KR102467559B1 - 장치 - Google Patents
장치 Download PDFInfo
- Publication number
- KR102467559B1 KR102467559B1 KR1020170013795A KR20170013795A KR102467559B1 KR 102467559 B1 KR102467559 B1 KR 102467559B1 KR 1020170013795 A KR1020170013795 A KR 1020170013795A KR 20170013795 A KR20170013795 A KR 20170013795A KR 102467559 B1 KR102467559 B1 KR 102467559B1
- Authority
- KR
- South Korea
- Prior art keywords
- holding
- basic image
- control
- workpiece
- moving
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000003384 imaging method Methods 0.000 claims abstract description 41
- 230000009471 action Effects 0.000 claims abstract description 32
- 238000003860 storage Methods 0.000 claims abstract description 12
- 238000012544 monitoring process Methods 0.000 abstract description 4
- 235000012431 wafers Nutrition 0.000 description 56
- 239000004065 semiconductor Substances 0.000 description 46
- 238000005520 cutting process Methods 0.000 description 39
- 230000007246 mechanism Effects 0.000 description 27
- 238000004140 cleaning Methods 0.000 description 25
- 230000007723 transport mechanism Effects 0.000 description 13
- 238000000034 method Methods 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 230000001681 protective effect Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- 230000003028 elevating effect Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F18/00—Pattern recognition
- G06F18/20—Analysing
- G06F18/22—Matching criteria, e.g. proximity measures
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
- G06V10/00—Arrangements for image or video recognition or understanding
- G06V10/70—Arrangements for image or video recognition or understanding using pattern recognition or machine learning
- G06V10/74—Image or video pattern matching; Proximity measures in feature spaces
- G06V10/75—Organisation of the matching processes, e.g. simultaneous or sequential comparisons of image or video features; Coarse-fine approaches, e.g. multi-scale approaches; using context analysis; Selection of dictionaries
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67282—Marking devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67288—Monitoring of warpage, curvature, damage, defects or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/60—Control of cameras or camera modules
- H04N23/63—Control of cameras or camera modules by using electronic viewfinders
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
- G06T2207/30148—Semiconductor; IC; Wafer
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
- G06V2201/00—Indexing scheme relating to image or video recognition or understanding
- G06V2201/06—Recognition of objects for industrial automation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Theoretical Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Multimedia (AREA)
- Evolutionary Computation (AREA)
- Data Mining & Analysis (AREA)
- Artificial Intelligence (AREA)
- Health & Medical Sciences (AREA)
- Signal Processing (AREA)
- High Energy & Nuclear Physics (AREA)
- Software Systems (AREA)
- Medical Informatics (AREA)
- Computing Systems (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Bioinformatics & Cheminformatics (AREA)
- Bioinformatics & Computational Biology (AREA)
- Evolutionary Biology (AREA)
- General Engineering & Computer Science (AREA)
- Databases & Information Systems (AREA)
- Optics & Photonics (AREA)
- Electromagnetism (AREA)
- Quality & Reliability (AREA)
- Toxicology (AREA)
- Dicing (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Laser Beam Processing (AREA)
- Microscoopes, Condenser (AREA)
- Studio Devices (AREA)
- Apparatus For Radiation Diagnosis (AREA)
Abstract
본 발명에 따르면, 이동 수단의 동작에 의해 유지 수단이 이동하는 영역을 촬상하는 촬상 수단과, 상기 유지 수단, 또는 작용 수단의 적정한 동작에 따른 기본 화상을 기억시킨 기본 화상 기억 수단과, 상기 촬상 수단에 의해 촬상된 화상과, 상기 기본 화상 기억 수단에 기억된 기본 화상을 비교하여 양 화상이 일치하도록 상기 이동 수단, 또는 상기 작용 수단을 제어하는 제어 수단으로 적어도 구성되는 장치가 제공된다.
Description
도 2는 도 1에 도시된 다이싱 장치의 제어 수단에 의해 실행되는 제어 프로그램의 흐름도.
도 3은 도 1에 도시된 제어 수단에 기억되는 이동 제어-기본 화상 맵(MAP)을 설명하기 위한 설명도.
도 4는 본 발명에 따라 실행되는 제어 프로그램에 의해 이동 수단이 제어되는 동작을 설명하기 위한 설명도.
3 : 척 테이블 4 : 스핀들 유닛
5 : 얼라인먼트 수단 6 : 표시 수단
7 : 카세트 테이블 8 : 카세트
9 : 촬상 수단 10 : 제어 수단
11 : 임시 배치부 12 : 피가공물 반출입 수단
13 : 제1 반송 기구 14 : 세정 수단
15 : 제2 반송 기구
Claims (3)
- 장치로서,
피가공물을 유지하는 유지 수단과,
상기 유지 수단에 유지된 피가공물에 작용을 행하는 작용 수단과,
상기 유지 수단과 상기 작용 수단을 상대적으로 이동시키는 이동 수단과,
상기 이동 수단의 동작에 의해 상기 유지 수단이 이동하는 영역을 촬상하는 촬상 수단으로서, 상기 영역은 상기 피가공물, 상기 유지 수단 및 상기 작용 수단 중 적어도 두 개의 특정 요소들을 포함하는 것인, 촬상 수단과,
상기 유지 수단 또는 상기 작용 수단의 적정한 동작에 따른 기본 화상을 기억시킨 기본 화상 기억 수단으로서, 상기 기본 화상 기억 수단은 메모리를 포함하는 것인, 기본 화상 기억 수단과,
상기 촬상 수단에 의해 촬상된 화상과, 상기 기본 화상 기억 수단에 기억된 기본 화상을 비교하여 양 화상이 일치하도록 상기 이동 수단 또는 상기 작용 수단을 제어하는 제어 수단
을 포함하고,
상기 촬상 수단에 의해 촬상된 화상과 상기 기본 화상을 비교하는 것은, 상기 촬상 수단에 의해 촬상된 상기 영역의 상기 적어도 두 개의 특정 요소들 간의 위치 관계가 상기 기본 화상 기억 수단에 기억된 상기 기본 화상 내의 대응하는 위치 관계와 일치하는지 확인하는 것을 포함하는 것인, 장치. - 제1항에 있어서,
상기 장치는 표시 수단을 구비하고, 상기 제어 수단이, 상기 촬상 수단에 의해 촬상된 화상과 상기 기본 화상 기억 수단에 기억된 기본 화상을 비교하여, 양 화상이 일치하도록 상기 이동 수단 또는 상기 작용 수단을 제어하여도 일치하지 않는 경우에는, 상기 표시 수단에 에러를 표시시키는 장치. - 제1항 또는 제2항에 있어서,
상기 장치는, 다이싱 장치, 레이저 가공 장치, 연삭 장치 중 어느 하나인 것인 장치.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2016-024888 | 2016-02-12 | ||
JP2016024888A JP6935168B2 (ja) | 2016-02-12 | 2016-02-12 | 加工装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20170095125A KR20170095125A (ko) | 2017-08-22 |
KR102467559B1 true KR102467559B1 (ko) | 2022-11-15 |
Family
ID=59410082
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020170013795A Active KR102467559B1 (ko) | 2016-02-12 | 2017-01-31 | 장치 |
Country Status (8)
Country | Link |
---|---|
US (1) | US10482587B2 (ko) |
JP (1) | JP6935168B2 (ko) |
KR (1) | KR102467559B1 (ko) |
CN (1) | CN107086195A (ko) |
DE (1) | DE102017202041A1 (ko) |
MY (1) | MY180542A (ko) |
SG (1) | SG10201700634TA (ko) |
TW (1) | TWI757264B (ko) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6935168B2 (ja) * | 2016-02-12 | 2021-09-15 | 株式会社ディスコ | 加工装置 |
KR101866139B1 (ko) * | 2017-08-25 | 2018-06-08 | 캐논 톡키 가부시키가이샤 | 얼라인먼트 방법, 얼라인먼트 장치, 이를 포함하는 진공증착방법 및 진공증착장치 |
JP6998232B2 (ja) * | 2018-02-20 | 2022-01-18 | 株式会社ディスコ | 加工装置 |
JP6998231B2 (ja) * | 2018-02-20 | 2022-01-18 | 株式会社ディスコ | 加工装置 |
JP7001493B2 (ja) * | 2018-02-26 | 2022-01-19 | 株式会社ディスコ | 撮像画像形成ユニット |
KR101940080B1 (ko) * | 2018-04-04 | 2019-01-18 | (주)신화에스티 | 인서트 스틸의 바닥면에 대한 연마 방법 |
KR101940075B1 (ko) * | 2018-04-04 | 2019-01-18 | (주)신화에스티 | 열처리 가공된 인서트 스틸의 바닥면에 대한 연마 장치 |
US10490525B1 (en) | 2018-05-10 | 2019-11-26 | International Business Machines Corporation | High speed handling of ultra-small chips by selective laser bonding and debonding |
JP2019198940A (ja) * | 2018-05-18 | 2019-11-21 | 株式会社ディスコ | 加工装置 |
JP7132042B2 (ja) * | 2018-09-10 | 2022-09-06 | 株式会社ディスコ | 加工装置 |
JP7362308B2 (ja) | 2019-06-17 | 2023-10-17 | 株式会社ディスコ | 加工装置 |
JP7286456B2 (ja) * | 2019-07-19 | 2023-06-05 | 株式会社ディスコ | 加工装置の制御方法 |
JP7357521B2 (ja) * | 2019-11-28 | 2023-10-06 | 株式会社ディスコ | 加工装置 |
JP7460272B2 (ja) * | 2020-01-16 | 2024-04-02 | 株式会社ディスコ | 加工装置 |
JP7430449B2 (ja) * | 2020-02-04 | 2024-02-13 | 株式会社ディスコ | 加工装置 |
JP2021132119A (ja) * | 2020-02-19 | 2021-09-09 | 株式会社ディスコ | 加工装置 |
