KR20090040232A - Radiation-sensitive composition, color filter, and liquid crystal display device for forming colored layer - Google Patents
Radiation-sensitive composition, color filter, and liquid crystal display device for forming colored layer Download PDFInfo
- Publication number
- KR20090040232A KR20090040232A KR1020080101983A KR20080101983A KR20090040232A KR 20090040232 A KR20090040232 A KR 20090040232A KR 1020080101983 A KR1020080101983 A KR 1020080101983A KR 20080101983 A KR20080101983 A KR 20080101983A KR 20090040232 A KR20090040232 A KR 20090040232A
- Authority
- KR
- South Korea
- Prior art keywords
- meth
- acid
- pigment
- colored layer
- acrylate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 114
- 230000005855 radiation Effects 0.000 title claims abstract description 54
- -1 color filter Substances 0.000 title claims description 119
- 239000004973 liquid crystal related substance Substances 0.000 title claims description 15
- 239000000049 pigment Substances 0.000 claims abstract description 129
- 239000000178 monomer Substances 0.000 claims abstract description 80
- 229920000642 polymer Polymers 0.000 claims abstract description 67
- 229920005989 resin Polymers 0.000 claims abstract description 57
- 239000011347 resin Substances 0.000 claims abstract description 57
- 150000001412 amines Chemical class 0.000 claims abstract description 48
- 239000002253 acid Substances 0.000 claims abstract description 43
- 125000003566 oxetanyl group Chemical group 0.000 claims abstract description 19
- 230000015572 biosynthetic process Effects 0.000 claims description 37
- 230000000379 polymerizing effect Effects 0.000 claims description 2
- 239000000758 substrate Substances 0.000 abstract description 46
- 239000002904 solvent Substances 0.000 abstract description 33
- 239000002270 dispersing agent Substances 0.000 abstract description 31
- 239000011159 matrix material Substances 0.000 abstract description 9
- 239000003999 initiator Substances 0.000 abstract description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 73
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 58
- 150000001875 compounds Chemical class 0.000 description 51
- 229920001577 copolymer Polymers 0.000 description 45
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 44
- 238000006243 chemical reaction Methods 0.000 description 40
- 239000000243 solution Substances 0.000 description 40
- 239000000852 hydrogen donor Substances 0.000 description 32
- 239000010408 film Substances 0.000 description 29
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 26
- 239000007788 liquid Substances 0.000 description 26
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 24
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 24
- 239000007787 solid Substances 0.000 description 20
- 239000004793 Polystyrene Substances 0.000 description 19
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- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 19
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 18
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 18
- 238000000576 coating method Methods 0.000 description 18
- 239000011248 coating agent Substances 0.000 description 17
- 238000005227 gel permeation chromatography Methods 0.000 description 17
- 238000011161 development Methods 0.000 description 15
- 238000000034 method Methods 0.000 description 15
- 238000003786 synthesis reaction Methods 0.000 description 15
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 14
- JOBBTVPTPXRUBP-UHFFFAOYSA-N [3-(3-sulfanylpropanoyloxy)-2,2-bis(3-sulfanylpropanoyloxymethyl)propyl] 3-sulfanylpropanoate Chemical compound SCCC(=O)OCC(COC(=O)CCS)(COC(=O)CCS)COC(=O)CCS JOBBTVPTPXRUBP-UHFFFAOYSA-N 0.000 description 13
- 238000001816 cooling Methods 0.000 description 13
- 238000005259 measurement Methods 0.000 description 12
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 11
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical class SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 11
- 239000003795 chemical substances by application Substances 0.000 description 10
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 9
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 8
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- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 8
- 150000008062 acetophenones Chemical class 0.000 description 8
- VYHBFRJRBHMIQZ-UHFFFAOYSA-N bis[4-(diethylamino)phenyl]methanone Chemical compound C1=CC(N(CC)CC)=CC=C1C(=O)C1=CC=C(N(CC)CC)C=C1 VYHBFRJRBHMIQZ-UHFFFAOYSA-N 0.000 description 8
- 238000013329 compounding Methods 0.000 description 8
- 238000011156 evaluation Methods 0.000 description 8
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 8
- 229920000647 polyepoxide Polymers 0.000 description 8
- 125000003396 thiol group Chemical group [H]S* 0.000 description 8
- ZOKCNEIWFQCSCM-UHFFFAOYSA-N (2-methyl-4-phenylpent-4-en-2-yl)benzene Chemical compound C=1C=CC=CC=1C(C)(C)CC(=C)C1=CC=CC=C1 ZOKCNEIWFQCSCM-UHFFFAOYSA-N 0.000 description 7
- RSHKWPIEJYAPCL-UHFFFAOYSA-N (3-ethyloxetan-3-yl)methyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1(CC)COC1 RSHKWPIEJYAPCL-UHFFFAOYSA-N 0.000 description 7
- 229940054266 2-mercaptobenzothiazole Drugs 0.000 description 7
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 7
- 125000003277 amino group Chemical group 0.000 description 7
- 238000011109 contamination Methods 0.000 description 7
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 7
- 239000006185 dispersion Substances 0.000 description 7
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- 125000000623 heterocyclic group Chemical group 0.000 description 7
- 150000007524 organic acids Chemical class 0.000 description 7
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical class NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 6
- 102100027123 55 kDa erythrocyte membrane protein Human genes 0.000 description 6
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 6
- 101001057956 Homo sapiens 55 kDa erythrocyte membrane protein Proteins 0.000 description 6
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 6
- 239000003513 alkali Substances 0.000 description 6
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 6
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 6
- 239000003086 colorant Substances 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 238000007654 immersion Methods 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 6
- 239000012860 organic pigment Substances 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- BLLFPKZTBLMEFG-UHFFFAOYSA-N 1-(4-hydroxyphenyl)pyrrole-2,5-dione Chemical compound C1=CC(O)=CC=C1N1C(=O)C=CC1=O BLLFPKZTBLMEFG-UHFFFAOYSA-N 0.000 description 5
- BQTPKSBXMONSJI-UHFFFAOYSA-N 1-cyclohexylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1CCCCC1 BQTPKSBXMONSJI-UHFFFAOYSA-N 0.000 description 5
- FLFWJIBUZQARMD-UHFFFAOYSA-N 2-mercapto-1,3-benzoxazole Chemical compound C1=CC=C2OC(S)=NC2=C1 FLFWJIBUZQARMD-UHFFFAOYSA-N 0.000 description 5
- 239000002202 Polyethylene glycol Substances 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 5
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- 125000002091 cationic group Chemical group 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 5
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 5
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- 238000006116 polymerization reaction Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
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- KDYFGRWQOYBRFD-UHFFFAOYSA-L succinate(2-) Chemical compound [O-]C(=O)CCC([O-])=O KDYFGRWQOYBRFD-UHFFFAOYSA-L 0.000 description 5
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- 150000003918 triazines Chemical class 0.000 description 5
- UAJRSHJHFRVGMG-UHFFFAOYSA-N 1-ethenyl-4-methoxybenzene Chemical compound COC1=CC=C(C=C)C=C1 UAJRSHJHFRVGMG-UHFFFAOYSA-N 0.000 description 4
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 4
- MWDGNKGKLOBESZ-UHFFFAOYSA-N 2-oxooctanal Chemical compound CCCCCCC(=O)C=O MWDGNKGKLOBESZ-UHFFFAOYSA-N 0.000 description 4
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 4
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- 229960002510 mandelic acid Drugs 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YSGBMDFJWFIEDF-UHFFFAOYSA-N methyl 2-hydroxy-3-methylbutanoate Chemical compound COC(=O)C(O)C(C)C YSGBMDFJWFIEDF-UHFFFAOYSA-N 0.000 description 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- CWKLZLBVOJRSOM-UHFFFAOYSA-N methyl pyruvate Chemical compound COC(=O)C(C)=O CWKLZLBVOJRSOM-UHFFFAOYSA-N 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- ZIYVHBGGAOATLY-UHFFFAOYSA-N methylmalonic acid Chemical compound OC(=O)C(C)C(O)=O ZIYVHBGGAOATLY-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 125000004573 morpholin-4-yl group Chemical group N1(CCOCC1)* 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- GYVGXEWAOAAJEU-UHFFFAOYSA-N n,n,4-trimethylaniline Chemical compound CN(C)C1=CC=C(C)C=C1 GYVGXEWAOAAJEU-UHFFFAOYSA-N 0.000 description 1
- SRLHDBRENZFCIN-UHFFFAOYSA-N n,n-di(butan-2-yl)butan-2-amine Chemical compound CCC(C)N(C(C)CC)C(C)CC SRLHDBRENZFCIN-UHFFFAOYSA-N 0.000 description 1
- FRQONEWDWWHIPM-UHFFFAOYSA-N n,n-dicyclohexylcyclohexanamine Chemical compound C1CCCCC1N(C1CCCCC1)C1CCCCC1 FRQONEWDWWHIPM-UHFFFAOYSA-N 0.000 description 1
- CIXSDMKDSYXUMJ-UHFFFAOYSA-N n,n-diethylcyclohexanamine Chemical compound CCN(CC)C1CCCCC1 CIXSDMKDSYXUMJ-UHFFFAOYSA-N 0.000 description 1
- DIAIBWNEUYXDNL-UHFFFAOYSA-N n,n-dihexylhexan-1-amine Chemical compound CCCCCCN(CCCCCC)CCCCCC DIAIBWNEUYXDNL-UHFFFAOYSA-N 0.000 description 1
- DAZXVJBJRMWXJP-UHFFFAOYSA-N n,n-dimethylethylamine Chemical compound CCN(C)C DAZXVJBJRMWXJP-UHFFFAOYSA-N 0.000 description 1
- ZUHZZVMEUAUWHY-UHFFFAOYSA-N n,n-dimethylpropan-1-amine Chemical compound CCCN(C)C ZUHZZVMEUAUWHY-UHFFFAOYSA-N 0.000 description 1
- OOHAUGDGCWURIT-UHFFFAOYSA-N n,n-dipentylpentan-1-amine Chemical compound CCCCCN(CCCCC)CCCCC OOHAUGDGCWURIT-UHFFFAOYSA-N 0.000 description 1
- CYQYCASVINMDFD-UHFFFAOYSA-N n,n-ditert-butyl-2-methylpropan-2-amine Chemical compound CC(C)(C)N(C(C)(C)C)C(C)(C)C CYQYCASVINMDFD-UHFFFAOYSA-N 0.000 description 1
- QYZFTMMPKCOTAN-UHFFFAOYSA-N n-[2-(2-hydroxyethylamino)ethyl]-2-[[1-[2-(2-hydroxyethylamino)ethylamino]-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound OCCNCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCNCCO QYZFTMMPKCOTAN-UHFFFAOYSA-N 0.000 description 1
- XRKQMIFKHDXFNQ-UHFFFAOYSA-N n-cyclohexyl-n-ethylcyclohexanamine Chemical compound C1CCCCC1N(CC)C1CCCCC1 XRKQMIFKHDXFNQ-UHFFFAOYSA-N 0.000 description 1
- GNVRJGIVDSQCOP-UHFFFAOYSA-N n-ethyl-n-methylethanamine Chemical compound CCN(C)CC GNVRJGIVDSQCOP-UHFFFAOYSA-N 0.000 description 1
- XWCCTMBMQUCLSI-UHFFFAOYSA-N n-ethyl-n-propylpropan-1-amine Chemical compound CCCN(CC)CCC XWCCTMBMQUCLSI-UHFFFAOYSA-N 0.000 description 1
- AGVKXDPPPSLISR-UHFFFAOYSA-N n-ethylcyclohexanamine Chemical compound CCNC1CCCCC1 AGVKXDPPPSLISR-UHFFFAOYSA-N 0.000 description 1
- XCVNDBIXFPGMIW-UHFFFAOYSA-N n-ethylpropan-1-amine Chemical compound CCCNCC XCVNDBIXFPGMIW-UHFFFAOYSA-N 0.000 description 1
- PXSXRABJBXYMFT-UHFFFAOYSA-N n-hexylhexan-1-amine Chemical compound CCCCCCNCCCCCC PXSXRABJBXYMFT-UHFFFAOYSA-N 0.000 description 1
- UVBMZKBIZUWTLV-UHFFFAOYSA-N n-methyl-n-propylpropan-1-amine Chemical compound CCCN(C)CCC UVBMZKBIZUWTLV-UHFFFAOYSA-N 0.000 description 1
- GVWISOJSERXQBM-UHFFFAOYSA-N n-methylpropan-1-amine Chemical compound CCCNC GVWISOJSERXQBM-UHFFFAOYSA-N 0.000 description 1
- JACMPVXHEARCBO-UHFFFAOYSA-N n-pentylpentan-1-amine Chemical compound CCCCCNCCCCC JACMPVXHEARCBO-UHFFFAOYSA-N 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- CATWEXRJGNBIJD-UHFFFAOYSA-N n-tert-butyl-2-methylpropan-2-amine Chemical compound CC(C)(C)NC(C)(C)C CATWEXRJGNBIJD-UHFFFAOYSA-N 0.000 description 1
- 239000000978 natural dye Substances 0.000 description 1
- FJDUDHYHRVPMJZ-UHFFFAOYSA-N nonan-1-amine Chemical compound CCCCCCCCCN FJDUDHYHRVPMJZ-UHFFFAOYSA-N 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 239000004843 novolac epoxy resin Substances 0.000 description 1
- ZWLPBLYKEWSWPD-UHFFFAOYSA-N o-toluic acid Chemical compound CC1=CC=CC=C1C(O)=O ZWLPBLYKEWSWPD-UHFFFAOYSA-N 0.000 description 1
- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- AMUUFLNQHMIHRP-UHFFFAOYSA-N oxetan-3-ylmethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1COC1 AMUUFLNQHMIHRP-UHFFFAOYSA-N 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- CKMXAIVXVKGGFM-UHFFFAOYSA-N p-cumic acid Chemical compound CC(C)C1=CC=C(C(O)=O)C=C1 CKMXAIVXVKGGFM-UHFFFAOYSA-N 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- LRTFPLFDLJYEKT-UHFFFAOYSA-N para-isopropylaniline Chemical compound CC(C)C1=CC=C(N)C=C1 LRTFPLFDLJYEKT-UHFFFAOYSA-N 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
- CLYVDMAATCIVBF-UHFFFAOYSA-N pigment red 224 Chemical compound C=12C3=CC=C(C(OC4=O)=O)C2=C4C=CC=1C1=CC=C2C(=O)OC(=O)C4=CC=C3C1=C42 CLYVDMAATCIVBF-UHFFFAOYSA-N 0.000 description 1
- 229940104573 pigment red 5 Drugs 0.000 description 1
- IUGYQRQAERSCNH-UHFFFAOYSA-N pivalic acid Chemical compound CC(C)(C)C(O)=O IUGYQRQAERSCNH-UHFFFAOYSA-N 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920002587 poly(1,3-butadiene) polymer Polymers 0.000 description 1
- 229920001495 poly(sodium acrylate) polymer Polymers 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920001610 polycaprolactone Chemical group 0.000 description 1
- 239000004632 polycaprolactone Chemical group 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920001195 polyisoprene Chemical group 0.000 description 1
- 229920000259 polyoxyethylene lauryl ether Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- ULWHHBHJGPPBCO-UHFFFAOYSA-N propane-1,1-diol Chemical compound CCC(O)O ULWHHBHJGPPBCO-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- ILPVOWZUBFRIAX-UHFFFAOYSA-N propyl 2-oxopropanoate Chemical compound CCCOC(=O)C(C)=O ILPVOWZUBFRIAX-UHFFFAOYSA-N 0.000 description 1
- HUAZGNHGCJGYNP-UHFFFAOYSA-N propyl butyrate Chemical compound CCCOC(=O)CCC HUAZGNHGCJGYNP-UHFFFAOYSA-N 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- WPPDXAHGCGPUPK-UHFFFAOYSA-N red 2 Chemical compound C1=CC=CC=C1C(C1=CC=CC=C11)=C(C=2C=3C4=CC=C5C6=CC=C7C8=C(C=9C=CC=CC=9)C9=CC=CC=C9C(C=9C=CC=CC=9)=C8C8=CC=C(C6=C87)C(C=35)=CC=2)C4=C1C1=CC=CC=C1 WPPDXAHGCGPUPK-UHFFFAOYSA-N 0.000 description 1
- 239000001054 red pigment Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- NNMHYFLPFNGQFZ-UHFFFAOYSA-M sodium polyacrylate Chemical compound [Na+].[O-]C(=O)C=C NNMHYFLPFNGQFZ-UHFFFAOYSA-M 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- WGPCGCOKHWGKJJ-UHFFFAOYSA-N sulfanylidenezinc Chemical compound [Zn]=S WGPCGCOKHWGKJJ-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YBRBMKDOPFTVDT-UHFFFAOYSA-N tert-butylamine Chemical compound CC(C)(C)N YBRBMKDOPFTVDT-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- GTZCVFVGUGFEME-UHFFFAOYSA-N trans-aconitic acid Natural products OC(=O)CC(C(O)=O)=CC(O)=O GTZCVFVGUGFEME-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 150000003628 tricarboxylic acids Chemical class 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- 235000013799 ultramarine blue Nutrition 0.000 description 1
- QFKMMXYLAPZKIB-UHFFFAOYSA-N undecan-1-amine Chemical compound CCCCCCCCCCCN QFKMMXYLAPZKIB-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000001052 yellow pigment Chemical class 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
Abstract
본 발명의 착색층 형성용 감방사선성 조성물은 (A) 안료, (B) 산가 및 아민가 중 적어도 어느 하나가 0을 초과하는 분산제, (C) 알칼리 가용성 수지, (D) 다관능성 단량체, (E) 광중합 개시제, 및 (F) 옥세타닐기를 갖는 반복 단위의 함유량이 70 질량% 이상인 중합체를 함유하는 것을 특징으로 한다. The radiation sensitive composition for forming a colored layer of the present invention is a dispersant in which at least one of (A) a pigment, (B) an acid value and an amine value is greater than zero, (C) an alkali-soluble resin, (D) a polyfunctional monomer, (E A photopolymerization initiator and (F) a polymer having a content of a repeating unit having an oxetanyl group is 70% by mass or more.
이에 따라, 본 발명의 착색층 형성용 감방사선성 조성물은 200 ℃ 미만의 후-베이킹 온도에 있어서도 폭넓은 용제에 대한 내성이 우수하고, 기판과의 밀착성도 우수한 화소 및 블랙 매트릭스를 형성할 수 있다. Accordingly, the radiation-sensitive composition for forming a colored layer of the present invention can form a pixel and a black matrix excellent in resistance to a wide range of solvents and excellent in adhesion to a substrate even at a post-baking temperature of less than 200 ° C. .
Description
본 발명은 착색층 형성용 감방사선성 조성물, 컬러 필터 및 액정 표시 소자에 관한 것이고, 보다 상세하게는 투과형 또는 반사형의 컬러 액정 표시 장치, 컬러 촬상관 소자 등에 이용되는 컬러 필터에 유용한 착색층의 형성에 이용되는 감방사선성 조성물, 해당 감방사선성 조성물을 이용하여 형성된 착색층을 구비하는 컬러 필터, 및 해당 컬러 필터를 구비하는 컬러 액정 표시 소자에 관한 것이다. The present invention relates to a radiation-sensitive composition for forming a colored layer, a color filter, and a liquid crystal display device, and more particularly, the formation of a colored layer useful for a color filter used in a transmissive or reflective color liquid crystal display device, a color image tube device, or the like. It relates to a color filter comprising a radiation-sensitive composition used for, a colored layer formed by using the radiation-sensitive composition, and a color liquid crystal display device comprising the color filter.
착색층 형성용 감방사선성 조성물을 이용하여 컬러 필터를 형성하는 방법으로서, 기판 상 또는 미리 원하는 패턴의 차광층을 형성한 기판 상에 안료 분산형의 착색층 형성용 감방사선성 조성물의 도막을 형성하고, 소정의 패턴을 갖는 포토마스크를 통해 방사선을 조사(이하, "노광"이라 함)하고, 현상하여 미노광부를 용해 제거한 후 후-베이킹함으로써, 각 색의 화소를 얻는 방법(예를 들면, 하기 특허 문헌 1, 특허 문헌 2 참조)이 알려져 있다. A method of forming a color filter using a radiation-sensitive composition for forming a colored layer, wherein a coating film of the radiation-sensitive composition for forming a pigment dispersion-type colored layer is formed on a substrate or on a substrate on which a light shielding layer having a desired pattern is formed in advance. And irradiating radiation through a photomask having a predetermined pattern (hereinafter referred to as "exposure"), developing and dissolving the unexposed portion, and then post-baking to obtain pixels of each color (for example, The following Patent Document 1 and Patent Document 2) are known.
여기서 후-베이킹 공정에 있어서는, 일반적으로 200 ℃ 내지 250 ℃의 온도 하에 30 분 정도의 열소성 처리가 행해진다. 최근 제조 비용의 삭감이나, 플라스틱 기판 등의 내열성에 한도가 있는 기판에 대응하는 관점에서, 후-베이킹 공정의 저온화나 단축화가 검토되고 있고, 종래보다도 저온 내지 단시간의 열소성 처리에서도 종래와 동일한 성능을 갖는 착색층 형성용 감방사선성 조성물의 개발이 매우 요망되고 있다. Here, in the post-baking process, a thermosetting treatment of about 30 minutes is generally performed at a temperature of 200 ° C to 250 ° C. In view of the reduction in manufacturing cost and substrates having a limit in heat resistance, such as plastic substrates, the lowering and shortening of the post-baking process have been considered. The development of the radiation sensitive composition for colored layer formation which has the above is highly desired.
한편, 컬러 액정 표시 장치의 높은 색 순도화에 따라 착색층 형성용 감방사선성 조성물에 포함되는 안료의 농도가 점점 더 높아지는 경향이 있다. 그러나 착색층 형성용 감방사선성 조성물에 포함되는 안료의 농도가 높아지면 형성되는 패턴의 각종 용제에 대한 내성이나 기판과의 밀착성이 저하된다는 문제가 발생한다. 이러한 문제를 해결하기 위해서, 하기 특허 문헌 3에서는 착색층 형성용 감광성 조성물 중에 옥세탄 골격을 갖는 단량체를 공중합한 결합제 중합체를 함유시키는 것이 제안되어 있다. 그러나 상술한 후-베이킹 공정의 저온화나 단축화에 적용할 수 있는 것은 아니었다.On the other hand, with the high color purity of a color liquid crystal display device, there exists a tendency for the density | concentration of the pigment contained in the radiation sensitive composition for colored layer formation to become increasingly high. However, when the density | concentration of the pigment contained in the radiation sensitive composition for colored layer formation becomes high, the problem that resistance to the various solvents of the pattern formed and adhesiveness with a board | substrate fall. In order to solve such a problem, following patent document 3 is proposed to contain the binder polymer which copolymerized the monomer which has an oxetane skeleton in the photosensitive composition for colored layer formation. However, it was not applicable to lowering or shortening the above-described baking process.
[특허 문헌 1] 일본 특허 공개 (평)2-144502호 공보[Patent Document 1] Japanese Patent Application Laid-Open No. 2-144502
[특허 문헌 2] 일본 특허 공개 (평)3-53201호 공보[Patent Document 2] Japanese Patent Application Laid-Open No. 3-53201
[특허 문헌 3] 일본 특허 공개 제2002-296778호 공보[Patent Document 3] Japanese Unexamined Patent Publication No. 2002-296778
본 발명은 이상과 같은 사정에 기초하여 이루어진 것으로, 그 과제는 200 ℃ 미만의 후-베이킹 온도에 있어서도, 폭넓은 용제에 대한 내성이 우수하고, 기판과의 밀착성도 우수한 화소 및 블랙 매트릭스를 제공할 수 있는 신규 착색층 형성용 감방사선성 조성물을 제공하는 것에 있다. 본 발명은 또한 이러한 착색층 형성용 감방사선성 조성물을 이용하여 형성된 컬러 필터, 및 상기 컬러 필터를 구비하는 액정 표시 소자를 제공하는 것을 목적으로 한다. The present invention has been made on the basis of the above circumstances, and the problem is to provide a pixel and a black matrix excellent in resistance to a wide range of solvents and excellent in adhesion to a substrate even at a post-baking temperature of less than 200 ° C. It is providing the radiation sensitive composition for novel colored layer formation which can be provided. An object of this invention is also to provide the color filter formed using such a radiation sensitive composition for colored layer formation, and the liquid crystal display element provided with the said color filter.
본 발명자들은 착색층 형성용 감광성 조성물 중에 특정 성상을 갖는 분산제와, 특정한 골격을 갖는 반복 단위를 소정량 이상 포함하는 중합체를 함유시킴으로써, 200 ℃ 미만의 후-베이킹 온도에 있어서도, 폭넓은 용제에 대한 내성이 우수하고, 기판과의 밀착성도 우수한 화소 및 블랙 매트릭스를 형성할 수 있는 것을 발견하였다. MEANS TO SOLVE THE PROBLEM The present inventors included the dispersing agent which has a specific property, and the polymer containing the predetermined amount or more in the photosensitive composition for colored layer formation, and the repeating unit which has a specific frame | skeleton, and is also suitable for a wide range of solvents even at the post-baking temperature below 200 degreeC. It was found that a pixel and a black matrix can be formed that are excellent in resistance and excellent in adhesion to the substrate.
즉, 본 발명은 첫번째로, (A) 안료, (B) 산가 및 아민가 중 적어도 어느 하나가 0을 초과하는 분산제, (C) 알칼리 가용성 수지, (D) 다관능성 단량체, (E) 광중합 개시제, 및 (F) 옥세타닐기를 갖는 반복 단위의 함유량이 70 질량% 이상인 중합체를 함유하는 착색층 형성용 감방사선성 조성물을 제공하는 것이다. That is, the present invention is, firstly, a dispersing agent in which at least one of (A) pigment, (B) acid value and amine value is greater than zero, (C) alkali-soluble resin, (D) polyfunctional monomer, (E) photopolymerization initiator, And (F) It provides the radiation sensitive composition for colored layer formation containing the polymer whose content of the repeating unit which has an oxetanyl group is 70 mass% or more.
본 발명은 두번째로, 상기 착색층 형성용 감방사선성 조성물을 이용하여 형성된 컬러 필터를 제공하는 것이다. Secondly, the present invention provides a color filter formed using the radiation-sensitive composition for forming a colored layer.
본 발명은 세번째로, 상기 컬러 필터를 구비하는 액정 표시 소자를 제공하는 것이다. A third object of the present invention is to provide a liquid crystal display device comprising the color filter.
본 발명의 착색층 형성용 감방사선성 조성물에 따르면, 200 ℃ 미만의 후-베이킹 온도에 있어서도 폭넓은 용제에 대한 내성이 우수하며, 기판과의 밀착성도 우수한 화소 및 블랙 매트릭스를 형성할 수 있다. According to the radiation sensitive composition for forming a colored layer of the present invention, a pixel and a black matrix excellent in resistance to a wide range of solvents and excellent in adhesion to a substrate can be formed even at a post-baking temperature of less than 200 ° C.
따라서, 본 발명의 착색층 형성용 감방사선성 조성물은 전자 공업 분야에서의 컬러 액정 표시 패널용의 컬러 필터를 비롯한 각종 컬러 필터 및 액정 표시 패널의 제조에 매우 유용하다. Therefore, the radiation sensitive composition for colored layer formation of this invention is very useful for manufacture of various color filters and liquid crystal display panels, including the color filter for color liquid crystal display panels in the electronic industry.
이하, 본 발명에 대해서 상세히 설명한다. EMBODIMENT OF THE INVENTION Hereinafter, this invention is demonstrated in detail.
착색층 형성용 감방사선성 조성물Radiation-sensitive composition for colored layer formation
본 발명의 착색층 형성용 감방사선성 조성물(이하, 간단히 "감방사선성 조성물"이라고도 함)에 있어서의 "착색층"이란, 컬러 필터에 이용되는 화소 및/또는 블랙 매트릭스를 포함하는 층을 의미한다. The "coloring layer" in the radiation sensitive composition for forming a colored layer of the present invention (hereinafter also referred to simply as "radiation sensitive composition") means a layer containing a pixel and / or a black matrix used in a color filter. do.
이하, 본 발명의 착색층 형성용 감방사선성 조성물의 구성 성분에 대해서 설명한다. Hereinafter, the structural component of the radiation sensitive composition for colored layer formation of this invention is demonstrated.
-(A) 안료-(A) Pigment
본 발명에 있어서의 (A) 안료로는 특별히 한정되는 것은 아니고, 유기 안료, 무기 안료 중 어느 하나일 수도 있다. 이 중, 컬러 필터에는 고순도이고 고투과성 인 발색과 내열성이 요구되기 때문에, 특히 유기 안료가 바람직하다. The (A) pigment in the present invention is not particularly limited and may be either an organic pigment or an inorganic pigment. Among these, organic pigments are particularly preferred because color filters require high purity and high permeability color development and heat resistance.
유기 안료로는, 예를 들면 색지수(C.I.; The Society of Dyers and Colourists사 발행)에 있어서 피그먼트로 분류되고 있는 화합물을 들 수 있다. 구체적으로는, 하기와 같은 색지수(C.I.) 번호가 부여되어 있는 것을 들 수 있다. Examples of the organic pigments include compounds classified as pigments in the color index (C.I .; issued by The Society of Dyers and Colourists). Specifically, the following color index (C.I.) numbers are given.
