AU2003212763A1 - An adressing method of moveable microelements in a spatial light modulator (slm) for pattering of a workpiece - Google Patents
An adressing method of moveable microelements in a spatial light modulator (slm) for pattering of a workpieceInfo
- Publication number
- AU2003212763A1 AU2003212763A1 AU2003212763A AU2003212763A AU2003212763A1 AU 2003212763 A1 AU2003212763 A1 AU 2003212763A1 AU 2003212763 A AU2003212763 A AU 2003212763A AU 2003212763 A AU2003212763 A AU 2003212763A AU 2003212763 A1 AU2003212763 A1 AU 2003212763A1
- Authority
- AU
- Australia
- Prior art keywords
- adressing
- pattering
- microelements
- slm
- moveable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
- G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0200788A SE0200788D0 (en) | 2002-03-15 | 2002-03-15 | Method using a movable micro-element |
SE0200788-8 | 2002-03-15 | ||
PCT/SE2003/000428 WO2003079091A1 (en) | 2002-03-15 | 2003-03-14 | An adressing method of moveable microelements in a spatial light modulator (slm) for pattering of a workpiece |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2003212763A1 true AU2003212763A1 (en) | 2003-09-29 |
Family
ID=20287277
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2003212763A Abandoned AU2003212763A1 (en) | 2002-03-15 | 2003-03-14 | An adressing method of moveable microelements in a spatial light modulator (slm) for pattering of a workpiece |
Country Status (3)
Country | Link |
---|---|
AU (1) | AU2003212763A1 (en) |
SE (1) | SE0200788D0 (en) |
WO (1) | WO2003079091A1 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SE0100336L (en) | 2001-02-05 | 2002-08-06 | Micronic Laser Systems Ab | Addressing method and apparatus using the same technical area |
US7023526B2 (en) | 2003-09-30 | 2006-04-04 | Asml Holding N.V. | Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation |
US7410736B2 (en) | 2003-09-30 | 2008-08-12 | Asml Holding N.V. | Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones |
US6876440B1 (en) | 2003-09-30 | 2005-04-05 | Asml Holding N.V. | Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region |
US10831018B2 (en) | 2017-12-08 | 2020-11-10 | Texas Instruments Incorporated | Methods and apparatus for increasing efficiency and optical bandwidth of a microelectromechanical system piston-mode spatial light modulator |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5212582A (en) * | 1992-03-04 | 1993-05-18 | Texas Instruments Incorporated | Electrostatically controlled beam steering device and method |
US5285196A (en) * | 1992-10-15 | 1994-02-08 | Texas Instruments Incorporated | Bistable DMD addressing method |
US5583688A (en) * | 1993-12-21 | 1996-12-10 | Texas Instruments Incorporated | Multi-level digital micromirror device |
US6046840A (en) * | 1995-06-19 | 2000-04-04 | Reflectivity, Inc. | Double substrate reflective spatial light modulator with self-limiting micro-mechanical elements |
US6312134B1 (en) * | 1996-07-25 | 2001-11-06 | Anvik Corporation | Seamless, maskless lithography system using spatial light modulator |
US5771116A (en) * | 1996-10-21 | 1998-06-23 | Texas Instruments Incorporated | Multiple bias level reset waveform for enhanced DMD control |
US6266178B1 (en) * | 1998-12-28 | 2001-07-24 | Texas Instruments Incorporated | Guardring DRAM cell |
-
2002
- 2002-03-15 SE SE0200788A patent/SE0200788D0/en unknown
-
2003
- 2003-03-14 AU AU2003212763A patent/AU2003212763A1/en not_active Abandoned
- 2003-03-14 WO PCT/SE2003/000428 patent/WO2003079091A1/en not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
WO2003079091A1 (en) | 2003-09-25 |
SE0200788D0 (en) | 2002-03-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |