[go: up one dir, main page]

KR940005943A - 투명판표면의 결함수정방법 - Google Patents

투명판표면의 결함수정방법 Download PDF

Info

Publication number
KR940005943A
KR940005943A KR1019930009035A KR930009035A KR940005943A KR 940005943 A KR940005943 A KR 940005943A KR 1019930009035 A KR1019930009035 A KR 1019930009035A KR 930009035 A KR930009035 A KR 930009035A KR 940005943 A KR940005943 A KR 940005943A
Authority
KR
South Korea
Prior art keywords
laser beam
defect
excimer laser
transparent plate
arf excimer
Prior art date
Application number
KR1019930009035A
Other languages
English (en)
Other versions
KR970005523B1 (ko
Inventor
오사무 미야자끼
가즈야 요시무라
순지 나까이
Original Assignee
쯔지 하루오
샤프 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP4173339A external-priority patent/JP2786377B2/ja
Priority claimed from JP4233948A external-priority patent/JP2804203B2/ja
Priority claimed from JP5011191A external-priority patent/JPH06130341A/ja
Application filed by 쯔지 하루오, 샤프 가부시끼가이샤 filed Critical 쯔지 하루오
Publication of KR940005943A publication Critical patent/KR940005943A/ko
Application granted granted Critical
Publication of KR970005523B1 publication Critical patent/KR970005523B1/ko

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B29/00—Reheating glass products for softening or fusing their surfaces; Fire-polishing; Fusing of margins
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/04—Automatically aligning, aiming or focusing the laser beam, e.g. using the back-scattered light
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/16—Surface shaping of articles, e.g. embossing; Apparatus therefor by wave energy or particle radiation, e.g. infrared heating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/30—Organic material
    • B23K2103/42—Plastics
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0838—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using laser
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2995/00—Properties of moulding materials, reinforcements, fillers, preformed parts or moulds
    • B29K2995/0018—Properties of moulding materials, reinforcements, fillers, preformed parts or moulds having particular optical properties, e.g. fluorescent or phosphorescent
    • B29K2995/0026—Transparent
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Laser Beam Processing (AREA)
  • Liquid Crystal (AREA)

Abstract

본 바명은 유리 등외 투명재료로 이루어진 판의 광투과성을 해치지 않고 이 판의 표떤에 발깅된 결함부분을 수정하는 결함수정방법에 관한 것으로, 륵히 액정표시장치등의 표시장치의 표시면의 미세한 오목한 결함부분을 수정하는 걸항수정방법에 관한 것이다. 결함부분의 형상에 대웅하는 형상의 개구를 갖는 마스크를 이용해 렌즈를 통해 엑시머 레이저빔을 조사하거나, 결함부분의 빔의 크기를 복수치로 변화시키면서 빔을 조사한다. 마스크로는 결함부분보다 큰 개구률 갖는 조리개 마스크를 이용할 수 있다. 빔의 크기는 각각 다른 크기의 개구를 갖는 복수의 마스크률 서로 교환하여서 변화된다. 또는, 엑시머 레이저빔의 중앙부의 에너지가 높과 주변부의 에너지가 낮도록 빔을 조사한다. 그렇지 않으면, 결함부분의 다른 부분들에 ArF 엑시머 레이저 빔 이 조사됨과 동시에 레이저빔의 발사 회수를 변화시키기 위해 레이저빔의 크기를 결함부분보다 작게하고 결함부론 갖는 투명판을 이동시킨다.

Description

투명판표면의 결함수정방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 ArF 엑시머 레이저빔을 조사하여 얻어진 부분의 단면도;
제2도는 KrF 엑시머 레이저빔을 조사하여 얻어진 부분의 단면도;
제3도는 투명판표면에 ArF 엑시머 레이저빔을 조사하는 것을 보여주는 개략도;
제4도는 본 발명에 따른 결함수정방법에 의해 얻어진 부분의 단면도;
제5도는 ArF 엑시머 레이저빔을 조사하여 얻어진 부분의 단면도.

