KR20070055197A - Semi-transmissive liquid crystal display panel and manufacturing method thereof - Google Patents

Abstract

The present invention relates to a transflective liquid crystal display panel and a method of manufacturing the same. An upper substrate including a light-transmitting groove, a thin film transistor, a lower substrate including a plurality of reflective lens units, and a gap between the upper substrate and the lower substrate. It provides a liquid crystal display panel including a liquid crystal layer, the height of the reflective lens portion provided below the light-transmitting groove is lower than the height of the reflective lens portion of the other region and a manufacturing method thereof. As described above, a reflecting lens portion having a flat lens shape is formed below the light transmitting groove, and the amount of light reflected by the light transmitting groove is increased to improve the reflectance.

LCD, Floodlight, Reflective Lens, Asymmetrical Lens, Reflectance

Description

Semi-transmissive liquid crystal display panel and a method of manufacturing the same {TRANSFLECTIVE TYPE LIQUID CRYSTAL DISPLAY PANEL AND METHOD FOR MANUFACTURING THE SAME}

1 is a cross-sectional conceptual view of a transflective liquid crystal display panel according to the prior art.

2 is a conceptual view for explaining the light reflection of the floodlight according to the prior art.

3 is a conceptual view illustrating a pattern of a reflective lens unit of a liquid crystal display panel according to an exemplary embodiment of the present invention.

4 is a conceptual cross-sectional view of a liquid crystal display panel according to an exemplary embodiment of the present invention.

5A to 5D are cross-sectional conceptual views illustrating a method of manufacturing the upper substrate according to the present embodiment.

6A and 6B are cross-sectional conceptual views for explaining a method of manufacturing a reflective lens unit according to the present embodiment.

7A and 7B are cross-sectional conceptual views for explaining a method for manufacturing an upper substrate according to the present embodiment.

8 is a conceptual view illustrating a pattern of a reflective lens unit of a liquid crystal display panel according to another exemplary embodiment of the present invention.

9 is a conceptual cross-sectional view of a liquid crystal display panel according to another exemplary embodiment of the present invention.

10A and 10B are cross-sectional conceptual views for explaining a method of manufacturing a reflective lens unit according to the present embodiment.

11A and 11B are cross-sectional conceptual views illustrating a method of manufacturing a reflective lens unit according to a modification of the present embodiment.

<Explanation of symbols for the main parts of the drawings>

10, 1000: upper substrate 12, 120: floodlight groove

20, 2000: lower substrate 30, 300: insulating film

40, 400: reflective lens unit

The present invention relates to a semi-transmissive liquid crystal display panel and a method of manufacturing the same, and to a semi-transmissive liquid crystal display panel and a method of manufacturing the same having improved reflectivity by modifying a lens pattern under the reflective groove.

In today's information society, the role of electronic display devices becomes more and more important, and various electronic display devices are widely used in various industrial fields.

In general, an electronic display device refers to a device that transmits various information to a human through vision. In other words, an electronic display device may be defined as an electronic device that converts electrical information signals output from various electronic devices into optical information signals that can be recognized by human eyes, and serves as a bridge that connects humans and electronic devices. It may be defined as.

In such an electronic display device, when an optical information signal is displayed by a light emitting phenomenon, it is called an emissive display device, and when a light modulation is displayed by reflection, scattering, or interference phenomenon, a light receiving display ( It is called a non-emissive display device. The light emitting display device, also called an active display device, includes a cathode ray tube (CRT), a plasma display panel (PDP), a light emitting diode (LED), and an electroluminescent display (electroluminescence display). luminescent display; ELD). In addition, the light receiving display device, which is a passive display device, includes a liquid crystal display (LCD), an electrochemical display (ECD), and an electro phoretic image display (EPID). .

Cathode ray tubes (CRTs) used in image display devices such as televisions and computer monitors occupy the highest share in terms of display quality and economy, but have many disadvantages such as heavy weight, large volume and high power consumption. .

However, due to the rapid progress of semiconductor technology, the electronic display device suitable for the new environment, that is, the thin and light, the low driving voltage and the low power consumption, according to the solidification, low voltage and low power of various electronic devices, and the small size and light weight of electronic devices The demand for flat panel display devices with features is rapidly increasing.

Among the various flat panel display devices currently developed, liquid crystal displays are thinner and lighter than other display devices, have low power consumption and low driving voltage, and are widely used in various electronic devices because they are capable of displaying images close to cathode ray tubes. Is being used.

Such a liquid crystal display may be broadly classified into a transmissive liquid crystal display displaying an image using an internal light source such as a backlight and a reflective liquid crystal display using external incident light such as natural light.

The transmissive liquid crystal display device has a high brightness of the screen because a back light unit is installed on the back and used as its own light source, but it is difficult to apply to a portable device because of high power consumption.

On the other hand, the reflective liquid crystal display displays an image by selectively transmitting natural light incident from the outside by the switching action of the liquid crystal layer and reflecting it back from the reflecting plate to be emitted to the front surface. It has a disadvantage that it is difficult to use in a low brightness and dark place because there is no own light source.

The semi-transmissive liquid crystal display device for solving the shortcomings of the transmissive and reflective liquid crystal display device displays an image by using both the external incident light and the light of the backlight unit. The semi-transmissive liquid crystal display device includes a liquid crystal display panel including an upper substrate and a lower substrate bonded through a sealing material, and a liquid crystal layer injected into a space between the two substrates. In addition, the liquid crystal display includes a polarizer attached to an upper end of the liquid crystal display panel. A lens-shaped reflecting portion is provided inside the liquid crystal display panel, that is, on the lower substrate.

In the case of the transflective liquid crystal display panel, a transmissive groove through which external light is transmitted is formed to improve reflectance. A transflective liquid crystal display panel having such a light transmitting groove will be described below with reference to the drawings.

1 is a cross-sectional conceptual view of a transflective liquid crystal display panel according to the related art.

2 is a conceptual diagram illustrating a light reflection of a light transmitting groove according to the prior art.

Referring to FIGS. 1 and 2, a conventional transflective liquid crystal display panel includes an upper substrate 10 including a color filter layer 11, a light transmitting groove 12, a common electrode 13, and a gate electrode 21. ), A thin film transistor including a gate insulating film 22, an active layer 23, an ohmic contact layer 24, a source electrode 25, and a drain electrode 26, an insulating film 30, and an upper surface of the insulating film 30. It includes a reflective lens portion 40 formed in. The reflective lens unit 40 is formed by forming a plurality of convex lens shapes of the same size on the upper surface of the insulating film 30, and then formed by coating Al or Ag on the upper surface.

In this case, the light transmitting groove 12 is formed to improve the reflectance of the liquid crystal display panel as described above. However, when the light emitting groove 12 is formed, the reflectance is improved, but since the color filter layer 11 is removed in the light transmitting groove 12 as shown in the drawing, color reproducibility is deteriorated. Therefore, there is a problem in that the area of the light transmitting groove 12 cannot be widened more than a predetermined range at present. Therefore, there is a problem in that the reflectance of the device must be improved by making the most of the limited area of the light transmitting groove 12.

However, in the conventional case, as shown, the reflective lens unit 40 reflecting the light is provided under the light-transmitting groove 12, but as shown in FIGS. 1 and 2, the pattern of each reflective lens unit 40 is uniformly manufactured. In addition, the lens pattern of the lower portion of the light-transmitting groove 12 also occurs irregularly. As a result, when light is irradiated through the light emitting groove 12 as shown by the dotted line of FIG. 2, the light is not reflected by the reflective lens unit 40 toward the light emitting groove 12 and is directed to an area other than the light transmitting groove 14. There was a problem of causing diffuse reflection to lower the light reflectance of the liquid crystal display panel.

Accordingly, the present invention is derived to solve the above problems, by adjusting the shape of the reflecting lens portion provided in the lower portion and the adjacent region of the light-transmitting groove to improve the reflectance reflected by the light-transmitting groove to the light-transmitting groove. It is an object of the present invention to provide a transflective liquid crystal display panel and a method of manufacturing the same.

An upper substrate including a light transmitting groove according to the present invention, a thin film transistor, a lower substrate including a plurality of reflective lens parts, and a liquid crystal layer provided between the upper substrate and the lower substrate, and provided below the light transmitting groove. Provided is a liquid crystal display panel in which the height of the reflective lens unit is lower than that of the reflective lens unit in the other region.

In this case, it is preferable that the reflective lens unit provided under the light-transmitting groove is manufactured in a flat lens shape. In addition, it is effective that the width of the reflective lens portion provided below the light transmitting groove is wider than the width of the reflective lens portion of the other region.

Here, when the width of the light emitting groove is set to 1, the maximum width of the firing lens unit provided below the light emitting groove is preferably 0.6 to 1, and the maximum height is preferably 0.01 to 0.5.

The above-described reflective lens part of the other area may have an asymmetric lens shape in which the top part is biased from the center thereof to the light transmitting groove area. The reflective lens portion of the other region may have a convex micro lens shape, and the reflective lens portion of the region adjacent to the lower side of the light transmitting groove among the reflective lens portions of the other region may have an asymmetric lens shape in which the top portion is biased from the center thereof to the light transmitting groove region. It may be.

The lower substrate is divided into a light transmitting area and a reflecting area, the reflecting area surrounds the light transmitting area in a closed curve shape, the reflecting lens part is formed in the reflecting area, and a part of the reflecting area and the light transmitting groove overlap. It is preferable.

Further, an upper substrate including a light transmitting groove according to the present invention, a thin film transistor, a lower substrate including a plurality of reflective lens units, and a liquid crystal layer provided between the upper substrate and the lower substrate, the lower side of the light transmitting groove The reflective lens portion of the region adjacent to the top provides a liquid crystal display panel in which the top portion is biased from its center to the light transmitting groove region.

Here, it is preferable that the height of the reflective lens portion provided below the light emitting groove is lower than the height of the reflective lens portion in an area adjacent to the bottom of the light transmitting groove. In addition, it is effective that the width of the reflective lens portion provided below the light transmitting groove is wider than the width of the reflective lens portion of the other region.

In addition, preparing an upper substrate provided with a light-transmitting groove between the color filter layer according to the present invention, preparing a thin film transistor, a lower substrate formed with a reflective lens portion, and a liquid crystal layer between the upper substrate and the lower substrate The forming of the lower substrate may include forming a thin film transistor on a transparent insulating substrate, applying an organic insulating film on the thin film transistor, and patterning a portion of the organic insulating film. Forming a microlens pattern, wherein the height of the microlens pattern of the region is formed below the floodlight groove to be higher than the height of the microlens pattern of the other region, and a reflective material is formed on the microlens pattern by forming a reflective material It provides a method for manufacturing a liquid crystal display panel comprising a step.

In this case, the forming of the microlens pattern by patterning a portion of the organic insulating layer may include a light blocking region for forming a plurality of patterns on the organic insulating layer and a light transmitting region separating the pattern from the light emitting groove. Placing a plurality of masks formed with a plurality of light-transmitting portion in the corresponding light-shielding area, and forming a plurality of irregularities pattern through a photolithography process using the mask, the height of the uneven pattern corresponding to the light-emitting groove is the uneven pattern of the other region It is preferable to include the step of making the height lower than the, and the step of changing the concave-convex pattern into a micro lens pattern by performing a reflow process.

In addition, preparing an upper substrate provided with a light-transmitting groove between the color filter layer according to the present invention, preparing a thin film transistor, a lower substrate formed with a reflective lens portion, and a liquid crystal layer between the upper substrate and the lower substrate The forming of the lower substrate may include forming a thin film transistor on a transparent insulating substrate, applying an organic insulating film on the thin film transistor, and patterning a portion of the organic insulating film. Forming a microlens pattern, wherein the top of the microlens pattern of the lower part of the light emitting groove and the adjacent area is biased from the center thereof to the light transmitting groove area; and forming a reflective material on the microlens pattern to form a reflective lens part. It provides a method for manufacturing a liquid crystal display panel comprising the step.

The forming of the microlens pattern by patterning a portion of the organic insulating layer may include: a light blocking region for forming a plurality of patterns on the organic insulating layer and a light transmitting region separating the pattern between the light emitting grooves; Arranging a mask having a plurality of light-transmitting portions formed in an outer portion of the light-shielding area corresponding to an adjacent area, and forming a plurality of uneven patterns through a photolithography process using the mask, wherein unevenness corresponding to the light-emitting groove and the adjacent area is formed. It is preferable to include the step of forming a step in the pattern, and the step of changing the concave-convex pattern into a micro lens pattern by performing a reflow process.

In addition, preparing an upper substrate provided with a light-transmitting groove between the color filter layer according to the present invention, preparing a thin film transistor, a lower substrate formed with a reflective lens portion, and a liquid crystal layer between the upper substrate and the lower substrate The forming of the lower substrate may include forming a thin film transistor on a transparent insulating substrate, applying an organic insulating film on the thin film transistor, and patterning a portion of the organic insulating film. A microlens pattern is formed, wherein the height of the microlens pattern of the region below the light emitting groove is better than the height of the microlens pattern of the other region, and the top of the microlens pattern of the lower region of the light emitting groove and the adjacent region is formed from the center thereof. Biasing into a light-transmitting groove area, and reflecting onto the micro lens pattern A method of manufacturing a liquid crystal display panel including forming a material to form a reflective lens unit is provided.

The forming of the microlens pattern by patterning a portion of the organic insulating layer may include a light blocking region for forming a plurality of patterns on the organic insulating layer and a light transmitting region separating the patterns, and corresponding to the light transmitting groove. Disposing a mask having a plurality of first light-transmitting portions formed in the light-shielding region, and forming a plurality of second light-transmitting portions in an outer portion of the light-shielding region corresponding to the light-transmitting groove and the adjacent region; Form a plurality of irregularities through the through, so that the height of the concave-convex pattern corresponding to the light-emitting groove is lower than the height of the concave-convex pattern of the other region, so that a step is formed in the concave-convex pattern corresponding to the light-emitting groove and the adjacent region. And changing the concave-convex pattern into a micro lens pattern by performing a reflow process. It is preferable to.

Hereinafter, with reference to the accompanying drawings will be described an embodiment of the present invention in more detail. However, the present invention is not limited to the embodiments disclosed below, but will be implemented in various forms, and only the embodiments are intended to complete the disclosure of the present invention, and to those skilled in the art to fully understand the scope of the invention. It is provided to inform you.

In the drawings, the thickness of layers, films, panels, regions, etc., may be exaggerated for clarity, and like reference numerals designate like elements. In addition, when a part such as a layer, a film, an area, or a plate is expressed as being on or above another part, not only when each part is directly above or directly above the other part but also another part between each part and another part This includes cases.

3 is a conceptual view illustrating a pattern of a reflective lens unit of a liquid crystal display panel according to an exemplary embodiment of the present invention.

Referring to FIG. 3, the reflective lens unit 401 provided under the light-transmitting groove 120 is manufactured in a shape in which the maximum height thereof is smaller than the maximum width. That is, the width of the reflective lens unit 400 is increased, and the reflection angle thereof is reduced. The reflective lens unit 402 of the region adjacent thereto is formed to have a maximum height higher than the maximum height of the reflective lens unit 401 provided under the light-transmitting groove 120.

The maximum width of the reflective lens unit 401 provided below the light transmitting groove 120 is preferably 0.6 to 1 when the width of the light transmitting groove 120 is 1. In this case, the maximum height of the reflective lens unit 401 provided below the light transmitting groove 120 may be 0.01 to 0.5. On the other hand, the maximum height of the reflective lens unit 402 in the area adjacent thereto is preferably 0.5 to 10.