C.I. 피그먼트 옐로우 12, C.I. 피그먼트 옐로우 13, C.I. 피그먼트 옐로우 14, C.I. 피그먼트 옐로우 17, C.I. 피그먼트 옐로우 20, C.I. 피그먼트 옐로우 24, C.I. 피그먼트 옐로우 31, C.I. 피그먼트 옐로우 55, C.I. 피그먼트 옐로우 83, C.I. 피그먼트 옐로우 93, C.I. 피그먼트 옐로우 109, C.I. 피그먼트 옐로우 110, C.I. 피그먼트 옐로우 138, C.I. 피그먼트 옐로우 139, C.I. 피그먼트 옐로우 150, C.I. 피그먼트 옐로우 153, C.I. 피그먼트 옐로우 154, C.I. 피그먼트 옐로우 155, C.I. 피그먼트 옐로우 166, C.I. 피그먼트 옐로우 168, C.I. 피그먼트 옐로우 211; C.I. Pigment Yellow 12, C.I. Pigment Yellow 13, C.I. Pigment Yellow 14, C.I. Pigment Yellow 17, C.I. Pigment Yellow 20, C.I. Pigment Yellow 24, C.I. Pigment Yellow 31, C.I. Pigment Yellow 55, C.I. Pigment Yellow 83, C.I. Pigment Yellow 93, C.I. Pigment Yellow 109, C.I. Pigment Yellow 110, C.I. Pigment Yellow 138, C.I. Pigment Yellow 139, C.I. Pigment Yellow 150, C.I. Pigment Yellow 153, C.I. Pigment Yellow 154, C.I. Pigment Yellow 155, C.I. Pigment Yellow 166, C.I. Pigment Yellow 168, C.I. Pigment yellow 211;
C.I. 피그먼트 오렌지 5, C.I. 피그먼트 오렌지 13, C.I. 피그먼트 오렌지 14, C.I. 피그먼트 오렌지 24, C.I. 피그먼트 오렌지 34, C.I. 피그먼트 오렌지 36, C.I. 피그먼트 오렌지 38, C.I. 피그먼트 오렌지 40, C.I. 피그먼트 오렌지 43, C.I. 피그먼트 오렌지 46, C.I. 피그먼트 오렌지 49, C.I. 피그먼트 오렌지 61, C.I. 피그먼트 오렌지 64, C.I. 피그먼트 오렌지 68, C.I. 피그먼트 오렌지 70, C.I. 피그먼트 오렌지 71, C.I. 피그먼트 오렌지 72, C.I. 피그먼트 오렌지 73, C.I. 피그먼트 오렌지 74; C.I. Pigment Orange 5, C.I. Pigment Orange 13, C.I. Pigment Orange 14, C.I. Pigment Orange 24, C.I. Pigment Orange 34, C.I. Pigment Orange 36, C.I. Pigment Orange 38, C.I. Pigment Orange 40, C.I. Pigment Orange 43, C.I. Pigment Orange 46, C.I. Pigment Orange 49, C.I. Pigment Orange 61, C.I. Pigment Orange 64, C.I. Pigment Orange 68, C.I. Pigment Orange 70, C.I. Pigment Orange 71, C.I. Pigment Orange 72, C.I. Pigment Orange 73, C.I. Pigment orange 74;
C.I. 피그먼트 레드 1, C.I. 피그먼트 레드 2, C.I. 피그먼트 레드 5, C.I. 피그먼트 레드 17, C.I. 피그먼트 레드 31, C.I. 피그먼트 레드 32, C.I. 피그먼트 레드 41, C.I. 피그먼트 레드 122, C I. 피그먼트 레드 123, C.I. 피그먼트 레드 144, C.I. 피그먼트 레드 149, C.I. 피그먼트 레드 166, C.I. 피그먼트 레드 168, C I. 피그먼트 레드 170, C.I. 피그먼트 레드 171, C.I. 피그먼트 레드 175, C.I. 피그먼트 레드 176, C.I. 피그먼트 레드 177, C I. 피그먼트 레드 178, C.I. 피그먼트 레드 179, C.I. 피그먼트 레드 180, C.I. 피그먼트 레드 185, C.I. 피그먼트 레드 187, C I. 피그먼트 레드 202, C.I. 피그먼트 레드 206, C.I. 피그먼트 레드 207, C.I. 피그먼트 레드 209, C.I. 피그먼트 레드 214, C I. 피그먼트 레드 220, C.I. 피그먼트 레드 221, C.I. 피그먼트 레드 224, C.I. 피그먼트 레드 242, C.I. 피그먼트 레드 243, C I. 피그먼트 레드 254, C.I. 피그먼트 레드 255, C.I. 피그먼트 레드 262, C.I. 피그먼트 레드 264, C.I. 피그먼트 레드 272; C.I. Pigment Red 1, C.I. Pigment Red 2, C.I. Pigment Red 5, C.I. Pigment Red 17, C.I. Pigment Red 31, C.I. Pigment Red 32, C.I. Pigment Red 41, C.I. Pigment Red 122, C I. Pigment Red 123, C.I. Pigment Red 144, C.I. Pigment Red 149, C.I. Pigment Red 166, C.I. Pigment Red 168, C I. Pigment Red 170, C.I. Pigment Red 171, C.I. Pigment Red 175, C.I. Pigment Red 176, C.I. Pigment Red 177, C I. Pigment Red 178, C.I. Pigment Red 179, C.I. Pigment Red 180, C.I. Pigment Red 185, C.I. Pigment Red 187, C I. Pigment Red 202, C.I. Pigment Red 206, C.I. Pigment Red 207, C.I. Pigment Red 209, C.I. Pigment Red 214, C I. Pigment Red 220, C.I. Pigment Red 221, C.I. Pigment Red 224, C.I. Pigment Red 242, C.I. Pigment Red 243, C I. Pigment Red 254, C.I. Pigment Red 255, C.I. Pigment Red 262, C.I. Pigment Red 264, C.I. Pigment red 272;
C.I. 피그먼트 바이올렛 1, C.I. 피그먼트 바이올렛 19, C.I. 피그먼트 바이올렛 23, C.I. 피그먼트 바이올렛 29, C.I. 피그먼트 바이올렛 32, C.I. 피그먼트 바이올렛 36, C.I. 피그먼트 바이올렛 38; C.I. Pigment Violet 1, C.I. Pigment Violet 19, C.I. Pigment Violet 23, C.I. Pigment Violet 29, C.I. Pigment violet 32, C.I. Pigment Violet 36, C.I. Pigment violet 38;
C.I. 피그먼트 블루 15, C.I. 피그먼트 블루 15:3, C.I. 피그먼트 블루 15:4, C.I. 피그먼트 블루 15:6, C.I. 피그먼트 블루 60, C.I. 피그먼트 블루 80; C.I. Pigment Blue 15, C.I. Pigment Blue 15: 3, C.I. Pigment Blue 15: 4, C.I. Pigment Blue 15: 6, C.I. Pigment Blue 60, C.I. Pigment blue 80;
C.I. 피그먼트 그린 7, C.I. 피그먼트 그린 36, C.I. 피그먼트 그린 58; C.I. Pigment Green 7, C.I. Pigment Green 36, C.I. Pigment green 58;
C.I. 피그먼트 브라운 23, C.I. 피그먼트 브라운 25; C.I. Pigment Brown 23, C.I. Pigment brown 25;
C.I. 피그먼트 블랙 1, C.I. 피그먼트 블랙 7. C.I. Pigment Black 1, C.I. Pigment Black 7.
이들 유기 안료는 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. These organic pigments can be used individually or in mixture of 2 or more types.
이들 유기 안료 중, C.I. 피그먼트 옐로우 83, C.I. 피그먼트 옐로우 138, C.I. 피그먼트 옐로우 139, C.I. 피그먼트 옐로우 150, C.I. 피그먼트 옐로우 180, C.I. 피그먼트 레드 177, C.I. 피그먼트 레드 242, C.I. 피그먼트 레드 254, C.I. 피그먼트 블루 15: 3, C.I. 피그먼트 블루 15:4, C.I. 피그먼트 블루 15:6, C.I. 피그먼트 그린 7, C.I. 피그먼트 그린 36, C.I. 피그먼트 그린 58, C.I. 피그먼트 바이올렛 23의 군으로부터 선택되는 1종 이상이 바람직하다.Among these organic pigments, C.I. Pigment Yellow 83, C.I. Pigment Yellow 138, C.I. Pigment Yellow 139, C.I. Pigment Yellow 150, C.I. Pigment Yellow 180, C.I. Pigment Red 177, C.I. Pigment Red 242, C.I. Pigment Red 254, C.I. Pigment Blue 15: 3, C.I. Pigment Blue 15: 4, C.I. Pigment Blue 15: 6, C.I. Pigment Green 7, C.I. Pigment Green 36, C.I. Pigment Green 58, C.I. At least one selected from the group of pigment violet 23 is preferred.
본 발명에 있어서, 유기 안료는 재결정법, 재침전법, 용제 세정법, 승화법, 진공 가열법이나, 이들의 조합에 의해 정제하여 사용할 수도 있다.In the present invention, the organic pigment may be purified by recrystallization, reprecipitation, solvent washing, sublimation, vacuum heating, or a combination thereof.
또한, 무기 안료로는, 예를 들면 산화티탄, 황산바륨, 탄산칼슘, 아연화, 황산납, 황색납, 아연황, 철단(적색 산화철(III), 카드뮴 레드, 군청, 감청, 산화크롬 그린, 코발트 그린, 엄버(invar), 티탄 블랙, 합성 철 블랙, 카본 블랙 등을 들 수 있다. Moreover, as an inorganic pigment, for example, titanium oxide, barium sulfate, calcium carbonate, zincation, lead sulfate, yellow lead, zinc sulfur, iron group (red iron oxide (III), cadmium red, ultramarine blue, blue blue, chromium oxide green, cobalt) Green, invar, titanium black, synthetic iron black, carbon black and the like.
이들 무기 안료는 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. These inorganic pigments can be used individually or in mixture of 2 or more types.
또한, 본 발명에 있어서는 경우에 따라 상기 안료와 함께 염료나 천연 색소를 1종 이상 병용할 수도 있다.Moreover, in this invention, you may use together 1 or more types of dyes and natural dyes with the said pigment as needed.
본 발명에 있어서, 안료는 필요하다면, 그 입자 표면을 중합체로 개질하여 사용할 수 있다. 안료의 입자 표면을 개질하는 중합체로는, 예를 들면 일본 특허 공개 (평)8-259876호 공보에 기재된 중합체나, 시판되고 있는 각종 안료 분산용의 중합체 또는 올리고머 등을 들 수 있다. In the present invention, the pigment may be used by modifying its particle surface with a polymer, if necessary. As a polymer which modifies the particle surface of a pigment, the polymer of Unexamined-Japanese-Patent No. 8-259876, the polymer for disperse | distributing various pigments, or oligomer etc. are mentioned, for example.
-(B) 분산제--(B) dispersant-
본 발명에 있어서의 (B) 분산제는 산가 및 아민가 중 적어도 어느 하나가 0을 초과하는 분산제(이하, "특정 분산제"라고도 함)이다. 이러한 분산제를 선택함으로써, 후-베이킹 공정에 있어서 후술하는 (F) 성분에 의해 형성되는 가교 구조가 보다 강고해지고, 내용제성이나 기판과의 밀착성이 우수한 패턴을 얻을 수 있다. The dispersing agent (B) in the present invention is a dispersing agent (hereinafter also referred to as "specific dispersing agent") in which at least one of the acid value and the amine value is more than zero. By selecting such a dispersing agent, the crosslinked structure formed by (F) component mentioned later in a post-baking process becomes stronger, and the pattern excellent in solvent resistance and adhesiveness with a board | substrate can be obtained.
분산제로는 산가 및 아민가 중 적어도 어느 하나가 0을 초과하는 것이면 특별히 한정되지 않지만, 중합체 분산제가 바람직하다. 구체적으로는, 변성 아크릴계 공중합체, 아크릴계 공중합체, 변성 폴리우레탄, 폴리에스테르, 고분자 공중합체의 알킬암모늄염 또는 인산에스테르염, 양이온성 빗형 그래프트 중합체 등을 들 수 있다. 여기서 양이온성 빗형 그래프트 중합체란, 복수개의 염기성기(양이온성의 관능기)를 갖는 줄기 중합체 1 분자에, 2 분자 이상의 가지 중합체가 그래프트 결합한 구조의 중합체를 말하며, 예를 들면 줄기 중합체부가 폴리에틸렌이민, 가지 중합체부가 ε-카프로락톤인 개환 중합체로 구성되는 중합체를 들 수 있다. 이들 분산제 중에서, 변성 아크릴계 공중합체, 아크릴계 공중합체, 양이온성 빗형 그래프트 중합체가 바람직하다. The dispersant is not particularly limited as long as at least one of the acid value and the amine value exceeds 0, but a polymer dispersant is preferable. Specifically, a modified acrylic copolymer, an acrylic copolymer, a modified polyurethane, a polyester, an alkyl ammonium salt or a phosphate ester salt of a polymer copolymer, a cationic comb graft polymer, etc. may be mentioned. The cationic comb graft polymer herein refers to a polymer having a structure in which two or more branch polymers are graft-bonded to one molecule of a stem polymer having a plurality of basic groups (cationic functional groups). For example, the stem polymer moiety is a polyethyleneimine or branch polymer The polymer comprised from the ring-opening polymer which is addition (epsilon) -caprolactone is mentioned. Of these dispersants, modified acrylic copolymers, acrylic copolymers, and cationic comb graft polymers are preferred.
본 발명에 있어서, 분산제는 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. In this invention, a dispersing agent can be used individually or in mixture of 2 or more types.
분산제의 산가(mgKOH/g)는, 바람직하게는 5 내지 100, 더욱 바람직하게는 10 내지 50, 특히 바람직하게는 20 내지 50이고, 아민가(mgKOH/g)는, 바람직하게는 1 내지 100, 더욱 바람직하게는 10 내지 70, 특히 바람직하게는 20 내지 70이다. 이러한 분산제를 선택함으로써, 내용제성이나 기판과의 밀착성이 우수한 패턴을 얻을 수 있고, 추가로 보존 안정성도 우수하며, 잔사나 바탕 오염도 발생하기 어려운 감방사선성 조성물을 얻을 수 있다. 여기서 아민가란, 분산제 고형분 1 g을 중화하는 데 필요한 HCl 양에 상당하는 KOH의 mg 수를 나타낸다. 또한 산가란, 분산제 고형분 1 g을 중화하는 데 필요한 KOH의 mg 수를 나타낸다. The acid value (mgKOH / g) of the dispersant is preferably 5 to 100, more preferably 10 to 50, particularly preferably 20 to 50, and the amine value (mgKOH / g) is preferably 1 to 100, further Preferably it is 10-70, Especially preferably, it is 20-70. By selecting such a dispersing agent, the pattern which is excellent in solvent resistance and adhesiveness with a board | substrate can be obtained, and also the radiation sensitive composition which is excellent also in storage stability and hardly generate | occur | produces a residue and ground contamination can be obtained. The amine number here refers to the mg number of KOH corresponding to the amount of HCl required to neutralize 1 g of the dispersant solids. In addition, an acid value shows the mg number of KOH which is required to neutralize 1 g of dispersant solid content.
이러한 분산제는 상업적으로 입수할 수 있고, 예를 들면 Such dispersants are commercially available, for example
디스퍼빅(Disperbyk)-142(불휘발 성분=60%, 아민가=43, 산가=46), Disperbyk-142 (non-volatile component = 60%, amine value = 43, acid value = 46),
디스퍼빅-145(불휘발 성분=100%, 아민가=71, 산가=76), Dispervic-145 (non-volatile component = 100%, amine value = 71, acid value = 76),
디스퍼빅-161(불휘발 성분=30%, 아민가=11), Dispervic-161 (non-volatile component = 30%, amine value = 11),
디스퍼빅-170(불휘발 성분=30%, 산가=11), Dispervic -170 (non-volatile component = 30%, acid value = 11),
디스퍼빅-182(불휘발 성분=43%, 아민가=13), Dispervic-182 (non-volatile component = 43%, amine number = 13),
디스퍼빅-2000(불휘발 성분=40%, 아민가=4), Dispervic-2000 (non-volatile component = 40%, amine number = 4),
디스퍼빅-2001(불휘발 성분=46%, 아민가=29, 산가=19), Dispervic-2001 (non-volatile component = 46%, amine value = 29, acid value = 19),
디스퍼빅-2020(불휘발 성분=70%, 아민가=38, 산가=35), Dispervic-2020 (non-volatile component = 70%, amine value = 38, acid value = 35),
디스퍼빅-2150(불휘발 성분=52%, 아민가=57), Dispervic-2150 (non-volatile component = 52%, amine number = 57),
디스퍼빅-9076(불휘발 성분=96%, 아민가=44, 산가=38)[이상, 빅케미 (BYK)사 제조], Dispervic -9076 (non-volatile component = 96%, amine value = 44, acid value = 38) [above, manufactured by Big Chemical Co., Ltd.],
아지스퍼(Ajisper) PB-711(불휘발 성분=40%, 아민가=45), Ajisper PB-711 (non-volatile component = 40%, amine number = 45),
아지스퍼 PB-821(불휘발 성분=100%, 아민가=9, 산가=13),Azisper PB-821 (non-volatile component = 100%, amine value = 9, acid value = 13),
아지스퍼 PB-822(불휘발 성분=100%, 아민가=13, 산가=16)[이상, 아지노모또파인테크노(주) 제조], Azisper PB-822 (non-volatile component = 100%, amine value = 13, acid value = 16) [above, manufactured by Ajinomoto Fine Techno Co., Ltd.],
솔스퍼스(Solsperse) 24000(불휘발 성분=100%, 아민가=42, 산가=25),Solsperse 24000 (non-volatile component = 100%, amine value = 42, acid value = 25),
솔스퍼스 32000(불휘발 성분=100%, 아민가=31, 산가=15), Solsperth 32000 (non-volatile component = 100%, amine value = 31, acid value = 15),
솔스퍼스 32500(불휘발 성분=40%, 아민가=12, 산가=7), Solsper's 32500 (non-volatile component = 40%, amine value = 12, acid value = 7),
솔스퍼스 32550(불휘발 성분=50%, 아민가=15, 산가=7),Solsperth 32550 (non-volatile component = 50%, amine value = 15, acid value = 7),
솔스퍼스 32600(불휘발 성분=40%, 아민가=12, 산가=6),Solsper's 32600 (non-volatile component = 40%, amine value = 12, acid value = 6),
솔스퍼스 35100(불휘발 성분=40%, 아민가=14, 산가=6),Solsper's 35100 (non-volatile component = 40%, amine value = 14, acid value = 6),
솔스퍼스 35200(불휘발 성분=40%, 아민가=14, 산가=6),Solsperth 35200 (non-volatile component = 40%, amine value = 14, acid value = 6),
솔스퍼스 37500(불휘발 성분=40%, 아민가=11, 산가=5)[이상, 루브리졸(주)사 제조] 등을 들 수 있다. Solsper's 37500 (non-volatile component = 40%, amine value = 11, acid value = 5) (above, Lubrizol Co., Ltd. product) etc. are mentioned.
본 발명에 있어서는, 특정 분산제와 함께 다른 분산제를 병용할 수 있다. In this invention, another dispersing agent can be used together with a specific dispersing agent.
해당 다른 분산제로는, 예를 들면 폴리옥시에틸렌라우릴에테르, 폴리옥시에틸렌스테아릴에테르, 폴리옥시에틸렌올레일에테르와 같은 폴리옥시에틸렌알킬에테르; 폴리옥시에틸렌 n-옥틸페닐에테르, 폴리옥시에틸렌 n-노닐페닐에테르와 같은 폴리옥시에틸렌알킬페닐에테르; 폴리에틸렌글리콜디라우레이트, 폴리에틸렌글리콜디스테아레이트와 같은 폴리에틸렌글리콜 디지방산 에스테르; 소르비탄 지방산 에스테르; 지방산 변성 폴리에스테르 등을 들 수 있다. As said other dispersing agent, For example, Polyoxyethylene alkyl ether, such as polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether; Polyoxyethylene alkyl phenyl ethers such as polyoxyethylene n-octylphenyl ether and polyoxyethylene n-nonylphenyl ether; Polyethylene glycol difatty acid esters such as polyethylene glycol dilaurate, polyethylene glycol distearate; Sorbitan fatty acid esters; And fatty acid-modified polyesters.
이들 다른 분산제는 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. These other dispersing agents can be used individually or in mixture of 2 or more types.
다른 분산제의 함유 비율(고형분 환산)은 현상성 및 보존 안정성이 양호한 균형을 확보하는 관점에서, 특정 분산제와 다른 분산제와의 합계 질량에 대하여, 바람직하게는 0 내지 75 질량%, 보다 바람직하게는 0 내지 50 질량%이다. The content ratio (solid content conversion) of the other dispersant is preferably 0 to 75% by mass, more preferably 0 to the total mass of the specific dispersant and the other dispersant from the viewpoint of ensuring a good balance between developability and storage stability. To 50 mass%.
본 발명에 있어서의 특정 분산제의 함유량(고형분 환산)은 감방사선성 조성물의 보존 안정성 및 기판 상의 잔사 발생 방지의 관점에서, (A) 안료 100 질량부에 대하여, 바람직하게는 1 내지 50 질량부, 더욱 바람직하게는 3 내지 30 질량부이다. Content (solid content conversion) of the specific dispersing agent in this invention is 1-50 mass parts with respect to 100 mass parts of (A) pigments from a viewpoint of the storage stability of a radiation sensitive composition, and the prevention of residue generation on a board | substrate, More preferably, it is 3-30 mass parts.
-(C) 알칼리 가용성 수지--(C) alkali-soluble resin-
본 발명에 있어서의 (C) 알칼리 가용성 수지로는 (A) 안료에 대하여 결합제로서 작용하고, 또한 컬러 필터를 제조할 때에, 그 현상 처리 공정에서 이용되는 현상액, 특히 바람직하게는 알칼리 현상액에 대하여 가용성을 갖는 것이면 특별히 한정되는 것은 아니다. 이러한 알칼리 가용성 수지로는 카르복실기를 갖는 알칼리 가용성 수지가 바람직하고, 특히 1개 이상의 카르복실기를 갖는 에틸렌성 불포화 단량체(이하, "카르복실기 함유 불포화 단량체"라 함)와, 이것과 공중합 가능한 다른 에틸렌성 불포화 단량체(이하, "공중합성 불포화 단량체"라 함)와의 공중합체(이하, "카르복실기 함유 공중합체"라 함)가 바람직하다. As (C) alkali-soluble resin in this invention, it acts as a binder with respect to (A) pigment, and when producing a color filter, it is soluble with respect to the developing solution used by the developing process, especially preferably alkaline developing solution. It will not be specifically limited if it has. As such alkali-soluble resin, alkali-soluble resin which has a carboxyl group is preferable, Especially ethylenically unsaturated monomer which has 1 or more carboxyl group (henceforth "carboxyl group-containing unsaturated monomer"), and other ethylenically unsaturated monomer copolymerizable with this Preferred is a copolymer (hereinafter referred to as "copolymerizable unsaturated monomer") (hereinafter referred to as "carboxyl group-containing copolymer").
카르복실기 함유 불포화 단량체로는, 예를 들면 As a carboxyl group-containing unsaturated monomer, for example
(메트)아크릴산, 크로톤산, α-클로로아크릴산, 신남산 등의 불포화 모노카르복실산류; Unsaturated monocarboxylic acids such as (meth) acrylic acid, crotonic acid, α-chloroacrylic acid and cinnamic acid;
말레산, 말레산 무수물, 푸마르산, 이타콘산, 이타콘산 무수물, 시트라콘산, 시트라콘산 무수물, 메사콘산 등의 불포화 디카르복실산 또는 그의 무수물류; Unsaturated dicarboxylic acids such as maleic acid, maleic anhydride, fumaric acid, itaconic acid, itaconic anhydride, citraconic acid, citraconic anhydride, mesaconic acid or anhydrides thereof;
3가 이상의 불포화 다가 카르복실산 또는 그의 무수물류; Trivalent or higher unsaturated polyvalent carboxylic acid or anhydrides thereof;
숙신산모노〔2-(메트)아크릴로일옥시에틸〕, 프탈산모노〔2-(메트)아크릴로 일옥시에틸〕등의 2가 이상의 다가 카르복실산의 모노〔(메트)아크릴로일옥시알킬〕에스테르류; Mono [(meth) acryloyloxyalkyl] of bivalent or more polyvalent carboxylic acids, such as succinate mono [2- (meth) acryloyloxyethyl] and phthalate mono [2- (meth) acryloyloxyethyl] Esters;
ω-카르복시폴리카프로락톤모노(메트)아크릴레이트 등의 양쪽 말단에 카르복실기와 수산기를 갖는 중합체의 모노(메트)아크릴레이트류 Mono (meth) acrylates of the polymer which has a carboxyl group and a hydroxyl group in both terminal, such as (omega) -carboxypolycaprolactone mono (meth) acrylate,
등을 들 수 있다. Etc. can be mentioned.
카르복실기 함유 불포화 단량체는 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. A carboxyl group-containing unsaturated monomer can be used individually or in mixture of 2 or more types.
본 발명에 있어서, 카르복실기 함유 불포화 단량체로는 (메트)아크릴산, 숙신산모노〔2-(메트)아크릴로일옥시에틸〕, ω-카르복시폴리카프로락톤모노(메트)아크릴레이트 등이 바람직하고, 특히(메트)아크릴산이 바람직하다. In the present invention, as the carboxyl group-containing unsaturated monomer, (meth) acrylic acid, monosuccinic acid [2- (meth) acryloyloxyethyl],? -Carboxypolycaprolactone mono (meth) acrylate, and the like are preferable, and in particular ( Meth) acrylic acid is preferred.
또한, 공중합성 불포화 단량체로는, 예를 들면 하기의 것이 예시된다. Moreover, the following are illustrated as a copolymerizable unsaturated monomer, for example.
N-페닐말레이미드, N-o-히드록시페닐말레이미드, N-m-히드록시페닐말레이미드, N-p-히드록시페닐말레이미드, N-벤질말레이미드, N-시클로헥실말레이미드, N-숙신이미딜-3-말레이미드벤조에이트, N-숙신이미딜-4-말레이미드부티레이트, N-숙신이미딜-6-말레이미드카프로에이트, N-숙신이미딜-3-말레이미드프로피오네이트, N-(아크리디닐)말레이미드와 같은 N-치환 말레이미드; N-phenylmaleimide, No-hydroxyphenylmaleimide, Nm-hydroxyphenylmaleimide, Np-hydroxyphenylmaleimide, N-benzylmaleimide, N-cyclohexylmaleimide, N-succinimidyl-3 -Maleimidebenzoate, N-succinimidyl-4-maleimidebutyrate, N-succinimidyl-6-maleimide caproate, N-succinimidyl-3-maleimide propionate, N- (acridy N-substituted maleimides such as nil) maleimide;
스티렌, α-메틸스티렌, o-비닐톨루엔, m-비닐톨루엔, p-비닐톨루엔, p-클로로스티렌, o-메톡시스티렌, m-메톡시스티렌, p-메톡시스티렌, o-비닐페놀, m-비닐페놀, p-비닐페놀, p-히드록시-α-메틸스티렌, o-비닐벤질메틸에테르, m-비닐벤질메틸에테르, p-비닐벤질메틸에테르, o-비닐벤질글리시딜에테르, m-비닐벤질글리시 딜에테르, p-비닐벤질글리시딜에테르와 같은 방향족 비닐 화합물; Styrene, α-methylstyrene, o-vinyltoluene, m-vinyltoluene, p-vinyltoluene, p-chlorostyrene, o-methoxystyrene, m-methoxystyrene, p-methoxystyrene, o-vinylphenol, m-vinylphenol, p-vinylphenol, p-hydroxy-α-methylstyrene, o-vinylbenzylmethyl ether, m-vinylbenzylmethyl ether, p-vinylbenzylmethyl ether, o-vinylbenzyl glycidyl ether, aromatic vinyl compounds such as m-vinylbenzyl glycidyl ether and p-vinyl benzyl glycidyl ether;
인덴, 1-메틸인덴과 같은 인덴류; Indenes such as indene and 1-methylindene;
메틸(메트)아크릴레이트, 에틸(메트)아크릴레이트, n-프로필(메트)아크릴레이트, i-프로필(메트)아크릴레이트, n-부틸(메트)아크릴레이트, i-부틸(메트)아크릴레이트, sec-부틸(메트)아크릴레이트, t-부틸(메트)아크릴레이트, 2-에틸헥실(메트)아크릴레이트, 2-히드록시에틸(메트)아크릴레이트, 2-히드록시프로필(메트)아크릴레이트, 3-히드록시프로필(메트)아크릴레이트, 2-히드록시부틸(메트)아크릴레이트, 3-히드록시부틸(메트)아크릴레이트, 4-히드록시부틸(메트)아크릴레이트, 알릴(메트)아크릴레이트, 벤질(메트)아크릴레이트, 시클로헥실(메트)아크릴레이트, 페닐(메트)아크릴레이트, 2-메톡시에틸(메트)아크릴레이트, 2-페녹시에틸(메트)아크릴레이트, 메톡시디에틸렌글리콜(메트)아크릴레이트, 메톡시트리에틸렌글리콜(메트)아크릴레이트, 메톡시프로필렌글리콜(메트)아크릴레이트, 메톡시디프로필렌글리콜(메트)아크릴레이트, 이소보르닐(메트)아크릴레이트, 트리시클로[5.2.1.02,6]데칸-8-일(메트)아크릴레이트, 2-히드록시-3-페녹시프로필(메트)아크릴레이트, 글리세롤모노(메트)아크릴레이트, 4-히드록시페닐(메트)아크릴레이트, 파라쿠밀페놀의 에틸렌옥시드 변성 (메트)아크릴레이트와 같은 불포화 카르복실산에스테르; Methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, i-propyl (meth) acrylate, n-butyl (meth) acrylate, i-butyl (meth) acrylate, sec-butyl (meth) acrylate, t-butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 3-hydroxybutyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, allyl (meth) acrylate , Benzyl (meth) acrylate, cyclohexyl (meth) acrylate, phenyl (meth) acrylate, 2-methoxyethyl (meth) acrylate, 2-phenoxyethyl (meth) acrylate, methoxydiethylene glycol ( Meth) acrylate, methoxytriethylene glycol (meth) acrylate, methoxypropyl Lenglycol (meth) acrylate, methoxydipropylene glycol (meth) acrylate, isobornyl (meth) acrylate, tricyclo [5.2.1.0 2,6 ] decane-8-yl (meth) acrylate, 2- Unsaturated carboxes such as hydroxy-3-phenoxypropyl (meth) acrylate, glycerol mono (meth) acrylate, 4-hydroxyphenyl (meth) acrylate, and ethylene oxide modified (meth) acrylate of paracumylphenol Acid ester;
2-아미노에틸(메트)아크릴레이트, 2-디메틸아미노에틸(메트)아크릴레이트, 2-아미노프로필(메트)아크릴레이트, 2-디메틸아미노프로필(메트)아크릴레이트, 3-아미노프로필(메트)아크릴레이트, 3-디메틸아미노프로필(메트)아크릴레이트 등의 불포화 카르복실산아미노알킬에스테르류; 2-aminoethyl (meth) acrylate, 2-dimethylaminoethyl (meth) acrylate, 2-aminopropyl (meth) acrylate, 2-dimethylaminopropyl (meth) acrylate, 3-aminopropyl (meth) acrylic Unsaturated carboxylic acid aminoalkyl esters such as acrylate and 3-dimethylaminopropyl (meth) acrylate;
글리시딜(메트)아크릴레이트 등의 불포화 카르복실산글리시딜에스테르류; Unsaturated carboxylic acid glycidyl esters such as glycidyl (meth) acrylate;
(메트)아크릴로니트릴, α-클로로아크릴로니트릴, 시안화비닐리덴 등의 시안화비닐 화합물; Vinyl cyanide compounds such as (meth) acrylonitrile, α-chloroacrylonitrile and vinylidene cyanide;
(메트)아크릴아미드, α-클로로아크릴아미드, N-2-히드록시에틸(메트)아크릴아미드 등의 불포화 아미드류; Unsaturated amides such as (meth) acrylamide, α-chloroacrylamide, and N-2-hydroxyethyl (meth) acrylamide;
아세트산비닐, 프로피온산비닐, 부티르산비닐, 벤조산비닐 등의 카르복실산비닐에스테르류; Carboxylic acid vinyl esters such as vinyl acetate, vinyl propionate, vinyl butyrate and vinyl benzoate;
비닐메틸에테르, 비닐에틸에테르, 알릴글리시딜에테르 등의 불포화 에테르류; Unsaturated ethers such as vinyl methyl ether, vinyl ethyl ether and allyl glycidyl ether;
1,3-부타디엔, 이소프렌, 클로로프렌 등의 지방족 공액 디엔류; Aliphatic conjugated dienes such as 1,3-butadiene, isoprene and chloroprene;
폴리스티렌, 폴리메틸(메트)아크릴레이트, 폴리-n-부틸(메트)아크릴레이트, 폴리실록산 등의 중합체 분자쇄의 말단에 모노(메트)아크릴로일기를 갖는 거대 단량체류. Macromonomers which have a mono (meth) acryloyl group at the terminal of polymer molecular chains, such as polystyrene, polymethyl (meth) acrylate, poly-n-butyl (meth) acrylate, and polysiloxane.
이들 공중합성 불포화 단량체는 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. These copolymerizable unsaturated monomers can be used individually or in mixture of 2 or more types.
