KR910016683A - 아미노에틸에탄올아민의 선택적 제조 - Google Patents
아미노에틸에탄올아민의 선택적 제조 Download PDFInfo
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- KR910016683A KR910016683A KR1019910004896A KR910004896A KR910016683A KR 910016683 A KR910016683 A KR 910016683A KR 1019910004896 A KR1019910004896 A KR 1019910004896A KR 910004896 A KR910004896 A KR 910004896A KR 910016683 A KR910016683 A KR 910016683A
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- Prior art keywords
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- metal oxide
- metal
- metallic
- condensation catalyst
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- LHIJANUOQQMGNT-UHFFFAOYSA-N aminoethylethanolamine Chemical compound NCCNCCO LHIJANUOQQMGNT-UHFFFAOYSA-N 0.000 title claims 2
- 238000000034 method Methods 0.000 claims 45
- 229910044991 metal oxide Inorganic materials 0.000 claims 42
- 150000004706 metal oxides Chemical class 0.000 claims 37
- 239000003054 catalyst Substances 0.000 claims 22
- 239000000203 mixture Substances 0.000 claims 20
- 239000000463 material Substances 0.000 claims 19
- 230000005494 condensation Effects 0.000 claims 18
- 238000009833 condensation Methods 0.000 claims 18
- -1 amino compound Chemical class 0.000 claims 15
- 239000003607 modifier Substances 0.000 claims 13
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims 10
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 8
- HXMVNCMPQGPRLN-UHFFFAOYSA-N 2-hydroxyputrescine Chemical compound NCCC(O)CN HXMVNCMPQGPRLN-UHFFFAOYSA-N 0.000 claims 7
- 150000001412 amines Chemical class 0.000 claims 7
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical class OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims 6
- 229910052751 metal Inorganic materials 0.000 claims 6
- 239000002184 metal Substances 0.000 claims 6
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 claims 5
- 229910019142 PO4 Inorganic materials 0.000 claims 5
- 229910021529 ammonia Inorganic materials 0.000 claims 5
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims 5
- 235000021317 phosphate Nutrition 0.000 claims 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 4
- 229910052804 chromium Inorganic materials 0.000 claims 4
- 239000011651 chromium Substances 0.000 claims 4
- 229910052750 molybdenum Inorganic materials 0.000 claims 4
- 239000011733 molybdenum Substances 0.000 claims 4
- PTMHPRAIXMAOOB-UHFFFAOYSA-L phosphoramidate Chemical compound NP([O-])([O-])=O PTMHPRAIXMAOOB-UHFFFAOYSA-L 0.000 claims 4
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid group Chemical group S(O)(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims 4
- 229910052721 tungsten Inorganic materials 0.000 claims 4
- 239000010937 tungsten Substances 0.000 claims 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 4
- 229910001928 zirconium oxide Inorganic materials 0.000 claims 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical group F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims 3
- 229920000388 Polyphosphate Polymers 0.000 claims 3
- 125000000217 alkyl group Chemical group 0.000 claims 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims 3
- 239000010452 phosphate Substances 0.000 claims 3
- 229910052698 phosphorus Inorganic materials 0.000 claims 3
- 239000011574 phosphorus Substances 0.000 claims 3
- 239000001205 polyphosphate Substances 0.000 claims 3
- 235000011176 polyphosphates Nutrition 0.000 claims 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 3
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 claims 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims 2
- 229910052684 Cerium Inorganic materials 0.000 claims 2
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 claims 2
- 229910052688 Gadolinium Inorganic materials 0.000 claims 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 2
