KR20090054917A - Pattern checker - Google Patents

Abstract

An object of the present invention is to perform an inspection using both the fallen illumination image and the transmitted illumination image at the same speed as that of the inspection apparatus using only one image, and do not cause an increase in the installation area. To provide.

Cameras 5a and 5b disposed on the upper and lower sides of the tape 10 (such as a COF tape), which are film-shaped band-shaped workpieces, for imaging the upper and lower sides of the tape 10, respectively, and the tape ( It is provided with the illuminating device 4 which irradiates an illumination light from the upper surface side of 10). The function of the fall light illumination for generating the fall light illumination image which shows the reflection state in the tape 10, and the function of the transmitted light illumination for generating the transmission illumination image which shows the distribution of the transparency in the tape 10, Since it is obtained by only one illumination device 4, the fall illumination image and the transmission illumination image regarding one to-be-tested pattern can be acquired simultaneously.

Description

Pattern checker {PATTERN INSPECTION DEVICE}

The present invention relates to an apparatus for inspecting a circuit pattern provided on a film carrier tape for mounting electronic components.

As film carrier tapes for electronic component mounting, Tape Automated Bonding (TAB) tapes, Tape Ball Grid Array (T-BGA) tapes, Application Specific Integration Circuit (ASIC) tapes, Chip On Film (COF) tapes, and the like are known. The film carrier tape for electronic component mounting consists of a transparent film, the electronic component adhering to this film, and the conductor pattern printed on the film in order to connect these electronic components mutually. Heat resistance is needed for a film material, The polyimide resin etc. which are excellent in heat resistance are used. It has a conductor pattern on an electronic component and a film, and comprises a circuit pattern. As a pattern inspection apparatus which inspects the circuit pattern on the film carrier tape for electronic component mounting, what is described, for example in patent document 1 (Unexamined-Japanese-Patent No. 2004-28597) is known.

This type of pattern inspection device irradiates the tape to be inspected with illumination light, images the circuit pattern with an imaging device, acquires a circuit pattern image, compares the circuit pattern image with a reference pattern, and detects defects in the circuit pattern. By checking the presence or absence, it is determined whether or not the circuit pattern is defective. As a defect in a circuit pattern, a defect (so-called "dish down") in which a part of the upper surface side of the wiring of the circuit pattern is missing (so-called "thinning") in which a part of the wiring is thinner than a prescribed value (so-called "thinning") And so-called defects ("thickening of the bottom") in which the width of the contact surface with the film in the wiring is larger than the prescribed value.

4 shows a main part of a pattern inspection apparatus A for acquiring a fall illumination image based on the reflected light of the tape and a pattern inspection apparatus B for acquiring a transmitted illumination image based on light transmitted through the tape (transmitted light). It is a conceptual diagram to show. The pattern inspection apparatus of FIG. 4A receives the light reflected by the tape 10 from the camera 5a while illuminating the tape 10 on which the conductor patterns D1 and D2 are printed with the illumination device 4, By imaging the tape 10 on the basis of the reflected light, a fall illumination image of the tape 10 is obtained, and a fall illumination image signal 501 representing the fall illumination image is output. When the pattern inspection apparatus of FIG. 4B illuminates the tape 10 on which the conductor patterns D1 and D2 are printed with the illuminating device 4, the light transmitted through the tape 10 (transmitted light) is photographed by the camera 5b. ), And by imaging the tape 10 based on the transmitted light, a transmitted illumination image of the tape 10 is obtained, and outputs a transmitted illumination image signal 502 representing the transmitted illumination image. The conductor pattern D2 has defects such as bottom thickening R and dish down S.

FIG. 5 is a view for explaining a method of inspecting an inspected pattern by the pattern inspecting apparatus of FIG. 4A or FIG. 4B. FIG. 5A is a plan view showing a portion of the tape 10 on which the conductor patterns D1 and D2 are printed, FIG. 5B is a cross-sectional view taken along the line AA of FIG. 5A, and FIG. (C) is a diagram showing a fall illumination image signal 501, and FIG. 5 (D) is a diagram showing a transmitted illumination image signal 502. FIG. The standard value of the width of the conductor pattern D1 is W1, the standard value of the width of the conductor pattern D2 is W3, and the standard value of the gap between the conductor patterns D1 and D2 is W2. Since the bottom thickness R exists in the conductor pattern D2, the interval between the conductor patterns D1 and D2 in the AA line is reduced to W4. In addition, the width from the left side of the conductor pattern D2 to the inner side of the dish down S is W5. Arrow 200 indicates the conveyance direction of the tape 10. R and s in FIG. 5C show the hunting of the waveform of the fall-off illumination image signal 501 corresponding to the bottom thickening R and the dish down S, respectively.