As shown in the drawing, the reflective lens unit 401 provided under the light-transmitting groove 120 is formed in a flat shape, and the reflective lens unit 402 provided in the adjacent area is formed in a protruding shape. When light is irradiated through the light emitting groove 120 in the same direction as the dotted lines A and B of FIG. 3, the light transmitting groove is formed by the flat reflective lens unit 401 provided under the light transmitting groove 120. In the direction of 120). This is because the reflective lens unit 401 provided below the light-transmitting groove 120 has a function similar to that of a flat mirror to reflect the light incident to the light-transmitting groove 120 in the direction of the light-transmitting groove 120. In addition, when light is irradiated through the light transmitting groove 120 in the same direction as the dotted lines C and D of FIG. 3, light is transmitted by the protruding reflective lens unit 402 provided in an area adjacent to the light transmitting groove 120. By reflecting light toward the groove 120, the light reflectance may be improved. In addition, the width of the reflective lens unit 401 provided under the light-transmitting groove 120 is preferably formed to be wider than the width of the reflective lens unit 402 provided in the other region. This is because the larger the width of the reflective lens unit 400 can reflect the irradiated light in the irradiation direction.

Hereinafter, the liquid crystal display panel according to the present exemplary embodiment having the reflective lens unit having the above-described structure will be described.

4 is a conceptual cross-sectional view of a liquid crystal display panel according to an exemplary embodiment of the present invention.

Referring to FIG. 4, the liquid crystal display panel according to the present exemplary embodiment includes an upper substrate 1000 having a light transmitting groove 120, a lower substrate 2000 on which a plurality of reflective lens units 400 are formed, and the upper substrate ( And a liquid crystal layer (not shown) provided between the 1000 and the lower substrate 2000. At this time, the height of the reflective lens unit 401 provided below the light-transmitting groove 120 is manufactured to be lower than the height of the reflective lens unit 402 of the other region.

The upper substrate 1000 refers to a curly filter substrate on which the color filter layer 110 is formed. The color filter layer 110 is formed on the transparent insulating substrate 100, and a light transmitting groove is formed between the color filter layers 110. 120) is formed. The overcoat layer 130 may be formed on the color filter layer 110, and the transparent electrode layer 140 may be formed on the overcoat layer 130. In this case, the over code layer 130 may not be formed on the upper substrate 1000. The light transmitting groove 120 may be formed to overlap a portion of the reflective lens unit 400 formed on the lower substrate 2000.

The lower substrate 2000 refers to a thin film transistor substrate on which a thin film transistor is formed. A thin film transistor connected to a gate line (not shown) and a source line (not shown) is formed, and an organic insulating layer is formed on the thin film transistor. 300 is coated and a plurality of reflective lens units 400 are provided on at least a portion of the insulating layer 300.

The lower substrate 2000 is defined as a light transmitting region and a reflecting region, and the reflecting region is formed to surround the light transmitting region in a closed curve shape. Such a reflection area preferably occupies an area of 10 to 50% of the pixel area. It is effective to form the plurality of reflective lens parts 400 on the reflective area. In addition, the light transmitting groove 120 is preferably formed in an area corresponding to an area of about 10 to 50% of the reflective area.

The reflective lens unit 400 is manufactured in the form of a convex micro lens, but the height T1 of the reflective lens unit 401 provided under the light-transmitting groove 120 of the upper substrate 1000 is the reflective lens unit 402 provided in another region. The light emission rate of the liquid crystal display panel may be improved by reflecting the light irradiated to the light emitting groove 120 toward the light emitting groove 120 by being formed lower than the height T2. In this case, the reflective lens unit 400 may serve as a pixel electrode, or a separate pixel electrode may be formed on the insulating layer 300. When using the reflective lens unit 400 as a pixel electrode, a separate contact hole (not shown) may be formed to connect the reflective lens unit 400 and the drain terminal 260 of the thin film transistor. .

Hereinafter, a method of manufacturing the liquid crystal display panel described above with reference to the drawings.

5A through 5D are cross-sectional conceptual views illustrating a method of manufacturing the upper substrate according to the present embodiment, and FIGS. 6A and 6B are cross-sectional conceptual views illustrating a method of manufacturing the reflective lens unit according to the present embodiment.

Referring to FIG. 5A, a first conductive layer is formed on a transparent insulating substrate, and then the gate electrode 210, the gate line (not shown), and the storage layer are formed through a photolithography process using a first photoresist mask pattern (not shown). Wiring (not shown) is formed.

First, a first conductive film is formed on a transparent insulating substrate by a deposition method using a CVD method, a PVD method, a sputtering method, or the like. At least one of Cr, MoW, Cr / Al, Cu, Al (Nd), Mo / Al, Mo / Al (Nd), Cr / Al (Nd), and Mo / Al / Mo is used as the first conductive film. It is preferable to Of course, the present invention is not limited thereto, and as described above, the first conductive layer may be formed of at least one metal of Al, Nd, Ag, Cr, Ti, Ta, and Mo, or an alloy containing them, but may be formed as a single layer or a multilayer. Can be. After forming the first conductive film on the entire substrate as described above, the photosensitive film is coated, and then a lithography process using the first mask is performed to form the first photosensitive film mask pattern. An etching process using the first photoresist mask pattern as an etching mask may be performed to form a plurality of gate lines, a gate electrode 210, and a plurality of sustain electrode lines. Thereafter, a predetermined strip process is performed to remove the first photoresist mask pattern.

