[go: up one dir, main page]

MX2015015989A - Método y dispositivo de limpieza con película protectora de carbono. - Google Patents

Método y dispositivo de limpieza con película protectora de carbono.

Info

Publication number
MX2015015989A
MX2015015989A MX2015015989A MX2015015989A MX2015015989A MX 2015015989 A MX2015015989 A MX 2015015989A MX 2015015989 A MX2015015989 A MX 2015015989A MX 2015015989 A MX2015015989 A MX 2015015989A MX 2015015989 A MX2015015989 A MX 2015015989A
Authority
MX
Mexico
Prior art keywords
workpiece
carbon
coating
interior
cleaning method
Prior art date
Application number
MX2015015989A
Other languages
English (en)
Inventor
Kobayashi Koji
FUNATSU Junya
Original Assignee
Honda Motor Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Honda Motor Co Ltd filed Critical Honda Motor Co Ltd
Publication of MX2015015989A publication Critical patent/MX2015015989A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)

Abstract

La presente invención proporciona un método para la limpieza de la película protectora de carbono, que puede limpiar la película protectora de carbono que se forma sobre cada porción de un dispositivo de plasma CVD y proporciona el dispositivo de plasma CVD. El dispositivo 1 de plasma CVD incluye: primer y segundo miembros de sellado, 2ª y 2b que se forman de los aislantes y que sellan ambos extremos de una pieza de trabajo W o una pieza de trabajo ficticia W´, respectivamente; un ánodo 3; unidades de descompresión 26 que descomprimen la parte interna de la pieza de trabajo W o la pieza de trabajo ficticia W´; una unidad de abastecimiento de la fuente de gas 6, que abastece una fuente de gas en el interior de la pieza de trabajo W; una fuente de energía 27; y una unidad de suministro de gas oxígeno-8 que provee gas oxígeno en el interior de la pieza de trabajo ficticia W´.
MX2015015989A 2013-05-31 2014-05-30 Método y dispositivo de limpieza con película protectora de carbono. MX2015015989A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013116035 2013-05-31
PCT/JP2014/064467 WO2014192929A1 (ja) 2013-05-31 2014-05-30 炭素被膜クリーニング方法及び装置

Publications (1)

Publication Number Publication Date
MX2015015989A true MX2015015989A (es) 2017-01-11

Family

ID=51988947

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2015015989A MX2015015989A (es) 2013-05-31 2014-05-30 Método y dispositivo de limpieza con película protectora de carbono.

Country Status (7)

Country Link
US (2) US10273581B2 (es)
JP (2) JP6030759B2 (es)
CN (1) CN105229197B (es)
BR (1) BR112015024628B1 (es)
CA (1) CA2903184C (es)
MX (1) MX2015015989A (es)
WO (2) WO2014192928A1 (es)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112531180B (zh) * 2019-09-17 2024-05-31 全球能源互联网研究院有限公司 一种去除平板式电池阳极积炭的方法

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6087025A (en) * 1994-03-29 2000-07-11 Southwest Research Institute Application of diamond-like carbon coatings to cutting surfaces of metal cutting tools
JPH0931626A (ja) * 1995-07-25 1997-02-04 Mitsubishi Electric Corp 金型加工装置
JP3119172B2 (ja) * 1995-09-13 2000-12-18 日新電機株式会社 プラズマｃｖｄ法及び装置
JPH09195036A (ja) * 1996-01-22 1997-07-29 Ulvac Japan Ltd 蒸着装置、及び薄膜製造方法
JPH10110269A (ja) 1996-10-07 1998-04-28 Nissin Electric Co Ltd パチンコ玉およびその製造方法
JP3555844B2 (ja) 1999-04-09 2004-08-18 三宅 正二郎 摺動部材およびその製造方法
JP2001003169A (ja) 1999-06-18 2001-01-09 Sanyo Electric Co Ltd 炭素系被膜の処理方法及び炭素系被膜並びに炭素系被膜を有する部品
US6440864B1 (en) * 2000-06-30 2002-08-27 Applied Materials Inc. Substrate cleaning process
JP4413084B2 (ja) * 2003-07-30 2010-02-10 シャープ株式会社 プラズマプロセス装置及びそのクリーニング方法
JP4973971B2 (ja) 2003-08-08 2012-07-11 日産自動車株式会社 摺動部材
FR2865420B1 (fr) * 2004-01-28 2007-09-14 Saint Gobain Procede de nettoyage d'un substrat
US7300684B2 (en) * 2004-07-15 2007-11-27 Sub-One Technology, Inc. Method and system for coating internal surfaces of prefabricated process piping in the field
US7608151B2 (en) * 2005-03-07 2009-10-27 Sub-One Technology, Inc. Method and system for coating sections of internal surfaces
JP4717591B2 (ja) * 2005-10-28 2011-07-06 スタンレー電気株式会社 プラズマ成膜装置
US7838793B2 (en) * 2006-07-21 2010-11-23 Sub-One Technology, Inc. System and method for treating surfaces of components
US8105660B2 (en) 2007-06-28 2012-01-31 Andrew W Tudhope Method for producing diamond-like carbon coatings using PECVD and diamondoid precursors on internal surfaces of a hollow component
GB2458507A (en) * 2008-03-20 2009-09-23 Tecvac Ltd Oxidation of non ferrous metal components
US8343593B2 (en) 2008-05-13 2013-01-01 Sub-One Technology, Inc. Method of coating inner and outer surfaces of pipes for thermal solar and other applications
US8715789B2 (en) * 2009-12-18 2014-05-06 Sub-One Technology, Inc. Chemical vapor deposition for an interior of a hollow article with high aspect ratio
JP2011162857A (ja) * 2010-02-10 2011-08-25 Nagoya Univ コーティング前処理方法、ダイヤモンド被膜のコーティング方法、および脱膜処理方法
US8753725B2 (en) * 2011-03-11 2014-06-17 Southwest Research Institute Method for plasma immersion ion processing and depositing coatings in hollow substrates using a heated center electrode
JP5816500B2 (ja) * 2011-09-15 2015-11-18 スタンレー電気株式会社 プラズマガンおよびそれを用いた成膜装置
US9121540B2 (en) * 2012-11-21 2015-09-01 Southwest Research Institute Superhydrophobic compositions and coating process for the internal surface of tubular structures

