KR20130008745A - Method for fabricating touch panel - Google Patents

Abstract

The present invention relates to a method for manufacturing a touch panel, the process of forming a shielding layer in the outer region on the transparent window, the step of forming a flattening layer on the transparent window, the length of the X-axis direction on the planarizing layer is Y Forming a first mask layer exposing an area larger than an axial width, forming a first connection portion of a transparent conductive material on the planarization layer exposed by the first mask layer, and forming the first mask layer; Removing the layer and forming an insulating layer such that both ends of the length of the first connection part are exposed on the planarization layer and cover side surfaces of the width, and exposing at least both ends of the first connection part on the planarization layer. Forming a second mask layer, and forming a sensing electrode and a second connection portion with a transparent conductive material on the planarization layer exposed by the first mask layer. . Therefore, the touch panel of the present invention has an advantage that the planarization layer can prevent the sensing electrode from being disconnected by removing the step generated by the shielding layer. In addition, since the sensing electrode is formed by the printing method after forming the mask layer, the process is not only simple, and there is an advantage of preventing the short circuit caused by the etching residue.

Description

Manufacturing method of touch panel {Method for fabricating touch panel}

The present invention relates to a method of manufacturing a touch panel, and more particularly, to a method of manufacturing a touch panel in which a sensing electrode is integrally formed on one surface of a transparent window.

In general, the touch panel is an input device that can be easily used by anyone of all ages by interactively and intuitively operating a computer by simply touching a button displayed on a display with a finger.

The touch panel can be classified into a resistive method, a capacitive method, an ultrasonic method, and an infrared method according to an operation method. Among the capacitive methods, the touch sensing panel has a thin thickness, high durability, and multi-touch. Widely used in various electronic devices.

Conventional capacitive touch sensing panels are manufactured by a process of attaching a separate substrate based on PET or the like and having a sensing electrode formed on one surface thereof to a transparent window using an adhesive layer such as an optical clean adhesive (OCA) film.

However, when attaching a substrate on which a sensing electrode is formed to a transparent window using an adhesive layer, various defects such as bubbles, scratches, and foreign matters are generated, which not only lowers the production yield but also reduces the defective rate during the attaching process. Since additional processes, such as surface treatment by plasma etc., are included, manufacturing cost increases.

Accordingly, a sensing electrode, a wiring part, and an input / output pad formed integrally with one surface of the transparent window are formed, and the other surface corresponding to the one surface is in contact with each other so that the manufacturing process can be simplified and the yield can be increased while reducing the thickness and weight. Touch panels including electrode integrated windows have been developed.

The touch panel according to the related art including the above-described electrode-integrated window has a predetermined pattern on one surface of the transparent window in order to define an effective display area of the sensing electrode and the touch panel of the transparent window. And a shielding layer formed and visually shielding, a wiring portion formed on the shielding layer, and an input / output pad formed on the shielding layer and connected to the sensing electrode by the wiring portion.

The touch panel including the electrode-integrated window is formed by printing an opaque ink or the like with a shielding layer printed on an outer region of one surface of the transparent window, and the shielding layer is formed on the other side of the transparent window with the wiring part and the input / output pad formed thereon. In order to visually shield in the form of a thickness of about several μm. In addition, after the shielding layer is formed, a sensing electrode is formed by depositing a transparent conductive material such as indium tin oxide (ITO) on one surface of the transparent window and patterning the same by a photography method.

However, the touch panel according to the related art as described above has a problem that the sensing electrode is disconnected due to the transparent window and the large step because the shielding layer is formed to a thick thickness of several μm during the manufacturing process. In addition, since the sensing electrode is formed by the photolithographic method on which the transparent conductive material is deposited, the process is not only complicated and there is a problem of undesired shorting by the etching residue.

Accordingly, an object of the present invention is to provide a method for manufacturing a touch panel which can prevent the detection electrode from being disconnected by the step of the shielding layer.

Another object of the present invention is to form a transparent conductive material deposited during the formation of the sensing electrode by a photolithography method, so that the process is complicated and there is a problem of undesired shorting by the etching residue.

