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KR970001253A - 액상 메틸틴 할라이드 조성물 - Google Patents

액상 메틸틴 할라이드 조성물 Download PDF

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Publication number
KR970001253A
KR970001253A KR1019960019460A KR19960019460A KR970001253A KR 970001253 A KR970001253 A KR 970001253A KR 1019960019460 A KR1019960019460 A KR 1019960019460A KR 19960019460 A KR19960019460 A KR 19960019460A KR 970001253 A KR970001253 A KR 970001253A
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KR
South Korea
Prior art keywords
trichloride
composition
alkyltin
liquid
methyltin halide
Prior art date
Application number
KR1019960019460A
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English (en)
Other versions
KR100407420B1 (ko
Inventor
알버트 라킨 윌리암
Original Assignee
월터 에이취. 슈마처
엘프 아토켐 노스 아메리카, 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 월터 에이취. 슈마처, 엘프 아토켐 노스 아메리카, 인코포레이티드 filed Critical 월터 에이취. 슈마처
Publication of KR970001253A publication Critical patent/KR970001253A/ko
Application granted granted Critical
Publication of KR100407420B1 publication Critical patent/KR100407420B1/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/22—Tin compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/22—Tin compounds
    • C07F7/2208—Compounds having tin linked only to carbon, hydrogen and/or halogen
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Surface Treatment Of Glass (AREA)
  • Paints Or Removers (AREA)

Abstract

본 발명은 액상 메틸틴 할라이드 조성물 및 화학 합성에 중간 물질과 기질상에 틴 옥사이드 피막을 형성시키기 위한 전구 물질로서의 이들의 용도에 관한 것이다.

Description

액상 메틸틴 할라이드 조성물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (9)

  1. 필수적으로 모노메틸틴 트리클로라이드, 디메틸틴 디클로라이드 및 이의 혼합물로 이루어진 그룹 중에서 선택된 메틸틴 할라이드 및 25℃에서 액상인 알킬틴 트리클로라이드로 이루어진, 24℃에서 액체인 조성물.
  2. 제1항에 있어서, 알킬틴 트리클로라이드가 모노부틸틴 트리클로라이드, 모노옥틸틴 트리클로라이드 및 이의 혼합물로 이루어진 그룹 중에서 선택된 조성물.
  3. 제1항에 있어서, 알킬틴 트리클로라이드가 모노부틸틴 트리클로라이드인 조성물.
  4. 제1항에 있어서, 메틸틴 할라이드가 모노메틸틴 트리클로라이드인 조성물.
  5. 제1항에 있어서, 메틸틴 할라이드가 모노메틸틴 트리클로라이드이고 알킬틴 트리할라이드가 모노부틸틴 트리클로라이드인 조성물.
  6. 기질상에 틴 옥사이드 피막을 열분해 침착시키기 위한 방법에 있어서, 공정 중에 제1항에서 청구한 바와 같은 조성물을 사용함을 특징으로 하는 방법.
  7. 제6항에 있어서, 침착된 피막이 감소된 적외선 반사율을 제공하는 성분을 함유하는 방법.
  8. 제6항의 방법으로 제조된 생성물.
  9. 제7항의 방법으로 제조된 생성물.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019960019460A 1995-06-02 1996-06-01 액상메틸주석할라이드조성물 KR100407420B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/459,958 1995-06-02
US08/459,958 US5725904A (en) 1995-06-02 1995-06-02 Liquid methyltin halide compositions

Publications (2)

Publication Number Publication Date
KR970001253A true KR970001253A (ko) 1997-01-21
KR100407420B1 KR100407420B1 (ko) 2004-04-09

Family

ID=23826851

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960019460A KR100407420B1 (ko) 1995-06-02 1996-06-01 액상메틸주석할라이드조성물

Country Status (19)