When the tape 10 shown in Figs. 5A and 5B is inspected by the pattern inspection device having the configuration shown in Fig. 4A, the fall light of Fig. 5C from the camera 5a. Image signal 501 is obtained. In the fall-off illumination image, by setting a threshold in a slightly brighter region of the image signal range indicating contrast (for example, Th1 shown in Fig. 5C), the difference between W3 and W5 'can be detected relatively easily. Can be. Therefore, about the defect on the upper surface side of a conductor pattern, such as dish down S, a defect location can be detected comparatively easily by acquiring a fall illumination image. On the other hand, defects existing in the dark portion of the image signal showing contrast, such as thickening (R) on the bottom side of the conductor pattern, may be set even if the threshold value is set in the dark region (for example, as shown in FIG. 5C). Th2] and the change point r are mixed with variations in reflectance of the film 10a serving as the base material, and it is difficult to detect the difference between W2 and W4 '. Therefore, a defect existing at the bottom side tends to be difficult to recognize as a defect only based on the fall illumination image.

When the tape 10 shown in Figs. 5A and 5B is inspected by the pattern inspection apparatus of Fig. 4B, the transmission illumination image signal of Fig. 5D is transmitted from the camera 5b. (502) is obtained. Since the conductor pattern is made of metal and is opaque, the shadow (silhouette) of the surface where the conductor patterns D1 and D2 are in close contact with the film 10a appears clearly in the transmission illumination image. Thus, as shown in Fig. 5D, by comparing the transmitted illumination image signal 502 with the threshold Th3, the distance W2 between the conductor patterns D1 and D2 can be measured and W2. Since W2> W4 can be known by comparison of W4 and W4, the space | interval with conductor patterns D1 and D2 is reduced, and it can be easily determined that bottom thickness R is present in conductor pattern D2. .

As described above, in the inspection by the fall illumination image, there is a drawback that it is difficult to detect the thickening of the bottom in the conductor pattern, but in addition to the inspection by the fall illumination image, the inspection by the transmission illumination image is performed so that The detection probability of thickening of the bottom can be improved. Like the thickening of the bottom, the defect "thinning", in which the width of the conductor pattern is thinner than the standard, is easily and reliably obtained by acquiring a transparent illumination image of the conductor pattern and inspecting the silhouette of the contact surface between the conductor pattern and the film. Can be detected. In this way, by acquiring both images of the fallen illumination image and the transmitted illumination image, and utilizing both characteristics, it is possible to improve the detection probability of defects in the inspected pattern such as dish down, thinning, and thickening of the bottom. .

Patent document 1 is provided with the fall light illuminating device which illuminates a tape from the upper side, and the transmitted light illuminating device which illuminates a tape from below, in order to test | inspect a single tape, and has both an image of a fall illuminating image and a translucent illumination image. The pattern inspection apparatus to be used is disclosed.

FIG. 6 is a conceptual diagram showing the configuration of a conventional pattern inspection apparatus shown in FIG. 5 in Patent Document 1. As shown in FIG. The pattern inspection apparatus includes a control device 21, an imaging device 8 composed of a line sensor camera, a fall lighting device 6, a tape tensioning mechanism 22, a transmission lighting device 7, a tape conveying mechanism 23, and The defective punch mechanism 24 is provided. The control device 21 inspects the imaging device 8, the fall lighting device 6, the tape tensioning mechanism 22, the transmission lighting device 7, the tape conveyance mechanism 23, the defective product punch mechanism 24, and the like. The control signals are transmitted at predetermined timings of the operation to control them. In the control apparatus 21, the master data 25 which becomes a reference | standard of a pattern test | inspection is previously input. The master data 25 includes two types of reference patterns: a reference pattern of an image (falling illumination image) obtained by fall illumination and a reference pattern of an image (transmission illumination image) obtained by transmission illumination.

Inspection by the pattern inspection apparatus of FIG. 6 is performed in the following order. First, the tape conveyance mechanism 23 is driven by the control part 21, and the tape 1 is conveyed and the test | inspection pattern in the tape 1 stops at an imaging position. Next, tension is applied in the width direction of the tape 1 in a state where the peripheral portion of the tape 1 is fitted by the grip upper member 16 and the grip lower member 17 of the tape tensioning mechanism 22. All.

Next, illumination light is irradiated to the test | inspection pattern on the tape 1 by the fall lighting device 6. The reflected light from the pattern under test is received by the CCD line sensor 81 of the imaging device 8. Next, while the illumination by the fall illumination device 6 is being illuminated, the frame to which the fall illumination device 6 and the imaging device 8 are fixed moves in the width direction of the tape 1. As a result, the fall illumination device 6 and the imaging device 8 both move in the width direction of the tape 1 and are scanned from one edge A of the tape 1 toward the other edge B. FIG. In the imaging device 8, the inspection pattern between the edges A and B of the tape 1 is imaged. The information of the image to-be-tested pattern is memorize | stored in the control part 21 corresponding to the position of the width direction of a tape.

When the imaging by the imaging device 8 reaches the edge B of the tape 1, the illumination by the fall lighting device 6 is stopped and the inspection object on the tape 1 is transmitted by the transmission lighting device 7. Illumination light is irradiated to the pattern, and transmitted light transmitted through the inspected pattern is received by the CCD line sensor 81 of the imaging device 8. Next, the frame moves in the width direction of the tape 1 in the state of being illuminated by the transparent illumination device 7. As a result, both the transmissive illumination device 7 and the imaging device 8 move in the width direction of the tape 1, and scan toward the one edge A from the other edge B of the tape 1. In the imaging device 8, the inspection pattern between the edge B and the edge A of the tape 1 is imaged. The information of the image to-be-tested pattern is stored by the control part 21 corresponding to a position in the width direction of a tape similarly to the above. When the imaging by the imaging device 8 reaches the edge A of the tape 1, the illumination by the transmission illuminator 7 is stopped, and the tape conveyance mechanism 23 is driven again, and the tape 1 ) Is conveyed and controlled so that a new inspected pattern stops at a predetermined imaging position.

As described above, the two information of the information (falling illumination image) and the information (transmission illumination image) by the reflected light of the inspection pattern on the tape 1 obtained by the reciprocating movement of the imaging device 8 and the transmitted light are controlled. In the apparatus 21, it is compared with each master data 25 stored, and it is determined whether it is bad.

The conventional pattern inspection apparatus described in Patent Document 1 described with reference to FIG. 6 includes a fall light imaging process of obtaining a fall illumination image by illuminating the tape 1 by the fall lighting device 6, and the transmission lighting device 7. One to-be-tested pattern is inspected by the two process of the transmission light imaging process which obtains a transmission illumination image by illuminating the tape 1 by it. In the conventional pattern inspection apparatus described in Patent Document 1, when both the illumination device 6 and the illumination device 7 are turned on, the fall light and the transmitted light interfere with each other, so that both the fall illumination image and the transmitted illumination image Since it is not clear and the defect of a to-be-tested pattern cannot be found, the fall lighting device 6 and the permeation lighting device 7 are inevitably lighted alternately, and it is divided into two processes of a fall light imaging process and a transmitted light imaging process. One test pattern is examined. Thus, the conventional pattern inspection apparatus described in Patent Document 1 has a problem to be solved that it is difficult to increase the speed of pattern inspection.

In order to improve the speed of the pattern inspection by improving the conventional method of FIG. 6, for example, the pattern inspection apparatus shown in FIG. 7 is used. The pattern inspection apparatus of FIG. 7 includes a control unit 11 (corresponding to the control apparatus 21 of FIG. 6), a fall light inspection unit 31, a transmitted light inspection unit 32, and a puncher unit 80 (defective punch mechanism of FIG. Equivalent to 24), the unwinding 21, the winding 23, and the air dancers 221, 222. The fall light inspection part 31 is corresponded to the fall lighting device 6 and the imaging device 8 in FIG. The transmission light inspection part 32 is corresponded to the transmission illumination device 7 and the imaging device 8 in FIG. Whereas the pattern inspection apparatus of FIG. 6 includes one inspection section composed of the fall lighting device 6, the transmissive lighting device 7, and the imaging device 8, the pattern inspection device of FIG. 7 is a fall light inspection section 31. And two inspection units called the transmitted light inspection unit 32. The unwinding part 21, the winding-up part 23, and the air dancers 221, 222 correspond to the tape conveyance mechanism 23 in FIG.