JP7511975B2 (ja) * | 2020-05-13 | 2024-07-08 | 株式会社ディスコ | 切削装置 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009266221A (ja) * | 2008-04-21 | 2009-11-12 | Mori Seiki Co Ltd | 加工シミュレーション方法及び加工シミュレーション装置 |
Family Cites Families (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4754334A (en) * | 1987-01-08 | 1988-06-28 | Management Graphics, Inc. | Image recorder having automatic alignment method and apparatus |
JP3373585B2 (ja) * | 1993-04-07 | 2003-02-04 | 株式会社日立製作所 | 走査型プローブ加工観察装置 |
JP2991593B2 (ja) * | 1993-08-19 | 1999-12-20 | 株式会社東京精密 | ダイシング装置の半導体ウェハ形状認識装置 |
JPH09320505A (ja) * | 1996-03-29 | 1997-12-12 | Hitachi Ltd | 電子線式検査方法及びその装置並びに半導体の製造方法及びその製造ライン |
JPH11207611A (ja) * | 1998-01-21 | 1999-08-03 | Shin Etsu Handotai Co Ltd | 両面研磨装置におけるワークの自動搬送装置 |
JP3326384B2 (ja) * | 1998-03-12 | 2002-09-24 | 古河電気工業株式会社 | 半導体ウエハーの劈開方法およびその装置 |
JP2000061804A (ja) | 1998-08-27 | 2000-02-29 | Disco Abrasive Syst Ltd | 切削装置 |
JP2000117592A (ja) * | 1998-10-12 | 2000-04-25 | Yamagata Casio Co Ltd | 部品搭載装置及び部品供給装置 |
JP2001284303A (ja) | 2000-03-29 | 2001-10-12 | Disco Abrasive Syst Ltd | 研削装置 |
JP2005088053A (ja) | 2003-09-18 | 2005-04-07 | Disco Abrasive Syst Ltd | レーザー加工装置 |
JP4908138B2 (ja) * | 2005-12-09 | 2012-04-04 | ルネサスエレクトロニクス株式会社 | プローブ検査装置 |
JP2009064828A (ja) * | 2007-09-04 | 2009-03-26 | Disco Abrasive Syst Ltd | 加工装置 |
JP2010073703A (ja) * | 2008-09-16 | 2010-04-02 | Hitachi High-Technologies Corp | パターンの検査装置、およびパターンの検査方法 |
JP4623193B2 (ja) * | 2008-09-29 | 2011-02-02 | カシオ計算機株式会社 | 撮像装置、撮像方法、及びプログラム |
JP2010212505A (ja) * | 2009-03-11 | 2010-09-24 | Toshiba Corp | 半導体装置の接合装置及び半導体装置の製造方法 |
JP2011066185A (ja) * | 2009-09-17 | 2011-03-31 | Ushio Inc | ワークアライメントマークの検出方法および露光装置 |
JP5904720B2 (ja) * | 2011-05-12 | 2016-04-20 | 株式会社ディスコ | ウエーハの分割方法 |
JP5948138B2 (ja) * | 2012-05-11 | 2016-07-06 | 株式会社日立ハイテクノロジーズ | 欠陥解析支援装置、欠陥解析支援装置で実行されるプログラム、および欠陥解析システム |
JP2013237097A (ja) * | 2012-05-17 | 2013-11-28 | Disco Corp | 改質層形成方法 |
JP6068074B2 (ja) * | 2012-09-20 | 2017-01-25 | 株式会社ディスコ | ゲッタリング層形成方法 |
KR101613135B1 (ko) * | 2012-10-29 | 2016-04-18 | 로제 가부시키가이샤 | 반도체 기판의 위치 검출 장치 및 위치 검출 방법 |
US9528915B2 (en) * | 2012-11-13 | 2016-12-27 | Ues, Inc. | Automated high speed metallographic system |
EP2932425B1 (en) * | 2012-12-14 | 2025-01-29 | The J. David Gladstone Institutes, a testamentary trust established under the Will of J. David Gladstone | Automated robotic microscopy systems |
JP6105308B2 (ja) * | 2013-02-08 | 2017-03-29 | 株式会社ディスコ | 加工装置 |
CN104002602B (zh) * | 2013-02-25 | 2017-08-04 | 比亚迪股份有限公司 | 具有加工精度纠正功能的激光活化设备和激光活化方法 |
JP6224350B2 (ja) * | 2013-05-17 | 2017-11-01 | 株式会社ディスコ | 加工装置 |
US9508611B2 (en) * | 2013-08-14 | 2016-11-29 | Hitachi, Ltd. | Semiconductor inspection method, semiconductor inspection device and manufacturing method of semiconductor element |
JP6294131B2 (ja) * | 2014-04-08 | 2018-03-14 | 株式会社日立ハイテクノロジーズ | 欠陥レビュー装置、欠陥レビュー方法 |
JP2016021492A (ja) * | 2014-07-14 | 2016-02-04 | 株式会社ディスコ | 加工装置 |
JP6935168B2 (ja) * | 2016-02-12 | 2021-09-15 | 株式会社ディスコ | 加工装置 |
JP6683500B2 (ja) * | 2016-02-24 | 2020-04-22 | 株式会社ディスコ | 検査装置及びレーザー加工装置 |
JP6814613B2 (ja) * | 2016-11-28 | 2021-01-20 | 株式会社ディスコ | ウェーハの加工方法 |
JP6870974B2 (ja) * | 2016-12-08 | 2021-05-12 | 株式会社ディスコ | 被加工物の分割方法 |
-
2016
- 2016-02-12 JP JP2016024888A patent/JP6935168B2/ja active Active
- 2016-12-30 TW TW105144208A patent/TWI757264B/zh active
-
2017
- 2017-01-25 SG SG10201700634TA patent/SG10201700634TA/en unknown
- 2017-01-27 MY MYPI2017700323A patent/MY180542A/en unknown
- 2017-01-31 KR KR1020170013795A patent/KR102467559B1/ko active Active
- 2017-02-03 US US15/424,239 patent/US10482587B2/en active Active
- 2017-02-09 DE DE102017202041.5A patent/DE102017202041A1/de active Pending
- 2017-02-09 CN CN201710070796.1A patent/CN107086195A/zh active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009266221A (ja) * | 2008-04-21 | 2009-11-12 | Mori Seiki Co Ltd | 加工シミュレーション方法及び加工シミュレーション装置 |
Also Published As
Publication number | Publication date |
---|---|
US20170236267A1 (en) | 2017-08-17 |
JP2017140682A (ja) | 2017-08-17 |
DE102017202041A1 (de) | 2017-08-17 |
SG10201700634TA (en) | 2017-09-28 |
KR20170095125A (ko) | 2017-08-22 |
MY180542A (en) | 2020-12-01 |
US10482587B2 (en) | 2019-11-19 |
TW201729272A (zh) | 2017-08-16 |
CN107086195A (zh) | 2017-08-22 |
JP6935168B2 (ja) | 2021-09-15 |
TWI757264B (zh) | 2022-03-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR102467559B1 (ko) | 장치 | |
TWI733937B (zh) | 雷射加工裝置 | |
KR101266373B1 (ko) | 절삭장치 | |
CN102019648B (zh) | 切削装置 | |
TWI809228B (zh) | 切割裝置及使用切割裝置的晶圓加工方法 | |
KR102345188B1 (ko) | 가공 장치 | |
CN104167378B (zh) | 加工装置 | |
CN112388154B (zh) | 激光加工装置 | |
CN106166801B (zh) | 加工装置 | |
JP5295720B2 (ja) | 半導体ウエーハ加工装置 | |
TW202132046A (zh) | 加工裝置 | |
JP6223862B2 (ja) | 切削装置 | |
JP6004761B2 (ja) | ダイシング方法 | |
JP4342807B2 (ja) | アライメント方法およびアライメント装置 | |
CN113492465A (zh) | 切削装置 | |
CN111314599A (zh) | 日志数据生成装置 | |
JP7271181B2 (ja) | 診断方法 | |
JP2022083252A (ja) | 加工装置及び加工方法 | |
JP2023028108A (ja) | 検査装置、及び加工システム | |
JP2021044481A (ja) | 加工装置 | |
JP2020098831A (ja) | 被加工物の分割方法 | |
JP2003218062A (ja) | 切削装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20170131 |
|
PG1501 | Laying open of application | ||
A201 | Request for examination | ||
PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20210201 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 20170131 Comment text: Patent Application |
|
E902 | Notification of reason for refusal | ||
PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20220502 Patent event code: PE09021S01D |
|
E701 | Decision to grant or registration of patent right | ||
PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20220811 |
|
GRNT | Written decision to grant | ||
PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20221111 Patent event code: PR07011E01D |
|
PR1002 | Payment of registration fee |
Payment date: 20221111 End annual number: 3 Start annual number: 1 |
|
PG1601 | Publication of registration |