- 229910052769 Ytterbium Inorganic materials 0.000 claims 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 2
- RNQKDQAVIXDKAG-UHFFFAOYSA-N aluminum gallium Chemical compound [Al].[Ga] RNQKDQAVIXDKAG-UHFFFAOYSA-N 0.000 claims 2
- 150000008064 anhydrides Chemical class 0.000 claims 2
- 229910052787 antimony Inorganic materials 0.000 claims 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims 2
- 229910052785 arsenic Inorganic materials 0.000 claims 2
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims 2
- 229910052797 bismuth Inorganic materials 0.000 claims 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims 2
- 229910052796 boron Inorganic materials 0.000 claims 2
- 229910052793 cadmium Inorganic materials 0.000 claims 2
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 claims 2
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 claims 2
- 229910017052 cobalt Inorganic materials 0.000 claims 2
- 239000010941 cobalt Substances 0.000 claims 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims 2
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 claims 2
- 229910052732 germanium Inorganic materials 0.000 claims 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims 2
- 229910052738 indium Inorganic materials 0.000 claims 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims 2
- 229910052742 iron Inorganic materials 0.000 claims 2
- 229910052746 lanthanum Inorganic materials 0.000 claims 2
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims 2
- 150000007522 mineralic acids Chemical class 0.000 claims 2
- 229910052759 nickel Inorganic materials 0.000 claims 2
- 229910052758 niobium Inorganic materials 0.000 claims 2
- 239000010955 niobium Substances 0.000 claims 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims 2
- 150000003013 phosphoric acid derivatives Chemical class 0.000 claims 2
- 150000003839 salts Chemical class 0.000 claims 2
- 229910052706 scandium Inorganic materials 0.000 claims 2
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical group [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- 239000000377 silicon dioxide Substances 0.000 claims 2
- 229910052715 tantalum Inorganic materials 0.000 claims 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 2
- 229910052718 tin Inorganic materials 0.000 claims 2
- 229910052719 titanium Inorganic materials 0.000 claims 2
- 239000010936 titanium Substances 0.000 claims 2
- 239000004408 titanium dioxide Substances 0.000 claims 2
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 claims 2
- 229910052727 yttrium Inorganic materials 0.000 claims 2
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims 2
- 229910052725 zinc Inorganic materials 0.000 claims 2
- 239000011701 zinc Substances 0.000 claims 2
- 229910052726 zirconium Inorganic materials 0.000 claims 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims 1
- 230000002378 acidificating effect Effects 0.000 claims 1
- 229910052783 alkali metal Inorganic materials 0.000 claims 1
- 150000001340 alkali metals Chemical class 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 230000003197 catalytic effect Effects 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 125000004122 cyclic group Chemical group 0.000 claims 1
- XPPKVPWEQAFLFU-UHFFFAOYSA-J diphosphate(4-) Chemical compound [O-]P([O-])(=O)OP([O-])([O-])=O XPPKVPWEQAFLFU-UHFFFAOYSA-J 0.000 claims 1
- 235000011180 diphosphates Nutrition 0.000 claims 1
- 150000004673 fluoride salts Chemical class 0.000 claims 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims 1
- 150000002736 metal compounds Chemical class 0.000 claims 1
- 229910001463 metal phosphate Inorganic materials 0.000 claims 1
- 150000002739 metals Chemical class 0.000 claims 1
- 125000005341 metaphosphate group Chemical group 0.000 claims 1
- 125000000446 sulfanediyl group Chemical group *S* 0.000 claims 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical class C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 claims 1
