KR102688973B1 - 표면 코팅재, 필름, 적층체, 표시 장치 및 물품 - Google Patents
표면 코팅재, 필름, 적층체, 표시 장치 및 물품 Download PDFInfo
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- KR102688973B1 KR102688973B1 KR1020190045025A KR20190045025A KR102688973B1 KR 102688973 B1 KR102688973 B1 KR 102688973B1 KR 1020190045025 A KR1020190045025 A KR 1020190045025A KR 20190045025 A KR20190045025 A KR 20190045025A KR 102688973 B1 KR102688973 B1 KR 102688973B1
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- 239000000463 material Substances 0.000 title claims abstract description 227
- 239000011248 coating agent Substances 0.000 title claims abstract description 49
- 238000000576 coating method Methods 0.000 title claims abstract description 49
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 125000003277 amino group Chemical group 0.000 claims abstract description 14
- 239000011521 glass Substances 0.000 claims abstract description 11
- 239000000126 substance Substances 0.000 claims description 12
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 11
- 229910052731 fluorine Inorganic materials 0.000 claims description 11
- 239000011737 fluorine Substances 0.000 claims description 11
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 10
- 229910052736 halogen Inorganic materials 0.000 claims description 9
- 150000002367 halogens Chemical class 0.000 claims description 9
- 229920000642 polymer Polymers 0.000 claims description 8
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 238000009833 condensation Methods 0.000 claims description 5
- 230000005494 condensation Effects 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 5
- 239000000919 ceramic Substances 0.000 claims description 3
- 150000002431 hydrogen Chemical class 0.000 claims 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract description 9
- 125000005647 linker group Chemical group 0.000 abstract description 8
- 125000003545 alkoxy group Chemical group 0.000 abstract description 6
- 125000005702 oxyalkylene group Chemical group 0.000 abstract description 4
- 230000000052 comparative effect Effects 0.000 description 55
- 230000015572 biosynthetic process Effects 0.000 description 27
- 239000000203 mixture Substances 0.000 description 27
- 238000003786 synthesis reaction Methods 0.000 description 27
- 239000010410 layer Substances 0.000 description 11
- 238000000034 method Methods 0.000 description 11
- 239000011247 coating layer Substances 0.000 description 8
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 7
- 238000011156 evaluation Methods 0.000 description 7
- 125000006832 (C1-C10) alkylene group Chemical group 0.000 description 5
- YLZOPXRUQYQQID-UHFFFAOYSA-N 3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]propan-1-one Chemical compound N1N=NC=2CN(CCC=21)CCC(=O)N1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F YLZOPXRUQYQQID-UHFFFAOYSA-N 0.000 description 5
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 5
- NZZFYRREKKOMAT-UHFFFAOYSA-N diiodomethane Chemical compound ICI NZZFYRREKKOMAT-UHFFFAOYSA-N 0.000 description 5
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 5
- 239000002346 layers by function Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 150000003377 silicon compounds Chemical class 0.000 description 4
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 3
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 3
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 3
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 3
- 239000005642 Oleic acid Substances 0.000 description 3
- 239000012790 adhesive layer Substances 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- ZHPNWZCWUUJAJC-UHFFFAOYSA-N fluorosilicon Chemical compound [Si]F ZHPNWZCWUUJAJC-UHFFFAOYSA-N 0.000 description 2
- 125000005842 heteroatom Chemical group 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 150000004702 methyl esters Chemical class 0.000 description 2
- 239000010702 perfluoropolyether Substances 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- JSYRNNOZQSUYOB-UHFFFAOYSA-N COCCOCCCCCCCCCCOCCCCCCCCCCC[Si](OC)(OC)OC Chemical compound COCCOCCCCCCCCCCOCCCCCCCCCCC[Si](OC)(OC)OC JSYRNNOZQSUYOB-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- VDRSDNINOSAWIV-UHFFFAOYSA-N [F].[Si] Chemical class [F].[Si] VDRSDNINOSAWIV-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 125000000852 azido group Chemical group *N=[N+]=[N-] 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000003739 carbamimidoyl group Chemical group C(N)(=N)* 0.000 description 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000000392 cycloalkenyl group Chemical group 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 125000000592 heterocycloalkyl group Chemical group 0.000 description 1
- 125000000717 hydrazino group Chemical group [H]N([*])N([H])[H] 0.000 description 1
- 125000005638 hydrazono group Chemical group 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- MNEXIOKPOFUXLA-UHFFFAOYSA-N n'-(11-trimethoxysilylundecyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCCCCCCCCCNCCN MNEXIOKPOFUXLA-UHFFFAOYSA-N 0.000 description 1
- AMVXVPUHCLLJRE-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)hexane-1,6-diamine Chemical compound CO[Si](OC)(OC)CCCNCCCCCCN AMVXVPUHCLLJRE-UHFFFAOYSA-N 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 125000004115 pentoxy group Chemical group [*]OC([H])([H])C([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 230000035807 sensation Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
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- C03C2218/116—Deposition methods from solutions or suspensions by spin-coating, centrifugation
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
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- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
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- Polymers & Plastics (AREA)
- General Chemical & Material Sciences (AREA)
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Abstract
Description
도 2는 다른 구현예에 따른 표시 장치의 단면도이고,
도 3은 일 구현예에 따른 필름 내 제1 물질 및 제2 물질의 모습을 나타낸 그림이다.
