MXPA03000438A - Deposicion de vapor. - Google Patents
Deposicion de vapor.Info
- Publication number
- MXPA03000438A MXPA03000438A MXPA03000438A MXPA03000438A MXPA03000438A MX PA03000438 A MXPA03000438 A MX PA03000438A MX PA03000438 A MXPA03000438 A MX PA03000438A MX PA03000438 A MXPA03000438 A MX PA03000438A MX PA03000438 A MXPA03000438 A MX PA03000438A
- Authority
- MX
- Mexico
- Prior art keywords
- vapour deposition
- coating
- metals
- applying
- substrate
- Prior art date
Links
- 230000008021 deposition Effects 0.000 title abstract 2
- 239000011248 coating agent Substances 0.000 abstract 4
- 238000000576 coating method Methods 0.000 abstract 4
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 150000002739 metals Chemical class 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Thermistors And Varistors (AREA)
- Tone Control, Compression And Expansion, Limiting Amplitude (AREA)
- Magnetic Heads (AREA)
Abstract
La invencion es concerniente con un proceso para aplicar un recubrimiento a un sustrato, en donde el recubrimiento es formado de por lo menos dos componentes o elementos. En una modalidad preferida, el recubrimiento es formado de por lo menos dos metales. De acuerdo con la invencion, el recubrimiento es aplicado mediante deposicion de vapor bajo condiciones de regulacion.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP00202559A EP1174526A1 (en) | 2000-07-17 | 2000-07-17 | Continuous vapour deposition |
PCT/NL2001/000546 WO2002006558A1 (en) | 2000-07-17 | 2001-07-17 | Vapour deposition |
Publications (1)
Publication Number | Publication Date |
---|---|
MXPA03000438A true MXPA03000438A (es) | 2004-09-10 |
Family
ID=8171819
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MXPA03000438A MXPA03000438A (es) | 2000-07-17 | 2001-07-17 | Deposicion de vapor. |
Country Status (13)
Country | Link |
---|---|
US (1) | US7220450B2 (es) |
EP (2) | EP1174526A1 (es) |
JP (1) | JP5049446B2 (es) |
KR (1) | KR100819892B1 (es) |
CN (1) | CN1213162C (es) |
AT (1) | ATE450630T1 (es) |
AU (2) | AU2001275831B2 (es) |
BR (1) | BR0112552B1 (es) |
CA (1) | CA2416093C (es) |
DE (1) | DE60140673D1 (es) |
ES (1) | ES2337552T3 (es) |
MX (1) | MXPA03000438A (es) |
WO (1) | WO2002006558A1 (es) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU2388846C2 (ru) * | 2005-05-31 | 2010-05-10 | Корус Текнолоджи Бв | Устройство и способ для нанесения покрытия на подложку |
EP1972699A1 (fr) * | 2007-03-20 | 2008-09-24 | ArcelorMittal France | Procede de revetement d'un substrat et installation de depot sous vide d'alliage metallique |
EP2048261A1 (fr) * | 2007-10-12 | 2009-04-15 | ArcelorMittal France | Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique |
EP2199425A1 (fr) * | 2008-12-18 | 2010-06-23 | ArcelorMittal France | Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique (II) |
US20110177622A1 (en) * | 2009-12-28 | 2011-07-21 | Global Solar Energy, Inc. | Apparatus and methods of mixing and depositing thin film photovoltaic compositions |
WO2012081738A1 (en) * | 2010-12-13 | 2012-06-21 | Posco | Continuous coating apparatus |
KR101439694B1 (ko) | 2012-12-26 | 2014-09-12 | 주식회사 포스코 | Zn-Mg 합금도금강판 및 그의 제조방법 |
UA117592C2 (uk) * | 2013-08-01 | 2018-08-27 | Арселорміттал | Пофарбований оцинкований сталевий лист та спосіб його виготовлення |
UA116262C2 (uk) | 2013-08-01 | 2018-02-26 | Арселорміттал | Сталевий лист з цинковим покриттям |