- 229910052845 zircon Inorganic materials 0.000 claims 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 claims 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C211/00—Compounds containing amino groups bound to a carbon skeleton
- C07C211/01—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to acyclic carbon atoms
- C07C211/20—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to acyclic carbon atoms of an acyclic unsaturated carbon skeleton
- C07C211/22—Compounds containing amino groups bound to a carbon skeleton having amino groups bound to acyclic carbon atoms of an acyclic unsaturated carbon skeleton containing at least two amino groups bound to the carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/02—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms containing only hydrogen and carbon atoms in addition to the ring hetero elements
- C07D295/023—Preparation; Separation; Stabilisation; Use of additives
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C209/00—Preparation of compounds containing amino groups bound to a carbon skeleton
- C07C209/04—Preparation of compounds containing amino groups bound to a carbon skeleton by substitution of functional groups by amino groups
- C07C209/14—Preparation of compounds containing amino groups bound to a carbon skeleton by substitution of functional groups by amino groups by substitution of hydroxy groups or of etherified or esterified hydroxy groups
- C07C209/16—Preparation of compounds containing amino groups bound to a carbon skeleton by substitution of functional groups by amino groups by substitution of hydroxy groups or of etherified or esterified hydroxy groups with formation of amino groups bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C213/00—Preparation of compounds containing amino and hydroxy, amino and etherified hydroxy or amino and esterified hydroxy groups bound to the same carbon skeleton
- C07C213/02—Preparation of compounds containing amino and hydroxy, amino and etherified hydroxy or amino and esterified hydroxy groups bound to the same carbon skeleton by reactions involving the formation of amino groups from compounds containing hydroxy groups or etherified or esterified hydroxy groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/12—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms
- C07D295/125—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms with the ring nitrogen atoms and the substituent nitrogen atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
- C07D295/13—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms with the ring nitrogen atoms and the substituent nitrogen atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Catalysts (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (49)
- 아미노 화합물을 IVB족 그룹 금속 화합물, IVB족 그룹-함유 물질 및 촉진된 축합 촉매로부터 선택된 축합 촉매의 존재하에 축합시킴을 특징으로하여, 아미노에틸에탄올아민을 고수율의 중량%로 함유하는 아민의 제조방법.
- 제1항에 있어서, 축합 촉매가 하나 이상의 IVB족 금속 산화물을 포함하는 방법.
- 제2항에 있어서, IVB족 그룹 금속 산화물이 표면적이 넓은 산화티탄 또는 산화지르코늄을 포함하는 방법.
- 제1항에 있어서, 축합촉매의 표면적이 약 70㎡/gm 이상인 방법.
- 제3항에 있어서, 산화티탄이 이산화티탄이고 산화지르코늄이 이산화지르코늄인 방법.
- 제2항에 있어서, IVB족 그룹 금속산화물이 산화티탄과 산화지르코늄의 혼합물을 포함하는 방법.
- 제6항에 있어서, 산화티탄과 산화지르코늄의 혼합물이 이산화티탄과 이산화지르콘의 혼합물인 방법
- 제3항에 있어서, 축합촉매의 표면적이 약 140㎡/gm 이상인 방법.
- 제3항에 있어서, 축합촉매의 표면적이 약 70㎡/gm 이상인 방법.
- 제1항에 있어서, 축합촉매가 VIB 그룹 금속-함유 물질을 포함하는 방법.
- 제10항에 있어서, VIB 그룹 금속-함유 물질이 텅스텐, 크롬 및/ 또는 몰리브덴의 하나 이상의 산화물인 방법.
- 제1항에 있어서, 축합 촉매가 촉진된 축합 촉매를 포함하는 방법.
- 제12항에 있어서, 촉진된 축합촉매가 VIB족 금속 산화물, 축합촉매를 촉진하기에 충분한 양으로 존재하는 축합촉매 촉진제와 관련있는 VIB족 금속-함유 물질 또는 이들의 혼합물을 포함하는 방법.
- 제13항에 있어서, 축합 촉매 촉진제가 생성물 선택성, 촉매 활성 및/또는촉매 안정성을 향상시키는 방법.
- 제13항에 있어서, 축합촉매 촉진제가 하나 이상의 금속 산화물, 사이클 구조이거나 사이클 구조가 아닐 수 있는 금속성 인산염, 축합 구조인 금속성 폴리인산염, VIB족 금속 함유물질, 인 함유 물질 또는 이들의 혼합물을 포함하는 방법.
- 제1항에 있어서, 축합 촉매가 성능 조절제와 관련있는 방법.
- 제16항에 있어서, 성능 조절제가 하나 이상의 금속 산화물을 포함하는 방법.
