KR930008341B1 - 원반형의 기판을 진공실에서 내외측으로 내부 이동과 외부 이동을 위한 장치 - Google Patents
원반형의 기판을 진공실에서 내외측으로 내부 이동과 외부 이동을 위한 장치 Download PDFInfo
- Publication number
- KR930008341B1 KR930008341B1 KR1019900003650A KR900003650A KR930008341B1 KR 930008341 B1 KR930008341 B1 KR 930008341B1 KR 1019900003650 A KR1019900003650 A KR 1019900003650A KR 900003650 A KR900003650 A KR 900003650A KR 930008341 B1 KR930008341 B1 KR 930008341B1
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- rotating plate
- plate
- support
- vacuum chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67751—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber vertical transfer of a single workpiece
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
- C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
Claims (11)
- 원반형으로 형성된 컨베이어 수단인 회전판(16)에, 관상으로 형성된 인상장치(27)와 공작물인 원반형의 기판(9)을 유지하기 위한 기판지지구(22)의 지지판(25)들을 둘러싸는 가장자리(17)가 형성되어 있고 한개이상의 개구부(20)가 제공되어 있는 것을 특징으로 하는, 공작물인 원반형의 기판을 운반하기 위한 컨베이어 수단인 회전판(16)이 진공실(14)내에 위치하여 있으며, 진공실(14)내에서 공작물인 원반형의 기판(9)을 내외측으로 이송하기 위한 장치.
- 제 1 항에 있어서, 지지판에는 진공실의 부분들과 반대방향으로 미는 기판지지구(22)가 제공되어 있는 것을 특징으로 하는 장치.
- 제 1 항 또는 제 2 항에 있어서, 지지판은 인상장치(27)에 의하여 굴대의 방향으로 이동될 수 있는 지지판(25)과 같이 형성됨을 특징으로 하는 장치.
- 제 1 항 또는 제 2 항에 있어서, 기판지지구(22)는 특히 박막형의 원반같이 얇게 형성되어 있는 것을 특징으로 하는 장치.
- 제 2 항에 있어서, 기판지지구는 중심수단으로, 특히 원반형의 기판(9)용 돌출부(35)를 구비하여 있는 것을 특징으로 하는 장치.
- 제 1 항에 있어서, 운반장치로서 회전판(16)은 기판지지구(22)용 프레임 형태의 용기형으로 구성하여 있음을 특징으로 하는 장치.
- 제 1 항 또는 제 6 항에 있어서, 운반장치로서 회전판(16)은 기판지지구(22)를 정치(定置)하기 위한 회전판(16)의 내주면부에 특히 한개 이상의 어깨부(21)가 형성되어 있는 원반형의 기판(9)용 용기의 개구부(20)가 한개이상 개설되어 있는 것을 특징으로 하는 장치.
- 제 7 항에 있어서, 용기의 개구부(20)는 터언테이블과 같은 회전판(16)내에 적용된 오목부가 축 방향으로 관통되게 구성된 것을 특징으로 하는 장치.
- 제 1 항 또는 제 8 항에 있어서, 용기의 개구부(20)은 운반장치로서 회전판(16)에 의하여 지지판(25)의 범위 내에서 움직일 수 있도록 배치되고 형성되고 있는 것을 특징으로 하는 장치.
- 제 6 항에 있어서, 운반장치인 회전판(16)은 한개의 판으로 이루어졌으며, 그 판은 진공실(14)(회전판) 내에서 회전할 수 있도록 배치되어 있고, 회전판(16)에는 원형의 용기 개구부(20)들이 제공되어 있고, 그것은 원형의 지지판(25)과 같이 형성된 지지판에 관하여 동축(同軸)의 위치로 이르게 할 수 있고, 그 회전판의 회전으로 거기에 이르게 된 것을 특징으로 하는 장치.
