KR960039113A - How to form an alignment mark - Google Patents
How to form an alignment mark Download PDFInfo
- Publication number
- KR960039113A KR960039113A KR1019950009550A KR19950009550A KR960039113A KR 960039113 A KR960039113 A KR 960039113A KR 1019950009550 A KR1019950009550 A KR 1019950009550A KR 19950009550 A KR19950009550 A KR 19950009550A KR 960039113 A KR960039113 A KR 960039113A
- Authority
- KR
- South Korea
- Prior art keywords
- alignment mark
- forming
- groove
- mask
- box
- Prior art date
Links
- 238000000034 method Methods 0.000 claims abstract description 9
- 239000004065 semiconductor Substances 0.000 claims abstract 4
- 239000000758 substrate Substances 0.000 claims abstract 3
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract 2
- 238000005530 etching Methods 0.000 abstract 2
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
본 발명은 정렬마크 형성방법에 관한 것으로, 반도체기판 상부에 제1정렬마크마스크를 이용한 식각공정으로 일정깊이 홈을 형성하고 전체표면상부에 초기산화막을 일정두께 형성한 다음, 제2정렬마크마스크를 이용한 식각공정으로 상기 홈의 저부에 감광막패턴을 형성함으로써 박스인 박스 형태의 정렬마스크를 형성하여 반도체소자의 신뢰성 및 수율을 향상시킬 수 있는 기술이다.The present invention relates to a method of forming an alignment mark, wherein a groove having a predetermined depth is formed in an etching process using a first alignment mark mask on an upper surface of a semiconductor substrate, and an initial oxide film is formed on the entire surface, and then a second alignment mark mask is formed. By forming a photoresist pattern on the bottom of the groove by the etching process, a box-type alignment mask is formed to improve reliability and yield of the semiconductor device.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제2A도 내지 제2E도는 본 발명의 실시예에 따른 정렬마크 형성방법을 도시한 관계도.2A to 2E are relationship diagrams showing a method for forming an alignment mark according to an embodiment of the present invention.
Claims (4)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019950009550A KR960039113A (en) | 1995-04-22 | 1995-04-22 | How to form an alignment mark |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019950009550A KR960039113A (en) | 1995-04-22 | 1995-04-22 | How to form an alignment mark |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR960039113A true KR960039113A (en) | 1996-11-21 |
Family
ID=66523542
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019950009550A KR960039113A (en) | 1995-04-22 | 1995-04-22 | How to form an alignment mark |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR960039113A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100395908B1 (en) * | 2001-06-29 | 2003-08-27 | 주식회사 하이닉스반도체 | Method for manufacturing an alignment key of semiconductor device |
| KR100815763B1 (en) * | 2006-10-13 | 2008-03-20 | 삼성에스디아이 주식회사 | Mask frame and mask frame and mask alignment method using the same |
-
1995
- 1995-04-22 KR KR1019950009550A patent/KR960039113A/en not_active Application Discontinuation
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100395908B1 (en) * | 2001-06-29 | 2003-08-27 | 주식회사 하이닉스반도체 | Method for manufacturing an alignment key of semiconductor device |
| KR100815763B1 (en) * | 2006-10-13 | 2008-03-20 | 삼성에스디아이 주식회사 | Mask frame and mask frame and mask alignment method using the same |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 19950422 |
|
| PG1501 | Laying open of application | ||
| PC1203 | Withdrawal of no request for examination | ||
| WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |