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NO20071731L - Fleksibelt nanopregestempel - Google Patents

Fleksibelt nanopregestempel

Info

Publication number
NO20071731L
NO20071731L NO20071731A NO20071731A NO20071731L NO 20071731 L NO20071731 L NO 20071731L NO 20071731 A NO20071731 A NO 20071731A NO 20071731 A NO20071731 A NO 20071731A NO 20071731 L NO20071731 L NO 20071731L
Authority
NO
Norway
Prior art keywords
embossing
stamp
defects
sections
nanopreg
Prior art date
Application number
NO20071731A
Other languages
English (en)
Inventor
Anders Kristensen
Theodor Nielsen
Ole Hansen
Original Assignee
Nil Technology Aps
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nil Technology Aps filed Critical Nil Technology Aps
Publication of NO20071731L publication Critical patent/NO20071731L/no

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F17/00—Printing apparatus or machines of special types or for particular purposes, not otherwise provided for
    • B41F17/001—Pad printing apparatus or machines
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C99/00—Subject matter not provided for in other groups of this subclass
    • B81C99/0075—Manufacture of substrate-free structures
    • B81C99/009—Manufacturing the stamps or the moulds

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

Den foreliggende oppfinnelsen angår et nanopregestempel for preging av strukturer i. nanometerstørrelse til mm-størrelse, idet stempelet (1) har en basisdel og en første og en andre pregeseksjon (2, 3), idet den første og den andre pregeseksjon har et litografisk mønster (7) som er beregnet til preging i et mottakssubstrat. I et første aspekt er den første og den andre pregeseksjon (2, 3) uavhengig av hverandre forskyvelige i en retning som i det vesentlige er parallell med en pregeretning for pregestempelet. I et andre aspekt er den første og den andre pregeseksjon (2, 3) mekanisk svakt koblet i en retning som i det vesentlige er parallell med en pregeretning for pregestempelet. Stempelet begrenser virkningen av defekter i eller på det substrat som skal preges med et litografisk mønster (7) og defekter i eller på stempelet og hvilke som helst kombinasjoner av slike defekter ved lokalisering av stempelets bøyning til basisdelen (5) mellom pregeseksjonene (2, 3).
NO20071731A 2004-09-08 2007-04-02 Fleksibelt nanopregestempel NO20071731L (no)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DKPA200401354 2004-09-08
US61252004P 2004-09-24 2004-09-24
PCT/DK2005/000570 WO2006026993A1 (en) 2004-09-08 2005-09-07 A flexible nano-imprint stamp

Publications (1)

Publication Number Publication Date
NO20071731L true NO20071731L (no) 2007-04-02

Family

ID=38731729

Family Applications (1)

Application Number Title Priority Date Filing Date
NO20071731A NO20071731L (no) 2004-09-08 2007-04-02 Fleksibelt nanopregestempel

Country Status (10)

Country Link
US (1) US8075298B2 (no)
EP (1) EP1789848B1 (no)
JP (1) JP4733134B2 (no)
CN (1) CN101036086B (no)
AU (1) AU2005282060A1 (no)
CA (1) CA2579603A1 (no)
DK (1) DK1789848T3 (no)
NO (1) NO20071731L (no)
WO (1) WO2006026993A1 (no)
ZA (1) ZA200702713B (no)