Also Published As

Publication number Publication date
JP5982570B2 (ja) 2016-08-31
US10273581B2 (en) 2019-04-30
CN105229197A (zh) 2016-01-06
US20160281237A1 (en) 2016-09-29
CA2903184C (en) 2017-03-14
JP6030759B2 (ja) 2016-11-24
CA2903184A1 (en) 2014-12-04
JPWO2014192929A1 (ja) 2017-02-23
CN105229197B (zh) 2017-05-24
US20160281217A1 (en) 2016-09-29
BR112015024628A2 (pt) 2017-07-18
WO2014192928A1 (ja) 2014-12-04
JPWO2014192928A1 (ja) 2017-02-23
WO2014192929A1 (ja) 2014-12-04
US9994957B2 (en) 2018-06-12
BR112015024628B1 (pt) 2021-10-26

Similar Documents

Publication Publication Date Title
MX2016009503A (es) Plasma no termico.
WO2014110446A3 (en) Method and system for graphene formation
MY183557A (en) Plasma cvd device and plasma cvd method
SG10201402882PA (en) Chamber wall of a plasma processing apparatus including a flowing protective liquid layer
MX2018001259A (es) Aparato y método de diseño de energía eléctrica para soplete de plasma cc.
WO2012059726A3 (en) Apparatus for generating hydroxyl radicals
SG10202109750RA (en) Pulsed power supply for sustainable redox agent supply for hydrogen abatement during electrochemical hypochlorite generation
SG10201805181UA (en) Purified hydrogen peroxide gas generation methods and devices
WO2015110784A3 (en) Plasma device
NZ727760A (en) Methods and apparatus for ionization
MX2015014659A (es) Proceso y aparato para endurecer termoquimicamente piezas a trabajar.
NZ728967A (en) Patient interface and method for making same
MX340630B (es) Dispositivo de limpieza para camara montada en vehiculo y metodo de limpieza de camara montada en vehiculo.
WO2007115309A3 (en) Apparatus and method for treating a workpiece with ionizing gas plasma
MX2013007734A (es) Sistema tipo soldadura para calcular un costo de una operacion de soldadura, con calculador de costos.
WO2009104918A3 (en) Apparatus and method for processing substrate
MX2018011433A (es) Sistemas de suministro y metodos para sintesis en plasma electrico de oxido nitrico.
IL255214A0 (en) The use of sgc stimulators, sgc activators, alone and combinations with pde5 inhibitors for the treatment of digital ulcers accompanying systemic sclerosis
EP3247820A4 (en) Solar powered systems and methods for generating hydrogen gas and oxygen gas from water
IN2015DN01149A (es)
EP4226999A3 (en) Plasma reactor for liquid and gas and related methods
WO2012087919A3 (en) Methods and apparatus for gas delivery into plasma processing chambers
MX2015015989A (es) Método y dispositivo de limpieza con película protectora de carbono.
WO2009104919A3 (en) Apparatus and method for processing substrate
TW201612944A (en) Plasma processing apparatus

Legal Events

Date Code Title Description
FG Grant or registration