GB1189344A - Process and Apparatus for Depositing Refractory Metals - Google Patents
Process and Apparatus for Depositing Refractory MetalsInfo
- Publication number
- GB1189344A GB1189344A GB2705667A GB2705667A GB1189344A GB 1189344 A GB1189344 A GB 1189344A GB 2705667 A GB2705667 A GB 2705667A GB 2705667 A GB2705667 A GB 2705667A GB 1189344 A GB1189344 A GB 1189344A
- Authority
- GB
- United Kingdom
- Prior art keywords
- heated
- gas mixture
- substrate
- heater
- june
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/08—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal halides
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
1,189,344. Coating with metals. MATSUSHITA ELECTRONICS CORP. June 12, 1967 [June 20, 1966], No. 27056/67. Heading C7F. Groups IV and V transition metals Nb, Ta, V, Ti, Zr are deposited on a substrate maintained at 350‹ -700‹ C. from a gas mixture of hydrogen and a gaseous halogen compound of the metal, the gas mixture being pre-heated by a mesh or porous pre-heater plate in the evacuated reaction tube prior to contacting the substrate. The substrate may be ceramic, quartz or a metal and the gas mixture is pre-heated to 600‹ -1300‹C. As shown in Fig. 2 the gas mixture enters reaction tube 11 via 12, is pre-heated by pre-heater 8 made of porous or mesh like Mo, Ta or C the heating being induction, resistance or infrared. The preheater is located 0À3-2 cms. from the substrate 15 which is heated by induction heater 13.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4089566 | 1966-06-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1189344A true GB1189344A (en) | 1970-04-22 |
Family
ID=12593229
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB2705667A Expired GB1189344A (en) | 1966-06-20 | 1967-06-12 | Process and Apparatus for Depositing Refractory Metals |
Country Status (4)
| Country | Link |
|---|---|
| BE (1) | BE700185A (en) |
| CH (1) | CH485867A (en) |
| GB (1) | GB1189344A (en) |
| NL (1) | NL149232B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2196019A (en) * | 1986-10-07 | 1988-04-20 | Cambridge Instr Ltd | Metalorganic chemical vapour deposition |
| WO1990010092A1 (en) * | 1989-02-24 | 1990-09-07 | Massachusetts Institute Of Technology | A modified stagnation flow apparatus for chemical vapor deposition providing excellent control of the deposition |
| US4997677A (en) * | 1987-08-31 | 1991-03-05 | Massachusetts Institute Of Technology | Vapor phase reactor for making multilayer structures |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3762052D1 (en) * | 1986-03-31 | 1990-05-03 | Unisys Corp | DEPOSITION OF A VANADIN MAT FOR MAGNETIC FILMS. |
-
1967
- 1967-06-12 GB GB2705667A patent/GB1189344A/en not_active Expired
- 1967-06-13 NL NL6708168A patent/NL149232B/en unknown
- 1967-06-19 BE BE700185D patent/BE700185A/xx unknown
- 1967-06-20 CH CH874767A patent/CH485867A/en not_active IP Right Cessation
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2196019A (en) * | 1986-10-07 | 1988-04-20 | Cambridge Instr Ltd | Metalorganic chemical vapour deposition |
| US4997677A (en) * | 1987-08-31 | 1991-03-05 | Massachusetts Institute Of Technology | Vapor phase reactor for making multilayer structures |
| WO1990010092A1 (en) * | 1989-02-24 | 1990-09-07 | Massachusetts Institute Of Technology | A modified stagnation flow apparatus for chemical vapor deposition providing excellent control of the deposition |
Also Published As
| Publication number | Publication date |
|---|---|
| DE1621289A1 (en) | 1971-05-13 |
| NL6708168A (en) | 1967-12-21 |
| NL149232B (en) | 1976-04-15 |
| DE1621289B2 (en) | 1972-08-17 |
| CH485867A (en) | 1970-02-15 |
| BE700185A (en) | 1967-12-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |