KR890004044B1 - 연속 증착 공정에서의 부착량 급속 변화 방법 - Google Patents
연속 증착 공정에서의 부착량 급속 변화 방법 Download PDFInfo
- Publication number
- KR890004044B1 KR890004044B1 KR1019850003652A KR850003652A KR890004044B1 KR 890004044 B1 KR890004044 B1 KR 890004044B1 KR 1019850003652 A KR1019850003652 A KR 1019850003652A KR 850003652 A KR850003652 A KR 850003652A KR 890004044 B1 KR890004044 B1 KR 890004044B1
- Authority
- KR
- South Korea
- Prior art keywords
- shutter
- deposition
- change
- amount
- aperture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (6)
- 진공 증착 공정에서 급속히 증착량을 변화시키는 방법에 있어서, 상기 진공 증착 장치의 증기 챤넬 및 금속 증착실 부근에서 증기 흐름을 초우크 시키는 영역을 제공하여 셔터 개구를 제한하는 공정과, 상기 초우크된 상태가 유지되는 동안 상기 셔터 개구를 변화시키는 공정과, 상기 셔터 개구 구경의 변화에 대응하여 증착실 가열기에 공급되는 전력을 변화시키는 공정을 포함하는 것을 특징으로 하는 연속 증착 공정에서의 부착량 급속 변화 방법.
- 제 1 항의 방법에 있어서, 상기 셔터가 슬라이드 셔터인 것을 특징으로 하는 연속 증착 공정에서의 부착량 급속 변화 방법.
- 제 1 항의 방법에 있어서, 상기 셔터가 버터 플라이형 벨트인 것을 특징으로 하는 연속 증착 공정에서의 부착량 급속 변화 방법.
- 제 3 항의 방법에 있어서, 상기 버터 플라이형 밸브가 이것의 한 측부에 한쌍의 격벽을 설비한 것을 특징으로 하는 연속 증착 공정에서의 부착량 급속 변화 방법.
- 제 1 항의 방법에 있어서, 그속에 아연이 부착되는 것을 특징으로 하는 연속 증착 공정에서의 부착량 급속 변화 방법.
- 제 1 항의 방법에 있어서, 부착될 필름의 두께가 탐지되고 또한 이렇게 탐지된 정보가 상기 셔터 자동 제어 수단으로 피이드백 되어, 두께의 변화를 부상하도록 상기 셔터 개구가 변화되는 것을 특징으로 하는 연속 증착 공정에서의 부착량 급속 변화방법.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP106396 | 1984-05-28 | ||
JP59106396A JPS60251273A (ja) | 1984-05-28 | 1984-05-28 | 真空蒸発装置の蒸発量制御方法 |
JP106,396 | 1984-05-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR850008503A KR850008503A (ko) | 1985-12-18 |
KR890004044B1 true KR890004044B1 (ko) | 1989-10-18 |
Family
ID=14432526
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019850003652A Expired KR890004044B1 (ko) | 1984-05-28 | 1985-05-28 | 연속 증착 공정에서의 부착량 급속 변화 방법 |
Country Status (7)
Country | Link |
---|---|
US (1) | US4587134A (ko) |
EP (1) | EP0166960B1 (ko) |
JP (1) | JPS60251273A (ko) |
KR (1) | KR890004044B1 (ko) |
AU (1) | AU574469B2 (ko) |
CA (1) | CA1249491A (ko) |
DE (1) | DE3583829D1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20140108005A (ko) * | 2013-02-28 | 2014-09-05 | 삼성에스디아이 주식회사 | 이차전지용 전극 제조 장치 |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62267471A (ja) * | 1986-05-16 | 1987-11-20 | Mitsubishi Heavy Ind Ltd | 真空蒸発装置の蒸発量制御方法 |
JPS62267465A (ja) * | 1986-05-16 | 1987-11-20 | Mitsubishi Heavy Ind Ltd | 連続真空蒸着装置の蒸着室内における溶融金属表面の汚れ検出方法 |
JPS648265A (en) * | 1987-06-30 | 1989-01-12 | Mitsubishi Heavy Ind Ltd | Method for controlling evaporation rate of vacuum deposition device |
JPS6465257A (en) * | 1987-09-07 | 1989-03-10 | Mitsubishi Heavy Ind Ltd | Method for controlling amount of evaporation in vacuum deposition device |
US4898746A (en) * | 1988-06-28 | 1990-02-06 | Rca Licensing Corporation | Material deposition process analysis system |
DE4442733C2 (de) * | 1994-12-01 | 2001-04-26 | Ardenne Anlagentech Gmbh | Einrichtung zur Bedampfung bandförmiger Substrate im Vakuum |
TW340876B (en) * | 1996-03-27 | 1998-09-21 | Nisshin Steel Co Ltd | Method and apparatus for controlling the deposition amount of a plating metal as well as method and apparatus for measuring the amount of a metal vapor |
US5951769A (en) * | 1997-06-04 | 1999-09-14 | Crown Roll Leaf, Inc. | Method and apparatus for making high refractive index (HRI) film |
US6254934B1 (en) * | 1998-07-29 | 2001-07-03 | Litton Systems, Inc. | Method for controlled deposition of mirror layers |
EP1174526A1 (en) * | 2000-07-17 | 2002-01-23 | Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek TNO | Continuous vapour deposition |
EP1972699A1 (fr) * | 2007-03-20 | 2008-09-24 | ArcelorMittal France | Procede de revetement d'un substrat et installation de depot sous vide d'alliage metallique |
