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KR890003438A - 독성 성분-함유 가스 청정 방법 - Google Patents

독성 성분-함유 가스 청정 방법 Download PDF

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Publication number
KR890003438A
KR890003438A KR1019880010970A KR880010970A KR890003438A KR 890003438 A KR890003438 A KR 890003438A KR 1019880010970 A KR1019880010970 A KR 1019880010970A KR 880010970 A KR880010970 A KR 880010970A KR 890003438 A KR890003438 A KR 890003438A
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South Korea
Prior art keywords
detergent
silver
gas
oxide
weight percent
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KR1019880010970A
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English (en)
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KR960004610B1 (ko
Inventor
고이찌 기따하라
다까시 시마다
노보루 아까따
다다시 히라모또
고헤이 사사끼
Original Assignee
야마자끼 료이찌
닛뽄 파이오닉스 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Priority claimed from JP63120645A external-priority patent/JPH07100128B2/ja
Priority claimed from JP63144643A external-priority patent/JPH07100130B2/ja
Application filed by 야마자끼 료이찌, 닛뽄 파이오닉스 가부시끼가이샤 filed Critical 야마자끼 료이찌
Publication of KR890003438A publication Critical patent/KR890003438A/ko
Application granted granted Critical
Publication of KR960004610B1 publication Critical patent/KR960004610B1/ko

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Biomedical Technology (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Catalysts (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Detergent Compositions (AREA)
  • Treating Waste Gases (AREA)

Abstract

내용 없음

Description

독성 성분-함유 가스 청정 방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 청정 방법의 유동도(여기서, 청정제로 충진된 청정 칼럼은 가스의 유로(flow path)에 둔다).

Claims (22)

  1. 아르신, 포스핀, 모노실란, 디보란 및 셀렌화 수소중에서 선택된 독성성분 하나이상을 함유하는 가스를, (1) 이산화망간 및 (2) 산화제이구리를 포함하는 성형 조성물을 함유하며, 그위에 (3)은 화합물이 침착된 청정제(여기서, 이산화망간에 대한 산화제이구리의 중량비는 0.2 내지 1.2 이며, 침착된 은 화합물의 양은 청정제의 0.01 내지 10.5 중량%이다)와 접촉시킴을 특징으로 하여, 이 가스를 청정하는 방법.
  2. 제1항에 있어서, 이산화망간에 대한 산화제이구리의 중량비가 0.3 내지 0.8인 방법.
  3. 제1항에 있어서, 침착된 은 화합물의 양이 청정제의 0.2 내지 5.0 중량%인 방법.
  4. 제1항에 있어서, 은 화합물이 산화은, 및/또는 수-불용성 또는 수-난용성 은(I)염인 방법.
  5. 제1항에 있어서, 은 화합물이 산화은(I), 산화은(II) 및 탄산은(I) 중 하나이상인 방법.
  6. 제1항에 있어서, 청정제의 밀도가 0.62 내지 1.88g/ml인 방법.
  7. 제1항에 있어서, 가스를 청정제로 충진된 컬럼으로 통과시킴으로써 접촉시키는 방법.
  8. 제7항에 있어서, 청정제를 0.4 내지 1.2g/ml의 충진밀도로 컬럼에 충진시키는 방법.
  9. 제1항에 있어서, 가스의 온도가 0。 내지 90℃ 방법.
  10. 제1항에 있어서, 가스가 공기 질소 또는 수소인 방법.
  11. 제1항에 있어서, 청정제를, 가스와 접촉시키기 전에 약 5 내지 약 30 중량%의 수분 함량을 갖도록 수분 조절시키는 방법.
  12. 제1항에 있어서, 성형 조성물이 5 내지 40 중량%의 산화코발트를 추가로 함유하는 방법.
  13. 제12항에 있어서, 이산화망간에 대한 산화제이구리의 중량비가 0.3 내지 0.8인 방법.
  14. 제12항에 있어서, 침착된 은 화합물의 양이 청정제의 0.2 내지 5.0 중량%인 방법.
  15. 제12항에 있어서, 은 화합물이 산화은, 및/또는 수-불용성 또는 수-난용성 은(I)염인 방법.
  16. 제12항에 있어서, 은 화합물이 산화은(I), 산화은(II) 및 탄산은(I)중 하나 이상인 방법.
  17. 제12항에 있어서, 청정제의 밀도가 0.62 내지 1.88g/ml인 방법.
  18. 제12항에 있어서, 가스를 청정제로 충진된 컬럼으로 통과시킴으로써 접촉시키는 방법.
  19. 제18항에 있어서, 청정제를 0.4 내지 1.2g/ml의 충진밀도로 컬럼에 충진시키는 방법.
  20. 제12항에 있어서, 가스의 온도가 0。 내지 90℃인 방법.
  21. 제12항에 있어서, 가스가 공기, 질소 또는 수소인 방법.
  22. 제12항에 있어서, 청정제를, 가스와 접촉시키기 전에 약 5 내지 약 30중량%의 수분함량을 갖도록 수분 조절시키는 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019880010970A 1987-08-31 1988-08-29 독성 성분-함유 가스 청정 방법 KR960004610B1 (ko)

Applications Claiming Priority (15)