Claims (17)

  1. 투명판 표면의 결함부분에 ArF 엑시머 레이저빔을 조사하여 상기 투명판 표면을 평활화 하는 투명판표면의 결함수정방법.
  2. 제1항에 있어서, 결함부분의 형상에 대응하는 형상의 개구를 갖는 마스크를 이용해 상기 ArF 엑시머 레이저 빔을 조사하는 투명판표면의 결함수정방법.
  3. 제1항에 있어서 상기 ArF 엑시머 레이저빔을 렌즈를 통해 조사하는 투명판 표면의 결함수정방법.
  4. 제1항에 있어서 상기 결함부분에서의 상기 ArF 엑시머 레이저빔의 크기를 복수치로 변화시키면서 레이저빔을 조사하는 투명판표면의 결함수전방법.
  5. 제4항에 있어서, 서로 다른 크기의 개구를 갖는 복수의 마스크들을 교환하여서 상기 빔의 크기를 변화시키는 투명판표면의 결함수정방법.
  6. 제4항에 있어서, 크기가 서로 다른 복수의 개구를 갖는 하나의 마스크를 이용하여 상기 빔의 르기를 탄화시키는 투명판표면의 결함수절방법.
  7. 제1항에 있어서, 결함부분의 중앙부에서는 에너지가 늪고 외주부에서는 에너지가 낮도록 상기 ArF 엑시머 렌이저빔을 조사하는 투명판표면의 결함수정방법.
  8. 제1항에 있어서 상기 ArF 엑시머 레이저빔의 크기가 상기 결함부분의 크기 보다 작으며, 상기 ArF 엑시머 레이저빔으로 상기 결함부분의 다른 부분들을 순차적으로 조사하도록 상기 결함부분을 갖는 투명판을 이동시킴과 동시에 상기 ArF 엑시머 레이저빔의 발사 회수를 변화시키는 투명판표면의 결함수정방법.
  9. 제8항에 있어서 상기 결글부븐의 깊이와 길이중 적어도 하나에 따라 상기 빔의 발사 회수를 변화시키는 투명판표면의 결함수정방법.
  10. 제8항에 있어서, 상기 결함부분을 갖는 투명판은 상기 결함부분의 중앙부가 상기 ArF 엑시머 레이저빔에 노출되었을 때는 턴턴히 이동되고 상기 결함부분의 외주부가 상기 레이저빔에 노출되었을 때는 신속히 이퐁되는 상기 결함부문 그 외주부가 살기 레이저빌에 노출되었을 때는 신속히 이동되는 투명판표면의 결함수정방법.
  11. 제3항에 있어서, 상기 ArF 엑시머 레이저빔에 의해 결함부분의 다른 부분들이 연속적으로 조사되도록 상기 레이저빔의 초점도률 변화시키고 결함부분을 갖는 투명관을 이동시키는 투명갈표면의 결함수정방법.
  12. 제11항에 있린서 상기 초점도의 변화와 상기 결함부분을 갖는 투명관의 이동이 ArF 엑시머 레이저빔의 조사에 평행한 방향과 교차하는 방향으로 투명관이 장착된 스떼 이 지 를 이동시 켜 서 실행되는 투명관좌면의 결함수정방법.
  13. 제1항에 있어서, 상기 결함부분보다 큰 개구를 갖는 조리개 마스크를 이용하여 ArF 엑시머 레이저빔을 조사하는 투명판표면의 결함수정방법.
  14. 제13항에 있어서, ArF 엑시머 레이저빔을 조사하는 동안 상기 조리개 마스크의 개구의 직경이 순차적으로 변화하는 투명판표면의 결함수정방법.
  15. 제1항에 있어서, 상기 투명관표면을 겉함부분만을 제외하고 마스크된 상태에서 ArF 엑시머 레이저빔을 조사하는 투명관표면의 결함수정방법.
  16. 제1항에 있어서, 상기 투명판이 유리로 형성되는 투명관표면의 결함수정방법.
  17. 제1항에 있어서, 상기 투명관이 표시장치의 표시면인 투명판표면의 결함수정방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019930009035A 1992-06-30 1993-05-22 투명판 표면의 결함 수정 방법 KR970005523B1 (ko)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
JP4173339A JP2786377B2 (ja) 1992-06-30 1992-06-30 透明板表面の欠陥修正方法
JP92-173339 1992-06-30
JP4233948A JP2804203B2 (ja) 1992-09-01 1992-09-01 液晶表示装置の欠陥修正方法
JP92-233948 1992-09-01
JP92-233950 1992-09-01
JP23395092 1992-09-01
JP5011191A JPH06130341A (ja) 1992-09-01 1993-01-26 表示装置の欠陥修正方法
JP93-11191 1993-01-26

