MX165044B - Metodo de desprendimiento fotolitografico - Google Patents
Metodo de desprendimiento fotolitograficoInfo
- Publication number
- MX165044B MX165044B MX1248A MX124886A MX165044B MX 165044 B MX165044 B MX 165044B MX 1248 A MX1248 A MX 1248A MX 124886 A MX124886 A MX 124886A MX 165044 B MX165044 B MX 165044B
- Authority
- MX
- Mexico
- Prior art keywords
- photolithographic
- detachment method
- detachment
- photolithographic detachment
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F5/00—Screening processes; Screens therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/691,829 US4623611A (en) | 1985-01-16 | 1985-01-16 | Photolithographic stripping method for removing contrast enhancement layer |
Publications (1)
Publication Number | Publication Date |
---|---|
MX165044B true MX165044B (es) | 1992-10-20 |
Family
ID=24778149
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX1248A MX165044B (es) | 1985-01-16 | 1986-01-16 | Metodo de desprendimiento fotolitografico |
Country Status (7)
Country | Link |
---|---|
US (1) | US4623611A (es) |
EP (1) | EP0188230B1 (es) |
JP (1) | JPS61198237A (es) |
KR (1) | KR940001554B1 (es) |
DE (1) | DE3676715D1 (es) |
IE (1) | IE56848B1 (es) |
MX (1) | MX165044B (es) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3689949T2 (de) * | 1985-12-09 | 1995-03-16 | Nippon Paint Co Ltd | Druckmaterial auf der Basis eines lichtempfindlichen Harzes. |
US4714670A (en) * | 1986-06-09 | 1987-12-22 | Imperial Metal & Chemical Company | Developer including an aliphatic cyclic carbonate in the oil phase emulsion |
KR920001450B1 (ko) * | 1986-12-23 | 1992-02-14 | 쉬플리 캄파니 인코포레이티드 | 감광성 내식막의 제조방법, 감광성 내식막 조성물 및 이의 제조방법 |
US5196295A (en) * | 1987-07-31 | 1993-03-23 | Microsi, Inc. | Spin castable mixtures useful for making deep-UV contrast enhancement layers |
JPH0727222B2 (ja) * | 1987-10-28 | 1995-03-29 | 日本合成ゴム株式会社 | ホトレジスト用剥離液 |
DE3836404A1 (de) * | 1988-10-26 | 1990-05-03 | Hoechst Ag | Entwicklungsloesemittel fuer durch photopolymerisation vernetzbare schichten sowie verfahren zur herstellung von reliefformen |
JPH0683596U (ja) * | 1993-04-30 | 1994-11-29 | 立仁 馮 | スノーケル |
DE69704298T2 (de) * | 1996-05-31 | 2001-09-27 | Atofina, Puteaux | Abbeizmittelzusammensetzung auf Basis von einem polaren, aprotischen Lösungsmittel, einem Ether und Wasser |
FR2749315B1 (fr) * | 1996-05-31 | 1998-08-14 | Atochem Elf Sa | Composition decapante a base d'eau et d'anisole |
US7897296B2 (en) | 2004-09-30 | 2011-03-01 | General Electric Company | Method for holographic storage |
US20060078802A1 (en) * | 2004-10-13 | 2006-04-13 | Chan Kwok P | Holographic storage medium |
JP6109896B2 (ja) * | 2015-09-03 | 2017-04-05 | 日新製鋼株式会社 | 金属板からレジスト膜を除去する方法およびエッチングされた金属板の製造方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3725069A (en) * | 1971-09-13 | 1973-04-03 | Scott Paper Co | Diazo lithographic composition and article |
GB1588417A (en) * | 1977-03-15 | 1981-04-23 | Agfa Gevaert | Photoresist materials |
US4395348A (en) * | 1981-11-23 | 1983-07-26 | Ekc Technology, Inc. | Photoresist stripping composition and method |
IE56082B1 (en) * | 1982-11-01 | 1991-04-10 | Microsi Inc | Photobleachable compositions |
US4578344A (en) * | 1984-12-20 | 1986-03-25 | General Electric Company | Photolithographic method using a two-layer photoresist and photobleachable film |
-
1985
- 1985-01-16 US US06/691,829 patent/US4623611A/en not_active Expired - Lifetime
- 1985-07-22 IE IE1836/85A patent/IE56848B1/en not_active IP Right Cessation
-
1986
- 1986-01-09 DE DE8686100219T patent/DE3676715D1/de not_active Expired - Fee Related
- 1986-01-09 EP EP86100219A patent/EP0188230B1/en not_active Expired - Lifetime
- 1986-01-15 KR KR1019860000193A patent/KR940001554B1/ko not_active IP Right Cessation
- 1986-01-16 MX MX1248A patent/MX165044B/es unknown
- 1986-01-16 JP JP61005144A patent/JPS61198237A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPH0524497B2 (es) | 1993-04-08 |
DE3676715D1 (de) | 1991-02-14 |
KR860006051A (ko) | 1986-08-16 |
EP0188230B1 (en) | 1991-01-09 |
IE851836L (en) | 1986-07-16 |
EP0188230A2 (en) | 1986-07-23 |
JPS61198237A (ja) | 1986-09-02 |
EP0188230A3 (en) | 1987-01-07 |
US4623611A (en) | 1986-11-18 |
KR940001554B1 (ko) | 1994-02-24 |
IE56848B1 (en) | 1992-01-01 |
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