본 발명에 있어서, 공중합성 불포화 단량체로는 N-치환 말레이미드, 방향족 비닐 화합물, 불포화 카르복실산에스테르, 중합체 분자쇄의 말단에 모노(메트)아크릴로일기를 갖는 거대 단량체 등이 바람직하고, 특히 N-페닐말레이미드, N-시클로헥실말레이미드, 스티렌, α-메틸스티렌, p-히드록시-α-메틸스티렌, 메틸(메트)아 크릴레이트, n-부틸(메트)아크릴레이트, 2-에틸헥실(메트)아크릴레이트, 2-히드록시에틸(메트)아크릴레이트, 알릴(메트)아크릴레이트, 벤질(메트)아크릴레이트, 글리세롤모노(메트)아크릴레이트, 4-히드록시페닐(메트)아크릴레이트, 파라쿠밀페놀의 에틸렌옥시드 변성 (메트)아크릴레이트, 폴리스티렌 거대 단량체, 폴리메틸메타크릴레이트 거대 단량체 등이 바람직하다. In the present invention, the copolymerizable unsaturated monomer is preferably an N-substituted maleimide, an aromatic vinyl compound, an unsaturated carboxylic acid ester, a macromonomer having a mono (meth) acryloyl group at the terminal of the polymer molecular chain, and the like. N-phenylmaleimide, N-cyclohexylmaleimide, styrene, α-methylstyrene, p-hydroxy-α-methylstyrene, methyl (meth) acrylate, n-butyl (meth) acrylate, 2-ethyl Hexyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, allyl (meth) acrylate, benzyl (meth) acrylate, glycerol mono (meth) acrylate, 4-hydroxyphenyl (meth) acrylate And ethylene oxide modified (meth) acrylates of paracumylphenol, polystyrene macromonomers, polymethylmethacrylate macromonomers, and the like.
카르복실기 함유 공중합체의 구체예로는, 예를 들면 하기의 것을 들 수 있다. As a specific example of a carboxyl group-containing copolymer, the following are mentioned, for example.
(메트)아크릴산/메틸(메트)아크릴레이트 공중합체, (Meth) acrylic acid / methyl (meth) acrylate copolymer,
(메트)아크릴산/벤질(메트)아크릴레이트 공중합체, (Meth) acrylic acid / benzyl (meth) acrylate copolymers,
(메트)아크릴산/2-히드록시에틸(메트)아크릴레이트 공중합체, (Meth) acrylic acid / 2-hydroxyethyl (meth) acrylate copolymer,
(메트)아크릴산/2-히드록시에틸(메트)아크릴레이트/벤질(메트)아크릴레이트 공중합체, (Meth) acrylic acid / 2-hydroxyethyl (meth) acrylate / benzyl (meth) acrylate copolymer,
(메트)아크릴산/메틸(메트)아크릴레이트/폴리스티렌 거대 단량체 공중합체, (Meth) acrylic acid / methyl (meth) acrylate / polystyrene macromonomer copolymer,
(메트)아크릴산/메틸(메트)아크릴레이트/폴리메틸메타크릴레이트 거대 단량체 공중합체, (Meth) acrylic acid / methyl (meth) acrylate / polymethylmethacrylate macromonomer copolymer,
(메트)아크릴산/벤질(메트)아크릴레이트/폴리스티렌 거대 단량체 공중합체, (Meth) acrylic acid / benzyl (meth) acrylate / polystyrene macromonomer copolymer,
(메트)아크릴산/벤질(메트)아크릴레이트/폴리메틸(메트)아크릴레이트 거대 단량체 공중합체, (Meth) acrylic acid / benzyl (meth) acrylate / polymethyl (meth) acrylate macromonomer copolymer,
(메트)아크릴산/벤질(메트)아크릴레이트/글리세롤모노(메트)아크릴레이트 공중합체, (Meth) acrylic acid / benzyl (meth) acrylate / glycerol mono (meth) acrylate copolymer,
(메트)아크릴산/스티렌/2-히드록시에틸(메트)아크릴레이트 공중합체, (Meth) acrylic acid / styrene / 2-hydroxyethyl (meth) acrylate copolymer,
(메트)아크릴산/2-히드록시에틸(메트)아크릴레이트/벤질(메트)아크릴레이트 공중합체, (Meth) acrylic acid / 2-hydroxyethyl (meth) acrylate / benzyl (meth) acrylate copolymer,
(메트)아크릴산/2-히드록시에틸(메트)아크릴레이트/페닐(메트)아크릴레이트 공중합체, (Meth) acrylic acid / 2-hydroxyethyl (meth) acrylate / phenyl (meth) acrylate copolymer,
(메트)아크릴산/N-페닐말레이미드/스티렌/벤질(메트)아크릴레이트 공중합체, (Meth) acrylic acid / N-phenylmaleimide / styrene / benzyl (meth) acrylate copolymer,
(메트)아크릴산/N-m-히드록시페닐말레이미드/스티렌/벤질(메트)아크릴레이트 공중합체, (Meth) acrylic acid / N-m-hydroxyphenylmaleimide / styrene / benzyl (meth) acrylate copolymer,
(메트)아크릴산/N-p-히드록시페닐말레이미드/스티렌/벤질(메트)아크릴레이트 공중합체, (Meth) acrylic acid / N-p-hydroxyphenylmaleimide / styrene / benzyl (meth) acrylate copolymer,
(메트)아크릴산/N-시클로헥실말레이미드/스티렌/벤질(메트)아크릴레이트 공중합체, (Meth) acrylic acid / N-cyclohexylmaleimide / styrene / benzyl (meth) acrylate copolymer,
(메트)아크릴산/N-페닐말레이미드/α-메틸스티렌/벤질(메트)아크릴레이트 공중합체, (Meth) acrylic acid / N-phenylmaleimide / α-methylstyrene / benzyl (meth) acrylate copolymer,
(메트)아크릴산/N-페닐말레이미드/스티렌/n-부틸(메트)아크릴레이트 공중합체, (Meth) acrylic acid / N-phenylmaleimide / styrene / n-butyl (meth) acrylate copolymer,
(메트)아크릴산/N-페닐말레이미드/스티렌/2-에틸헥실(메트)아크릴레이트 공중합체, (Meth) acrylic acid / N-phenylmaleimide / styrene / 2-ethylhexyl (meth) acrylate copolymer,
(메트)아크릴산/N-페닐말레이미드/p-히드록시-α-메틸스티렌/벤질(메트)아크릴레이트 공중합체, (Meth) acrylic acid / N-phenylmaleimide / p-hydroxy-α-methylstyrene / benzyl (meth) acrylate copolymer,
(메트)아크릴산/N-페닐말레이미드/스티렌/n-부틸(메트)아크릴레이트 공중합체, (Meth) acrylic acid / N-phenylmaleimide / styrene / n-butyl (meth) acrylate copolymer,
(메트)아크릴산/N-페닐말레이미드/스티렌/파라쿠밀페놀의 에틸렌옥시드 변성 (메트)아크릴레이트 공중합체, Ethylene oxide modified (meth) acrylate copolymers of (meth) acrylic acid / N-phenylmaleimide / styrene / paracumylphenol,
(메트)아크릴산/N-페닐말레이미드/스티렌/2-에틸헥실(메트)아크릴레이트/2-히드록시에틸(메트)아크릴레이트/벤질(메트)아크릴레이트 공중합체, (Meth) acrylic acid / N-phenylmaleimide / styrene / 2-ethylhexyl (meth) acrylate / 2-hydroxyethyl (meth) acrylate / benzyl (meth) acrylate copolymer,
(메트)아크릴산/N-페닐말레이미드/스티렌/2-히드록시에틸(메트)아크릴레이트/벤질(메트)아크릴레이트 공중합체, (Meth) acrylic acid / N-phenylmaleimide / styrene / 2-hydroxyethyl (meth) acrylate / benzyl (meth) acrylate copolymer,
(메트)아크릴산/N-페닐말레이미드/스티렌/벤질(메트)아크릴레이트/글리세롤모노(메트)아크릴레이트 공중합체, (Meth) acrylic acid / N-phenylmaleimide / styrene / benzyl (meth) acrylate / glycerol mono (meth) acrylate copolymer,
(메트)아크릴산/N-p-히드록시페닐말레이미드/스티렌/벤질(메트)아크릴레이트/글리세롤모노(메트)아크릴레이트 공중합체, (Meth) acrylic acid / N-p-hydroxyphenylmaleimide / styrene / benzyl (meth) acrylate / glycerol mono (meth) acrylate copolymer,
(메트)아크릴산/N-페닐말레이미드/스티렌/페닐(메트)아크릴레이트/2-히드록시에틸(메트)아크릴레이트/폴리스티렌 거대 단량체 공중합체,(Meth) acrylic acid / N-phenylmaleimide / styrene / phenyl (meth) acrylate / 2-hydroxyethyl (meth) acrylate / polystyrene macromonomer copolymer,
(메트)아크릴산/N-페닐말레이미드/스티렌/페닐(메트)아크릴레이트/2-히드록시에틸(메트)아크릴레이트/폴리메틸메타크릴레이트 거대 단량체 공중합체, (Meth) acrylic acid / N-phenylmaleimide / styrene / phenyl (meth) acrylate / 2-hydroxyethyl (meth) acrylate / polymethylmethacrylate macromonomer copolymer,
(메트)아크릴산/숙신산모노〔2-(메트)아크릴로일옥시에틸〕/N-페닐말레이미드/스티렌/벤질(메트)아크릴레이트 공중합체, (Meth) acrylic acid / mono succinate mono [2- (meth) acryloyloxyethyl] / N-phenylmaleimide / styrene / benzyl (meth) acrylate copolymer,
(메트)아크릴산/숙신산모노〔2-(메트)아크릴로일옥시에틸〕/N-p-히드록시페닐말레이미드/스티렌/벤질(메트)아크릴레이트 공중합체, (Meth) acrylic acid / mono succinate [2- (meth) acryloyloxyethyl] / N-p-hydroxyphenylmaleimide / styrene / benzyl (meth) acrylate copolymer,
(메트)아크릴산/숙신산모노〔2-(메트)아크릴로일옥시에틸〕/N-페닐말레이미드/스티렌/알릴(메트)아크릴레이트 공중합체, (Meth) acrylic acid / mono succinic acid [2- (meth) acryloyloxyethyl] / N-phenylmaleimide / styrene / allyl (meth) acrylate copolymer,
(메트)아크릴산/숙신산모노〔2-(메트)아크릴로일옥시에틸〕/N-시클로헥실말레이미드/스티렌/알릴(메트)아크릴레이트 공중합체, (Meth) acrylic acid / mono succinate [2- (meth) acryloyloxyethyl] / N-cyclohexylmaleimide / styrene / allyl (meth) acrylate copolymer,
(메트)아크릴산/숙신산모노〔2-(메트)아크릴로일옥시에틸〕/N-시클로헥실말레이미드/스티렌/벤질(메트)아크릴레이트 공중합체, (Meth) acrylic acid / mono succinate mono [2- (meth) acryloyloxyethyl] / N-cyclohexylmaleimide / styrene / benzyl (meth) acrylate copolymer,
(메트)아크릴산/ω-카르복시폴리카프로락톤모노(메트)아크릴레이트/N-m-히드록시페닐말레이미드/스티렌/벤질(메트)아크릴레이트 공중합체, (Meth) acrylic acid / ω-carboxypolycaprolactone mono (meth) acrylate / N-m-hydroxyphenylmaleimide / styrene / benzyl (meth) acrylate copolymer,
(메트)아크릴산/ω-카르복시폴리카프로락톤모노(메트)아크릴레이트/N-p-히드록시페닐말레이미드/스티렌/벤질(메트)아크릴레이트 공중합체, (Meth) acrylic acid / ω-carboxypolycaprolactone mono (meth) acrylate / N-p-hydroxyphenylmaleimide / styrene / benzyl (meth) acrylate copolymer,
(메트)아크릴산/ω-카르복시폴리카프로락톤모노(메트)아크릴레이트/N-페닐말레이미드/스티렌/벤질(메트)아크릴레이트/글리세롤모노(메트)아크릴레이트 공중합체, (Meth) acrylic acid / ω-carboxypolycaprolactone mono (meth) acrylate / N-phenylmaleimide / styrene / benzyl (meth) acrylate / glycerol mono (meth) acrylate copolymer,
(메트)아크릴산/ω-카르복시폴리카프로락톤모노(메트)아크릴레이트/N-p-히드록시페닐말레이미드/스티렌/벤질(메트)아크릴레이트/글리세롤모노(메트)아크릴레이트 공중합체. (Meth) acrylic acid / ω-carboxypolycaprolactone mono (meth) acrylate / N-p-hydroxyphenylmaleimide / styrene / benzyl (meth) acrylate / glycerol mono (meth) acrylate copolymer.
카르복실기 함유 공중합체에 있어서의 카르복실기 함유 불포화 단량체의 공중합 비율은 통상 5 내지 50 질량%, 바람직하게는 10 내지 40 질량%이다. 이 공중합 비율이 5 질량% 미만이면 얻어지는 감방사선성 조성물의 알칼리 현상액에 대한 용해성이 저하되는 경향이 있다. 한편, 50 질량%를 초과하면 알칼리 현상액에 대한 용해성이 과대해지고, 알칼리 현상액에 의해 현상할 때에, 착색층의 기판으로부터의 탈락이나 착색층 표면의 막 거칠음을 초래하기 쉬워지는 경향이 있다. The copolymerization ratio of the carboxyl group-containing unsaturated monomer in the carboxyl group-containing copolymer is usually 5 to 50% by mass, preferably 10 to 40% by mass. When this copolymerization ratio is less than 5 mass%, there exists a tendency for the solubility with respect to the alkaline developing solution of the radiation sensitive composition obtained to fall. On the other hand, when it exceeds 50 mass%, there exists a tendency for the solubility to alkaline developing solution to become excessive, and when developing with alkaline developing solution, the fall of the colored layer from the board | substrate and the film roughness of the colored layer surface become easy to be brought about.
본 발명에 있어서의 알칼리 가용성 수지의 중량평균 분자량(이하, "Mw"라 함)은 통상 3,000 내지 300,000, 바람직하게는 5,000 내지 100,000이다. The weight average molecular weight (hereinafter referred to as "Mw") of the alkali-soluble resin in the present invention is usually 3,000 to 300,000, preferably 5,000 to 100,000.
또한, 본 발명에 있어서의 알칼리 가용성 수지의 수평균 분자량(이하, "Mn" 이라 함)은 통상 3,000 내지 60,000, 바람직하게는 5,000 내지 25,000이다. In addition, the number average molecular weight (henceforth "Mn") of alkali-soluble resin in this invention is 3,000-60,000 normally, Preferably it is 5,000-25,000.
여기서 본 명세서에 있어서 중량평균 분자량(Mw)이란, 겔 투과 크로마토그래피(GPC, 용출 용매: 테트라히드로푸란)로 측정한 폴리스티렌 환산의 Mw를 말하며, 수평균 분자량(Mn)이란 GPC(용출 용매: 테트라히드로푸란)로 측정한 폴리스티렌 환산의 Mn을 말한다. In this specification, the weight average molecular weight (Mw) means Mw of polystyrene conversion measured by gel permeation chromatography (GPC, elution solvent: tetrahydrofuran), and the number average molecular weight (Mn) is GPC (elution solvent: tetra). Hydrofuran) to Mn in terms of polystyrene.
본 발명에 있어서는, 이러한 특정한 Mw 및 Mn을 갖는 알칼리 가용성 수지를 사용함으로써, 현상성이 우수한 감방사선성 조성물이 얻어진다. 이에 따라, 날카로운 패턴 단부를 갖는 화소 및 블랙 매트릭스를 형성할 수 있을 뿐만 아니라, 현상시에 미노광부의 기판 상 및 차광층 상에 잔사, 바탕 오염, 막 잔여물 등이 발생하기 어려워진다.In this invention, the radiation sensitive composition excellent in developability is obtained by using alkali-soluble resin which has such specific Mw and Mn. As a result, not only the pixels and the black matrix having sharp pattern ends can be formed, but also residues, ground contamination, film residues, etc. on the substrate and the light shielding layer of the unexposed portion during development are less likely to occur.
또한, 본 발명에 있어서의 알칼리 가용성 수지의 Mw와 Mn의 비(Mw/Mn)는, 바람직하게는 1 내지 5, 더욱 바람직하게는 1 내지 4이다. Moreover, ratio (Mw / Mn) of Mw and Mn of alkali-soluble resin in this invention becomes like this. Preferably it is 1-5, More preferably, it is 1-4.
본 발명에 있어서, 알칼리 가용성 수지는 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. In this invention, alkali-soluble resin can be used individually or in mixture of 2 or more types.
본 발명에 있어서의 알칼리 가용성 수지의 함유량(고형분 환산)은, (A) 착색 제 100 질량부에 대하여, 통상 10 내지 1,000 질량부, 바람직하게는 20 내지 500 질량부이다. 알칼리 가용성 수지의 함유량이 10 질량부 미만이면, 예를 들면 알칼리 현상성이 저하되거나, 미노광부의 기판 상 또는 차광층 상에 바탕 오염이나 막 잔여물이 발생할 우려가 있다. 한편, 1,000 질량부를 초과하면 상대적으로 착색제 농도가 저하되기 때문에, 박막으로서 목적으로 하는 색 농도를 달성하는 것이 곤란해질 우려가 있다. Content (solid content conversion) of alkali-soluble resin in this invention is 10-1,000 mass parts normally with respect to 100 mass parts of (A) coloring agents, Preferably it is 20-500 mass parts. When content of alkali-soluble resin is less than 10 mass parts, alkali developability may fall, for example, or a ground contamination and a film residue may generate | occur | produce on the board | substrate or the light shielding layer of an unexposed part. On the other hand, when it exceeds 1,000 mass parts, since a coloring agent density | concentration falls relatively, there exists a possibility that it may become difficult to achieve the target color density as a thin film.
-(D) 다관능성 단량체-(D) polyfunctional monomer
본 발명에 있어서의 다관능성 단량체는 2개 이상의 중합성 불포화 결합을 갖는 단량체를 포함한다. The polyfunctional monomer in the present invention includes a monomer having two or more polymerizable unsaturated bonds.
다관능성 단량체로는, 예를 들면 As a polyfunctional monomer, for example
에틸렌글리콜, 프로필렌글리콜 등의 알킬렌글리콜의 디(메트)아크릴레이트류; Di (meth) acrylates of alkylene glycols such as ethylene glycol and propylene glycol;
폴리에틸렌글리콜, 폴리프로필렌글리콜 등의 폴리알킬렌글리콜의 디(메트)아크릴레이트류; Di (meth) acrylates of polyalkylene glycols such as polyethylene glycol and polypropylene glycol;
글리세린, 트리메틸올프로판, 펜타에리트리톨, 디펜타에리트리톨 등의 3가 이상의 다가 알코올의 폴리(메트)아크릴레이트류나, 이들의 디카르복실산 변성물; Poly (meth) acrylates of trihydric or higher polyhydric alcohols such as glycerin, trimethylolpropane, pentaerythritol, dipentaerythritol, and these dicarboxylic acid modified substances;
폴리에스테르, 에폭시 수지, 우레탄 수지, 알키드 수지, 실리콘 수지, 스피란 수지 등의 올리고(메트)아크릴레이트류; Oligo (meth) acrylates such as polyester, epoxy resin, urethane resin, alkyd resin, silicone resin and spiran resin;
양쪽 말단 히드록실의 폴리-1,3-부타디엔, 양쪽 말단 히드록실의 폴리이소프렌, 양쪽 말단 히드록실의 폴리카프로락톤 등의 양쪽 말단 히드록실화 중합체의 디(메트)아크릴레이트류; 및 Di (meth) acrylates of both terminal hydroxylated polymers such as poly-1,3-butadiene of both terminal hydroxyls, polyisoprene of both terminal hydroxyls, and polycaprolactone of both terminal hydroxyls; And
트리스〔2-(메트)아크릴로일옥시에틸〕포스페이트 Tris [2- (meth) acryloyloxyethyl] phosphate
등을 들 수 있다. Etc. can be mentioned.
이들 다관능성 단량체 중, 3가 이상의 다가 알코올의 폴리(메트)아크릴레이트류나 이들의 디카르복실산 변성물이 바람직하다. 구체적으로는 트리메틸올프로판트리아크릴레이트, 트리메틸올프로판트리메타크릴레이트, 펜타에리트리톨트리아크릴레이트, 펜타에리트리톨트리메타크릴레이트, 펜타에리트리톨테트라아크릴레이트, 펜타에리트리톨테트라메타크릴레이트, 디펜타에리트리톨펜타아크릴레이트, 디펜타에리트리톨펜타메타크릴레이트, 디펜타에리트리톨헥사아크릴레이트, 디펜타에리트리톨헥사메타크릴레이트, 하기 화학식 1로 표시되는 화합물, 하기 화학식 2로 표시되는 화합물 등이 바람직하다. Among these polyfunctional monomers, poly (meth) acrylates of trivalent or higher polyhydric alcohols and their dicarboxylic acid modified substances are preferable. Specifically, trimethylol propane triacrylate, trimethylol propane trimethacrylate, pentaerythritol triacrylate, pentaerythritol trimethacrylate, pentaerythritol tetraacrylate, pentaerythritol tetramethacrylate, dipenta Erythritol pentaacrylate, dipentaerythritol pentamethacrylate, dipentaerythritol hexaacrylate, dipentaerythritol hexamethacrylate, a compound represented by the following formula (1), a compound represented by the following formula (2), and the like are preferable. Do.
그 중에서도, 특히 트리메틸올프로판트리아크릴레이트, 펜타에리트리톨트리아크릴레이트, 디펜타에리트리톨헥사아크릴레이트, 및 상기 화학식 1 및 2로 표시되는 화합물이 착색층의 강도가 높고, 착색층의 표면 평활성이 우수하며, 미노광부의 기판 상 및 차광층 상에 바탕 오염, 막 잔여물 등이 발생하기 어렵다는 점에서 바람직하다. Among them, trimethylolpropane triacrylate, pentaerythritol triacrylate, dipentaerythritol hexaacrylate, and the compounds represented by the formulas (1) and (2) are particularly high in the strength of the colored layer and the surface smoothness of the colored layer. It is excellent in that it is difficult to generate background contamination, film residue, etc. on the substrate and the light shielding layer of the unexposed part.
다관능성 단량체는 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. A polyfunctional monomer can be used individually or in mixture of 2 or more types.
또한, 본 발명에 있어서는 다관능성 단량체의 일부를, 중합성 불포화 결합을 1개 갖는 단관능성 단량체로 대체할 수도 있다.In addition, in this invention, a part of polyfunctional monomer can also be replaced by the monofunctional monomer which has one polymerizable unsaturated bond.
이러한 단관능성 단량체로는, 예를 들면 (C) 알칼리 가용성 수지에 있어서 예시한 카르복실기 함유 불포화 단량체나 공중합성 불포화 단량체와 마찬가지의 화합물이나, N-(메트)아크릴로일모르폴린, N-비닐피롤리돈, N-비닐-ε-카프로락탐 이외에, 시판품으로서 M-5600(상품명, 도아 고세이(주)제조) 등을 들 수 있다.As such a monofunctional monomer, For example, the compound similar to the carboxyl group-containing unsaturated monomer and copolymerizable unsaturated monomer which were illustrated in (C) alkali-soluble resin, N- (meth) acryloyl morpholine, N-vinyl-pipi M-5600 (brand name, Toagosei Co., Ltd.) etc. are mentioned as a commercial item other than a ralidone and N-vinyl- epsilon caprolactam.
이들 단관능성 단량체는 단독으로 또는 2종 이상을 혼합하여 사용할 수 있 다. These monofunctional monomers can be used individually or in mixture of 2 or more types.
단관능성 단량체의 함유 비율은 다관능성 단량체와 단관능성 단량체와의 합계 질량에 대하여, 통상 90 질량% 이하, 바람직하게는 50 질량% 이하이다. 단관능성 단량체의 함유 비율이 90 질량%를 초과하면 얻어지는 착색층의 강도나 표면 평활성이 불충분해질 우려가 있다. The content rate of a monofunctional monomer is 90 mass% or less normally with respect to the total mass of a polyfunctional monomer and a monofunctional monomer, Preferably it is 50 mass% or less. When the content rate of monofunctional monomer exceeds 90 mass%, there exists a possibility that the intensity | strength and surface smoothness of the colored layer obtained may become inadequate.
본 발명에 있어서, 다관능성 단량체의 함유량은 (C) 알칼리 가용성 수지 100 질량부(고형분 환산)에 대하여, 통상 5 내지 500 질량부, 바람직하게는 20 내지 300 질량부이다. 상기 함유량이 5 질량부 미만이면 착색층의 강도나 표면 평활성이 저하되는 경향이 있다. 한편, 500 질량부를 초과하면, 예를 들면 알칼리 현상성이 저하되거나, 미노광부의 기판 상 또는 차광층 상에 바탕 오염, 막 잔여물 등이 발생하기 쉬워지는 경향이 있다. 또한, 다관능성 단량체와 단관능성 단량체를 병용하는 경우, 단관능성 단량체의 질량은 다관능성 단량체의 질량에 포함된다. In this invention, content of a polyfunctional monomer is 5-500 mass parts normally with respect to 100 mass parts (solid content conversion) of (C) alkali-soluble resin, Preferably it is 20-300 mass parts. When the said content is less than 5 mass parts, there exists a tendency for the intensity | strength and surface smoothness of a colored layer to fall. On the other hand, when it exceeds 500 mass parts, alkali developability falls, for example, and it exists in the tendency for background contamination, a film residue, etc. to occur easily on the board | substrate or the light shielding layer of an unexposed part. In addition, when using together a polyfunctional monomer and a monofunctional monomer, the mass of a monofunctional monomer is contained in the mass of a polyfunctional monomer.
-(E) 광중합 개시제--(E) photoinitiator-
본 발명에 있어서의 광중합 개시제는 가시광선, 자외선, 원자외선, 전자선, X선 등의 방사선의 노광에 의해 (D) 다관능성 단량체 및 경우에 따라 사용되는 단관능성 단량체의 중합을 개시할 수 있는 활성종을 발생시키는 화합물이다. The photopolymerization initiator in the present invention is an activity capable of initiating polymerization of (D) the polyfunctional monomer and the monofunctional monomer used in some cases by exposure to radiation such as visible light, ultraviolet ray, far ultraviolet ray, electron beam, X-ray and the like. It is a compound that generates species.
이러한 광중합 개시제로는, 예를 들면 아세토페논계 화합물, 비이미다졸계 화합물, 트리아진계 화합물, O-아실옥심계 화합물, 오늄염계 화합물, 벤조인계 화합물, 벤조페논계 화합물, α-디케톤계 화합물, 다핵 퀴논계 화합물, 크산톤계 화합물, 디아조계 화합물, 이미드술포네이트계 화합물 등을 들 수 있다. Examples of such photopolymerization initiators include acetophenone compounds, biimidazole compounds, triazine compounds, O-acyl oxime compounds, onium salt compounds, benzoin compounds, benzophenone compounds, α-diketone compounds, A polynuclear quinone type compound, a xanthone type compound, a diazo type compound, an imide sulfonate type compound, etc. are mentioned.
본 발명에 있어서, 광중합 개시제는 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. 본 발명에 있어서의 광중합 개시제로는 아세토페논계 화합물, 비이미다졸계 화합물, 트리아진계 화합물, O-아실옥심계 화합물의 군으로부터 선택되는 1종 이상이 바람직하다. In this invention, a photoinitiator can be used individually or in mixture of 2 or more types. As a photoinitiator in this invention, 1 or more types chosen from the group of an acetophenone type compound, a biimidazole type compound, a triazine type compound, and an O-acyl oxime type compound are preferable.
본 발명에 있어서, 광중합 개시제의 합계 함유량은 (D) 다관능성 단량체 100 질량부에 대하여, 통상 0.01 내지 120 질량부, 바람직하게는 1 내지 100 질량부이다. 광중합 개시제의 함유량이 0.01 질량부 미만이면 노광에 의한 경화가 불충분해지고, 착색층 패턴이 소정의 배열에 따라서 배치된 컬러 필터를 얻는 것이 곤란해질 우려가 있다. 한편, 120 질량부를 초과하면 형성된 착색층이 현상시에 기판으로부터 탈락하기 쉬워지는 경향이 있다. 또한, 다관능성 단량체와 단관능성 단량체를 병용하는 경우, 단관능성 단량체의 질량은 다관능성 단량체의 질량에 포함된다. In this invention, the sum total content of a photoinitiator is 0.01-120 mass parts normally with respect to 100 mass parts of (D) polyfunctional monomers, Preferably it is 1-100 mass parts. When content of a photoinitiator is less than 0.01 mass part, hardening by exposure may become inadequate and it may become difficult to obtain the color filter by which the colored layer pattern was arrange | positioned according to the predetermined | prescribed arrangement. On the other hand, when it exceeds 120 mass parts, there exists a tendency for the formed colored layer to fall off from a board | substrate at the time of image development. In addition, when using together a polyfunctional monomer and a monofunctional monomer, the mass of a monofunctional monomer is contained in the mass of a polyfunctional monomer.
본 발명에 있어서의 바람직한 광중합 개시제 중, 아세토페논계 화합물의 구체예로는 2-메틸-1-〔4-(메틸티오)페닐〕-2-모르폴리노프로판-1-온, 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)부탄-1-온 등의 모르폴리노기를 갖는 아세토페논계 화합물; As a specific example of an acetophenone type compound among the preferable photoinitiators in this invention, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholino propane- 1-one, 2-benzyl- Acetophenone compounds having a morpholino group such as 2-dimethylamino-1- (4-morpholinophenyl) butan-1-one;
2-히드록시-2-메틸-1-페닐프로판-1-온, 1-히드록시시클로헥실-페닐케톤, 2,2-디메톡시-1,2-디페닐에탄-1-온, 1,2-옥탄디온 등을 들 수 있다. 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1-hydroxycyclohexyl-phenylketone, 2,2-dimethoxy-1,2-diphenylethan-1-one, 1,2 -Octanedione etc. are mentioned.
이들 아세토페논계 화합물 중, 특히 2-메틸-1-〔4-(메틸티오)페닐〕-2-모르폴리노프로판-1-온, 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)부탄-1-온, 1,2- 옥탄디온 등이 바람직하다. Among these acetophenone compounds, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane-1-one and 2-benzyl-2-dimethylamino-1- (4-mor Polynophenyl) butan-1-one, 1,2-octanedione, etc. are preferable.
아세토페논계 화합물은 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. An acetophenone type compound can be used individually or in mixture of 2 or more types.
본 발명에 있어서, 광중합 개시제로서 아세토페논계 화합물을 사용하는 경우, 그 함유량은 (D) 다관능성 단량체 100 질량부에 대하여, 통상 0.01 내지 80 질량부, 바람직하게는 1 내지 70 질량부, 더욱 바람직하게는 1 내지 60 질량부이다. 아세토페논계 화합물의 함유량이 0.01 질량부 미만이면 노광에 의한 경화가 불충분해지고, 착색층 패턴이 소정의 배열에 따라서 배치된 컬러 필터를 얻는 것이 곤란해질 우려가 있다. 한편, 80 질량부를 초과하면 형성된 착색층이 현상시에 기판으로부터 탈락하기 쉬워지는 경향이 있다. 또한, 다관능성 단량체와 단관능성 단량체를 병용하는 경우, 단관능성 단량체의 질량은 다관능성 단량체의 질량에 포함된다. In this invention, when using an acetophenone type compound as a photoinitiator, the content is 0.01-80 mass parts normally with respect to 100 mass parts of (D) polyfunctional monomers, Preferably it is 1-70 mass parts, More preferably, Preferably from 1 to 60 parts by mass. When content of an acetophenone type compound is less than 0.01 mass part, hardening by exposure may become inadequate and it may become difficult to obtain the color filter by which the colored layer pattern was arrange | positioned according to the predetermined | prescribed arrangement. On the other hand, when it exceeds 80 mass parts, there exists a tendency for the formed colored layer to fall off from a board | substrate at the time of image development. In addition, when using together a polyfunctional monomer and a monofunctional monomer, the mass of a monofunctional monomer is contained in the mass of a polyfunctional monomer.