The control part 11 is provided with the control part main body 11a which consists of a server, the display 11b, and the keyboard 11c. The display 11b is controlled by the control unit body 11a. The keyboard 11c is a terminal device that inputs a command or data to the control unit body 11a. For example, selection of data to be displayed on the display 11b is instructed to the control unit body 11a by operation of the keyboard 11c. do.

The unwinding part 21 is provided with the winding reel 10a and the tension roller 25a which were attached to the shaft 21a. The fall light inspection part 31 is provided with the camera 5a, the fall lighting device 6, the stage 31a, and the free sprockets 25b and 25c. The transmission light inspection part 32 is provided with the camera 5b, the transmission illumination apparatus 7, the stage 32a, and the free sprocket 25g. The puncher portion 80 includes three punchers 80a and a free sprocket 25e. The winding-up part 23 is equipped with the winding reel 10b attached to the shaft 23a, and the tension roller 25f. The air dancer 221 is provided with eight sensors 22a, and detects the position of the lower end of the tape 10 with the sensor 22a, so that the tape 10 always maintains a margin of adequate length. The tape conveyance mechanism of 31) is controlled. The air dancer 222 is equipped with eight sensors 22a, and detects the position of the lower end part of the tape 10 with the sensor 22a, and the transmitted light inspection part 32 so that the tape 10 may always maintain a suitable length. Is controlling the tape conveyance mechanism. In the figure, the tape 10 is unwound from the reel reel 10a and shows the tape while being wound on the reel 10b.

Since the pattern inspection apparatus of FIG. 7 arranges the fall light inspection part 31 and the transmitted light inspection part 32 in the conveyance direction of the tape 10, it irradiates one to-be-tested pattern with fall light, and acquires a fall illumination image. In the meantime, another inspected pattern can be simultaneously illuminated with the transmissive illumination device 7 to obtain a transmissive illuminated image. Therefore, compared with the pattern inspection apparatus of patent document 1 shown in FIG. 6, an inspection pattern can be inspected at twice the speed. However, since the pattern inspection apparatus of FIG. 7 includes the fall light inspection unit 31 and the transmitted light inspection unit 32, as illustrated in FIG. 7, the width inspection dimension is one inspection unit and one as compared to the pattern inspection apparatus of FIG. 6. The length of the two air dancers (1690 mm in the example of FIG. 7) is lengthened in the conveying direction of the tape 10. The pattern inspection apparatus of FIG. 7 in which two inspection portions are arranged in series so as to be inspected simultaneously by fall light and transmitted light requires a long installation place, and thus a large installation area. In addition, since the fall light inspection part 31 and the transmitted light inspection part 32 require the mechanism for controlling tape conveyance with high precision, manufacturing cost of the pattern inspection apparatus of FIG. 7 becomes expensive. Therefore, the apparatus of FIG. 7 has a problem to be solved with respect to the installation area and manufacturing cost.

Therefore, an object of the present invention is to use the image of both the fall illumination image and the transmitted illumination image of the inspected pattern, so that the inspection of the inspected pattern can be performed at high speed, and either the fall illumination image or the transmissive illumination image can be obtained. An image of a bay can be provided in the same area as the pattern inspection apparatus which inspects a pattern under test, and the manufacturing cost is low.

[Patent Document 1] Japanese Patent Application Publication No. 2004-28597

[Patent Document 2] Japanese Patent Application Laid-open No. Hei 11-296657

In order to solve the above problem, the present invention provides the following means.

(1) In the pattern inspection apparatus which image | photographs the pattern formed in the film-shaped strip | belt-shaped workpiece | work, and examines the external appearance of the said pattern,

First imaging means arranged on one surface side of the strip-shaped workpiece to image the strip-shaped workpiece;

Second image pickup means disposed on the other surface side of the strip-shaped workpiece to image the strip-shaped workpiece;

Illumination means which irradiates from one surface side of the said strip | belt-shaped workpiece | work was provided, The pattern inspection apparatus characterized by the above-mentioned.

