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RU93058399A - METHOD OF CHEMICAL-STEAM APPLICATION OF THIN LAYER ON GLASS SURFACE - Google Patents

METHOD OF CHEMICAL-STEAM APPLICATION OF THIN LAYER ON GLASS SURFACE

Info

Publication number
RU93058399A
RU93058399A RU93058399/33A RU93058399A RU93058399A RU 93058399 A RU93058399 A RU 93058399A RU 93058399/33 A RU93058399/33 A RU 93058399/33A RU 93058399 A RU93058399 A RU 93058399A RU 93058399 A RU93058399 A RU 93058399A
Authority
RU
Russia
Prior art keywords
chemical
thin layer
glass surface
steam application
glass
Prior art date
Application number
RU93058399/33A
Other languages
Russian (ru)
Other versions
RU2102347C1 (en
Inventor
А.Руссо Дэвид
Р.Диркс Райан
П.Флорсак Гленн
Original Assignee
ЕЛФ Атокем Норт Америка, Инк.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ЕЛФ Атокем Норт Америка, Инк. filed Critical ЕЛФ Атокем Норт Америка, Инк.
Priority claimed from PCT/US1992/010872 external-priority patent/WO1993012892A1/en
Publication of RU93058399A publication Critical patent/RU93058399A/en
Application granted granted Critical
Publication of RU2102347C1 publication Critical patent/RU2102347C1/en

Links

Claims (1)

Заявленный способ нанесения покрытия на стекло химико-паровым осаждением при температуре ниже 200oС и под атмосферным давлением газовой смеси предшественника окиси олова, предшественника двуокиси кремния и такого ускорителя, как триэтилфосфит, позволяет достичь таких скоростей осаждения, которые превышают
Figure 00000001
в секунду. Слой наносимого при этом материала можно сочетать с другими слоями, получая изделие с особыми свойствами, в частности с заданными излучательной способностью, показателем преломления, износостойкостью при истирании и внешним видом.The claimed method of coating a glass by chemical vapor deposition at a temperature below 200 o C and at atmospheric pressure a gas mixture of tin oxide precursor, silicon dioxide precursor and such an accelerator as triethylphosphite allows to reach such deposition rates that exceed
Figure 00000001
per second. The layer of the material applied at the same time can be combined with other layers, obtaining a product with special properties, in particular with given emissivity, refractive index, wear resistance during abrasion and appearance.
RU93058399A 1991-12-26 1992-12-21 Method for chemical vapor-phase deposition of thin films onto glass substrate RU2102347C1 (en)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US81436691A 1991-12-26 1991-12-26
US07/814366 1991-12-26
US07/814,366 1991-12-26
US81435291A 1991-12-27 1991-12-27
US07/814,352 1991-12-27
US07/814352 1991-12-27
PCT/US1992/010872 WO1993012892A1 (en) 1991-12-26 1992-12-21 Method for coating glass substrates

Publications (2)

Publication Number Publication Date
RU93058399A true RU93058399A (en) 1996-01-10
RU2102347C1 RU2102347C1 (en) 1998-01-20

Family

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Family Applications (2)

Application Number Title Priority Date Filing Date
RU93058399A RU2102347C1 (en) 1991-12-26 1992-12-21 Method for chemical vapor-phase deposition of thin films onto glass substrate
RU9293058398A RU2091340C1 (en) 1991-12-26 1992-12-21 Article made by applying at least one layer of silicon and tin oxides mixture on glass backing

Family Applications After (1)

Application Number Title Priority Date Filing Date
RU9293058398A RU2091340C1 (en) 1991-12-26 1992-12-21 Article made by applying at least one layer of silicon and tin oxides mixture on glass backing

Country Status (26)

Country Link
US (2) US5401305A (en)
EP (4) EP0573639B1 (en)
JP (3) JP3485918B2 (en)
KR (3) KR100238740B1 (en)
CN (3) CN1043988C (en)
AR (1) AR248263A1 (en)
AT (2) ATE272582T1 (en)
AU (3) AU651754B2 (en)
BR (3) BR9205672A (en)
CA (3) CA2104590C (en)
CZ (3) CZ286854B6 (en)
DE (2) DE69230219T2 (en)
DK (2) DK0927706T3 (en)
ES (2) ES2221257T3 (en)
GR (1) GR3031624T3 (en)
HU (3) HU214047B (en)
MX (2) MX9207592A (en)
MY (1) MY110355A (en)
NO (3) NO316642B1 (en)
NZ (1) NZ246459A (en)
PL (1) PL169649B1 (en)
PT (4) PT927706E (en)
RU (2) RU2102347C1 (en)
SK (3) SK282141B6 (en)
UY (3) UY23526A1 (en)
WO (3) WO1993012892A1 (en)