또한, 비이미다졸계 화합물의 구체예로는, Moreover, as a specific example of a biimidazole type compound,
2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라키스(4-에톡시카르보닐페닐)-1,2'-비이미다졸, 2,2'-비스(2-브로모페닐)-4,4',5,5'-테트라키스(4-에톡시카르보닐페닐)-1,2'-비이미다졸 등의 비스(할로겐 치환 페닐)테트라키스(알콕시카르보닐페닐)비이미다졸; 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetrakis (4-ethoxycarbonylphenyl) -1,2'-biimidazole, 2,2'-bis Bis (halogen substituted phenyl) tetrakis (alkoxy, such as (2-bromophenyl) -4,4 ', 5,5'- tetrakis (4-ethoxycarbonylphenyl) -1,2'-biimidazole) Carbonylphenyl) biimidazole;
2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐-1,2'-비이미다졸, 2,2'-비스(2,4-디클로로페닐)-4,4',5,5-테트라페닐-1,2'-비이미다졸, 2,2'-비스(2,4,6-트리클로로페닐)-4,4',5,5'-테트라페닐-1,2'-비이미다졸, 2,2'-비스(2-브로모페닐)-4,4',5,5'-테트라페닐-1,2'-비이미다졸, 2,2'-비스(2,4-디브로모페닐)-4,4',5,5'- 테트라페닐-1,2'-비이미다졸, 2,2'-비스(2,4,6-트리브로모페닐)-4,4',5,5'-테트라페닐-1,2'-비이미다졸 등의 비스(할로겐 치환 페닐)테트라페닐비이미다졸을 들 수 있다. 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-bis (2,4-dichlorophenyl)- 4,4 ', 5,5-tetraphenyl-1,2'-biimidazole, 2,2'-bis (2,4,6-trichlorophenyl) -4,4', 5,5'-tetra Phenyl-1,2'-biimidazole, 2,2'-bis (2-bromophenyl) -4,4 ', 5,5'-tetraphenyl-1,2'-biimidazole, 2,2 '-Bis (2,4-dibromophenyl) -4,4', 5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-bis (2,4,6-t And bis (halogen substituted phenyl) tetraphenylbiimidazoles such as ribomophenyl) -4,4 ', 5,5'-tetraphenyl-1,2'-biimidazole.
이들 비이미다졸계 화합물 중, 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐-1,2'-비이미다졸, 2,2'-비스(2,4-디클로로페닐)-4,4',5,5'-테트라페닐-1,2'-비이미다졸, 2,2'-비스(2,4,6-트리클로로페닐)-4,4',5,5'-테트라페닐-1,2'-비이미다졸 등이 바람직하고, 특히 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐-1,2'-비이미다졸이 바람직하다. Among these biimidazole compounds, 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-bis ( 2,4-dichlorophenyl) -4,4 ', 5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-bis (2,4,6-trichlorophenyl) -4, 4 ', 5,5'-tetraphenyl-1,2'-biimidazole and the like are preferred, in particular 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetraphenyl -1,2'-biimidazole is preferred.
이들 비이미다졸계 화합물은 용제에 대한 용해성이 우수하고, 미용해물, 석출물 등의 이물질을 발생시키지 않고, 감도가 높으며, 적은 에너지량의 노광에 의해 경화 반응을 충분히 진행시킴과 동시에, 미노광부에서 경화 반응이 발생하지 않는다. 이 때문에, 노광 후의 도막은 현상액에 대하여 불용성의 경화 부분과, 현상액에 대하여 높은 용해성을 갖는 미경화 부분으로 명확히 구분된다. 이에 따라, 언더컷이 없는 착색층 패턴이 소정의 배열에 따라서 배치된 고정밀한 컬러 필터를 형성할 수 있다. These biimidazole-based compounds are excellent in solubility in solvents, do not generate foreign matters such as undissolved products and precipitates, and have high sensitivity, and sufficiently proceed the curing reaction by exposure of a small amount of energy. Curing reaction does not occur. For this reason, the coating film after exposure is clearly divided into the insoluble hardened part with respect to a developing solution, and the unhardened part which has high solubility with respect to a developing solution. Thereby, the high-precision color filter by which the colored layer pattern without undercut is arrange | positioned according to a predetermined arrangement can be formed.
비이미다졸계 화합물은 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. A biimidazole type compound can be used individually or in mixture of 2 or more types.
본 발명에 있어서, 광중합 개시제로서 비이미다졸계 화합물을 사용하는 경우, 그 함유량은 (D) 다관능성 단량체 100 질량부에 대하여, 통상 0.01 내지 40 질량부, 바람직하게는 1 내지 30 질량부, 더욱 바람직하게는 1 내지 20 질량부이다. 비이미다졸계 화합물의 함유량이 0.01 질량부 미만이면 노광에 의한 경화가 불충분 해지고, 착색층 패턴이 소정의 배열에 따라서 배치된 컬러 필터를 얻는 것이 곤란해질 우려가 있다. 한편, 40 질량부를 초과하면 현상할 때에 형성된 착색층의 기판으로부터의 탈락이나 착색층 표면의 막거칠음을 초래하기 쉬워지는 경향이 있다. 또한, 다관능성 단량체와 단관능성 단량체를 병용하는 경우, 단관능성 단량체의 질량은 다관능성 단량체의 질량에 포함된다. In this invention, when using a biimidazole type compound as a photoinitiator, the content is 0.01-40 mass parts normally with respect to 100 mass parts of (D) polyfunctional monomers, Preferably it is 1-30 mass parts, More Preferably it is 1-20 mass parts. When content of a biimidazole type compound is less than 0.01 mass part, hardening by exposure may become inadequate and it may become difficult to obtain the color filter by which the colored layer pattern was arrange | positioned according to the predetermined | prescribed arrangement. On the other hand, when it exceeds 40 mass parts, there exists a tendency which becomes easy to cause the fall of the colored layer formed at the time of image development, and the film | membrane of the colored layer surface. In addition, when using together a polyfunctional monomer and a monofunctional monomer, the mass of a monofunctional monomer is contained in the mass of a polyfunctional monomer.
본 발명에 있어서는, 광중합 개시제로서 비이미다졸계 화합물을 이용하는 경우, 후술하는 수소 공여체를 병용하는 것이 감도를 더욱 향상시킨다는 점에서 바람직하다. In this invention, when using a biimidazole type compound as a photoinitiator, using the hydrogen donor mentioned later together is preferable at the point which improves a sensitivity further.
여기서 말하는 "수소 공여체"란, 노광에 의해 비이미다졸계 화합물로부터 발생한 라디칼에 대하여, 수소 원자를 공여할 수 있는 화합물을 의미한다. The "hydrogen donor" as used here means the compound which can donate a hydrogen atom with respect to the radical which generate | occur | produced from the biimidazole type compound by exposure.
본 발명에 있어서의 수소 공여체로는, 하기에서 정의하는 메르캅탄계 화합물, 아민계 화합물 등이 바람직하다. As a hydrogen donor in this invention, a mercaptan type compound, an amine compound, etc. which are defined below are preferable.
메르캅탄계 화합물이란, 벤젠환 또는 복소환을 모핵으로 하고, 상기 모핵에 직접 결합한 메르캅토기를 1개 이상, 바람직하게는 1 내지 3개, 더욱 바람직하게는 1 내지 2개 갖는 화합물(이하, "메르캅탄계 수소 공여체"라 함)을 의미한다. A mercaptan compound is a compound having a benzene ring or a heterocycle as a mother nucleus and having one or more, preferably one to three, more preferably one to two mercapto groups directly bonded to the mother nucleus (hereinafter, "Mercaptan-based hydrogen donor").
또한, 상기 아민계 화합물이란, 벤젠환 또는 복소환을 모핵으로 하고, 상기 모핵에 직접 결합한 아미노기를 1개 이상, 바람직하게는 1 내지 3개, 더욱 바람직하게는 1 내지 2개 갖는 화합물(이하, "아민계 수소 공여체"라 함)을 의미한다. The amine compound is a compound having a benzene ring or a heterocycle as a mother nucleus, and having at least one, preferably 1 to 3, more preferably 1 to 2 amino groups directly bonded to the mother nucleus (hereinafter, "Amine-based hydrogen donor").
또한, 이들 수소 공여체는 메르캅토기와 아미노기를 동시에 가질 수도 있다.These hydrogen donors may also have a mercapto group and an amino group at the same time.
이하, 수소 공여체에 대해서 보다 구체적으로 설명한다. The hydrogen donor will be described in more detail below.
메르캅탄계 수소 공여체는 벤젠환 또는 복소환을 각각 1개 이상 갖거나, 벤젠환과 복소환을 둘 다 가질 수 있다. 이들 환을 2개 이상 갖는 경우, 축합환을 형성할 수도 있다. The mercaptan-based hydrogen donor may have one or more benzene rings or heterocycles, or may have both a benzene ring and a heterocycle. When it has 2 or more of these rings, a condensed ring can also be formed.
또한, 메르캅탄계 수소 공여체는 메르캅토기를 2개 이상 갖는 경우, 1개 이상의 유리 메르캅토기가 잔존하는 한 나머지 메르캅토기의 1개 이상이 알킬, 아랄킬 또는 아릴기로 치환될 수도 있다. 또한, 1개 이상의 유리 메르캅토기가 잔존하는 한 2개의 황 원자가 알킬렌기 등의 2가의 유기기를 개재하여 결합한 구조 단위, 또는 2개의 황 원자가 디술피드의 형태로 결합한 구조 단위를 가질 수 있다.In addition, when the mercaptan-based hydrogen donor has two or more mercapto groups, one or more of the remaining mercapto groups may be substituted with alkyl, aralkyl or aryl groups as long as one or more free mercapto groups remain. As long as at least one free mercapto group remains, it may have a structural unit in which two sulfur atoms are bonded via a divalent organic group such as an alkylene group, or two sulfur atoms in the form of disulfide.
또한, 메르캅탄계 수소 공여체는 메르캅토기 이외의 개소에서 카르복실기, 알콕시카르보닐기, 치환 알콕시카르보닐기, 페녹시카르보닐기, 치환 페녹시카르보닐기, 니트릴기 등에 의해서 치환될 수도 있다. The mercaptan-based hydrogen donor may be substituted by a carboxyl group, an alkoxycarbonyl group, a substituted alkoxycarbonyl group, a phenoxycarbonyl group, a substituted phenoxycarbonyl group, a nitrile group, or the like at a position other than the mercapto group.
이러한 메르캅탄계 수소 공여체의 구체예로는 2-메르캅토벤조티아졸, 2-메르캅토벤조옥사졸, 2-메르캅토벤조이미다졸, 2,5-디메르캅토-1,3,4-티아디아졸, 2-메르캅토-2,5-디메틸아미노피리딘 등을 들 수 있다. Specific examples of such mercaptan-based hydrogen donors include 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobenzoimidazole, 2,5-dimercapto-1,3,4-thia Diazole, 2-mercapto-2,5-dimethylaminopyridine, and the like.
이들 메르캅탄계 수소 공여체 중, 2-메르캅토벤조티아졸, 2-메르캅토벤조옥사졸이 바람직하고, 특히 2-메르캅토벤조티아졸이 바람직하다.Among these mercaptan-based hydrogen donors, 2-mercaptobenzothiazole and 2-mercaptobenzoxazole are preferable, and 2-mercaptobenzothiazole is particularly preferable.
또한, 아민계 수소 공여체는 벤젠환 또는 복소환을 각각 1개 이상 갖거나, 벤젠환과 복소환을 둘 다 가질 수 있다. 이들 환을 2개 이상 갖는 경우, 축합환을 형성할 수도 있다.In addition, the amine-based hydrogen donor may have one or more benzene rings or heterocycles, or may have both a benzene ring and a heterocycle. When it has 2 or more of these rings, a condensed ring can also be formed.
또한, 아민계 수소 공여체는 아미노기의 1개 이상이 알킬기 또는 치환 알킬 기로 치환될 수도 있고, 또한 아미노기 이외의 개소에서 카르복실기, 알콕시카르보닐기, 치환 알콕시카르보닐기, 페녹시카르보닐기, 치환 페녹시카르보닐기, 니트릴기 등에 의해서 치환될 수도 있다. In the amine-based hydrogen donor, at least one amino group may be substituted with an alkyl group or a substituted alkyl group, and at a position other than the amino group, a carboxyl group, alkoxycarbonyl group, substituted alkoxycarbonyl group, phenoxycarbonyl group, substituted phenoxycarbonyl group, nitrile group or the like. It may be substituted by.
이러한 아민계 수소 공여체의 구체예로는 4,4'-비스(디메틸아미노)벤조페논, 4,4'-비스(디에틸아미노)벤조페논 등의 아미노 치환 벤조페논류, 4-디메틸아미노프로피오페논, 에틸 4-디메틸아미노벤조에이트, 4-디메틸아미노벤조산, 4-디메틸아미노벤조니트릴 등을 들 수 있다. Specific examples of such amine-based hydrogen donors include amino-substituted benzophenones such as 4,4'-bis (dimethylamino) benzophenone and 4,4'-bis (diethylamino) benzophenone, and 4-dimethylaminopropiope. And non-ethyl, 4-dimethylaminobenzoate, 4-dimethylaminobenzoic acid, 4-dimethylaminobenzonitrile and the like.
이들 아민계 수소 공여체 중, 4,4'-비스(디메틸아미노)벤조페논, 4,4'-비스(디에틸아미노)벤조페논이 바람직하고, 특히 4,4'-비스(디에틸아미노)벤조페논이 바람직하다. Among these amine-based hydrogen donors, 4,4'-bis (dimethylamino) benzophenone and 4,4'-bis (diethylamino) benzophenone are preferable, and 4,4'-bis (diethylamino) benzo is particularly preferred. Phenones are preferred.
또한, 아민계 수소 공여체는 비이미다졸계 화합물 이외의 광중합 개시제의 경우에도 증감제로서의 작용을 갖는 것이다. The amine hydrogen donor also has a function as a sensitizer even in the case of photopolymerization initiators other than the biimidazole compound.
본 발명에 있어서, 수소 공여체는 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. 특히 1종 이상의 메르캅탄계 수소 공여체와 1종 이상의 아민계 수소 공여체를 조합하여 사용하는 것이 형성된 착색층이 현상시에 기판으로부터 탈락하기 어렵고, 또한 착색층 강도 및 감도도 높다는 점에서 바람직하다. In the present invention, the hydrogen donors may be used alone or in combination of two or more thereof. Particularly, the use of a combination of one or more mercaptan-based hydrogen donors and one or more amine-based hydrogen donors is preferable in that the formed colored layer is hardly eliminated from the substrate during development, and the colored layer strength and sensitivity are also high.
메르캅탄계 수소 공여체와 아민계 수소 공여체와의 조합의 구체예로는 2-메르캅토벤조티아졸/4,4'-비스(디메틸아미노)벤조페논, 2-메르캅토벤조티아졸/4,4'-비스(디에틸아미노)벤조페논, 2-메르캅토벤조옥사졸/4,4'-비스(디메틸아미노)벤조페논, 2-메르캅토벤조옥사졸/4,4'-비스(디에틸아미노)벤조페논 등을 들 수 있다. 그 중에서도, 더욱 바람직한 조합은 2-메르캅토벤조티아졸/4,4'-비스(디에틸아미노)벤조페논, 2-메르캅토벤조옥사졸/4,4'-비스(디에틸아미노)벤조페논이고, 특히 바람직한 조합은 2-메르캅토벤조티아졸/4,4'-비스(디에틸아미노)벤조페논이다. Specific examples of the combination of the mercaptan-based hydrogen donor and the amine-based hydrogen donor include 2-mercaptobenzothiazole / 4,4'-bis (dimethylamino) benzophenone, 2-mercaptobenzothiazole / 4,4 '-Bis (diethylamino) benzophenone, 2-mercaptobenzoxazole / 4,4'-bis (dimethylamino) benzophenone, 2-mercaptobenzooxazole / 4,4'-bis (diethylamino ) Benzophenone, etc. are mentioned. Especially, a more preferable combination is 2-mercapto benzothiazole / 4,4'-bis (diethylamino) benzophenone and 2-mercapto benzoxazole / 4,4'-bis (diethylamino) benzophenone And a particularly preferred combination is 2-mercaptobenzothiazole / 4,4'-bis (diethylamino) benzophenone.
메르캅탄계 수소 공여체와 아민계 수소 공여체와의 조합에서의 메르캅탄계 수소 공여체와 아민계 수소 공여체와의 질량비는, 통상 1:1 내지 1:4, 바람직하게는 1:1 내지 1:3이다.The mass ratio of the mercaptan-based hydrogen donor to the amine-based hydrogen donor in the combination of the mercaptan-based hydrogen donor and the amine-based hydrogen donor is usually 1: 1 to 1: 4, preferably 1: 1 to 1: 3. .
본 발명에 있어서, 수소 공여체를 비이미다졸 화합물과 병용하는 경우, 수소 공여체의 함유량은 (D) 다관능성 단량체 100 질량부에 대하여, 바람직하게는 0.01 내지 40 질량부, 더욱 바람직하게는 1 내지 30 질량부, 특히 바람직하게는 1 내지 20 질량부이다. 수소 공여체의 함유량이 0.01 질량부 미만이면 감도의 개량 효과가 저하되는 경향이 있다. 한편, 40 질량부를 초과하면 형성된 착색층이 현상시에 기판으로부터 탈락하기 쉬워지는 경향이 있다. 또한, 다관능성 단량체와 단관능성 단량체를 병용하는 경우, 단관능성 단량체의 질량은 다관능성 단량체의 질량에 포함된다. In this invention, when using a hydrogen donor together with a biimidazole compound, content of a hydrogen donor becomes like this. Preferably it is 0.01-40 mass parts, More preferably 1-30, with respect to 100 mass parts of (D) polyfunctional monomers. It is mass parts, Especially preferably, it is 1-20 mass parts. When content of a hydrogen donor is less than 0.01 mass part, there exists a tendency for the improvement effect of a sensitivity to fall. On the other hand, when it exceeds 40 mass parts, there exists a tendency for the formed colored layer to fall off from a board | substrate at the time of image development. In addition, when using together a polyfunctional monomer and a monofunctional monomer, the mass of a monofunctional monomer is contained in the mass of a polyfunctional monomer.
또한, 아민계 수소 공여체는 아세토페논계 화합물 등의 비이미다졸 화합물 이외의 광중합 개시제와 병용하는 경우에는 증감제로서 기능할 수 있다. 아민계 수소 공여체를 증감제로서 사용하는 경우, 그 함유량은 비이미다졸 화합물 이외의 광중합 개시제 100 질량부에 대하여, 통상 300 질량부 이하, 바람직하게는 200 질량부 이하, 더욱 바람직하게는 100 질량부 이하이다. 또한, 이러한 함유량이 지나치게 적으면 충분한 효과가 얻기 어려워지기 때문에, 함유량의 하한을 바람직하게 는 2 질량부, 더욱 바람직하게는 5 질량부로 하는 것이 바람직하다. Moreover, an amine hydrogen donor can function as a sensitizer when it uses together with photoinitiators other than biimidazole compounds, such as an acetophenone type compound. When using an amine hydrogen donor as a sensitizer, the content is 300 mass parts or less normally, Preferably it is 200 mass parts or less, More preferably, 100 mass parts with respect to 100 mass parts of photoinitiators other than a biimidazole compound. It is as follows. In addition, when such content is too small, since sufficient effect will become difficult to be acquired, it is preferable to make a minimum of content into 2 mass parts, More preferably, 5 mass parts.
또한, 트리아진계 화합물의 구체예로는 2,4,6-트리스(트리클로로메틸)-s-트리아진, 2-메틸-4,6-비스(트리클로로메틸)-s-트리아진, 2-〔2-(5-메틸푸란-2-일)에테닐〕-4,6-비스(트리클로로메틸)-s-트리아진, 2-〔2-(푸란-2-일)에테닐〕-4,6-비스(트리클로로메틸)-s-트리아진, 2-〔2-(4-디에틸아미노-2-메틸페닐)에테닐〕-4,6-비스(트리클로로메틸)-s-트리아진, 2-〔2-(3,4-디메톡시페닐)에테닐〕-4,6-비스(트리클로로메틸)-s-트리아진, 2-(4-메톡시페닐)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(4-에톡시스티릴)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(4-n-부톡시페닐)-4,6-비스(트리클로로메틸)-s-트리아진 등의 할로메틸기를 갖는 트리아진계 화합물을 들 수 있다. In addition, specific examples of the triazine-based compound include 2,4,6-tris (trichloromethyl) -s-triazine, 2-methyl-4,6-bis (trichloromethyl) -s-triazine, 2- [2- (5-methylfuran-2-yl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine, 2- [2- (furan-2-yl) ethenyl] -4 , 6-bis (trichloromethyl) -s-triazine, 2- [2- (4-diethylamino-2-methylphenyl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine , 2- [2- (3,4-dimethoxyphenyl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine, 2- (4-methoxyphenyl) -4,6-bis (Trichloromethyl) -s-triazine, 2- (4-ethoxystyryl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-n-butoxyphenyl)- Triazine type compounds which have halomethyl groups, such as 4, 6-bis (trichloromethyl) -s-triazine, are mentioned.
이들 트리아진계 화합물 중, 특히 2-〔2-(3,4-디메톡시페닐)에테닐〕-4,6-비스(트리클로로메틸)-s-트리아진이 바람직하다. Among these triazine compounds, 2- [2- (3,4-dimethoxyphenyl) ethenyl] -4,6-bis (trichloromethyl) -s-triazine is particularly preferable.
트리아진계 화합물은 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. The triazine type compound can be used individually or in mixture of 2 or more types.
본 발명에 있어서, 광중합 개시제로서 트리아진계 화합물을 사용하는 경우, 그 함유량은 (D) 다관능성 단량체 100 질량부에 대하여, 바람직하게는 0.01 내지 40 질량부, 더욱 바람직하게는 1 내지 30 질량부, 특히 바람직하게는 1 내지 20 질량부이다. 트리아진계 화합물의 함유량이 0.01 질량부 미만이면 노광에 의한 경화가 불충분해지고, 착색층 패턴이 소정의 배열에 따라서 배치된 컬러 필터를 얻는 것이 곤란해질 우려가 있다. 한편, 40 질량부를 초과하면 형성된 착색층이 현상시에 기판으로부터 탈락하기 쉬워지는 경향이 있다. 또한, 다관능성 단량체와 단관 능성 단량체를 병용하는 경우, 단관능성 단량체의 질량은 다관능성 단량체의 질량에 포함된다. In the present invention, in the case of using a triazine-based compound as the photopolymerization initiator, the content thereof is preferably 0.01 to 40 parts by mass, more preferably 1 to 30 parts by mass, based on 100 parts by mass of the (D) polyfunctional monomer, Especially preferably, it is 1-20 mass parts. When content of a triazine type compound is less than 0.01 mass part, hardening by exposure may become inadequate and it may become difficult to obtain the color filter by which the colored layer pattern was arrange | positioned according to the predetermined | prescribed arrangement. On the other hand, when it exceeds 40 mass parts, there exists a tendency for the formed colored layer to fall off from a board | substrate at the time of image development. In addition, when using together a polyfunctional monomer and a monofunctional monomer, the mass of a monofunctional monomer is contained in the mass of a polyfunctional monomer.
또한, O-아실옥심계 화합물로는, 예를 들면 1,2-옥탄디온, 1-〔4-(페닐티오페닐〕-, 2-(O-벤조일옥심); 1-〔9-에틸-6-벤조일-9H-카르바졸-3-일〕-노난-1,2-노난-2-옥심-O-벤조에이트; 1-〔9-에틸-6-벤조일-9H-카르바졸-3-일〕-노난-1,2-노난-2-옥심-O-아세테이트; 1-〔9-에틸-6-벤조일-9H-카르바졸-3-일〕-펜탄-1,2-펜탄-2-옥심-O-아세테이트; 1-〔9-에틸-6-벤조일-9H-카르바졸-3-일〕-옥탄-1-온옥심-O-아세테이트; 1-〔9-에틸-6-(2-메틸벤조일)-9H-카르바졸-3-일〕-에탄-1-온옥심-O-벤조에이트; 1-〔9-에틸-6-(1,3,5-트리메틸벤조일)-9H-카르바졸-3-일〕-에탄-1-온옥심-O-벤조에이트; 1-〔9-부틸-6-(2-에틸벤조일)-9H-카르바졸-3-일〕-에탄-1-온옥심-O-벤조에이트; 에타논, 1-[9-에틸-6-(2-메틸벤조일)-9H-카르바졸-3-일]-, 1-(O-아세틸옥심); 에타논, 1-[9-에틸-6-[2-메틸-4-(2,2-디메틸-1,3-디옥솔라닐)메톡시벤조일]-9H-카르바졸-3-일]-, 1-(O-아세틸옥심) 등을 들 수 있다. As the O-acyl oxime compound, for example, 1,2-octanedione, 1- [4- (phenylthiophenyl]-, 2- (O-benzoyloxime); 1- [9-ethyl-6 -Benzoyl-9H-carbazol-3-yl] -nonane-1,2-nonan-2-oxime-O-benzoate; 1- [9-ethyl-6-benzoyl-9H-carbazol-3-yl] -Nonane-1,2-nonane-2-oxime-O-acetate; 1- [9-ethyl-6-benzoyl-9H-carbazol-3-yl] -pentane-1,2-pentane-2-oxime- O-acetate; 1- [9-ethyl-6-benzoyl-9H-carbazol-3-yl] -octan-1-one oxime-O-acetate; 1- [9-ethyl-6- (2-methylbenzoyl ) -9H-carbazol-3-yl] -ethane-1-one oxime-O-benzoate; 1- [9-ethyl-6- (1,3,5-trimethylbenzoyl) -9H-carbazole-3 -Yl] -ethane-1-one oxime-O-benzoate; 1- [9-butyl-6- (2-ethylbenzoyl) -9H-carbazol-3-yl] -ethane-1-one oxime-O -Benzoate; ethanone, 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl]-, 1- (O-acetyloxime); ethanone, 1- [9 -Ethyl-6- [2-methyl-4- (2,2-dimethyl-1,3-dioxolanyl) methoxybenzoyl ] -9H-carbazol-3-yl]-, 1- (O-acetyloxime), etc. are mentioned.
이들 O-아실옥심계 화합물 중, 특히 1,2-옥탄디온, 1-〔4-(페닐티오페닐〕-, 2-(O-벤조일옥심); 에타논, 1-[9-에틸-6-(2-메틸벤조일)-9H-카르바졸-3-일]-, 1 -(O-아세틸옥심); 에타논, 1-[9-에틸-6-[2-메틸-4-(2,2-디메틸-1,3-디옥솔라닐)메톡시벤조일]-9H-카르바졸-3-일]-, 1-(O-아세틸옥심) 등이 바람직하다. Among these O-acyl oxime compounds, especially 1,2-octanedione, 1- [4- (phenylthiophenyl]-, 2- (O-benzoyloxime); ethanone, 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl]-, 1-(O-acetyloxime); ethanone, 1- [9-ethyl-6- [2-methyl-4- (2,2 -Dimethyl-1,3-dioxolanyl) methoxybenzoyl] -9H-carbazol-3-yl]-, 1- (O-acetyloxime) and the like are preferable.
O-아실옥심계 화합물은 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다.O-acyl oxime type compounds can be used individually or in mixture of 2 or more types.
본 발명에 있어서, 광중합 개시제로서 O-아실옥심계 화합물을 사용하는 경우, 그 함유량은 (D) 다관능성 단량체 100 질량부에 대하여, 바람직하게는 0.01 내 지 60 질량부, 더욱 바람직하게는 1 내지 50 질량부, 특히 바람직하게는 1 내지 40 질량부이다. O-아실옥심계 화합물의 함유량이 0.01 질량부 미만이면 노광에 의한 경화가 불충분해지고, 착색층 패턴이 소정의 배열에 따라서 배치된 컬러 필터를 얻는 것이 곤란해질 우려가 있다. 한편, 60 질량부를 초과하면 형성된 착색층이 현상시에 기판으로부터 탈락하기 쉬워지는 경향이 있다. 또한, 다관능성 단량체와 단관능성 단량체를 병용하는 경우, 단관능성 단량체의 질량은 다관능성 단량체의 질량에 포함된다. In the present invention, in the case of using an O-acyl oxime compound as the photopolymerization initiator, the content thereof is preferably 0.01 to 60 parts by mass, more preferably 1 to 1 to 100 parts by mass of the (D) polyfunctional monomer. 50 parts by mass, particularly preferably 1 to 40 parts by mass. When content of an O-acyl oxime type compound is less than 0.01 mass part, hardening by exposure may become inadequate and it may become difficult to obtain the color filter by which the colored layer pattern was arrange | positioned according to the predetermined | prescribed arrangement. On the other hand, when it exceeds 60 mass parts, there exists a tendency for the formed colored layer to fall off from a board | substrate at the time of image development. In addition, when using together a polyfunctional monomer and a monofunctional monomer, the mass of a monofunctional monomer is contained in the mass of a polyfunctional monomer.
크산톤계 화합물로는, 예를 들면 크산톤; 티오크산톤, 2,4-디에틸티오크산톤, 2-클로로티오크산톤 등의 티오크산톤류를 들 수 있다. As a xanthone type compound, For example, Xanthone; Thioxanthones, such as thioxanthone, 2, 4- diethyl thioxanthone, and 2-chloro thioxanthone, are mentioned.
본 발명에 있어서, 광중합 개시제로서 크산톤계 화합물을 사용하는 경우, 그 함유량은, (D) 다관능성 단량체 100 질량부에 대하여, 바람직하게는 0.01 내지 50 질량부, 더욱 바람직하게는 1 내지 40 질량부, 특히 바람직하게는 1 내지 30 질량부이다. 크산톤계 화합물의 함유량이 0.01 질량부 미만이면 노광에 의한 경화가 불충분해지고, 착색층 패턴이 소정의 배열에 따라서 배치된 컬러 필터를 얻는 것이 곤란해질 우려가 있다. 한편, 50 질량부를 초과하면 형성된 착색층이 현상시에 기판으로부터 탈락하기 쉬워지는 경향이 있다. 또한, 다관능성 단량체와 단관능성 단량체를 병용하는 경우, 단관능성 단량체의 질량은 다관능성 단량체의 질량에 포함된다. In this invention, when using a xanthone type compound as a photoinitiator, its content becomes like this. Preferably it is 0.01-50 mass parts, More preferably, 1-40 mass parts with respect to 100 mass parts of (D) polyfunctional monomers. Especially preferably, it is 1-30 mass parts. When content of a xanthone type compound is less than 0.01 mass part, hardening by exposure may become inadequate and it may become difficult to obtain the color filter by which the colored layer pattern was arrange | positioned according to the predetermined | prescribed arrangement. On the other hand, when it exceeds 50 mass parts, there exists a tendency for the formed colored layer to fall off from a board | substrate at the time of image development. In addition, when using together a polyfunctional monomer and a monofunctional monomer, the mass of a monofunctional monomer is contained in the mass of a polyfunctional monomer.
-(F) 옥세타닐기를 갖는 반복 단위의 함유량이 70 질량% 이상인 중합체--Polymer whose content of the repeating unit which has (F) oxetanyl group is 70 mass% or more-
본 발명에 있어서의 (F) 옥세타닐기를 갖는 반복 단위의 함유량이 70 질량% 이상인 중합체(이하, "중합체 (F)"라고도 함)는 후-베이킹 공정에 있어서 특정 분산제 및 (C) 알칼리 가용성 수지를 가교시킬 수 있는 성분이다. 또한, 가열됨으로써 중합체 (F) 단독으로 중합하여 가교 구조를 형성할 수 있다. The polymer (hereinafter, also referred to as "polymer (F)") having a content of a repeating unit having a (F) oxetanyl group in the present invention (hereinafter, also referred to as "polymer (F)") is a specific dispersant and (C) alkali-soluble in a post-baking step. It is a component which can bridge | crosslink resin. In addition, by heating, the polymer (F) alone can be polymerized to form a crosslinked structure.