Publications (2)

Publication Number Publication Date
KR940005943A true KR940005943A (ko) 1994-03-22
KR970005523B1 KR970005523B1 (ko) 1997-04-17

Family

ID=27455557

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019930009035A KR970005523B1 (ko) 1992-06-30 1993-05-22 투명판 표면의 결함 수정 방법

Country Status (4)

Country Link
US (1) US5514850A (ko)
EP (1) EP0577260B1 (ko)
KR (1) KR970005523B1 (ko)
DE (1) DE69312814T2 (ko)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1996033839A1 (en) * 1995-04-26 1996-10-31 Minnesota Mining And Manufacturing Company Method and apparatus for step and repeat exposures
US5742026A (en) * 1995-06-26 1998-04-21 Corning Incorporated Processes for polishing glass and glass-ceramic surfaces using excimer laser radiation
US6197209B1 (en) 1995-10-27 2001-03-06 Lg. Philips Lcd Co., Ltd. Method of fabricating a substrate
JPH10166460A (ja) * 1996-12-06 1998-06-23 Toyota Motor Corp 積層造形方法及び積層造形装置
CA2227672A1 (en) * 1997-01-29 1998-07-29 Toyota Jidosha Kabushiki Kaisha Method for producing a laminated object and apparatus for producing the same
KR100265556B1 (ko) 1997-03-21 2000-11-01 구본준 식각장치
KR100234896B1 (ko) * 1997-07-29 1999-12-15 구본준 액정표시장치의 기판 평탄화 방법
US6327011B2 (en) * 1997-10-20 2001-12-04 Lg Electronics, Inc. Liquid crystal display device having thin glass substrate on which protective layer formed and method of making the same
JP3019053B2 (ja) * 1997-12-25 2000-03-13 日本電気株式会社 液晶表示装置及びその製造方法
JP2000235351A (ja) * 1998-12-18 2000-08-29 Hitachi Ltd 画像表示装置及びその修正方法並びに修正装置
JP3736791B2 (ja) * 2000-08-31 2006-01-18 シャープ株式会社 レーザ加工方法
US20050196746A1 (en) * 2001-03-24 2005-09-08 Jia Xu High-density ion transport measurement biochip devices and methods
CA2441366A1 (en) * 2001-03-24 2002-10-03 Aviva Biosciences Corporation Biochips including ion transport detecting structures and methods of use
US20060029955A1 (en) * 2001-03-24 2006-02-09 Antonio Guia High-density ion transport measurement biochip devices and methods
CN1554085A (zh) * 2001-08-10 2004-12-08 Tdk株式会社 光记录介质及其制造方法
DE10206082B4 (de) * 2002-02-13 2004-12-09 Ce-Sys Gmbh Ilmenau Glas mit gehärteter Oberflächenschicht und Verfahren zu seiner Herstellung
EP1870388B1 (en) * 2005-04-15 2010-09-08 Asahi Glass Company Ltd. Method for reducing diameter of bubble existing inside of glass plate
KR101156443B1 (ko) * 2010-04-23 2012-06-18 삼성모바일디스플레이주식회사 액정 디스플레이 장치와, 이의 제조 방법
CN108569851A (zh) * 2017-03-14 2018-09-25 鸿富锦精密工业（深圳）有限公司 玻璃切割方法

