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KR970018763A - 자기저항 소자 및 센서 - Google Patents

자기저항 소자 및 센서 Download PDF

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Publication number
KR970018763A
KR970018763A KR1019960039944A KR19960039944A KR970018763A KR 970018763 A KR970018763 A KR 970018763A KR 1019960039944 A KR1019960039944 A KR 1019960039944A KR 19960039944 A KR19960039944 A KR 19960039944A KR 970018763 A KR970018763 A KR 970018763A
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South Korea
Prior art keywords
layer
ferromagnetic
cobalt
magnetoresistive element
nickel
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KR1019960039944A
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English (en)
Inventor
카즈히꼬 하야시
쥬니찌 후지카타
히데후미 야마모또
구니히코 이시하라
마사후미 나카다
Original Assignee
가네꼬 히사시
닛폰 덴키 주식회사
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Publication of KR970018763A publication Critical patent/KR970018763A/ko

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00—Galvanomagnetic devices
    • H10N50/10—Magnetoresistive devices
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/09—Magnetoresistive devices
    • G01R33/093—Magnetoresistive devices using multilayer structures, e.g. giant magnetoresistance sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00—Galvanomagnetic devices
    • H10N50/80—Constructional details
    • H10N50/85—Materials of the active region
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B2005/3996—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects large or giant magnetoresistive effects [GMR], e.g. as generated in spin-valve [SV] devices
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109—Details
    • G11B5/3116—Shaping of layers, poles or gaps for improving the form of the electrical signal transduced, e.g. for shielding, contour effect, equalizing, side flux fringing, cross talk reduction between heads or between heads and information tracks
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • G11B5/3906—Details related to the use of magnetic thin film layers or to their effects
    • G11B5/3929—Disposition of magnetic thin films not used for directly coupling magnetic flux from the track to the MR film or for shielding
    • G11B5/3932—Magnetic biasing films

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Hall/Mr Elements (AREA)
  • Measuring Magnetic Variables (AREA)
  • Magnetic Heads (AREA)
  • Thin Magnetic Films (AREA)

Abstract

본 발명의 자기저항 소자는 반강자성 층, 제1 강자성 층, 비자기 층 및, 제2 강자성 층을 연속적으로 포함한다. 비자기 층 대신에, 상기 자기저항 소자는 Co층과, 비자기 층 및, Co층의 결합을 포함할 수 있다. 상기 반강자성 층은 니켈 산화물, 니켈 산화물과 코발트 산화물의 혼합물, 또는 니켈 산화물과 코발트 산화물의 적층부로 제조된다. 상기 강자성 층은 1 내지 10㎚ 두께를 가지고, 상기 소자는 0.1 내지 1um의 높이를 가진다. 상기 비자성층은 2 내지 3㎚의 두께를 가지며, 상기 반강자성 층은 5 내지 30㎚의 두께를 가진다. 상기 자기저항 소자는 적절한 교차점을 가지고, 우수한 재생신호를 출력하며, 출력신호에 대하여 바람직한 반쪽폭을 가진다.

Description

자기저항 소자 및 센서
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
도 3은 본 발명에 사용되는 통상적인 자기저항 소자의 단면도.

Claims (14)

