KR102525345B1 - 반도체 칩 - Google Patents
반도체 칩 Download PDFInfo
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- KR102525345B1 KR102525345B1 KR1020150123515A KR20150123515A KR102525345B1 KR 102525345 B1 KR102525345 B1 KR 102525345B1 KR 1020150123515 A KR1020150123515 A KR 1020150123515A KR 20150123515 A KR20150123515 A KR 20150123515A KR 102525345 B1 KR102525345 B1 KR 102525345B1
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 129
- 239000000758 substrate Substances 0.000 claims abstract description 67
- 238000001514 detection method Methods 0.000 claims abstract description 36
- 238000005520 cutting process Methods 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 3
- 230000002950 deficient Effects 0.000 abstract description 9
- 238000005336 cracking Methods 0.000 description 2
- 230000014509 gene expression Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
- H01L22/34—Circuits for electrically characterising or monitoring manufacturing processes, e. g. whole test die, wafers filled with test structures, on-board-devices incorporated on each die, process control monitors or pad structures thereof, devices in scribe line
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67288—Monitoring of warpage, curvature, damage, defects or the like
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
- H01L23/585—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries comprising conductive layers or plates or strips or rods or rings
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/98—Methods for disconnecting semiconductor or solid-state bodies
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2855—Environmental, reliability or burn-in testing
- G01R31/2856—Internal circuit aspects, e.g. built-in test features; Test chips; Measuring material aspects, e.g. electro migration [EM]
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2884—Testing of integrated circuits [IC] using dedicated test connectors, test elements or test circuits on the IC under test
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Automation & Control Theory (AREA)
- Dicing (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Semiconductor Integrated Circuits (AREA)
- General Engineering & Computer Science (AREA)
Abstract
Description
도 2는 도 1의 Ⅱ 부위를 확대해서 나타낸 평면도이다.
도 3은 본 발명의 다른 실시예에 따른 반도체 칩을 나타낸 평면도이다.
도 4는 도 3의 Ⅳ 부위를 확대해서 나타낸 평면도이다.
도 5는 본 발명의 또 다른 실시예에 따른 반도체 칩을 나타낸 평면도이다.
도 6은 도 5의 Ⅵ 부위를 확대해서 나타낸 평면도이다.
도 7은 본 발명의 또 다른 실시예에 따른 반도체 칩을 나타낸 평면도이다.
도 8은 도 7의 Ⅷ 부위를 확대해서 나타낸 평면도이다.
도 9는 본 발명의 또 다른 실시예에 따른 반도체 칩을 나타낸 평면도이다.
도 10은 도 9의 Ⅹ 부위를 확대해서 나타낸 평면도이다.
도 11은 본 발명의 또 다른 실시예에 따른 반도체 칩을 나타낸 평면도이다.
도 12는 도 11의 ⅩⅡ 부위를 확대해서 나타낸 평면도이다.
114 ; 제 2 측면 116 ; 모서리
120 ; 회로 구조물 122 ; 챔퍼면
130 ; 크랙 감지 회로 132 ; 제 1 메인 라인
134 ; 제 2 메인 라인 136 ; 챔퍼 라인
137 ; 제 1 단부 138 ; 제 2 단부
140 ; 가드 링 142 ; 보조 가드 링
Claims (10)
- 회로 구조물을 갖는 반도체 기판; 및
상기 회로 구조물을 둘러싸도록 상기 반도체 기판 내에 형성된 메인 라인들, 및 상기 반도체 기판의 모서리들에서 상기 메인 라인들을 연결하는 챔퍼 라인들을 포함하고, 상기 챔퍼 라인들 각각은 서로 직교하는 상기 메인 라인들 중에서 어느 하나의 메인 라인과 제 1 각도를 이루고 나머지 메인 라인과 제 1 각도보다 넓은 제 2 각도를 이루는 크랙 감지 회로(crack detection circuit)를 포함하고,
상기 챔퍼 라인과 상기 제 1 각도를 이루는 상기 메인 라인의 연장 방향은 반도체 칩 복수개들이 구성된 웨이퍼를 1차 절단하는 방향과 평행하고, 상기 챔퍼 라인과 상기 제 2 각도를 이루는 상기 메인 라인의 연장 방향은 상기 웨이퍼를 2차 절단하는 방향과 평행한 반도체 칩. - 삭제
- 제 1 항에 있어서, 상기 챔퍼 라인들은 직선 형상을 갖는 반도체 칩.
- 제 1 항에 있어서, 상기 챔퍼 라인들은 상기 회로 구조물의 외측면을 따라 배열된 반도체 칩.
- 제 1 항에 있어서, 상기 반도체 기판의 모서리에 인접한 상기 회로 구조물의 모서리에 챔퍼면이 형성된 반도체 칩.
- 제 1 항에 있어서, 상기 크랙 감지 회로와 상기 반도체 기판의 측면들 사이에 형성된 가드 링(guard ring)을 더 포함하는 반도체 칩.
- 제 6 항에 있어서, 상기 가드 링으로부터 연장되어 상기 챔퍼 라인들의 외측면에 인접하게 배열된 보조 가드 링을 더 포함하는 반도체 칩.