- 제17항에 있어서, 성능 조절제가 하나 이상의 IA족 그룹 금속 산화물, IIA족 금속 산화물, IIIB족 금속 산화물, VB족 금속 산화물, VIB족 금속 산화물, VIIB족 금속 산화물, VIII족 금속 산화물, IB족 금속 산화물, IIB족 금속 산화물, IIIA족 금속 산화물, IVA족 금속 산화물, VA족 금속 산화물, VIA족 금속 산화물, IVB족 금속 산화물 또는 이들의 혼합물을 포함하는 방법.
- 제18항에 있어서, 성능 조절제가 스칸듐, 이트륨, 란탄, 세륨, 가돌리늄, 루테튬, 이테르븀, 니오브, 탄탈, 크롬, 몰리브덴, 텅스텐, 티탄, 지르코늄, 철, 코발트, 니켈, 아연, 카드뮴, 붕소, 알루미늄, 갈륨, 인듐, 규소, 게르마늄, 주석, 납, 비소, 안티몬 및 비스무스의 산화물 하나 이상을 포함하는 방법.
- 제16항에 있어서, 성능 조절제가 사이클 구조이거나 사이클 구조가 아닐 수 있는 하나 이상의 금속성 인산염, 축합 구조인 금속성 폴리인산염,금속성 메타폴리포스피메이트, 금속성 포스포르아미데이트, 금속성 아미도포스페이트, 금속성 이미도포스페이트 또는 이들의 혼합물을 포함하는 방법.
- 제20항에 있어서, 성능 조절제가 금속성 오르토인산염, 금속성 메타인산염, 금속성 피로인산염, 금속성 폴리인산염, 금속성 울트라인산염, 금속성 메타포스피메이트, 금속성 포스포르아미데이트, 금속성 아미도포스페이트, 금속성 이미도포스페이트 또는 이들의 혼합물을 포함하는 방법.
- 제16항에 있어서, 성능 조절제가 VIB족 금속-함유 물질을 포함하는 방법.
- 제22항에 있어서, 성능 조절제가 텅스텐, 크롬 및/또는 몰리브덴의 산화물물 하나 이상인 방법.
- 제24항에 있어서, 성능 조절제가 인 함유 물질을 포함하는 방법
- 제24항에 있어서, 인 함유 물질이 산성 금속 인산염, 인산 화합물 및 이의 무수물, 아인산 화합물 및 이의 무수물, 알킬 또는 아릴 인산염 에스테르, 알킬 또는 아릴 아인산염 에스테르, 알킬 또는 아릴 치환된 아인산 및 인산, 아인산의 알칼리 금속 단일염, 이들의 티오 동족체 및 이들의 혼합물을 포함하는 방법.
- 제16항에 있어서, 성능 조절제가 무기산 또는 무기산으로부터 유도된 화합물을 포함하는 방법
- 제26항에 있어서, 성능 조절제가 인산 또는 인산의 염인 방법.
- 제26항에 있어서, 성능 조절제가 불화수소, 불화수소산 또는 불화물 염인 방법
- 제26항에 있어서, 성능 조절제가 황산 또는 황산의 염인 방법
- 제2항에 있어서, IVB 그룹 금속 산화물이 IVB족 금속 산화물과 하나 이상의 다른 금속 산화물의 혼합 산화물을 포함하는 방법
- 제30항에 있어서, 금속 산화물이 하나 이상의 IA족 금속 산화물, IIA족 금속 산화물, IIIB족 금속 산화물,VB족 금속 산화물, VIB족 금속 산화물, VIIB족 금속 산화물, VIII족 금속 산화물, IB족 금속 산화물, IIB족 금속산화물, IIIA족 금속 산화물, IVA족 금속 산화물, VA족 금속 산화물, VIA족 금속산화물, 기타의 IVB족 금속 산화물 또는 이들의 혼합물을 포함하는 방법.