  1. 반강자성 층과, 제1 강자성 층과, 비자기 층 및, 연성 자기재료의 제2 강자성 층을 연속적으로 포함하고, 상기 반강자성 층은 5 내지 30㎚의 두께를 가지고 니켈 산화물, 니켈 산화물과 코발트 산화물의 혼합물 및, 니켈 산화물막과 코발트 산화물막을 포함하는 적층부중의 하나로 제조되며, 상기 제1 및 제2 강자성 층은 1 내지 10㎚의 두께를 가지는 것을 특징으로 하는 자기저항 소자.
  2. 제1항에 있어서, 상기 제1 및 제2 강자성 층은 0.45 내지 0.55의 교차점을 제공하는 것을 특징으로 하는 자기저항 소자.
  3. 제1항에 있어서, 상기 자기저항 소자는 0.1 내지 1㎜의 소자높이를 가지는 것을 특징으로 하는 자기저항 소자.
  4. 제1항에 있어서, 상기 제1 강자성 층과 비자기 층사이의 제1 코발트 층과, 상기 비자기 층과 제2 강자성 층사이의 제2 코발트 층을 부가로 포함하는 것을 특징으로 하는 자기저항 소자.
  5. 제1항에 있어서, 상기 반강자성 층에서 니켈과 코발트의 전체 원자에 대한 니켈 원자의 비는 0.25이상인 것을 특징으로 하는 자기저항 소자.
  6. 제1항에 있어서, 상기 제1 및 제2 강자성 층중 하나 이상의 층은 주 구성품으로써, NiFe, NiFeCo, NiCo 및 Co 중 하나를 포함하는 것을 특징으로 하는 자기저항 소자.
  7. 제1항에 있어서, 상기 비자기 층은 주 구성품으로써 Cu와, Cu에 부가된 Ag 및, Cu에 부가된 Re를 포함하는 것을 특징으로 하는 자기저항 소자.
  8. 기판과; 상기 기판위에 연속적으로 형성되고 패턴을 가지는 저부 실드층과 저부 갭층과; 강자성 소자에 바이어스 자기장을 제공하기 위하여 강자성 소자의 모서리위에 형성된 종방향 바이어스 층과 강자성 소자를 포함하며 저부 갭층위에 형성된 활성층 및; 상기 활성층위에 연속적으로 형성된 상부 갭층과 상부 실드층을 포함하며, 반강자성 층과, 제1 강자성 층과, 비자기 층 및, 연성 자기재료의 제2 강자성 층을 연속적으로 포함하고, 상기 반강자성층은 5 내지 30㎚의 두께를 가지고 니켈 산화물, 니켈 산화물과 코발트 산화물의 혼합물 및, 니켈 산화물막과 코발트 산화물막을 포함하는 적층부중의 하나로 제조되며, 상기 제1 및 제2 강자성 층은 1 내지 10㎚의 두께를 가지는 것을 특징으로 하는 자기저항 센서.
  9. 제8항에 있어서, 상기 제1 및 제2 강자성 층은 0.45 내지 0.55의 교차점을 제공하는 것을 특징으로 하는 자기저항 센서.
  10. 제8항에 있어서, 상기 자기저항 소자는 0.1 내지 1㎜의 소자높이를 가지는 것을 특징으로 하는 자기저항 센서.
  11. 제8항에 있어서, 상기 제1 강자성 층과 비자성층 사이의 제1 코발트 층과, 상기 비자기 층과 제2 강자성 층사이의 제2코발트 층을 부가로 포함하는 것을 특징으로 하는 자기저항 센서.
  12. 제8항에 있어서, 상기 반강자성 층에서 니켈과 코발트의 전체 원자에 대한 니켈 원자의 비는 0.25 이상인 것을 특징으로 하는 자기저항 센서.
  13. 제8항에 있어서, 상기 제1 및 제2 강자성 층중 하나 이상의 층은 주로 구성품으로써, NiFe, NiFeCo, NiCo 및 Co 중 하나를 포함하는 것을 특징으로 하는 자기저항 센서.
  14. 제8항에 있어서, 상기 비자성층은 주 구성품으로써 Cu, Cu에 부가된 Ag 및, Cu에 부가된 Re를 포함하는 것을 특징으로 하는 자기저항 센서.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019960039944A 1995-09-14 1996-09-14 자기저항 소자 및 센서 KR970018763A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP7236470A JPH0983039A (ja) 1995-09-14 1995-09-14 磁気抵抗効果素子
JP95-236470 1995-09-14

Publications (1)

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KR970018763A true KR970018763A (ko) 1997-04-30

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US (1) US5889640A (ko)
JP (1) JPH0983039A (ko)
KR (1) KR970018763A (ko)
CN (1) CN1088917C (ko)

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Publication number Priority date Publication date Assignee Title
KR20010030439A (ko) * 1999-09-22 2001-04-16 아끼구사 나오유끼 자기 센서, 자기 헤드 및 자기 디스크 장치

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