KR900702562A - 패턴의 수정방법 - Google Patents

패턴의 수정방법

Info

Publication number: KR900702562A
Authority: KR; South Korea
Prior art keywords: modify; pattern
Prior art date: 1988-11-08

Application number

KR1019900700538A

Other languages

English (en)

Other versions

KR0149497B1 (ko

Inventor

다다히로 후루가와

도시아끼 기꾸지

히도시 고오노

Original Assignee

쿄오도오 인사쓰 가부시기가이샤

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1988-11-08

Filing date

1990-03-14

Publication date

1990-12-07

1989-10-11 Application filed by 쿄오도오 인사쓰 가부시기가이샤 filed Critical 쿄오도오 인사쓰 가부시기가이샤

1990-12-07 Publication of KR900702562A publication Critical patent/KR900702562A/ko

1998-12-01 Application granted granted Critical

1998-12-01 Publication of KR0149497B1 publication Critical patent/KR0149497B1/ko

2009-10-11 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Condensed Matter Physics & Semiconductors (AREA)
Manufacturing & Machinery (AREA)
Computer Hardware Design (AREA)
Microelectronics & Electronic Packaging (AREA)
Power Engineering (AREA)
Optical Filters (AREA)
Preparing Plates And Mask In Photomechanical Process (AREA)
Manufacturing Of Printed Wiring (AREA)

KR1019900700538A 1988-11-08 1989-10-11 패턴의 수정방법 Expired - Fee Related KR0149497B1 (ko)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
JP28208388		1988-11-08
JP63-282083		1988-11-08
PCT/JP1989/001041 WO1990005326A1 (en)	1988-11-08	1989-10-11	Pattern correction method

Publications (2)

Publication Number	Publication Date
KR900702562A true KR900702562A (ko)	1990-12-07
KR0149497B1 KR0149497B1 (ko)	1998-12-01

Family

ID=17647904

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
KR1019900700538A Expired - Fee Related KR0149497B1 (ko)	1988-11-08	1989-10-11	패턴의 수정방법

Country Status (7)

Country	Link
EP (1)	EP0396768B1 (ko)
JP (1)	JP2794199B2 (ko)
KR (1)	KR0149497B1 (ko)
AU (1)	AU612286B2 (ko)
CA (1)	CA2001910A1 (ko)
DE (1)	DE68928200T2 (ko)
WO (1)	WO1990005326A1 (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH08114711A (ja) *	1994-10-13	1996-05-07	Shinto Paint Co Ltd	平坦性が損なわれたカラーフィルターの修正方法、修正されたカラーフィルターおよびそのカラーフィルターを有する多色表示装置
JP4930740B2 (ja) *	2001-02-26	2012-05-16	大日本印刷株式会社	カラーフィルタの欠陥修正方法
JP4118082B2 (ja) *	2002-05-08	2008-07-16	株式会社きもと	フォトマスク用保護膜修正方法
JP2006258873A (ja) *	2005-03-15	2006-09-28	Toppan Printing Co Ltd	カラーフィルターの修正方法およびカラーフィルター
JP4617236B2 (ja) *	2005-10-03	2011-01-19	シャープ株式会社	カラーフィルターの修正方法
KR101536767B1 (ko) *	2014-05-29	2015-07-15	주식회사 루미스탈	반도체 기판의 표면 상에 존재하는 결함의 선택적 커버링 방법

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4200668A (en) *	1978-09-05	1980-04-29	Western Electric Company, Inc.	Method of repairing a defective photomask
JPS61122605A (ja) *	1984-11-20	1986-06-10	Canon Inc	カラ−フイルタ−の修復方法
JPS63313158A (ja) *	1987-06-16	1988-12-21	Nec Corp	レチクルの修正方法

1989
- 1989-07-11 JP JP17849189A patent/JP2794199B2/ja not_active Expired - Fee Related
- 1989-10-11 AU AU43491/89A patent/AU612286B2/en not_active Ceased
- 1989-10-11 DE DE68928200T patent/DE68928200T2/de not_active Expired - Fee Related
- 1989-10-11 KR KR1019900700538A patent/KR0149497B1/ko not_active Expired - Fee Related
- 1989-10-11 EP EP89911406A patent/EP0396768B1/en not_active Expired - Lifetime
- 1989-10-11 WO PCT/JP1989/001041 patent/WO1990005326A1/ja active IP Right Grant
- 1989-10-31 CA CA002001910A patent/CA2001910A1/en not_active Abandoned