Application Number Priority Date Filing Date Title
JP?215000/87? 1987-08-31
JP215000/87 1987-08-31
JP21500087 1987-08-31
JP?325566/87? 1987-12-24
JP325565/87 1987-12-24
JP32556587 1987-12-24
JP?325565/87? 1987-12-24
JP32556687 1987-12-24
JP325566/87 1987-12-24
JP120645/88 1988-05-19
JP?120645/88? 1988-05-19
JP63120645A JPH07100128B2 (ja) 1987-08-31 1988-05-19 ガスの浄化方法
JP63144643A JPH07100130B2 (ja) 1988-06-14 1988-06-14 ガスの浄化方法
JP?144643/88? 1988-06-14
JP144643/88 1988-06-14

Publications (2)

Publication Number Publication Date
KR890003438A true KR890003438A (ko) 1989-04-14
KR960004610B1 KR960004610B1 (ko) 1996-04-09

Family

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KR1019880010970A KR960004610B1 (ko) 1987-08-31 1988-08-29 독성 성분-함유 가스 청정 방법

Country Status (4)

Country Link
US (1) US4910001A (ko)
EP (1) EP0309099B1 (ko)
KR (1) KR960004610B1 (ko)
DE (1) DE3869301D1 (ko)

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DE3822777A1 (de) * 1988-07-06 1990-01-11 Hoechst Ag Verfahren zur entfernung von phosphorwasserstoff aus abluft
JP2732262B2 (ja) * 1988-09-26 1998-03-25 日本パイオニクス株式会社 アルシンの精製方法
FR2652280B1 (fr) * 1989-09-22 1991-11-29 Air Liquide Procede d'elimination d'hydrures gazeux sur support solide a base d'oxydes metalliques.
US4933159A (en) * 1989-11-02 1990-06-12 Phillips Petroleum Company Sorption of trialkyl arsines
DE4005695A1 (de) * 1990-02-20 1991-08-29 Hydrid Wasserstofftech Chemiesorptionsfaehige metallegierung und verfahren zur gasreinigung
US5182088A (en) * 1990-09-07 1993-01-26 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Removal of gaseous hydrides
EP0624392B1 (en) * 1993-05-11 1998-08-12 Japan Pionics Co., Ltd. Process for cleaning harmful gas
JP3340510B2 (ja) * 1993-05-19 2002-11-05 日本パイオニクス株式会社 有害ガスの浄化方法
US5414199A (en) * 1993-09-28 1995-05-09 The United States Of America As Represented By The United States Department Of Energy Apparatus and method for two-stage oxidation of wastes
JP3347478B2 (ja) * 1994-06-13 2002-11-20 日本パイオニクス株式会社 排ガスの浄化方法
US5858065A (en) * 1995-07-17 1999-01-12 American Air Liquide Process and system for separation and recovery of perfluorocompound gases
US5785741A (en) 1995-07-17 1998-07-28 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges, Claude Process and system for separation and recovery of perfluorocompound gases
JPH0929002A (ja) 1995-07-17 1997-02-04 Teisan Kk ガス回収装置
JP3716030B2 (ja) * 1996-02-29 2005-11-16 日本パイオニクス株式会社 有害ガスの浄化方法
IE80909B1 (en) * 1996-06-14 1999-06-16 Air Liquide An improved process and system for separation and recovery of perfluorocompound gases
US5759237A (en) * 1996-06-14 1998-06-02 L'air Liquide Societe Anonyme Pour L'etude Et, L'exploitation Des Procedes Georges Claude Process and system for selective abatement of reactive gases and recovery of perfluorocompound gases
US5955037A (en) * 1996-12-31 1999-09-21 Atmi Ecosys Corporation Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases
JPH10235185A (ja) * 1997-02-26 1998-09-08 Japan Pionics Co Ltd 有害ガスの浄化剤および浄化方法
US6491884B1 (en) 1999-11-26 2002-12-10 Advanced Technology Materials, Inc. In-situ air oxidation treatment of MOCVD process effluent
DE60123547T2 (de) 2000-11-14 2007-08-09 Japan Pionics Co. Ltd. Verfahren zur Wiedergewinnung einer Kupfer- und/oder Manganverbindung aus Gasreinigungspartikeln
US7364603B2 (en) 2002-12-09 2008-04-29 Applied Materials, Inc. Method and apparatus for the abatement of toxic gas components from a semiconductor manufacturing process effluent stream
US6805728B2 (en) * 2002-12-09 2004-10-19 Advanced Technology Materials, Inc. Method and apparatus for the abatement of toxic gas components from a semiconductor manufacturing process effluent stream
US6843830B2 (en) * 2003-04-15 2005-01-18 Advanced Technology Materials, Inc. Abatement system targeting a by-pass effluent stream of a semiconductor process tool
CN103121663A (zh) * 2011-11-18 2013-05-29 扬光绿能股份有限公司 氢气产生设备
CN106111050A (zh) * 2016-07-08 2016-11-16 常州天兴环保科技有限公司 一种tx‑gf‑jh‑3型废气净化吸附剂

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Also Published As

Publication number Publication date
DE3869301D1 (de) 1992-04-23
US4910001A (en) 1990-03-20
KR960004610B1 (ko) 1996-04-09
EP0309099A1 (en) 1989-03-29
EP0309099B1 (en) 1992-03-18

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