(2) the illumination means having an observation window disposed between the light incidence opening of the first imaging means and the band-shaped workpiece, for passing the light reflected from the band-shaped workpiece,

The said 1st imaging means image | photographs the said strip | belt-shaped workpiece | work through the said observation window, The pattern inspection apparatus of said (1) characterized by the above-mentioned.

(3) The pattern inspection apparatus according to (1) or (2), wherein the illumination means simultaneously performs illumination for the first imaging means and illumination for the second imaging means.

According to the present invention having the above-described configuration, by illuminating one inspected pattern in the strip-shaped work with one illuminating means, a fall illumination image and a transmissive illuminating image relating to the inspected pattern can be obtained simultaneously, By using both the fallen-light image and the transmitted-light image of the inspected pattern, the inspected pattern can be inspected at high speed, and the fallen-light image or the transmitted-light image can be acquired by one inspection unit. In addition, the pattern inspection apparatus can be provided in the same area as the pattern inspection apparatus for inspecting the inspection target pattern based on the image of only one of these images, and the manufacturing cost can be low.

EMBODIMENT OF THE INVENTION Next, embodiment of this invention is described with reference to drawings. 1 is a conceptual diagram showing the configuration of an embodiment of a pattern inspection apparatus according to the present invention. The pattern inspection apparatus includes the control device 1, the cameras 5a and 5b using the CCD line sensor as the light sensing means, the lighting device 4, the tape tensioning mechanism 3, the tape conveyance mechanism 2 and the defective product punching mechanism. (8) is provided. The tape 10 is a film carrier tape for mounting electronic components such as a COF tape, and is one kind of the above-described strip-shaped work. The cameras 5a and 5b correspond to the above-mentioned first and second imaging means, respectively.

The control device 1 inspects the cameras 5a and 5b, the lighting device 4, the tape tensioning mechanism 3, the lighting device 4, the tape conveying mechanism 2, the defective product punching mechanism 8, and the like. Control signals are transmitted at predetermined timings of operation to control them. The master device 9, which is a standard for pattern inspection, is input to the control device 1 in advance. The master data 9 includes two types of reference patterns: a reference pattern a of an image (falling illumination image) obtained by fall illumination and a reference pattern b of an image (transmission illumination image) obtained by transmission illumination. It is.

The tape tensioning mechanism 3 supports the peripheral portion of the tape 10 by the upper member 31 for grip and the lower member 32 for grip, and applies the tension in the width direction to the tape 10 so that the tape 10 Improves the floor plan. The illumination device 4 irradiates the illumination light with respect to the inspection pattern on the tape 10. The lighting device 4 is arranged between the light incidence opening of the camera 5a and the tape 10 and has an observation window through which the light reflected from the tape 10 passes, the camera 5a through the observation window. The tape 10 is imaged. As an example of an illuminating device having an observation window and capable of illuminating a target area of illumination with equal illuminance, an "imaging optical system of an image processing apparatus" disclosed in Patent Document 2 (Japanese Patent Application Laid-Open No. Hei 11-296657) have. The camera 5a receives the reflected light from the pattern under test by the CCD line sensor 51. In addition, the camera 5b receives the transmitted light from the inspected pattern by the CCD line sensor 52.

The CCD line sensors 51 and 52 are formed by arranging a plurality of CCDs in a line (line) shape. The arrangement direction of the CCD in the CCD line sensors 51 and 52 is a direction orthogonal to the direction in which the tape 10 is conveyed (that is, the longitudinal direction of the tape 10). The tape conveyance mechanism 2 conveys the tape 10 in the longitudinal direction at intervals that are intermittently fixed at minute intervals in units of widths of pixels constituted by CCDs. The cameras 5a and 5b image the tape 10 at a timing synchronized with the intermittent conveyance.

Inspection by the pattern inspection apparatus of FIG. 1 is performed in the following order. First, when the tape conveyance mechanism 2 is driven by the control of the control apparatus 1, the tape 10 is conveyed, and when the front-end | tip part of the to-be-tested pattern in the tape 10 reaches an imaging position, the camera 5a and 5b) starts imaging.