Families Citing this family (64)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2102347C1 (en) * 1991-12-26 1998-01-20 ЕЛФ Атокем Норт Америка, Инк. Method for chemical vapor-phase deposition of thin films onto glass substrate
US5863337A (en) * 1993-02-16 1999-01-26 Ppg Industries, Inc. Apparatus for coating a moving glass substrate
US5356718A (en) * 1993-02-16 1994-10-18 Ppg Industries, Inc. Coating apparatus, method of coating glass, compounds and compositions for coating glasss and coated glass substrates
US5599387A (en) * 1993-02-16 1997-02-04 Ppg Industries, Inc. Compounds and compositions for coating glass with silicon oxide
US5395698A (en) * 1993-06-04 1995-03-07 Ppg Industries, Inc. Neutral, low emissivity coated glass articles and method for making
DE4433206A1 (en) * 1994-09-17 1996-03-21 Goldschmidt Ag Th Process for the pyrolytic coating of glass, glass ceramic and enamel products
DE19504906A1 (en) * 1995-02-15 1996-08-22 Goldschmidt Ag Th Process for the hot end annealing of hollow glass bodies by applying metal compounds to the hot outer glass surface
CO4560356A1 (en) * 1995-02-22 1998-02-10 Elf Atochem Vlissingen Bv PROCESS FOR THE PRODUCTION OF A PROTECTIVE COATING ON THE SURFACE OF A GLASS OR CERAMIC ARTICLE
US5648175A (en) * 1996-02-14 1997-07-15 Applied Materials, Inc. Chemical vapor deposition reactor system and integrated circuit
GB9616983D0 (en) * 1996-08-13 1996-09-25 Pilkington Plc Method for depositing tin oxide and titanium oxide coatings on flat glass and the resulting coated glass
GB9710547D0 (en) * 1997-05-23 1997-07-16 Pilkington Plc Coating method
FR2780054B1 (en) 1998-06-19 2000-07-21 Saint Gobain Vitrage METHOD FOR DEPOSITING A METAL OXIDE-BASED LAYER ON A GLASS SUBSTRATE, A GLASS SUBSTRATE THUS COATED
FR2789698B1 (en) * 1999-02-11 2002-03-29 Air Liquide METHOD AND INSTALLATION FOR FORMING A DEPOSIT OF A LAYER ON A SUBSTRATE
US6797388B1 (en) 1999-03-18 2004-09-28 Ppg Industries Ohio, Inc. Methods of making low haze coatings and the coatings and coated articles made thereby
JP3227449B2 (en) 1999-05-28 2001-11-12 日本板硝子株式会社 Substrate for photoelectric conversion device, method for manufacturing the same, and photoelectric conversion device using the same
LU90432B1 (en) * 1999-09-01 2001-03-02 Glaverbel Pyrolytic phosphostannate or borostannate layer and glazing comprising this layer
US6399208B1 (en) * 1999-10-07 2002-06-04 Advanced Technology Materials Inc. Source reagent composition and method for chemical vapor deposition formation or ZR/HF silicate gate dielectric thin films
JP4272534B2 (en) * 2002-01-28 2009-06-03 日本板硝子株式会社 Method for producing glass substrate provided with transparent conductive film, glass substrate provided with transparent conductive film, and photoelectric conversion device using the same
US6784049B2 (en) * 2002-08-28 2004-08-31 Micron Technology, Inc. Method for forming refractory metal oxide layers with tetramethyldisiloxane
US7030042B2 (en) * 2002-08-28 2006-04-18 Micron Technology, Inc. Systems and methods for forming tantalum oxide layers and tantalum precursor compounds
US20050196623A1 (en) * 2004-03-03 2005-09-08 Mckown Clem S.Jr. Solar control coated glass composition
US20050221003A1 (en) * 2004-03-31 2005-10-06 Remington Michael P Jr Enhancement of SiO2 deposition using phosphorus (V) compounds
US7372610B2 (en) 2005-02-23 2008-05-13 Sage Electrochromics, Inc. Electrochromic devices and methods
DE602006020302D1 (en) 2005-10-11 2011-04-07 Kuraray Co LIGHTING BODIES
RU2445340C2 (en) * 2005-10-11 2012-03-20 Курарей Ко, ЛТД., Luminous body
US8258690B2 (en) 2005-10-11 2012-09-04 Kuraray Co., Ltd. High brightness inorganic electroluminescence device driven by direct current
US20090002809A1 (en) * 2006-01-16 2009-01-01 Nippon Sheet Glass Company Limited Glass Plate Having Thin Film Formed Thereon
JP5325100B2 (en) * 2006-06-05 2013-10-23 ピルキントン グループ リミテッド Glass article having zinc oxide coating and method for producing the same
US8158262B2 (en) * 2006-06-05 2012-04-17 Pilkington Group Limited Glass article having a zinc oxide coating and method for making same
US20080026147A1 (en) * 2006-07-28 2008-01-31 Gulbrandsen Chemicals, Inc. Method and formulation for depositing a metal-containing coating on a substrate
US20080152804A1 (en) * 2006-07-28 2008-06-26 Gulbrandsen Chemicals, Inc. Method for depositing a metal-containing coating on a substrate