According to an aspect of the present invention, there is provided a method of manufacturing a touch panel, including: forming a shielding layer defining an effective display area on an outer region of a transparent window; and forming a planarization layer to cover the shielding layer on the transparent window. Forming a first mask layer on the planarization layer, the first mask layer exposing a region having a length in the X-axis direction greater than a width in the Y-axis direction, and transparent on the planarization layer exposed by the first mask layer. Depositing a conductive material to form a first connection portion, and removing both the first mask layer and exposing both ends of the length in the X-axis direction of the first connection portion on the planarization layer, and a side view of the width in the Y-axis direction Forming an insulating layer to cover, forming a second mask layer exposing at least both ends of the first connecting portion in the X-axis direction on the planarization layer; A transparent conductive material is deposited on the planarization layer exposed by the mask layer, so that N pieces are arranged along the Y axis in M rows on the X axis, and are spaced apart from each other by adjacent M rows on the X axis. And forming a sensing electrode connected to each other and electrically connected by N second axes of the Y-axis.

In the above, the planarization layer is formed of a transparent ink.

The planarization layer is formed by the method of silkscreen printing, gravure printing or comma printing.

In the above, the first and second mask layers are formed of UV ink.

In the above, the first and second mask layers are formed by a printing method such as silk screen printing, gravure printing, or comma printing.

In the above, the insulating layer is formed of an insulating ink using a mask.

The insulating layer is formed by a printing method such as silkscreen printing, gravure printing, or comma printing.

Therefore, the touch panel of the present invention has an advantage that the planarization layer can prevent the sensing electrode from being disconnected by removing the step generated by the shielding layer. In addition, since the sensing electrode is formed by the printing method after forming the mask layer, the process is not only simple, and there is an advantage of preventing the short circuit caused by the etching residue.

1 is a plan view schematically illustrating a touch panel according to an exemplary embodiment of the present invention.
2 is an enlarged view of a portion A of FIG. 1.
3 is a cross-sectional view taken along the line BB of FIG.
4a to 4e is a manufacturing process diagram of the touch panel according to the present invention.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the following embodiments of the present invention may be modified into various other forms, and the scope of the present invention is not limited to the embodiments described below. The embodiments of the present invention are provided to enable those skilled in the art to more fully understand the present invention.

1 is a plan view schematically illustrating a touch panel according to an exemplary embodiment of the present invention, and FIG. 2 is an enlarged view of a portion A of FIG. 1.

1 and 2, a plane of a touch panel according to an exemplary embodiment may include a transparent window 11, a shielding layer 13, a planarization layer 15, a sensing electrode 25, and a wiring unit 29. And an input / output pad 31.

The shielding layer 13 is formed by printing an opaque ink or the like on a portion of the transparent window 11, preferably, an outer region, to define an effective display area of the touch panel. In addition, the shielding layer 13 visually shields the wiring portion 29 and the input / output pad 31 formed on the upper surface of the shielding layer 13 from being exposed to the other surface of the transparent window 11.

The sensing electrode 25 is formed in any one of a diamond shape, a rectangular shape, a honeycomb shape, and a right triangle shape by interposing the planarization layer 15 on one surface of the transparent window 11. The sensing electrode 25 is a transparent conductive material such as indium-tin oxide (ITO), indium zinc oxide (IZO), or zinc oxide (ZnO) that has excellent light transmittance and electrical conductivity. M is a natural number) and N (N is a natural number).

The sensing electrodes 25 are formed in M rows in which N pieces formed along the Y axis are electrically connected by the second connection part 27 formed by the same process to form a body. In addition, each of the M columns in which N pieces are electrically connected along the Y axis by the second connection part 27 of the sensing electrode 25 is formed to be spaced apart from adjacent ones on the X axis.

Each of the M sensing electrodes 25 spaced apart from the adjacent one on the X axis is electrically connected to each other through the first connection unit 19. In the above, both ends of the first connector 19 are exposed by the insulating layer 21, and both ends of the exposed first connector 19 are in contact with each sensing electrode 25 to be electrically connected to each other.

