KR102315409B1 - Tg가 낮은 보레이트를 포함하는 홀로그래픽 매체의 제조를 위한 광중합체 배합물 - Google Patents
Tg가 낮은 보레이트를 포함하는 홀로그래픽 매체의 제조를 위한 광중합체 배합물 Download PDFInfo
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- KR102315409B1 KR102315409B1 KR1020167012505A KR20167012505A KR102315409B1 KR 102315409 B1 KR102315409 B1 KR 102315409B1 KR 1020167012505 A KR1020167012505 A KR 1020167012505A KR 20167012505 A KR20167012505 A KR 20167012505A KR 102315409 B1 KR102315409 B1 KR 102315409B1
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- 239000000203 mixture Substances 0.000 title claims abstract description 167
- 238000009472 formulation Methods 0.000 title claims abstract description 54
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 150000001642 boronic acid derivatives Chemical class 0.000 title abstract description 39
- 238000000034 method Methods 0.000 claims abstract description 60
- 239000000126 substance Substances 0.000 claims abstract description 49
- 239000005056 polyisocyanate Substances 0.000 claims abstract description 23
- 229920001228 polyisocyanate Polymers 0.000 claims abstract description 23
- 239000000178 monomer Substances 0.000 claims abstract description 18
- 239000012948 isocyanate Substances 0.000 claims abstract description 10
- 150000002513 isocyanates Chemical class 0.000 claims abstract description 10
- -1 cycloheptyl radicals Chemical class 0.000 claims description 202
- 150000003254 radicals Chemical class 0.000 claims description 55
- 150000001450 anions Chemical class 0.000 claims description 29
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 28
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 27
- 239000000463 material Substances 0.000 claims description 27
- 150000003839 salts Chemical class 0.000 claims description 27
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 claims description 25
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims description 25
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 24
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 claims description 24
- 229910052736 halogen Inorganic materials 0.000 claims description 21
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 20
- 150000002367 halogens Chemical class 0.000 claims description 20
- MNLAVFKVRUQAKW-UHFFFAOYSA-N VR nerve agent Chemical compound CCN(CC)CCSP(C)(=O)OCC(C)C MNLAVFKVRUQAKW-UHFFFAOYSA-N 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 16
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 12
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 claims description 11
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims description 10
- 230000009477 glass transition Effects 0.000 claims description 10
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 9
- CIUQDSCDWFSTQR-UHFFFAOYSA-N [C]1=CC=CC=C1 Chemical group [C]1=CC=CC=C1 CIUQDSCDWFSTQR-UHFFFAOYSA-N 0.000 claims description 8
- 239000001257 hydrogen Substances 0.000 claims description 8
- 229910052739 hydrogen Inorganic materials 0.000 claims description 8
- 125000004429 atom Chemical group 0.000 claims description 7
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 7
- 238000012545 processing Methods 0.000 claims description 7
- 230000015572 biosynthetic process Effects 0.000 claims description 6
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 6
- VHVGFEDTMPYCSX-UHFFFAOYSA-N [1-[[2,2-dimethyl-3-[[4-(oxoazaniumylmethylidene)pyridin-1-yl]methoxy]propoxy]methyl]pyridin-4-ylidene]methyl-oxoazanium;dichloride Chemical compound [Cl-].[Cl-].C1=CC(=C[NH+]=O)C=CN1COCC(C)(C)COCN1C=CC(=C[NH+]=O)C=C1 VHVGFEDTMPYCSX-UHFFFAOYSA-N 0.000 claims description 5
- DTXOCJGLLMAFBX-UHFFFAOYSA-N oxo-[[1-[2-[[4-(oxoazaniumylmethylidene)pyridin-1-yl]methoxy]ethoxymethyl]pyridin-4-ylidene]methyl]azanium;dichloride Chemical compound [Cl-].[Cl-].C1=CC(=C[NH+]=O)C=CN1COCCOCN1C=CC(=C[NH+]=O)C=C1 DTXOCJGLLMAFBX-UHFFFAOYSA-N 0.000 claims description 5
- 150000001768 cations Chemical class 0.000 claims description 4
- 238000004132 cross linking Methods 0.000 claims description 4
- 239000000470 constituent Substances 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 3
- OSDBJMYIUDLIRI-UHFFFAOYSA-N oxo-[[1-[[4-[[4-(oxoazaniumylmethylidene)pyridin-1-yl]methoxy]cyclohexyl]oxymethyl]pyridin-4-ylidene]methyl]azanium;dichloride Chemical compound [Cl-].[Cl-].C1=CC(=C[NH+]=O)C=CN1COC1CCC(OCN2C=CC(=C[NH+]=O)C=C2)CC1 OSDBJMYIUDLIRI-UHFFFAOYSA-N 0.000 claims description 3