마찰계수 | 초기 접촉각(°) (물) | 초기 접촉각(°) (디아이오도메탄) | |
실시예 1 | 0.498 | 74.6 | 49.4 |
실시예 2 | 0.486 | 75.0 | 51.3 |
실시예 3 | 0.448 | 83.1 | 57.5 |
실시예 4 | 0.28 | 83.0 | 56.7 |
실시예 5 | 0.32 | 80.4 | 51.0 |
비교예 1 | 0.561 | 73.9 | 47.1 |
비교예 2 | 0.233 | 111.8 | 96.5 |
비교예 3 | 0.127 | 116.7 | 100.8 |
비교예 4 | 0.221 | 96.0 | 76.2 |
비교예 5 | 0.515 | 86.7 | 85.0 |
비교예 6 | 0.505 | 93.6 | 96.5 |
비교예 7 | 0.292 | 104.3 | 97.8 |
비교예 8 | 0.124 | 111.6 | 99.6 |
비교예 9 | 1.22 | 62.7 | 52.8 |
비교예 10 | 1.114 | 106.7 | 57.5 |
비교예 11 | 0.717 | 113.8 | 78.8 |
비교예 12 | 0.723 | 114.3 | 96.5 |
표면에너지 (mN/m) | |
실시예 1 | 37.38 |
실시예 2 | 36.49 |
실시예 3 | 31.44 |
실시예 4 | 56.7 |
실시예 5 | 51.0 |
비교예 1 | 38.52 |
비교예 2 | 10.33 |
비교예 3 | 8.53 |
비교예 4 | 20.33 |
비교예 5 | 21.07 |
비교예 6 | 16.05 |
비교예 7 | 11.51 |
비교예 8 | 9.45 |
비교예 9 | 41.75 |
비교예 10 | 28.55 |
비교예 11 | 18.66 |
비교예 12 | 10.1 |
불소(F) 원자 함량 (wt%) | |
실시예 1 | 0.41 |
실시예 2 | 0.69 |
실시예 3 | 1.89 |
실시예 4 | 0.95 |
실시예 5 | 1.79 |
비교예 1 | 0.00 |
비교예 2 | 10.90 |
비교예 3 | 17.58 |
비교예 4 | 4.84 |
비교예 5 | 4.69 |
비교예 6 | 7.30 |
비교예 7 | 7.47 |
비교예 8 | 9.83 |
비교예 9 | 0.00 |
비교예 10 | 4.42 |
비교예 11 | 10.98 |
비교예 12 | 20.10 |
50: 표시 패널
70: 터치 스크린 패널
100, 200: 표시 장치
Claims (21)
- 제1 물질 및 제2 물질을 포함하고,
상기 제1 물질은 하기 화학식 2로 표시되고,
상기 제2 물질은 하기 화학식 3으로 표시되고,
상기 제1 물질은 상기 제1 물질 및 제2 물질의 총량(100 몰%) 대비 5 몰% 이하로 포함되는 표면 코팅재:
[화학식 2]
CF3O-[(CF2)m1O]m2-(CF2O)m3-CF2-CONH-L1-(NH-L2)m4-SiRaRbRc
[화학식 3]
R1-L3-X1-L4-X2-L5-SiRaRbRc
상기 화학식 2 및 화학식 3에서,
L1, L2 및 L4는 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬렌기이고,
L3은 *-LaO-*(La는 치환 또는 비치환된 C1 내지 C20 알킬렌기) 또는 치환 또는 비치환된 C1 내지 C20 알킬렌기이고,
L5는 단일결합 또는 치환 또는 비치환된 C1 내지 C20 알킬렌기이고,
R1은 비치환된 C1 내지 C20 알콕시기 또는 아미노기이고,
X1은 *-NH-* 또는 단일결합이고,
X2는 산소 또는 단일결합이고,
Ra, Rb 및 Rc는 각각 독립적으로 수소, 치환 또는 비치환된 C1 내지 C20 알콕시기, 할로겐, 히드록시기, 아미노기, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C6 내지 C20 아릴기 또는 이들의 조합이고, 단 Ra, Rb 및 Rc 중 적어도 하나는 치환 또는 비치환된 C1 내지 C20 알콕시기, 할로겐 또는 히드록시기이고,
m1은 2 이상의 정수이고,
m2 및 m3은 각각 독립적으로 1 이상의 정수이고,
m4는 0 또는 1의 정수이다.