Referring to FIG. 5B, the gate insulating layer 220, the active layer 230, and the ohmic contact layer 240 are sequentially formed on the entire structure shown in FIG. 5A, and then a second photoresist mask pattern (not shown) is used. An etching process is performed to form an active region of the thin film transistor.

The gate insulating film 220 is formed on the entire substrate through a deposition method using PECVD, sputtering, or the like. In this case, it is preferable to use an insulating material including silicon oxide or silicon nitride as the gate insulating film 220. The active layer 230 and the ohmic contact layer 240 are sequentially formed on the gate insulating layer 220 through the above-described deposition method. An amorphous silicon layer is used as the active layer 230, and an amorphous silicon layer doped with a high concentration of silicide or N-type impurities is used as the ohmic contact layer 240. Thereafter, a photoresist film is coated on the ohmic contact layer 240, and then a second photoresist mask pattern is formed through a photolithography process using a second mask. An etching process using the second photoresist mask pattern as an etch mask and the gate insulating layer 220 as an etch stop layer is performed to remove the ohmic contact layer 240 and the active layer 230, thereby forming an upper portion of the gate electrode 210. To form an active region. Thereafter, a predetermined strip process is performed to remove the remaining second photoresist mask pattern.

In this case, it is preferable that the gate insulating layer 220 is formed to have a thickness of 1000 to 5000 GPa, the active layer 230 is formed to have a thickness of 500 to 2000 GPa, and the ohmic contact layer 240 is formed to have a thickness of 300 to 600 GPa.

Referring to FIG. 5C, a second conductive film is formed on the entire structure shown in FIG. 5B, and then an etching process is performed using a third photoresist mask pattern (not shown) to form the source and drain electrodes 250 and 260 and the source. A line (not shown) is formed.

The second conductive film is formed on the entire substrate through a deposition method using a CVD method, a PVD method, a sputtering method, or the like. At this time, it is preferable to use at least one metal single layer or multiple layers of Mo, Al, Cr, Ti as the second conductive film. Of course, the same material as that of the first conductive film may be used for the second conductive film. It is effective to deposit a 2nd electroconductive film in the thickness of 1000 micrometers-3000 micrometers. Thereafter, a photosensitive film is coated on the second conductive film, and then a lithography process using a mask is performed to form a third photosensitive film mask pattern. The second conductive layer is etched by performing an etching process using the third photoresist mask pattern as an etch mask, and then the third photoresist mask pattern is removed, followed by etching using the etched second conductive layer as an etch mask. The ohmic contact layer 240 in the exposed region between the depositions is removed to form a channel including the active layer 230 between the source electrode 250 and the drain electrode 260. Here, the ohmic contact layer 240 may be removed without removing the third photoresist mask pattern to expose the active layer 230 between the source electrode 250 and the drain electrode 260. At this time, the etching process is performed by wet etching first to remove the second conductive layer in the region where the third photoresist mask pattern is not formed, and to perform the dry etching process to remove the ohmic contact layer 240. In addition, an ashing process using an O ₂ plasma may be performed between the wet etching and the dry etching to remove the third photoresist pattern.

Referring to FIG. 5D, an insulating film 300 is formed on the entire structure of FIG. 5C, a portion of the insulating film 300 is patterned, and then an upper reflective lens part 400 is formed, but the lower side of the through groove 120 is formed. The height of the reflective lens unit 401 in the region is lower than that of the reflective lens unit 402 in the other region. In this case, it is preferable to use an organic insulating film containing a photosensitive acrylic resin as the insulating film 300.

The reflective lens unit 400 applies the organic insulating layer 300 as shown in FIG. 6A and then places the microlens forming mask 500 on the organic insulating layer 300. In this case, the mask 500 includes a light shielding region where a lens is formed and a light transmitting region separating the lens, and in particular, a plurality of light transmitting regions for light transmission are provided in the light shielding region corresponding to the light transmitting groove 120. . Subsequently, when the photolithography process is performed using the mask 500, the separation region between the lenses is exposed, and the remaining region is shielded to form an uneven panel on the organic insulating layer 300. At this time, the region corresponding to the lower side of the light-transmitting groove 120 is subjected to slit or halftone exposure to produce an uneven pattern having a lower step than the peripheral region as shown in the drawing.

Thereafter, the organic insulating layer is hard baked for the purpose of reflow, outgassing and solvent removal. Thereafter, curing is performed at a temperature of about 200 degrees or more to cure and stabilize the organic insulating layer 300. Here, when the organic insulating layer 300 is reflowed through the hard baking and curing processes described above, the concave-convex pattern flows and deforms into a convex micro lens shape as shown in FIG. 6B. At this time, the inclination of the micro lens may be adjusted by adjusting the hard baking process and the curing process conditions. Here, the inclination refers to the inclinations θ1 and θ2 formed by a line connecting two points of the minimum height of the reflective lens unit 400 and a line connecting one point of the minimum height and one point of the highest height.

