[go: up one dir, main page]

KR20220004545A - X선 분석 장치 - Google Patents

X선 분석 장치 Download PDF

Info

Publication number
KR20220004545A
KR20220004545A KR1020210055033A KR20210055033A KR20220004545A KR 20220004545 A KR20220004545 A KR 20220004545A KR 1020210055033 A KR1020210055033 A KR 1020210055033A KR 20210055033 A KR20210055033 A KR 20210055033A KR 20220004545 A KR20220004545 A KR 20220004545A
Authority
KR
South Korea
Prior art keywords
ray
sample
spectrum
energy
intensity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020210055033A
Other languages
English (en)
Korean (ko)
Inventor
하루오 다카하시
Original Assignee
가부시키가이샤 히다치 하이테크 사이언스
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 히다치 하이테크 사이언스 filed Critical 가부시키가이샤 히다치 하이테크 사이언스
Publication of KR20220004545A publication Critical patent/KR20220004545A/ko
Pending legal-status Critical Current

Links

Images

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
    • G01N23/2076Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions for spectrometry, i.e. using an analysing crystal, e.g. for measuring X-ray fluorescence spectrum of a sample with wavelength-dispersion, i.e. WDXFS
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/2204Specimen supports therefor; Sample conveying means therefore
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/07Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076X-ray fluorescence

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
KR1020210055033A 2020-07-03 2021-04-28 X선 분석 장치 Pending KR20220004545A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2020-127755 2020-07-03
JP2020127755A JP7562324B2 (ja) 2020-07-03 2020-07-03 X線分析装置

Publications (1)

Publication Number Publication Date
KR20220004545A true KR20220004545A (ko) 2022-01-11

Family

ID=79010192

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020210055033A Pending KR20220004545A (ko) 2020-07-03 2021-04-28 X선 분석 장치

Country Status (4)

Country Link
JP (2) JP7562324B2 (zh)
KR (1) KR20220004545A (zh)
CN (1) CN113884524A (zh)
TW (1) TW202215000A (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2024042215A (ja) 2022-09-15 2024-03-28 株式会社日立ハイテクサイエンス X線分析装置およびx線分析方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06273147A (ja) 1993-03-19 1994-09-30 Seiko Instr Inc 蛍光x線微小部膜厚計
JPH06273146A (ja) 1993-03-19 1994-09-30 Seiko Instr Inc 帯状の試料の中心を検出する方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61250508A (ja) * 1985-04-30 1986-11-07 Seiko Instr & Electronics Ltd 膜厚測定装置
JPS6457556A (en) * 1987-08-27 1989-03-03 Shimadzu Corp Stage movement controller for electron beam analyzer
JPH10216651A (ja) * 1997-02-13 1998-08-18 Ishikawajima Harima Heavy Ind Co Ltd 金属選別方法とこの方法を用いた金属選別装置
US6266390B1 (en) * 1998-09-21 2001-07-24 Spectramet, Llc High speed materials sorting using x-ray fluorescence
JP3146195B2 (ja) * 1999-01-22 2001-03-12 株式会社堀場製作所 X線マッピング装置
JP2001099795A (ja) * 1999-09-30 2001-04-13 Shimadzu Corp 元素マッピング装置
JP3888980B2 (ja) * 2003-03-18 2007-03-07 株式会社日立ハイテクノロジーズ 物質同定システム
JP4413887B2 (ja) * 2006-05-29 2010-02-10 株式会社日立ハイテクノロジーズ 物質同定システム
JP4870014B2 (ja) * 2007-04-12 2012-02-08 三菱電機株式会社 再生プラスチック材料選別方法
US20130022167A1 (en) * 2011-07-22 2013-01-24 Creative Electron, Inc. High Speed, Non-Destructive, Reel-to-Reel Chip/Device Inspection System and Method Utilizing Low Power X-rays/X-ray Fluorescence
US8855809B2 (en) * 2011-09-01 2014-10-07 Spectramet, Llc Material sorting technology
JP2016017823A (ja) * 2014-07-08 2016-02-01 株式会社日立ハイテクサイエンス X線分析用試料板及び蛍光x線分析装置
JP6305280B2 (ja) * 2014-08-28 2018-04-04 株式会社日立ハイテクサイエンス 蛍光x線分析装置及びその試料表示方法
WO2020105566A1 (ja) * 2018-11-19 2020-05-28 キヤノン株式会社 情報処理装置、情報処理装置の制御方法、プログラム、算出装置、及び算出方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06273147A (ja) 1993-03-19 1994-09-30 Seiko Instr Inc 蛍光x線微小部膜厚計
JPH06273146A (ja) 1993-03-19 1994-09-30 Seiko Instr Inc 帯状の試料の中心を検出する方法

Also Published As

Publication number Publication date
JP7562324B2 (ja) 2024-10-07
TW202215000A (zh) 2022-04-16
JP2024174008A (ja) 2024-12-13
CN113884524A (zh) 2022-01-04
JP2022013497A (ja) 2022-01-18

Similar Documents

Publication Publication Date Title
US11112371B2 (en) X-ray spectrometer
US10180404B2 (en) X-ray analysis device
EP3521814B1 (en) Wavelength-dispersive x-ray fluorescence spectrometer and x-ray fluorescence analysing method using the same
US20140151569A1 (en) Method and apparatus for analysis of samples
US7113566B1 (en) Enhancing resolution of X-ray measurements by sample motion
US20160041110A1 (en) X-ray transmission inspection apparatus and extraneous substance detecting method
US6885726B2 (en) Fluorescent X-ray analysis apparatus
KR101862692B1 (ko) 검사 설비, 검사 방법 및 검사 시스템
JP2024174008A (ja) X線分析装置
JPH0238850A (ja) X線分光器を用いた定性分析方法
US9213007B2 (en) Foreign matter detector
US20140098940A1 (en) Method and apparatus for investigating the x-ray radiographic properties of samples
US20080089478A1 (en) Collimator with adjustable focal length
CN110320220B (zh) 分析材料短程有序结构和长程有序结构的装置和方法
US11442031B2 (en) Apparatus for selecting products on the basis of their composition by X ray fluorescent spectroscopy and corresponding selection method
JP4658117B2 (ja) 物体の密度と寸法特性を測定する方法およびシステムならびに製造中の核燃料ペレットを検査する応用例
JP6506629B2 (ja) X線受光装置およびこれを備えたx線検査装置
JPH0288952A (ja) 組織を分析する方法および装置
WO2022118585A1 (ja) 全反射蛍光x線分析装置
JP2005172568A (ja) 光学装置及びそれを有する測定装置
JP2921910B2 (ja) 全反射蛍光x線分析装置
KR20240037830A (ko) X선 분석 장치 및 x선 분석 방법
JPS6315546B2 (zh)
JP2007064727A (ja) X線検査装置とx線検査方法
JPS6353457A (ja) 二次元走査型状態分析装置

Legal Events

Date Code Title Description
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 20210428

PG1501 Laying open of application