- 제30항에 있어서, 금속산화물이 스칸듐, 이트륨, 란탄, 세륨, 가돌리늄, 루테튬, 이테르븀, 니오브, 탄탈, 크롬, 몰리브덴, 텅스텐, 티탄, 지르코늄, 철, 코발트, 니켈, 아연, 카드뮴, 붕소, 알루미늄, 갈륨, 인듐, 규소, 게르마늄, 주석, 납, 비소, 안티몬 및 비스무스의 산화물을 하나 이상을 포함하는 방법.
- 제2항에 있어서, IVB족 금속 산화물이 촉매의 약 50중량% 내지 약 90중량%를 구성하는 방법.
- 제2항에 있어서, IVB족 금속 산화물이 촉매의 약 50중량% 내지 약 90중량%를 구성하는 방법.
- 제2항에 있어서, IVB족 금속 산화물이 촉매의 약 75중량% 내지 약 90중량%를 구성하는 방법.
- 제1항에 있어서, 축합촉매가 지지물질과 관련있는 방법.
- 제36항에 있어서, 지지물질이 알루미나 물질 또는 알루미나-실리카 물질을 포함하는 방법.
- 제36항에 있어서, 지지물질이 실리카 물질 또는 실리카-알루미나 물질을 포함하는 방법.
- 제36항에 있어서, 지지물질이 축합촉매의 약 2 내지 약 50중량%를 구성하는 방법.
- 제1항에 있어서, 아미노 화합물이 알킬렌아민, 알칼올아민 또는 이의 혼합물을 포함하는 방법.
- 제1항에 있어서, 아미노 화합물이 알킬렌아민과 알칼올아민을 포함하는 방법.
- 제1항에 있어서, 아미노 화합물이 모노에탈올아민과 에틸렌디아민의 혼합물을 포함하는 방법.
- 제1항에 있어서, 아미노 화합물이 모노에탈올아민, 에틸렌디아민 및 암모니아의 혼합물을 포함하는 방법.
- 제1항에 있어서, 아민 생성물의 AEEA에 대한 DETA의 중량비가 약 5.0미만이고 PIP에 대한 AEEA의 중량비가 약 5.0이상인 방법.
- 제1항에 있어서, 아민 생성물의 AEEA 수율이 존재하는 물 및/또는 암모니아 및/또는 공급물을 제외하고 생성물 100중량%를 기준으로 하여 약 20.0중량% 이상인 방법.
- 제1항에 있어서, 아민 생성물의 AEEA 수율이 물 및/또는 암모니아 및/또는 잔존하는 공급물을 제외하고 생성물 100중량%를 기준으로 하여 약 25.0중량% 이상인 방법.
- 제1항의 방법에 의해 제조된 아민 생성물.
- 제1항에 있어서, 아민 생성물이, 존재하는 물 및/또는 암모니아 및/또는 공급물을 제외하고 조성물 100중량%를 기준으로 하여 a)AEEA 약20.0중량% 이상, b)DETA 약 75.0중량% 미만, c)PIP와 AEP의 혼합물 약 10.0중량% 미만, d)TETA이성체와 TEPA이성체의 혼합물 약 20.0중량% 미만, e)기타 물질의 약 50중량% 미만 f)AEEA에 대한 DATA 약 5.0미만의 중량비, 및 g)PIP에 대한 DETA를 약 5.0이상의 중량비로 포함하는 방법.
