MY175401A - Polishing composition and method for producing magnetic disk substrate - Google Patents
Polishing composition and method for producing magnetic disk substrateInfo
- Publication number
- MY175401A MY175401A MYPI2015000939A MYPI2015000939A MY175401A MY 175401 A MY175401 A MY 175401A MY PI2015000939 A MYPI2015000939 A MY PI2015000939A MY PI2015000939 A MYPI2015000939 A MY PI2015000939A MY 175401 A MY175401 A MY 175401A
- Authority
- MY
- Malaysia
- Prior art keywords
- polishing composition
- polishing
- magnetic disk
- disk substrate
- producing magnetic
- Prior art date
Links
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
To provide a polishing composition capable of suppressing a reduction in polishing rate due to long-time use of a polishing pad. Provided is a polishing composition used for polishing magnetic disk substrates. The polishing composition includes silica abrasives having an average minor axis length, Ds, and inorganic particles having an average particle diameter, Db, that is less than 50% of the average minor axis length, Ds. The most illustrative drawing: Figure 1
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014085019A JP6362395B2 (en) | 2014-04-16 | 2014-04-16 | Polishing composition and method for manufacturing magnetic disk substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
MY175401A true MY175401A (en) | 2020-06-24 |
Family
ID=54597499
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI2015000939A MY175401A (en) | 2014-04-16 | 2015-04-10 | Polishing composition and method for producing magnetic disk substrate |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP6362395B2 (en) |
MY (1) | MY175401A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6659449B2 (en) * | 2016-05-09 | 2020-03-04 | 山口精研工業株式会社 | Abrasive composition for electroless nickel-phosphorus plated aluminum magnetic disk substrate |
CN111318956A (en) * | 2018-12-13 | 2020-06-23 | 夏泰鑫半导体(青岛)有限公司 | Polyurethane polishing pad, method for producing same, and chemical mechanical polishing apparatus |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4346712B2 (en) * | 1998-11-20 | 2009-10-21 | スピードファム株式会社 | Wafer edge polishing method |
JP4373776B2 (en) * | 2003-02-05 | 2009-11-25 | 花王株式会社 | Polishing liquid composition |
JP2004253058A (en) * | 2003-02-20 | 2004-09-09 | Kao Corp | Polishing liquid composition |
JP2007123523A (en) * | 2005-10-27 | 2007-05-17 | Ebara Corp | Polishing method, polishing device, and electrolytic polishing device |
JP4827805B2 (en) * | 2007-08-01 | 2011-11-30 | 山口精研工業株式会社 | Precision polishing composition for hard and brittle materials |
JP5495508B2 (en) * | 2008-05-23 | 2014-05-21 | 日揮触媒化成株式会社 | Abrasive particle dispersion and method for producing the same |
JP6122783B2 (en) * | 2012-02-17 | 2017-04-26 | 株式会社フジミインコーポレーテッド | Polishing composition and method for producing semiconductor substrate |
MY186419A (en) * | 2014-03-28 | 2021-07-22 | Yamaguchi Seiken Kogyo Co Ltd | Polishing composition and method for polishing magnetic disk substrate |
-
2014
- 2014-04-16 JP JP2014085019A patent/JP6362395B2/en active Active
-
2015
- 2015-04-10 MY MYPI2015000939A patent/MY175401A/en unknown
Also Published As
Publication number | Publication date |
---|---|
JP2015204127A (en) | 2015-11-16 |
JP6362395B2 (en) | 2018-07-25 |
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