Next, in the state which is illuminating by the illumination device 4, the tape conveyance mechanism 2 conveys the tape 10 in the longitudinal direction by the said fixed minute distance from the position of the start end mark of a to-be-tested pattern. During this conveyance, the cameras 5a and 5b image the inspected pattern at the timing. When the cameras 5a and 5b finish the imaging of the end mark of the inspected pattern, the tape conveyance mechanism 2 is used when the position of the start end mark of the next inspected pattern is imaged by the cameras 5a and 5b. The tape 10 is quickly conveyed, and the tape 10 is conveyed by the micro distance at the timing from the time when the position of the start end mark was imaged. Similarly, the inspection target pattern on the tape 10 is sequentially imaged by the cameras 5a and 5b.

As described above, in accordance with the conveyance of the tape 10, the image data by the reflected light of the inspected pattern on the tape 10 and the image data by the transmitted light of the inspected pattern are obtained, and the signals of these image data are respectively It is output from the camera 5a and the camera 5b as the fall illumination image signal 501 and the transmitted illumination image signal 502. The fall illumination image and the transmitted illumination image are compared with the reference pattern a and the reference pattern b stored in the control device 1, respectively. The control device 1 determines whether or not the inspected pattern is defective by this comparison.

FIG. 2 is a diagram showing a method of determining whether or not a test target pattern is defective by the control device 1 in FIG. Since the main part of the tape conveyance mechanism 2 in the pattern inspection apparatus of FIG. 1 is the unwinding part 21 and the winding-up part 23, in FIG. 2, the tape 10 by the unwinding part 21 and the winding-up part 23 is shown. Is shown conceptually. Further, the control device 1 compares the fallen illumination image and the transmitted illumination image with the reference pattern (a) and the reference pattern (b), respectively, to determine whether the inspected pattern is defective or not, as described above. Although it has a function of controlling the operation of the entire inspection apparatus, only the determination function is extracted and shown in FIG.

The determination function is composed of determination units 1c and 1d, combining unit 1e and final determination unit 1f. The reference patterns a and b are data stored in the determination units 1c and 1d, respectively. As described above, the pattern inspection apparatus that determines whether or not the inspected pattern is defective using only the fallen illumination image has a weak point in detecting such as thickening of the bottom. Therefore, the pattern inspection apparatus according to the present embodiment includes the fallout illumination image generation camera 5a and the transmitted illumination image generation camera 5b, whereby each of these cameras causes the fallout illumination image signal 501 and the transmitted illumination image signal. 502 is being obtained.

1 and 2, a determination function for determining whether or not the inspected pattern in the embodiment of FIG. 1 is defective will be described. It is assumed that the pattern inspection apparatus of FIG. 1 is inspecting an area including the conductor patterns D1 and D2 shown in FIGS. 5A and 5B. The determination units 1c and 1d obtain data from the reference patterns a and b indicating that the conductor patterns D1 and D2 are present in the predetermined regions, respectively. The determination unit 1c detects the width of the conductor patterns D1 and D2 and the gap between the conductor patterns by comparing the fall illumination image signal 501 with the first threshold value, and determines the width and the gap between the reference pattern (a). The defects such as the dish-down S are detected in comparison with the widths and intervals in the circuits, respectively, and a determination signal 103 indicating the determination result (the presence or absence of the defects) is output. The determination unit 1d compares the transmitted illumination image signal 502 with the second threshold value, detects the widths of the conductor patterns D1 and D2 and the gaps between the conductor patterns, and determines the width and the gap between the reference patterns b. In comparison with the width and the interval in the above), defects such as thickening of the bottom (R) are detected, and a determination signal 104 indicating the determination result is output.

The combining unit 1e receives the determination signals 103 and 104 output from the determination units 1c and 1d, respectively, and synthesizes the determination results indicated by the determination signals 103 and 104 for each predetermined range in the inspection pattern. Then, the degree of the defect of the predetermined range is determined, and a composite determination signal 105 indicating the determination is generated. The final judging unit 1f comprehensively evaluates the inspected pattern on the basis of the degree of the defect of a certain range of the inspected pattern indicated by the synthesis determination signal 105, and determines whether the inspected pattern is a defective product. Further, it is determined whether or not the hole to be inspected should be punched by the defective punch mechanism 8.

