KR850004452A - 붕규산염 유리조성물 - Google Patents
붕규산염 유리조성물 Download PDFInfo
- Publication number
- KR850004452A KR850004452A KR1019840008043A KR840008043A KR850004452A KR 850004452 A KR850004452 A KR 850004452A KR 1019840008043 A KR1019840008043 A KR 1019840008043A KR 840008043 A KR840008043 A KR 840008043A KR 850004452 A KR850004452 A KR 850004452A
- Authority
- KR
- South Korea
- Prior art keywords
- composition
- group
- sio
- glass
- mixtures
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title claims 11
- 239000005388 borosilicate glass Substances 0.000 title 1
- 229910004298 SiO 2 Inorganic materials 0.000 claims 4
- 239000011521 glass Substances 0.000 claims 4
- 239000000463 material Substances 0.000 claims 3
- 229910016036 BaF 2 Inorganic materials 0.000 claims 1
- 229910004261 CaF 2 Inorganic materials 0.000 claims 1
- 229910006404 SnO 2 Inorganic materials 0.000 claims 1
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 claims 1
- 239000006185 dispersion Substances 0.000 claims 1
- 229910052745 lead Inorganic materials 0.000 claims 1
- 229910001512 metal fluoride Inorganic materials 0.000 claims 1
- 230000001590 oxidative effect Effects 0.000 claims 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims 1
- 229910001887 tin oxide Inorganic materials 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/14—Silica-free oxide glass compositions containing boron
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
- C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
- H01C17/065—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thick film techniques, e.g. serigraphy
- H01C17/06506—Precursor compositions therefor, e.g. pastes, inks, glass frits
- H01C17/06573—Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the permanent binder
- H01C17/0658—Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the permanent binder composed of inorganic material
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Inorganic Chemistry (AREA)
- Glass Compositions (AREA)
- Non-Adjustable Resistors (AREA)
- Inorganic Insulating Materials (AREA)
- Developing Agents For Electrophotography (AREA)
Abstract
Description
Claims (5)
- Bi, Cd 및 Pb가 실제적으로 결여되어 있고 다음과 같은 물 %로 구성되며; A. B2O325-55%, SiO215-40%, ZrO20-10%와 SnO20-5% 및 그의 혼합물로 이루어지는 군에서 선택된 물질 50-85%, B. BaO 10-30%, CoO 1-10% 및 원자번호 12-38의 알칼리토금속산화물 0-12 및 산화물과 그의 혼합물로 이루어지는 군에서 선택된 물질 50-15%; 보다 자세하게는 (1) B2O3와 SiO2의 몰비가 B2O3/SiO2 0.8이고, (2) ∑(B2O3+SiO2)50임을 특징으로 하는 유리조성물.
- 제1항에 있어서, A군의 물질이 조성물의 65-75%를 구성하고 B군의 물질이 조성물의 35-25%를 구성하고 있는 조성물.
- 청구범위 제1항의 유리 95-99.9%wt.와 CaF2, BaF2, MgF2, SrF2, NaF, LiF, KF 및 NiF2와 그의 혼합물로 이루어지는 군에서 선택된 불화금속 5-0.1%wt. 구성되는 조성물.
- (1) 산화주석 피로클로르계 전도성상 95-55%wt.와 (2) 청구범위 제1항 또는 제3항의 유리조성물 5-45%wt.의 미세분할입자의 유기매체내 분산물로 구성되는 인쇄성후막 저항기 조성물.