Subsequently, a reflective material including Al or Ag is formed on the organic insulating layer 300 having the microlens-shaped concave-convex pattern formed on the surface thereof, and then an etching process using a mask is performed to reflect the reflective lens on a portion of the organic insulating layer 300. To form a portion (400). As a result, a flat reflective lens portion 401 having a low height and a wide width is provided in the lower region of the light transmitting groove 120. In other words, the reflective lens portion with reduced inclination θ1 is manufactured. On the other hand, in other regions, the reflective lens unit 402 having a height higher than that of the reflective lens unit 401 in the lower region of the light transmitting groove 120 is provided. That is, the reflective lens unit 402 is formed in which the inclination θ2 is larger than the reflective lens unit 401 in the lower region of the light transmitting groove 120.

In this case, before forming the microlens-shaped convex-concave pattern on the organic insulating layer 300, a portion of the organic insulating layer 300 is removed to form a contact hole to be connected to the drain electrode 260 below. In addition, a transparent electrode (not shown) may be formed by depositing a transparent conductive film such as ITO or IZO before applying the reflective material. In this case, the transparent electrode may be connected to the drain electrode 260 through the contact hole.

As a result, the lower substrate 2000 having the flat reflective lens portion 401 in the light transmitting groove region is manufactured.

7A and 7B are cross-sectional conceptual views illustrating a method of manufacturing the upper substrate according to the present embodiment.

Referring to FIG. 7A, a color filter material is formed on the light-transmissive insulating substrate 100, and then, a patterning process using a mask is performed to form a light transmitting groove 120 in the color filter layer 110 and a region therebetween. Referring to FIG. 7B, an overcoat layer 130 and a transparent common electrode 140 are formed on the entire structure of FIG. 7A. As a result, the upper substrate 1000 is manufactured.

A liquid crystal display panel as illustrated in FIG. 4 is manufactured by bonding the lower substrate 2000 manufactured as shown in FIG. 5D and the upper substrate 1000 manufactured as shown in FIG. 7B. In this case, a spacer or a sealing member may be provided on the lower substrate 2000 and the upper substrate 1000, then overlapped, and then pressurized at a high temperature. Next, a liquid crystal is injected into a region between the two substrates to manufacture a liquid crystal display panel. Of course, a liquid crystal can also be provided between two substrates by the dropping method. An alignment layer may be formed on an opposite surface of the lower substrate and the upper substrate.

The present invention is not limited thereto, and the top portion of the reflective lens of the region adjacent to the light emitting groove may be manufactured so as to be biased from the center thereof to one side, that is, the light transmitting groove region, thereby increasing the amount of light reflected by the light transmitting groove to improve the light reflectance. have. Hereinafter, a liquid crystal display panel according to another exemplary embodiment of the present invention having the reflective lens portion with its top portion biased to one side will be described. In the following embodiments, descriptions overlapping with the above-described embodiments will be omitted.

8 is a conceptual view illustrating a pattern of a reflective lens unit of a liquid crystal display panel according to another exemplary embodiment of the present invention.

Referring to FIG. 8, the reflective lens unit 402 of the region adjacent to the lower side of the light transmitting groove 120 may be manufactured in a shape in which the top portion thereof is convenient to the area of the light transmitting groove 120. That is, the reflective lens unit 401 provided under the light-transmitting groove 120 is manufactured in the shape of an ellipse or a sphere, and the reflective lens unit 402 in the region adjacent thereto is biased toward the light-transmitting groove 120 and a predetermined curved surface. Having an asymmetric lens shape of approximately triangular form. The reflective lens unit 402 provided in the region adjacent to the lower side of the light transmitting groove 120 may increase the amount of light reflected toward the light transmitting groove 120 by increasing the reflection angle in the direction of the light transmitting groove 120.

As shown in the drawing, a convex lens-shaped reflective lens unit 401 is formed under the light-transmitting groove 120, and an asymmetrical lens-shaped reflective lens unit in which the top portion is biased toward the light-transmitting groove 120 from the center thereof is formed. 402 is formed. Through this, the light irradiated through the light emitting groove 120 in the same direction as the dotted lines A and B of FIG. 8 is within a predetermined angle range through the convex lens-shaped reflective lens unit 401 provided under the light transmitting groove 120. It is refracted and reflected toward the light transmitting groove 120. In addition, the light irradiated through the light emitting groove 120 in the same direction as the dotted lines C and D of FIG. 8 is transmitted by the asymmetric lens-shaped reflective lens unit 402 provided in an area adjacent to the lower side of the light transmitting groove 120. It is reflected in the (120) direction. At this time, the top of the asymmetric lens-shaped reflective lens portion 402 is biased into the light-transmitting groove 120 region. As a result, most of the light irradiated from the end of the light emitting groove 120 to the top region of the reflective lens unit 402 having an asymmetric lens shape may be reflected toward the light transmitting groove 120. As a result, the light reflectance of the liquid crystal display panel is improved.

Hereinafter, the liquid crystal display panel according to the present exemplary embodiment having the reflective lens unit having the above-described structure and a manufacturing method thereof will be described. At this time, since the pattern of the region excluding the reflective lens unit is similar to that of the above-described embodiment, the following description will focus on the reflective lens unit.

9 is a conceptual cross-sectional view of a liquid crystal display panel according to another exemplary embodiment of the present invention.

10A and 10B are cross-sectional conceptual views illustrating a method of manufacturing a reflective lens unit according to the present embodiment.