FIG. 3 is a diagram conceptually illustrating the external dimensions of the pattern inspection apparatus of FIG. 1. FIG. The pattern inspection apparatus of FIG. 3 includes a control unit 11 (corresponding to the control apparatus 1 of FIG. 1), an inspection unit 30, a puncher unit 80 (corresponding to the defective product punch mechanism 8 of FIG. 1), and an unwinding unit. It consists of 21, the winding part 23, and the air dancer 22. As shown in FIG. The inspection part 30 is corresponded to the part which consists of the illuminating device 4 and camera 5a, 5b in FIG. The unwinding part 21, the winding-up part 23, and the air dancer 22 correspond to the tape conveyance mechanism 2 of FIG. The tape tensioning mechanism 3 in FIG. 1 is not shown in FIG.

The pattern inspection apparatus of FIG. 7 described above is provided with two inspection units, a fall light inspection unit 31 and a transmitted light inspection unit 32, to obtain a fall illumination image and a transmitted illumination image of the tape 10. FIG. On the other hand, the pattern inspection apparatus in Fig. 3 acquires both images at the same time as in the conventional apparatus, but since there is a configuration in which both of these images are acquired with respect to one common inspection pattern, there is only one detection unit. As described above, the pattern inspection apparatus of FIG. 3 generates the fallen illumination image and the transmitted illumination image at the same time as the pattern inspection apparatus of FIG. 7 and performs inspection using both images. Is high speed without falling behind the inspection speed by the pattern inspection apparatus of FIG.

In addition, the pattern inspection apparatus of FIG. 7 provides each of the fall light inspection unit 31 and the transmitted light inspection unit 32 with a looseness to the tape 10 and to impart a function of smoothly conveying the tape 10. In comparison with the air dancers 221 and 222, in the pattern inspection apparatus shown in Fig. 3, since there is only one inspection unit, only one air dancer is sufficient. In this manner, the pattern inspection apparatus of FIG. 3 uses the fall light inspection unit 31, the transmitted light inspection unit 32, and the air dancers 221 and 222 in the pattern inspection apparatus of FIG. 22), it is 1690 mm or less in the total width. Therefore, the installation area of the apparatus of FIG. 5 is significantly reduced compared with the installation area of the apparatus of FIG. In addition, since the pattern inspection apparatus of FIG. 3 having one inspection unit has a high-precision conveying mechanism for conveying the tape 10 intermittently by minute distances (distances corresponding to the resolutions of the cameras 5a and 5b), there is enough one. As compared with the conventional pattern inspection apparatus of Fig. 7, which requires two identical conveyance mechanisms, it can be manufactured at a very low cost.

In the pattern inspection apparatus of Patent Literature 1, a fall lighting device and a transmissive lighting device are provided, and each of these lighting devices is assigned exclusively for the fall lighting image acquisition and the permeation lighting image acquisition. Since both lights interfere with each other and both images are not clear at all, each light is turned on alternately, and both images can be obtained alternately, so that the inspection speed can be improved. On the other hand, in the embodiment of the present invention described above, by illuminating one inspected pattern on the tape 10 with only one illuminating device 4, a fall illumination image and a transmissive illuminating image relating to the inspected pattern are displayed. Simultaneously obtained, the inspection using both the fallen-light image and the transmitted-light image of the inspected pattern can be performed at high speed, and furthermore, the inspection-pattern of the inspected pattern is based on the image of only one of the fallen-light image and the transmitted-light image. It can be provided in the same area as the pattern inspection apparatus which examines, and manufacturing cost is low.

In addition, although embodiment was described in detail as an example of this invention, of course, this invention is not limited to these forms. For example, in the embodiment of Fig. 1, only one camera having a fall light illumination image acquisition symbol 1a is used. However, in the pattern inspection apparatus of the present invention, when inspecting a tape having a width wider than that of one camera, a plurality of cameras are used. By arranging the cameras for the fall illumination image acquisition in the width direction of the tape, the cameras are arranged so as to acquire the fall illumination image for the entire tape width area by the plurality of cameras. The same applies to the camera for transmitting illumination image acquisition.

In addition, in the embodiment shown in FIGS. 1-3, there was only one lighting means (corresponding to the lighting apparatus 4), but this invention does not necessarily limit to one lighting means. For example, the first illuminating means for the fall illumination and the second illuminating means for the transmissive illumination are provided on the side of the first imaging device (corresponding to the camera 5a) for acquiring the fall illumination image, and the first imaging device is a The band-shaped workpiece is imaged by illumination (falling illumination), and the second imaging device (equivalent to the camera 5b) is configured to capture the band-shaped workpiece by illumination (transmission illumination) of the second lighting device. Even if the optical axis of an imaging device is made different, ie, the structure which offset the optical axis of the 1st and 2nd imaging device is employ | adopted, this invention can be implemented.