- 229910001413 alkali metal ion Inorganic materials 0.000 claims description 2
- 238000002360 preparation method Methods 0.000 abstract description 41
- 230000008569 process Effects 0.000 abstract description 23
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 76
- 239000000243 solution Substances 0.000 description 74
- 239000008346 aqueous phase Substances 0.000 description 69
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 49
- 239000012074 organic phase Substances 0.000 description 49
- 239000000975 dye Substances 0.000 description 44
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 40
- XTFIVUDBNACUBN-UHFFFAOYSA-N 1,3,5-trinitro-1,3,5-triazinane Chemical compound [O-][N+](=O)N1CN([N+]([O-])=O)CN([N+]([O-])=O)C1 XTFIVUDBNACUBN-UHFFFAOYSA-N 0.000 description 35
- 239000000047 product Substances 0.000 description 35
- 239000012071 phase Substances 0.000 description 31
- 150000001875 compounds Chemical class 0.000 description 30
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 28
- DZLFLBLQUQXARW-UHFFFAOYSA-N tetrabutylammonium Chemical compound CCCC[N+](CCCC)(CCCC)CCCC DZLFLBLQUQXARW-UHFFFAOYSA-N 0.000 description 27
- 239000010410 layer Substances 0.000 description 25
- PEDCQBHIVMGVHV-UHFFFAOYSA-N glycerol group Chemical group OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 21
- 230000002829 reductive effect Effects 0.000 description 21
- GBXQPDCOMJJCMJ-UHFFFAOYSA-M trimethyl-[6-(trimethylazaniumyl)hexyl]azanium;bromide Chemical compound [Br-].C[N+](C)(C)CCCCCC[N+](C)(C)C GBXQPDCOMJJCMJ-UHFFFAOYSA-M 0.000 description 21
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 20
- 239000000376 reactant Substances 0.000 description 20
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 20
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 19
- QDYLMAYUEZBUFO-UHFFFAOYSA-N cetalkonium chloride Chemical compound CCCCCCCCCCCCCCCC[N+](C)(C)CC1=CC=CC=C1 QDYLMAYUEZBUFO-UHFFFAOYSA-N 0.000 description 18
- GJVFBWCTGUSGDD-UHFFFAOYSA-L pentamethonium bromide Chemical compound [Br-].[Br-].C[N+](C)(C)CCCCC[N+](C)(C)C GJVFBWCTGUSGDD-UHFFFAOYSA-L 0.000 description 17
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 16
- 229920005862 polyol Polymers 0.000 description 16
- 150000003077 polyols Chemical class 0.000 description 16
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 15
- 101710134784 Agnoprotein Proteins 0.000 description 15
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 15
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 14
- 125000006201 3-phenylpropyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 12
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 12
- AJQWOUVFEBQHAN-UHFFFAOYSA-M benzyl-hexadecyl-dimethylazanium;chloride;hydrate Chemical compound O.[Cl-].CCCCCCCCCCCCCCCC[N+](C)(C)CC1=CC=CC=C1 AJQWOUVFEBQHAN-UHFFFAOYSA-M 0.000 description 12
- 238000010438 heat treatment Methods 0.000 description 12
- 239000003921 oil Substances 0.000 description 12
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 12
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 11
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 10
- 125000001931 aliphatic group Chemical group 0.000 description 10
- 125000001204 arachidyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 10
- 125000002511 behenyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 10
- 238000004128 high performance liquid chromatography Methods 0.000 description 10
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 10
- HNSDLXPSAYFUHK-UHFFFAOYSA-N 1,4-bis(2-ethylhexyl) sulfosuccinate Chemical compound CCCCC(CC)COC(=O)CC(S(O)(=O)=O)C(=O)OCC(CC)CCCC HNSDLXPSAYFUHK-UHFFFAOYSA-N 0.000 description 9
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 9
- 125000000217 alkyl group Chemical class 0.000 description 9
- 230000005540 biological transmission Effects 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- 238000001816 cooling Methods 0.000 description 9
- 229920000570 polyether Polymers 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- 239000004721 Polyphenylene oxide Substances 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 8