- 비산화 분위기에서 연소시켜 유기매체를 휘발시키고 유리와 전도성상은 소결시킨 청구범위 제4항조성물의 형판박층으로 구성되는 저항기.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US562,965 | 1983-12-19 | ||
US06/562,965 US4536329A (en) | 1983-12-19 | 1983-12-19 | Borosilicate glass compositions |
US562965 | 1983-12-19 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR850004452A true KR850004452A (ko) | 1985-07-15 |
KR870001760B1 KR870001760B1 (ko) | 1987-10-06 |
Family
ID=24248526
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019840008043A KR870001760B1 (ko) | 1983-12-19 | 1984-12-18 | 붕규산염 유리조성물 |
Country Status (7)
Country | Link |
---|---|
US (1) | US4536329A (ko) |
EP (1) | EP0146118B1 (ko) |
JP (1) | JPH063761B2 (ko) |
KR (1) | KR870001760B1 (ko) |
CA (1) | CA1232618A (ko) |
DE (1) | DE3478106D1 (ko) |
DK (1) | DK608484A (ko) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4636332A (en) * | 1985-11-01 | 1987-01-13 | E. I. Du Pont De Nemours And Company | Thick film conductor composition |
US4755490A (en) * | 1986-04-18 | 1988-07-05 | Tektronix, Inc. | Low firing temperature ceramic materials |
US4961999A (en) * | 1988-07-21 | 1990-10-09 | E. I. Du Pont De Nemours And Company | Thermistor composition |
US4906406A (en) * | 1988-07-21 | 1990-03-06 | E. I. Du Pont De Nemours And Company | Thermistor composition |
GB9319971D0 (en) * | 1993-09-28 | 1993-11-17 | Cookson Group Plc | Cobalt glass compositions for coatings |
US5569412A (en) * | 1994-08-18 | 1996-10-29 | E. I. Du Pont De Nemours And Company | Tin oxide based conductive powders and coatings |
JP2017143163A (ja) * | 2016-02-09 | 2017-08-17 | Koa株式会社 | 抵抗ペースト組成物およびそれを用いた厚膜チップ抵抗器 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2757105A (en) * | 1955-02-28 | 1956-07-31 | Gen Electric | Ceramic coating for compressor blades, coated blades and method of making same |
US3413133A (en) * | 1963-04-10 | 1968-11-26 | Owens Corning Fiberglass Corp | Opalescent glass fibers |
US4173518A (en) * | 1974-10-23 | 1979-11-06 | Sumitomo Aluminum Smelting Company, Limited | Electrodes for aluminum reduction cells |
US4065743A (en) * | 1975-03-21 | 1977-12-27 | Trw, Inc. | Resistor material, resistor made therefrom and method of making the same |
US4091144A (en) * | 1976-05-24 | 1978-05-23 | Rca Corporation | Article with electrically-resistive glaze for use in high-electric fields and method of making same |
US4244722A (en) * | 1977-12-09 | 1981-01-13 | Noboru Tsuya | Method for manufacturing thin and flexible ribbon of dielectric material having high dielectric constant |
US4215020A (en) * | 1978-04-03 | 1980-07-29 | Trw Inc. | Electrical resistor material, resistor made therefrom and method of making the same |
US4225468A (en) * | 1978-08-16 | 1980-09-30 | E. I. Du Pont De Nemours And Company | Temperature coefficient of resistance modifiers for thick film resistors |
JPS6022660B2 (ja) * | 1980-09-27 | 1985-06-03 | 富士写真光機株式会社 | 可撓性を有する光学繊維束製造用酸溶出性ガラス |
JPS6025379B2 (ja) * | 1980-09-29 | 1985-06-18 | 日本碍子株式会社 | 鋼板ホ−ロ−用下釉フリツト組成物 |
JPS6049144B2 (ja) * | 1980-10-30 | 1985-10-31 | 東芝硝子株式会社 | 着色フリットガラス混合釉薬 |
US4362656A (en) * | 1981-07-24 | 1982-12-07 | E. I. Du Pont De Nemours And Company | Thick film resistor compositions |
US4548741A (en) * | 1982-06-01 | 1985-10-22 | E. I. Du Pont De Nemours And Company | Method for doping tin oxide |
EP0132810A1 (en) * | 1983-07-25 | 1985-02-13 | E.I. Du Pont De Nemours And Company | Borosilicate glass composition |
-
1983
- 1983-12-19 US US06/562,965 patent/US4536329A/en not_active Expired - Lifetime
-
1984
- 1984-12-13 DE DE8484115334T patent/DE3478106D1/de not_active Expired
- 1984-12-13 EP EP84115334A patent/EP0146118B1/en not_active Expired
- 1984-12-18 DK DK608484A patent/DK608484A/da not_active Application Discontinuation
- 1984-12-18 KR KR1019840008043A patent/KR870001760B1/ko not_active IP Right Cessation
- 1984-12-18 CA CA000470419A patent/CA1232618A/en not_active Expired
- 1984-12-19 JP JP59266534A patent/JPH063761B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS60169101A (ja) | 1985-09-02 |
JPH063761B2 (ja) | 1994-01-12 |
DK608484A (da) | 1985-06-20 |
EP0146118A1 (en) | 1985-06-26 |
EP0146118B1 (en) | 1989-05-10 |
DK608484D0 (da) | 1984-12-18 |
US4536329A (en) | 1985-08-20 |
CA1232618A (en) | 1988-02-09 |
DE3478106D1 (en) | 1989-06-15 |
KR870001760B1 (ko) | 1987-10-06 |
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A201 | Request for examination | ||
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Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 19841218 |
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Comment text: Notification of reason for refusal Patent event date: 19870316 Patent event code: PE09021S01D |
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Comment text: Decision on Publication of Application Patent event code: PG16051S01I Patent event date: 19870903 |
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Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 19871221 |
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