중합체 (F)는 낮은 후-베이킹 온도에서도 우수한 내용제성과 밀착성을 갖는 착색층을 얻는다는 점에서, 옥세타닐기를 갖는 반복 단위의 함유량이 90 질량% 이상인 것이 바람직하고, 95 질량% 이상인 것이 특히 바람직하다. 여기서 옥세타닐기를 갖는 반복 단위의 함유량이란, 중합체 (F)를 구성하는 모든 반복 단위의 합계 질량을 기준으로 한 값을 말한다, In view of obtaining a colored layer having excellent solvent resistance and adhesion even at a low post-baking temperature, the polymer (F) preferably has a content of a repeating unit having an oxetanyl group of 90% by mass or more, particularly 95% by mass or more. desirable. Content of the repeating unit which has an oxetanyl group means here the value based on the total mass of all the repeating units which comprise a polymer (F),
옥세타닐기를 갖는 반복 단위를 제공하는 단량체로는, 옥세타닐기를 갖는 불포화 화합물이면 특별히 한정되지 않지만, 예를 들면 하기의 것이 예시된다. As a monomer which provides the repeating unit which has an oxetanyl group, if it is an unsaturated compound which has an oxetanyl group, it will not specifically limit, For example, the following are illustrated.
3-〔(메트)아크릴로일옥시메틸〕옥세탄, 3-〔2-(메트)아크릴로일옥시에틸〕옥세탄, 2-〔(메트)아크릴로일옥시메틸〕옥세탄, 2-〔2-(메트)아크릴로일옥시에틸〕옥세탄 등의 (메트)아크릴로일옥시알킬옥세탄; 3-[(meth) acryloyloxymethyl] oxetane, 3- [2- (meth) acryloyloxyethyl] oxetane, 2-[(meth) acryloyloxymethyl] oxetane, 2- [ (Meth) acryloyloxyalkyloxetanes, such as 2- (meth) acryloyloxyethyl] oxetane;
3-〔(메트)아크릴로일옥시메틸〕-2-메틸옥세탄, 3-〔(메트)아크릴로일옥시메틸〕-3-메틸옥세탄, 3-〔(메트)아크릴로일옥시메틸〕-2-에틸옥세탄, 3-〔(메트)아크릴로일옥시메틸〕-3-에틸옥세탄, 3-〔2-(메트)아크릴로일옥시에틸〕-2-메틸옥세탄, 3-〔2-(메트)아크릴로일옥시에틸〕-3-메틸옥세탄, 3-〔2-(메트)아크릴로일옥시에틸〕-2-에틸옥세탄, 3-〔2-(메트)아크릴로일옥시에틸〕-3-에틸옥세탄, 2-〔(메트)아크릴로일옥시메틸〕-2-메틸옥세탄, 2-〔(메트)아크릴로일옥시메틸〕-3-메틸옥세탄, 2-〔(메트)아크릴로일옥시메틸〕-4-메틸옥세탄, 2-〔(메트)아크릴로일옥시메 틸〕-2-에틸옥세탄, 2-〔(메트)아크릴로일옥시메틸〕-3-에틸옥세탄, 2-〔(메트)아크릴로일옥시메틸〕-4-에틸옥세탄, 2-〔2-(메트)아크릴로일옥시에틸〕-2-메틸옥세탄, 2-〔2-(메트)아크릴로일옥시에틸〕-3-메틸옥세탄, 2-〔2-(메트)아크릴로일옥시에틸〕-4-메틸옥세탄, 2-〔2-(메트)아크릴로일옥시에틸〕-2-에틸옥세탄, 2-〔2-(메트)아크릴로일옥시에틸〕-3-에틸옥세탄, 2-〔2-(메트)아크릴로일옥시에틸〕-4-에틸옥세탄 등의〔(메트)아크릴로일옥시알킬〕알킬옥세탄; 3-[(meth) acryloyloxymethyl] -2-methyloxetane, 3-[(meth) acryloyloxymethyl] -3-methyloxetane, 3-[(meth) acryloyloxymethyl] 2-ethyloxetane, 3-[(meth) acryloyloxymethyl] -3-ethyloxetane, 3- [2- (meth) acryloyloxyethyl] -2-methyloxetane, 3- [ 2- (meth) acryloyloxyethyl] -3-methyloxetane, 3- [2- (meth) acryloyloxyethyl] -2-ethyloxetane, 3- [2- (meth) acryloyl Oxyethyl] -3-ethyloxetane, 2-[(meth) acryloyloxymethyl] -2-methyloxetane, 2-[(meth) acryloyloxymethyl] -3-methyloxetane, 2- [(Meth) acryloyloxymethyl] -4-methyloxetane, 2-[(meth) acryloyloxymethyl] -2-ethyloxetane, 2-[(meth) acryloyloxymethyl]- 3-ethyloxetane, 2-[(meth) acryloyloxymethyl] -4-ethyloxetane, 2- [2- (meth) acryloyloxyethyl] -2-methyloxetane, 2- [2 -(Meth) acryloyloxyethyl -3-methyloxetane, 2- [2- (meth) acryloyloxyethyl] -4-methyloxetane, 2- [2- (meth) acryloyloxyethyl] -2-ethyloxetane, 2 [(Meth) acryloyloxy such as [2- (meth) acryloyloxyethyl] -3-ethyl oxetane and 2- [2- (meth) acryloyloxyethyl] -4-ethyl oxetane Alkyl] alkyloxetane;
3-〔(메트)아크릴로일옥시메틸〕-2-트리플루오로메틸옥세탄, 3-〔(메트)아크릴로일옥시메틸〕-2-펜타플루오로에틸옥세탄, 3-〔(메트)아크릴로일옥시메틸〕-2-페닐옥세탄, 3-〔(메트)아크릴로일옥시메틸〕-2,2-디플루오로옥세탄, 3-〔(메트)아크릴로일옥시메틸〕-2,2,4-트리플루오로옥세탄, 3-〔(메트)아크릴로일옥시메틸〕-2,2,4,4-테트라플루오로옥세탄, 3-〔2-(메트)아크릴로일옥시에틸〕-2-트리플루오로메틸옥세탄, 3-〔2-(메트)아크릴로일옥시에틸〕-2-펜타플루오로에틸옥세탄, 3-〔2-(메트)아크릴로일옥시에틸〕-2-페닐옥세탄, 3-〔2-(메트)아크릴로일옥시에틸〕-2,2-디플루오로옥세탄, 3-〔2-(메트)아크릴로일옥시에틸〕-2,2,4-트리플루오로옥세탄, 3-〔2-(메트)아크릴로일옥시에틸〕-2,2,4,4-테트라플루오로옥세탄, 2-〔(메트)아크릴로일옥시메틸〕-2-트리플루오로메틸옥세탄, 2-〔(메트)아크릴로일옥시메틸〕-3-트리플루오로메틸옥세탄, 2-〔(메트)아크릴로일옥시메틸〕-4-트리플루오로메틸옥세탄, 2-〔(메트)아크릴로일옥시메틸〕-2-펜타플루오로에틸옥세탄, 2-〔(메트)아크릴로일옥시메틸〕-3-펜타플루오로에틸옥세탄, 2-〔(메트)아크릴로일옥시메틸〕-4-펜타플루오로에틸옥세탄, 3-[(meth) acryloyloxymethyl] -2-trifluoromethyloxetane, 3-[(meth) acryloyloxymethyl] -2-pentafluoroethyloxetane, 3-[(meth) Acryloyloxymethyl] -2-phenyloxetane, 3-[(meth) acryloyloxymethyl] -2,2-difluorooxetane, 3-[(meth) acryloyloxymethyl] -2 , 2,4-trifluorooxetane, 3-[(meth) acryloyloxymethyl] -2,2,4,4-tetrafluorooxetane, 3- [2- (meth) acryloyloxy Ethyl] -2-trifluoromethyloxetane, 3- [2- (meth) acryloyloxyethyl] -2-pentafluoroethyl oxetane, 3- [2- (meth) acryloyloxyethyl] 2-phenyloxetane, 3- [2- (meth) acryloyloxyethyl] -2,2-difluorooxetane, 3- [2- (meth) acryloyloxyethyl] -2,2 , 4-trifluorooxetane, 3- [2- (meth) acryloyloxyethyl] -2,2,4,4-tetrafluorooxetane, 2-[(meth) acryloyloxymethyl] 2-trifluoro Methyl oxetane, 2-[(meth) acryloyloxymethyl] -3-trifluoromethyl oxetane, 2-[(meth) acryloyloxymethyl] -4-trifluoromethyl oxetane, 2- [(Meth) acryloyloxymethyl] -2-pentafluoroethyl oxetane, 2- [(meth) acryloyloxymethyl] -3-pentafluoroethyl oxetane, 2- [(meth) acrylo Iloxymethyl] -4-pentafluoroethyl oxetane,
2-〔(메트)아크릴로일옥시메틸〕-2,3-디플루오로옥세탄, 2-〔(메트)아크릴로일옥시메틸〕-2,4-디플루오로옥세탄, 2-〔(메트)아크릴로일옥시메틸〕-3,3-디플루오로옥세탄, 2-〔(메트)아크릴로일옥시메틸〕-3,4-디플루오로옥세탄, 2-〔(메트)아크릴로일옥시메틸〕-4,4-디플루오로옥세탄, 2-〔(메트)아크릴로일옥시메틸〕-3,3,4-트리플루오로옥세탄, 2-〔(메트)아크릴로일옥시메틸〕-3,4,4-트리플루오로옥세탄, 2-〔(메트)아크릴로일옥시메틸〕-3,3,4,4-테트라플루오로옥세탄, 2-〔2-(메트)아크릴로일옥시에틸〕-2-트리플루오로메틸옥세탄, 2-〔2-(메트)아크릴로일옥시에틸〕-3-트리플루오로메틸옥세탄, 2-〔2-(메트)아크릴로일옥시에틸〕-4-트리플루오로메틸옥세탄, 2-〔2-(메트)아크릴로일옥시에틸〕-2-펜타플루오로에틸옥세탄, 2-〔2-(메트)아크릴로일옥시에틸〕-3-펜타플루오로에틸옥세탄, 2-〔2-(메트)아크릴로일옥시에틸〕-4-펜타플루오로에틸옥세탄, 2-〔2-(메트)아크릴로일옥시에틸〕-2,3-디플루오로옥세탄, 2-〔2-(메트)아크릴로일옥시에틸〕-2,4-디플루오로옥세탄, 2-〔2-(메트)아크릴로일옥시에틸〕-3,3-디플루오로옥세탄, 2-〔2-(메트)아크릴로일옥시에틸〕-3,4-디플루오로옥세탄, 2-〔2-(메트)아크릴로일옥시에틸〕-4,4-디플루오로옥세탄, 2-〔2-(메트)아크릴로일옥시에틸〕-3,3,4-트리플루오로옥세탄, 2-〔2-(메트)아크릴로일옥시에틸〕-3,4,4-트리플루오로옥세탄, 2-〔2-(메트)아크릴로일옥시에틸〕-3,3,4,4-테트라플루오로옥세탄 등의 〔(메트)아크릴로일옥시알킬〕플루오로옥세탄; 2-[(meth) acryloyloxymethyl] -2,3-difluorooxetane, 2-[(meth) acryloyloxymethyl] -2,4-difluorooxetane, 2-[( (Meth) acryloyloxymethyl] -3,3-difluorooxetane, 2-[(meth) acryloyloxymethyl] -3,4-difluorooxetane, 2-[(meth) acrylo Iloxymethyl] -4,4-difluorooxetane, 2-[(meth) acryloyloxymethyl] -3,3,4-trifluorooxetane, 2-[(meth) acryloyloxy Methyl] -3,4,4-trifluorooxetane, 2-[(meth) acryloyloxymethyl] -3,3,4,4-tetrafluorooxetane, 2- [2- (meth) Acryloyloxyethyl] -2-trifluoromethyloxetane, 2- [2- (meth) acryloyloxyethyl] -3-trifluoromethyloxetane, 2- [2- (meth) acrylo Iloxyethyl] -4-trifluoromethyloxetane, 2- [2- (meth) acryloyloxyethyl] -2-pentafluoroethyl oxetane, 2- [2- (meth) acryloyloxy Ethyl] -3-penta Fluoroethyl oxetane, 2- [2- (meth) acryloyloxyethyl] -4-pentafluoroethyl oxetane, 2- [2- (meth) acryloyloxyethyl] -2,3-di Fluorooxetane, 2- [2- (meth) acryloyloxyethyl] -2,4-difluorooxetane, 2- [2- (meth) acryloyloxyethyl] -3,3-di Fluorooxetane, 2- [2- (meth) acryloyloxyethyl] -3,4-difluorooxetane, 2- [2- (meth) acryloyloxyethyl] -4,4-di Fluorooxetane, 2- [2- (meth) acryloyloxyethyl] -3,3,4-trifluorooxetane, 2- [2- (meth) acryloyloxyethyl] -3,4 [(Meth) acryloyloxyalkyl] fluorine such as, 4-trifluorooxetane and 2- [2- (meth) acryloyloxyethyl] -3,3,4,4-tetrafluorooxetane Rooxetane;
2-〔(메트)아크릴로일옥시메틸〕-2-페닐옥세탄, 2-〔(메트)아크릴로일옥시메틸〕-3-페닐옥세탄, 2-〔(메트)아크릴로일옥시메틸〕-4-페닐옥세탄, 2-〔2-(메트) 아크릴로일옥시에틸〕-2-페닐옥세탄, 2-〔2-(메트)아크릴로일옥시에틸〕-3-페닐옥세탄, 2-〔2-(메트)아크릴로일옥시에틸〕-4-페닐옥세탄 등의〔(메트)아크릴로일옥시알킬〕페닐옥세탄 등의 (메트)아크릴산에스테르류; 2-[(meth) acryloyloxymethyl] -2-phenyloxetane, 2-[(meth) acryloyloxymethyl] -3-phenyloxetane, 2-[(meth) acryloyloxymethyl] 4-phenyloxetane, 2- [2- (meth) acryloyloxyethyl] -2-phenyloxetane, 2- [2- (meth) acryloyloxyethyl] -3-phenyloxetane, 2 (Meth) acrylic acid esters such as [(meth) acryloyloxyalkyl] phenyl oxetane such as [2- (meth) acryloyloxyethyl] -4-phenyloxetane;
4-[3-(3-에틸옥세탄-3-일메톡시)프로폭시]스티렌, 4-[4-(3-에틸옥세탄-3-일메톡시)부틸옥시]스티렌, 4-[5-(3-에틸옥세탄-3-일메톡시)펜틸옥시]스티렌, 4-[6-(3-에틸옥세탄-3-일메톡시)헥실옥시]스티렌, 4-[7-(3-에틸옥세탄-3-일메톡시)헵틸옥시]스티렌 등의 방향족 비닐류.4- [3- (3-ethyloxetan-3-ylmethoxy) propoxy] styrene, 4- [4- (3-ethyloxetan-3-ylmethoxy) butyloxy] styrene, 4- [5- ( 3-ethyloxetane-3-ylmethoxy) pentyloxy] styrene, 4- [6- (3-ethyloxetane-3-ylmethoxy) hexyloxy] styrene, 4- [7- (3-ethyloxetane Aromatic vinyls such as -3-ylmethoxy) heptyloxy] styrene.
또한, 상기한 "(메트)아크릴로일옥시알킬" 및 "알킬옥세탄"에 있어서의 알킬 부분의 탄소수는 1 내지 4가 바람직하다. Moreover, as for carbon number of the alkyl part in said "(meth) acryloyloxyalkyl" and "alkyloxetane", 1-4 are preferable.
이들 옥세타닐기를 갖는 불포화 화합물 중, 3-〔(메트)아크릴로일옥시메틸〕옥세탄, 3-〔(메트)아크릴로일옥시메틸〕-3-에틸옥세탄, 3-〔(메트)아크릴로일옥시메틸〕-2-트리플루오로메틸옥세탄, 3-〔(메트)아크릴로일옥시메틸〕-2-페닐옥세탄, 2-〔(메트)아크릴로일옥시메틸〕옥세탄, 2-〔(메트)아크릴로일옥시메틸〕-4-트리플루오로메틸옥세탄 등이 바람직하고, 특히 3-(메타크릴로일옥시메틸)옥세탄, 3-(메타크릴로일옥시메틸)-3-에틸옥세탄, 3-(메타크릴로일옥시메틸)-2-트리플루오로메틸옥세탄, 3-(메타크릴로일옥시메틸)-2-페닐옥세탄, 2-(메타크릴로일옥시메틸)옥세탄, 2-(메타크릴로일옥시메틸)-4-트리플루오로메틸옥세탄 등이 얻어지는 감방사선성 조성물의 현상 마진이 넓고, 또한 얻어지는 착색층의 내약품성을 높이는 점에서 바람직하다. Of the unsaturated compounds having these oxetanyl groups, 3-[(meth) acryloyloxymethyl] oxetane, 3-[(meth) acryloyloxymethyl] -3-ethyloxetane, 3-[(meth) Acryloyloxymethyl] -2-trifluoromethyloxetane, 3-[(meth) acryloyloxymethyl] -2-phenyloxetane, 2-[(meth) acryloyloxymethyl] oxetane, 2-[(meth) acryloyloxymethyl] -4-trifluoromethyloxetane and the like are preferable, and 3- (methacryloyloxymethyl) oxetane and 3- (methacryloyloxymethyl) are particularly preferred. 3-ethyl oxetane, 3- (methacryloyloxymethyl) -2-trifluoromethyloxetane, 3- (methacryloyloxymethyl) -2-phenyloxetane, 2- (methacrylo From the point that the developing margin of the radiation sensitive composition from which oxymethyl) oxetane, 2- (methacryloyloxymethyl) -4-trifluoromethyloxetane, etc. are obtained is wide, and the chemical-resistance of the colored layer obtained is improved. desirable.
또한, 본 발명에 있어서는 옥세타닐기를 갖는 불포화 화합물로서, 상기 이외 에도, 예를 들면 In addition, in this invention, as an unsaturated compound which has an oxetanyl group, besides the above, for example,
(3-옥세타닐메톡시)-p-비닐벤젠, 〔2-(3-옥세타닐)에톡시〕-p-비닐벤젠, (2-옥세타닐메톡시)-p-비닐벤젠, 〔2-(2-옥세타닐)에톡시〕-p-비닐벤젠 등의 비닐페놀의 (옥세타닐알킬)에테르류; (3-oxetanylmethoxy) -p-vinylbenzene, [2- (3-oxetanyl) ethoxy] -p-vinylbenzene, (2-oxetanylmethoxy) -p-vinylbenzene, [2- (Oxetanylalkyl) ethers of vinylphenol such as (2-oxetanyl) ethoxy] -p-vinylbenzene;
(3-옥세타닐메틸)비닐에테르, 〔2-(3-옥세타닐)에틸〕비닐에테르, (2-옥세타닐메틸)비닐에테르, 〔2-(2-옥세타닐)에틸〕비닐에테르 등의 (옥세타닐알킬)비닐에테르류 (3-oxetanylmethyl) vinyl ether, [2- (3-oxetanyl) ethyl] vinyl ether, (2-oxetanylmethyl) vinyl ether, [2- (2-oxetanyl) ethyl] vinyl (Oxetanylalkyl) vinyl ethers such as ether
등을 사용할 수도 있다. Etc. can also be used.
중합체 (F)에 있어서, 옥세타닐기를 갖는 불포화 화합물은 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. In a polymer (F), the unsaturated compound which has an oxetanyl group can be used individually or in mixture of 2 or more types.
중합체 (F)에 있어서는, 옥세타닐기를 갖는 불포화 화합물과 함께, 이것과 공중합 가능한 다른 불포화 화합물을 공중합시킬 수도 있다.In the polymer (F), the other unsaturated compound copolymerizable with this can be copolymerized with the unsaturated compound which has an oxetanyl group.
다른 불포화 화합물로는 (C) 알칼리 가용성 수지에 있어서 공중합성 불포화 단량체로서 예를 든 N-치환 말레이미드, 불포화 카르복실산에스테르, 불포화 카르복실산아미노알킬에스테르류, 불포화 카르복실산글리시딜에스테르류, 시안화비닐 화합물, 불포화 아미드류, 카르복실산비닐에스테르류, 불포화 에테르류, 지방족 공액 디엔류, 중합체 분자쇄의 말단에 모노(메트)아크릴로일기를 갖는 거대 단량체류나, As another unsaturated compound, N-substituted maleimide, unsaturated carboxylic acid ester, unsaturated carboxylic acid aminoalkyl ester, and unsaturated carboxylic acid glycidyl ester which were mentioned as a copolymerizable unsaturated monomer in (C) alkali-soluble resin , Vinyl cyanide compounds, unsaturated amides, carboxylic acid vinyl esters, unsaturated ethers, aliphatic conjugated dienes, macromonomers having a mono (meth) acryloyl group at the terminal of the polymer molecular chain,
스티렌, α-메틸스티렌, o-비닐톨루엔, m-비닐톨루엔, p-비닐톨루엔, p-클로로스티렌, o-메톡시스티렌, m-메톡시스티렌, p-메톡시스티렌, o-비닐벤질메틸에테 르, m-비닐벤질메틸에테르, p-비닐벤질메틸에테르, o-비닐벤질글리시딜에테르, m-비닐벤질글리시딜에테르, p-비닐벤질글리시딜에테르와 같은 방향족 비닐 화합물 등을 들 수 있다. Styrene, α-methylstyrene, o-vinyltoluene, m-vinyltoluene, p-vinyltoluene, p-chlorostyrene, o-methoxystyrene, m-methoxystyrene, p-methoxystyrene, o-vinylbenzylmethyl Aromatic vinyl compounds such as ether, m-vinyl benzyl methyl ether, p-vinyl benzyl methyl ether, o-vinyl benzyl glycidyl ether, m-vinyl benzyl glycidyl ether, and p-vinyl benzyl glycidyl ether Can be mentioned.
본 발명에 있어서의 중합체 (F)의 Mw는, 바람직하게는 2,000 내지 50,000, 특히 바람직하게는 2,000 내지 30,000이다. Mw of the polymer (F) in this invention becomes like this. Preferably it is 2,000-50,000, Especially preferably, it is 2,000-30,000.
또한, 본 발명에 있어서의 중합체 (F)의 Mw와 Mn과의 비(Mw/Mn)는, 바람직하게는 1.0 내지 2.5, 특히 바람직하게는 1.0 내지 2.0이다. Moreover, ratio (Mw / Mn) of Mw and Mn of the polymer (F) in this invention becomes like this. Preferably it is 1.0-2.5, Especially preferably, it is 1.0-2.0.
본 발명에 있어서는, 이러한 특정한 Mw 및/또는 Mw/Mn을 갖는 중합체 (F)를 사용함으로써, 얻어지는 감방사선성 조성물의 내용제성이나 기판과의 밀착성을 보다 높일 수 있다.In this invention, by using the polymer (F) which has such specific Mw and / or Mw / Mn, the solvent resistance of the radiation sensitive composition obtained and adhesiveness with a board | substrate can be improved more.
본 발명에 있어서의 중합체 (F)는, 예를 들면 옥세타닐기를 갖는 불포화 화합물을 적당한 용매 중, 2,2'-아조비스이소부티로니트릴, 2,2'-아조비스(2,4-디메틸발레로니트릴), 2,2'-아조비스(4-메톡시-2,4-디메틸발레로니트릴), 4,4'-아조비스(4-시아노프로피온산), 4,4'-아조비스(4-시아노부틸산), 4,4'-아조비스(4-시아노발레르산), 4,4'-아조비스(4-시아노에틸벤조산), 4,4'-아조비스(4-시아노에틸시클로헥산카르복실산) 등의 라디칼 중합 개시제의 존재하에 중합함으로써 제조할 수 있다. The polymer (F) in the present invention is, for example, an unsaturated compound having an oxetanyl group in 2,2'-azobisisobutyronitrile, 2,2'-azobis (2,4-) in a suitable solvent. Dimethylvaleronitrile), 2,2'-azobis (4-methoxy-2,4-dimethylvaleronitrile), 4,4'-azobis (4-cyanopropionic acid), 4,4'-azo Bis (4-cyanobutyl acid), 4,4'-azobis (4-cyanovaleric acid), 4,4'-azobis (4-cyanoethylbenzoic acid), 4,4'-azobis ( It can manufacture by polymerizing in presence of radical polymerization initiators, such as 4-cyanoethyl cyclohexanecarboxylic acid).
또한, Mw/Mn을 상기 범위로 제어하는 의미에 있어서, 본 발명에 있어서의 중합체 (F)로는 옥세타닐기를 갖는 불포화 화합물을 상기 라디칼 중합 개시제, 및 연쇄 이동제로서 작용하는 다가 티올 화합물의 존재하에 적당한 용매 중에서 라디칼 중합함으로써 제조된 것이 바람직하다. 여기서 본 명세서에 있어서 다가 티올 화합물이란, 1 분자 중에 2개 이상의 티올기를 갖는 화합물을 말하며, 예를 들면 트리메틸올프로판트리스(3-메르캅토프로피오네이트), 펜타에리트리톨테트라키스(3-메르캅토프로피오네이트), 테트라에틸렌글리콜비스(3-메르캅토프로피오네이트), 디펜타에리트리톨헥사키스(3-메르캅토프로피오네이트), 펜타에리트리톨테트라키스(티오글리콜레이트), 1,4-비스(3-메르캅토부티릴옥시)부탄, 펜타에리트리톨테트라키스(3-메르캅토부티레이트), 1,3,5-트리스(3-메르캅토부틸옥시에틸)-1,3,5-트리아진-2,4,6(1H,3H,5H)-트리온 등을 들 수 있다. In addition, in the meaning which controls Mw / Mn in the said range, as a polymer (F) in this invention, the unsaturated compound which has an oxetanyl group in presence of the said radical polymerization initiator and the polyhydric thiol compound which acts as a chain transfer agent is mentioned. Preference is given to those prepared by radical polymerization in a suitable solvent. Here, in this specification, a polyvalent thiol compound means the compound which has two or more thiol groups in 1 molecule, For example, trimethylol propane tris (3-mercapto propionate) and pentaerythritol tetrakis (3- mercapto Propionate), tetraethylene glycol bis (3-mercaptopropionate), dipentaerythritol hexakis (3-mercaptopropionate), pentaerythritol tetrakis (thioglycolate), 1,4- Bis (3-mercaptobutyryloxy) butane, pentaerythritol tetrakis (3-mercaptobutyrate), 1,3,5-tris (3-mercaptobutyloxyethyl) -1,3,5-triazine -2,4,6 (1H, 3H, 5H) -trione etc. are mentioned.
중합체 (F)를 중합에 의해 합성할 때의 다가 티올 화합물의 사용량은 옥세타닐기를 갖는 불포화 화합물 100 질량부에 대하여, 통상 0.5 내지 20 질량부, 바람직하게는 1 내지 10 질량부이다. 라디칼 중합 개시제의 사용량은 상기 불포화 화합물 100 질량부에 대하여, 통상 0.1 내지 50 질량부, 바람직하게는 0.1 내지 20 질량부이다. The use amount of the polyvalent thiol compound at the time of synthesize | combining a polymer (F) by superposition | polymerization is 0.5-20 mass parts normally with respect to 100 mass parts of unsaturated compounds which have an oxetanyl group, Preferably it is 1-10 mass parts. The usage-amount of a radical polymerization initiator is 0.1-50 mass parts normally with respect to 100 mass parts of said unsaturated compounds, Preferably it is 0.1-20 mass parts.
또한, 중합 온도는, 통상 0 내지 150 ℃, 바람직하게는 50 내지 120 ℃이다. 중합 시간은, 통상 10 분 내지 20 시간, 바람직하게는 30 분 내지 6 시간이다. Moreover, polymerization temperature is 0-150 degreeC normally, Preferably it is 50-120 degreeC. The polymerization time is usually 10 minutes to 20 hours, preferably 30 minutes to 6 hours.
본 발명에 있어서는, 중합체 (F)를 중합에 의해 합성할 때, 다가 티올 화합물 이외의 연쇄 이동제, 예를 들면 t-도데실메르캅탄, 2,4-디페닐-4-메틸-1-펜텐 등의 1종 이상을, 연쇄 이동제의 전체 질량에 대하여, 통상 90 질량% 이하, 바람직하게는 60 질량% 이하의 양으로 병용할 수도 있다.In this invention, when synthesize | combining a polymer (F) by superposition | polymerization, chain transfer agents other than a polyvalent thiol compound, for example, t-dodecyl mercaptan, 2, 4- diphenyl-4- methyl-1- pentene, etc. 1 or more types of can also be used together in the quantity of 90 mass% or less normally, Preferably it is 60 mass% or less with respect to the total mass of a chain transfer agent.
본 발명에 있어서의 중합체 (F)의 함유량은, (C) 알칼리 가용성 수지 100 질 량부(고형분 환산)에 대하여, 통상 1 내지 400 질량부, 바람직하게는 3 내지 200 질량부, 특히 바람직하게는 5 내지 100 질량부이다. 상기 함유량이 1 질량부 미만이면 원하는 효과가 얻기 어려워지는 경향이 있다. 또한, 400 질량부를 초과하면 현저히 현상성이 소실되는 경향이 있다. Content of the polymer (F) in this invention is 1-400 mass parts normally with respect to 100 mass parts (solid content conversion) of (C) alkali-soluble resin, Preferably it is 3-200 mass parts, Especially preferably, 5 To 100 parts by mass. It exists in the tendency for a desired effect to become difficult to be acquired that the said content is less than 1 mass part. Moreover, when it exceeds 400 mass parts, there exists a tendency for the developability to disappear remarkably.
-첨가제--additive-
본 발명의 감방사선성 조성물은, 필요에 따라서 여러 가지 첨가제를 함유할 수도 있다. The radiation sensitive composition of this invention may contain various additives as needed.
첨가제로는, 예를 들면 유기산 또는 유기 아미노 화합물(단, 상기 수소 공여체는 제외함), 경화제, 경화 보조제 등을 들 수 있다. As an additive, an organic acid or an organic amino compound (however, the said hydrogen donor is excluded), a hardening | curing agent, a hardening adjuvant, etc. are mentioned, for example.
유기산 및 유기 아미노 화합물은 감방사선성 조성물의 알칼리 현상액에 대한 용해성을 보다 개선하고, 현상 후의 미용해물의 잔존을 보다 억제하는 작용 등을 나타내는 성분이다. An organic acid and an organic amino compound are components which show the effect which further improves the solubility to the alkali developing solution of a radiation sensitive composition, and suppresses the remainder of the undissolved matter after image development.
유기산으로는 분자 중에 1개 이상의 카르복실기를 갖는 지방족 카르복실산 또는 페닐기 함유 카르복실산이 바람직하다. As an organic acid, the aliphatic carboxylic acid or phenyl group containing carboxylic acid which has 1 or more carboxyl group in a molecule is preferable.
지방족 카르복실산으로는, 예를 들면 As aliphatic carboxylic acid, for example
포름산, 아세트산, 프로피온산, 부티르산, 발레르산, 피발산, 카프로산, 디에틸아세트산, 에난트산, 카프릴산 등의 모노카르복실산류; Monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, pivalic acid, caproic acid, diethyl acetic acid, enanthic acid and caprylic acid;
옥살산, 말론산, 숙신산, 글루타르산, 아디프산, 피멜산, 수베르산, 아젤라산, 세박산, 브라실산, 메틸말론산, 에틸말론산, 디메틸말론산, 메틸숙신산, 테트라메틸숙신산, 시클로헥산디카르복실산, 이타콘산, 시트라콘산, 말레산, 푸마르산, 메사콘산 등의 디카르복실산류; Oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, brasilic acid, methylmalonic acid, ethylmalonic acid, dimethylmalonic acid, methylsuccinic acid, tetramethylsuccinic acid, Dicarboxylic acids such as cyclohexanedicarboxylic acid, itaconic acid, citraconic acid, maleic acid, fumaric acid and mesaconic acid;
트리카르발릴산, 아코니트산, 캄포론산 등의 트리카르복실산류 Tricarboxylic acids, such as tricarvalic acid, aconitic acid, and camphoronic acid
등을 들 수 있다. Etc. can be mentioned.
또한, 페닐기 함유 카르복실산으로는, 예를 들면 카르복실기가 직접 페닐기에 결합한 화합물, 카르복실기가 탄소쇄를 통해 페닐기에 결합한 카르복실산 등을 들 수 있다. Moreover, as a phenyl group containing carboxylic acid, the compound which the carboxyl group couple | bonded with the phenyl group directly, the carboxylic acid which the carboxyl group couple | bonded with the phenyl group through a carbon chain, etc. are mentioned, for example.