- 150000002148 esters Chemical class 0.000 description 8
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 8
- 239000004417 polycarbonate Substances 0.000 description 8
- 229920000515 polycarbonate Polymers 0.000 description 8
- 239000007787 solid Substances 0.000 description 8
- 238000003756 stirring Methods 0.000 description 8
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 7
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 7
- ULUAUXLGCMPNKK-UHFFFAOYSA-N Sulfobutanedioic acid Chemical class OC(=O)CC(C(O)=O)S(O)(=O)=O ULUAUXLGCMPNKK-UHFFFAOYSA-N 0.000 description 7
- 239000002253 acid Substances 0.000 description 7
- 125000004432 carbon atom Chemical group C* 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 7
- 239000000460 chlorine Substances 0.000 description 7
- 229910052801 chlorine Inorganic materials 0.000 description 7
- 239000002131 composite material Substances 0.000 description 7
- FBELJLCOAHMRJK-UHFFFAOYSA-L disodium;2,2-bis(2-ethylhexyl)-3-sulfobutanedioate Chemical compound [Na+].[Na+].CCCCC(CC)CC(C([O-])=O)(C(C([O-])=O)S(O)(=O)=O)CC(CC)CCCC FBELJLCOAHMRJK-UHFFFAOYSA-L 0.000 description 7
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 7
- 239000011737 fluorine Substances 0.000 description 7
- 229910052731 fluorine Inorganic materials 0.000 description 7
- 230000004907 flux Effects 0.000 description 7
- 230000003287 optical effect Effects 0.000 description 7
- 229920000728 polyester Polymers 0.000 description 7
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- 229920000139 polyethylene terephthalate Polymers 0.000 description 7
- 239000005020 polyethylene terephthalate Substances 0.000 description 7
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 6
- PJMDLNIAGSYXLA-UHFFFAOYSA-N 6-iminooxadiazine-4,5-dione Chemical group N=C1ON=NC(=O)C1=O PJMDLNIAGSYXLA-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 6
- 238000004061 bleaching Methods 0.000 description 6
- 125000002091 cationic group Chemical group 0.000 description 6
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 6
- 125000000623 heterocyclic group Chemical group 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 6
- 239000007858 starting material Substances 0.000 description 6
- 150000005846 sugar alcohols Polymers 0.000 description 6
- 125000000876 trifluoromethoxy group Chemical group FC(F)(F)O* 0.000 description 6
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 5
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 5
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 150000001412 amines Chemical class 0.000 description 5
- 150000003863 ammonium salts Chemical class 0.000 description 5
- YMKDRGPMQRFJGP-UHFFFAOYSA-M cetylpyridinium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+]1=CC=CC=C1 YMKDRGPMQRFJGP-UHFFFAOYSA-M 0.000 description 5
- 125000004122 cyclic group Chemical group 0.000 description 5
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 5
- 150000002009 diols Chemical class 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 125000001153 fluoro group Chemical group F* 0.000 description 5
- 125000005842 heteroatom Chemical group 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 230000007774 longterm Effects 0.000 description 5
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
- 150000002894 organic compounds Chemical class 0.000 description 5
- 239000011780 sodium chloride Substances 0.000 description 5
- 229910052938 sodium sulfate Inorganic materials 0.000 description 5
- 235000011152 sodium sulphate Nutrition 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- PCHXZXKMYCGVFA-UHFFFAOYSA-N 1,3-diazetidine-2,4-dione Chemical compound O=C1NC(=O)N1 PCHXZXKMYCGVFA-UHFFFAOYSA-N 0.000 description 4
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 4
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 4
- 125000001255 4-fluorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1F 0.000 description 4
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
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- 239000004698 Polyethylene Substances 0.000 description 4
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- 230000000996 additive effect Effects 0.000 description 4
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- 229910017053 inorganic salt Inorganic materials 0.000 description 4