- 삭제
- 제1항에서,
상기 제1 물질은 상기 제2 물질보다 큰 중량평균분자량을 가지는 표면 코팅재.
- 제3항에서,
상기 제1 물질은 1,500 g/mol 내지 7,000 g/mol의 중량평균분자량을 가지고,
상기 제2 물질은 400 g/mol 내지 800 g/mol의 중량평균분자량을 가지는 표면 코팅재.
- 제1항에서,
상기 표면 코팅재는 상기 제1 물질 및 제2 물질의 총량(100 중량%) 대비 0.4 중량% 이상의 불소를 포함하는 표면 코팅재.
- 제1항에서,
상기 제1 물질은 상기 제2 물질보다 사슬 길이가 더 긴 표면 코팅재.
- 제1항에서,
상기 제1 물질 및 제2 물질은 각각 독립적으로 선형 구조(linear type)를 가지는 표면 코팅재.
- 제1 물질 및 제2 물질의 축중합물을 포함하고,
상기 제1 물질은 하기 화학식 2로 표시되고,
상기 제2 물질은 하기 화학식 3으로 표시되고,
상기 제1 물질은 상기 제1 물질 및 제2 물질의 총량(100 몰%) 대비 5 몰% 이하로 포함되는 필름:
[화학식 2]
CF3O-[(CF2)m1O]m2-(CF2O)m3-CF2-CONH-L1-(NH-L2)m4-SiRaRbRc
[화학식 3]
R1-L3-X1-L4-X2-L5-SiRaRbRc
상기 화학식 2 및 화학식 3에서,
L1, L2 및 L4는 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬렌기이고,
L3은 *-LaO-*(La는 치환 또는 비치환된 C1 내지 C20 알킬렌기) 또는 치환 또는 비치환된 C1 내지 C20 알킬렌기이고,
L5는 단일결합 또는 치환 또는 비치환된 C1 내지 C20 알킬렌기이고,
R1은 비치환된 C1 내지 C20 알콕시기 또는 아미노기이고,
X1은 *-NH-* 또는 단일결합이고,
X2는 산소 또는 단일결합이고,
Ra, Rb 및 Rc는 각각 독립적으로 수소, 치환 또는 비치환된 C1 내지 C20 알콕시기, 할로겐, 히드록시기, 아미노기, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C6 내지 C20 아릴기 또는 이들의 조합이고, 단 Ra, Rb 및 Rc 중 적어도 하나는 치환 또는 비치환된 C1 내지 C20 알콕시기, 할로겐 또는 히드록시기이고,
m1은 2 이상의 정수이고,
m2 및 m3은 각각 독립적으로 1 이상의 정수이고,
m4는 0 또는 1의 정수이다.
- 삭제
- 제8항에서,
상기 제1 물질은 상기 제2 물질보다 큰 중량평균분자량을 가지는 필름.
- 제10항에서,
상기 제1 물질은 1,500 g/mol 내지 7,000 g/mol의 중량평균분자량을 가지고,
상기 제2 물질은 400 g/mol 내지 800 g/mol의 중량평균분자량을 가지는 필름.
- 제8항에서,
상기 필름은 상기 제1 물질 및 제2 물질의 총량(100 중량%) 대비 0.4 중량% 이상의 불소를 포함하는 필름.
- 제8항에서,
상기 제1 물질은 상기 제2 물질보다 사슬 길이가 더 긴 표면 코팅재.
- 제8항에서,
상기 제1 물질 및 제2 물질은 각각 독립적으로 선형 구조(linear type)를 가지는 필름.
- 제8항에서,
상기 필름은 31 mN/m 이상의 표면에너지를 가지는 필름.
- 제8항에서,
상기 필름은 1nm 내지 20nm의 두께를 가지는 필름.
- 기재 및
제8항 및 제10항 내지 제16항 중 어느 한 항에 따른 필름
을 포함하는 적층체.
- 제17항에서,
상기 기재는 세라믹 또는 유리인 적층체.
- 제8항에 따른 필름을 포함하는 표시 장치.
- 제18항에 따른 적층체를 포함하는 표시 장치.
- 유리 기재에 제1항 및 제3항 내지 제7항 중 어느 한 항의 표면 코팅재를 코팅한 물품.
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