Although the sensing electrodes 25 are described as being spaced apart from each other in which N pieces are connected along the Y axis and M columns on the X axis are adjacent to each other, in another embodiment of the present invention, M pieces are connected along the X axis and N on the Y axis. Columns may be formed spaced apart from each other adjacent to each other.

The wiring portion 29 and the input / output pad 31 are formed of a conductive metal such as aluminum (Al) or copper (Cu) on the shielding layer 13. In the above, the wiring unit 29 is formed to connect each of the plurality of sensing electrodes 25 formed to be connected along the X axis to the input / output pad 31.

3 is a cross-sectional view taken along the line B-B in FIG. 2.

The cross-sectional structure of the touch panel illustrated in FIG. 3 includes a shielding layer 13, a planarization layer 15, a first connection portion 19, an insulating layer 21, and a sensing electrode 25 formed on one surface of the transparent window 11. And a second connection portion 27.

The transparent window 11 may be formed of a transparent synthetic resin such as polyethylene terephtalete (PET) or acrylic, or soda lime glass.

The shielding layer 13 is formed in the outer region on one surface of the transparent window 11. In the shielding layer 13, the wiring part 29 and the input / output pad 31 formed thereon are prevented from being visually exposed to the other side of the transparent window 11 while preventing the decoration of the transparent window 11. The opaque ink such as black is formed to have a thickness of about 2 to 5 μm by a method such as silk screen printing, gravure printing, or comma printing. In addition, the shielding layer 13 may define an effective display area of the touch panel.

The planarization layer 15 is formed to cover the shielding layer 13 on one surface of the transparent window 11. The planarization layer 15 is formed of a transparent ink such as UV (ultraviolet) transparent ink to a thickness of about 3 to 7 μm by a method such as silk screen printing, gravure printing, or comma printing. As a result, the planarization layer 15 reduces or eliminates the step between the transparent window 11 and the shielding layer 13.

The first connection portion 19 is patterned in the effective display area of the touch panel defined by the shielding layer 13 on the planarization layer 15 so that the length in the X-axis direction is larger than the width in the Y-axis direction, It is formed to be arranged in a plurality of rows. In the first connection portion 19 is a transparent conductive material such as ITO (indium-tin oxide), IZO (indium zinc oxide) or ZnO (zinc oxide) excellent in light transmittance and electrical conductivity 1000 ~ 2000Å It is formed to a thickness of about. The first connection portion 19 may be formed by depositing a transparent conductive material and patterning the photolithography method. In addition, the first connector 19 may form an indium-tin oxide (ITO), indium zinc oxide (IZO), or the like after forming a first mask layer (not shown) that exposes a portion to be formed on the planarization layer 15. It may be formed by depositing a transparent conductive material such as zinc oxide (ZnO) by a method such as sputtering and removing the first mask layer.

The insulating layer 21 is formed on the planarization layer 15 so that both ends of the length of the first connecting portion 19 in the X-axis direction are exposed and the side surface of the width in the Y-axis direction is also covered. In the above-described insulating layer 21, UV (ultraviolet) transparent ink having an insulating property is formed in a thickness of about 1 to 3 μm by a method such as silk screen printing, gravure printing, or comma printing.

The sensing electrode 25 is a transparent conductive material, such as indium-tin oxide (ITO), indium zinc oxide (IZO), or zinc oxide (ZnO), which has excellent light transmittance and electrical conductivity on the planarization layer 15. It has a thickness of and is formed in any one shape such as diamond shape, rectangular shape, honeycomb shape and right triangle shape. In the above-described sensing electrodes 25, a plurality of sensing electrodes 25 are formed by the same process so as to be connected along the Y axis by the second connection part 27 forming one body. In addition, the sensing electrodes 25 connected along the Y-axis are respectively adjacent to each other on the X-axis and spaced apart at intervals of about 1 to 5 μm on the insulating layer 21, respectively, and are in contact with both exposed ends of the first connector 19. And is electrically connected.

