KR20200100124A - Modified Perovskite Composite Oxide, Manufacturing Method thereof, and Composite Dielectric Material - Google Patents
Modified Perovskite Composite Oxide, Manufacturing Method thereof, and Composite Dielectric Material Download PDFInfo
- Publication number
- KR20200100124A KR20200100124A KR1020207020496A KR20207020496A KR20200100124A KR 20200100124 A KR20200100124 A KR 20200100124A KR 1020207020496 A KR1020207020496 A KR 1020207020496A KR 20207020496 A KR20207020496 A KR 20207020496A KR 20200100124 A KR20200100124 A KR 20200100124A
- Authority
- KR
- South Korea
- Prior art keywords
- group
- composite oxide
- perovskite
- type composite
- modified
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 238000000034 method Methods 0.000 claims description 31
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- GJBRNHKUVLOCEB-UHFFFAOYSA-N tert-butyl benzenecarboperoxoate Chemical compound CC(C)(C)OOC(=O)C1=CC=CC=C1 GJBRNHKUVLOCEB-UHFFFAOYSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- JEPXSTGVAHHRBD-UHFFFAOYSA-N trimethoxy(nonyl)silane Chemical compound CCCCCCCCC[Si](OC)(OC)OC JEPXSTGVAHHRBD-UHFFFAOYSA-N 0.000 description 1
- LCXXOYOABWDYBF-UHFFFAOYSA-N trimethoxy(pentadecyl)silane Chemical compound CCCCCCCCCCCCCCC[Si](OC)(OC)OC LCXXOYOABWDYBF-UHFFFAOYSA-N 0.000 description 1
- AXNJHBYHBDPTQF-UHFFFAOYSA-N trimethoxy(tetradecyl)silane Chemical compound CCCCCCCCCCCCCC[Si](OC)(OC)OC AXNJHBYHBDPTQF-UHFFFAOYSA-N 0.000 description 1
- QSYYSIXGDAAPNN-UHFFFAOYSA-N trimethoxy(tridecyl)silane Chemical compound CCCCCCCCCCCCC[Si](OC)(OC)OC QSYYSIXGDAAPNN-UHFFFAOYSA-N 0.000 description 1
- LIJFLHYUSJKHKV-UHFFFAOYSA-N trimethoxy(undecyl)silane Chemical compound CCCCCCCCCCC[Si](OC)(OC)OC LIJFLHYUSJKHKV-UHFFFAOYSA-N 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229920003169 water-soluble polymer Polymers 0.000 description 1
- 150000007964 xanthones Chemical class 0.000 description 1
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Abstract
하기 일반식 (1)로 표시되는 실란 커플링제에 의해 페로브스카이트형 복합 산화물 입자의 표면이 피복되어 있는 개질 페로브스카이트형 복합 산화물.
(XY)aSi(OZ)4-a (1)
(일반식 (1) 중, X는 수소 원자, 에폭시기, 아미노기, 비닐기, (메트)아크릴기, 이소시아네이트기 또는 머캅토기이며, Y는 탄소 원자수 5 이상의 직쇄상 알킬렌기이며, Z는 수소 원자, 탄소 원자수 1 내지 3의 알킬기, 아세틸기 또는 탄소 원자수 2 내지 4의 알콕시알킬기이며, a는 1 또는 2이다.)A modified perovskite composite oxide in which the surface of perovskite composite oxide particles is coated with a silane coupling agent represented by the following general formula (1).
(XY) a Si(OZ) 4-a (1)
(In general formula (1), X is a hydrogen atom, an epoxy group, an amino group, a vinyl group, a (meth)acryl group, an isocyanate group, or a mercapto group, Y is a linear alkylene group having 5 or more carbon atoms, and Z is a hydrogen atom. , An alkyl group having 1 to 3 carbon atoms, an acetyl group or an alkoxyalkyl group having 2 to 4 carbon atoms, and a is 1 or 2.)
Description
본 발명은, 복합 유전체나 복합 압전체의 무기 충전재로서 유용한 개질 페로브스카이트형 복합 산화물 및 그의 제조 방법, 그리고 개질 페로브스카이트형 복합 산화물을 포함하는 복합 유전체 재료에 관한 것이다.The present invention relates to a modified perovskite-type composite oxide useful as an inorganic filler for a composite dielectric or a composite piezoelectric body, a method for producing the same, and a composite dielectric material containing a modified perovskite-type composite oxide.
종래, 일렉트로닉스 산업에 있어서의 고도의 전자 제어화 중에 있어서, 고성능이 필요한 수동 디바이스로서는, 세라믹 분말을 성형한 후, 이것을 소성하여 얻어지는 세라믹 소결체가 다용되어 왔다. 전자 회로의 처리나 부품의 실장은, 복잡화하면서도 저비용화, 공간 절약화, 고속화, 고신뢰성화 등 많은 요구를 받고 있고, 지금도 진화를 계속하고 있다. 이러한 배경 하에, 세라믹 소결체는 치수나 형상, 실장 등 성형법에서 기인하여 많은 제약을 받고 있다. 또한, 소결체는 고경도이며 취성이기 때문에, 자유로운 가공이 곤란하여, 임의의 형상이나 복잡한 형상을 얻기 위해서는 극도로 곤란하였다.BACKGROUND ART [0002] Conventionally, as a passive device requiring high performance in advanced electronic control in the electronics industry, ceramic sintered bodies obtained by molding ceramic powder and then firing it have been widely used. The processing of electronic circuits and mounting of components are complex, yet are receiving many demands such as reduction in cost, space saving, high speed, and high reliability, and continues to evolve even now. Under this background, ceramic sintered bodies are subject to many restrictions due to molding methods such as dimensions, shapes, and mounting. Further, since the sintered body is highly hard and brittle, it is difficult to freely process it, and it is extremely difficult to obtain an arbitrary shape or a complicated shape.
이 때문에, 수지 중에 강유전체, 초전체, 압전체라고 하는 광의로 유전체라 총칭되는 무기 충전재를 분산시킨 복합 유전체 재료가, 가공성이 우수하고, 고유전 특성, 저손실 특성, 초전 특성, 압전 특성 등 다채로운 기능을 구비할 수 있는 새로운 소재로서 주목받고 있다.For this reason, composite dielectric materials in which inorganic fillers collectively referred to as dielectrics in a broad sense such as ferroelectrics, pyroelectrics, and piezoelectrics are dispersed in a resin, are excellent in processability, and have various functions such as high dielectric properties, low loss properties, pyroelectric properties, and piezoelectric properties. It is attracting attention as a new material that can be provided.
여기에서 사용되는 무기 충전재로서는, 예를 들어 페로브스카이트형 복합 산화물이 알려져 있다(예를 들어, 특허문헌 1을 참조). 그러나, 페로브스카이트형 복합 산화물은, 비표면적이 경시 변화하며, 유전 특성을 저하시킨다는 문제가 있고, 또한 물과 접촉하면 구조 중의 Ba, Ca, Sr, Mg 등의 A 사이트 금속이 용출되고, 이에 수반하여 수지와 무기 충전재의 계면이 박리되거나, 이온 마이그레이션에 의해 절연 열화가 일어난다는 문제가 있었다.As the inorganic filler used here, for example, a perovskite type composite oxide is known (see, for example, Patent Document 1). However, the perovskite-type composite oxide has a problem that the specific surface area changes with time and decreases the dielectric properties, and when it comes into contact with water, A-site metals such as Ba, Ca, Sr, and Mg in the structure are eluted. As a result, there is a problem that the interface between the resin and the inorganic filler is peeled off, or insulation deterioration occurs due to ion migration.
한편, 특허문헌 2 내지 4에 기재된 바와 같이, 수지 중에 있어서의 분산성을 향상시킬 목적으로, 티타늄산바륨 등의 무기 충전재를 커플링제로 표면 처리하는 것이 알려져 있다.On the other hand, as described in
특허문헌 5 및 6에서는, 수지와의 혼합성을 개선하기 위해서, 티타늄산바륨 등의 금속 산화물에 대하여, 실란 커플링제에 의해 표면 처리하는 것이 기재되어 있다.In
그러나, 본 발명자들이 검토한 결과, 페로브스카이트형 복합 산화물 입자의 표면을 커플링제로 단순히 처리해도, 비표면적의 경시 변화나 Ba 등의 A 사이트 금속의 용출을 충분히 저감시킬 수 없어, 수지와의 혼합성에 대해서도 개선의 여지가 있음을 알았다. 수지에 대한 균질한 충전성이나 수지와의 친화성은, 유기 용매에 대한 호분산성이 불가결하고, 페로브스카이트형 복합 산화물을 미처리인 채로 또는 종래의 커플링제로 표면 처리해도, 유기 용매 중에서는 충분한 분산을 얻는 것이 곤란하였다.However, as a result of investigation by the present inventors, even if the surface of the perovskite composite oxide particles is simply treated with a coupling agent, the change in specific surface area over time and the elution of the A-site metal such as Ba cannot be sufficiently reduced. It was found that there was room for improvement in the mixability. Homogeneous filling properties for resins and affinity with resins are indispensable for homodispersity in organic solvents, and even if the perovskite-type complex oxide is untreated or surface-treated with a conventional coupling agent, it is sufficiently dispersed in an organic solvent. It was difficult to obtain.
따라서, 본 발명의 목적은, 상기 과제를 해결하기 위해서, 수지 중으로의 충전성 및 분산성이 우수한 페로브스카이트형 복합 산화물 및 그의 제조 방법을 제공하는 데 있다.Accordingly, an object of the present invention is to provide a perovskite composite oxide having excellent filling properties and dispersibility in a resin and a method for producing the same in order to solve the above problems.
본 발명자들은 상기 실정을 감안하여 예의 연구를 거듭한 결과, 특정한 실란 커플링제에 의해 피복된 페로브스카이트형 복합 산화물은, 유기 용매로의 분산성이 우수한 것이 되어, 수지 중으로의 충전성 및 분산성이 우수한 것을 발견하고, 본 발명을 완성시키기에 이르렀다.The present inventors have conducted extensive research in view of the above circumstances. As a result, the perovskite-type composite oxide coated with a specific silane coupling agent has excellent dispersibility in an organic solvent, and the filling property and dispersibility in the resin. This excellent thing was discovered, and the present invention was completed.
즉, 본 발명은, 하기 일반식 (1)로 표시되는 실란 커플링제에 의해 페로브스카이트형 복합 산화물 입자의 표면이 피복되어 있는 것을 특징으로 하는 개질 페로브스카이트형 복합 산화물이다.That is, the present invention is a modified perovskite composite oxide characterized in that the surface of the perovskite composite oxide particles is coated with a silane coupling agent represented by the following general formula (1).
(XY)aSi(OZ)4-a (1) (XY) a Si(OZ) 4-a (1)
(일반식 (1) 중, X는 수소 원자, 에폭시기, 아미노기, 비닐기, (메트)아크릴기, 이소시아네이트기 또는 머캅토기이며, Y는 탄소 원자수 5 이상의 직쇄상 알킬렌기이며, Z는 수소 원자, 탄소 원자수 1 내지 3의 알킬기, 아세틸기 또는 탄소 원자수 2 내지 4의 알콕시알킬기이며, a는 1 또는 2이다.)(In general formula (1), X is a hydrogen atom, an epoxy group, an amino group, a vinyl group, a (meth)acryl group, an isocyanate group, or a mercapto group, Y is a linear alkylene group having 5 or more carbon atoms, and Z is a hydrogen atom. , An alkyl group having 1 to 3 carbon atoms, an acetyl group or an alkoxyalkyl group having 2 to 4 carbon atoms, and a is 1 or 2.)
또한, 본 발명은, 페로브스카이트형 복합 산화물과 상기 일반식 (1)로 표시되는 실란 커플링제를 혼합한 후, 그 혼합물을 기류식 분쇄기에 공급함으로써 페로브스카이트형 복합 산화물을 분쇄하면서 페로브스카이트형 복합 산화물 입자의 표면을 상기 실란 커플링제로 피복하는 것을 특징으로 하는 개질 페로브스카이트형 복합 산화물의 제조 방법이다.Further, in the present invention, after mixing the perovskite-type composite oxide with the silane coupling agent represented by the general formula (1), the mixture is supplied to an air flow type mill to pulverize the perovskite-type composite oxide. A method for producing a modified perovskite-type composite oxide, characterized in that the surface of the skyt-type composite oxide particle is coated with the silane coupling agent.
본 발명에 따르면, 수지 중으로의 충전성 및 분산성이 우수한 개질 페로브스카이트형 복합 산화물 및 그의 제조 방법을 제공할 수 있다.According to the present invention, it is possible to provide a modified perovskite composite oxide having excellent filling properties and dispersibility in a resin, and a method for producing the same.
도 1은 실시예 1에서 얻어진 개질 티타늄산바륨 입자의 유기 용매 중에서의 입도 분포 측정 결과이다.
도 2는 비교예 1에서 얻어진 티타늄산바륨 입자의 유기 용매 중에서의 입도 분포 측정 결과이다.
도 3은 비교예 1에서 얻어진 티타늄산바륨 입자의 수 중에서의 입도 분포 측정 결과이다.1 is a result of measuring the particle size distribution of modified barium titanate particles obtained in Example 1 in an organic solvent.
2 is a result of measurement of particle size distribution of barium titanate particles obtained in Comparative Example 1 in an organic solvent.
3 is a measurement result of particle size distribution in water of barium titanate particles obtained in Comparative Example 1.
