NL7711723A - RADIATION SENSITIVE ELEMENT. - Google Patents

RADIATION SENSITIVE ELEMENT.

Info

Publication number: NL7711723A
Authority: NL; Netherlands
Prior art keywords: sensitive element; radiation sensitive; radiation; sensitive
Prior art date: 1976-10-27

Application number

NL7711723A

Other languages

Dutch (nl)

Original Assignee

Du Pont

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1976-10-27

Filing date

1977-10-26

Publication date

1978-05-02

1977-10-26 Application filed by Du Pont filed Critical Du Pont

1978-05-02 Publication of NL7711723A publication Critical patent/NL7711723A/en

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Polymerisation Methods In General (AREA)
Non-Metallic Protective Coatings For Printed Circuits (AREA)
Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Compositions Of Macromolecular Compounds (AREA)
Macromonomer-Based Addition Polymer (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Materials For Photolithography (AREA)

NL7711723A 1976-10-27 1977-10-26 RADIATION SENSITIVE ELEMENT. NL7711723A (en)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
US73597976A	1976-10-27	1976-10-27
US78090777A	1977-03-24	1977-03-24

Publications (1)

Publication Number	Publication Date
NL7711723A true NL7711723A (en)	1978-05-02

Family

ID=27112970

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
NL7711723A NL7711723A (en)	1976-10-27	1977-10-26	RADIATION SENSITIVE ELEMENT.

Country Status (9)

Country	Link
JP (1)	JPS5356018A (en)
CA (1)	CA1116919A (en)
CH (1)	CH630767A5 (en)
DE (1)	DE2747947C2 (en)
FR (1)	FR2369590A1 (en)
GB (1)	GB1588368A (en)
IT (1)	IT1089005B (en)
NL (1)	NL7711723A (en)
SE (1)	SE435106B (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
NO159729C (en) *	1978-11-01	1989-02-01	Coates Brothers & Co	PROCEDURE FOR MANUFACTURING A PATTERN METAL PATTERN ON A LAYER ELECTRIC CONDUCTIVE METAL BEARED BY A NON-CONDUCTIVE SUBSTRATE.
DE3136818C2 (en) *	1980-09-19	1990-08-02	Hitachi Chemical Co., Ltd., Tokio/Tokyo	Use of a photosensitive mixture and a photosensitive recording material for forming a solder mask
JPS5764734A (en) *	1980-10-08	1982-04-20	Hitachi Chem Co Ltd	Photosensitive resin composition and photosensitive element
DE3114931A1 (en) *	1981-04-13	1982-10-28	Hoechst Ag, 6000 Frankfurt	POLYMERIZABLE MIXTURE BY RADIATION AND PHOTOPOLYMERIZABLE COPY MATERIAL MADE THEREOF
US4752553A (en) *	1982-04-01	1988-06-21	M&T Chemicals Inc.	High resolution solder mask photopolymers for screen coating over circuit traces
JPS5969752A (en) *	1982-10-14	1984-04-20	Sekisui Chem Co Ltd	Photopolymerizable composition for forming image
JPS63158157U (en) *	1987-04-07	1988-10-17
US5196296A (en) *	1989-10-06	1993-03-23	Nippon Steel Corporation	Epoxy acrylate resins and photosensitive resin compositions therefrom
EP0822448B1 (en) *	1996-08-02	2000-11-02	E.I. Du Pont De Nemours And Company	Flexible, flame-retardant, photoimageable composition for coating printed circuits
US7141614B2 (en)	2001-10-30	2006-11-28	Kaneka Corporation	Photosensitive resin composition and photosensitive films and laminates made by using the same

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CA614181A (en) *		1961-02-07	J. Mcgraw William	Photopolymerizable compositions, elements and processes
US3261686A (en) *	1963-04-23	1966-07-19	Du Pont	Photopolymerizable compositions and elements
DE1950120A1 (en) *	1968-10-09	1970-04-30	Du Pont	Heterogeneous photopolymerizable mass
US3682800A (en) *	1969-07-25	1972-08-08	Toray Industries	Method for producing acrylonitrile copolymers
US3657088A (en) *	1969-12-17	1972-04-18	Bayer Ag	Moulding and coating masses hardenable by uv irradiation
GB1312492A (en) *	1969-12-19	1973-04-04	Mccall Corp	Crosslinked polymers and process therefor
US3887450A (en) *	1971-02-04	1975-06-03	Dynachem Corp	Photopolymerizable compositions containing polymeric binding agents
JPS498281A (en) *	1972-05-11	1974-01-24
JPS5537869B2 (en) *	1973-02-12	1980-09-30
JPS5335722B2 (en) *	1973-08-29	1978-09-28
DE2344680A1 (en) *	1973-09-05	1975-03-20	Bruno Prof Dr Vollmert	Photopolymerisable relief printing plates - copolymer of monounsatd. acids esters and nitroiles crosslinked by divinyl compounds
JPS5179342A (en) *	1974-12-26	1976-07-10	Fuji Photo Film Co Ltd