Country Link
US (2) US5725904A (ko)
EP (1) EP0745605B1 (ko)
JP (1) JPH08333376A (ko)
KR (1) KR100407420B1 (ko)
CN (1) CN1096504C (ko)
AR (1) AR002179A1 (ko)
AT (1) ATE238314T1 (ko)
AU (1) AU701688B2 (ko)
BR (1) BR9602525A (ko)
CA (1) CA2175953A1 (ko)
CO (1) CO4560462A1 (ko)
CZ (1) CZ292143B6 (ko)
DE (1) DE69627573T2 (ko)
DK (1) DK0745605T3 (ko)
ES (1) ES2191725T3 (ko)
IN (1) IN187865B (ko)
PT (1) PT745605E (ko)
TW (1) TW408160B (ko)
ZA (1) ZA964410B (ko)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5725904A (en) * 1995-06-02 1998-03-10 Elf Atochem North America, Inc. Liquid methyltin halide compositions
US6503561B1 (en) * 1999-07-08 2003-01-07 Air Products And Chemicals, Inc. Liquid precursor mixtures for deposition of multicomponent metal containing materials
US6238734B1 (en) * 1999-07-08 2001-05-29 Air Products And Chemicals, Inc. Liquid precursor mixtures for deposition of multicomponent metal containing materials
US20070194470A1 (en) * 2006-02-17 2007-08-23 Aviza Technology, Inc. Direct liquid injector device
US20080152804A1 (en) * 2006-07-28 2008-06-26 Gulbrandsen Chemicals, Inc. Method for depositing a metal-containing coating on a substrate
US20080026147A1 (en) * 2006-07-28 2008-01-31 Gulbrandsen Chemicals, Inc. Method and formulation for depositing a metal-containing coating on a substrate
US7947374B2 (en) * 2009-02-19 2011-05-24 Guardian Industries Corp. Coated article with sputter-deposited transparent conductive coating capable of surviving harsh environments, and method of making the same
US20100209730A1 (en) * 2009-02-19 2010-08-19 Guardian Industries Corp., Coated article with sputter-deposited transparent conductive coating for refrigeration/freezer units, and method of making the same
US8097342B2 (en) 2009-02-19 2012-01-17 Guardian Industries Corp. Coated article with sputter-deposited transparent conductive coating capable of surviving harsh environments, and method of making the same
US8062706B2 (en) * 2009-03-31 2011-11-22 Ppg Industries Ohio, Inc. Recovery of monobutyltin trichloride

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GB1520124A (en) * 1974-09-18 1978-08-02 M & T Chemicals Inc Process for applying stannic oxide coatings to glass
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US5725904A (en) * 1995-06-02 1998-03-10 Elf Atochem North America, Inc. Liquid methyltin halide compositions

Also Published As

Publication number Publication date
ES2191725T3 (es) 2003-09-16
PT745605E (pt) 2003-09-30
CZ292143B6 (cs) 2003-08-13
BR9602525A (pt) 1998-10-27
EP0745605B1 (en) 2003-04-23
US5725904A (en) 1998-03-10
AU701688B2 (en) 1999-02-04
US5853799A (en) 1998-12-29
JPH08333376A (ja) 1996-12-17
AU5221196A (en) 1996-12-12
DE69627573D1 (de) 2003-05-28
DK0745605T3 (da) 2003-08-18
TW408160B (en) 2000-10-11
CN1096504C (zh) 2002-12-18
AR002179A1 (es) 1998-01-07
ATE238314T1 (de) 2003-05-15
CA2175953A1 (en) 1996-12-03
CO4560462A1 (es) 1998-02-10
CN1147024A (zh) 1997-04-09
EP0745605A3 (en) 1999-03-17
KR100407420B1 (ko) 2004-04-09
EP0745605A2 (en) 1996-12-04
ZA964410B (en) 1997-07-31
CZ161096A3 (en) 1996-12-11
IN187865B (ko) 2002-07-13
DE69627573T2 (de) 2003-11-27

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