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4338114A (en) * 1980-08-21 1982-07-06 Liberty Glass Company Laser treatment method for imparting increased mechanical strength to glass objects
US4444801A (en) * 1981-01-14 1984-04-24 Hitachi, Ltd. Method and apparatus for correcting transparent defects on a photomask
US4729372A (en) * 1983-11-17 1988-03-08 Lri L.P. Apparatus for performing ophthalmic laser surgery
US4478677A (en) * 1983-12-22 1984-10-23 International Business Machines Corporation Laser induced dry etching of vias in glass with non-contact masking
JPS60196942A (ja) * 1984-03-21 1985-10-05 Hitachi Ltd フオトマスク欠陥修正方法
AU606315B2 (en) * 1985-09-12 1991-02-07 Summit Technology, Inc. Surface erosion using lasers
JPS6384789A (ja) * 1986-09-26 1988-04-15 Semiconductor Energy Lab Co Ltd 光加工方法
US4911711A (en) * 1986-12-05 1990-03-27 Taunton Technologies, Inc. Sculpture apparatus for correcting curvature of the cornea
CA1325832C (en) * 1988-06-09 1994-01-04 Paul R. Yoder, Jr. Methods and apparatus for laser sculpture of the cornea
US5017755A (en) * 1988-10-26 1991-05-21 Kabushiki Kaisha Toshiba Method of repairing liquid crystal display and apparatus using the method
US4980534A (en) * 1988-11-18 1990-12-25 Toyoda Koki Kabushiki Kaisha Method and device for treating machined surface of workpiece
US4871415A (en) * 1988-12-30 1989-10-03 Zenith Electronics Corporation Apparatus and method for curing a defect in a grille formed on a panel of a color cathode ray tube
KR100190423B1 (ko) * 1989-06-06 1999-06-01 기타지마 요시도시 에멀젼마스크 등의결함 수정방법 및 장치
JPH0321928A (ja) * 1989-06-19 1991-01-30 Nec Corp アクティブ液晶パネルの製造方法
JP2789720B2 (ja) * 1989-10-12 1998-08-20 三菱電機株式会社 接合基板の分離方法及び液晶表示装置の分離方法
US5091626A (en) * 1990-02-02 1992-02-25 Hadassah Medical Organization Method for the ablative reshaping of material surfaces
JPH0421823A (ja) * 1990-05-16 1992-01-24 Hosiden Corp 液晶表示素子の点欠陥の黒欠陥化法及び液晶表示素子
US5280374A (en) * 1991-03-01 1994-01-18 Sharp Kabushiki Kaisha Liquid crystal display device and method of compensating for a defect
US5175504A (en) * 1991-06-17 1992-12-29 Photon Dynamics, Inc. Method and apparatus for automatically inspecting and repairing a simple matrix circuit panel
JP2592369B2 (ja) * 1991-08-22 1997-03-19 富士通株式会社 多層配線回路基板の製造方法及び誘電体ミラーマスクの製造方法
JPH06110069A (ja) * 1992-09-29 1994-04-22 Matsushita Electric Ind Co Ltd 電子部品の欠陥修復方法および欠陥修復装置

Also Published As

Publication number Publication date
EP0577260B1 (en) 1997-08-06
US5514850A (en) 1996-05-07
DE69312814D1 (de) 1997-09-11
EP0577260A2 (en) 1994-01-05
KR970005523B1 (ko) 1997-04-17
DE69312814T2 (de) 1998-02-26
EP0577260A3 (ko) 1994-02-16