9, 10A, and 10B, the liquid crystal display panel according to the present exemplary embodiment includes an upper substrate 1000 having a light transmitting groove 120, and a lower substrate having a plurality of reflective lens units 400 formed on at least a portion thereof. And a liquid crystal layer provided between the upper substrate 1000 and the lower substrate 2000. In this case, the reflective lens unit 402 provided in an area adjacent to the lower side of the light transmitting groove 120 is manufactured in an asymmetric lens shape in which the top portion is biased from the center thereof to the light transmitting groove 120 region.

In addition, the reflective lens unit 401 under the light transmitting groove 120 is manufactured in the shape of a convex lens. Of course, the reflective lens unit 403 formed on the lower side of the light-transmitting groove 120 and the remaining area except the adjacent area is preferably a convex lens shape. The reflective lens unit 403 of the remaining areas may be manufactured in the same asymmetrical lens shape as the reflective lens unit 402 provided in the region adjacent to the lower side of the light transmitting groove 120.

The manufacturing method of the asymmetric lens as described above is as follows.

As shown in FIG. 10A, a photolithography process using a mask 600 for forming a microlens is performed on the organic insulating layer 300. In this case, the mask 600 forms a predetermined pattern using the light blocking area and the exposure area, but in the present embodiment, a plurality of light transmitting parts are provided in the light blocking area of the area adjacent to the through groove 120. In this case, when the light transmitting part defines the light transmitting groove 120 inward, it is preferable to provide a plurality of light transmitting parts outside the light blocking area. The photolithography process using the mask 600 is performed to form a protruding pattern having a predetermined step in a region adjacent to the light transmitting groove 120 as shown in FIG. 10A.

Thereafter, a reflow process is performed to change the protruding pattern into a lens shape having a curved surface, as shown in FIG. 10B, and then a reflective material is coated on the reflective lens part 400. Here, a protruding pattern having a predetermined step is formed in a region adjacent to the light transmitting groove 120, and the protruding pattern having such a step is flowed down by a reflow process so that the top part is biased toward one side from the center thereof. It can be prepared as. In this case, the inclination of the micro lens may be adjusted by adjusting the baking conditions and the curing conditions during the reflow process. Here, the inclination refers to an angle formed by the top of the reflective lens unit 400 and the lower end of the reflective lens unit 400.

In addition, the reflective lens unit according to the present exemplary embodiment is not limited to the above description, and the reflective lens unit may be manufactured so that the height of the reflective lens unit in the lower region of the light transmitting groove is lower than that of the reflective lens unit in the other region.

11A and 11B are cross-sectional conceptual views illustrating a method of manufacturing a reflective lens unit according to a modification of the present embodiment.

As shown in FIG. 11A, a photolithography process using a microlens forming mask 700 is performed on the organic insulating layer 300 to form a projecting pattern having a low height in the lower region of the light transmitting groove 120, and a staircase around the organic insulating layer 300. Form a protruding pattern with mold steps. In the mask 700, a plurality of light transmitting parts are evenly distributed in the light blocking area of the through groove 120, and a plurality of light transmitting parts are formed outside the light blocking area of the adjacent area. When performing a photolithography process using such a mask, as shown in FIG. 11A, a projection pattern having a low height is formed in the light emitting groove 120, and a protrusion pattern having a step is formed in an area adjacent to the light emitting groove 120. do.

Subsequently, when the reflective material is applied after the reflow process, as shown in FIG. 11B, a flat lens-shaped reflective lens unit 401 is formed in the lower region of the light-transmitting groove 120, and an asymmetric lens is formed in the region adjacent thereto. The reflective lens portion 402 is formed.

As a result, the light irradiated to the light emitting groove may be reflected in the light emitting groove direction by a flat lens-shaped reflector at the bottom and an asymmetric lens shape having its top portion biased in the light emitting groove direction. It is possible to improve the light reflectance of the.

As described above, a reflecting lens portion having a flat lens shape is formed under the light transmitting groove, and the amount of light reflected by the light transmitting groove is increased to improve the reflectance.

In addition, an asymmetric lens-shaped reflective lens portion may be formed in an area adjacent to the lower side of the light transmitting groove to increase the amount of light reflected by the light transmitting groove.

Although the invention has been described with reference to the accompanying drawings and the preferred embodiments described above, the invention is not limited thereto, but is defined by the claims that follow. Accordingly, one of ordinary skill in the art may variously modify and modify the present invention without departing from the spirit of the following claims.

Claims (17)