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Publication number Priority date Publication date Assignee Title
US9016221B2 (en) 2004-02-17 2015-04-28 University Of Florida Research Foundation, Inc. Surface topographies for non-toxic bioadhesion control
US7676088B2 (en) 2004-12-23 2010-03-09 Asml Netherlands B.V. Imprint lithography
US8202075B2 (en) * 2005-08-12 2012-06-19 Canon Kabushiki Kaisha Imprint apparatus and imprint method
JP5268239B2 (ja) * 2005-10-18 2013-08-21 キヤノン株式会社 パターン形成装置、パターン形成方法
US7517211B2 (en) 2005-12-21 2009-04-14 Asml Netherlands B.V. Imprint lithography
US20070138699A1 (en) * 2005-12-21 2007-06-21 Asml Netherlands B.V. Imprint lithography
US7500431B2 (en) * 2006-01-12 2009-03-10 Tsai-Wei Wu System, method, and apparatus for membrane, pad, and stamper architecture for uniform base layer and nanoimprinting pressure
JP4938365B2 (ja) * 2006-06-26 2012-05-23 パナソニック株式会社 カーボン金型、およびその製造方法
US20080315459A1 (en) * 2007-06-21 2008-12-25 3M Innovative Properties Company Articles and methods for replication of microstructures and nanofeatures
US20090114618A1 (en) * 2007-06-21 2009-05-07 3M Innovative Properties Company Method of making hierarchical articles
US20090041986A1 (en) * 2007-06-21 2009-02-12 3M Innovative Properties Company Method of making hierarchical articles
WO2009067241A1 (en) * 2007-11-21 2009-05-28 Molecular Imprints, Inc. Porous template and imprinting stack for nano-imprint lithography
US20090159936A1 (en) * 2007-12-20 2009-06-25 Uday Shah Device with asymmetric spacers
JP2010009729A (ja) * 2008-06-30 2010-01-14 Toshiba Corp インプリント用スタンパ、インプリント用スタンパの製造方法、磁気記録媒体、磁気記録媒体の製造方法及び磁気ディスク装置
KR101512876B1 (ko) * 2008-08-27 2015-04-16 에이엠오 게엠베하 개선된 나노임프린트 방법
US8145457B2 (en) * 2008-09-22 2012-03-27 Massachusetts Institute Of Technology Method and apparatus for modeling deformation of a deformable body embossed with a stamp
US20100104852A1 (en) * 2008-10-23 2010-04-29 Molecular Imprints, Inc. Fabrication of High-Throughput Nano-Imprint Lithography Templates
WO2010056824A2 (en) 2008-11-11 2010-05-20 University Of Florida Research Foundation, Inc. Method of patterning a surface and articles comprising the same
WO2011038741A1 (en) 2009-10-02 2011-04-07 Danmarks Tekniske Universitet Injection molding tools with micro/nano-meter pattern
US8585954B2 (en) * 2009-11-10 2013-11-19 Massachusetts Institute Of Technology Method and apparatus for embossing a deformable body
FR2955520B1 (fr) * 2010-01-28 2012-08-31 Commissariat Energie Atomique Moule pour la lithographie par nano-impression et procedes de realisation
JP5760714B2 (ja) 2011-06-03 2015-08-12 住友電気工業株式会社 ナノインプリント用モールド
US9937655B2 (en) 2011-06-15 2018-04-10 University Of Florida Research Foundation, Inc. Method of manufacturing catheter for antimicrobial control
RU2476917C1 (ru) * 2011-08-12 2013-02-27 Открытое акционерное общество "НИИ молекулярной электроники и завод "Микрон" Способ изготовления штампа для наноимпринт литографии
JP5328869B2 (ja) * 2011-10-21 2013-10-30 東芝機械株式会社 転写用の型の製造方法
US9149958B2 (en) * 2011-11-14 2015-10-06 Massachusetts Institute Of Technology Stamp for microcontact printing
WO2014070444A1 (en) * 2012-10-29 2014-05-08 Northwestern University Heat actuated and projected lithography systems and methods
TWI665078B (zh) 2013-07-22 2019-07-11 皇家飛利浦有限公司 製造圖案化印模以圖案化輪廓表面之方法、供在壓印微影製程中使用之圖案化印模、壓印微影方法、包括圖案化輪廓表面之物件及圖案化印模用於壓印微影之用法
KR102249004B1 (ko) * 2014-04-22 2021-05-07 에베 그룹 에. 탈너 게엠베하 나노구조를 엠보싱하기 위한 방법 및 장치
EP3198341B1 (en) 2014-09-22 2023-07-19 Koninklijke Philips N.V. Transfer method and apparatus and computer program product
US9704821B2 (en) * 2015-08-11 2017-07-11 X-Celeprint Limited Stamp with structured posts
US20220088836A1 (en) * 2019-01-24 2022-03-24 Nil Technology Aps A component for liquid handling with self-cleaning properties
GB2612986B (en) * 2021-11-18 2024-07-31 Rockley Photonics Ltd Stamp for micro-transfer printing

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3372258B2 (ja) * 1995-08-04 2003-01-27 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン リソグラフィ・プロセス用のスタンプ
US6482742B1 (en) 2000-07-18 2002-11-19 Stephen Y. Chou Fluid pressure imprint lithography
US6365059B1 (en) 2000-04-28 2002-04-02 Alexander Pechenik Method for making a nano-stamp and for forming, with the stamp, nano-size elements on a substrate
SE516414C2 (sv) * 2000-05-24 2002-01-15 Obducat Ab Metod vid tillverkning av en mall, samt mallen tillverkad därav
US20030017424A1 (en) 2001-07-18 2003-01-23 Miri Park Method and apparatus for fabricating complex grating structures
US20030071016A1 (en) * 2001-10-11 2003-04-17 Wu-Sheng Shih Patterned structure reproduction using nonsticking mold
US6743368B2 (en) * 2002-01-31 2004-06-01 Hewlett-Packard Development Company, L.P. Nano-size imprinting stamp using spacer technique
JP3821069B2 (ja) * 2002-08-01 2006-09-13 株式会社日立製作所 転写パターンによる構造体の形成方法
US6916511B2 (en) * 2002-10-24 2005-07-12 Hewlett-Packard Development Company, L.P. Method of hardening a nano-imprinting stamp
KR100585951B1 (ko) * 2004-02-18 2006-06-01 한국기계연구원 조합/분리형 독립구동이 가능한 복수 개의 모듈을 갖는 임프린팅 장치

Also Published As

Publication number Publication date
JP2008512274A (ja) 2008-04-24
ZA200702713B (en) 2008-08-27
JP4733134B2 (ja) 2011-07-27
CN101036086A (zh) 2007-09-12
CA2579603A1 (en) 2006-03-16
DK1789848T3 (da) 2010-10-25
EP1789848B1 (en) 2010-06-30
EP1789848A1 (en) 2007-05-30
WO2006026993A1 (en) 2006-03-16
CN101036086B (zh) 2011-01-19
AU2005282060A1 (en) 2006-03-16
US20080000375A1 (en) 2008-01-03
US8075298B2 (en) 2011-12-13
WO2006026993A9 (en) 2006-09-21

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