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GB1312492A - Crosslinked polymers and process therefor - Google Patents

Crosslinked polymers and process therefor

Info

Publication number
GB1312492A
GB1312492A GB5476170A GB5476170A GB1312492A GB 1312492 A GB1312492 A GB 1312492A GB 5476170 A GB5476170 A GB 5476170A GB 5476170 A GB5476170 A GB 5476170A GB 1312492 A GB1312492 A GB 1312492A
Authority
GB
United Kingdom
Prior art keywords
coating
polymer composition
groups
radiation
photo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5476170A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mccall Corp
Original Assignee
Mccall Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mccall Corp filed Critical Mccall Corp
Publication of GB1312492A publication Critical patent/GB1312492A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

1312492 Photo-sensitive materials for producing printing plates MCCALL CORP 18 Nov 1970 [19 Dec 1969] 54761/70 Heading G2C [Also in Division C3] Relief printing plates are made by coating a substrate with the radiation sensitive polymer composition described below, exposing part of the coating to radiation to effect cross-linking therein, and removing the unexposed part. In example 1, a coating is formed on a metal base, exposed to U. V. light through a lettered stencil, and the unexposed part then removed by methylene chloride. In example 2 the substrate is a metal base having a polyurethane coating thereon, and nine layers of the polymer composition are successively applied thereto, the proportion of photoinitiator in the composition being varied in groups of layers. Example 4 refers to exposure to electron radiation. The polymer composition used above comprises (1) an elastomer containing a plurality of non- terminal ethyleric groups, which is a copolymer of butadiene or a derivative thereof with acrylonitrile or a derivative thereof and which optionally contains carboxyl groups, (2) a saturated halogenated polymer, preferably PVC or a vinyl chloride/vinyl acetate copolymer, (3) a polyfunctional monomeric cross-linking agent (many specified), and (4) a photo-initiator, e.g. benzophenone. The composition is applied from solution, e.g. in methyl ethyl ketone.
GB5476170A 1969-12-19 1970-11-18 Crosslinked polymers and process therefor Expired GB1312492A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US88676769A 1969-12-19 1969-12-19

Publications (1)

Publication Number Publication Date
GB1312492A true GB1312492A (en) 1973-04-04

Family

ID=25389726

Family Applications (1)

Application Number Title Priority Date Filing Date
GB5476170A Expired GB1312492A (en) 1969-12-19 1970-11-18 Crosslinked polymers and process therefor

Country Status (5)

Country Link
JP (1) JPS4918721B1 (en)
CA (1) CA930231A (en)
CH (1) CH558816A (en)
DE (1) DE2062563A1 (en)
GB (1) GB1312492A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2415822A1 (en) * 1978-01-25 1979-08-24 Du Pont PHOTOSENSITIVE ELASTOMERIC COMPOSITIONS FOR FLEXOGRAPHIC PRINTING PLATES
US4179531A (en) 1977-08-23 1979-12-18 W. R. Grace & Co. Polythiol effect, curable monoalkenyl aromatic-diene and ene composition
FR2438282A1 (en) * 1978-10-02 1980-04-30 Asahi Chemical Ind PHOTOSENSITIVE ELASTOMER COMPOSITION
US4234676A (en) 1978-01-23 1980-11-18 W. R. Grace & Co. Polythiol effect curable polymeric composition
US4264708A (en) 1978-03-31 1981-04-28 E. I. Du Pont De Nemours And Company Radiation sensitive element having a thin photopolymerizable layer
US4278752A (en) 1978-09-07 1981-07-14 E. I. Du Pont De Nemours And Company Flame retardant radiation sensitive element
US4308338A (en) 1980-03-26 1981-12-29 E. I. Du Pont De Nemours And Company Methods of imaging photopolymerizable materials containing diester polyether
EP0104751A2 (en) * 1982-08-31 1984-04-04 W.R. Grace & Co.-Conn. Photosensitive elastomeric polymer composition for flexographic printing plates
US5252428A (en) * 1988-03-31 1993-10-12 Asahi Kasei Kogyo Kabushiki Kaisha Photoresin relief printing plate

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51116893A (en) * 1975-04-08 1976-10-14 Ube Ind Ltd Photo-setting compositions
CA1116919A (en) * 1976-10-27 1982-01-26 Joseph E. Gervay Flame retardant radiation sensitive element of photopolymerizable composition containing halogen and an acrylonitrile containing polymeric binder
JPS53127004A (en) * 1977-04-11 1978-11-06 Asahi Chemical Ind Photosensitive elastomer composition
DE2834768A1 (en) * 1977-08-23 1979-03-08 Grace W R & Co METHOD FOR MANUFACTURING A PRINTING PLATE AND CONTAINING HARDABLE POLYMER COMPOSITION
DE3327523A1 (en) * 1983-07-30 1985-02-07 Basf Ag, 6700 Ludwigshafen LIGHT-SENSITIVE MULTILAYER MATERIAL
JPS61128243A (en) * 1984-11-28 1986-06-16 Asahi Chem Ind Co Ltd Photosensitive resin composition

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4179531A (en) 1977-08-23 1979-12-18 W. R. Grace & Co. Polythiol effect, curable monoalkenyl aromatic-diene and ene composition
US4234676A (en) 1978-01-23 1980-11-18 W. R. Grace & Co. Polythiol effect curable polymeric composition
FR2415822A1 (en) * 1978-01-25 1979-08-24 Du Pont PHOTOSENSITIVE ELASTOMERIC COMPOSITIONS FOR FLEXOGRAPHIC PRINTING PLATES
US4264708A (en) 1978-03-31 1981-04-28 E. I. Du Pont De Nemours And Company Radiation sensitive element having a thin photopolymerizable layer
US4278752A (en) 1978-09-07 1981-07-14 E. I. Du Pont De Nemours And Company Flame retardant radiation sensitive element
FR2438282A1 (en) * 1978-10-02 1980-04-30 Asahi Chemical Ind PHOTOSENSITIVE ELASTOMER COMPOSITION
US4308338A (en) 1980-03-26 1981-12-29 E. I. Du Pont De Nemours And Company Methods of imaging photopolymerizable materials containing diester polyether
EP0104751A2 (en) * 1982-08-31 1984-04-04 W.R. Grace & Co.-Conn. Photosensitive elastomeric polymer composition for flexographic printing plates
EP0104751A3 (en) * 1982-08-31 1984-09-05 Uniroyal, Inc. Photosensitive elastomeric polymer composition for flexographic printing plates
US5252428A (en) * 1988-03-31 1993-10-12 Asahi Kasei Kogyo Kabushiki Kaisha Photoresin relief printing plate

Also Published As

Publication number Publication date
CH558816A (en) 1975-02-14
DE2062563A1 (en) 1971-09-02
JPS4918721B1 (en) 1974-05-13
CA930231A (en) 1973-07-17

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Legal Events

Date Code Title Description
PS Patent sealed
PLE Entries relating assignments, transmissions, licences in the register of patents
PCNP Patent ceased through non-payment of renewal fee