페닐기 함유 카르복실산으로는, 예를 들면 As a phenyl group containing carboxylic acid, for example
벤조산, 톨루엔산, 쿠민산, 헤멜리트산, 메시틸렌산 등의 방향족 모노카르복실산류; Aromatic monocarboxylic acids such as benzoic acid, toluic acid, cuminic acid, hemelic acid and mesitylene acid;
프탈산, 이소프탈산, 테레프탈산, 신나밀리덴말론산 등의 방향족 디카르복실산류; Aromatic dicarboxylic acids such as phthalic acid, isophthalic acid, terephthalic acid and cinnamildenmalonic acid;
트리멜리트산, 트리메스산, 멜로판산, 피로멜리트산 등의 3가 이상의 방향족 폴리카르복실산류나, Trivalent or higher aromatic polycarboxylic acids such as trimellitic acid, trimesic acid, melanoic acid and pyromellitic acid;
페닐아세트산, 히드로아트로프산, 히드로신남산, 만델산, 페닐숙신산, 아트로프산, 신남산, 신나밀리덴아세트산, 쿠마르산, 움벨산 Phenylacetic acid, hydroatroic acid, hydrocinnamic acid, mandelic acid, phenylsuccinic acid, atroic acid, cinnamic acid, cinnamylidene acetic acid, kumaric acid, umbelic acid
등을 들 수 있다.Etc. can be mentioned.
이들 유기산 중, 알칼리 용해성, 후술하는 용매에 대한 용해성, 미노광부의 기판 상 또는 차광층 상에서의 바탕 오염이나 막 잔여물의 방지 등의 관점에서, 지방족 카르복실산으로는 지방족 디카르복실산류가 바람직하고, 특히 말론산, 아디프산, 이타콘산, 시트라콘산, 푸마르산, 메사콘산 등이 바람직하다. 또한, 페닐기 함유 카르복실산으로는 방향족 디카르복실산류가 바람직하고, 특히 프탈산이 바람직하다. Among these organic acids, aliphatic dicarboxylic acids are preferable as the aliphatic carboxylic acid from the viewpoint of alkali solubility, solubility in a solvent to be described later, prevention of background contamination on the substrate or the light shielding layer of the unexposed portion, and film residue. In particular, malonic acid, adipic acid, itaconic acid, citraconic acid, fumaric acid, mesaconic acid and the like are preferable. Moreover, as a phenyl group containing carboxylic acid, aromatic dicarboxylic acids are preferable and phthalic acid is especially preferable.
유기산은 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. An organic acid can be used individually or in mixture of 2 or more types.
유기산의 함유량은 감방사선성 조성물의 고형분 전체에 대하여, 통상 15 질량% 이하, 바람직하게는 10 질량% 이하이다. 유기산의 함유량이 15 질량%를 초과하면 형성된 착색층의 기판에 대한 밀착성이 저하되는 경향이 있다. Content of an organic acid is 15 mass% or less normally with respect to the whole solid content of a radiation sensitive composition, Preferably it is 10 mass% or less. When content of an organic acid exceeds 15 mass%, there exists a tendency for adhesiveness with respect to the board | substrate of the formed colored layer to fall.
또한, 유기 아미노 화합물로는 분자 중에 1개 이상의 아미노기를 갖는 지방족 아민 또는 페닐기 함유 아민이 바람직하다. As the organic amino compound, an aliphatic amine or a phenyl group-containing amine having one or more amino groups in the molecule is preferable.
지방족 아민으로는, 예를 들면 하기의 것이 예시된다. As an aliphatic amine, the following are illustrated, for example.
n-프로필아민, i-프로필아민, n-부틸아민, i-부틸아민, sec-부틸아민, t-부틸아민, n-펜틸아민, n-헥실아민, n-헵틸아민, n-옥틸아민, n-노닐아민, n-데실아민, n-운데실아민, n-도데실아민, 시클로헥실아민, 2-메틸시클로헥실아민, 3-메틸시클로헥실아민, 4-메틸시클로헥실아민, 2-에틸시클로헥실아민, 3-에틸시클로헥실아민, 4-에틸시클로헥실아민 등의 모노(시클로)알킬아민류; n-propylamine, i-propylamine, n-butylamine, i-butylamine, sec-butylamine, t-butylamine, n-pentylamine, n-hexylamine, n-heptylamine, n-octylamine, n-nonylamine, n-decylamine, n-undecylamine, n-dodecylamine, cyclohexylamine, 2-methylcyclohexylamine, 3-methylcyclohexylamine, 4-methylcyclohexylamine, 2-ethyl Mono (cyclo) alkylamines such as cyclohexylamine, 3-ethylcyclohexylamine and 4-ethylcyclohexylamine;
메틸에틸아민, 디에틸아민, 메틸 n-프로필아민, 에틸 n-프로필아민, 디-n-프로필아민, 디-i-프로필아민, 디-n-부틸아민, 디-i-부틸아민, 디-sec-부틸아민, 디-t-부틸아민, 디-n-펜틸아민, 디-n-헥실아민, 메틸시클로헥실아민, 에틸시클로헥실아민, 디시클로헥실아민 등의 디(시클로)알킬아민류; Methylethylamine, diethylamine, methyl n-propylamine, ethyl n-propylamine, di-n-propylamine, di-i-propylamine, di-n-butylamine, di-i-butylamine, di- di (cyclo) alkylamines such as sec-butylamine, di-t-butylamine, di-n-pentylamine, di-n-hexylamine, methylcyclohexylamine, ethylcyclohexylamine and dicyclohexylamine;
디메틸에틸아민, 메틸디에틸아민, 트리에틸아민, 디메틸 n-프로필아민, 디에틸 n-프로필아민, 메틸디-n-프로필아민, 에틸디-n-프로필아민, 트리-n-프로필아민, 트리-i-프로필아민, 트리-n-부틸아민, 트리-i-부틸아민, 트리-sec-부틸아민, 트리-t-부틸아민, 트리-n-펜틸아민, 트리-n-헥실아민, 디메틸시클로헥실아민, 디에틸시클로헥실아민, 메틸디시클로헥실아민, 에틸디시클로헥실아민, 트리시클로헥실아민 등의 트리(시클로)알킬아민류;Dimethylethylamine, methyldiethylamine, triethylamine, dimethyl n-propylamine, diethyl n-propylamine, methyldi-n-propylamine, ethyldi-n-propylamine, tri-n-propylamine, tri -i-propylamine, tri-n-butylamine, tri-i-butylamine, tri-sec-butylamine, tri-t-butylamine, tri-n-pentylamine, tri-n-hexylamine, dimethylcyclo Tri (cyclo) alkylamines such as hexylamine, diethylcyclohexylamine, methyldicyclohexylamine, ethyldicyclohexylamine and tricyclohexylamine;
2-아미노에탄올, 3-아미노-1-프로판올, 1-아미노-2-프로판올, 4-아미노-1-부탄올, 5-아미노-1-펜탄올, 6-아미노-1-헥산올, 4-아미노-1-시클로헥산올 등의 모노(시클로)알칸올아민류; 2-aminoethanol, 3-amino-1-propanol, 1-amino-2-propanol, 4-amino-1-butanol, 5-amino-1-pentanol, 6-amino-1-hexanol, 4-amino Mono (cyclo) alkanolamines such as -1-cyclohexanol;
디에탄올아민, 디-n-프로판올아민, 디-i-프로판올아민, 디-n-부탄올아민, 디-i-부탄올아민, 디-n-펜탄올아민, 디-n-헥산올아민, 디(4-시클로헥산올)아민 등의 디(시클로)알칸올아민류; Diethanolamine, di-n-propanolamine, di-i-propanolamine, di-n-butanolamine, di-i-butanolamine, di-n-pentanolamine, di-n-hexanolamine, di ( Di (cyclo) alkanolamines such as 4-cyclohexanol) amine;
트리에탄올아민, 트리-n-프로판올아민, 트리-i-프로판올아민, 트리-n-부탄올아민, 트리-i-부탄올아민, 트리-n-펜탄올아민, 트리-n-헥산올아민, 트리(4-시클로헥산올)아민 등의 트리(시클로)알칸올아민류; Triethanolamine, tri-n-propanolamine, tri-i-propanolamine, tri-n-butanolamine, tri-i-butanolamine, tri-n-pentanolamine, tri-n-hexanolamine, tri (4 Tri (cyclo) alkanolamines such as -cyclohexanol) amine;
3-아미노-1,2-프로판디올, 2-아미노-1,3-프로판디올, 4-아미노-1,2-부탄디올, 4-아미노-1,3-부탄디올, 4-아미노-1,2-시클로헥산디올, 4-아미노-1,3-시클로헥산디올, 3-디메틸아미노-1,2-프로판디올, 3-디에틸아미노-1,2-프로판디올, 2-디메틸아미노-1,3-프로판디올, 2-디에틸아미노-1,3-프로판디올 등의 아미노 (시클로)알칸디올류; 3-amino-1,2-propanediol, 2-amino-1,3-propanediol, 4-amino-1,2-butanediol, 4-amino-1,3-butanediol, 4-amino-1,2- Cyclohexanediol, 4-amino-1,3-cyclohexanediol, 3-dimethylamino-1,2-propanediol, 3-diethylamino-1,2-propanediol, 2-dimethylamino-1,3- Amino (cyclo) alkanediols such as propanediol and 2-diethylamino-1,3-propanediol;
1-아미노시클로펜탄메탄올, 4-아미노시클로펜탄메탄올, 1-아미노시클로헥산메탄올, 4-아미노시클로헥산메탄올, 4-디메틸아미노시클로펜탄메탄올, 4-디에틸아 미노시클로펜탄메탄올, 4-디메틸아미노시클로헥산메탄올, 4-디에틸아미노시클로헥산메탄올 등의 아미노기 함유 시클로알칸메탄올류; 1-aminocyclopentanmethanol, 4-aminocyclopentanmethanol, 1-aminocyclohexanemethanol, 4-aminocyclohexanemethanol, 4-dimethylaminocyclopentanmethanol, 4-diethylaminocyclopentanmethanol, 4-dimethylamino Amino group-containing cycloalkanethanols such as cyclohexanemethanol and 4-diethylaminocyclohexanemethanol;
β-알라닌, 2-아미노부티르산, 3-아미노부티르산, 4-아미노부티르산, 2-아미노이소부티르산, 3-아미노이소부티르산, 2-아미노발레르산, 5-아미노발레르산, 6-아미노카프로산, 1-아미노시클로프로판카르복실산, 1-아미노시클로헥산카르복실산, 4-아미노시클로헥산카르복실산 등의 아미노카르복실산류. β-alanine, 2-aminobutyric acid, 3-aminobutyric acid, 4-aminobutyric acid, 2-aminoisobutyric acid, 3-aminoisobutyric acid, 2-aminovaleric acid, 5-aminovaleric acid, 6-aminocaproic acid, 1 Aminocarboxylic acids such as aminocyclopropanecarboxylic acid, 1-aminocyclohexanecarboxylic acid, and 4-aminocyclohexanecarboxylic acid.
또한, 페닐기 함유 아민으로는, 예를 들면 아미노기가 직접 페닐기에 결합한 화합물, 아미노기가 탄소쇄를 통해 페닐기에 결합한 화합물 등을 들 수 있다. Moreover, as a phenyl group containing amine, the compound which the amino group couple | bonded with the phenyl group directly, the compound which the amino group couple | bonded with the phenyl group through the carbon chain, etc. are mentioned, for example.
페닐기 함유 아민으로는, 예를 들면 As a phenyl group containing amine, it is, for example
아닐린, 2-메틸아닐린, 3-메틸아닐린, 4-메틸아닐린, 4-에틸아닐린, 4-n-프로필아닐린, 4-i-프로필아닐린, 4-n-부틸아닐린, 4-t-부틸아닐린, 1-나프틸아민, 2-나프틸아민, N,N-디메틸아닐린, N,N-디에틸아닐린, 4-메틸-N,N-디메틸아닐린 등의 방향족 아민류; Aniline, 2-methylaniline, 3-methylaniline, 4-methylaniline, 4-ethylaniline, 4-n-propylaniline, 4-i-propylaniline, 4-n-butylaniline, 4-t-butylaniline, Aromatic amines such as 1-naphthylamine, 2-naphthylamine, N, N-dimethylaniline, N, N-diethylaniline and 4-methyl-N, N-dimethylaniline;
2-아미노벤질알코올, 3-아미노벤질알코올, 4-아미노벤질알코올, 4-디메틸아미노벤질알코올, 4-디에틸아미노벤질알코올 등의 아미노벤질알코올류; Aminobenzyl alcohols such as 2-aminobenzyl alcohol, 3-aminobenzyl alcohol, 4-aminobenzyl alcohol, 4-dimethylaminobenzyl alcohol, and 4-diethylaminobenzyl alcohol;
2-아미노페놀, 3-아미노페놀, 4-아미노페놀, 4-디메틸아미노페놀, 4-디에틸아미노페놀 등의 아미노페놀류 Aminophenols such as 2-aminophenol, 3-aminophenol, 4-aminophenol, 4-dimethylaminophenol, and 4-diethylaminophenol
등을 들 수 있다. Etc. can be mentioned.
이들 유기 아미노 화합물 중, 후술하는 용매에 대한 용해성, 미노광부의 기판 상 또는 차광층 상에서의 바탕 오염이나 막 잔여물의 방지 등의 관점에서, 지방 족 아민으로는 모노(시클로)알칸올아민류, 아미노(시클로)알칸디올류가 바람직하고, 특히 2-아미노에탄올, 3-아미노-1-프로판올, 5-아미노-1-펜탄올, 3-아미노-1,2-프로판디올, 2-아미노-1,3-프로판디올, 4-아미노-1,2-부탄디올 등이 바람직하다. 또한, 페닐기 함유 아민으로는 아미노페놀류가 바람직하고, 특히 2-아미노페놀, 3-아미노페놀, 4-아미노페놀 등이 바람직하다. Among these organic amino compounds, mono (cyclo) alkanolamines, amino () as the aliphatic amines from the viewpoints of solubility in a solvent to be described later, prevention of background contamination on the substrate or the light shielding layer of the unexposed portion, and film residues. Cyclo) alkanediols are preferred, in particular 2-aminoethanol, 3-amino-1-propanol, 5-amino-1-pentanol, 3-amino-1,2-propanediol, 2-amino-1,3 -Propanediol, 4-amino-1,2-butanediol and the like are preferable. Moreover, as a phenyl group containing amine, aminophenols are preferable and 2-aminophenol, 3-aminophenol, 4-aminophenol etc. are especially preferable.
경화제는 특정 분산제, 카르복실기 함유 공중합체 및/또는 중합체 (F)와 반응하여 그것 자체가 가교 구조에 삽입되고, 경화도 및 내용제성을 향상시키는 성분이다. A curing agent is a component that reacts with a specific dispersant, a carboxyl group-containing copolymer and / or a polymer (F) to insert itself into a crosslinked structure and to improve the degree of curing and solvent resistance.
이러한 경화제로는, 예를 들면 에폭시 화합물, 옥세탄 화합물(단, 중합체 (F)는 제외함), 다가 카르복실산 무수물 등을 들 수 있다. As such a hardening | curing agent, an epoxy compound, an oxetane compound (except a polymer (F)), polyhydric carboxylic anhydride, etc. are mentioned, for example.
에폭시 화합물로는 다관능 에폭시 화합물이 바람직하다. 그 구체예로는 비스페놀 A 에폭시 수지, 수소화 비스페놀 A 에폭시 수지, 비스페놀 F 에폭시 수지, 수소화 비스페놀 F 에폭시 수지, 노볼락형 에폭시 수지 등의 방향족계 에폭시 수지; 지환족계 에폭시 수지, 복소환식 에폭시 수지, 글리시딜에스테르계 수지, 글리시딜아민계 수지, 에폭시화유 등의 다른 에폭시 수지; 이들 에폭시 수지의 브롬화 유도체 이외에, 부타디엔의 (공)중합체의 에폭시화물, 이소프렌의 (공)중합체의 에폭시화물, 글리시딜기 함유 불포화 화합물의 (공)중합체, 트리글리시딜이소시아누레이트 등을 들 수 있다. As an epoxy compound, a polyfunctional epoxy compound is preferable. Specific examples thereof include aromatic epoxy resins such as bisphenol A epoxy resin, hydrogenated bisphenol A epoxy resin, bisphenol F epoxy resin, hydrogenated bisphenol F epoxy resin and novolac epoxy resin; Other epoxy resins such as cycloaliphatic epoxy resins, heterocyclic epoxy resins, glycidyl ester resins, glycidylamine resins, and epoxidized oils; In addition to the brominated derivatives of these epoxy resins, epoxides of (co) polymers of butadiene, epoxides of (co) polymers of isoprene, (co) polymers of glycidyl group-containing unsaturated compounds, triglycidyl isocyanurate, and the like can be given. Can be.
또한, 에폭시 화합물로서, 에폭시기 함유 불포화 화합물도 바람직하다. 그 구체예로는 글리시딜(메트)아크릴레이트, 3,4-에폭시부틸(메트)아크릴레이트, 6,7- 에폭시헵틸(메트)아크릴레이트, o-비닐벤질글리시딜에테르, m-비닐벤질글리시딜에테르, p-비닐벤질글리시딜에테르 등을 들 수 있다. Moreover, an epoxy group containing unsaturated compound is also preferable as an epoxy compound. Specific examples thereof include glycidyl (meth) acrylate, 3,4-epoxybutyl (meth) acrylate, 6,7-epoxyheptyl (meth) acrylate, o-vinylbenzyl glycidyl ether, m-vinyl Benzyl glycidyl ether, p-vinyl benzyl glycidyl ether, and the like.
옥세탄 화합물로는 다관능 옥세탄 화합물이 바람직하다. 그 구체예로는, 탄산비스옥세타닐, 아디프산비스옥세타닐, 테레프탈산비스옥세타닐, p-크실릴렌디카르복실산비스옥세타닐, 1,4-시클로헥산디카르복실산비스옥세타닐 등의 저분자 화합물이나, 페놀노볼락 수지의 옥세탄에테르화물 등의 고분자 화합물을 들 수 있다. As an oxetane compound, a polyfunctional oxetane compound is preferable. As the specific example, bis oxetanyl carbonate, bis oxetanyl adipic acid, bis oxetanyl terephthalate, p-xylylene dicarboxylic acid bis oxetanyl, 1, 4- cyclohexane dicarboxylic acid High molecular compounds, such as low molecular weight compounds, such as bisoxetanyl, and the oxetane etherate of a phenol novolak resin, are mentioned.
또한, 옥세탄 화합물로서, 상기 중합체 (F)에서 사용하는 단량체 이외의 것을 사용할 수 있다. Moreover, as an oxetane compound, things other than the monomer used for the said polymer (F) can be used.
다가 카르복실산 무수물의 구체예로는, 프탈산 무수물, 피로멜리트산 무수물, 트리멜리트산 무수물, 3,3',4,4'-벤조페논테트라카르복실산 이무수물 등의 방향족 다가 카르복실산 무수물류; 이타콘산 무수물, 숙신산 무수물, 시트라콘산 무수물, 도데세닐숙신산 무수물, 트리카르발릴산 무수물, 말레산 무수물, 1,2,3,4-부탄테트라카르복실산 이무수물 등의 지방족 다가 카르복실산 무수물류; 헥사히드로프탈산 무수물, 3,4-디메틸테트라히드로프탈산 무수물, 1,2,4-시클로펜탄트리카르복실산 무수물, 1,2,4-시클로헥산트리카르복실산 무수물, 시클로펜탄테트라카르복실산 이무수물, 1,2,4,5-시클로헥산테트라카르복실산 이무수물, 하이믹산 무수물, 나딕산 무수물 등의 지환족 다가 카르복실산 무수물류; 에틸렌글리콜비스트리멜리테이트 무수물, 글리세린트리스트리멜리테이트 무수물 등의 에스테르기 함유 카르복실산 무수물류 이외에, 아데카 하드너 EH-700(아사히 덴까 고교(주)제조), 리카시드 HH(신닛본 케미컬(주)제조), MH-700(신닛본 케미컬(주)제조) 등의 상품명으로 시판되고 있는 에폭시 수지 경화제 등을 들 수 있다. Specific examples of the polyhydric carboxylic anhydride include aromatic polyhydric carboxylic anhydrides such as phthalic anhydride, pyromellitic anhydride, trimellitic anhydride, and 3,3 ', 4,4'-benzophenone tetracarboxylic dianhydride. logistics; Aliphatic polyhydric carboxylic acid anhydrides such as itaconic anhydride, succinic anhydride, citraconic anhydride, dodecenyl succinic anhydride, tricarvallylic anhydride, maleic anhydride, 1,2,3,4-butanetetracarboxylic dianhydride logistics; Hexahydrophthalic anhydride, 3,4-dimethyltetrahydrophthalic anhydride, 1,2,4-cyclopentanetricarboxylic anhydride, 1,2,4-cyclohexanetricarboxylic anhydride, cyclopentanetetracarboxylic dianhydride Alicyclic polyhydric carboxylic anhydrides such as water, 1,2,4,5-cyclohexanetetracarboxylic dianhydride, hymic acid anhydride, and nadic acid anhydride; In addition to ester group-containing carboxylic anhydrides such as ethylene glycol bistrimellitate anhydride and glycerin tristrimellitate anhydride, Adeka Hadner EH-700 (manufactured by Asahi Denka Kogyo Co., Ltd.) and Ricaside HH (Shin Nippon Chemical ( Epoxy resin hardening | curing agent etc. which are marketed by brand names, such as the following), MH-700 (made by Shin-Nippon Chemical Co., Ltd.), etc. are mentioned.
이들 경화제는 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. These hardeners can be used individually or in mixture of 2 or more types.
경화제의 함유량은 감방사선성 조성물의 고형분 전체에 대하여, 통상 30 질량% 이하, 바람직하게는 20 질량% 이하이다. 경화제의 함유량이 30 질량%를 초과하면 얻어지는 감방사선성 조성물의 보존 안정성이 저하되는 경향이 있다. Content of a hardening | curing agent is 30 mass% or less normally with respect to the whole solid content of a radiation sensitive composition, Preferably it is 20 mass% or less. When content of a hardening | curing agent exceeds 30 mass%, there exists a tendency for the storage stability of the radiation sensitive composition obtained to fall.
경화 보조제는 상기 중합체 (F) 및 상기 경화제가 갖는 관능기(예를 들면, 에폭시기, 옥세타닐기)를 개환시키고, 그것 자체가 가교 구조에 삽입되지 않고 경화 반응을 촉진하는 성분이다. The curing aid is a component that opens the functional group (eg, epoxy group, oxetanyl group) included in the polymer (F) and the curing agent and promotes the curing reaction without being inserted into the crosslinked structure itself.
이러한 경화 보조제로는, 예를 들면 술포늄염류, 벤조티아조늄염류, 암모늄염류, 포스포늄염류, 술폰산에스테르 화합물, 술폰이미드 화합물, 디아조메탄 화합물 등의 열산 발생제를 들 수 있고, 이들 중에서 술포늄염류, 벤조티아조늄염류, 술폰산에스테르 화합물, 술폰이미드 화합물, 디아조메탄 화합물 등이 바람직하다. Examples of such curing aids include thermal acid generators such as sulfonium salts, benzothiazonium salts, ammonium salts, phosphonium salts, sulfonic acid ester compounds, sulfonimide compounds, diazomethane compounds, and the like. Sulfonium salts, benzothiazonium salts, sulfonic acid ester compounds, sulfonimide compounds, diazomethane compounds and the like are preferable.
술포늄염류의 구체예로는, 예를 들면 하기의 것이 예시된다. As a specific example of sulfonium salts, the following are illustrated, for example.
4-아세토페닐디메틸술포늄헥사플루오로안티모네이트, 4-아세톡시페닐디메틸술포늄헥사플루오로아르세네이트, 디메틸-4-(벤질옥시카르보닐옥시)페닐술포늄헥사플루오로안티모네이트, 디메틸-4-(벤조일옥시)페닐술포늄헥사플루오로안티모네이트, 디메틸-4-(벤조일옥시)페닐술포늄헥사플루오로아르세네이트, 디메틸-3-클로로-4-아세톡시페닐술포늄헥사플루오로안티모네이트 등의 알킬술포늄염; 4-acetophenyldimethylsulfonium hexafluoroantimonate, 4-acetoxyphenyldimethylsulfonium hexafluoroarsenate, dimethyl-4- (benzyloxycarbonyloxy) phenylsulfonium hexafluoroantimonate, Dimethyl-4- (benzoyloxy) phenylsulfonium hexafluoroantimonate, dimethyl-4- (benzoyloxy) phenylsulfonium hexafluoroarsenate, dimethyl-3-chloro-4-acetoxyphenylsulfonium hexa Alkylsulfonium salts such as fluoroantimonate;
벤질-4-히드록시페닐메틸술포늄헥사플루오로안티모네이트, 벤질-4-히드록시페닐메틸술포늄헥사플루오로포스페이트, 4-아세톡시페닐벤질메틸술포늄헥사플루오 로안티모네이트, 벤질-4-메톡시페닐메틸술포늄헥사플루오로안티모네이트, 벤질-2-메틸-4-히드록시페닐메틸술포늄헥사플루오로안티모네이트, 벤질-3-클로로-4-히드록시페닐메틸술포늄헥사플루오로아르세네이트, 4-메톡시벤질-4-히드록시페닐메틸술포늄헥사플루오로포스페이트 등의 벤질술포늄염; Benzyl-4-hydroxyphenylmethylsulfonium hexafluoroantimonate, benzyl-4-hydroxyphenylmethylsulfonium hexafluorophosphate, 4-acetoxyphenylbenzylmethylsulfonium hexafluoroantimonate, benzyl-4 -Methoxyphenylmethylsulfonium hexafluoroantimonate, benzyl-2-methyl-4-hydroxyphenylmethylsulfonium hexafluoroantimonate, benzyl-3-chloro-4-hydroxyphenylmethylsulfonium hexa Benzylsulfonium salts such as fluoroarsenate and 4-methoxybenzyl-4-hydroxyphenylmethylsulfonium hexafluorophosphate;
디벤질-4-히드록시페닐술포늄헥사플루오로안티모네이트, 디벤질-4-히드록시페닐술포늄헥사플루오로포스페이트, 4-아세톡시페닐디벤질술포늄헥사플루오로안티모네이트, 디벤질-4-메톡시페닐술포늄헥사플루오로안티모네이트, 디벤질-3-클로로-4-히드록시페닐술포늄헥사플루오로아르세네이트, 디벤질-3-메틸-4-히드록시-5-tert-부틸페닐술포늄헥사플루오로안티모네이트, 벤질-4-메톡시벤질-4-히드록시페닐술포늄헥사플루오로포스페이트 등의 디벤질술포늄염; Dibenzyl-4-hydroxyphenylsulfonium hexafluoroantimonate, dibenzyl-4-hydroxyphenylsulfonium hexafluorophosphate, 4-acetoxyphenyldibenzylsulfonium hexafluoroantimonate, dibenzyl 4-methoxyphenylsulfonium hexafluoroantimonate, dibenzyl-3-chloro-4-hydroxyphenylsulfonium hexafluoroarsenate, dibenzyl-3-methyl-4-hydroxy-5- dibenzylsulfonium salts such as tert-butylphenylsulfonium hexafluoroantimonate and benzyl-4-methoxybenzyl-4-hydroxyphenylsulfonium hexafluorophosphate;
p-클로로벤질-4-히드록시페닐메틸술포늄헥사플루오로안티모네이트, p-니트로벤질-4-히드록시페닐메틸술포늄헥사플루오로안티모네이트, p-클로로벤질-4-히드록시페닐메틸술포늄헥사플루오로포스페이트, p-니트로벤질-3-메틸-4-히드록시페닐메틸술포늄헥사플루오로안티모네이트, 3,5-디클로로벤질-4-히드록시페닐메틸술포늄헥사플루오로안티모네이트, o-클로로벤질-3-클로로-4-히드록시페닐메틸술포늄헥사플루오로안티모네이트 등의 치환 벤질술포늄염. p-chlorobenzyl-4-hydroxyphenylmethylsulfonium hexafluoroantimonate, p-nitrobenzyl-4-hydroxyphenylmethylsulfonium hexafluoroantimonate, p-chlorobenzyl-4-hydroxyphenyl Methylsulfonium hexafluorophosphate, p-nitrobenzyl-3-methyl-4-hydroxyphenylmethylsulfonium hexafluoroantimonate, 3,5-dichlorobenzyl-4-hydroxyphenylmethylsulfonium hexafluoro Substituted benzylsulfonium salts, such as an antimonate and o-chlorobenzyl-3- chloro-4- hydroxyphenyl methylsulfonium hexafluoro antimonate.
벤조티아조늄염류의 구체예로는 3-벤질벤조티아조늄헥사플루오로안티모네이트, 3-벤질벤조티아조늄헥사플루오로포스페이트, 3-벤질벤조티아조늄테트라플루오로보레이트, 3-(p-메톡시벤질)벤조티아조늄헥사플루오로안티모네이트, 3-벤질-2-메틸티오벤조티아조늄헥사플루오로안티모네이트, 3-벤질-5-클로로벤조티아조늄헥사플 루오로안티모네이트 등의 벤질벤조티아조늄염 등을 들 수 있다.Specific examples of the benzothiazonium salts include 3-benzylbenzothiazonium hexafluoroantimonate, 3-benzylbenzothiazonium hexafluorophosphate, 3-benzylbenzothiazonium tetrafluoroborate, 3- (p-meth Oxybenzyl) benzothiazonium hexafluoroantimonate, 3-benzyl-2-methylthiobenzothiazonium hexafluoroantimonate, 3-benzyl-5-chlorobenzothiazonium hexafluoroantimonate, etc. Benzyl benzothiazonium salt etc. are mentioned.
술폰산에스테르 화합물의 구체예로는 벤조인토실레이트, α-메틸올벤조인토실레이트, α-메틸올벤조인 n-옥탄술포네이트, 피로갈롤트리스(트리플루오로메탄술포네이트), 피로갈롤트리스(노나플루오로-n-부탄술포네이트), 피로갈롤트리스(메탄술포네이트), 니트로벤질-9,10-디에톡시안트라센-2-술포네이트 등을 들 수 있다. Specific examples of the sulfonic acid ester compound include benzointosylate, α-methylolbenzointosylate, α-methylolbenzoin n-octanesulfonate, pyrogalloltris (trifluoromethanesulfonate), and pyrogalloltris ( Nonafluoro-n-butanesulfonate), pyrogallol tris (methanesulfonate), nitrobenzyl-9,10- diethoxyanthracene-2-sulfonate, and the like.
술폰이미드 화합물의 구체예로는 N-(트리플루오로메탄술포닐옥시)숙신이미드, N-(트리플루오로메탄술포닐옥시)비시클로[2.2.1]헵트-5-엔-2,3-디카르복시이미드, N-(10-캄파술포닐옥시)숙신이미드, N-(10-캄파술포닐옥시)비시클로[2.2.1]헵트-5-엔-2,3-디카르복시이미드, N-〔(5-메틸-5-카르복시메탄비시클로[2.2.1]헵타-2-일)술포닐옥시〕숙신이미드 등을 들 수 있다. Specific examples of the sulfonimide compound include N- (trifluoromethanesulfonyloxy) succinimide, N- (trifluoromethanesulfonyloxy) bicyclo [2.2.1] hept-5-ene-2, 3-dicarboxyimide, N- (10-campasulfonyloxy) succinimide, N- (10-campasulfonyloxy) bicyclo [2.2.1] hept-5-ene-2,3-dicarboxyimide And N-[(5-methyl-5-carboxymethanebicyclo [2.2.1] hepta-2-yl) sulfonyloxy] succinimide and the like.