WO2008027085A1 (en) * 2006-08-29 2008-03-06 Pilkington Group Limited Method of making low resistivity doped zinc oxide coatings and the articles formed thereby
JP5559536B2 (en) * 2006-08-29 2014-07-23 ピルキントン グループ リミテッド Method for producing glass article coated with low resistivity doped zinc oxide and coated glass article produced by the process
FR2913973B1 (en) * 2007-03-21 2011-02-18 Saint Gobain GLAZED COATED SUBSTRATE WITH IMPROVED MECHANICAL STRENGTH
MX2009007526A (en) * 2007-01-15 2009-07-22 Saint Gobain Glass substrate coated with layers having an improved mechanical strength.
US20100124642A1 (en) * 2008-11-19 2010-05-20 Ppg Industries Ohio, Inc. Undercoating layers providing improved conductive topcoat functionality
US8133599B2 (en) 2008-11-19 2012-03-13 Ppg Industries Ohio, Inc Undercoating layers providing improved photoactive topcoat functionality
US7998586B2 (en) 2008-11-19 2011-08-16 Ppg Industries Ohio, Inc. Undercoating layers providing improved topcoat functionality
JP5343133B2 (en) * 2008-11-19 2013-11-13 ピーピージー・インダストリーズ・オハイオ・インコーポレイテッド Undercoating layer that improves topcoat functionality
DE102008060923B4 (en) 2008-12-06 2012-09-27 Innovent E.V. Use of a layer
EP2452381A1 (en) * 2009-07-06 2012-05-16 Arkema, Inc. Oled substrate consisting of transparent conductive oxide (tco) and anti-iridescent undercoat
US20110146768A1 (en) * 2009-12-21 2011-06-23 Ppg Industries Ohio, Inc. Silicon thin film solar cell having improved underlayer coating
US9366783B2 (en) * 2009-12-21 2016-06-14 Ppg Industries Ohio, Inc. Silicon thin film solar cell having improved underlayer coating
US9224892B2 (en) * 2009-12-21 2015-12-29 Ppg Industries Ohio, Inc. Silicon thin film solar cell having improved haze and methods of making the same
FR2956659B1 (en) * 2010-02-22 2014-10-10 Saint Gobain LAYER COATED VERTICAL SUBSTRATE WITH IMPROVED MECHANICAL STRENGTH
EP2441860A1 (en) * 2010-10-13 2012-04-18 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Apparatus and method for atomic layer deposition on a surface
US8557099B2 (en) 2010-10-25 2013-10-15 Ppg Industries Ohio, Inc. Electrocurtain coating process for coating solar mirrors
RU2477711C1 (en) * 2011-08-12 2013-03-20 Федеральное государственное автономное образовательное учреждение высшего профессионального образования "Уральский федеральный университет имени первого Президента России Б.Н. Ельцина" Doped quartz glass with tetrahedral coordination of titanium atoms
US8734903B2 (en) 2011-09-19 2014-05-27 Pilkington Group Limited Process for forming a silica coating on a glass substrate
JP6117799B2 (en) * 2011-09-30 2017-04-19 アーケマ・インコーポレイテッド Silicon oxide deposition by atmospheric pressure chemical vapor deposition
CN102584025B (en) * 2012-01-19 2014-06-11 江苏秀强玻璃工艺股份有限公司 Preparation method of glass with wide band-gap refractive-index-adjustable isolation layer
US20130334089A1 (en) * 2012-06-15 2013-12-19 Michael P. Remington, Jr. Glass Container Insulative Coating
KR101684446B1 (en) * 2013-03-12 2016-12-08 비트로, 에스.에이.비. 데 씨.브이. High haze underlayer for solar cell
TW201716245A (en) * 2015-08-05 2017-05-16 康寧公司 Articles and methods for bonding sheets with carriers
WO2017082541A1 (en) * 2015-11-11 2017-05-18 한국화학연구원 Metal precursor, manufacturing method therefor, and method for forming thin film by using same
EP3173507A1 (en) * 2015-11-25 2017-05-31 Umicore AG & Co. KG Method for the organometallic gas phase deposition under use of solutions of indiumalkyl compounds in hydrocarbons
GB201523156D0 (en) * 2015-12-31 2016-02-17 Pilkington Group Ltd High strength glass containers
CA2920646A1 (en) 2016-02-12 2017-08-12 Seastar Chemicals Inc. Organometallic compound and method
CN106217968A (en) * 2016-07-15 2016-12-14 常熟市赛蒂镶嵌玻璃制品有限公司 A kind of high abrasion implosion guard
WO2019043398A1 (en) 2017-08-31 2019-03-07 Pilkington Group Limited Coated glass article, method of making the same, and photovoltaic cell made therewith
US11485678B2 (en) 2017-08-31 2022-11-01 Pilkington Group Limited Chemical vapor deposition process for forming a silicon oxide coating
JP6993394B2 (en) * 2019-08-06 2022-02-21 バーサム マテリアルズ ユーエス，リミティド ライアビリティ カンパニー Silicon compounds and methods of depositing films using silicon compounds
EP4139257A1 (en) * 2020-04-23 2023-03-01 Pilkington Group Limited Method of making a coated glass article
TR202010598A2 (en) 2020-07-03 2022-01-21 Tuerkiye Sise Ve Cam Fabrikalari Anonim Sirketi Antimicrobial coating solution developed for glass surfaces, antimicrobial coated glass and its application process