1977
- 1977-10-25 CA CA000289448A patent/CA1116919A/en not_active Expired
- 1977-10-25 GB GB4444377A patent/GB1588368A/en not_active Expired
- 1977-10-26 FR FR7732230A patent/FR2369590A1/en active Granted
- 1977-10-26 IT IT2900877A patent/IT1089005B/en active
- 1977-10-26 SE SE7712054A patent/SE435106B/en not_active IP Right Cessation
- 1977-10-26 CH CH1304577A patent/CH630767A5/en not_active IP Right Cessation
- 1977-10-26 NL NL7711723A patent/NL7711723A/en not_active Application Discontinuation
- 1977-10-26 DE DE19772747947 patent/DE2747947C2/en not_active Expired
- 1977-10-27 JP JP12823777A patent/JPS5356018A/en active Granted

Also Published As

Publication number	Publication date
DE2747947A1 (en)	1978-05-03
IT1089005B (en)	1985-06-10
SE435106B (en)	1984-09-03
JPS5751655B2 (en)	1982-11-02
DE2747947C2 (en)	1983-12-22
CH630767A5 (en)	1982-06-30
CA1116919A (en)	1982-01-26
GB1588368A (en)	1981-04-23
FR2369590B1 (en)	1981-11-13
SE7712054L (en)	1978-04-28
JPS5356018A (en)	1978-05-22
FR2369590A1 (en)	1978-05-26

Publication	Publication Date	Title
NL186474C (en)	1990-12-03	IMAGING ELEMENT.
NL170464C (en)	1982-11-01	PHOTOGRAPHIC ELEMENT.
NL7709936A (en)	1978-03-15	SENSITIVE COPIER GROUND.
SE430713B (en)	1983-12-05	FAST SEEN element
NL7704948A (en)	1977-11-08	CALIBRATION DEVICE.
NL7707518A (en)	1978-01-10	HEATING ELEMENTS.
NL7707065A (en)	1977-12-30	SCINTILLATION DETECTOR.
NL7707522A (en)	1978-01-10	TEMPERATURE SENSOR ELEMENT.
NL7713490A (en)	1978-06-08	TEMPERATURE DEVICE.
NL7705779A (en)	1977-11-30	PHOTO-SENSITIVE ELEMENT.
NL165851C (en)	1981-05-15	RADIATION SENSITIVE COVER.
NL7709935A (en)	1978-03-15	SENSITIVE COPIER GROUND.
NL7808060A (en)	1979-02-13	SEMICONDUCTOR ELEMENT.
NL7709672A (en)	1978-03-29	RADIATION DETECTOR.
NL7706047A (en)	1977-12-06	MOUNTING ELEMENT.
NO774081L (en)	1978-07-11	RADIATION SYSTEM.
NL7712151A (en)	1978-05-08	PHOTO DETECTOR.
NL7701379A (en)	1977-08-30	LIGHT EMISSIONING SEMICONDUCTOR ELEMENT.
NL190032C (en)	1993-10-01	SCINTILLATION DETECTOR.
NL7709724A (en)	1978-03-06	RADIOMETER.
NL7711723A (en)	1978-05-02	RADIATION SENSITIVE ELEMENT.
NO774182L (en)	1978-06-21	DETECTOR.
SE7703707L (en)	1977-10-10	SECURITY ELEMENT
NL185587C (en)	1990-05-16	TEMPERATURE SENSOR.
NL7702398A (en)	1977-09-13	RADIATION DETECTION DEVICE.

Legal Events

Date	Code	Title
1984-07-02	BC	A request for examination has been filed
1985-01-01	A85	Still pending on 85-01-01
1988-06-01	BV	The patent application has lapsed