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 4
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- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
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- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 4
- 238000005191 phase separation Methods 0.000 description 4
- 238000004022 photochemical bleaching Methods 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 4
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 3
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 3
- HGYRVYPLIJPQDF-UHFFFAOYSA-M 4-tert-butyl-1-hexadecylpyridin-1-ium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[n+]1ccc(cc1)C(C)(C)C HGYRVYPLIJPQDF-UHFFFAOYSA-M 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- 229920002284 Cellulose triacetate Polymers 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 3
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 3
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Classifications
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- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
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- C07C211/00—Compounds containing amino groups bound to a carbon skeleton
- C07C211/62—Quaternary ammonium compounds
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- C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
- C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
- C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
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- C07D213/16—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom containing only hydrogen and carbon atoms in addition to the ring nitrogen atom containing only one pyridine ring
- C07D213/20—Quaternary compounds thereof
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- C07D—HETEROCYCLIC COMPOUNDS
- C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
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- C07D233/56—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring carbon atoms
- C07D233/58—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring carbon atoms with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, attached to ring nitrogen atoms
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- C07D295/02—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms containing only hydrogen and carbon atoms in addition to the ring hetero elements
- C07D295/037—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms containing only hydrogen and carbon atoms in addition to the ring hetero elements with quaternary ring nitrogen atoms
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
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- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
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- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H2001/026—Recording materials or recording processes
- G03H2001/0264—Organic recording material
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- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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Abstract
<화학식 Ia>
Description
Claims (19)
- 이소시아네이트에 대해 반응성인 성분, 폴리이소시아네이트 성분, 기록 단량체, 및 1종 이상의 염료 및 공개시제를 함유하는 광개시제를 포함하며, 공개시제가 하기 화학식 Ia의 1종 이상의 물질을 함유하는 것을 특징으로 하는 광중합체 배합물:
<화학식 Ia>
상기 식에서,
R1은 임의로 분지화된 C14- 내지 C22-알킬 라디칼이고,
R2는 임의로 분지화된 및/또는 임의로 치환된 C8- 내지 C22-알킬 라디칼, 시클로헥실 또는 시클로헵틸 라디칼, C7- 내지 C10-아르알킬 라디칼, 또는 비이온성 라디칼에 의해 치환된 페닐 라디칼이고,
R3 및 R4는 각각 독립적으로 임의로 치환된 C1- 또는 C2-알킬 라디칼이거나, 임의로 분지화된 및/또는 임의로 치환된 C3- 내지 C5-알킬 라디칼이거나, 또는
R1은 임의로 분지화된 C14- 내지 C22-알킬 라디칼이고,
R2는 임의로 분지화된 및/또는 임의로 치환된 C8- 내지 C22-알킬 라디칼 또는 C7- 내지 C10-아르알킬 라디칼이고,
R3 및 R4는 함께 -(CH2)4-, -(CH2)5- 또는 -(CH2)2-O-(CH2)2- 가교를 형성하거나, 또는
R1은 임의로 분지화된 C14- 내지 C22-알킬 라디칼이고,
R2, R3 및 R4는 N+와 함께, 적어도 C1- 내지 C8-알킬, C1- 내지 C8-알콕시, C5- 내지 C7-시클로알킬, 벤질 또는 페닐로부터 선택된 1개의 라디칼에 의해 치환된 이미다졸 또는 피리딘 고리를 형성하고,
R21은 임의로 치환된 C1- 내지 C22-알킬, C3- 내지 C22-알케닐, C5- 내지 C7-시클로알킬 또는 C7- 내지 C13-아르알킬 라디칼이고,
R22 내지 R24는 각각 독립적으로, 할로겐, C1- 내지 C4-알킬, 트리플루오로메틸, C1- 내지 C4-알콕시, 트리플루오로메톡시, 페닐 및 페녹시로부터 선택된 1개 이상의 라디칼에 의해 임의로 치환된 C6- 내지 C10-아릴 라디칼이다. - 제1항에 있어서, 공개시제가 ≤ 0℃의 유리 전이 온도 Tg를 갖는 것을 특징으로 하는 광중합체 배합물.
- 제3항에 있어서, 공개시제가 화학식 Ia 및 Ib의 물질을 80:20 내지 99.99:0.01의 몰비로 함유하는 것을 특징으로 하는 광중합체 배합물.