CN101925688B (zh) * | 2007-12-21 | 2012-12-05 | 工业等离子体服务与技术Ipst有限公司 | 用于控制真空蒸发中蒸汽流的方法和装置 |
EP2199425A1 (fr) | 2008-12-18 | 2010-06-23 | ArcelorMittal France | Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique (II) |
WO2012030792A1 (en) * | 2010-08-30 | 2012-03-08 | First Solar, Inc. | Vapor deposition system |
TWI582251B (zh) * | 2014-10-31 | 2017-05-11 | 財團法人工業技術研究院 | 蒸鍍系統以及蒸鍍方法 |
CN104988462B (zh) * | 2015-07-23 | 2017-05-31 | 京东方科技集团股份有限公司 | 一种坩埚装置 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2440135A (en) * | 1944-08-04 | 1948-04-20 | Alexander Paul | Method of and apparatus for depositing substances by thermal evaporation in vacuum chambers |
GB1010456A (en) * | 1962-10-02 | 1965-11-17 | G V Planer Ltd | Means for measuring and/or controlling the evaporation rate in vacuum evaporation processes |
US3281265A (en) * | 1963-09-17 | 1966-10-25 | United States Steel Corp | Method and apparatus for controlling coating thickness by electron beam evaporation |
US3602190A (en) * | 1968-10-30 | 1971-08-31 | Western Electric Co | Multiple vaporizing system |
US3690933A (en) * | 1970-05-21 | 1972-09-12 | Republic Steel Corp | Apparatus and method for continuously condensing metal vapor upon a substrate |
BE789818A (fr) * | 1971-10-07 | 1973-04-06 | Du Pont | Composes de polycetal |
BE790940A (fr) * | 1971-11-04 | 1973-03-01 | Rca Corp | Procede de reglage de la composition d'un film |
GB1483966A (en) * | 1974-10-23 | 1977-08-24 | Sharp Kk | Vapourized-metal cluster ion source and ionized-cluster beam deposition |
US4061800A (en) * | 1975-02-06 | 1977-12-06 | Applied Materials, Inc. | Vapor desposition method |
US3971334A (en) * | 1975-03-04 | 1976-07-27 | Xerox Corporation | Coating device |
JPS5210869A (en) * | 1975-07-15 | 1977-01-27 | Toshinori Takagi | Thin film forming method |
DE2548357C2 (de) * | 1975-10-29 | 1983-05-26 | Robert Bosch Gmbh, 7000 Stuttgart | Einrichtung zur kontinuierlichen Vakuumbedampfung eines bandförmigen Trägermaterials mit Zink |
US4425871A (en) * | 1981-02-09 | 1984-01-17 | Applied Magnetics Corporation | Apparatus for sensing deposition of a thin film layer of a material |
CA1163231A (en) * | 1981-07-24 | 1984-03-06 | Don E. Brodie | Reactive plating method and product |
US4495889A (en) * | 1982-11-24 | 1985-01-29 | Riley Thomas J | Polymeric film coating apparatus |
US4526802A (en) * | 1983-03-31 | 1985-07-02 | Clarion Co., Ltd. | Film deposition equipment |
-
1984
- 1984-05-28 JP JP59106396A patent/JPS60251273A/ja active Granted
-
1985
- 1985-05-16 CA CA000481704A patent/CA1249491A/en not_active Expired
- 1985-05-17 US US06/735,442 patent/US4587134A/en not_active Expired - Fee Related
- 1985-05-24 EP EP85106511A patent/EP0166960B1/en not_active Expired - Lifetime
- 1985-05-24 DE DE8585106511T patent/DE3583829D1/de not_active Expired - Lifetime
- 1985-05-28 KR KR1019850003652A patent/KR890004044B1/ko not_active Expired
- 1985-05-28 AU AU43056/85A patent/AU574469B2/en not_active Ceased
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20140108005A (ko) * | 2013-02-28 | 2014-09-05 | 삼성에스디아이 주식회사 | 이차전지용 전극 제조 장치 |
Also Published As
Publication number | Publication date |
---|---|
KR850008503A (ko) | 1985-12-18 |
US4587134A (en) | 1986-05-06 |
EP0166960A3 (en) | 1988-03-30 |
JPS60251273A (ja) | 1985-12-11 |
AU4305685A (en) | 1985-12-05 |
EP0166960B1 (en) | 1991-08-21 |
AU574469B2 (en) | 1988-07-07 |
JPH037751B2 (ko) | 1991-02-04 |
EP0166960A2 (en) | 1986-01-08 |
DE3583829D1 (de) | 1991-09-26 |
CA1249491A (en) | 1989-01-31 |
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