<개질 페로브스카이트형 복합 산화물><Modified perovskite type composite oxide>
본 발명의 개질 페로브스카이트형 복합 산화물은, 페로브스카이트형 복합 산화물 입자의 표면을, 하기 일반식 (1)로 표시되는 실란 커플링제에 의해 피복한 것이다.The modified perovskite-type composite oxide of the present invention is obtained by coating the surface of perovskite-type composite oxide particles with a silane coupling agent represented by the following general formula (1).
(XY)aSi(OZ)4-a (1) (XY) a Si(OZ) 4-a (1)
(일반식 (1) 중, X는 수소 원자, 에폭시기, 아미노기, 비닐기, (메트)아크릴기, 이소시아네이트기 또는 머캅토기이며, Y는 탄소 원자수 5 이상의 직쇄상 알킬렌기이며, Z는 수소 원자, 탄소 원자수 1 내지 3의 알킬기, 아세틸기 또는 탄소 원자수 2 내지 4의 알콕시알킬기이며, a는 1 또는 2이다.)(In general formula (1), X is a hydrogen atom, an epoxy group, an amino group, a vinyl group, a (meth)acryl group, an isocyanate group, or a mercapto group, Y is a linear alkylene group having 5 or more carbon atoms, and Z is a hydrogen atom. , An alkyl group having 1 to 3 carbon atoms, an acetyl group or an alkoxyalkyl group having 2 to 4 carbon atoms, and a is 1 or 2.)
개질 대상이 되는 페로브스카이트형 복합 산화물은, 특별히 제한되는 것은 아니고, 티타늄산바륨, 티타늄산스트론튬, 티타늄산칼슘, 니오브산칼륨, 니오브산나트륨, 니오브산칼륨나트륨, 니오브산칼륨나트륨리튬, 티타늄산비스무트칼륨, 티타늄산비스무트나트륨, 철산비스무트, 탄탈산칼륨, 또한 이들 복합 고용체로서, 탄탈산니오브산칼륨, 탄탈산니오브산칼륨나트륨리튬 등을 들 수 있다. 이들 페로브스카이트형 복합 산화물은 1종 단독으로 사용해도 되고, 2종 이상을 조합하여 사용해도 된다.The perovskite-type composite oxide to be modified is not particularly limited, and barium titanate, strontium titanate, calcium titanate, potassium niobate, sodium niobate, sodium potassium niobate, sodium potassium niobate lithium, titanium Potassium bismuth acid, sodium bismuth titanate, bismuth iron acid, potassium tantalate, and the complex solid solution of these include potassium tantalate niobate, potassium niobate sodium tantalate, and the like. These perovskite type composite oxides may be used singly or in combination of two or more.
이러한 페로브스카이트형 복합 산화물의 제조 이력은, 특별히 제한되는 것은 아니고, 예를 들어 공침법, 가수 분해법, 수열 합성법 등의 습식법, 졸-겔법, 고상법 등의 공지된 방법으로 얻어지는 것이 사용된다. 이들 페로브스카이트형 복합 산화물의 물성으로서는, 특별히 제한되는 것은 아니지만, BET 비표면적이 바람직하게는 0.2m2/g 내지 20m2/g, 보다 바람직하게는 0.3m2/g 내지 15m2/g인 것이, 분쇄 공정에서의 취급의 관점에서 바람직하다. 또한, 페로브스카이트형 복합 산화물의 평균 입자 직경이 바람직하게는 0.1㎛ 내지 10㎛, 보다 바람직하게는 0.15㎛ 내지 5㎛인 것이, 분쇄 공정에서의 취급이 관점에서 바람직하다. 이 평균 입자 직경은, 레이저 회절 산란법에 의해 물을 분산매로서 사용하여 측정한 메디안 직경(D50)이다.The production history of such a perovskite composite oxide is not particularly limited, and for example, those obtained by known methods such as a coprecipitation method, a hydrolysis method, a hydrothermal synthesis method and the like, a sol-gel method, and a solid phase method are used. The physical properties of these perovskite composite oxides are not particularly limited, but the BET specific surface area is preferably 0.2 m 2 /g to 20 m 2 /g, more preferably 0.3 m 2 /g to 15 m 2 /g. This is preferable from the viewpoint of handling in the pulverizing step. In addition, the average particle diameter of the perovskite composite oxide is preferably 0.1 µm to 10 µm, more preferably 0.15 µm to 5 µm, and handling in the pulverizing step is preferable from the viewpoint of handling. This average particle diameter is a median diameter (D50) measured using water as a dispersion medium by a laser diffraction scattering method.
또한, 개질 대상이 되는 페로브스카이트형 복합 산화물의 입자 형상은, 특별히 제한되는 것은 아니고, 구상, 입상, 판상, 인편상, 위스커상, 봉상, 필라멘트상 등 중 어느 것이어도 된다.In addition, the particle shape of the perovskite-type composite oxide to be modified is not particularly limited, and may be any of a spherical shape, a granular shape, a plate shape, a scale shape, a whisker shape, a rod shape, a filament shape, and the like.
일반식 (1)에 있어서 X는, 수소 원자, 에폭시기, 아미노기, 비닐기, (메트)아크릴기, 이소시아네이트기 또는 머캅토기이다. 이들 중에서도 일반적인 유기 용매로의 분산성 부여라는 관점에서, 수소 원자인 것이 바람직하다.In General Formula (1), X is a hydrogen atom, an epoxy group, an amino group, a vinyl group, a (meth)acryl group, an isocyanate group, or a mercapto group. Among these, it is preferably a hydrogen atom from the viewpoint of imparting dispersibility to a general organic solvent.
일반식 (1)에 있어서 Y로 표시되는 탄소 원자수 5 이상의 직쇄상 알킬렌기로서는, n-펜틸렌기, n-헥실렌기, n-헵틸렌기, n-옥틸렌기, n-노닐렌기, n-데실렌기, n-운데실렌기, n-도데실렌기, n-트리데실렌기, n-테트라데실렌기, n-펜타데실렌기, n-헥사데실렌기, n-헵타데실렌기, n-옥타데실렌기, n-노나데실렌기 등을 들 수 있다. 입수의 용이함의 관점에서, 직쇄상 알킬렌기의 탄소 원자수는 5 이상 20 이하인 것이 바람직하다.Examples of the linear alkylene group having 5 or more carbon atoms represented by Y in the general formula (1) include n-pentylene group, n-hexylene group, n-heptylene group, n-octylene group, n-nonylene group, and n- Decylene group, n-undecylene group, n-dodecylene group, n-tridecylene group, n-tetradecylene group, n-pentadecylene group, n-hexadecylene group, n-heptadecylene group , n-octadecylene group, n-nonadecylene group, etc. are mentioned. From the viewpoint of availability, it is preferable that the number of carbon atoms in the linear alkylene group is 5 or more and 20 or less.
일반식 (1)에 있어서 Z로 표시되는 탄소 원자수 1 내지 3의 알킬기로서는, 메틸기, 에틸기, 프로필기 등을 들 수 있다. 또한, 일반식 (1)에 있어서 Z로 표시되는 탄소 원자수 2 내지 4의 알콕시알킬기로서는, 메톡시메틸기, 에톡시메틸기, 메톡시에틸기, 에톡시에틸기 등을 들 수 있다.Examples of the alkyl group having 1 to 3 carbon atoms represented by Z in the general formula (1) include a methyl group, an ethyl group, and a propyl group. In addition, examples of the alkoxyalkyl group having 2 to 4 carbon atoms represented by Z in the general formula (1) include a methoxymethyl group, an ethoxymethyl group, a methoxyethyl group, and an ethoxyethyl group.
일반식 (1)로 표시되는 실란 커플링제의 구체예로서는, 헥실트리메톡시실란(X=수소, Y=n-헥실렌기, Z=메틸기, a=1), 헵틸트리메톡시실란(X=수소, Y=n-헵틸렌기, Z=메틸기, a=1), 옥틸트리에톡시실란(X=수소, Y=n-옥틸렌기, Z=에틸기, a=1), 노닐트리메톡시실란(X=수소, Y=n-노닐렌기, Z=메틸기, a=1), 데실트리메톡시실란(X=수소, Y=n-데실렌기, Z=메틸기, a=1), 운데실트리메톡시실란(X=수소, Y=n-운데실렌기, Z=메틸기, a=1), 도데실트리메톡시실란(X=수소, Y=n-도데실렌기, Z=메틸기, a=1), 트리데실트리메톡시실란(X=수소, Y=n-트리데실렌기, Z=메틸기, a=1), 테트라데실트리메톡시실란(X=수소, Y=n-테트라데실렌기, Z=메틸기, a=1), 펜타데실트리메톡시실란(X=수소, Y=n-펜타데실렌기, Z=메틸기, a=1) 등을 들 수 있다. 이들 중에서도, 일반적인 유기 용매로의 분산성 부여라는 관점에서, 헥실트리메톡시실란, 옥틸트리에톡시실란 및 데실트리메톡시실란이 바람직하다.As a specific example of the silane coupling agent represented by general formula (1), hexyltrimethoxysilane (X=hydrogen, Y=n-hexylene group, Z=methyl group, a=1), heptyltrimethoxysilane (X= Hydrogen, Y=n-heptylene group, Z=methyl group, a=1), octyltriethoxysilane (X=hydrogen, Y=n-octylene group, Z=ethyl group, a=1), nonyltrimethoxysilane ( X=hydrogen, Y=n-nonylene group, Z=methyl group, a=1), decyltrimethoxysilane (X=hydrogen, Y=n-decylene group, Z=methyl group, a=1), undecyltri Methoxysilane (X=hydrogen, Y=n-undecylene group, Z=methyl group, a=1), dodecyltrimethoxysilane (X=hydrogen, Y=n-dodecylene group, Z=methyl group, a= 1), tridecyltrimethoxysilane (X=hydrogen, Y=n-tridecylene group, Z=methyl group, a=1), tetradecyltrimethoxysilane (X=hydrogen, Y=n-tetradecylene Group, Z=methyl group, a=1), pentadecyltrimethoxysilane (X=hydrogen, Y=n-pentadecylene group, Z=methyl group, a=1), etc. are mentioned. Among these, hexyltrimethoxysilane, octyltriethoxysilane, and decyltrimethoxysilane are preferable from the viewpoint of imparting dispersibility to a general organic solvent.
레이저 회절 산란법에 의해 유기 용매를 분산매로서 사용하여 측정한 본 발명의 개질 페로브스카이트형 복합 산화물(일반식 (1)로 표시되는 실란 커플링제에 의해 피복한 페로브스카이트형 복합 산화물)의 평균 입자 직경(D50)을 Dos라 하고, 레이저 회절 산란법에 의해 물을 분산매로서 사용하여 측정한 미개질 페로브스카이트형 복합 산화물(개질하기 전의 페로브스카이트형 복합 산화물)의 평균 입자 직경(D50)을 Dw라 하였을 때, Dos/Dw로 표시되는 응집도가 1.4 이하인 것이 바람직하고, 1.2 이하인 것이 보다 바람직하다. 응집도가 1.4 이하이면, 물에 대하여 습윤성이 비교적 양호한 페로브스카이트형 복합 산화물과 마찬가지로 유기 용매 중에서도 분산된 상태로 취급할 수 있는 것을 의미한다. 여기에서 사용하는 유기 용매로서는, 특별히 제한되지 않지만, 메틸에틸케톤, 아세톤, n-헥산, 메탄올, 에탄올, 톨루엔, 시클로펜타논 등을 들 수 있다.Average of the modified perovskite composite oxide of the present invention (perovskite composite oxide coated with a silane coupling agent represented by the general formula (1)) measured by using an organic solvent as a dispersion medium by laser diffraction scattering method The particle diameter (D50) is called Dos, and the average particle diameter (D50) of the unmodified perovskite composite oxide (perovskite composite oxide before modification) measured using water as a dispersion medium by laser diffraction scattering method When is Dw, the degree of cohesion expressed by Dos/Dw is preferably 1.4 or less, and more preferably 1.2 or less. If the degree of aggregation is 1.4 or less, it means that it can be handled in a dispersed state even in an organic solvent, similarly to the perovskite-type composite oxide having relatively good wettability with respect to water. Although it does not specifically limit as an organic solvent used here, Methyl ethyl ketone, acetone, n-hexane, methanol, ethanol, toluene, cyclopentanone, etc. are mentioned.
또한, 본 발명의 개질 페로브스카이트형 복합 산화물은, 흡습 수분량이 0.3질량% 이하인 것이 바람직하고, 0.25질량% 이하인 것이 보다 바람직하다. 흡습 수분량이 0.3질량% 이하이면, 기재인 페로브스카이트형 복합 산화물의 표면이 수분에 의해 수산화물 또는 탄산 화합물로 변화되는 정도가 낮아, 입자 형상의 변화나 전기 특성의 저하를 방지할 수 있다. 또한, 본 명세서에 있어서, 개질 페로브스카이트형 복합 산화물의 흡습 수분량은, 이하의 방법으로 구해진다.In addition, the modified perovskite composite oxide of the present invention preferably has a moisture absorption content of 0.3% by mass or less, and more preferably 0.25% by mass or less. When the moisture absorption moisture content is 0.3% by mass or less, the degree to which the surface of the perovskite composite oxide as a base material changes to a hydroxide or a carbonate compound by moisture is low, and a change in particle shape and a decrease in electrical properties can be prevented. In addition, in this specification, the moisture absorption moisture content of a modified perovskite type composite oxide is calculated|required by the following method.
먼저, 제조 직후의 개질 페로브스카이트형 복합 산화물 시료를 정칭 (A)하고, 이 시료를 선반단 건조기에서 105℃, 2시간의 조건으로 가열하여 얻어진 건조물을 정칭 (B)한다. 이것과는 별도로 제조 직후의 개질 페로브스카이트형 복합 산화물 시료를 정칭 (a)하고, 이 시료를 40℃, 습도 90%의 환경 하에서 180분간 정치하여 흡습시켜 얻어진 흡습 시료를 정칭 (c)한다. 이 흡습 시료를 선반단 건조기에서 105℃, 2시간의 조건으로 가열하여 얻어진 건조물을 정칭 (b)한다. 다음 식에 의해 부착 수분량을 구하여, 시료에 흡습한 수분량(질량%)으로 한다.First, a modified perovskite-type composite oxide sample immediately after production is accurately weighed (A), and the dried product obtained by heating this sample in a shelf-stage dryer at 105° C. for 2 hours is accurately weighed (B). Separately from this, a modified perovskite-type composite oxide sample immediately after production is accurately weighed (a), and the sample is allowed to stand for 180 minutes in an environment of 40°C and 90% humidity to absorb moisture, and thus a moisture absorption sample obtained is accurately measured (c). The dried product obtained by heating this moisture absorption sample in a drying machine at 105° C. for 2 hours is accurately weighed (b). The amount of adhered moisture is determined by the following equation, and it is taken as the amount of moisture absorbed into the sample (mass%).
흡습 수분량(질량%)=(((c-b)/a)×100)-(((A-B)/A)×100)Moisture absorption (% by mass) = (((c-b)/a)×100)-(((A-B)/A)×100)
본 발명의 개질 페로브스카이트형 복합 산화물은, 개질 대상이 되는 페로브스카이트형 복합 산화물과, 상기 일반식 (1)로 표시되는 실란 커플링제를 혼합한 후, 그 혼합물을 기류식 분쇄기에 공급함으로써, 페로브스카이트형 복합 산화물을 분쇄하면서 페로브스카이트형 복합 산화물 입자의 표면을 실란 커플링제로 피복함으로써 제조할 수 있다. 페로브스카이트형 복합 산화물과 상기 일반식 (1)로 표시되는 실란 커플링제의 혼합물을, 기류식 분쇄기에 공급함으로써, 분쇄되는 과정에서 노출되는 페로브스카이트형 복합 산화물의 새로운 표면을 상기 일반식 (1)로 표시되는 실란 커플링제로 즉시 피복할 수 있기 때문에, 주위 환경에 폭로되어 수분과 접촉하는 기회를 저감시킬 수 있어, A 사이트 금속의 용출이나 비표면적의 경시 변화를 억제할 수 있다.The modified perovskite-type composite oxide of the present invention is obtained by mixing the perovskite-type composite oxide to be modified with the silane coupling agent represented by the general formula (1), and then supplying the mixture to an air flow type mill. , It can be produced by pulverizing the perovskite-type composite oxide and coating the surface of the perovskite-type composite oxide particles with a silane coupling agent. By supplying a mixture of the perovskite-type composite oxide and the silane coupling agent represented by the general formula (1) to an airflow-type grinder, a new surface of the perovskite-type composite oxide exposed in the process of being pulverized is obtained from the general formula ( Since it can be immediately coated with the silane coupling agent represented by 1), the chance of exposure to the surrounding environment and contact with moisture can be reduced, and elution of the A-site metal and changes in the specific surface area over time can be suppressed.
페로브스카이트형 복합 산화물과 실란 커플링제의 혼합 방법은, 특별히 제한되는 것은 아니지만, 실란 커플링제를 페로브스카이트형 복합 산화물에 분무하는 방법, 고체의 실란 커플링제를 페로브스카이트형 복합 산화물과 건식 혼합하는 방법, 유기 용매 중에 분산된 페로브스카이트형 복합 산화물에 대하여 액체의 실란 커플링제를 첨가하고, 여과 건조시켜 혼합물을 얻는 방법 등을 들 수 있다. 실란 커플링제는 원액인 채로 사용해도 되고, 적당한 용매(알코올류, 케톤류, 에테르류 등)에 녹인 것을 사용해도 된다. 페로브스카이트형 복합 산화물과 실란 커플링제를 혼합할 때, 페로브스카이트형 복합 산화물과 실란 커플링제의 질량비를 99.5:0.5 내지 95:5로 하는 것이 바람직하고, 99:1 내지 96:4로 하는 것이 보다 바람직하다. 페로브스카이트형 복합 산화물과 실란 커플링제의 질량비가 99.5:0.5 내지 95:5이면, 페로브스카이트형 복합 산화물 입자의 표면에 적어도 1층의 실란 커플링제 막을 형성할 수 있다. 그러나, 실란 커플링제를 다량으로 첨가해도 얻어지는 효과가 증폭되지 않으므로 경제적으로 불리해진다.The mixing method of the perovskite composite oxide and the silane coupling agent is not particularly limited, but a method of spraying a silane coupling agent onto the perovskite composite oxide, and a solid silane coupling agent with the perovskite composite oxide and dry method A method of mixing, a method of adding a liquid silane coupling agent to the perovskite-type composite oxide dispersed in an organic solvent, followed by filtration and drying to obtain a mixture, and the like. The silane coupling agent may be used as an undiluted solution, or dissolved in a suitable solvent (alcohols, ketones, ethers, etc.) may be used. When mixing the perovskite composite oxide and the silane coupling agent, the mass ratio of the perovskite composite oxide and the silane coupling agent is preferably 99.5:0.5 to 95:5, and 99:1 to 96:4. It is more preferable. When the mass ratio of the perovskite-type composite oxide and the silane coupling agent is 99.5:0.5 to 95:5, at least one layer of a silane coupling agent film can be formed on the surface of the perovskite-type composite oxide particles. However, even if a large amount of the silane coupling agent is added, the obtained effect is not amplified, which is economically disadvantageous.
기류식 분쇄기로서는, 제트 밀, 스트림 밀, 유동상 분쇄기 등을 들 수 있다. 이들 중에서도, 분쇄실에 블레이드나 미디어를 넣지 않은 구조에 의해 콘타미네이션이 적다는 관점에서, 제트 밀이 바람직하다.Examples of the air-flow type pulverizer include a jet mill, a stream mill, and a fluid bed pulverizer. Among these, a jet mill is preferred from the viewpoint of less contamination due to a structure in which no blades or media are placed in the grinding chamber.
기류식 분쇄기에 의한 분쇄 조건으로서는, 특별히 제한되는 것은 아니지만, 바람직하게는 0.03MPa 이상, 보다 바람직하게는 0.05MPa 내지 0.7MPa의 그라인딩압이다. 또한 분체 투입 속도는 기류식 분쇄기의 사이즈에 따라서 다르지만, 4 내지 40kg/hr가 바람직하다. 이 분쇄 조건에서 행함으로써, 상기 일반식 (1)로 표시되는 실란 커플링제를, 새롭게 노출된 페로브스카이트형 복합 산화물의 표면에 충분하면서 효율적으로 피복할 수 있다.Although it does not specifically limit as a grinding|pulverization condition by an air flow type grinder, It is a grinding pressure of preferably 0.03 MPa or more, more preferably 0.05 MPa to 0.7 MPa. In addition, although the powder input speed varies depending on the size of the air flow type mill, it is preferably 4 to 40 kg/hr. By performing under this pulverization condition, the silane coupling agent represented by the general formula (1) can be sufficiently and efficiently coated on the surface of the newly exposed perovskite composite oxide.
이와 같이 하여 얻어지는 본 발명의 개질 페로브스카이트형 복합 산화물은, 수지 중으로의 충전성 및 분산성이 우수하기 때문에, 고유전 특성, 저손실 특성, 초전 특성, 압전 특성 등이 우수한 후술하는 복합 유전체 재료를 제조하는 것이 가능해진다. 또한, 본 발명의 개질 페로브스카이트형 복합 산화물은, 강유전체, 초전체 및 압전체가 될 수 있는 것이지만, 광의로는 상유전체도 포함하여 유전체라 총칭되는 것이다.Since the modified perovskite-type composite oxide of the present invention obtained in this way is excellent in filling and dispersing properties in the resin, the composite dielectric material described below is excellent in high dielectric properties, low loss properties, pyroelectric properties, piezoelectric properties, etc. It becomes possible to manufacture. In addition, the modified perovskite type composite oxide of the present invention can be a ferroelectric, a pyroelectric, and a piezoelectric material, but in a broad sense, it is generically referred to as a dielectric including a phase dielectric.
<복합 유전체 재료><Composite dielectric material>
본 발명의 복합 유전체 재료는, 고분자 재료와 무기 충전재로서의 상기 개질 페로브스카이트형 복합 산화물을 함유하는 것이다. 본 발명의 복합 유전체 재료는, 후술하는 고분자 재료에 상기 개질 페로브스카이트형 복합 산화물을 바람직하게는 60질량% 이상, 보다 바람직하게는 70질량% 내지 90질량% 함유시킴으로써, 바람직하게는 15 이상, 보다 바람직하게는 20 이상의 비유전율을 갖는 재료인 것이 바람직하다.The composite dielectric material of the present invention contains a polymer material and the modified perovskite composite oxide as an inorganic filler. The composite dielectric material of the present invention contains preferably 60% by mass or more, more preferably 70% by mass to 90% by mass of the modified perovskite composite oxide in the polymer material described later, and preferably 15 or more, More preferably, it is preferably a material having a relative dielectric constant of 20 or more.
본 발명에 있어서 사용할 수 있는 고분자 재료로서는, 열경화성 수지, 열가소성 수지 또는 광감광성 수지를 들 수 있다.As a polymer material that can be used in the present invention, a thermosetting resin, a thermoplastic resin, or a photosensitive resin can be mentioned.
열경화성 수지로서는, 예를 들어 에폭시 수지, 페놀 수지, 폴리이미드 수지, 멜라민 수지, 시아네이트 수지류, 비스말레이미드류, 비스말레이미드류와 디아민의 부가 중합물, 다관능성 시안산에스테르 수지, 이중 결합 부가 폴리페닐렌옥시드 수지, 불포화 폴리에스테르 수지, 폴리비닐벤질에테르 수지, 폴리부타디엔 수지, 푸마레이트 수지 등의 공지된 것을 들 수 있다. 이들 열경화성 수지는 1종 단독으로 사용해도 되고, 2종 이상을 조합하여 사용해도 된다. 이들 열경화성 수지 중에서도, 내열성, 가공성, 가격 등의 밸런스로부터 에폭시 수지 및 폴리비닐벤질에테르 수지가 바람직하다.Examples of thermosetting resins include epoxy resins, phenolic resins, polyimide resins, melamine resins, cyanate resins, bismaleimides, bismaleimides and diamine addition polymerization products, polyfunctional cyanate ester resins, double bond addition Known things, such as a polyphenylene oxide resin, an unsaturated polyester resin, a polyvinyl benzyl ether resin, a polybutadiene resin, and a fumarate resin, are mentioned. These thermosetting resins may be used singly or in combination of two or more. Among these thermosetting resins, epoxy resins and polyvinyl benzyl ether resins are preferred from the balance of heat resistance, processability, and cost.
본 발명에서 사용하는 에폭시 수지란, 1 분자 내에 적어도 2개의 에폭시기를 갖는 모노머, 올리고머, 폴리머 전반이며, 예를 들어 페놀노볼락형 에폭시 수지, 오르토크레졸노볼락형 에폭시 수지를 비롯한 페놀, 크레졸, 크실레놀, 레조르신, 카테콜, 비스페놀 A, 비스페놀 F 등의 페놀류 및/또는 α-나프톨, β-나프톨, 디히드록시나프탈렌 등의 나프톨류와 포름알데히드, 아세트알데히드, 프로피온알데히드, 벤즈알데히드, 살리실알데히드 등의 알데히드류를 산성 촉매 하에서 축합 또는 공축합시켜 얻어지는 노볼락 수지를 에폭시화한 것, 비스페놀 A, 비스페놀 B, 비스페놀 F, 비스페놀 S, 알킬 치환 또는 비치환된 비페놀 등의 디글리시딜에테르, 페놀류와 디시클로펜타디엔이나 테르펜류의 부가물 또는 중부가물을 에폭시화한 것, 프탈산, 다이머산 등의 다염기산과 에피클로로히드린의 반응에 의해 얻어지는 글리시딜에스테르형 에폭시 수지, 디아미노디페닐메탄, 이소시아누르산 등의 폴리아민과 에피클로로히드린의 반응에 의해 얻어지는 글리시딜아민형 에폭시 수지, 올레핀 결합을 과아세트산 등의 과산으로 산화하여 얻어지는 선상 지방족 에폭시 수지, 지환족 에폭시 수지 등을 들 수 있다. 이들은 1종 단독으로 사용해도 되고, 2종 이상을 조합하여 사용해도 된다.The epoxy resin used in the present invention is a monomer, oligomer, and general polymer having at least two epoxy groups in one molecule. For example, phenol novolak type epoxy resin, orthocresol novolak type epoxy resin including phenol, cresol, and Phenols such as silenol, resorcin, catechol, bisphenol A and bisphenol F, and/or naphthols such as α-naphthol, β-naphthol, and dihydroxynaphthalene, and formaldehyde, acetaldehyde, propionaldehyde, benzaldehyde, and salicyl Diglycidyl such as bisphenol A, bisphenol B, bisphenol F, bisphenol S, alkyl substituted or unsubstituted biphenol, etc., obtained by epoxidizing novolac resin obtained by condensing or co-condensing aldehydes such as aldehydes under an acidic catalyst Epoxyized product of ether, phenols and dicyclopentadiene or terpene adducts or polyadditions, glycidyl ester type epoxy resin obtained by reaction of epichlorohydrin with polybasic acids such as phthalic acid and dimer acid, dia Glycidylamine-type epoxy resin obtained by reaction of epichlorohydrin with polyamine such as minodiphenylmethane and isocyanuric acid, linear aliphatic epoxy resin obtained by oxidizing olefin bonds with peracids such as peracetic acid, and alicyclic epoxy Resin, etc. are mentioned. These may be used individually by 1 type, and may be used in combination of 2 or more types.