디아조메탄 화합물의 구체예로는 비스(시클로헥산술포닐)디아조메탄, 비스(t-부틸술포닐)디아조메탄, 비스(1,4-디옥사스피로[4.5]-데칸-7-술포닐)디아조메탄 등을 들 수 있다. Specific examples of the diazomethane compound include bis (cyclohexanesulfonyl) diazomethane, bis (t-butylsulfonyl) diazomethane, bis (1,4-dioxaspiro [4.5] -decane-7-sul Ponyyl) diazomethane etc. are mentioned.
이들 중에서, 특히 4-아세톡시페닐디메틸술포늄헥사플루오로아르세네이트, 벤질-4-히드록시페닐메틸술포늄헥사플루오로안티모네이트, 4-아세톡시페닐벤질메틸술포늄헥사플루오로안티모네이트, 디벤질-4-히드록시페닐술포늄헥사플루오로안티모네이트, 4-아세톡시페닐벤질술포늄헥사플루오로안티모네이트, 3-벤질벤조티아조늄헥사플루오로안티모네이트, N-(트리플루오로메탄술포닐옥시)비시클로[2.2.1]헵트-5-엔-2,3-디카르복시이미드 등이 바람직하다. Among them, 4-acetoxyphenyldimethylsulfonium hexafluoroarsenate, benzyl-4-hydroxyphenylmethylsulfonium hexafluoroantimonate, 4-acetoxyphenylbenzylmethylsulfonium hexafluoroantimo Nate, Dibenzyl-4-hydroxyphenylsulfonium hexafluoroantimonate, 4-acetoxyphenylbenzylsulfonium hexafluoroantimonate, 3-benzylbenzothiazonium hexafluoroantimonate, N- ( Trifluoromethanesulfonyloxy) bicyclo [2.2.1] hept-5-ene-2,3-dicarboxyimide and the like are preferred.
이들 경화 보조제는 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. These curing aids can be used individually or in mixture of 2 or more types.
경화 보조제의 함유량은 감방사선성 조성물의 고형분 전체에 대하여, 통상 15 질량% 이하, 바람직하게는 10 질량% 이하이다. 경화 보조제의 함유량이 15 중량%를 초과하면 얻어지는 감방사선성 조성물의 보존 안정성이 저하되거나, 형성된 착색층이 현상시에 기판으로부터 탈락하기 쉬워지는 경향이 있다. Content of a hardening adjuvant is 15 mass% or less normally with respect to the whole solid content of a radiation sensitive composition, Preferably it is 10 mass% or less. When content of a hardening aid exceeds 15 weight%, the storage stability of the radiation sensitive composition obtained tends to fall, or the formed colored layer tends to fall off from a board | substrate at the time of image development.
또한, 경화제 및 경화 보조제의 함유량의 하한은, 감방사선성 조성물의 고형분 전체에 대하여, 통상 0.1 질량부, 바람직하게는 0.5 질량부이다. In addition, the minimum of content of a hardening | curing agent and a hardening adjuvant is 0.1 mass part normally with respect to the whole solid content of a radiation sensitive composition, Preferably it is 0.5 mass part.
또한, 상기 이외의 첨가제로는, 예를 들면 In addition, as an additive other than the above, for example,
구리프탈로시아닌 유도체 등의 청색 안료 유도체나 황색 안료 유도체 등의 분산 보조제; Dispersion aids such as blue pigment derivatives such as copper phthalocyanine derivatives and yellow pigment derivatives;
유리, 알루미나 등의 충전제; Fillers such as glass and alumina;
폴리비닐알코올, 폴리에틸렌글리콜모노알킬에테르류, 폴리(플루오로알킬아크릴레이트)류 등의 고분자 화합물; Polymer compounds such as polyvinyl alcohol, polyethylene glycol monoalkyl ethers, and poly (fluoroalkyl acrylates);
비이온계, 양이온계, 음이온계 등의 계면활성제; Surfactants such as nonionic, cationic and anionic systems;
비닐트리메톡시실란, 비닐트리에톡시실란, 비닐트리스(2-메톡시에톡시)실란, N-(2-아미노에틸)-3-아미노프로필메틸디메톡시실란, N-(2-아미노에틸)-3-아미노프로필트리메톡시실란, 3-아미노프로필트리에톡시실란, 3-글리시독시프로필트리메톡시실란, 3-글리시독시프로필메틸디메톡시실란, 2-(3,4-에폭시시클로헥실)에틸트리메톡시실란, 3-클로로프로필메틸디메톡시실란, 3-클로로프로필트리메톡시실란, 3-메타크릴로일옥시프로필트리메톡시실란, 3-메르캅토프로필트리메톡시실란 등의 밀착 촉진제; Vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, N- (2-aminoethyl) 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2- (3,4-epoxycyclo Hexyl) ethyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloyloxypropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane, etc. Adhesion promoter;
2,2'-티오비스(4-메틸-6-t-부틸페놀), 2,6-디-t-부틸페놀 등의 산화 방지제; Antioxidants such as 2,2'-thiobis (4-methyl-6-t-butylphenol) and 2,6-di-t-butylphenol;
2-(3-t-부틸-5-메틸-2-히드록시페닐)-5-클로로벤조트리아졸, 알콕시벤조페논류 등의 자외선 흡수제; Ultraviolet absorbers such as 2- (3-t-butyl-5-methyl-2-hydroxyphenyl) -5-chlorobenzotriazole and alkoxybenzophenones;
폴리아크릴산나트륨 등의 응집 방지제; Aggregation inhibitors such as sodium polyacrylate;
1,1'-아조비스(시클로헥산-1-카르보니트릴), 2-페닐라조-4-메톡시-2,4-디메틸발레로니트릴 등의 열 라디칼 발생제 등을 들 수 있다. And thermal radical generators such as 1,1'-azobis (cyclohexane-1-carbonitrile) and 2-phenyllazo-4-methoxy-2,4-dimethylvaleronitrile.
-용매--menstruum-
본 발명의 감방사선성 조성물은 상기 (A) 내지 (F) 성분을 필수 성분으로 하고, 필요에 따라서 첨가제 성분을 함유하지만, 통상 용매를 배합하여 액상 조성물로서 제조된다. Although the radiation sensitive composition of this invention makes the said (A)-(F) component an essential component, and contains an additive component as needed, it is normally manufactured as a liquid composition by mix | blending a solvent.
용매로는 감방사선성 조성물을 구성하는 (A) 내지 (F) 성분이나 첨가제 성분을 분산 또는 용해시키고, 또한 이들 성분과 반응하지 않고, 알맞은 휘발성을 갖는 한 적절히 선택하여 사용할 수 있다. The solvent may be appropriately selected and used as long as it disperses or dissolves the components (A) to (F) and the additive components constituting the radiation-sensitive composition and does not react with these components and has a suitable volatility.
이러한 용매로는, 예를 들면 하기의 것이 예시된다. As such a solvent, the following are illustrated, for example.
에틸렌글리콜모노메틸에테르, 에틸렌글리콜모노에틸에테르, 에틸렌글리콜모노-n-프로필에테르, 에틸렌글리콜모노-n-부틸에테르, 디에틸렌글리콜모노메틸에테르, 디에틸렌글리콜모노에틸에테르, 디에틸렌글리콜모노-n-프로필에테르, 디에틸렌글리콜모노-n-부틸에테르, 트리에틸렌글리콜모노메틸에테르, 트리에틸렌글리콜모노에틸에테르, 프로필렌글리콜모노메틸에테르, 프로필렌글리콜모노에틸에테르, 프로필렌글리콜모노-n-프로필에테르, 프로필렌글리콜모노-n-부틸에테르, 디프로필렌글 리콜모노메틸에테르, 디프로필렌글리콜모노에틸에테르, 디프로필렌글리콜모노-n-프로필에테르, 디프로필렌글리콜모노-n-부틸에테르, 트리프로필렌글리콜모노메틸에테르, 트리프로필렌글리콜모노에틸에테르 등의 (폴리)알킬렌글리콜모노알킬에테르류; Ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-propyl ether, ethylene glycol mono-n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n -Propyl ether, diethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, propylene Glycol mono-n-butyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono-n-propyl ether, dipropylene glycol mono-n-butyl ether, tripropylene glycol monomethyl ether, (Poly) alkylene glycol monoalkyl ethers such as tripropylene glycol monoethyl ether;
에틸렌글리콜모노메틸에테르아세테이트, 에틸렌글리콜모노에틸에테르아세테이트, 디에틸렌글리콜모노메틸에테르아세테이트, 디에틸렌글리콜모노에틸에테르아세테이트, 프로필렌글리콜모노메틸에테르아세테이트, 프로필렌글리콜모노에틸에테르아세테이트 등의 (폴리)알킬렌글리콜모노알킬에테르아세테이트류; (Poly) alkylenes such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, and propylene glycol monoethyl ether acetate Glycol monoalkyl ether acetates;
디에틸렌글리콜디메틸에테르, 디에틸렌글리콜메틸에틸에테르, 디에틸렌글리콜디에틸에테르, 테트라히드로푸란 등의 다른 에테르류; Other ethers such as diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether and tetrahydrofuran;
메틸에틸케톤, 시클로헥사논, 2-헵타논, 3-헵타논 등의 케톤류; Ketones such as methyl ethyl ketone, cyclohexanone, 2-heptanone, and 3-heptanone;
락트산메틸, 락트산에틸 등의 락트산알킬에스테르류; Lactic acid alkyl esters such as methyl lactate and ethyl lactate;
2-히드록시-2-메틸프로피온산에틸, 3-메톡시프로피온산메틸, 3-메톡시프로피온산에틸, 3-에톡시프로피온산메틸, 3-에톡시프로피온산에틸, 에톡시아세트산에틸, 히드록시아세트산에틸, 2-히드록시-3-메틸부탄산메틸, 3-메톡시부틸아세테이트, 3-메틸-3-메톡시부틸아세테이트, 3-메틸-3-메톡시부틸프로피오네이트, 아세트산에틸, 아세트산 n-프로필, 아세트산 i-프로필, 아세트산 n-부틸, 아세트산 i-부틸, 포름산 n-아밀, 아세트산 i-아밀, 프로피온산 n-부틸, 부티르산에틸, 부티르산 n-프로필, 부티르산 i-프로필, 부티르산 n-부틸, 피루브산메틸, 피루브산에틸, 피루브산 n-프로필, 아세토아세트산메틸, 아세토아세트산에틸, 2-옥소부탄산에틸 등의 다른 에스테르류; Ethyl 2-hydroxy-2-methylpropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl ethoxyacetate, ethyl hydroxyacetate, 2 Methyl hydroxy-3-methylbutyrate, 3-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, 3-methyl-3-methoxybutylpropionate, ethyl acetate, n-propyl acetate, I-propyl acetate, n-butyl acetate, i-butyl acetate, n-amyl acetate, i-amyl acetate, n-butyl propionate, ethyl butyrate, n-propyl butyrate, i-propyl butyrate n-butyl, n-butyl butyrate, methyl pyruvate Other esters such as ethyl pyruvate, n-propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, and ethyl 2-oxobutyrate;
톨루엔, 크실렌 등의 방향족 탄화수소류; Aromatic hydrocarbons such as toluene and xylene;
N,N-디메틸포름아미드, N,N-디메틸아세트아미드, N-메틸피롤리돈 등의 아미드 또는 락탐류. Amides or lactams such as N, N-dimethylformamide, N, N-dimethylacetamide, and N-methylpyrrolidone.
이들 용매 중, 용해성, 안료 분산성, 도포성 등의 관점에서 프로필렌글리콜모노메틸에테르, 에틸렌글리콜모노메틸에테르아세테이트, 프로필렌글리콜모노메틸에테르아세테이트, 프로필렌글리콜모노에틸에테르아세테이트, 디에틸렌글리콜디메틸에테르, 디에틸렌글리콜메틸에틸에테르, 시클로헥사논, 2-헵타논, 3-헵타논, 락트산에틸, 3-메톡시프로피온산에틸, 3-에톡시프로피온산메틸, 3-에톡시프로피온산에틸, 3-메톡시부틸아세테이트, 3-메틸-3-메톡시부틸프로피오네이트, 아세트산 n-부틸, 아세트산 i-부틸, 포름산 n-아밀, 아세트산 i-아밀, 프로피온산 n-부틸, 부티르산에틸, 부티르산 i-프로필, 부티르산 n-부틸, 피루브산에틸 등이 바람직하다. Among these solvents, propylene glycol monomethyl ether, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, diethylene glycol dimethyl ether, di, etc. Ethylene glycol methyl ethyl ether, cyclohexanone, 2-heptanone, 3-heptanone, ethyl lactate, 3-methoxy propionate, methyl 3-ethoxypropionate, 3-ethoxypropionate, 3-methoxybutyl acetate , 3-methyl-3-methoxybutylpropionate, n-butyl acetate, i-butyl acetate, n-amyl formate, i-amyl acetate, n-butyl propionate, ethyl butyrate, i-propyl butyrate, butyric acid n- Butyl, ethyl pyruvate, etc. are preferable.
용매는 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. A solvent can be used individually or in mixture of 2 or more types.
또한, 상기 용매와 함께 벤질에틸에테르, 디-n-헥실에테르, 아세토닐아세톤, 이소포론, 카프로산, 카프릴산, 1-옥탄올, 1-노난올, 벤질알코올, 아세트산벤질, 벤조산에틸, 옥살산디에틸, 말레산디에틸, γ-부티로락톤, 탄산에틸렌, 탄산프로필렌, 에틸렌글리콜모노페닐에테르아세테이트 등의 고비점 용매를 병용할 수도 있다.In addition, benzyl ethyl ether, di-n-hexyl ether, acetonyl acetone, isophorone, caproic acid, caprylic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, ethyl benzoate, together with the solvent High boiling point solvents, such as diethyl oxalate, diethyl maleate, gamma -butyrolactone, ethylene carbonate, propylene carbonate, and ethylene glycol monophenyl ether acetate, can also be used together.
이들 고비점 용매는 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. These high boiling point solvents can be used individually or in mixture of 2 or more types.
용매의 함유량은 특별히 한정되는 것은 아니지만, 얻어지는 감방사선성 조성물의 도포성, 안정성 등의 관점에서, 해당 조성물의 용매를 제외한 각 성분의 합계 농도가 통상 5 내지 50 질량%, 바람직하게는 10 내지 40 질량%가 되는 양이 바람 직하다. Although content of a solvent is not specifically limited, From a viewpoint of the applicability | paintability, stability, etc. of the radiation sensitive composition obtained, the total concentration of each component except the solvent of the said composition is 5-50 mass% normally, Preferably it is 10-40. The amount which becomes mass% is preferable.
컬러 필터Color filter
본 발명의 컬러 필터는 본 발명의 착색층 형성용 감방사선성 조성물을 이용하여 형성된 착색층을 구비하는 것이다. The color filter of this invention is equipped with the colored layer formed using the radiation sensitive composition for colored layer formation of this invention.
이하, 본 발명의 컬러 필터에 있어서의 착색층을 형성하는 방법에 대해서 설명한다. Hereinafter, the method of forming the colored layer in the color filter of this invention is demonstrated.
우선, 기판의 표면 상에 필요에 따라서 화소를 형성하는 부분을 구획하도록 차광층을 형성하고, 이 기판 상에, 예를 들면 적색의 안료가 분산된 감방사선성 조성물의 액상 조성물을 도포한 후, 예비-베이킹을 행하여 용매를 증발시켜 도막을 형성한다. First, a light shielding layer is formed on the surface of a substrate so as to partition a portion for forming a pixel as necessary, and, for example, a liquid composition of a radiation-sensitive composition in which a red pigment is dispersed is applied onto the substrate, Pre-baking is carried out to evaporate the solvent to form a coating film.
이어서, 이 도막에 포토마스크를 통해 노광한 후, 알칼리 현상액을 이용하여 현상하여 도막의 미노광부를 용해 제거한다. 그 후, 후-베이킹함으로써, 적색의 화소 패턴이 소정의 배열로 배치된 화소 어레이를 형성한다. Subsequently, after exposing this coating film through a photomask, it develops using alkaline developing solution, and removes and removes the unexposed part of a coating film. Thereafter, by post-baking, a pixel array in which red pixel patterns are arranged in a predetermined arrangement is formed.
그 후, 녹색 또는 청색의 안료가 분산된 각 감방사선성 조성물의 액상 조성물을 이용하여, 상기와 동일하게 함으로써 각 액상 조성물의 도포, 예비-베이킹, 노광, 현상 및 후-베이킹을 행하여 녹색의 화소 어레이 및 청색의 화소 어레이를 동일한 기판 상에 순차 형성함으로써, 적색, 녹색 및 청색의 3원색의 화소 어레이가 기판 상에 배치된 컬러 필터가 얻어진다. 단, 본 발명에 있어서는 각 색의 화소를 형성하는 순서는 상기 것으로 한정되지 않는다. Thereafter, using the liquid composition of each radiation-sensitive composition in which a green or blue pigment is dispersed, the same procedure as described above is carried out to apply, pre-bak, expose, develop, and post-bak each liquid composition to obtain a green pixel. By sequentially forming the array and the blue pixel array on the same substrate, a color filter in which the pixel arrays of the three primary colors of red, green and blue are arranged on the substrate is obtained. However, in this invention, the order which forms the pixel of each color is not limited to the said thing.
또한, 블랙 매트릭스는, 예를 들면 흑색의 안료가 분산된 감방사선성 조성물 의 액상 조성물을 이용하고, 상기 화소의 형성의 경우와 동일하게 하여 형성할 수 있다. In addition, a black matrix can be formed similarly to the case of formation of the said pixel, for example using the liquid composition of the radiation sensitive composition in which black pigment was disperse | distributed.
화소 및/또는 블랙 매트릭스를 형성할 때에 사용되는 기판의 재질로는, 예를 들면 유리, 실리콘, 폴리카르보네이트, 폴리에스테르, 방향족 폴리아미드, 폴리아미드이미드, 폴리이미드 등을 들 수 있다. As a material of the board | substrate used when forming a pixel and / or a black matrix, glass, silicone, polycarbonate, polyester, aromatic polyamide, polyamideimide, polyimide, etc. are mentioned, for example.
또한, 이들 기판에는 필요에 따라 실란 커플링제 등에 의한 약품 처리, 플라즈마 처리, 이온 플레이팅, 스퍼터링, 기상 반응법, 진공 증착 등의 적절한 전처리를 실시해둘 수도 있다.Furthermore, these substrates may be subjected to appropriate pretreatment such as chemical treatment with a silane coupling agent or the like, plasma treatment, ion plating, sputtering, vapor phase reaction, vacuum deposition, or the like as necessary.
감방사선성 조성물의 액상 조성물을 기판에 도포할 때는 분무법, 롤 코팅법, 회전 도포법(스핀 코팅법), 슬릿다이 도포법, 바 도포법, 잉크젯법 등의 적절한 도포법을 채용할 수 있지만, 특히 스핀 코팅법, 슬릿다이 도포법이 바람직하다. When the liquid composition of the radiation-sensitive composition is applied to a substrate, an appropriate coating method such as spraying, roll coating, spin coating (spin coating), slit die coating, bar coating or inkjet may be employed. In particular, the spin coating method and the slit die coating method are preferable.
도포 두께는 건조 후의 막 두께로서, 통상 0.1 내지 10 ㎛, 바람직하게는 0.2 내지 8.0 ㎛, 특히 바람직하게는 0.2 내지 6.0 ㎛이다. The coating thickness is a film thickness after drying, which is usually 0.1 to 10 mu m, preferably 0.2 to 8.0 mu m, particularly preferably 0.2 to 6.0 mu m.
착색층을 형성할 때에 사용되는 방사선으로는, 예를 들면 가시광선, 자외선, 원자외선, 전자선, X선 등을 사용할 수 있지만, 파장이 190 내지 450 nm의 범위에 있는 방사선이 바람직하다. As the radiation used for forming the colored layer, for example, visible rays, ultraviolet rays, far ultraviolet rays, electron beams, X rays and the like can be used, but radiation having a wavelength in the range of 190 to 450 nm is preferable.
방사선의 노광량은 바람직하게는 10 내지 10,000 J/㎡이다. The exposure dose of radiation is preferably 10 to 10,000 J / m 2.
또한, 알칼리 현상액으로는, 예를 들면 탄산나트륨, 수산화나트륨, 수산화칼륨, 테트라메틸암모늄히드록시드, 콜린, 1,8-디아자비시클로-[5.4.0]-7-운데센, 1,5-디아자비시클로-[4.3.0]-5-노넨 등의 수용액이 바람직하다. As the alkaline developer, for example, sodium carbonate, sodium hydroxide, potassium hydroxide, tetramethylammonium hydroxide, choline, 1,8-diazabicyclo- [5.4.0] -7-undecene, 1,5- Aqueous solutions, such as diazabicyclo- [4.3.0] -5-nonene, are preferable.
알칼리 현상액에는, 예를 들면 메탄올, 에탄올 등의 수용성 유기 용제나 계면활성제 등을 적량 첨가할 수도 있다. 또한, 알칼리 현상 후에는 통상 수세한다. A suitable amount of water-soluble organic solvents, such as methanol and ethanol, surfactant, etc. can also be added to alkaline developing solution. In addition, after alkali development, water washing is normally performed.
현상 처리법으로는 샤워 현상법, 분무 현상법, 침지 현상법, 퍼들 현상법 등을 적용할 수 있다. 현상 조건은 상온에서 5 내지 300 초가 바람직하다. As the developing treatment method, a shower developing method, a spray developing method, an immersion developing method, a puddle developing method and the like can be applied. As for image development conditions, 5 to 300 second is preferable at normal temperature.
후-베이킹에 있어서의 가열 온도로는, 종래 바람직하게는 200 내지 250 ℃ 정도의 처리 온도가 채용되어 왔지만, 본 발명의 착색층 형성용 감방사선성 조성물에 있어서는, 150 내지 200 ℃ 정도의 처리 온도에서도 충분한 여러 가지 성능을 갖는 컬러 필터를 형성할 수 있다. 또한, 가열 시간으로는, 종래 바람직하게는 20 내지 40 분 정도의 처리 시간이 채용되어 왔지만, 본 발명의 착색층 형성용 감방사선성 조성물에 있어서는, 200 ℃ 이상의 가열 온도이면 10 내지 20 분 정도, 200 ℃ 미만의 가열 온도이면 20 내지 30 분 정도의 처리 시간에서도 충분한 여러 가지 성능을 갖는 컬러 필터를 형성할 수 있다. As a heating temperature in post-baking, although processing temperature of about 200-250 degreeC is employ | adopted conventionally, Preferably, in the radiation sensitive composition for colored layer formation of this invention, the processing temperature of about 150-200 degreeC Even in the present invention, a color filter having sufficient performance can be formed. Moreover, as heating time, although processing time of about 20-40 minutes is employ | adopted conventionally, in the radiation sensitive composition for colored layer formation of this invention, if it is a heating temperature of 200 degreeC or more, about 10 to 20 minutes, If it is heating temperature below 200 degreeC, the color filter which has a sufficient various performance can be formed also in the processing time of about 20 to 30 minutes.
이와 같이 하여 형성된 화소의 막 두께는, 통상 0.5 내지 5.0 ㎛, 바람직하게는 1.5 내지 3.0 ㎛이다. The film thickness of the pixel formed in this way is 0.5-5.0 micrometers normally, Preferably it is 1.5-3.0 micrometers.
이와 같이 하여 얻어지는 본 발명의 컬러 필터는, 예를 들면 투과형 또는 반사형의 컬러 액정 표시 소자, 컬러 촬상관 소자, 컬러 센서 등에 매우 유용하다. The color filter of the present invention thus obtained is very useful, for example, in a transmissive or reflective color liquid crystal display element, a color image tube element, a color sensor, or the like.
액정 표시 소자Liquid crystal display element
본 발명의 액정 표시 소자는 본 발명의 컬러 필터를 구비하는 것이다. The liquid crystal display element of this invention is equipped with the color filter of this invention.
본 발명의 액정 표시 소자의 1개의 형태로서, 본 발명의 착색층 형성용 감방사선성 조성물을 이용하여, 박막 트랜지스터 기판 어레이 상에 상술한 바와 같이 하여 화소 및/또는 블랙 매트릭스를 형성함으로써, 특히 우수한 특성을 갖는 컬러 액정 표시 소자를 제조할 수 있다. As one form of the liquid crystal display element of this invention, it is especially excellent by forming a pixel and / or a black matrix on the thin film transistor substrate array as mentioned above using the radiation sensitive composition for colored layer formation of this invention. The color liquid crystal display element which has a characteristic can be manufactured.
<실시예><Example>
이하, 실시예를 들어 본 발명을 더욱 구체적으로 설명한다. 단, 본 발명이 하기 실시예로 한정되는 것은 아니다. 또한, 이하에 있어서 "부" 및 "%"는 특별히 나타내지 않는 한 질량 기준이다. Hereinafter, an Example is given and this invention is demonstrated further more concretely. However, the present invention is not limited to the following examples. In addition, "part" and "%" are mass references | standards unless there is particular notice below.
하기 각 합성예에서 얻은 수지의 Mw 및 Mn은, 하기 사양에 의한 겔 투과 크로마토그래피(GPC)에 의해 측정하였다. Mw and Mn of resin obtained by each following synthesis example were measured by the gel permeation chromatography (GPC) by the following specification.
장치: GPC-101(쇼와 덴꼬(주)제조) Equipment: GPC-101 (manufactured by Showa Denko Co., Ltd.)
칼럼: GPC-KF-801, GPC-KF-802, GPC-KF-803 및 GPC-KF-804를 결합하여 이용하였다. Column: GPC-KF-801, GPC-KF-802, GPC-KF-803 and GPC-KF-804 were used in combination.
용출 용매: 인산 0.5%를 포함하는 테트라히드로푸란 Elution solvent: tetrahydrofuran containing 0.5% phosphoric acid
본 실시예에서 사용한 분산제, 다관능성 단량체, 광중합 개시제 및 경화제를 이하에 나타낸다.The dispersing agent, the polyfunctional monomer, the photoinitiator, and the hardening | curing agent used in the present Example are shown below.
분산제Dispersant
b-1: 디스퍼빅-2001(불휘발 성분=46%, 아민가=29, 산가=19, 빅케미(BYK)사 제조) b-1: Dispervic-2001 (non-volatile component = 46%, amine value = 29, acid value = 19, manufactured by Big Chemical Co., Ltd.)
b-2: 솔스퍼스 24000(불휘발 성분=100%, 아민가=42, 산가=25, 루브리졸(주)사 제조) b-2: Solsper 24000 (non-volatile component = 100%, amine value = 42, acid value = 25, Lubrizol Co., Ltd. product)
b-3: 디스퍼빅-192(불휘발 성분=100%, 아민가=0, 산가=0, 빅케미(BYK)사 제 조) b-3: Dispervic-192 (non-volatile component = 100%, amine value = 0, acid value = 0, manufactured by BYK Corporation)
다관능성 단량체Polyfunctional monomer
d-1: 디펜타에리트리톨헥사아크릴레이트 d-1: dipentaerythritol hexaacrylate
광중합 개시제Photopolymerization initiator
e-1: 2-메틸-1-〔4-(메틸티오)페닐〕-2-모르폴리노프로판-1-온 e-1: 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane-1-one
e-2: 에타논, 1-[9-에틸-6-(2-메틸벤조일)-9H-카르바졸-3-일]-, 1-(O-아세틸옥심) e-2: ethanone, 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl]-, 1- (O-acetyloxime)
e-3: 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)부탄-1-온 e-3: 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one
e-4: 2,4-디에틸티오크산톤 e-4: 2,4-diethyl thioxanthone
e-5: 4,4'-비스(디에틸아미노)벤조페논 e-5: 4,4'-bis (diethylamino) benzophenone
경화제Hardener
g-1: 비스페놀 A 노볼락형 에폭시 수지(상품명 157S65, 재팬에폭시레진(주)제조)g-1: Bisphenol A novolak-type epoxy resin (brand name 157S65, Japan Epoxy Resin Co., Ltd. product)
g-2: 트리멜리트산 무수물 g-2: trimellitic anhydride
g-3: N-(트리플루오로메탄술포닐옥시)비시클로[2.2.1]헵트-5-엔-2,3-디카르복시이미드 g-3: N- (trifluoromethanesulfonyloxy) bicyclo [2.2.1] hept-5-ene-2,3-dicarboxyimide
(C) 알칼리 가용성 수지의 합성(C) Synthesis of Alkali-Soluble Resin
합성예 1 Synthesis Example 1
냉각관, 교반기를 구비한 플라스크에 2,2'-아조비스이소부티로니트릴 3부, 프로필렌글리콜모노메틸에테르아세테이트 200부를 투입하고, 계속해서 메타크릴산 15부, N-페닐말레이미드 20부, 스티렌 10부, 벤질메타크릴레이트 55부, 및 분자량 조절제로서 2,4-디페닐-4-메틸-1-펜텐(닛본 유시(주)제조 상품명: 노프머 MSD) 5부를 투입하고, 질소 치환하였다. 그 후 완만히 교반하여 반응 용액의 온도를 80 ℃로 상승시키고, 이 온도를 5 시간 동안 유지하여 중합함으로써, 수지 용액을 얻었다. 이 수지를 "알칼리 가용성 수지 (c-1)"이라 한다. 이 알칼리 가용성 수지의 겔 투과 크로마토그래피 측정에 의한 폴리스티렌 환산 중량평균 분자량은 11,000, Mw/Mn은 2.6이었다. 3 parts of 2,2'- azobisisobutyronitrile and 200 parts of propylene glycol monomethyl ether acetate were put into a flask equipped with a cooling tube and a stirrer, followed by 15 parts of methacrylic acid and 20 parts of N-phenylmaleimide, 10 parts of styrene, 55 parts of benzyl methacrylate, and 5 parts of 2,4-diphenyl-4-methyl-1-pentene (Nippon Yushi Co., Ltd. product name: Nofmer MSD) as a molecular weight regulator were added and nitrogen-substituted. . Then, the mixture was stirred gently to raise the temperature of the reaction solution to 80 ° C., and maintained at this temperature for 5 hours to polymerize, thereby obtaining a resin solution. This resin is called "alkali-soluble resin (c-1)". Polystyrene conversion weight average molecular weight by gel permeation chromatography measurement of this alkali-soluble resin was 11,000, and Mw / Mn was 2.6.
합성예 2 Synthesis Example 2
냉각관, 교반기를 구비한 플라스크에 2,2'-아조비스이소부티로니트릴 3부, 프로필렌글리콜모노메틸에테르아세테이트 200부를 투입하고, 계속해서 메타크릴산 15부, 벤질메타크릴레이트 85부, 및 분자량 조절제로서 2,4-디페닐-4-메틸-1-펜텐(닛본 유시(주)제조 상품명: 노프마 MSD) 5부를 투입하고, 질소 치환하였다. 그 후 완만히 교반하여 반응 용액의 온도를 80 ℃로 상승시키고, 이 온도를 5 시간 동안 유지하여 중합함으로써, 수지 용액을 얻었다. 이 수지를 "알칼리 가용성 수지 (c-2)"라 한다. 이 알칼리 가용성 수지의 겔 투과 크로마토그래피 측정에 의한 폴리스티렌 환산 중량평균 분자량은 13,000, Mw/Mn은 2.8이었다. 3 parts of 2,2'-azobisisobutyronitrile and 200 parts of propylene glycol monomethyl ether acetate were added to a flask equipped with a cooling tube and a stirrer, followed by 15 parts of methacrylic acid, 85 parts of benzyl methacrylate, and As a molecular weight modifier, 5 parts of 2,4-diphenyl-4-methyl-1-pentene (the Nippon Yushi Co., Ltd. make brand name: Nova MSD) was thrown in, and nitrogen-substituted. Then, the mixture was stirred gently to raise the temperature of the reaction solution to 80 ° C., and maintained at this temperature for 5 hours to polymerize, thereby obtaining a resin solution. This resin is referred to as "alkali soluble resin (c-2)". Polystyrene conversion weight average molecular weight by gel permeation chromatography measurement of this alkali-soluble resin was 13,000, and Mw / Mn was 2.8.