Also Published As

Publication number	Publication date
AU4349189A (en)	1990-05-28
WO1990005326A1 (en)	1990-05-17
AU612286B2 (en)	1991-07-04
DE68928200D1 (de)	1997-09-04
CA2001910A1 (en)	1990-05-08
EP0396768B1 (en)	1997-07-23
DE68928200T2 (de)	1997-11-13
EP0396768A1 (en)	1990-11-14
JPH02262603A (ja)	1990-10-25
KR0149497B1 (ko)	1998-12-01
EP0396768A4 (en)	1991-07-17
JP2794199B2 (ja)	1998-09-03

Publication	Publication Date	Title
ATA901789A (de)	1997-07-15	Somatostatinpeptid
BR8806093A (pt)	1990-06-26	Trepano
PT90226A (pt)	1989-11-10	Pulverizador
ATA900689A (de)	1997-01-15	Calcitoninpeptide
ATA172889A (de)	1994-02-15	Furanderivate
DK55389A (da)	1989-08-14	Fabrikationsbane
DE68926597D1 (de)	1996-07-11	Mikrorechner
BR8902098A (pt)	1989-12-05	Eletrolisador
DK113291A (da)	1991-06-13	Homogent enzymimmunassay
KR900702562A (ko)	1990-12-07	패턴의 수정방법
BR8906898A (pt)	1990-09-25	Jamela
DK100890A (da)	1990-04-24	Spjaeldregulerende arrangement
DE68926367D1 (de)	1996-06-05	Hydroxymethylcyclobutylpurine
KR890017257U (ko)	1989-09-06	팽 이
KR890700854A (ko)	1989-04-27	레지스트를 패턴화 하는 방법
DD277186A3 (de)	1990-03-28	Waelzlagerseparator
UA26030A1 (uk)	1999-02-26	Спосіб отримаhhя ураhу
IT89067917A1 (it)	1991-04-26	Orinale a perdere
DK641188D0 (da)	1988-11-17	Cad/cam - hurtig form
BR6801753U (pt)	1990-03-27	Esfregona
BR8801963A (pt)	1989-11-28	Maqfio-maquina de fazer meio-fio rapido
SE8803324D0 (sv)	1988-09-20	Skap
SE8802859D0 (sv)	1988-08-10	Hengbrygga - tak
BR6801307U (pt)	1989-09-12	Boneco-luva
BR6800871U (pt)	1988-08-09	Giro-arte

Legal Events

Date	Code	Title	Description
1990-03-14	PA0109	Patent application	Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 19900314
1990-12-07	PG1501	Laying open of application
1994-09-27	A201	Request for examination
1994-09-27	PA0201	Request for examination	Patent event code: PA02012R01D Patent event date: 19940927 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 19900314 Comment text: Patent Application
1997-12-24	E902	Notification of reason for refusal
1997-12-24	PE0902	Notice of grounds for rejection	Comment text: Notification of reason for refusal Patent event date: 19971224 Patent event code: PE09021S01D
1998-05-11	E701	Decision to grant or registration of patent right
1998-05-11	PE0701	Decision of registration	Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 19980511
1998-06-08	GRNT	Written decision to grant
1998-06-08	PR0701	Registration of establishment	Comment text: Registration of Establishment Patent event date: 19980608 Patent event code: PR07011E01D
1998-06-08	PR1002	Payment of registration fee	Payment date: 19980608 End annual number: 3 Start annual number: 1
1998-12-01	PG1601	Publication of registration
2001-05-30	PR1001	Payment of annual fee	Payment date: 20010530 Start annual number: 4 End annual number: 4
2002-05-21	PR1001	Payment of annual fee	Payment date: 20020521 Start annual number: 5 End annual number: 5
2003-05-22	FPAY	Annual fee payment	Payment date: 20030522 Year of fee payment: 6
2003-05-22	PR1001	Payment of annual fee	Payment date: 20030522 Start annual number: 6 End annual number: 6
2004-06-09	LAPS	Lapse due to unpaid annual fee
2004-06-09	PC1903	Unpaid annual fee	Termination category: Default of registration fee Termination date: 20050311