- 존재하는 물 및/또는 암모니아 및/또는 공급물을 제외하고 조성물의 중량 100%을 기준으로 하여 a)AEEA 약20.0중량% 이상, b)DETA 약 75.0중량% 미만, c)PIP와 AEP의 혼합물 약 10.0중량% 미만, d)TETA이성체의 혼합물 약 20.0중량% 미만, e)기타 물질의 약 50중량% 미만, f)AEEA에 대한 DATA 약 5.0미만의 중량비, 및 g)PIP에 대한 DETA를 약 5.0이상의 중량비로 포함하는 연속 생성된 알킬렌 아민 생성제 조성물.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
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US07/501,906 US5214215A (en) | 1990-03-30 | 1990-03-30 | Selective production of aminoethylethanolamine |
US501,906 | 1990-03-30 |
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KR1019910004896A KR910016683A (ko) | 1990-03-30 | 1991-03-28 | 아미노에틸에탄올아민의 선택적 제조 |
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US (1) | US5214215A (ko) |
EP (1) | EP0449381A1 (ko) |
KR (1) | KR910016683A (ko) |
CN (1) | CN1055923A (ko) |
AU (1) | AU7389991A (ko) |
CA (1) | CA2039368A1 (ko) |
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JPH0233A (ja) * | 1987-10-30 | 1990-01-05 | Fuji Photo Film Co Ltd | ハロゲン化銀写真感光材料 |
US4982003A (en) * | 1987-11-06 | 1991-01-01 | Tosoh Corporation | Mixed oxide catalyst and process for producing an alkylenamine by using the catalyst |
JP2676847B2 (ja) * | 1987-12-18 | 1997-11-17 | 東ソー株式会社 | アルキレンアミン類の製造方法 |
US5202489A (en) * | 1987-12-22 | 1993-04-13 | Union Carbide Chemicals & Plastics Technology Corporation | Amines catalysis |
GB8730266D0 (en) * | 1987-12-29 | 1988-02-03 | Unilever Plc | Process for synthesis of polyol fatty acid polyesters |
JP2764968B2 (ja) * | 1988-02-10 | 1998-06-11 | 東ソー株式会社 | アルキレンアミン類の製造法 |
JPH02876A (ja) * | 1988-02-12 | 1990-01-05 | Sharp Corp | 電子写真装置用トナー |
US4914072A (en) * | 1988-03-02 | 1990-04-03 | Texaco Inc. | Phosphorus/titania/zirconia catalyst for preparation of linear polyethylenepolyamines |
US4922024A (en) * | 1988-04-14 | 1990-05-01 | The Dow Chemical Company | Amination process employing group vib metal catalysts |
US5030740A (en) * | 1988-10-14 | 1991-07-09 | The Dow Chemical Company | Process for preparing linearly-extended polyalkylenepolyamines |
US4996363A (en) * | 1988-12-20 | 1991-02-26 | The Dow Chemical Company | Catalytic reforming of alkyleneamines to linearly-extended polyalkylenepolyamines |
US5101074A (en) * | 1989-08-08 | 1992-03-31 | Union Carbide Chemicals & Plastics Technology Corporation | Vicinal di(hetro) alkylene organometalates and processes for the production of amines therewith |
US4983736A (en) * | 1989-08-08 | 1991-01-08 | Union Carbide Chemicals And Plastic Company Inc. | Amines catalysis using metallic polyphosphate condensation catalysts having a condensed structure |
-
1990
- 1990-03-30 US US07/501,906 patent/US5214215A/en not_active Expired - Lifetime
-
1991
- 1991-03-28 ZA ZA912389A patent/ZA912389B/xx unknown
- 1991-03-28 AU AU73899/91A patent/AU7389991A/en not_active Withdrawn
- 1991-03-28 EP EP91200711A patent/EP0449381A1/en not_active Withdrawn
- 1991-03-28 WO PCT/US1991/001982 patent/WO1991015459A1/en unknown
- 1991-03-28 CA CA002039368A patent/CA2039368A1/en not_active Abandoned
- 1991-03-28 KR KR1019910004896A patent/KR910016683A/ko not_active Application Discontinuation
- 1991-03-28 CN CN91102799A patent/CN1055923A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
US5214215A (en) | 1993-05-25 |
WO1991015459A1 (en) | 1991-10-17 |
EP0449381A1 (en) | 1991-10-02 |
AU7389991A (en) | 1991-10-03 |
ZA912389B (en) | 1992-01-29 |
CN1055923A (zh) | 1991-11-06 |
CA2039368A1 (en) | 1991-10-01 |
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