Similar Documents

Publication Publication Date Title
KR940005943A (ko) 투명판표면의 결함수정방법
DE2263856C3 (de) Verfahren und Vorrichtung zum Korrigieren defekter Fotomasken
DE69113715T2 (de) Optisches Projektionssystem.
US6664501B1 (en) Method for creating laser-induced color images within three-dimensional transparent media
DE1547305A1 (de) Lichtprojektionsvorrichtung
KR950033687A (ko) 투영노광장치
WO2005008333A2 (en) Method for correcting critical dimension variations in photomasks
EP0597000A1 (en) METHOD FOR PROFILING SURFACES OF CONTACT LENSES.
JPH04270082A (ja) マーキングシステム
KR20000034917A (ko) Ｖｕｖ-마이크로리소그래피용 조광 장치
JP2003194540A5 (ko)
KR20070008409A (ko) 투과형 스크린의 제조방법, 그 제조장치 및 투과형 스크린
KR950024025A (ko) 투사 노출 장치 및 디바이스 제조방법
KR20110120872A (ko) 레이저 노광 장치
JPH03133119A (ja) 半導体ウェハー用写真製版装置および方法
US20090026388A1 (en) Illumination Homogenizer
US6733931B2 (en) Symmetrical mask system and method for laser irradiation
DE2419567C3 (de) Einrichtung zur gleichmäßigen Beleuchtung einer Projektionsvorlage
KR950015638A (ko) 개량된 해상도 특성을 갖는 스텝 앤드 리피트 노출 시스템
KR0128816B1 (ko) 액정표시장치 및 액정표시장치의 결함수정방법
WO2005015310A3 (en) Illumination system for a microlithographic projection exposure apparatus
JPH06250110A (ja) レーザー処理方法、レーザー処理装置、光照射方法、及び光照射装置
JP2599508B2 (ja) 不透明化処理方法およびその装置
KR0143814B1 (ko) 반도체 노광 장치
JPS5669634A (en) Exposure method of photomask and its device

Legal Events

Date Code Title Description
A201 Request for examination
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 19930522

PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 19930522

Comment text: Request for Examination of Application

PG1501 Laying open of application
E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 19961126

Patent event code: PE09021S01D

G160 Decision to publish patent application
PG1605 Publication of application before grant of patent

Comment text: Decision on Publication of Application

Patent event code: PG16051S01I

Patent event date: 19970319

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 19970708

GRNT Written decision to grant
PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 19970922

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 19970922

End annual number: 3

Start annual number: 1

PR1001 Payment of annual fee

Payment date: 20000411

Start annual number: 4

End annual number: 4

PR1001 Payment of annual fee

Payment date: 20010912

Start annual number: 5

End annual number: 5

PR1001 Payment of annual fee

Payment date: 20020905

Start annual number: 6

End annual number: 6

PR1001 Payment of annual fee

Payment date: 20030915

Start annual number: 7

End annual number: 7

PR1001 Payment of annual fee

Payment date: 20040910

Start annual number: 8

End annual number: 8

PR1001 Payment of annual fee

Payment date: 20050909

Start annual number: 9

End annual number: 9

PR1001 Payment of annual fee

Payment date: 20060908

Start annual number: 10

End annual number: 10

PR1001 Payment of annual fee

Payment date: 20070906

Start annual number: 11

End annual number: 11

PR1001 Payment of annual fee

Payment date: 20080911

Start annual number: 12

End annual number: 12

PR1001 Payment of annual fee

Payment date: 20090910

Start annual number: 13

End annual number: 13

PR1001 Payment of annual fee

Payment date: 20100910

Start annual number: 14

End annual number: 14

FPAY Annual fee payment

Payment date: 20110811

Year of fee payment: 15

PR1001 Payment of annual fee

Payment date: 20110811

Start annual number: 15

End annual number: 15

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee