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KR970025296A - 외부자장이 가해지는 평면형 고주파 유도결합 플라즈마 처리장치 - Google Patents

외부자장이 가해지는 평면형 고주파 유도결합 플라즈마 처리장치 Download PDF

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Publication number
KR970025296A
KR970025296A KR1019950035711A KR19950035711A KR970025296A KR 970025296 A KR970025296 A KR 970025296A KR 1019950035711 A KR1019950035711 A KR 1019950035711A KR 19950035711 A KR19950035711 A KR 19950035711A KR 970025296 A KR970025296 A KR 970025296A
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South Korea
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antenna
magnetic field
high frequency
chamber
deposition
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KR0178847B1 (ko
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황기웅
이호준
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황기웅
이호준
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Priority to KR1019950035711A priority Critical patent/KR0178847B1/ko
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Publication of KR0178847B1 publication Critical patent/KR0178847B1/ko
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)

Abstract

본 발명은 유도기전력이 처리용 챔버내로 깊숙이 침투하지 못함에 따라 균일한 대면적의 플라즈마를 고밀도로 발생시킬 수 없는 플라즈마 처리장치의 결점을 해소하기 위한 것으로서, 나선형으로 수회 감겨진 평면형 안테나(11), 안테나(11)에 전력을 인가하는 전력공급원(12), 낮은 압력의 처리(식각 또는 증착)용 챔버(13), 안테나(11)와 처리용 챔버(13)를 격리시키되 안테나(11)의 유도기전력은 통과시키는 석영창(14), 식각 또는 증착을 위한 전극(15), 안테나(11)의 임피던스 정합회로(16), 전극(15)에 바이어스를 인가하기 위한 라디오 주파수 전력공급원(17), 그 안테나(11)에 대한 라디오 주파수 차폐막(18), 그리고 안테나(11)의 평면과 수직을 이루는 외부자장 발생용의 2쌍의 전자석(19)을 포함하는 본 발명의 외부자장이 가해지는 평면형 고주파 유도결합 플라즈마 처리장치를 제공한다.

Description

외부자장이 가해지는 평면형 고주파 유도결합 플라즈마 처리장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 실시예의 평면형 고주파 유도결합 플라즈마 처리장치의 개략적인 구성을 보여주는 도면.

Claims (2)

  1. 나선형으로 수회 감겨진 평면형 안테나(11), 상기 안테나(l1)에 전력을 인가하는 전력공급원(12), 낮은 압력의 처리(시각 또는 증착)용 챔버(13), 상기 안테나(11)와 처리용 챔버(13)를 격리시키되 상기 안테나(11)의 유도기전력은 통과시키는 석영창(14), 상기 처리용 챔버(13)내에서의 식각 또는 증착을 위한 전극(15), 상기 안테나(11)의 임피던스 정합회로(16), 상기 전극(15)에 바이어스를 인가하기 위한 라디오 주파수 전력공급원(17), 상기 안테나(1])의 평면과 수직을 이루는 의부자장발생용의 적어도 2쌍의 전자석(19)을 포함하는 것을 특징으로 하는, 외부자장이 가해지는 평면형 고주파 유도결합 플라즈마 발생장치.
  2. 제1항에 있어서, 상기 전자석(19)이 자장의 방향이 상기 처리용 챔버(13)의 벽과 평행을 이루는 것을 특징으로 하는, 외부자장이 가해지는 평면형 고주파 유도결합 플라즈마 발생장치.
KR1019950035711A 1995-10-13 1995-10-13 외부자장이 가해지는 평면형 고주파 유도결합 플라즈마 처리장치 Expired - Lifetime KR0178847B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950035711A KR0178847B1 (ko) 1995-10-13 1995-10-13 외부자장이 가해지는 평면형 고주파 유도결합 플라즈마 처리장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950035711A KR0178847B1 (ko) 1995-10-13 1995-10-13 외부자장이 가해지는 평면형 고주파 유도결합 플라즈마 처리장치

Publications (2)

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KR970025296A true KR970025296A (ko) 1997-05-30
KR0178847B1 KR0178847B1 (ko) 1999-05-15

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KR1019950035711A Expired - Lifetime KR0178847B1 (ko) 1995-10-13 1995-10-13 외부자장이 가해지는 평면형 고주파 유도결합 플라즈마 처리장치

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100318690B1 (ko) * 1999-03-19 2001-12-28 염근영 자장강화된 유도결합형 플라즈마장치

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101629214B1 (ko) 2013-11-29 2016-06-13 서울대학교산학협력단 자장 제어를 통한 플라즈마 쉐이핑이 가능한 플라즈마 처리 장치

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100318690B1 (ko) * 1999-03-19 2001-12-28 염근영 자장강화된 유도결합형 플라즈마장치

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