- 제 1 항에 있어서, 유지 장치는 특히, 원반형의 기판(9)용 기판지지구(22)와 같이 형성되어 있으며, 그 회전판(16)내에서 코우팅 시스템 특히, 스퍼터링 음극이 있는 진공실(14)내부에 한개 이상의 코우팅소오스 부분으로 원반형의 기판(9)과 같이 기판지지구(22)를 이동함을 특징으로 하는 장치.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3910244 | 1989-03-30 | ||
DEP3910244.0 | 1989-03-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR900014627A KR900014627A (ko) | 1990-10-24 |
KR930008341B1 true KR930008341B1 (ko) | 1993-08-30 |
Family
ID=6377438
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019900003650A Expired - Fee Related KR930008341B1 (ko) | 1989-03-30 | 1990-03-19 | 원반형의 기판을 진공실에서 내외측으로 내부 이동과 외부 이동을 위한 장치 |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0389820B1 (ko) |
JP (1) | JPH07113151B2 (ko) |
KR (1) | KR930008341B1 (ko) |
DE (1) | DE59001747D1 (ko) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0448782B1 (de) * | 1990-03-26 | 1993-06-16 | Leybold Aktiengesellschaft | Vorrichtung zum Ein- und Ausschleusen eines Werkstücks in eine Vakuumkammer |
DE4117969C2 (de) * | 1991-05-31 | 2000-11-09 | Balzers Ag Liechtenstein | Vakuumkammer |
DE4203473A1 (de) * | 1992-02-07 | 1993-08-12 | Leybold Ag | Drehschleuse zum ein- und/oder ausbringen eines substrats aus der einen in eine benachbarte behandlungskammer |
EP0591706B1 (de) * | 1992-10-06 | 2002-04-24 | Unaxis Balzers Aktiengesellschaft | Kammer für den Transport von Werkstücken |
DE4235676C2 (de) * | 1992-10-22 | 1997-08-28 | Balzers Hochvakuum | Vakuumkammer zum Transport scheibenförmiger Werkstücke in einer Vakuumanlage |
DE4235674C2 (de) * | 1992-10-22 | 2000-12-28 | Balzers Ag Liechtenstein | Kammer für den Transport von Werkstücken in Vakuumatmosphäre, Kammerkombination und Verfahren zum Transportieren eines Werkstückes |
DE4302794A1 (de) * | 1993-02-02 | 1994-08-04 | Leybold Ag | Vorrichtung zum Ein- und/oder Ausschleusen einer Maske in die bzw. aus der Kammer einer Vakuum-Beschichtungsanlage |
DE9307263U1 (de) * | 1993-05-13 | 1993-07-22 | Balzers und Leybold Deutschland Holding AG, 63450 Hanau | Vorrichtung zum Greifen und Halten eines flachen Substrats |
DE9309935U1 (de) * | 1993-07-03 | 1993-09-02 | Leybold Ag, 63450 Hanau | Vorrichtung zum Halten und Transportieren von Substraten |
DE19614596C1 (de) * | 1996-04-13 | 1997-05-22 | Singulus Technologies Gmbh | Vorrichtung zum Transport von Substraten |
US6264804B1 (en) | 2000-04-12 | 2001-07-24 | Ske Technology Corp. | System and method for handling and masking a substrate in a sputter deposition system |
DE10146838A1 (de) | 2001-09-24 | 2003-04-10 | Ptr Praez Stechnik Gmbh | Werkstückzufuhrvorrichtung für eine Elektronenstrahlbearbeitungsvorrichtung |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH573985A5 (ko) * | 1973-11-22 | 1976-03-31 | Balzers Patent Beteilig Ag | |
US4548699A (en) * | 1984-05-17 | 1985-10-22 | Varian Associates, Inc. | Transfer plate rotation system |
DE3606152A1 (de) * | 1986-02-26 | 1987-08-27 | Basf Ag | Halterung fuer substratplatten auf traegerplatten |
JPS6337186A (ja) * | 1986-08-01 | 1988-02-17 | Matsushita Electric Ind Co Ltd | 液晶組成物 |
DE3716498C2 (de) * | 1987-05-16 | 1994-08-04 | Leybold Ag | Vorrichtung zum Ein- und Ausschleusen von Werkstücken in eine Beschichtungskammer |
DE3803411A1 (de) * | 1988-02-05 | 1989-08-17 | Leybold Ag | Vorrichtung zur halterung von werkstuecken |
-
1990
- 1990-03-01 EP EP90104004A patent/EP0389820B1/de not_active Expired - Lifetime
- 1990-03-01 DE DE9090104004T patent/DE59001747D1/de not_active Expired - Fee Related
- 1990-03-19 KR KR1019900003650A patent/KR930008341B1/ko not_active Expired - Fee Related
- 1990-03-28 JP JP2077154A patent/JPH07113151B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0389820B1 (de) | 1993-06-16 |
KR900014627A (ko) | 1990-10-24 |
DE59001747D1 (de) | 1993-07-22 |
EP0389820A1 (de) | 1990-10-03 |
JPH02285074A (ja) | 1990-11-22 |
JPH07113151B2 (ja) | 1995-12-06 |
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