에폭시 수지 경화제로서는, 당업자에 있어서 공지된 것은 모두 사용할 수 있지만, 특히 에틸렌디아민, 트리메틸렌디아민, 테트라메틸렌디아민, 헥사메틸렌디아민 등의 C2 내지 C20의 직쇄 지방족 디아민, 메타페닐렌디아민, 파라페닐렌디아민, 파라크실렌디아민, 4,4'-디아미노디페닐메탄, 4,4'-디아미노디페닐프로판, 4,4'-디아미노디페닐에테르, 4,4'-디아미노디페닐술폰, 4,4'-디아미노디시클로헥산, 비스(4-아미노페닐)페닐메탄, 1,5-디아미노나프탈렌, 메타크실릴렌디아민, 파라크실릴렌디아민, 1,1-비스(4-아미노페닐)시클로헥산, 디시아노디아미드 등의 아민류, 페놀노볼락 수지, 크레졸노볼락 수지, tert-부틸페놀노볼락 수지, 노닐페놀노볼락 수지 등의 노볼락형 페놀 수지, 레졸형 페놀 수지, 폴리파라옥시 스티렌 등의 폴리옥시 스티렌, 페놀아르알킬 수지, 나프톨계 아르알킬 수지 등의, 벤젠환이나 나프탈렌환 기타 방향족성의 환에 결합하는 수소 원자가 수산기로 치환된 페놀 화합물과, 카르보닐 화합물과의 공축합에 의해 얻어지는 페놀 수지나, 산무수물 등을 들 수 있다. 이들은 1종 단독으로 사용해도 되고, 2종 이상을 조합하여 사용해도 된다.As the epoxy resin curing agent, all known ones can be used, but in particular, C 2 to C 20 linear aliphatic diamines such as ethylenediamine, trimethylenediamine, tetramethylenediamine and hexamethylenediamine, metaphenylenediamine, and paraphenyl Rendiamine, paraxylenediamine, 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylpropane, 4,4'-diaminodiphenyl ether, 4,4'-diaminodiphenylsulfone , 4,4'-diaminodicyclohexane, bis(4-aminophenyl)phenylmethane, 1,5-diaminonaphthalene, metaxylylenediamine, paraxylylenediamine, 1,1-bis(4- Amines such as aminophenyl)cyclohexane, dicyanodiamide, phenol novolac resin, cresol novolac resin, tert-butylphenol novolak resin, novolac-type phenol resin such as nonylphenol novolac resin, resol-type phenol resin, A phenol compound in which a hydrogen atom bonded to a benzene ring, naphthalene ring, or other aromatic ring is substituted with a hydroxyl group, such as polyoxy styrene such as polyparaoxy styrene, a phenol aralkyl resin, or a naphthol aralkyl resin, and a carbonyl compound. A phenol resin obtained by co-condensation, an acid anhydride, etc. are mentioned. These may be used individually by 1 type, and may be used in combination of 2 or more types.
에폭시 수지 경화제의 배합량은, 에폭시 수지에 대하여 당량비로 바람직하게는 0.1 내지 10, 보다 바람직하게는 0.7 내지 1.3의 범위이다.The blending amount of the epoxy resin curing agent is preferably 0.1 to 10, more preferably 0.7 to 1.3 in an equivalent ratio with respect to the epoxy resin.
또한, 본 발명에 있어서 에폭시 수지의 경화 반응을 촉진시킬 목적으로 공지된 경화 촉진제를 사용할 수 있다. 경화 촉진제로서는, 예를 들어 1,8-디아자-비시클로(5,4,0)운데센-7, 트리에틸렌디아민, 벤질디메틸아민 등의 3급 아민 화합물, 2-메틸이미다졸, 2-에틸-4-메틸이미다졸, 2-페닐이미다졸, 2-페닐-4-메틸이미다졸 등의 이미다졸 화합물, 트리페닐포스핀, 트리부틸포스핀 등의 유기 포스핀 화합물, 포스포늄염, 암모늄염 등을 들 수 있다. 이들은 1종 단독으로 사용해도 되고, 2종 이상을 조합하여 사용해도 된다.Further, in the present invention, a known curing accelerator may be used for the purpose of accelerating the curing reaction of the epoxy resin. Examples of the curing accelerator include tertiary amine compounds such as 1,8-diaza-bicyclo(5,4,0)undecene-7, triethylenediamine, and benzyldimethylamine, 2-methylimidazole, 2 -Imidazole compounds such as ethyl-4-methylimidazole, 2-phenylimidazole and 2-phenyl-4-methylimidazole, organic phosphine compounds such as triphenylphosphine and tributylphosphine, phosphine A phonium salt, an ammonium salt, etc. are mentioned. These may be used individually by 1 type, and may be used in combination of 2 or more types.
본 발명에서 사용하는 폴리비닐벤질에테르 수지란, 폴리비닐벤질에테르 화합물로부터 얻어지는 것이다. 폴리비닐벤질에테르 화합물은, 하기 일반식 (2)로 나타나는 화합물이 바람직하다.The polyvinyl benzyl ether resin used in the present invention is obtained from a polyvinyl benzyl ether compound. The polyvinyl benzyl ether compound is preferably a compound represented by the following general formula (2).
일반식 (2)의 식 중, R1은 메틸기 또는 에틸기를 나타낸다. R2는 수소 원자 또는 탄소수 1 내지 10의 탄화수소기를 나타낸다. R2로 표시되는 탄화수소기는, 치환기를 갖고 있어도 되는 알킬기, 아르알킬기, 아릴기 등이다. 알킬기로서는, 예를 들어 메틸기, 에틸기, 프로필기, 부틸기 등을 들 수 있다. 아르알킬기로서는, 예를 들어 벤질기 등을 들 수 있다. 아릴기로서는, 예를 들어 페닐기 등을 들 수 있다. R3은 수소 원자 또는 비닐벤질기를 나타낸다. 또한, R3의 수소 원자는 일반식 (2)의 화합물을 합성하는 경우의 출발 화합물에서 유래하고, 수소 원자와 비닐벤질기의 몰비가 60:40 내지 0:100이면, 경화 반응을 충분히 진행시킬 수 있고, 또한 본 발명의 복합 유전체 재료에 있어서, 충분한 유전 특성이 얻어지는 점에서 바람직하다. n은 2 내지 4의 정수를 나타낸다.In the formula of General Formula (2), R 1 represents a methyl group or an ethyl group. R 2 represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms. The hydrocarbon group represented by R 2 is an alkyl group, an aralkyl group, an aryl group and the like which may have a substituent. As an alkyl group, a methyl group, an ethyl group, a propyl group, a butyl group, etc. are mentioned, for example. As an aralkyl group, a benzyl group etc. are mentioned, for example. As an aryl group, a phenyl group etc. are mentioned, for example. R 3 represents a hydrogen atom or a vinylbenzyl group. In addition, the hydrogen atom of R 3 is derived from the starting compound when synthesizing the compound of general formula (2), and if the molar ratio of the hydrogen atom and the vinylbenzyl group is 60:40 to 0:100, the curing reaction is sufficiently advanced. In addition, in the composite dielectric material of the present invention, it is preferable from the viewpoint of obtaining sufficient dielectric properties. n represents the integer of 2-4.
폴리비닐벤질에테르 화합물은 그것만을 수지 재료로서 중합하여 사용해도 되고, 다른 모노머와 공중합시켜 사용해도 된다. 공중합 가능한 모노머로서는, 스티렌, 비닐톨루엔, 디비닐벤젠, 디비닐벤질에테르, 알릴페놀, 알릴옥시벤젠, 디알릴프탈레이트, 아크릴산에스테르, 메타크릴산에스테르, 비닐피롤리돈, 이들의 변성물 등을 들 수 있다. 이들 모노머의 배합 비율은, 폴리비닐벤질에테르 화합물에 대하여 2질량% 내지 50질량%이다.The polyvinyl benzyl ether compound may be used by polymerizing only it as a resin material, or may be used by copolymerizing with another monomer. Examples of copolymerizable monomers include styrene, vinyl toluene, divinylbenzene, divinylbenzyl ether, allylphenol, allyloxybenzene, diallylphthalate, acrylic acid ester, methacrylic acid ester, vinylpyrrolidone, and modified products thereof. I can. The blending ratio of these monomers is 2% by mass to 50% by mass based on the polyvinylbenzyl ether compound.
폴리비닐벤질에테르 화합물의 중합 및 경화는 공지된 방법으로 행할 수 있다. 경화는, 경화제의 존재 하 또는 비존재 하 중 어느 것이라도 가능하다. 경화제로서는, 예를 들어 과산화벤조일, 메틸에틸케톤퍼옥시드, 디쿠밀퍼옥시드, t-부틸퍼벤조에이트 등의 공지된 라디칼 중합 개시제를 사용할 수 있다. 사용량은, 폴리비닐벤질에테르 화합물 100질량부에 대하여 0질량부 내지 10질량부이다. 경화 온도는, 경화제의 사용의 유무 및 경화제의 종류에 따라서도 다르지만, 충분히 경화시키기 위해서는, 바람직하게는 20℃ 내지 250℃, 보다 바람직하게는 50℃ 내지 250℃이다.The polymerization and curing of the polyvinyl benzyl ether compound can be performed by a known method. Curing may be performed in the presence or absence of a curing agent. As the curing agent, known radical polymerization initiators such as benzoyl peroxide, methyl ethyl ketone peroxide, dicumyl peroxide, and t-butyl perbenzoate can be used, for example. The amount used is 0 to 10 parts by mass based on 100 parts by mass of the polyvinyl benzyl ether compound. The curing temperature varies depending on the presence or absence of a curing agent and the type of curing agent, but in order to sufficiently cure, it is preferably 20°C to 250°C, more preferably 50°C to 250°C.
또한, 경화의 조정을 위해서, 히드로퀴논, 벤조퀴논, 구리염 등을 배합해도 된다.Further, in order to adjust the curing, hydroquinone, benzoquinone, copper salt, or the like may be blended.
열가소성 수지로서는, 예를 들어 (메트)아크릴 수지, 히드록시스티렌 수지, 노볼락 수지, 폴리에스테르 수지, 폴리이미드 수지, 나일론 수지, 폴리에테르이미드 수지 등의 공지된 것을 들 수 있다.Examples of the thermoplastic resin include known ones such as (meth)acrylic resin, hydroxystyrene resin, novolac resin, polyester resin, polyimide resin, nylon resin, and polyetherimide resin.
감광성 수지로서는, 예를 들어 광중합성 수지, 광가교성 수지 등의 공지된 것을 들 수 있다.As a photosensitive resin, well-known things, such as a photopolymerizable resin and a photocrosslinkable resin, are mentioned, for example.
본 발명에서 사용하는 광중합성 수지로서는, 예를 들어 에틸렌성 불포화기를 갖는 아크릴계 공중합체(감광성 올리고머)와 광중합성 화합물(감광성 모노머)과 광중합 개시제를 포함하는 것, 에폭시 수지와 광양이온 중합 개시제를 포함하는 것 등을 들 수 있다. 감광성 올리고머로서는, 에폭시 수지에 아크릴산을 부가한 것, 그것을 추가로 산무수물과 반응시킨 것이나 글리시딜기를 갖는 (메트)아크릴 모노머를 포함하는 공중합체에 (메트)아크릴산을 반응시킨 것, 또한 그것에 산무수물을 반응시킨 것, 수산기를 갖는 (메트)아크릴 모노머를 포함하는 공중합체에 (메트)아크릴산글리시딜을 반응시킨 것, 또한 그것에 산무수물을 반응시킨 것, 무수 말레산을 포함하는 공중합체에 수산기를 갖는 (메트)아크릴 모노머 혹은 글리시딜기를 갖는 (메트)아크릴 모노머를 반응시킨 것 등을 들 수 있다. 이들은 1종 단독으로 사용해도 되고, 2종 이상을 조합하여 사용해도 된다.The photopolymerizable resin used in the present invention includes, for example, an acrylic copolymer (photosensitive oligomer) having an ethylenically unsaturated group, a photopolymerizable compound (photosensitive monomer), and a photopolymerization initiator, and an epoxy resin and a photocationic polymerization initiator. And things to do. As photosensitive oligomers, those obtained by adding acrylic acid to an epoxy resin, further reacting it with an acid anhydride, or reacting (meth)acrylic acid to a copolymer containing a (meth)acrylic monomer having a glycidyl group, and an acid A reaction of an anhydride, a reaction of glycidyl (meth)acrylate with a copolymer containing a (meth)acrylic monomer having a hydroxyl group, further reaction of an acid anhydride therewith, a copolymer containing maleic anhydride The reaction of a (meth)acrylic monomer having a hydroxyl group or a (meth)acrylic monomer having a glycidyl group may be mentioned. These may be used individually by 1 type, and may be used in combination of 2 or more types.
