KR20170123254A - 처리 챔버를 위한 세라믹 코팅된 석영 리드 - Google Patents
처리 챔버를 위한 세라믹 코팅된 석영 리드 Download PDFInfo
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- KR20170123254A KR20170123254A KR1020170052858A KR20170052858A KR20170123254A KR 20170123254 A KR20170123254 A KR 20170123254A KR 1020170052858 A KR1020170052858 A KR 1020170052858A KR 20170052858 A KR20170052858 A KR 20170052858A KR 20170123254 A KR20170123254 A KR 20170123254A
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Abstract
Description
도 1은 본 개시내용의 일 구현예에 따른 처리 챔버의 개략적인 단면도를 도시한다.
도 2a는 본 개시내용의 일 구현예에 따른 리드의 상부도를 도시한다.
도 2b는 도 2a의 라인 A-A를 따라 취해진 리드의 개략적인 단면도를 도시한다.
도 2c는 도 2b의 원 "B"의 확대 단면도이다.
도 3a는 본 개시내용의 일 구현예에 따른 스페이서 링의 상부도를 도시한다.
도 3b는 도 3a의 라인 A-A를 따라 취해진 스페이서 링의 개략적인 단면도를 도시한다.
도 3c는 도 3a의 스페이서 링의 사시도를 도시한다.
도 4는 리드의 중앙 개구 내에 배치된 가스 커플링 인서트를 도시하는 도 2c의 확대 단면도이다.
그러나, 본 개시내용은 동등한 효과의 다른 구현예들을 허용할 수 있으므로, 첨부 도면들은 본 개시내용의 전형적인 구현예들만을 예시하며, 따라서 그것의 범위를 제한하는 것으로 고려되어서는 안 된다는 점에 유의해야 한다.
이해를 용이하게 하기 위해서, 가능한 경우에, 도면들에 공통인 동일한 요소들을 지시하는 데에 동일한 참조 번호들이 이용되었다.
Claims (15)
- 기판 처리 챔버를 위한 리드로서,
제1 표면 및 상기 제1 표면에 대향하는 제2 표면을 갖는 커버 부재;
상기 커버 부재를 관통하는 중앙 개구 - 상기 중앙 개구의 내측 프로파일은 제1 직경을 갖는 제1 섹션, 제2 직경을 갖는 제2 섹션, 및 제3 직경을 갖는 제3 섹션을 포함하고, 상기 제2 섹션은 상기 제1 섹션과 상기 제3 섹션 사이에 배치되고, 상기 제1 직경은 상기 제2 섹션으로부터 상기 커버 부재의 상기 제1 표면을 향하여 점진적으로 증가하고, 상기 제1 섹션은 상기 중앙 개구의 축에 대해 기울어진 내측 표면을 가짐 -; 및
상기 제1 표면에서 폐쇄 경로를 따라 형성된 트렌치 - 상기 트렌치는 상기 트렌치의 내측 표면에 형성된 리세스를 가짐 -
를 포함하는 리드. - 제1항에 있어서,
상기 제1 섹션의 상기 내측 표면의 각도는 약 30° 내지 약 60°인, 리드. - 제1항에 있어서,
상기 리세스는, 상기 트렌치의 최하부 표면에 대해 약 15° 내지 약 45°의 각도를 이루는 방향을 따라 연장되는 베벨을 갖는, 리드. - 제1항에 있어서,
상기 커버 부재는 불꽃 연마된 석영(flame polished quartz)으로 이루어지는, 리드. - 제1항에 있어서,
상기 커버 부재는 석영으로 이루어지고, 상기 커버 부재의 상기 제2 표면은 불꽃 연마되는, 리드. - 제5항에 있어서,
상기 커버 부재의 상기 제2 표면은, 이트륨 산화물 함유 세라믹 또는 이트륨 함유 산화물을 포함하는 코팅을 갖는, 리드. - 제5항에 있어서,
상기 커버 부재의 상기 제2 표면은 약 2 옹스트롬 내지 약 150 옹스트롬의 평균 표면 조도를 갖는, 리드. - 제1항에 있어서,
상기 커버 부재는 비-불꽃 연마된 석영(non-flame polished quartz)으로 이루어지는, 리드. - 제8항에 있어서,
상기 커버 부재의 상기 제2 표면은, 이트륨 산화물 함유 세라믹 또는 이트륨 함유 산화물을 포함하는 코팅을 갖는, 리드. - 처리 챔버로서,
바디;
상기 바디 내에 배치된 기판 지지체 어셈블리;
상기 바디를 커버하는 리드 - 상기 리드는,
제1 표면 및 상기 제1 표면에 대향하는 제2 표면을 갖는 플레이트,
상기 플레이트를 관통하는 중앙 개구 - 상기 중앙 개구의 일부는 상기 제1 표면을 향하여 증가하는 내측 직경을 가짐 -, 및
상기 제1 표면에 형성된 트렌치
를 포함함 -; 및
상기 중앙 개구 내에 배치되며, 상기 중앙 개구의 내측 직경에 매칭하도록 성형된 테이퍼형 플랜지(tapered flange)를 갖는 가스 커플링 인서트(gas coupling insert); 및
상기 리드와 상기 가스 커플링 인서트 사이의 계면에 배치된 스페이서 링 - 상기 스페이서 링은 상기 리드와 상기 가스 커플링 인서트 사이의 계면에 매칭하는 형상을 가짐 -
을 포함하는 처리 챔버. - 제10항에 있어서,
상기 트렌치는 상기 트렌치의 내측 표면에 형성된 리세스를 갖는, 처리 챔버. - 제11항에 있어서,
상기 리세스는, 상기 내측 표면의 일부가 상기 트렌치의 최하부 표면에 대해 약 15° 내지 약 45°의 각도를 이루는 방향을 따라 연장되도록 베벨형으로 이루어지는(beveled), 처리 챔버. - 제10항에 있어서,
상기 플레이트는 불꽃 연마된 석영으로 이루어지고, 상기 플레이트의 상기 제2 표면은, 이트륨 산화물 함유 세라믹 또는 이트륨 함유 산화물을 포함하는 코팅을 갖는, 처리 챔버. - 제10항에 있어서,
상기 플레이트의 상기 제2 표면은 약 2 옹스트롬 내지 약 150 옹스트롬의 평균 표면 조도를 갖는, 처리 챔버. - 제10항에 있어서,
상기 플레이트는 비-불꽃 연마된 석영으로 이루어지고, 상기 플레이트의 상기 제2 표면은, 이트륨 산화물 함유 세라믹 또는 이트륨 함유 산화물을 포함하는 코팅을 갖는, 처리 챔버.
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