US10131983B2 (en) * | 2013-11-05 | 2018-11-20 | Tata Steel Nederland Technology B.V. | Method and apparatus for controlling the composition of liquid metal in an evaporator device |
TWI523962B (zh) * | 2014-10-03 | 2016-03-01 | Nat Inst Chung Shan Science & Technology | Method and apparatus for stabilizing vapor deposition uniformity film |
TWI582251B (zh) * | 2014-10-31 | 2017-05-11 | 財團法人工業技術研究院 | 蒸鍍系統以及蒸鍍方法 |
ES2663507T3 (es) * | 2015-07-13 | 2018-04-13 | Hec High End Coating Gmbh | Procedimiento para la fabricación de sustratos recubiertos |
EP3228727A3 (de) | 2016-03-30 | 2018-01-24 | HEC High End Coating GmbH | Verfahren zur herstellung beschichteter substrate, beschichtete substrate und deren verwendung |
KR102098455B1 (ko) | 2017-12-26 | 2020-04-07 | 주식회사 포스코 | 연속 증착 장치 및 연속 증착 방법 |
WO2019239186A1 (en) | 2018-06-13 | 2019-12-19 | Arcelormittal | Vacuum deposition facility and method for coating a substrate |
WO2019239184A1 (en) * | 2018-06-13 | 2019-12-19 | Arcelormittal | Vacuum deposition facility and method for coating a substrate |
JP2019060022A (ja) * | 2018-11-09 | 2019-04-18 | アルセロルミタル・インベステイガシオン・イ・デサロジヨ・エセ・エレ | 亜鉛コーティングを備えた鋼板 |
JP2019060021A (ja) * | 2018-11-09 | 2019-04-18 | アルセロルミタル・インベステイガシオン・イ・デサロジヨ・エセ・エレ | 亜鉛コーティングを備えた塗装鋼板 |
CN112553578B (zh) * | 2019-09-26 | 2022-01-14 | 宝山钢铁股份有限公司 | 一种具有抑流式喷嘴的真空镀膜装置 |
CN113432775B (zh) * | 2020-03-23 | 2023-04-18 | 核工业理化工程研究院 | 一种标定设备内部气体滞止压力与悬臂梁部件温度关系曲线的方法 |
WO2023062410A1 (en) * | 2021-10-14 | 2023-04-20 | Arcelormittal | Vapour nozzle for pvd |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53110973A (en) * | 1977-03-10 | 1978-09-28 | Futaba Denshi Kogyo Kk | Method and apparatus for manufacturing compounds |
JPS59208006A (ja) * | 1983-05-10 | 1984-11-26 | Toyota Motor Corp | 合金微粉末の製造方法 |
EP0173715B1 (en) * | 1984-02-13 | 1992-04-22 | SCHMITT, Jerome J. III | Method and apparatus for the gas jet deposition of conducting and dielectric thin solid films and products produced thereby |
CA1235808A (en) * | 1984-03-22 | 1988-04-26 | Tetsuo Oka | Vertical magnetic recording medium and process for preparation thereof |
JPS60251273A (ja) * | 1984-05-28 | 1985-12-11 | Mitsubishi Heavy Ind Ltd | 真空蒸発装置の蒸発量制御方法 |
JPH02125866A (ja) * | 1988-11-04 | 1990-05-14 | Kobe Steel Ltd | 合金蒸着めっき装置 |
US5104634A (en) * | 1989-04-20 | 1992-04-14 | Hercules Incorporated | Process for forming diamond coating using a silent discharge plasma jet process |
US5256205A (en) * | 1990-05-09 | 1993-10-26 | Jet Process Corporation | Microwave plasma assisted supersonic gas jet deposition of thin film materials |
US5919310A (en) * | 1991-10-07 | 1999-07-06 | Canon Kabushiki Kaisha | Continuously film-forming apparatus provided with improved gas gate means |
EP0667921B1 (en) * | 1992-11-13 | 2000-01-26 | Energy Conversion Devices, Inc. | Microwave apparatus for depositing thin films |
JPH08269696A (ja) * | 1995-03-28 | 1996-10-15 | Nisshin Steel Co Ltd | Mgの蒸発方法 |
JPH0953173A (ja) * | 1995-08-18 | 1997-02-25 | Nisshin Steel Co Ltd | 蒸発材料の安定供給方法 |
US5728224A (en) * | 1995-09-13 | 1998-03-17 | Tetra Laval Holdings & Finance S.A. | Apparatus and method for manufacturing a packaging material using gaseous phase atmospheric photo chemical vapor deposition to apply a barrier layer to a moving web substrate |
JPH09143682A (ja) * | 1995-11-22 | 1997-06-03 | Nisshin Steel Co Ltd | 多重ダクトを用いたZn−Mg蒸着法及び蒸着めっき設備 |