광중합성 화합물(감광성 모노머)로서는, 예를 들어 2-히드록시에틸(메트)아크릴레이트, 2-히드록시프로필(메트)아크릴레이트, N-비닐피롤리돈, 아크릴로일모르폴린, 메톡시폴리에틸렌글리콜(메트)아크릴레이트, 폴리에틸렌글리콜디(메트)아크릴레이트, 폴리프로필렌글리콜디(메트)아크릴레이트, N,N-디메틸아크릴아미드, 페녹시에틸(메트)아크릴레이트, 시클로헥실(메트)아크릴레이트, 트리메틸올프로판(메트)아크릴레이트, 펜타에리트리톨트리(메트)아크릴레이트, 디펜타에리트리톨헥사(메트)아크릴레이트, 트리스(히드록시에틸)이소시아누레이트디(메트)아크릴레이트, 트리스(히드록시에틸)이소시아누레이트트리(메트)아크릴레이트 등을 들 수 있다. 이들은 1종 단독으로 사용해도 되고, 2종 이상을 조합하여 사용해도 된다.As a photopolymerizable compound (photosensitive monomer), for example, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, N-vinylpyrrolidone, acryloylmorpholine, methoxypolyethylene Glycol (meth) acrylate, polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, N,N-dimethylacrylamide, phenoxyethyl (meth) acrylate, cyclohexyl (meth) acrylate , Trimethylolpropane (meth)acrylate, pentaerythritol tri(meth)acrylate, dipentaerythritol hexa(meth)acrylate, tris(hydroxyethyl)isocyanurate di(meth)acrylate, tris( Hydroxyethyl) isocyanurate tri(meth)acrylate, etc. are mentioned. These may be used individually by 1 type, and may be used in combination of 2 or more types.
광중합 개시제로서는, 예를 들어 벤조인과 그의 알킬에테르류, 벤조페논류, 아세토페논류, 안트라퀴논류, 크산톤류, 티오크산톤류 등을 들 수 있다. 이들은 1종 단독으로 사용해도 되고, 2종 이상을 조합하여 사용해도 된다. 또한, 이들 광중합 개시제는 벤조산계, 제3 아민계 등의 공지 관용의 광중합 촉진제와 병용할 수 있다. 광양이온 중합 개시제로서는, 예를 들어 트리페닐술포늄헥사플루오로안티모네이트, 디페닐술포늄헥사플루오로안티모네이트, 트리페닐술포늄헥사플루오로포스페이트, 벤질-4-히드록시페닐메틸술포늄헥사플루오로포스페이트, 브뢴스테드산의 철 방향족 화합물염(시바·가이기사, CG24-061) 등을 들 수 있다. 이들은 1종 단독으로 사용해도 되고, 2종 이상을 조합하여 사용해도 된다.As a photoinitiator, benzoin and its alkyl ethers, benzophenones, acetophenones, anthraquinones, xanthones, thioxanthones, etc. are mentioned, for example. These may be used individually by 1 type, and may be used in combination of 2 or more types. Further, these photopolymerization initiators can be used in combination with known and commonly used photopolymerization accelerators such as benzoic acid and tertiary amines. As a photocationic polymerization initiator, for example, triphenylsulfonium hexafluoroantimonate, diphenylsulfoniumhexafluoroantimonate, triphenylsulfonium hexafluorophosphate, benzyl-4-hydroxyphenylmethylsulfonium Hexafluorophosphate and iron aromatic compound salts of Bronsted acid (Ciba-Geigi, CG24-061), and the like. These may be used individually by 1 type, and may be used in combination of 2 or more types.
광양이온 중합 개시제에 의해 에폭시 수지가 개환 중합하지만, 광중합성은 통상의 글리시딜에스테르계 에폭시 수지보다도 지환 에폭시 수지 쪽이 반응 속도가 빠르므로 보다 바람직하다. 지환 에폭시 수지와 글리시딜에스테르계 에폭시 수지를 병용할 수도 있다. 지환 에폭시 수지로서는, 예를 들어 비닐시클로헥센디에폭시드, 알리시클릭디에폭시아세탈, 알리시클릭디에폭시아디페이트, 알리시클릭디에폭시카르복실레이트, 다이셀 가가꾸 고교(주)제, EHPE-3150 등을 들 수 있다. 이들은 1종 단독으로 사용해도 되고, 2종 이상을 조합하여 사용해도 된다.Although the epoxy resin is ring-opened and polymerized by the photocationic polymerization initiator, the photopolymerization is more preferable because the reaction rate is faster than the usual glycidyl ester epoxy resin. An alicyclic epoxy resin and a glycidyl ester type epoxy resin can also be used together. As an alicyclic epoxy resin, for example, vinylcyclohexene diepoxide, alicyclic diepoxycetal, alicyclic diepoxydipate, alicyclic diepoxycarboxylate, Daicel Chemical Co., Ltd. make, EHPE -3150 etc. are mentioned. These may be used individually by 1 type, and may be used in combination of 2 or more types.
광가교성 수지로서는, 예를 들어 수용성 폴리머 중크롬산염계, 폴리신남산비닐(코닥 KPR), 환화 고무 아지드계(코닥 KTFR) 등을 들 수 있다. 이들은 1종 단독으로 사용해도 되고, 2종 이상을 조합하여 사용해도 된다.Examples of the photocrosslinkable resin include water-soluble polymer dichromate, polycinnamate vinyl (Kodak KPR), cyclized rubber azide (Kodak KTFR), and the like. These may be used individually by 1 type, and may be used in combination of 2 or more types.
이들 감광성 수지의 유전율은 일반적으로 2.5 내지 4.0으로 낮다. 따라서, 바인더의 유전율을 높이기 위해서, 감광성 수지의 감광 특성을 손상시키지 않는 범위에서, 보다 고유전성의 폴리머(예를 들어, 스미토모 가가꾸의 SDP-E(ε: 15<), 신에쓰 가가꾸의 시아노 레진(ε: 18<))나 고유전성 액체(예를 들어, 스미토모 가가꾸의 SDP-S(ε: 40<))를 첨가할 수도 있다.The dielectric constant of these photosensitive resins is generally as low as 2.5 to 4.0. Therefore, in order to increase the dielectric constant of the binder, a polymer having more high dielectric properties (for example, Sumitomo Chemical's SDP-E (ε: 15<), Shin-Etsu Chemical's Cyano resin (ε: 18<)) or a highly dielectric liquid (eg, Sumitomo Chemical's SDP-S (ε: 40<)) can also be added.
본 발명에 있어서, 상기한 고분자 재료는 1종 단독으로 사용해도 되고, 2종 이상을 조합하여 사용해도 된다.In the present invention, the polymer materials described above may be used singly or in combination of two or more.
본 발명의 복합 유전체 재료에 있어서, 개질 페로브스카이트형 복합 산화물의 배합량은, 수지와의 복합 시에 차지하는 비율로서, 바람직하게는 60질량% 이상, 보다 바람직하게는 70질량% 내지 90질량%이다. 이 이유는 60질량% 미만에서는 충분한 비유전율이 얻어지지 않는 경향이 있고, 한편, 90질량%를 초과하면 점도가 증가하여 분산성이 나빠지는 경향이 있음과 함께, 복합물의 고형 시에 충분한 강도가 얻어지지 않거나 할 우려가 있기 때문이다. 상기 배합에 의해 바람직하게는 15 이상, 보다 바람직하게는 20 이상의 비유전율을 갖는 재료인 것이 바람직하다.In the composite dielectric material of the present invention, the blending amount of the modified perovskite-type composite oxide is a proportion of the composite oxide with the resin, preferably 60% by mass or more, and more preferably 70% by mass to 90% by mass. . The reason for this is that when it is less than 60% by mass, a sufficient relative dielectric constant tends not to be obtained. On the other hand, when it exceeds 90% by mass, the viscosity increases and the dispersibility tends to deteriorate. This is because there is a risk of not being obtained or not. It is preferable that it is a material having a relative dielectric constant of preferably 15 or more, more preferably 20 or more by the above formulation.
또한, 본 발명의 복합 유전체 재료는, 본 발명의 효과를 손상시키지 않는 범위의 첨가량으로 다른 충전제를 함유 할 수 있다. 다른 충전제로서는, 예를 들어 아세틸렌 블랙, 케첸 블랙 등의 카본 미분, 흑연 미분, 탄화규소 등을 들 수 있다.In addition, the composite dielectric material of the present invention may contain other fillers in an added amount within a range that does not impair the effects of the present invention. Examples of other fillers include carbon fine powder such as acetylene black and Ketjen black, graphite fine powder, and silicon carbide.
또한, 본 발명의 복합 유전체 재료에는, 본 발명의 효과를 손상시키지 않는 범위에서, 경화제, 유리 분말, 고분자 첨가제, 반응성 희석제, 중합 금지제, 레벨링제, 습윤성 개량제, 계면 활성제, 가소제, 자외선 흡수제, 산화 방지제, 대전 방지제, 무기계 충전제, 곰팡이 방지제, 조습제, 염료 용해제, 완충제, 킬레이트제, 난연제 등을 첨가해도 된다. 이들 첨가제는 1종 단독으로 사용해도 되고, 2종 이상을 조합하여 사용해도 된다.In addition, the composite dielectric material of the present invention includes a curing agent, a glass powder, a polymer additive, a reactive diluent, a polymerization inhibitor, a leveling agent, a wettability improving agent, a surfactant, a plasticizer, an ultraviolet absorber, as long as the effect of the present invention is not impaired. Antioxidants, antistatic agents, inorganic fillers, mold inhibitors, humidifiers, dye solubilizers, buffers, chelating agents, flame retardants, and the like may be added. These additives may be used individually by 1 type, and may be used in combination of 2 or more types.
본 발명의 복합 유전체 재료는, 복합 유전체 페이스트를 조제하여, 유기 용제의 제거, 경화 반응 또는 중합 반응을 행함으로써 제조할 수 있다.The composite dielectric material of the present invention can be produced by preparing a composite dielectric paste and performing an organic solvent removal, curing reaction, or polymerization reaction.
복합 유전체 페이스트는, 수지 성분, 개질 페로브스카이트형 복합 산화물, 필요에 따라서 첨가되는 첨가제 및 유기 용제를 함유하는 것이다.The composite dielectric paste contains a resin component, a modified perovskite composite oxide, an additive added as necessary, and an organic solvent.
복합 유전체 페이스트에 함유되는 수지 성분은, 열경화성 수지의 중합성 화합물, 열가소성 수지의 중합체 및 감광성 수지의 중합성 화합물이다. 또한, 이들 수지 성분은 1종 단독으로 사용해도 되고, 2종 이상을 조합하여 사용해도 된다.The resin component contained in the composite dielectric paste is a polymerizable compound of a thermosetting resin, a polymer of a thermoplastic resin, and a polymerizable compound of a photosensitive resin. In addition, these resin components may be used individually by 1 type, and may be used in combination of 2 or more types.
여기서, 중합성 화합물이란, 중합성기를 갖는 화합물을 나타내고, 예를 들어 완전 경화 전의 전구체 중합체, 중합성 올리고머 및 단량체를 포함한다. 또한, 중합체란, 실질적으로 중합 반응이 완료된 화합물을 나타낸다.Here, the polymerizable compound represents a compound having a polymerizable group, and includes, for example, a precursor polymer, a polymerizable oligomer, and a monomer before complete curing. In addition, a polymer refers to a compound in which the polymerization reaction has been substantially completed.
필요에 따라서 첨가되는 유기 용제로서는, 사용하는 수지 성분에 따라서 상이하고, 수지 성분을 용해시킬 수 있는 것이면 특별히 제한되는 것은 아니지만, 예를 들어 N-메틸피롤리돈, 디메틸포름아미드, 에테르, 디에틸에테르, 테트라히드로푸란, 디옥산, 1 내지 6개의 탄소 원자를 갖는 직쇄 또는 분지의 알킬기를 갖는 모노알코올의 에틸글리콜에테르, 프로필렌글리콜에테르, 부틸글리콜에테르, 케톤, 아세톤, 메틸에틸케톤, 메틸이소프로필케톤, 메틸이소부틸케톤, 시클로헥사논, 에스테르, 에틸아세테이트, 부틸아세테이트, 에틸렌글리콜아세테이트, 메톡시프로필아세테이트, 메톡시프로판올, 기타 할로겐화 탄화수소, 지환식 탄화수소, 방향족 탄화수소 등을 들 수 있다. 이들 유기 용제는 1종 단독으로 사용해도 되고, 2종 이상을 조합하여 사용해도 된다. 이들 중에서도, 헥산, 헵탄, 시클로헥산, 톨루엔 및 디크실렌이 바람직하다.The organic solvent to be added as needed is not particularly limited as long as it differs depending on the resin component to be used and can dissolve the resin component. For example, N-methylpyrrolidone, dimethylformamide, ether, diethyl Ether, tetrahydrofuran, dioxane, ethyl glycol ether, propylene glycol ether, butyl glycol ether, ketone, acetone, methyl ethyl ketone, methyl isopropyl of a monoalcohol having a straight or branched alkyl group having 1 to 6 carbon atoms Ketone, methyl isobutyl ketone, cyclohexanone, ester, ethyl acetate, butyl acetate, ethylene glycol acetate, methoxypropyl acetate, methoxypropanol, other halogenated hydrocarbons, alicyclic hydrocarbons, aromatic hydrocarbons, and the like. These organic solvents may be used alone or in combination of two or more. Among these, hexane, heptane, cyclohexane, toluene and dixylene are preferable.
본 발명에 있어서, 복합 유전체 페이스트는 원하는 점도로 조제하여 사용된다. 복합 유전체 페이스트의 점도는 통상 1,000mPa·s 내지 1,000,000mPa·s(25℃)이며, 복합 유전체 페이스트의 도포성을 고려하면, 바람직하게는 10,000mPa·s 내지 600,000mPa·s(25℃)이다.In the present invention, the composite dielectric paste is prepared and used to a desired viscosity. The viscosity of the composite dielectric paste is usually 1,000 mPa·s to 1,000,000 mPa·s (25°C), and in consideration of the applicability of the composite dielectric paste, it is preferably 10,000 mPa·s to 600,000 mPa·s (25° C.).
본 발명의 복합 유전체 재료는, 필름상, 벌크상 또는 소정 형상의 성형체로서 가공하여 사용할 수 있고, 특히 박막 형상의 고유전체 필름으로서 사용할 수 있다.The composite dielectric material of the present invention can be processed and used as a film, a bulk, or a molded article having a predetermined shape, and in particular, can be used as a thin film-shaped high dielectric film.
본 발명의 복합 유전 재료를 사용하여 복합 유전체 필름을 제조하기 위해서는, 예를 들어 종래 공지된 복합 유전체 페이스트의 사용 방법에 따라서 제조하면 되고, 하기에 그 일례를 나타낸다.In order to manufacture a composite dielectric film using the composite dielectric material of the present invention, for example, it may be produced according to a conventionally known method of using a composite dielectric paste, and an example thereof is shown below.
복합 유전체 페이스트를 기재 상에 도포한 후, 건조시킴으로써 필름상으로 성형할 수 있다. 기재로서는, 예를 들어 표면에 박리 처리가 이루어진 플라스틱 필름을 사용할 수 있다. 박리 처리가 실시된 플라스틱 필름 상에 도포하여 필름상으로 성형한 경우, 일반적으로는 성형 후, 필름으로부터 기재를 박리하여 사용하는 것이 바람직하다. 기재로서 사용할 수 있는 플라스틱 필름으로서는, 폴리에틸렌테레프탈레이트(PET) 필름, 폴리에틸렌 필름, 폴리프로필렌 필름, 폴리에스테르 필름, 폴리이미드 필름, 아라미드, 캡톤, 폴리메틸펜텐 등의 필름을 들 수 있다. 또한, 기재로서 사용하는 플라스틱 필름의 두께로서는, 1㎛ 내지 100㎛인 것이 바람직하고, 더욱 바람직하게는 1㎛ 내지 40㎛이다. 또한, 기재 표면 상에 실시하는 이형 처리로서는, 실리콘, 왁스, 불소 수지 등을 표면에 도포하는 이형 처리가 바람직하게 사용된다.The composite dielectric paste can be applied onto a substrate and then dried to form a film. As the substrate, for example, a plastic film having a peeling treatment on its surface can be used. In the case of coating on a plastic film subjected to a peeling treatment and molding into a film, it is generally preferred to peel the substrate from the film after molding to be used. As a plastic film which can be used as a base material, films, such as a polyethylene terephthalate (PET) film, a polyethylene film, a polypropylene film, a polyester film, a polyimide film, aramid, Kapton, and polymethylpentene, are mentioned. In addition, the thickness of the plastic film used as the substrate is preferably 1 µm to 100 µm, and more preferably 1 µm to 40 µm. Further, as the release treatment performed on the surface of the substrate, a release treatment in which silicone, wax, fluororesin, or the like is applied to the surface is preferably used.
또한, 기재로서 금속박을 사용하여, 금속박 상에 유전체 필름을 형성해도 된다. 이러한 경우, 기재로서 사용한 금속박을 콘덴서의 전극으로서 사용할 수 있다.Moreover, you may use a metal foil as a base material, and you may form a dielectric film on the metal foil. In this case, the metal foil used as the base material can be used as the electrode of the capacitor.
기재 상에 상기 복합 유전체 페이스트를 도포하는 방법으로서는, 특별히 한정되는 것은 아니며, 일반적인 도포 방법을 사용할 수 있다. 예를 들어, 롤러법, 스프레이법, 실크 스크린법 등에 의해 도포할 수 있다.The method of applying the composite dielectric paste on the substrate is not particularly limited, and a general application method can be used. For example, it can be applied by a roller method, a spray method, a silk screen method, or the like.
이러한 유전체 필름은, 프린트 기판 등의 기판에 내장한 후, 가열하여 열경화할 수 있다. 또한, 감광성 수지를 사용한 경우에는, 선택적으로 노광함으로써 패터닝할 수 있다.Such a dielectric film can be thermally cured by heating after being embedded in a substrate such as a printed circuit board. In addition, when a photosensitive resin is used, patterning can be performed by selectively exposing.
또한, 예를 들어 캘린더법 등에 의해, 본 발명의 복합 유전체 재료를 압출 성형하여, 필름상으로 성형해도 된다.Further, for example, the composite dielectric material of the present invention may be extrusion-molded by a calender method or the like to form a film.
압출 성형한 유전체 필름은, 상기 기재 상에 압출되도록 성형되어도 된다. 또한, 기재로서 금속박을 사용하는 경우, 금속박으로서는, 구리, 알루미늄, 놋쇠, 니켈, 철 등을 재료로 하는 박 외에도, 이들의 합금박, 복합박 등을 사용할 수 있다. 금속박에는, 필요 시에 따라서 표면 조면화의 처리나, 접착제의 도포 등의 처리를 실시해두어도 된다.The dielectric film extruded may be molded so as to be extruded onto the substrate. In addition, when a metal foil is used as a base material, as the metal foil, in addition to a foil made of copper, aluminum, brass, nickel, iron or the like as a material, alloy foils, composite foils and the like thereof can be used. If necessary, the metal foil may be subjected to a treatment such as surface roughening or application of an adhesive.
또한, 금속박 사이에 유전체 필름을 형성해도 된다. 이 경우, 금속박 상에 복합 유전체 페이스트를 도포한 후, 이 위에 금속박을 올려놓고, 금속박 사이에 복합 유전체 페이스트를 끼운 상태로 건조시킴으로써, 금속박 사이에 끼워진 상태의 유전체 필름을 형성해도 된다. 또한, 금속박 사이에 끼워지도록 압출 성형함으로써, 금속박 사이에 마련된 유전체 필름을 형성해도 된다.Further, a dielectric film may be formed between the metal foils. In this case, a dielectric film sandwiched between the metal foils may be formed by applying the composite dielectric paste on the metal foil, placing the metal foil thereon, and drying the composite dielectric paste sandwiched between the metal foils. Further, by extrusion molding so as to be sandwiched between metal foils, a dielectric film provided between metal foils may be formed.
또한, 본 발명의 복합 유전체 재료는, 전술한 유기 용매를 사용하여 바니시로 한 후, 이것에 클로스 또는 부직포를 함침하고, 건조를 행함으로써 프리프레그로서 사용해도 된다. 사용할 수 있는 클로스나 부직포의 종류는, 특별히 제한되는 것은 아니고, 공지된 것을 사용할 수 있다. 클로스로서는, 유리 클로스, 아라미드 클로스, 카본 클로스, 연신 다공질 폴리테트라플루오로에틸렌 등을 들 수 있다. 또한, 부직포로서는, 아라미드 부직포, 글래스 페이퍼 등을 들 수 있다. 프리프레그는 회로 기판 등의 전자 부품에 적층한 후, 경화함으로써, 전자 부품에 절연층을 도입할 수 있다.Further, the composite dielectric material of the present invention may be used as a prepreg by making a varnish using the organic solvent described above, impregnating it with a cloth or nonwoven fabric, and drying. The kind of cloth or nonwoven fabric that can be used is not particularly limited, and a known one can be used. Examples of the cloth include glass cloth, aramid cloth, carbon cloth, and stretched porous polytetrafluoroethylene. Moreover, as a nonwoven fabric, an aramid nonwoven fabric, glass paper, etc. are mentioned. The prepreg is laminated on an electronic component such as a circuit board and then cured to introduce an insulating layer into the electronic component.
본 발명의 복합 유전체 재료는, 높은 비유전율을 갖는 점에서 전자 부품, 특히 프린트 회로 기판, 반도체 패키지, 콘덴서, 고주파용 안테나, 무기 EL 등의 전자 부품의 유전체층으로서 적합하게 사용할 수 있다.Since the composite dielectric material of the present invention has a high dielectric constant, it can be suitably used as a dielectric layer of electronic components, particularly electronic components such as printed circuit boards, semiconductor packages, capacitors, high frequency antennas, and inorganic ELs.
본 발명의 복합 유전체 재료를 사용하여 다층 프린트 배선판을 제조하기 위해서는, 당해 기술 분야에서 공지된 방법을 사용하여 제조할 수 있다(예를 들어, 일본 특허 공개 제2003-192768호 공보, 일본 특허 공개 제2005-29700호 공보, 일본 특허 공개 제2002-226816호 공보, 일본 특허 공개 제2003-327827호 공보 등 참조.). 또한, 이하에 나타내는 일례는, 복합 유전체 재료의 고분자 재료로서 열경화성 수지를 사용한 경우의 예시이다.In order to manufacture a multilayer printed wiring board using the composite dielectric material of the present invention, it can be manufactured using a method known in the art (for example, Japanese Patent Laid-Open No. 2003-192768, Japanese Patent Laid-Open No. See 2005-29700, Japanese Patent Publication No. 2002-226816, Japanese Patent Application Publication No. 2003-327827, etc.). In addition, an example shown below is an example in the case of using a thermosetting resin as a polymer material of a composite dielectric material.
본 발명의 복합 유전체 재료를 전술한 유전체 필름으로 하여, 유전체 필름의 수지면에서 회로 기판에 가압, 가열하거나, 혹은 진공 라미네이터를 사용하여 라미네이트한다. 라미네이트 후, 필름으로부터 기재를 박리하여 노출된 수지층 상에, 추가로 금속박을 라미네이트하여, 수지를 가열 경화시킨다.The composite dielectric material of the present invention is used as the above-described dielectric film, and is laminated by pressing and heating a circuit board on the resin surface of the dielectric film or using a vacuum laminator. After lamination, the base material is peeled from the film, and a metal foil is further laminated on the exposed resin layer to heat cure the resin.
또한, 본 발명의 복합 유전체 재료를 프리프레그로 한 것의 회로 기판으로의 라미네이트는, 진공 프레스에 의해 행할 수 있다. 구체적으로는 프리프레그의 편면을 회로 기판에 접촉시키고, 다른 면에 금속박을 올려놓고 프레스를 행하는 것이 바람직하다.In addition, lamination of the composite dielectric material of the present invention as a prepreg onto a circuit board can be performed by vacuum pressing. Specifically, it is preferable that one surface of the prepreg is brought into contact with a circuit board, and a metal foil is placed on the other surface to perform pressing.
또한, 본 발명의 복합 유전체 재료를 바니시로서 사용하고, 회로 기판에, 스크린 인쇄, 커튼 코팅, 롤 코팅, 스프레이 코팅 등을 사용하여 도포·건조시킴으로써 다층 프린트 배선판의 중간 절연층을 형성할 수 있다.Further, an intermediate insulating layer of a multilayer printed circuit board can be formed by using the composite dielectric material of the present invention as a varnish and applying and drying the circuit board using screen printing, curtain coating, roll coating, spray coating, or the like.
본 발명에 있어서, 절연층을 최외층에 갖는 프린트 배선판의 경우에는, 스루홀 및 바이아홀부를 드릴 또는 레이저로 천공을 행하고, 절연층 표면을 조화제 처리해 미세한 요철을 형성한다. 절연층의 조화 방법으로서는, 절연 수지층이 형성된 기판을 산화제 등의 용액 중에 침지하는 방법이나, 산화제 등의 용액을 스프레이하는 방법 등의 사양에 따라서 실시할 수 있다. 조화 처리제의 구체예로서는, 중크롬산염, 과망간산염, 오존, 과산화수소/황산, 질산 등의 산화제, N-메틸-2-피롤리돈, N,N-디메틸포름아미드, 메톡시프로판올 등의 유기 용제, 또한 가성 소다, 가성칼리 등의 알칼리성 수용액, 황산, 염산 등의 산성 수용액, 또는 각종 플라스마 처리 등을 사용할 수 있다. 또한, 이들 처리는 병용하여 사용해도 된다. 상기한 바와 같이, 절연층이 조화된 프린트 배선판 상은, 이어서 증착, 스퍼터링, 이온 플레이팅 등의 건식 도금, 혹은 무전해·전해 도금 등의 습식 도금에 의해 도체층을 형성한다. 이 때, 도체층과는 역 패턴의 도금 레지스트를 형성하고, 무전해 도금만으로 도체층을 형성해도 된다. 이렇게 도체층이 형성된 후, 어닐 처리함으로써, 열경화성 수지의 경화가 진행되어 도체층의 필 강도를 더욱 향상시킬 수도 있다. 이와 같이 하여, 최외층에 도체층을 형성할 수 있다.In the present invention, in the case of a printed wiring board having an insulating layer on the outermost layer, through-holes and via-holes are drilled or drilled with a laser, and the surface of the insulating layer is treated with a roughening agent to form fine irregularities. As a roughening method of the insulating layer, it can be carried out according to specifications such as a method of immersing the substrate on which the insulating resin layer is formed in a solution such as an oxidizing agent, or a method of spraying a solution such as an oxidizing agent. Specific examples of the roughening treatment agent include oxidizing agents such as dichromate, permanganate, ozone, hydrogen peroxide/sulfuric acid, and nitric acid, organic solvents such as N-methyl-2-pyrrolidone, N,N-dimethylformamide, and methoxypropanol, and Alkaline aqueous solutions such as caustic soda and caustic potassium, acidic aqueous solutions such as sulfuric acid and hydrochloric acid, or various plasma treatments can be used. In addition, these treatments may be used in combination. As described above, on the printed wiring board in which the insulating layer is harmonized, a conductor layer is then formed by dry plating such as vapor deposition, sputtering, or ion plating, or wet plating such as electroless/electrolytic plating. At this time, a plating resist having a reverse pattern may be formed with the conductor layer, and the conductor layer may be formed only by electroless plating. After the conductor layer is formed in this way, by annealing treatment, the curing of the thermosetting resin proceeds and the peel strength of the conductor layer can be further improved. In this way, a conductor layer can be formed on the outermost layer.
또한, 중간 절연층을 형성한 금속박은, 진공 프레스로 적층함으로써 다층화할 수 있다. 중간 절연층을 형성한 금속박은, 내층 회로가 형성된 프린트 배선판 상에, 진공 프레스로 적층함으로써, 최외층을 도체층의 프린트 배선판으로 할 수 있다. 또한, 본 발명의 복합 유전체 재료를 사용한 프리프레그는, 금속박과 함께, 내층 회로가 형성된 프린트 배선판 상에, 진공 프레스로 적층함으로써, 최외층을 도체층의 프린트 배선판으로 할 수 있다. 컨포멀 공법 등으로 소정의 스루홀 및 바이아홀부를 드릴 또는 레이저로 천공을 행하고, 스루홀 및 바이아홀 내를 디스미어 처리하여, 미세한 요철을 형성한다. 이어서, 무전해·전해 도금 등의 습식 도금에 의해, 층간의 도통을 취한다.Moreover, the metal foil in which the intermediate insulating layer was formed can be multilayered by laminating by vacuum press. The metal foil having the intermediate insulating layer formed thereon can be laminated by vacuum pressing on a printed wiring board on which an inner circuit is formed, thereby making the outermost layer a printed wiring board of a conductor layer. In addition, the prepreg using the composite dielectric material of the present invention can be laminated with a metal foil on a printed wiring board on which an inner circuit is formed by vacuum pressing, so that the outermost layer can be a printed wiring board of a conductor layer. A predetermined through-hole and a via hole are drilled or drilled with a laser by a conformal method or the like, and the through-hole and the via-hole are desmeared to form fine irregularities. Subsequently, conduction between the layers is achieved by wet plating such as electroless/electrolytic plating.
또한, 필요에 따라서 이들 공정을 수회 반복하고, 추가로 최외층의 회로 형성이 종료된 후, 솔더 레지스트를, 스크린 인쇄법에 의한 패턴 인쇄·열경화, 또는 커튼 코팅·롤 코팅·스프레이 코팅에 의한 전체면 인쇄·열경화 후 레이저로 패턴을 형성함으로써, 원하는 다층 프린트 배선판을 얻는다.In addition, if necessary, these processes are repeated several times, and after the formation of the circuit of the outermost layer is completed, the solder resist is applied by pattern printing/thermal curing by the screen printing method, or by curtain coating/roll coating/spray coating. A desired multilayer printed wiring board is obtained by forming a pattern with a laser after full surface printing and heat curing.
실시예Example
이하에 실시예를 사용하여 본 발명을 더욱 상세하게 설명하지만, 본 발명은 이들에 한정되는 것은 아니다.Hereinafter, the present invention will be described in more detail using examples, but the present invention is not limited thereto.
<티타늄산바륨의 조제><Preparation of barium titanate>
염화바륨2수염 1300g 및 옥살산2수염 1300g에 순수 7200g을 첨가하고, 온도 55℃에서 0.5시간 교반하여 얻어진 현탁액을 A액이라 하였다. 또한, TiO2 환산으로 15.3질량%의 사염화티타늄 수용액 2560g에 순수 5600g을 첨가하여 희석한 것을 B액이라 하였다.7200 g of pure water was added to 1300 g of barium chloride dihydrate and 1300 g of oxalic acid dihydrate, and the suspension obtained by stirring at a temperature of 55° C. for 0.5 hours was referred to as Solution A. In addition, 5600 g of pure water was added and diluted to 2560 g of 15.3 mass% titanium tetrachloride aqueous solution in terms of TiO 2 , and this was referred to as Liquid B.
이어서, 교반하면서 반응 온도 55℃에서 30분간에 걸쳐 B액을 A액에 첨가하고, 첨가 후에는 교반을 계속하면서 0.5시간의 숙성을 행하였다. 숙성 종료 후, 여과하여 옥살산바륨티타닐을 회수하였다.Subsequently, while stirring, the liquid B was added to the liquid A over 30 minutes at a reaction temperature of 55°C, and after the addition, aging for 0.5 hours was performed while continuing stirring. After completion of aging, it was filtered to recover barium titanyl oxalate.
이어서, 회수한 옥살산바륨티타닐을 순수로 리펄프하고, 80℃에서 24시간 정치 건조시켜 옥살산바륨티타닐의 분말을 얻었다.Subsequently, the recovered barium titanyl oxalate was repulped with pure water, and dried at 80°C for 24 hours to obtain a powder of barium titanyl oxalate.
얻어진 옥살산바륨티타닐의 분말을 알루미나 도가니에 500g 투입하고, 900℃에서 10시간 가소한 후, 제트 밀에 의해 분쇄하고, 또한 900℃에서 9시간 가소함으로써 티타늄산바륨(BET 비표면적: 9m2/g, 평균 입자 직경: 0.5㎛)을 얻었다.500 g of the obtained barium titanyl oxalate powder was put in an alumina crucible, calcined at 900° C. for 10 hours, pulverized by a jet mill, and calcined at 900° C. for 9 hours, thereby barium titanate (BET specific surface area: 9 m 2 / g, average particle diameter: 0.5 µm) was obtained.
[실시예 1 내지 3][Examples 1 to 3]
상기에서 얻어진 티타늄산바륨 200g에 대하여, 표 1에 나타내는 종류 및 양의 실란 커플링제를 분무하여 티타늄산바륨과 실란 커플링제의 혼합물을 얻고, 이 혼합물을 제트 밀((주)세이신 기교사제 STJ200)에 공급하고, 그라인딩압≥0.06MPa의 조건에서 처리하여 개질 티타늄산바륨을 제조하였다.With respect to 200 g of barium titanate obtained above, a mixture of barium titanate and a silane coupling agent was obtained by spraying a silane coupling agent of the type and amount shown in Table 1, and the mixture was used in a jet mill (STJ200 manufactured by Seishin Engineering Co., Ltd.). ) And treated under conditions of a grinding pressure ≥ 0.06 MPa to prepare a modified barium titanate.
[비교예 1][Comparative Example 1]
상기에서 얻어진 티타늄산바륨에 실란 커플링제를 분무하지 않고 제트 밀에 공급하고, 그라인딩압≥0.06MPa의 조건에서 처리하여 분쇄된 티타늄산바륨을 제조하였다.The barium titanate obtained above was supplied to a jet mill without spraying a silane coupling agent, and treated under conditions of a grinding pressure ≥0.06 MPa to prepare pulverized barium titanate.
[비교예 2 내지 4][Comparative Examples 2 to 4]
표 1에 나타내는 종류 및 양의 표면 처리제로 변경한 것 이외에는, 실시예 1 내지 3과 마찬가지로 하여 개질 티타늄산바륨을 제조하였다.Modified barium titanate was produced in the same manner as in Examples 1 to 3 except that the type and amount of the surface treatment agent shown in Table 1 were changed.
<평가><Evaluation>
(응집도)(Coagulation degree)
비교예 1의 실란 커플링제에 의한 표면 처리를 행하지 않은 티타늄산바륨에 대하여, 분산매에 물을 사용하여 레이저 회절 산란법에 의해 평균 입자 직경(D50)을 구하였다. 이 때의 평균 입자 직경을 Dw라 하였다. 이어서, 실시예 1 내지 3 및 비교예 2 내지 4의 개질 티타늄산바륨, 그리고 비교예 1의 티타늄산바륨에 대하여, 메틸에틸케톤을 분산매로서 사용하여 레이저 회절 산란법에 의해 평균 입자 직경(D50)을 구하였다. 이 때의 평균 입자 직경을 Dos라 하였다.For barium titanate not subjected to the surface treatment with the silane coupling agent of Comparative Example 1, water was used as a dispersion medium, and the average particle diameter (D50) was determined by laser diffraction scattering method. The average particle diameter at this time was referred to as Dw. Next, with respect to the modified barium titanate of Examples 1 to 3 and Comparative Examples 2 to 4, and the barium titanate of Comparative Example 1, the average particle diameter (D50) by laser diffraction scattering method using methyl ethyl ketone as a dispersion medium. Was obtained. The average particle diameter at this time was called Dos.
얻어진 측정값으로부터 Dos/Dw를 산출하고, 유기 용매 중의 입자의 응집도로 하였다. 그 결과를 표 2에 나타낸다. 또한, 실시예 1에서 얻어진 개질 티타늄산바륨 입자의 유기 용매 중에서의 입도 분포 측정을 도 1에 도시하고, 비교예 1에서 얻어진 티타늄산바륨 입자의 유기 용매 중에서의 입도 분포 측정 결과를 도 2에 도시하고, 비교예 1에서 얻어진 티타늄산바륨 입자의 수 중에서의 입도 분포 측정 결과를 도 3에 도시한다. 또한, 평균 입자 직경의 측정에는, 레이저 회절식 입도 분포 측정 장치(마이크로트랙·벨사제, MT3300EX)를 사용하였다.From the obtained measured value, Dos/Dw was calculated, and the degree of aggregation of particles in an organic solvent was taken. The results are shown in Table 2. In addition, the particle size distribution measurement of the modified barium titanate particles obtained in Example 1 in an organic solvent is shown in FIG. 1, and the particle size distribution measurement results of the barium titanate particles obtained in Comparative Example 1 in an organic solvent are shown in FIG. And Fig. 3 shows the result of measuring the particle size distribution in water of the barium titanate particles obtained in Comparative Example 1. In addition, for the measurement of the average particle diameter, a laser diffraction type particle size distribution measuring device (made by Microtrac Bell, MT3300EX) was used.
(용출 시험)(Dissolution test)
실시예 1 내지 3 및 비교예 1 내지 4 각각에서 얻어진 시료 2g과 이온 교환수 50g을 정칭하여 1시간 교반 후, 상청액을 0.2㎛ 구멍 직경의 시린지 필터로 여과한 여액 20g에, 농염산 1mL를 첨가하고, 50mL가 되도록 정용한 시료 용액을, ICP-AES(애질런트사제 Agilent5100)로 정량하여, 수 중으로의 Ba 용출의 평가를 행하였다. 그 결과를 표 2에 나타낸다.2 g of samples obtained in each of Examples 1 to 3 and Comparative Examples 1 to 4 and 50 g of ion-exchanged water were accurately weighed and stirred for 1 hour, and then 1 mL of concentrated hydrochloric acid was added to 20 g of the filtrate filtered through a syringe filter having a 0.2 μm pore diameter. Then, the sample solution determined to be 50 mL was quantified by ICP-AES (Agilent 5100 manufactured by Agilent Corporation), and the elution of Ba into water was evaluated. The results are shown in Table 2.
(흡습 시험)(Hygroscopicity test)
실시예 1 내지 3 및 비교예 1 내지 4 각각에서 얻어진 시료의 흡습 수분량을 구하였다. 그 결과를 표 2에 나타낸다.The moisture absorption amount of the samples obtained in each of Examples 1 to 3 and Comparative Examples 1 to 4 was calculated. The results are shown in Table 2.
표 2의 결과로부터, 비교예 1의 티타늄산바륨 및 비교예 2의 티타늄 커플링제에 의한 개질 티타늄산바륨에서는, 유기 용매 중에서의 응집도가 높았다. 또한, 비교예 3 및 비교예 4의 개질 티타늄산바륨에서는, Ba의 용출량 및 흡습 수분량이 많았다. 이에 비해, 실시예 1 내지 3에서 얻어진 개질 티타늄산바륨에서는, 응집도가 낮고, Ba의 용출이 억제되어 있으며, 또한 흡습 수분량이 적고, 안정화된 입자로 되어 있음을 알 수 있다.From the results of Table 2, in the barium titanate of Comparative Example 1 and the modified barium titanate by the titanium coupling agent of Comparative Example 2, the degree of aggregation in an organic solvent was high. In addition, in the modified barium titanate of Comparative Example 3 and Comparative Example 4, the elution amount and moisture absorption amount of Ba were large. In contrast, in the modified barium titanate obtained in Examples 1 to 3, it can be seen that the degree of aggregation is low, the elution of Ba is suppressed, the moisture absorption amount is small, and the particles are stabilized.
<티타늄산스트론튬의 조제><Preparation of strontium titanate>
염화스트론튬2수염 1300g 및 옥살산2수염 1300g에 순수 7200g을 첨가하고, 온도 55℃에서 0.5시간 교반하여 얻어진 현탁액을 A액이라 하였다. 또한, TiO2 환산으로 15.3질량%의 사염화티타늄 수용액 2560g에 순수 5600g을 첨가하여 희석한 것을 B액이라 하였다.7200 g of pure water was added to 1300 g of strontium chloride dihydrate and 1300 g of oxalic acid dihydrate, and a suspension obtained by stirring at a temperature of 55° C. for 0.5 hours was referred to as Solution A. In addition, 5600 g of pure water was added and diluted to 2560 g of 15.3 mass% titanium tetrachloride aqueous solution in terms of TiO 2 , and this was referred to as Liquid B.
이어서, 교반하면서 반응 온도 55℃에서 30분간에 걸쳐 B액을 A액에 첨가하고, 첨가 후에는 교반을 계속하면서 0.5시간의 숙성을 행하였다. 숙성 종료 후, 여과하여 옥살산스트론튬티타닐을 회수하였다.Subsequently, while stirring, the liquid B was added to the liquid A over 30 minutes at a reaction temperature of 55°C, and after the addition, aging for 0.5 hours was performed while continuing stirring. After completion of aging, strontium titanyl oxalate was recovered by filtration.
이어서, 회수한 옥살산스트론튬티타닐을 순수로 리펄프하고, 80℃에서 24시간 정치 건조시켜 옥살산스트론튬티타닐의 분말을 얻었다.Subsequently, the recovered strontium titanyl oxalate was repulped with pure water and dried at 80°C for 24 hours to obtain a powder of strontium titanyl oxalate.
얻어진 옥살산스트론튬티타닐의 분말을 알루미나 도가니에 500g 투입하고, 900℃에서 10시간 가소한 후, 제트 밀에 의해 분쇄하고, 또한 900℃에서 9시간 가소함으로써 티타늄산스트론튬(BET 비표면적: 11m2/g, 평균 입자 직경: 0.4㎛)을 얻었다.500 g of the obtained strontium titanyl oxalate powder was put into an alumina crucible, calcined at 900° C. for 10 hours, pulverized by a jet mill, and calcined at 900° C. for 9 hours, thereby strontium titanate (BET specific surface area: 11 m 2 / g, average particle diameter: 0.4 µm) was obtained.
[실시예 4 내지 6][Examples 4 to 6]
상기에서 얻어진 티타늄산스트론튬 200g에 대하여, 표 3에 나타내는 종류 및 양의 실란 커플링제를 분무하여 티타늄산스트론튬과 실란 커플링제의 혼합물을 얻고, 이 혼합물을 제트 밀((주)세이신 기교사제 STJ200)에 공급하고, 그라인딩압≥0.06MPa의 조건에서 처리하여 개질 티타늄산스트론튬을 제조하였다.With respect to 200 g of strontium titanate obtained above, a mixture of strontium titanate and a silane coupling agent was obtained by spraying a silane coupling agent of the kind and amount shown in Table 3, and the mixture was used as a jet mill (STJ200, manufactured by Seishin Engineering Co., Ltd. ) And treated under conditions of grinding pressure ≥ 0.06 MPa to prepare modified strontium titanate.
[비교예 5][Comparative Example 5]
상기에서 얻어진 티타늄산스트론튬에 실란 커플링제를 분무하지 않고 제트 밀에 공급하고, 그라인딩압≥0.06MPa의 조건에서 처리하여 분쇄된 티타늄산스트론튬을 제조하였다.The strontium titanate obtained above was supplied to a jet mill without spraying a silane coupling agent, and treated under conditions of a grinding pressure ≥ 0.06 MPa to prepare pulverized strontium titanate.
[비교예 6 내지 8][Comparative Examples 6 to 8]
표 3에 나타내는 종류 및 양의 표면 처리제로 변경한 것 이외에는, 실시예 4 내지 6과 마찬가지로 하여 개질 티타늄산스트론튬을 제조하였다.Modified strontium titanate was produced in the same manner as in Examples 4 to 6 except that the type and amount of the surface treatment agent shown in Table 3 were changed.
<평가><Evaluation>
(응집도)(Coagulation degree)
실시예 1 내지 3 및 비교예 1 내지 4와 마찬가지의 방법으로, 실시예 4 내지 6 및 비교예 5 내지 8 각각에서 얻어진 시료의 응집도를 구하였다. 그 결과를 표 4에 나타낸다.In the same manner as in Examples 1 to 3 and Comparative Examples 1 to 4, the degree of aggregation of the samples obtained in each of Examples 4 to 6 and Comparative Examples 5 to 8 was calculated. The results are shown in Table 4.
(용출 시험)(Dissolution test)
실시예 1 내지 3 및 비교예 1 내지 4와 마찬가지의 방법으로, 실시예 4 내지 6 및 비교예 5 내지 8 각각에서 얻어진 시료의 수 중으로의 Sr 용출의 평가를 행하였다. 그 결과를 표 4에 나타낸다.In the same manner as in Examples 1 to 3 and Comparative Examples 1 to 4, the elution of Sr into the water of the samples obtained in each of Examples 4 to 6 and Comparative Examples 5 to 8 was evaluated. The results are shown in Table 4.
(흡습 시험)(Hygroscopicity test)
실시예 1 내지 3 및 비교예 1 내지 4와 마찬가지의 방법으로, 실시예 4 내지 6 및 비교예 5 내지 8 각각에서 얻어진 시료의 흡습 수분량을 구하였다. 그 결과를 표 4에 나타낸다.In the same manner as in Examples 1 to 3 and Comparative Examples 1 to 4, the moisture absorption moisture content of the samples obtained in each of Examples 4 to 6 and Comparative Examples 5 to 8 was calculated. The results are shown in Table 4.
표 4의 결과로부터, 비교예 5의 티타늄산스트론튬 및 비교예 6 내지 8의 개질 티타늄산스트론튬에서는, 유기 용매 중에서의 응집도가 높고, Sr의 용출량 및 흡습 수분량이 많았다. 이에 비해, 실시예 4 내지 6에서 얻어진 개질 티타늄산스트론튬에서는, 응집도가 낮고, Sr의 용출이 억제되어 있으며, 또한 흡습 수분량이 적고, 안정화된 입자로 되어 있음을 알 수 있다.From the results of Table 4, in the strontium titanate of Comparative Example 5 and the modified strontium titanate of Comparative Examples 6 to 8, the degree of aggregation in an organic solvent was high, and the elution amount of Sr and the moisture absorption amount were large. In contrast, in the modified strontium titanate obtained in Examples 4 to 6, it can be seen that the degree of aggregation is low, the elution of Sr is suppressed, the moisture absorption amount is small, and the particles are stabilized.
<니오브산칼륨나트륨의 조제><Preparation of sodium potassium niobate>
오산화니오븀 4688g, 탄산나트륨 958g 및 탄산칼륨 1183g을, 헨쉘 믹서에 의해 건식 혼합하여 원료 혼합물을 얻었다.4688 g of niobium pentoxide, 958 g of sodium carbonate, and 1183 g of potassium carbonate were dry mixed with a Henschel mixer to obtain a raw material mixture.
이 원료 혼합물을 650℃에서 7시간 가소한 후, 제트 밀에 의해 분쇄하고, 또한 900℃에서 10시간 가소함으로써 니오브산칼륨나트륨(BET 비표면적: 3m2/g, 평균 입자 직경: 0.9㎛)을 얻었다.This raw material mixture was calcined at 650°C for 7 hours, then pulverized by a jet mill, and then calcined at 900°C for 10 hours to obtain sodium potassium niobate (BET specific surface area: 3 m 2 /g, average particle diameter: 0.9 μm). Got it.
[실시예 7][Example 7]
상기에서 얻어진 니오브산칼륨나트륨 200g에 대하여, 표 5에 나타내는 종류 및 양의 실란 커플링제를 분무하여 니오브산칼륨나트륨과 실란 커플링제의 혼합물을 얻고, 이 혼합물을 제트 밀((주)세이신 기교사제 STJ200)에 공급하고, 그라인딩압≥0.06MPa의 조건에서 처리하여 개질 니오브산칼륨나트륨을 제조하였다.With respect to 200 g of sodium potassium niobate obtained above, a mixture of sodium potassium niobate and a silane coupling agent was obtained by spraying a silane coupling agent of the type and amount shown in Table 5, and the mixture was used in a jet mill (Seishin Co., Ltd. It was supplied to a teacher's STJ200) and treated under conditions of a grinding pressure ≥0.06 MPa to prepare a modified sodium potassium niobate.
[비교예 9][Comparative Example 9]
상기에서 얻어진 니오브산칼륨나트륨에 실란 커플링제를 분무하지 않고 제트 밀에 공급하고, 그라인딩압≥0.06MPa의 조건에서 처리하여 분쇄된 니오브산칼륨나트륨을 제조하였다.The sodium potassium niobate obtained above was supplied to a jet mill without spraying a silane coupling agent, and treated under conditions of a grinding pressure ≥ 0.06 MPa to prepare pulverized sodium potassium niobate.
<평가><Evaluation>
(응집도)(Coagulation degree)
실시예 1 내지 3 및 비교예 1 내지 4와 마찬가지의 방법으로, 실시예 7 및 비교예 9 각각에서 얻어진 시료의 응집도를 구하였다. 그 결과를 표 6에 나타낸다. In the same manner as in Examples 1 to 3 and Comparative Examples 1 to 4, the degree of aggregation of the samples obtained in each of Example 7 and Comparative Example 9 was determined. The results are shown in Table 6.
(용출 시험)(Dissolution test)
실시예 1 내지 3 및 비교예 1 내지 4와 마찬가지의 방법으로, 실시예 7 및 비교예 9 각각에서 얻어진 시료의 수 중으로의 Sr 용출의 평가를 행하였다. 그 결과를 표 6에 나타낸다.In the same manner as in Examples 1 to 3 and Comparative Examples 1 to 4, the elution of Sr into the water of the samples obtained in each of Examples 7 and 9 was evaluated. The results are shown in Table 6.
(흡습 시험)(Hygroscopicity test)
실시예 1 내지 3 및 비교예 1 내지 4와 마찬가지의 방법으로, 실시예 7 및 비교예 9 각각에서 얻어진 시료의 흡습 수분량을 구하였다. 그 결과를 표 6에 나타낸다.In the same manner as in Examples 1 to 3 and Comparative Examples 1 to 4, the moisture absorption moisture content of the samples obtained in each of Examples 7 and 9 was determined. The results are shown in Table 6.
표 6의 결과로부터, 비교예 9의 니오브산칼륨나트륨에서는, 유기 용매 중에서의 응집도가 높고, Na 및 K의 용출량 및 흡습 수분량이 많았다. 이에 비해, 실시예 7에서 얻어진 개질 니오브산칼륨나트륨에서는, 응집도가 낮고, Na 및 K의 용출이 억제되어 있으며, 또한 흡습 수분량이 적고, 안정화된 입자로 되어 있음을 알 수 있다.From the results of Table 6, in the sodium potassium niobate of Comparative Example 9, the degree of aggregation in an organic solvent was high, and the elution amount of Na and K and the moisture absorption amount were large. In contrast, in the modified sodium potassium niobate obtained in Example 7, the degree of aggregation was low, the elution of Na and K was suppressed, and the moisture absorption amount was small, and the particles were stabilized.
또한, 본 국제 출원은, 2017년 12월 20일에 출원한 일본 특허 출원 제2017-243790호에 기초하는 우선권을 주장하는 것이며, 이 일본 특허 출원의 전체 내용을 본 국제 출원에 원용한다.In addition, this international application claims the priority based on Japanese Patent Application No. 2017-243790 for which it applied on December 20, 2017, and uses the whole content of this Japanese patent application for this international application.
Claims (10)
(XY)aSi(OZ)4-a (1)
(일반식 (1) 중, X는 수소 원자, 에폭시기, 아미노기, 비닐기, (메트)아크릴기, 이소시아네이트기 또는 머캅토기이며, Y는 탄소 원자수 5 이상의 직쇄상 알킬렌기이며, Z는 수소 원자, 탄소 원자수 1 내지 3의 알킬기, 아세틸기 또는 탄소 원자수 2 내지 4의 알콕시알킬기이며, a는 1 또는 2이다.)A modified perovskite-type composite oxide, characterized in that the surface of the perovskite-type composite oxide particles is coated with a silane coupling agent represented by the following general formula (1).
(XY) a Si(OZ) 4-a (1)
(In general formula (1), X is a hydrogen atom, an epoxy group, an amino group, a vinyl group, a (meth)acryl group, an isocyanate group or a mercapto group, Y is a linear alkylene group having 5 or more carbon atoms, and Z is a hydrogen atom. , An alkyl group having 1 to 3 carbon atoms, an acetyl group or an alkoxyalkyl group having 2 to 4 carbon atoms, and a is 1 or 2.)
(XY)aSi(OZ)4-a (1)
(일반식 (1) 중, X는 수소 원자, 에폭시기, 아미노기, 비닐기, (메트)아크릴기, 이소시아네이트기 또는 머캅토기이며, Y는 탄소 원자수 5 이상의 직쇄상 알킬렌기이며, Z는 수소 원자, 탄소 원자수 1 내지 3의 알킬기, 아세틸기 또는 탄소 원자수 2 내지 4의 알콕시알킬기이며, a는 1 또는 2이다.)Perovskite-type composite oxide particles are mixed with a silane coupling agent represented by the following general formula (1), and then the mixture is supplied to an airflow mill to pulverize the perovskite-type composite oxide while pulverizing the perovskite-type composite oxide particles. A method for producing a modified perovskite composite oxide, characterized in that the surface of the silane coupling agent is coated with the silane coupling agent.
(XY) a Si(OZ) 4-a (1)
(In general formula (1), X is a hydrogen atom, an epoxy group, an amino group, a vinyl group, a (meth)acryl group, an isocyanate group, or a mercapto group, Y is a linear alkylene group having 5 or more carbon atoms, and Z is a hydrogen atom. , An alkyl group having 1 to 3 carbon atoms, an acetyl group or an alkoxyalkyl group having 2 to 4 carbon atoms, and a is 1 or 2.)
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