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NL149232B - PROCEDURE FOR DEPOSITING A METAL ON A SUBSTRATE AND OBJECTS THEREFORE. - Google Patents

PROCEDURE FOR DEPOSITING A METAL ON A SUBSTRATE AND OBJECTS THEREFORE.

Info

Publication number
NL149232B
NL149232B NL6708168A NL6708168A NL149232B NL 149232 B NL149232 B NL 149232B NL 6708168 A NL6708168 A NL 6708168A NL 6708168 A NL6708168 A NL 6708168A NL 149232 B NL149232 B NL 149232B
Authority
NL
Netherlands
Prior art keywords
depositing
objects
procedure
substrate
metal
Prior art date
Application number
NL6708168A
Other languages
Dutch (nl)
Other versions
NL6708168A (en
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Publication of NL6708168A publication Critical patent/NL6708168A/xx
Publication of NL149232B publication Critical patent/NL149232B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/08—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal halides

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
NL6708168A 1966-06-20 1967-06-13 PROCEDURE FOR DEPOSITING A METAL ON A SUBSTRATE AND OBJECTS THEREFORE. NL149232B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4089566 1966-06-20

Publications (2)

Publication Number Publication Date
NL6708168A NL6708168A (en) 1967-12-21
NL149232B true NL149232B (en) 1976-04-15

Family

ID=12593229

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6708168A NL149232B (en) 1966-06-20 1967-06-13 PROCEDURE FOR DEPOSITING A METAL ON A SUBSTRATE AND OBJECTS THEREFORE.

Country Status (4)

Country Link
BE (1) BE700185A (en)
CH (1) CH485867A (en)
GB (1) GB1189344A (en)
NL (1) NL149232B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3762052D1 (en) * 1986-03-31 1990-05-03 Unisys Corp DEPOSITION OF A VANADIN MAT FOR MAGNETIC FILMS.
GB2196019A (en) * 1986-10-07 1988-04-20 Cambridge Instr Ltd Metalorganic chemical vapour deposition
US4997677A (en) * 1987-08-31 1991-03-05 Massachusetts Institute Of Technology Vapor phase reactor for making multilayer structures
WO1990010092A1 (en) * 1989-02-24 1990-09-07 Massachusetts Institute Of Technology A modified stagnation flow apparatus for chemical vapor deposition providing excellent control of the deposition

Also Published As

Publication number Publication date
DE1621289A1 (en) 1971-05-13
NL6708168A (en) 1967-12-21
DE1621289B2 (en) 1972-08-17
CH485867A (en) 1970-02-15
BE700185A (en) 1967-12-01
GB1189344A (en) 1970-04-22

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