The sensing electrode 25 may be formed by depositing a transparent conductive material and patterning the photolithography method. In addition, the sensing electrode 25 forms a second mask layer (not shown) on the planarization layer 15 and the insulating layer 21 to expose a portion where the sensing electrode 25 is to be formed. It may be formed by depositing a transparent conductive material such as -tin oxide), indium zinc oxide (IZO) or zinc oxide (ZnO) by sputtering or the like, and removing the second mask layer.

Since the sensing electrode 25 is formed in the planarization layer 15 having no step by the shielding layer 13, the sensing electrode 25 is prevented from being disconnected at a portion corresponding to the edge of the shielding layer 13. do.

Although not shown in FIG. 3, the wiring unit 29 and the input / output pad 31 are formed on the shielding layer 13 as shown in FIG. 1.

In the touch panel having the above-described configuration, when a user touches a finger or a touch pen on the other surface on which the sensing electrode 25 of the transparent window 11 is not formed, a sensing signal is generated at the sensing electrode 120. The sense signal may include a capacitance change that occurs upon contact. The transparent window 11 is preferably formed to have a uniform thickness in order to generate a capacitance value capable of accurately determining the contact position and the pressure according to the contact.

The sensing signal generated by contacting the user's finger or the touch pen is a control unit mounted on a circuit board (not shown) through the wiring unit 29 and the input / output pad 31 electrically connected to the sensing electrode 25. (Not shown) receives a detection signal to determine whether a contact has occurred and a location where the contact has occurred.

As described above, the touch panel according to the embodiment of the present invention is formed by forming the planarization layer 15 on the transparent window so as to cover the shielding layer 13 so as to reduce or eliminate the step by the shielding layer 13. Disconnection of the sensing electrode 25 can be prevented.

4A to 4E are manufacturing process diagrams of a touch panel according to the present invention.

Referring to FIG. 4A, a shielding layer 13 is formed in an outer region on one surface of the transparent window 11. In the above-described shielding layer 13, an opaque ink such as black or the like is formed into a thickness of about 2 to 5 µm by a method such as silk screen printing, gravure printing, or comma printing. The shielding layer 13 defines an effective display area of the touch panel, and prevents the wiring portion 29 and the input / output pad 31 formed thereon from being visually exposed to the other side of the transparent window 11, and prevents the transparent window 11 from being visually exposed. Decorate the outer area of (11).

The transparent window 11 may be formed of a transparent synthetic resin such as polyethylene terephtalete (PET) or acrylic, or soda lime glass.

Then, the planarization layer 15 is formed on one surface of the transparent window 11 to cover the shielding layer 13 to reduce or eliminate the step between the transparent window 11 and the shielding layer 13. The planarization layer 15 is formed of a transparent ink, such as UV (ultraviolet) transparent ink to a thickness of 3 ~ 7㎛ by a method such as silk screen printing, gravure printing or comma printing.

Referring to FIG. 4B, a first mask layer 17 is formed on the planarization layer 15 by exposing a predetermined area to ink such as UV ink using silk mask printing, gravure printing, or comma printing. Form. In the above description, the first mask layer 17 is arranged such that a region exposing the planarization layer 15 is arranged in a plurality of rows and a plurality of rows while the length of the X-axis direction is larger than the width of the Y-axis direction. Is formed.

In addition, the planarization layer 15 exposed by the first mask layer 17 is first pretreated with plasma, and indium-tin oxide (ITO), indium zinc oxide (IZO), or ZnO ( A transparent conductive material such as zinc oxide) is deposited to a thickness of about 1000 to 2000Å by a method such as sputtering. At this time, on the exposed portion of the planarization layer 15, a first connecting portion 19 having a length in the X-axis direction larger than a width in the Y-axis direction is formed.

Referring to FIG. 4C, the first mask layer 17 is removed. At this time, the transparent conductive material deposited on the first mask layer 17 is also removed, leaving only the first connection portion 19. Since the first connector 19 is formed using the first mask layer 17 without patterning the photolithography method, the etching process is simple and no etching residues are generated on the planarization layer 15.

