KR970028809A - Phase reversal mask used in the manufacture of semiconductor devices - Google Patents
Phase reversal mask used in the manufacture of semiconductor devices Download PDFInfo
- Publication number
- KR970028809A KR970028809A KR1019950042628A KR19950042628A KR970028809A KR 970028809 A KR970028809 A KR 970028809A KR 1019950042628 A KR1019950042628 A KR 1019950042628A KR 19950042628 A KR19950042628 A KR 19950042628A KR 970028809 A KR970028809 A KR 970028809A
- Authority
- KR
- South Korea
- Prior art keywords
- pattern layer
- light shielding
- shielding pattern
- mask
- manufacture
- Prior art date
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- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
차광패턴층의 일부에 위상쉬프터를 갖는 위상반전마스크에 관하여 개시한다. 본 발명은 마스크 기판상에 차광패턴층이 형성된 위상반전마스크에 있어서, 상기 차광패턴층의 일부에 위상쉬프터가 형성되어 있는 것을 특징으로 하는 위상반전마스크를 제공한다. 상기 차광패턴층은 라인/스페이스 패턴 또는 섬(island) 패턴으로 구성할 수 있다. 본 발명은 차광패턴층의 일부 또는 차광패턴층의 하부의 기판을 식각하여 위상시프터를 구성함으로써, 브릿지 없는 패턴을 얻을 수 있다.A phase inversion mask having a phase shifter in a part of a light shielding pattern layer is disclosed. The present invention provides a phase inversion mask in which a light shielding pattern layer is formed on a mask substrate, wherein a phase shifter is formed in a part of the light shielding pattern layer. The light blocking pattern layer may be configured as a line / space pattern or an island pattern. According to the present invention, a pattern without a bridge can be obtained by etching a part of the light shielding pattern layer or a substrate under the light shielding pattern layer to form a phase shifter.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제1도는 본 발명에 의한 위상반전마스크를 도시한 평면도이다.1 is a plan view showing a phase inversion mask according to the present invention.
Claims (3)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019950042628A KR970028809A (en) | 1995-11-21 | 1995-11-21 | Phase reversal mask used in the manufacture of semiconductor devices |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019950042628A KR970028809A (en) | 1995-11-21 | 1995-11-21 | Phase reversal mask used in the manufacture of semiconductor devices |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR970028809A true KR970028809A (en) | 1997-06-24 |
Family
ID=66588599
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019950042628A KR970028809A (en) | 1995-11-21 | 1995-11-21 | Phase reversal mask used in the manufacture of semiconductor devices |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR970028809A (en) |
-
1995
- 1995-11-21 KR KR1019950042628A patent/KR970028809A/en not_active Application Discontinuation
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 19951121 |
|
| PG1501 | Laying open of application | ||
| PC1203 | Withdrawal of no request for examination | ||
| WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |