MY200070A - Polishing composition, method for producing magnetic disk substrate and method for polishing magnetic disk - Google Patents
Polishing composition, method for producing magnetic disk substrate and method for polishing magnetic diskInfo
- Publication number
- MY200070A MY200070A MYPI2018701219A MYPI2018701219A MY200070A MY 200070 A MY200070 A MY 200070A MY PI2018701219 A MYPI2018701219 A MY PI2018701219A MY PI2018701219 A MYPI2018701219 A MY PI2018701219A MY 200070 A MY200070 A MY 200070A
- Authority
- MY
- Malaysia
- Prior art keywords
- magnetic disk
- polishing
- polishing composition
- particles
- disk substrate
- Prior art date
Links
- 238000005498 polishing Methods 0.000 title abstract 4
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 title 1
- 239000002245 particle Substances 0.000 abstract 3
- 230000001186 cumulative effect Effects 0.000 abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
Provided is a polishing composition that allows effectively reducing the number of scratches present on a polished surface. The polishing composition provided herein contains: an abrasive containing silica particles; and water. The abrasive has an average aspect ratio of 1 to 1.25 for D0-5 particles of a cumulative 0% to 5% in a number-basis cumulative particle size distribution from a small diameter side, and an average aspect ratio of 1 to 1.30 for total particles.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017070453A JP6864519B2 (en) | 2017-03-31 | 2017-03-31 | Polishing composition, manufacturing method of magnetic disk substrate, and polishing method of magnetic disk |
Publications (1)
Publication Number | Publication Date |
---|---|
MY200070A true MY200070A (en) | 2023-12-06 |
Family
ID=64107459
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI2018701219A MY200070A (en) | 2017-03-31 | 2018-03-26 | Polishing composition, method for producing magnetic disk substrate and method for polishing magnetic disk |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP6864519B2 (en) |
MY (1) | MY200070A (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7041714B2 (en) * | 2019-06-26 | 2022-03-24 | 花王株式会社 | Abrasive liquid composition for silicon oxide film |
JP7319157B2 (en) * | 2019-09-30 | 2023-08-01 | 株式会社フジミインコーポレーテッド | Polishing composition |
JP7368997B2 (en) * | 2019-09-30 | 2023-10-25 | 株式会社フジミインコーポレーテッド | polishing composition |
JP7450439B2 (en) * | 2020-03-31 | 2024-03-15 | 株式会社フジミインコーポレーテッド | Polishing composition and method for producing magnetic disk substrate |
JP7396953B2 (en) * | 2020-03-31 | 2023-12-12 | 株式会社フジミインコーポレーテッド | Polishing composition, substrate manufacturing method, and polishing method |
-
2017
- 2017-03-31 JP JP2017070453A patent/JP6864519B2/en active Active
-
2018
- 2018-03-26 MY MYPI2018701219A patent/MY200070A/en unknown
Also Published As
Publication number | Publication date |
---|---|
JP2018174009A (en) | 2018-11-08 |
JP6864519B2 (en) | 2021-04-28 |
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