Then, the insulating layer 21 is formed on the planarization layer 15 so that both ends of the length in the X-axis direction are exposed and the side surfaces of the width in the Y-axis direction are also covered. By using the insulating layer 21 as a mask, an insulating UV (ultraviolet) transparent ink having a thickness of about 1 to 3 μm is formed by a method such as silk screen printing, gravure printing, or comma printing.

Referring to FIG. 4D, a second mask layer 23 is formed on the planarization layer 15 that exposes a predetermined area by using a mask such as UV ink, silkscreen printing, gravure printing, or comma printing. Form. At this time, both ends of the first connecting portion 19 are exposed while the planarization layer 15 is exposed to the second mask layer 23 in any one of a diamond shape, a rectangular shape, a honeycomb shape, and a right triangle shape. Form.

In addition, the planarization layer 15 exposed by the first mask layer 17 is subjected to a second pretreatment with plasma, and has excellent light transmittance and electrical conductivity, such as indium-tin oxide (ITO), indium zinc oxide (IZO), or ZnO ( A transparent conductive material such as zinc oxide) is deposited to a thickness of about 200 to 500 kW by a sputtering method to form the sensing electrode 25 and the second connection part 27. At this time, N sensing electrodes 25 are electrically connected along the Y axis by the second connection part 27, and M rows on the X axis are spaced apart from adjacent ones. In addition, since the step difference caused by the shielding layer 13 is reduced or eliminated by the planarization layer 15, the sensing electrode 25 is prevented from being disconnected. In the above, the sensing electrodes 25 are electrically connected to each other on the X axis by the first connector 19. In addition, the second connection part 27 is formed on the insulating layer 21.

Referring to FIG. 4E, the second mask layer 23 is removed. At this time, the transparent conductive material deposited on the second mask layer 23 is also removed, leaving the sensing electrode 25 and the second connection portion 27. Since the sensing electrode 25 and the second connection part 27 are formed using the second mask layer 23 without patterning by the photolithography method, the process is simple and no short circuit due to the etching residues occurs.

Although a preferred embodiment of the touch panel according to the present invention has been described above, the present invention is not limited thereto, and various modifications can be made within the scope of the claims and the detailed description of the invention and the accompanying drawings. This also belongs to the present invention.

11: window 13: shielding layer
15: planarization layer 19: first connection portion
21 insulating layer 25 sensing electrode
27: second connection portion 29: wiring portion
31: input / output pad

Claims (7)

Forming a shielding layer defining an effective display region in an outer region on the transparent window;
Forming a planarization layer to cover the shielding layer on the transparent window;
Forming a first mask layer on the planarization layer exposing a region having a length in the X-axis direction greater than a width in the Y-axis direction;
Depositing a transparent conductive material on the planarization layer exposed by the first mask layer to form a first connection portion;
Removing the first mask layer and forming an insulating layer on the planarization layer so that both ends of the length in the X-axis direction of the first connection part are exposed and the side surfaces of the width in the Y-axis direction are also covered;
Forming a second mask layer on the planarization layer exposing at least both ends of the first connection portion in the X-axis direction;
By depositing a transparent conductive material on the planarization layer exposed by the first mask layer, N is arranged along the Y axis in M rows on the X axis, and spaced apart from adjacent M columns on the X axis, respectively, to the first connection portion. Forming a sensing electrode that is electrically connected by the N-axis and electrically connected by N second axes of the Y-axis.
The method of claim 1, wherein the planarization layer is formed of a transparent ink.
The method of claim 1, wherein the flattening layer is formed by silkscreen printing, gravure printing, or comma printing.
The method of claim 1, wherein the first and second mask layers are formed of UV ink.
The method of manufacturing a touch panel according to claim 1, wherein the first and second mask layers are formed by a printing method such as silk screen printing, gravure printing, or comma printing.
The method according to claim 1, wherein the insulating layer is formed of an insulating ink using a mask.
The method of manufacturing a touch panel according to claim 1, wherein the insulating layer is formed by a printing method such as silk screen printing, gravure printing, or comma printing.

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