BE1010351A6 (fr) * | 1996-06-13 | 1998-06-02 | Centre Rech Metallurgique | Procede et dispositif pour revetir en continu un substrat en mouvement au moyen d'une vapeur metallique. |
US5874131A (en) * | 1996-10-02 | 1999-02-23 | Micron Technology, Inc. | CVD method for forming metal-containing films |
BE1010720A3 (fr) * | 1996-10-30 | 1998-12-01 | Centre Rech Metallurgique | Procede et dispositif pour revetir en continu un substrat en mouvement au moyen d'un alliage metallique en phase vapeur. |
US6062256A (en) * | 1997-02-11 | 2000-05-16 | Engineering Measurements Company | Micro mass flow control apparatus and method |
US6165554A (en) * | 1997-11-12 | 2000-12-26 | Jet Process Corporation | Method for hydrogen atom assisted jet vapor deposition for parylene N and other polymeric thin films |
US6309508B1 (en) * | 1998-01-15 | 2001-10-30 | 3M Innovative Properties Company | Spinning disk evaporator |
US6190732B1 (en) * | 1998-09-03 | 2001-02-20 | Cvc Products, Inc. | Method and system for dispensing process gas for fabricating a device on a substrate |
US6804285B2 (en) * | 1998-10-29 | 2004-10-12 | Canon Kabushiki Kaisha | Gas supply path structure for a gas laser |
CN1260599A (zh) * | 1998-12-22 | 2000-07-19 | 佳能株式会社 | 处理衬底的设备和方法 |
US6409837B1 (en) * | 1999-01-13 | 2002-06-25 | Tokyo Electron Limited | Processing system and method for chemical vapor deposition of a metal layer using a liquid precursor |
-
2000
- 2000-07-17 EP EP00202559A patent/EP1174526A1/en not_active Withdrawn
-
2001
- 2001-07-17 JP JP2002512445A patent/JP5049446B2/ja not_active Expired - Fee Related
- 2001-07-17 WO PCT/NL2001/000546 patent/WO2002006558A1/en active IP Right Grant
- 2001-07-17 CA CA002416093A patent/CA2416093C/en not_active Expired - Lifetime
- 2001-07-17 BR BRPI0112552-4B1A patent/BR0112552B1/pt not_active IP Right Cessation
- 2001-07-17 ES ES01953374T patent/ES2337552T3/es not_active Expired - Lifetime
- 2001-07-17 DE DE60140673T patent/DE60140673D1/de not_active Expired - Lifetime
- 2001-07-17 AU AU2001275831A patent/AU2001275831B2/en not_active Ceased
- 2001-07-17 AT AT01953374T patent/ATE450630T1/de active
- 2001-07-17 EP EP01953374A patent/EP1301649B1/en not_active Expired - Lifetime
- 2001-07-17 US US10/333,039 patent/US7220450B2/en not_active Expired - Lifetime
- 2001-07-17 MX MXPA03000438A patent/MXPA03000438A/es active IP Right Grant
- 2001-07-17 CN CNB018157629A patent/CN1213162C/zh not_active Expired - Fee Related
- 2001-07-17 KR KR1020037000767A patent/KR100819892B1/ko not_active Expired - Lifetime
- 2001-07-17 AU AU7583101A patent/AU7583101A/xx active Pending
Also Published As
Publication number | Publication date |
---|---|
CA2416093C (en) | 2009-06-30 |
KR20030032999A (ko) | 2003-04-26 |
BR0112552B1 (pt) | 2013-07-16 |
AU7583101A (en) | 2002-01-30 |
KR100819892B1 (ko) | 2008-04-07 |
CN1458985A (zh) | 2003-11-26 |
ATE450630T1 (de) | 2009-12-15 |
AU2001275831B2 (en) | 2006-09-07 |
ES2337552T3 (es) | 2010-04-27 |
EP1301649A1 (en) | 2003-04-16 |
WO2002006558A1 (en) | 2002-01-24 |
JP5049446B2 (ja) | 2012-10-17 |
BR0112552A (pt) | 2003-06-24 |
DE60140673D1 (de) | 2010-01-14 |
CA2416093A1 (en) | 2002-01-24 |
EP1301649B1 (en) | 2009-12-02 |
JP2004504487A (ja) | 2004-02-12 |
US20040022942A1 (en) | 2004-02-05 |
CN1213162C (zh) | 2005-08-03 |
EP1174526A1 (en) | 2002-01-23 |
US7220450B2 (en) | 2007-05-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG | Grant or registration |