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KR910014013A - 플라즈마 발생장치 - Google Patents

플라즈마 발생장치

Info

Publication number
KR910014013A
KR910014013A KR1019900020202A KR900020202A KR910014013A KR 910014013 A KR910014013 A KR 910014013A KR 1019900020202 A KR1019900020202 A KR 1019900020202A KR 900020202 A KR900020202 A KR 900020202A KR 910014013 A KR910014013 A KR 910014013A
Authority
KR
South Korea
Prior art keywords
plasma generator
plasma
generator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
KR1019900020202A
Other languages
English (en)
Other versions
KR0141592B1 (ko
Inventor
게쉐 로란트
크레츠메르 카알-하인츠
Original Assignee
라이볼트 악티엔게젤샤프트
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 라이볼트 악티엔게젤샤프트 filed Critical 라이볼트 악티엔게젤샤프트
Publication of KR910014013A publication Critical patent/KR910014013A/ko
Application granted granted Critical
Publication of KR0141592B1 publication Critical patent/KR0141592B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/321Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/32137Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155Frequency modulation
    • H01J37/32165Plural frequencies

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Waveguide Switches, Polarizers, And Phase Shifters (AREA)
KR1019900020202A 1989-12-23 1990-12-08 플라즈마 발생장치 Expired - Fee Related KR0141592B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3942964.4 1989-12-23
DE3942964A DE3942964A1 (de) 1989-12-23 1989-12-23 Einrichtung fuer die erzeugung eines plasmas

Publications (2)

Publication Number Publication Date
KR910014013A true KR910014013A (ko) 1991-07-31
KR0141592B1 KR0141592B1 (ko) 1998-07-01

Family

ID=6396444

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900020202A Expired - Fee Related KR0141592B1 (ko) 1989-12-23 1990-12-08 플라즈마 발생장치

Country Status (5)

Country Link
US (1) US5146137A (ko)
EP (1) EP0434932B1 (ko)
JP (1) JPH04167400A (ko)
KR (1) KR0141592B1 (ko)
DE (2) DE3942964A1 (ko)

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US7253109B2 (en) * 1997-11-26 2007-08-07 Applied Materials, Inc. Method of depositing a tantalum nitride/tantalum diffusion barrier layer system
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US6254738B1 (en) 1998-03-31 2001-07-03 Applied Materials, Inc. Use of variable impedance having rotating core to control coil sputter distribution
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Also Published As

Publication number Publication date
EP0434932B1 (de) 1996-01-10
DE59010049D1 (de) 1996-02-22
EP0434932A3 (en) 1992-01-02
DE3942964A1 (de) 1991-06-27
KR0141592B1 (ko) 1998-07-01
EP0434932A2 (de) 1991-07-03
US5146137A (en) 1992-09-08
JPH04167400A (ja) 1992-06-15

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