비교 합성예 1 Comparative Synthesis Example 1
냉각관, 교반기를 구비한 플라스크에 2,2'-아조비스이소부티로니트릴 3부, 프로필렌글리콜모노메틸에테르아세테이트 200부를 투입하고, 계속해서 메타크릴산 15부, 벤질메타크릴레이트 70부, 3-(메타크릴로일옥시메틸)-3-에틸옥세탄 15부 및 분자량 조절제로서 2,4-디페닐-4-메틸-1-펜텐(닛본 유시(주)제조 상품명: 노프마 MSD) 5부를 투입하고, 질소 치환하였다. 그 후 완만히 교반하여 반응 용액의 온도를 80 ℃로 상승시키고, 이 온도를 5 시간 동안 유지하여 중합함으로써, 수지 용액을 얻었다. 이 수지를 "알칼리 가용성 수지 (c-3)"이라 한다. 이 알칼리 가용성 수지의 겔 투과 크로마토그래피 측정에 의한 폴리스티렌 환산 중량평균 분자량은 13,000, Mw/Mn은 2.7이었다. 3 parts of 2,2'- azobisisobutyronitrile and 200 parts of propylene glycol monomethyl ether acetates were added to the flask equipped with a cooling tube and the stirrer, and 15 parts of methacrylic acid, 70 parts of benzyl methacrylate, and 3 -15 parts of (methacryloyloxymethyl) -3-ethyl oxetane and 5 parts of 2,4-diphenyl-4-methyl-1-pentene (manufactured by Nippon Yushi Co., Ltd.) It injected | thrown-in and replaced with nitrogen. Then, the mixture was stirred gently to raise the temperature of the reaction solution to 80 ° C., and maintained at this temperature for 5 hours to polymerize, thereby obtaining a resin solution. This resin is called "alkali-soluble resin (c-3)". Polystyrene conversion weight average molecular weight by gel permeation chromatography measurement of this alkali-soluble resin was 13,000, and Mw / Mn was 2.7.
중합체 (F)의 합성Synthesis of Polymer (F)
합성예 3 Synthesis Example 3
냉각관, 교반기를 구비한 플라스크에 2,2'-아조비스이소부티로니트릴 3부, 프로필렌글리콜모노메틸에테르아세테이트 200부를 투입하고, 3-(메타크릴로일옥시메틸)-3-에틸옥세탄 100부, 및 분자량 조절제로서 2,4-디페닐-4-메틸-1-펜텐(닛본 유시(주)제조 상품명: 노프마 MSD) 5부를 투입하고, 질소 치환하였다. 그 후 완만히 교반하여 반응 용액의 온도를 80 ℃로 상승시키고, 이 온도를 5 시간 동안 유지하여 중합함으로써, 수지 용액을 얻었다. 이 수지를 "중합체 (f-1)"이라 한다. 이 중합체의 겔 투과 크로마토그래피 측정에 의한 폴리스티렌 환산 중량평균 분자량은 12,000, Mw/Mn은 2.9였다. Into a flask equipped with a cooling tube and a stirrer, 3 parts of 2,2'-azobisisobutyronitrile and 200 parts of propylene glycol monomethyl ether acetate were added thereto, and 3- (methacryloyloxymethyl) -3-ethyl oxetane was added. 100 parts and 5 parts of 2, 4- diphenyl- 4-methyl- 1-pentene (The Nippon Yushi Co., Ltd. make brand name: Nova MSD) were prepared, and it substituted by nitrogen. Then, the mixture was stirred gently to raise the temperature of the reaction solution to 80 ° C., and maintained at this temperature for 5 hours to polymerize, thereby obtaining a resin solution. This resin is referred to as "polymer (f-1)". Polystyrene conversion weight average molecular weight by the gel permeation chromatography measurement of this polymer was 12,000, and Mw / Mn was 2.9.
합성예 4 Synthesis Example 4
냉각관, 교반기를 구비한 플라스크에 2,2'-아조비스이소부티로니트릴 3부, 프로필렌글리콜모노메틸에테르아세테이트 200부를 투입하고, 3-(메타크릴로일옥시메틸)-3-에틸옥세탄 100부, 및 분자량 조절제로서 펜타에리트리톨테트라키스(3-메 르캅토프로피오네이트)(사카이 가가꾸 고교(주)제조 상품명: PEMP) 7부를 투입하고, 질소 치환하였다. 그 후 완만히 교반하여 반응 용액의 온도를 80 ℃로 상승시키고, 이 온도를 5 시간 동안 유지하여 중합함으로써, 수지 용액을 얻었다. 이 수지를 "중합체 (f-2)"라 한다. 이 중합체의 겔 투과 크로마토그래피 측정에 의한 폴리스티렌 환산 중량평균 분자량은 7,000, Mw/Mn은 1.7이었다. Into a flask equipped with a cooling tube and a stirrer, 3 parts of 2,2'-azobisisobutyronitrile and 200 parts of propylene glycol monomethyl ether acetate were added thereto, and 3- (methacryloyloxymethyl) -3-ethyl oxetane was added. 100 parts and 7 parts of pentaerythritol tetrakis (3-mercaptopropionate) (the Sakai Chemical Co., Ltd. make brand name: PEMP) were charged, and nitrogen substitution was carried out as a molecular weight regulator. Then, the mixture was stirred gently to raise the temperature of the reaction solution to 80 ° C., and maintained at this temperature for 5 hours to polymerize, thereby obtaining a resin solution. This resin is referred to as "polymer (f-2)". The weight average molecular weight of polystyrene conversion by the gel permeation chromatography measurement of this polymer was 7,000, and Mw / Mn was 1.7.
합성예 5 Synthesis Example 5
냉각관, 교반기를 구비한 플라스크에 4,4'-아조비스(4-시아노발레르산) 3부, 프로필렌글리콜모노메틸에테르아세테이트 200부를 투입하고, 3-(메타크릴로일옥시메틸)-3-에틸옥세탄 100부, 및 분자량 조절제로서 2,4-디페닐-4-메틸-1-펜텐(닛본 유시(주)제조 상품명: 노프마 MSD) 5부를 투입하고, 질소 치환하였다. 그 후 완만히 교반하여 반응 용액의 온도를 80 ℃로 상승시키고, 이 온도를 5 시간 동안 유지하여 중합함으로써, 수지 용액을 얻었다. 이 수지를 "중합체 (f-3)"이라 한다. 이 중합체의 겔 투과 크로마토그래피 측정에 의한 폴리스티렌 환산 중량평균 분자량은 16,000, Mw/Mn은 2.8이었다. Into a flask equipped with a cooling tube and a stirrer, 3 parts of 4,4'-azobis (4-cyano valeric acid) and 200 parts of propylene glycol monomethyl ether acetate were added thereto, and 3- (methacryloyloxymethyl) -3 was added. 100 parts of ethyl oxetane and 5 parts of 2,4-diphenyl-4-methyl-1-pentene (Nipbon Yushi Co., Ltd. product name: Nova MSD) were added and nitrogen-substituted. Then, the mixture was stirred gently to raise the temperature of the reaction solution to 80 ° C., and maintained at this temperature for 5 hours to polymerize, thereby obtaining a resin solution. This resin is referred to as "polymer (f-3)". Polystyrene conversion weight average molecular weight by the gel permeation chromatography measurement of this polymer was 16,000, and Mw / Mn was 2.8.
합성예 6 Synthesis Example 6
냉각관, 교반기를 구비한 플라스크에 2,2'-아조비스이소부티로니트릴 3부, 프로필렌글리콜모노메틸에테르아세테이트 200부를 투입하고, 4-[3-(3-에틸옥세탄-3-일메톡시)프로폭시]스티렌 100부, 및 분자량 조절제로서 2,4-디페닐-4-메틸-1-펜텐(닛본 유시(주)제조 상품명: 노프마 MSD) 5부를 투입하고, 질소 치환하였다. 그 후 완만히 교반하여 반응 용액의 온도를 80 ℃로 상승시키고, 이 온도를 5 시간 동 안 유지하여 중합함으로써, 수지 용액을 얻었다. 이 수지를 "중합체 (f-4)"라 한다. 이 중합체의 겔 투과 크로마토그래피 측정에 의한 폴리스티렌 환산 중량평균 분자량은 11,000, Mw/Mn 은 2.6이었다. 3 parts of 2,2'- azobisisobutyronitrile and 200 parts of propylene glycol monomethyl ether acetates were put into the flask equipped with a cooling tube and the stirrer, and 4- [3- (3-ethyloxetane-3-ylmethoxy ) Propoxy] styrene 100 parts and 5 parts of 2, 4- diphenyl- 4-methyl- 1-pentene (The Nippon Yushi Co., Ltd. make brand name: Nova MSD) were prepared, and it substituted with nitrogen. Then, the mixture was stirred gently to raise the temperature of the reaction solution to 80 ° C., and this resin was maintained for 5 hours to polymerize to obtain a resin solution. This resin is referred to as "polymer (f-4)". Polystyrene conversion weight average molecular weight by gel permeation chromatography measurement of this polymer was 11,000, and Mw / Mn was 2.6.
합성예 7 Synthesis Example 7
냉각관, 교반기를 구비한 플라스크에 2,2'-아조비스이소부티로니트릴 3부, 프로필렌글리콜모노메틸에테르아세테이트 200부를 투입하고, 3-(메타크릴로일옥시메틸)-3-에틸옥세탄 95부, 벤질메타크릴레이트 5부, 및 분자량 조절제로서 펜타에리트리톨테트라키스(3-메르캅토프로피오네이트)(사카이 가가꾸 고교(주)제조 상품명: PEMP) 7부를 투입하고, 질소 치환하였다. 그 후 완만히 교반하여 반응 용액의 온도를 80 ℃로 상승시키고, 이 온도를 5 시간 동안 유지하여 중합함으로써, 수지 용액을 얻었다. 이 수지를 "중합체 (f-5)"라 한다. 이 중합체의 겔 투과 크로마토그래피 측정에 의한 폴리스티렌 환산 중량평균 분자량은 7,000, Mw/Mn은 1.7이었다. Into a flask equipped with a cooling tube and a stirrer, 3 parts of 2,2'-azobisisobutyronitrile and 200 parts of propylene glycol monomethyl ether acetate were added thereto, and 3- (methacryloyloxymethyl) -3-ethyl oxetane was added. 95 parts, benzyl methacrylate 5 parts, and 7 parts of pentaerythritol tetrakis (3-mercapto propionate) (A Sakai Chemical Co., Ltd. make brand name: PEMP) as a molecular weight modifier were thrown in, and nitrogen-substituted. Then, the mixture was stirred gently to raise the temperature of the reaction solution to 80 ° C., and maintained at this temperature for 5 hours to polymerize, thereby obtaining a resin solution. This resin is referred to as "polymer (f-5)". The weight average molecular weight of polystyrene conversion by the gel permeation chromatography measurement of this polymer was 7,000, and Mw / Mn was 1.7.
합성예 8 Synthesis Example 8
냉각관, 교반기를 구비한 플라스크에 2,2'-아조비스이소부티로니트릴 3부, 프로필렌글리콜모노메틸에테르아세테이트 200부를 투입하고, 3-(메타크릴로일옥시메틸)-3-에틸옥세탄 90부, 벤질메타크릴레이트 10부, 및 분자량 조절제로서 펜타에리트리톨테트라키스(3-메르캅토프로피오네이트)(사카이 가가꾸 고교(주)제조 상품명: PEMP) 7부를 투입하고, 질소 치환하였다. 그 후 완만히 교반하여 반응 용액의 온도를 80 ℃로 상승시키고, 이 온도를 5 시간 동안 유지하여 중합함으로써, 수지 용액을 얻었다. 이 수지를 "중합체 (f-6)"이라 한다. 이 중합체의 겔 투과 크로마토그래피 측정에 의한 폴리스티렌 환산 중량평균 분자량은 7,000, Mw/Mn은 1.7이었다. Into a flask equipped with a cooling tube and a stirrer, 3 parts of 2,2'-azobisisobutyronitrile and 200 parts of propylene glycol monomethyl ether acetate were added thereto, and 3- (methacryloyloxymethyl) -3-ethyl oxetane was added. 90 parts, 10 parts of benzyl methacrylates, and 7 parts of pentaerythritol tetrakis (3-mercaptopropionate) (the Sakai Chemical Co., Ltd. make brand name: PEMP) as a molecular weight regulator were thrown in, and nitrogen-substituted. Then, the mixture was stirred gently to raise the temperature of the reaction solution to 80 ° C., and maintained at this temperature for 5 hours to polymerize, thereby obtaining a resin solution. This resin is called "polymer (f-6)". The weight average molecular weight of polystyrene conversion by the gel permeation chromatography measurement of this polymer was 7,000, and Mw / Mn was 1.7.
합성예 9Synthesis Example 9
냉각관, 교반기를 구비한 플라스크에 2,2'-아조비스이소부티로니트릴 3부, 프로필렌글리콜모노메틸에테르아세테이트 200부를 투입하고, 3-(메타크릴로일옥시메틸)-3-에틸옥세탄 80부, 벤질메타크릴레이트 20부, 및 분자량 조절제로서 펜타에리트리톨테트라키스(3-메르캅토프로피오네이트)(사카이 가가꾸 고교(주)제조 상품명: PEMP) 7부를 투입하고, 질소 치환하였다. 그 후 완만히 교반하여 반응 용액의 온도를 80 ℃로 상승시키고, 이 온도를 5 시간 동안 유지하여 중합함으로써, 수지 용액을 얻었다. 이 수지를 "중합체 (f-7)"이라 한다. 이 중합체의 겔 투과 크로마토그래피 측정에 의한 폴리스티렌 환산 중량평균 분자량은 7,000, Mw/Mn은 1.7이었다. Into a flask equipped with a cooling tube and a stirrer, 3 parts of 2,2'-azobisisobutyronitrile and 200 parts of propylene glycol monomethyl ether acetate were added thereto, and 3- (methacryloyloxymethyl) -3-ethyl oxetane was added. 80 parts, 20 parts of benzyl methacrylates, and 7 parts of pentaerythritol tetrakis (3-mercaptopropionate) (the Sakai Chemical Co., Ltd. make brand name: PEMP) as a molecular weight regulator were thrown in, and nitrogen-substituted. Then, the mixture was stirred gently to raise the temperature of the reaction solution to 80 ° C., and maintained at this temperature for 5 hours to polymerize, thereby obtaining a resin solution. This resin is referred to as "polymer (f-7)". The weight average molecular weight of polystyrene conversion by the gel permeation chromatography measurement of this polymer was 7,000, and Mw / Mn was 1.7.
합성예 10Synthesis Example 10
냉각관, 교반기를 구비한 플라스크에 2,2'-아조비스이소부티로니트릴 3부, 프로필렌글리콜모노메틸에테르아세테이트 200부를 투입하고, 3-(메타크릴로일옥시메틸)-3-에틸옥세탄 70부, 벤질메타크릴레이트 30부, 및 분자량 조절제로서 펜타에리트리톨테트라키스(3-메르캅토프로피오네이트)(사카이 가가꾸 고교(주)제조 상품명: PEMP) 7부를 투입하고, 질소 치환하였다. 그 후 완만히 교반하여 반응 용액의 온도를 80 ℃로 상승시키고, 이 온도를 5 시간 동안 유지하여 중합함으로써, 수지 용액을 얻었다. 이 수지를 "중합체 (f-8)"이라 한다. 이 중합체의 겔 투과 크로마토그래피 측정에 의한 폴리스티렌 환산 중량평균 분자량은 7,000, Mw/Mn은 1.7이었다. Into a flask equipped with a cooling tube and a stirrer, 3 parts of 2,2'-azobisisobutyronitrile and 200 parts of propylene glycol monomethyl ether acetate were added thereto, and 3- (methacryloyloxymethyl) -3-ethyl oxetane was added. 70 parts of benzyl methacrylate and 30 parts of benzyl methacrylate and 7 parts of pentaerythritol tetrakis (3-mercaptopropionate) (the Sakai Chemical Co., Ltd. make brand name: PEMP) were prepared, and it substituted by nitrogen. Then, the mixture was stirred gently to raise the temperature of the reaction solution to 80 ° C., and maintained at this temperature for 5 hours to polymerize, thereby obtaining a resin solution. This resin is called "polymer (f-8)". The weight average molecular weight of polystyrene conversion by the gel permeation chromatography measurement of this polymer was 7,000, and Mw / Mn was 1.7.
비교 합성예 2 Comparative Synthesis Example 2
냉각관, 교반기를 구비한 플라스크에 2,2'-아조비스이소부티로니트릴 3부, 프로필렌글리콜모노메틸에테르아세테이트 200부를 투입하고, 3-(메타크릴로일옥시메틸)-3-에틸옥세탄 60부, 벤질메타크릴레이트 40부, 및 분자량 조절제로서 펜타에리트리톨테트라키스(3-메르캅토프로피오네이트)(사카이 가가꾸 고교(주)제조 상품명: PEMP) 7부를 투입하고, 질소 치환하였다. 그 후 완만히 교반하여 반응 용액의 온도를 80 ℃로 상승시키고, 이 온도를 5 시간 동안 유지하여 중합함으로써, 수지 용액을 얻었다. 이 수지를 "중합체 (f-9)"라 한다. 이 중합체의 겔 투과 크로마토그래피 측정에 의한 폴리스티렌 환산 중량평균 분자량은 7,000, Mw/Mn은 1.7이었다. Into a flask equipped with a cooling tube and a stirrer, 3 parts of 2,2'-azobisisobutyronitrile and 200 parts of propylene glycol monomethyl ether acetate were added thereto, and 3- (methacryloyloxymethyl) -3-ethyl oxetane was added. 60 parts, 40 parts of benzyl methacrylates, and 7 parts of pentaerythritol tetrakis (3-mercaptopropionate) (the Sakai Chemical Co., Ltd. make brand name: PEMP) as a molecular weight modifier were thrown in, and nitrogen-substituted. Then, the mixture was stirred gently to raise the temperature of the reaction solution to 80 ° C., and maintained at this temperature for 5 hours to polymerize, thereby obtaining a resin solution. This resin is referred to as "polymer (f-9)". The weight average molecular weight of polystyrene conversion by the gel permeation chromatography measurement of this polymer was 7,000, and Mw / Mn was 1.7.
안료 분산액의 제조Preparation of Pigment Dispersion
제조예 1Preparation Example 1
(A) 착색제로서 C.I. 피그먼트 레드 254/C.I. 피그먼트 레드 242/C.I. 피그먼트 옐로우 139=45/30/25(질량비)의 혼합물 20부, 분산제로서 (b-1) 5부(고형분 환산), 용매로서 프로필렌글리콜모노메틸에테르아세테이트 75부를 비드밀에 의해 처리하여 안료 분산액 (R)을 제조하였다. (A) As a coloring agent, C.I. Pigment Red 254 / C.I. Pigment Red 242 / C.I. Pigment Yellow 139 = 45/30/25 (mass ratio) 20 parts of a mixture, (b-1) 5 parts (solid content conversion) as a dispersing agent, 75 parts of propylene glycol monomethyl ether acetate as a solvent are processed by the bead mill, pigment dispersion liquid (R) was prepared.
제조예 2Preparation Example 2
(A) 착색제로서 C.I. 피그먼트 그린 58/C.I. 피그먼트 옐로우 150=50/50 (질량비)의 혼합물 20부, 분산제로서 (b-2) 5부(고형분 환산), 용매로서 프로필렌글리콜모노메틸에테르아세테이트 75부를 비드밀에 의해 처리하여 안료 분산액 (S)를 제조하였다. (A) As a coloring agent, C.I. Pigment Green 58 / C.I. Pigment Yellow 150 parts of a mixture of 150 = 50/50 (mass ratio), 5 parts (in terms of solids) (b-2) as a dispersant, and 75 parts of propylene glycol monomethyl ether acetate as a solvent were treated with a bead mill to give a pigment dispersion (S ) Was prepared.
제조예 3Preparation Example 3
(A) 착색제로서 C.I. 피그먼트 그린 58/C.I. 피그먼트 옐로우 150=50/50(질량비)의 혼합물 20부, 분산제로서 (b-3) 5부(고형분 환산), 용매로서 프로필렌글리콜모노메틸에테르아세테이트 75부를 비드밀에 의해 처리하여 안료 분산액 (T)를 제조하였다. (A) As a coloring agent, C.I. Pigment Green 58 / C.I. Pigment Yellow 150 parts of a mixture of 150 = 50/50 (mass ratio), 20 parts (b-3) (solid content conversion) as a dispersant, and 75 parts of propylene glycol monomethyl ether acetate as a solvent were treated with a bead mill to give a pigment dispersion (T ) Was prepared.
실시예 1Example 1
안료 분산액 (R) 100부, 알칼리 가용성 수지 (c-1) 용액 10부(고형분 환산), 중합체 (f-1) 용액 3부(고형분 환산), (D) 다관능성 단량체로서 (d-1) 17부, (E) 광중합 개시제로서 (e-1) 5부와 (e-4) 3부, 용매로서 프로필렌글리콜모노메틸에테르아세테이트를 혼합하여 고형분 농도 25%의 액상 조성물 (R-1)을 제조하였다. 100 parts of the pigment dispersion (R), 10 parts of the alkali-soluble resin (c-1) solution (solid content conversion), 3 parts of the polymer (f-1) solution (solid content conversion), (D) as a polyfunctional monomer (d-1) 17 parts, (E) 5 parts of (e-1) as a photoinitiator, (e-4) 3 parts, and propylene glycol monomethyl ether acetate as a solvent were mixed and the liquid composition (R-1) of 25% of solid content concentration was manufactured. It was.
액상 조성물 (R-1)에 대해서 하기의 절차에 따라서 패턴을 형성하여 평가를 행하였다. 평가 결과를 하기 표 3에 나타낸다. The liquid composition (R-1) was evaluated by forming a pattern according to the following procedure. The evaluation results are shown in Table 3 below.
패턴의 형성Formation of patterns
액상 조성물 (R-1)을 유리 기판의 표면 상에 스핀 코터를 이용하여 도포한 후, 90 ℃에서 4 분간 예비-베이킹을 행하여 막 두께 1.3 ㎛의 도막을 형성하였다. 이어서, 이 기판 3매를 실온에 냉각하고, 각 기판 상의 도막에 고압 수은 램프를 이용하여, 포토마스크를 통해 각 기판 상의 도막에 2,000 J/㎡의 노광량으로 노광하였다. 이어서, 각 기판 상의 도막에 23 ℃의 0.04% 수산화칼륨 수용액을 현상압 1 kgf/㎠(노즐 직경 1 mm)로 토출함으로써, 샤워 현상을 행한 후, 220 ℃, 또는 180 ℃에서 30 분간 후-베이킹을 행하여 200×200 ㎛의 도트 패턴을 형성하였다. After apply | coating a liquid composition (R-1) on the surface of a glass substrate using a spin coater, it pre-baked at 90 degreeC for 4 minutes, and formed the coating film with a film thickness of 1.3 micrometers. Subsequently, three board | substrates were cooled to room temperature, and it exposed to the coating film on each board | substrate by the exposure amount of 2,000 J / m <2> through the photomask using the high pressure mercury lamp for the coating film on each board | substrate. Subsequently, after showering by discharging a 0.04% potassium hydroxide aqueous solution of 23 ° C. at a developing pressure of 1 kgf / cm 2 (nozzle diameter of 1 mm) to the coating films on the substrates, post-baking was performed at 220 ° C. or 180 ° C. for 30 minutes. To form a 200 x 200 탆 dot pattern.
내용제성 평가Solvent resistance evaluation
220 ℃ 또는 180 ℃에서 30 분간 후-베이킹을 행하여 제조한 기판 3매씩을 각각 25 ℃의 N-메틸피롤리돈(하기 표 3 및 4에서는 "NMP"라 함), 18% HCl 수용액(표 3 및 4에서는 "HCl"이라 함) 또는 5% KOH 수용액(표 3 및 4에서는 "KOH"라 함)에 각각 30 분간 침지하고, 침지 전후의 도트 패턴을 주사형 전자 현미경으로 관찰하였다. 그리고 패턴이 양호하게 형성되고, 침지 전후에서의 막 두께비(침지 후의 막 두께×100/침지 전의 막 두께)가 95% 이상인 경우를 A, 침지 전후에서의 막 두께비가 95% 미만이거나, 또는 패턴의 일부에 결함이 인지되는 경우를 B, 침지 후에 패턴이 전부 기판으로부터 박리되는 경우를 C로 하여 평가하였다. Three substrates prepared by post-baking at 220 ° C. or 180 ° C. for 30 minutes were each N-methylpyrrolidone (referred to as “NMP” in Tables 3 and 4) at 25 ° C., and an aqueous 18% HCl solution (Table 3 And immersion in 5% aqueous KOH solution (referred to as "KOH" in Tables 3 and 4) for 30 minutes, respectively, and the dot pattern before and after immersion was observed with the scanning electron microscope. And when the pattern is formed satisfactorily and the film thickness ratio (film thickness after immersion x 100 / film thickness before immersion) before and after dipping is 95% or more, the film thickness ratio before and after dipping is less than 95%, or The case where a defect was recognized by one part was evaluated as B and the case where all the patterns peeled from a board | substrate after immersion is C.
밀착성 평가Adhesion Evaluation
액상 조성물 (R-1)을 유리 기판의 표면 상에 스핀 코터를 이용하여 도포한 후, 90 ℃에서 4 분간 예비-베이킹을 행하여 막 두께 1.3 ㎛의 도막을 형성하였다. 이어서, 이 기판을 실온에 냉각한 후, 고압 수은 램프를 이용하여, 도막에 2,000 J/㎡의 노광량으로 노광하였다. 이어서, 도막에 23 ℃의 0.04% 수산화칼륨 수용액을 현상압 1 kgf/㎠(노즐 직경 1 mm)로 토출함으로써, 샤워 현상을 행한 후, 180 ℃에서 30 분간 후-베이킹을 행하였다. 이어서, JIS K5400 규격에 따라, 도막을 100개의 격자상으로 크로스컷트하여 밀착성 시험을 행하였다. 그리고 격자의 박리가 발생하지 않는 경우를 A, 격자 중 1 내지 10개가 박리되는 경우를 B, 격자가 10개보다 많이 박리되는 경우를 C로 하여 평가하였다. After apply | coating a liquid composition (R-1) on the surface of a glass substrate using a spin coater, it pre-baked at 90 degreeC for 4 minutes, and formed the coating film with a film thickness of 1.3 micrometers. Subsequently, after cooling this board | substrate at room temperature, it exposed on the coating film by the exposure amount of 2,000 J / m <2> using the high pressure mercury lamp. Subsequently, after showering was performed by discharging an aqueous 0.04% potassium hydroxide solution at 23 ° C. at a developing pressure of 1 kgf / cm 2 (nozzle diameter of 1 mm), the film was post-baked at 180 ° C. for 30 minutes. Next, in accordance with JIS K5400 standard, the coating film was cross-cut into 100 grid | lattices, and the adhesive test was done. And the case where A peeling does not generate | occur | produce A and the case where 1-10 pieces of a lattice are peeled off were evaluated as B and the case where more than 10 lattice peels.
실시예 2 내지 16Examples 2-16
하기 표 1에 나타내는 배합 성분 및 배합량으로 변경한 것 이외에는, 실시예 1과 동일하게 하여 액상 조성물 (R-2) 내지 (R-16)을 제조하였다. Liquid compositions (R-2) to (R-16) were produced in the same manner as in Example 1, except that the compounding ingredients and the compounding amounts shown in Table 1 were changed.
이어서, 액상 조성물 (R-1) 대신에 각각 액상 조성물 (R-2) 내지 (R-16)을 이용한 것 이외에는, 실시예 1과 동일하게 하여 평가를 행하였다. 평가 결과를 표 3에 나타낸다. Next, it evaluated similarly to Example 1 except having used liquid compositions (R-2)-(R-16) instead of liquid composition (R-1), respectively. Table 3 shows the results of the evaluation.
비교예 1 내지 4Comparative Examples 1 to 4
표 1에 나타내는 배합 성분 및 배합량으로 변경한 것 이외에는, 실시예 1과 동일하게 하여 액상 조성물 (R-17) 내지 (R-20)을 제조하였다. Liquid compositions (R-17) to (R-20) were produced in the same manner as in Example 1, except that the compounding ingredients and the compounding amounts shown in Table 1 were changed.
이어서, 액상 조성물 (R-1) 대신에 각각 액상 조성물 (R-17) 내지 (R-20)을 이용한 것 이외에는, 실시예 1과 동일하게 하여 평가를 행하였다. 평가 결과를 표 3에 나타낸다. Next, it evaluated similarly to Example 1 except having used liquid compositions (R-17)-(R-20) instead of liquid composition (R-1), respectively. Table 3 shows the results of the evaluation.
실시예 17Example 17
안료 분산액 (S) 100부, 알칼리 가용성 수지 (c-1) 용액 12부(고형분 환산), 중합체 (f-1) 용액 3부(고형분 환산), (D) 다관능성 단량체로서 (d-1) 10부, (E) 광중합 개시제로서 (e-3) 5부와 (e-5) 1부, 용매로서 프로필렌글리콜모노메틸에테르아세테이트를 혼합하여 고형분 농도 25%의 액상 조성물 (S-1)을 제조하였다. 100 parts of the pigment dispersion (S), 12 parts of the alkali-soluble resin (c-1) solution (solid content conversion), 3 parts of the polymer (f-1) solution (solid content conversion), (D) as a polyfunctional monomer (d-1) 10 parts, (E) 5 parts of (e-3) as a photoinitiator, (e-5) 1 part, and propylene glycol monomethyl ether acetate as a solvent are mixed, and the liquid composition (S-1) of 25% of solid content concentration is manufactured. It was.
이어서, 액상 조성물 (R-1) 대신에 액상 조성물 (S-1)을 이용한 것 이외에는, 실시예 1과 동일하게 하여 패턴을 형성하여 평가를 행하였다. 평가 결과를 하기 표 4에 나타낸다. Next, except having used liquid composition (S-1) instead of liquid composition (R-1), it carried out similarly to Example 1, and formed the pattern and evaluated. The evaluation results are shown in Table 4 below.
실시예 18 내지 32Examples 18-32
하기 표 2에 나타내는 배합 성분 및 배합량으로 변경한 것 이외에는, 실시예 17과 동일하게 하여 액상 조성물 (S-2) 내지 (S-16)을 제조하였다. Liquid compositions (S-2) to (S-16) were produced like Example 17 except having changed into the compounding component and compounding quantity shown in following Table 2.
이어서, 액상 조성물 (R-1) 대신에 각각 액상 조성물 (S-2) 내지 (S-16)을 이용한 것 이외에는, 실시예 1과 동일하게 하여 평가를 행하였다. 평가 결과를 표4에 나타낸다. Next, it evaluated similarly to Example 1 except having used liquid compositions (S-2)-(S-16) instead of liquid composition (R-1), respectively. The evaluation results are shown in Table 4.
비교예 5 내지 9Comparative Examples 5 to 9
표 2에 나타내는 배합 성분 및 배합량으로 변경한 것 이외에는, 실시예 17과 동일하게 하여 액상 조성물 (S-17) 내지 (S-20) 및 (T-1)을 제조하였다. Liquid compositions (S-17) to (S-20) and (T-1) were produced in the same manner as in Example 17, except that the compounding ingredients and the compounding amount shown in Table 2 were changed.
이어서, 액상 조성물 (R-1) 대신에 각각 액상 조성물 (S-17) 내지 (S-20), (T-1)을 이용한 것 이외에는 실시예 1과 동일하게 하여 평가를 행하였다. 평가 결과를 표 4에 나타낸다. Next, it evaluated like Example 1 except having used liquid compositions (S-17)-(S-20) and (T-1) instead of liquid composition (R-1), respectively. The evaluation results are shown in Table 4.
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