- 회로 구조물을 갖는 반도체 기판; 및
상기 회로 구조물을 둘러싸도록 상기 반도체 기판의 가장자리들에 형성된 직선형의 메인 라인들, 및 상기 반도체 기판의 모서리들에서 상기 메인 라인들을 연결하는 챔퍼 라인들을 포함하고, 상기 챔퍼 라인의 제 1 단부로부터 상기 모서리까지의 제 1 거리는 상기 제 1 단부의 반대측인 상기 챔퍼 라인의 제 2 단부로부터 상기 모서리까지의 제 2 거리보다 짧은 크랙 감지 회로(crack detection circuit)를 포함하는 반도체 칩. - 제 8 항에 있어서, 상기 챔퍼 라인의 제 1 단부로부터 상기 모서리를 향하는 방향은 반도체 칩 복수개들이 구성된 웨이퍼를 1차 절단하는 방향과 평행하고, 상기 챔퍼 라인의 제 2 단부로부터 상기 모서리를 향하는 방향은 상기 웨이퍼를 2차 절단하는 방향과 평행한 반도체 칩.
- 제 8 항에 있어서,
상기 크랙 감지 회로와 상기 반도체 기판의 측면들 사이에 형성된 가드 링(guard ring); 및
상기 가드 링으로부터 연장되어 상기 챔퍼 라인들의 외측면에 인접하게 배열된 보조 가드 링을 더 포함하는 반도체 칩.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
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KR1020150123515A KR102525345B1 (ko) | 2015-09-01 | 2015-09-01 | 반도체 칩 |
US15/219,457 US9984945B2 (en) | 2015-09-01 | 2016-07-26 | Semiconductor chip |
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KR1020150123515A KR102525345B1 (ko) | 2015-09-01 | 2015-09-01 | 반도체 칩 |
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KR20170027069A KR20170027069A (ko) | 2017-03-09 |
KR102525345B1 true KR102525345B1 (ko) | 2023-04-25 |
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Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
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KR102369938B1 (ko) * | 2017-08-22 | 2022-03-03 | 삼성디스플레이 주식회사 | 표시 장치 |
CN108305577B (zh) * | 2018-01-19 | 2021-06-29 | 昆山国显光电有限公司 | 一种显示面板的检测装置及检测方法 |
KR102385105B1 (ko) * | 2018-02-27 | 2022-04-08 | 삼성전자주식회사 | 크랙 검출용 칩 및 이를 이용한 크랙 검출 방법 |
KR102460323B1 (ko) | 2018-03-08 | 2022-10-28 | 삼성전자주식회사 | 하나 이상의 지정된 핀을 이용하여 디스플레이의 상태를 결정하기 위한 전자 장치 |
KR102794183B1 (ko) * | 2020-07-16 | 2025-04-11 | 에스케이하이닉스 주식회사 | 반도체 장치 |
DE102020130330A1 (de) | 2020-11-17 | 2022-05-19 | Elmos Semiconductor Se | Verpackungsmaschine für mikroelektronische Bauteile mit einer Prüfung auf verdeckte mechanische Beschädigungen |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2008045965A (ja) | 2006-08-14 | 2008-02-28 | Yamaha Corp | ウェハの検査方法及びウェハのクラック検査装置 |
Family Cites Families (12)
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JP2943511B2 (ja) | 1992-07-29 | 1999-08-30 | 日本電気株式会社 | 半導体装置 |
JP3813562B2 (ja) | 2002-03-15 | 2006-08-23 | 富士通株式会社 | 半導体装置及びその製造方法 |
JP2005277338A (ja) | 2004-03-26 | 2005-10-06 | Nec Electronics Corp | 半導体装置及びその検査方法 |
JP4202970B2 (ja) | 2004-06-10 | 2008-12-24 | 株式会社東芝 | 半導体装置及びその製造方法、半導体装置の欠陥検出方法 |
US7649200B1 (en) * | 2005-05-04 | 2010-01-19 | Advanced Micro Devices, Inc. | System and method of detecting IC die cracks |
KR101004574B1 (ko) * | 2006-09-06 | 2010-12-30 | 히타치 긴조쿠 가부시키가이샤 | 반도체 센서 장치 및 그 제조 방법 |
US8217394B2 (en) * | 2007-05-10 | 2012-07-10 | Taiwan Semiconductor Manufacturing Company, Ltd. | Probe pad on a corner stress relief region in a semiconductor chip |
US8159254B2 (en) * | 2008-02-13 | 2012-04-17 | Infineon Technolgies Ag | Crack sensors for semiconductor devices |
US7888776B2 (en) | 2008-06-30 | 2011-02-15 | Texas Instruments Incorporated | Capacitor-based method for determining and characterizing scribe seal integrity and integrity loss |
JP2010281625A (ja) | 2009-06-03 | 2010-12-16 | Yamaha Corp | 半導体チップの検査方法 |
TW201113977A (en) | 2009-10-02 | 2011-04-16 | Fortune Semiconductor Corp | Semiconductor chip, seal-ring structure and the manufacturing process thereof |
US8987997B2 (en) | 2012-02-17 | 2015-03-24 | Innosys, Inc. | Dimming driver with stealer switch |
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- 2015-09-01 KR KR1020150123515A patent/KR102525345B1/ko active Active
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- 2016-07-26 US US15/219,457 patent/US9984945B2/en active Active
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JP2008045965A (ja) | 2006-08-14 | 2008-02-28 | Yamaha Corp | ウェハの検査方法及びウェハのクラック検査装置 |
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US9984945B2 (en) | 2018-05-29 |
KR20170027069A (ko) | 2017-03-09 |
US20170062293A1 (en) | 2017-03-02 |
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