An upper substrate including a light transmitting groove; A lower substrate including a thin film transistor and a plurality of reflective lens parts; A liquid crystal layer provided between the upper substrate and the lower substrate, The liquid crystal display panel having a height lower than that of the reflective lens of the other area is provided below the light emitting groove. The method according to claim 1, The liquid crystal display panel of which the reflective lens unit provided under the light emitting groove is formed in a flat lens shape. The method according to claim 1, And a width of the reflective lens portion below the light transmitting groove is wider than a width of the reflective lens portion of the other region. The method according to claim 1, When the width of the light emitting groove is set to 1, the maximum width of the firing lens portion provided below the light emitting groove is 0.6 to 1, and the maximum height is 0.01 to 0.5. The method according to claim 1, And a reflecting lens portion of the other region having an asymmetric lens shape in which a top portion is biased from a center thereof to a light transmitting groove region. The method according to claim 1, The liquid crystal display panel of which the reflecting lens portion of the other region has a convex micro lens shape. The method according to claim 1, And a reflecting lens portion of a region adjacent to the lower side of the light transmitting groove among the reflecting lens portions of the other region having an asymmetric lens shape in which a top portion is biased from the center thereof to the light transmitting groove region. The method according to claim 1, The lower substrate is divided into a light transmitting area and a reflecting area, the reflecting area surrounds the light transmitting area in the form of a closed curve, the reflecting lens portion is formed in the reflecting area, and a part of the reflecting area and the light transmitting groove overlap the liquid crystal. Display panel. An upper substrate including a light transmitting groove; A lower substrate including a thin film transistor and a plurality of reflective lens parts; A liquid crystal layer provided between the upper substrate and the lower substrate, And a reflecting lens portion in a region adjacent to the lower side of the light transmitting groove, the top of which is biased from the center thereof to the light transmitting groove region. The method according to claim 9, And a height of the reflective lens portion below the light transmitting groove is lower than a height of the reflective lens portion in an area adjacent to the bottom of the light transmitting groove. The method according to claim 9, And a width of the reflective lens portion below the light transmitting groove is wider than a width of the reflective lens portion of the other region. Preparing an upper substrate provided with a light transmitting groove between the color filter layers; Preparing a thin film transistor and a lower substrate on which a reflective lens unit is formed; Forming a liquid crystal layer between the upper substrate and the lower substrate, Preparing the lower substrate, Forming a thin film transistor on the transparent insulating substrate; Applying an organic insulating film on the thin film transistor; Forming a microlens pattern by patterning a portion of the organic insulating layer, wherein the height of the microlens pattern in the region is formed below the height of the microlens pattern in the other region below the light emitting groove; Forming a reflective lens by forming a reflective material on the micro lens pattern. The method of claim 12, wherein the forming of the micro lens pattern by patterning a portion of the organic insulating layer comprises: Disposing a mask including a light blocking area for forming a plurality of patterns on the organic insulating layer and a light transmitting area separating the pattern, and having a plurality of light transmitting parts formed in the light blocking area corresponding to the light transmitting groove; Forming a plurality of uneven patterns through the photolithography process using the mask, such that the height of the uneven pattern corresponding to the light-transmitting groove is lower than the height of the uneven pattern of the other region; A method of manufacturing a liquid crystal display panel comprising performing a reflow process to change the uneven pattern into a micro lens pattern. Preparing an upper substrate provided with a light transmitting groove between the color filter layers; Preparing a thin film transistor and a lower substrate on which a reflective lens unit is formed; Forming a liquid crystal layer between the upper substrate and the lower substrate, Preparing the lower substrate, Forming a thin film transistor on the transparent insulating substrate; Applying an organic insulating film on the thin film transistor; Patterning a portion of the organic insulating layer to form a microlens pattern, wherein a top portion of the microlens pattern in the lower side and the adjacent region of the light transmitting groove is biased from the center thereof to the light transmitting groove region; Forming a reflective lens by forming a reflective material on the micro lens pattern. The method of claim 14, wherein the forming of the micro lens pattern by patterning a portion of the organic insulating layer comprises: A mask including a light blocking region for forming a plurality of patterns and a light transmitting region separating the patterns, wherein a mask including a plurality of light transmitting portions is formed in an outer portion of the light blocking region corresponding to the light transmitting groove and an adjacent region on the organic insulating layer; step; Forming a plurality of uneven patterns through a photolithography process using the mask, wherein a step is formed in the uneven pattern corresponding to the light emitting groove and the adjacent region; A method of manufacturing a liquid crystal display panel comprising performing a reflow process to change the uneven pattern into a micro lens pattern. Preparing an upper substrate provided with a light transmitting groove between the color filter layers; Preparing a thin film transistor and a lower substrate on which a reflective lens unit is formed; Forming a liquid crystal layer between the upper substrate and the lower substrate, Preparing the lower substrate, Forming a thin film transistor on the transparent insulating substrate; Applying an organic insulating film on the thin film transistor; A portion of the organic insulating layer is patterned to form a micro lens pattern, wherein the height of the micro lens pattern in the region below the light emitting groove is better than the height of the micro lens pattern in the other region. Allowing the top of the micro lens pattern to be biased from its center to the floodlight area; Forming a reflective lens by forming a reflective material on the micro lens pattern. The method of claim 16, wherein the forming of the micro lens pattern by patterning a portion of the organic insulating layer, A light blocking area for forming a plurality of patterns and a light transmitting area separating the pattern between the organic insulating layer, wherein a plurality of first light transmitting parts are formed in the light blocking area corresponding to the light transmitting groove, and a region adjacent to the light transmitting groove Arranging a mask in which a plurality of second light-transmitting portions are formed in an outer portion of the light-shielding area corresponding to A plurality of uneven patterns are formed through a photolithography process using the mask, so that the height of the uneven pattern corresponding to the floodlight groove is lower than the height of the uneven pattern of the other region, and corresponds to the adjacent area of the floodlight groove. Step to form a step in the concave-convex pattern; A method of manufacturing a liquid crystal display panel comprising performing a reflow process to change the uneven pattern into a micro lens pattern.

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