Thus, in the structure which provided the 1st and 2nd illumination means, and offset the optical axis of the 1st and 2nd imaging device, each of the 1st and 2nd imaging devices is strip-shaped based only on illumination by only 1 illumination means, respectively. Since the work is imaged, the fall light and the transmitted light do not interfere with each other even when the fall light and the transmissive light are simultaneously performed, so that a clear fall light image and the transmissive light image are obtained from the first and second imaging devices, respectively, And since a 2nd imaging device can image | photograph a strip | belt-shaped workpiece | work simultaneously, it is possible to test | inspect a to-be-tested pattern at high speed similarly to the structure with one illumination means. Moreover, in the pattern inspection apparatus of such a structure which provided such a 1st and 2nd illumination means, and offset the optical axis of the 1st and 2nd imaging device, the to-be-tested pattern in a strip | belt-shaped workpiece is the 1st and 2nd imaging In the apparatus, although slightly shifted in the conveyance direction of a strip | belt-shaped workpiece, since the 1st and 2nd lighting means and the 1st and 2nd imaging device can be provided in one inspection apparatus, 1 conveyance mechanism of a strip | belt-shaped workpiece is enough, Compared with the conventional pattern inspection apparatus of FIG. 7, which requires two identical conveyance mechanisms, it can be manufactured very inexpensively.

1 is a conceptual diagram showing the configuration of an embodiment of a pattern inspection apparatus according to the present invention.

FIG. 2 is a diagram showing a method of determining whether or not a test target pattern is defective by the control device 1 in FIG.

3 is a configuration diagram for explaining the external dimensions of the pattern inspection apparatus of FIG.

Fig. 4 is a conceptual diagram showing the main part A of the pattern inspection apparatus for acquiring only the fall illumination image and the main part B of the pattern inspection apparatus for acquiring only the transmitted illumination image.

Fig. 5 is a view for explaining the fall-off illumination image signal and the transmission illumination image signal by the pattern inspection apparatus in Figs. 4A and 4B.

6 is a conceptual diagram showing the configuration of a conventional pattern inspection apparatus.

7 is a block diagram showing a conventional pattern inspection apparatus.

<Description of the symbols for the main parts of the drawings>

1: control unit

1c, 1d: determination unit

1e: synthesis section

1f: final judgment unit

2: tape conveyance mechanism

3: tape tensioning mechanism

4: lighting device

5a, 5b: Cameras using CCD line sensors as light sensing means

8: defective product punch mechanism

9: master data

9a, 9b: reference pattern

10: film carrier tape for mounting electronic components such as COF tape

10a: reel reel

10b: winding reel

11: control unit

11a: control unit body

11b: display

11c: keyboard

21: loosening part

21a, 23a: axis

22, 221, 222: air dancer

23: winding

25a, 25f: tension roller

25b, 25c, 25e, 25g: free sprocket

25d, 25h: Sprocket

30: inspection unit

31: Falling light inspection unit

32: transmitted light inspection unit

80: puncher

103, 104: judgment signal

105: synthesis determination signal

200: conveying direction of the tape

501: fall lights image signal

502: transmitted light image signal

Claims (3)

In the pattern inspection apparatus which image | photographs the pattern formed in the film-form strip | belt-shaped workpiece | work, and examines the external appearance of the said pattern, First imaging means arranged on one surface side of the strip-shaped workpiece to image the strip-shaped workpiece; Second image pickup means disposed on the other surface side of the strip-shaped workpiece to image the strip-shaped workpiece; Illumination means irradiated from one surface side of the said strip | belt-shaped workpiece | work was provided, The pattern inspection apparatus characterized by the above-mentioned. The said illumination means is provided between the light incident opening of the said 1st imaging means, and the said strip | belt-shaped workpiece | work, and has the observation window which passes the light reflected by the said strip | belt-shaped workpiece | work, And the first imaging means picks up the band-shaped workpiece through the observation window. The pattern inspection apparatus according to claim 1 or 2, wherein the illumination means simultaneously performs illumination for the first imaging means and illumination for the second imaging means.

Images