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3378396A (en) * 1967-03-27 1968-04-16 Zaromb Solomon Conductive oxide-coated articles
US3984581A (en) * 1973-02-28 1976-10-05 Carl Zeiss-Stiftung Method for the production of anti-reflection coatings on optical elements made of transparent organic polymers
US3949146A (en) * 1973-08-24 1976-04-06 Rca Corporation Process for depositing transparent electrically conductive tin oxide coatings on a substrate
DE2454657A1 (en) * 1974-11-18 1976-05-20 Jenaer Glaswerk Schott & Gen Antimist coating with high phosphorus pentoxide content - easily applied to glass and other (in)-organic surfaces with permanent effect
US4227929A (en) * 1976-08-26 1980-10-14 Ameron, Inc. Siloxane-tin coatings
US4308316A (en) * 1977-04-04 1981-12-29 Gordon Roy G Non-iridescent glass structures
US4187336A (en) * 1977-04-04 1980-02-05 Gordon Roy G Non-iridescent glass structures
US4206252A (en) * 1977-04-04 1980-06-03 Gordon Roy G Deposition method for coating glass and the like
SU833649A1 (en) * 1979-02-12 1981-05-30 Северо-Западный Заочный Политехническийинститут Film-producing solution for glass articles
JPS5734164A (en) * 1980-08-06 1982-02-24 Kansai Paint Co Ltd Film-forming composition
US4386117A (en) * 1981-11-20 1983-05-31 Gordon Roy G Coating process using alkoxy substituted silicon-bearing reactant
JPS58189263A (en) * 1982-04-28 1983-11-04 Hitachi Chem Co Ltd Coating fluid for sio2 film formation
JPS59125433A (en) * 1982-12-30 1984-07-19 Fujitsu Ltd Audio response system
US4590096A (en) * 1984-12-28 1986-05-20 M&T Chemicals Inc. Water vapor, reaction rate and deposition rate control of tin oxide film by CVD on glass
JPS61181253A (en) * 1985-02-06 1986-08-13 Keihachirou Shikakura Telephone set
JPS62263754A (en) * 1986-05-09 1987-11-16 Iwatsu Electric Co Ltd data input device
US5028566A (en) * 1987-04-10 1991-07-02 Air Products And Chemicals, Inc. Method of forming silicon dioxide glass films
US4880664A (en) * 1987-08-31 1989-11-14 Solarex Corporation Method of depositing textured tin oxide
AU616736B2 (en) * 1988-03-03 1991-11-07 Asahi Glass Company Limited Amorphous oxide film and article having such film thereon
EP0486475B1 (en) * 1988-03-03 1997-12-03 Asahi Glass Company Ltd. Amorphous oxide film and article having such film thereon
US5382383A (en) * 1988-08-24 1995-01-17 Catalysts & Chemicals Industries Co., Ltd. Coating solutions for forming transparent conductive ceramic coatings, substrates coated with transparent conductive ceramic coatings and process for preparing same, and uses of substrates coated with transparent conductive ceramic coatings
JP2856754B2 (en) * 1989-02-17 1999-02-10 株式会社東芝 Ultraviolet-suppressed luminescence source, coating agent for ultraviolet-suppressed luminescence source, and method for producing ultraviolet-suppressed luminescence source
EP0386341B1 (en) * 1989-03-07 1995-03-15 Asahi Glass Company Ltd. Laminated glass structure
JPH0717407B2 (en) * 1989-10-09 1995-03-01 旭硝子株式会社 Method for producing glass with functional thin film
US5090985A (en) * 1989-10-17 1992-02-25 Libbey-Owens-Ford Co. Method for preparing vaporized reactants for chemical vapor deposition
RU2102347C1 (en) * 1991-12-26 1998-01-20 ЕЛФ Атокем Норт Америка, Инк. Method for chemical vapor-phase deposition of thin films onto glass substrate

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