- 제5항에 있어서, 공개시제가, 공개시제의 총량을 기준으로 하여 0.01 내지 10 중량%, 0.05 내지 7 중량%, 또는 1 내지 5 중량%의 화학식 II의 염을 함유하는 것을 특징으로 하는 광중합체 배합물.
- 제7항에 있어서, 공개시제가 물질 IIIa 및 IIIb를, 물질 Ia 및 Ib와 동일한 서로에 대한 비로 함유하는 것을 특징으로 하는 광중합체 배합물.
- 제7항에 있어서, 물질 IIIa 및 임의로 IIIb 대 물질 Ia 및 임의로 Ib의 총 합계의 몰비가 ≤ 15:85인 것을 특징으로 하는 광중합체 배합물.
- 제1항 또는 제2항에 따른 광중합체 배합물을 사용하여 제조된 홀로그래픽 매체.
- (I) 제1항 또는 제2항에 따른 광중합체 배합물을, 이들의 모든 구성성분을 혼합함으로써 제조하고,
(II) 광중합체 배합물을 20 내지 40 ℃의 가공 온도에서 필름 형태로 전환시키고,
(III) 가공 온도 초과의 가교 온도에서 우레탄 형성과 함께 필름 형태로 경화시키는,
홀로그래픽 매체를 제조하는 방법. - 캐리어 기판, 그에 적용된 제10항에 따른 홀로그래픽 매체, 및 임의로 홀로그래픽 매체의 캐리어 기판으로부터의 반대 측면에 적용된 커버 층을 포함하는 라미네이트 구조체.
- 물 및 에스테르의 2상 혼합물 중에서 하기 화학식 VII의 염의 존재 하에 하기 화학식 IIIa의 보레이트 또는 하기 화학식 IIIa 및 IIIb의 보레이트의 혼합물을 하기 화학식 VI의 암모늄 염과 반응시키는 것을 특징으로 하는, 하기 화학식 Ia의 물질 및 하기 화학식 II의 염의 혼합물을 포함하고, 임의로 하기 화학식 Ib 및/또는 하기 화학식 IIIa 및/또는 하기 화학식 IIIb의 물질을 또한 함유하는 공개시제를 제조하는 방법:
<화학식 Ia>
<화학식 Ib>
<화학식 II>
<화학식 IIIa>
<화학식 IIIb>
상기 식에서,
R1 내지 R4는 각각 제1항에 정의된 바와 같고,
R11 내지 R14는 각각 독립적으로 C1- 내지 C4-알킬이고,
R21 내지 R24는 각각 제1항에 정의된 바와 같고,
R25는 할로겐, C1- 내지 C4-알킬, 트리플루오로메틸, C1- 내지 C4-알콕시, 트리플루오로메톡시, 페닐 및 페녹시로부터 선택된 1개 이상의 라디칼에 의해 임의로 치환된 C6- 내지 C10-아릴 라디칼이고,
An-는 3 내지 6 범위의 AClogP를 갖는 음이온이고,
<화학식 VI>
상기 식에서,
R1 내지 R4는 각각 제1항에 정의된 바와 같고,
X-는 음이온 또는 할라이드 이온이고,
<화학식 VII>
상기 식에서,
M+는 양이온, 알칼리 금속 이온 또는 암모늄 이온이고,
An-는 3 내지 6 범위의 AClogP를 갖는 음이온이다. - 제13항에 있어서, 화학식 VII의 염을, 화학식 Ia의 물질 또는 화학식 Ia 및 Ib의 물질의 총 합계에 대하여 0.5 내지 10:100 또는 1 내지 5:100의 몰비로 사용하는 것을 특징으로 하는, 공개시제를 제조하는 방법.
- 제13항 또는 제14항에 있어서, 화학식 II의 염을, 화학식 Ia, Ib의 물질 및 화학식 VII의 염의 총 합계에 대하여 100 내지 110:100, 100 내지 105:100, 또는 100 내지 102:100의 몰비로 사용하는 것을 특징으로 하는, 공개시제를 제조하는 방법.
- 제13항 또는 제14항에 따른 방법에 의해 제조가능한 공개시제.
- 화학식 VIII의 보레이트:
<화학식 VIII>
상기 식에서,
R31은 임의로 분지화된 C14- 내지 C22-알킬 라디칼이고,
R32는 C7- 내지 C10-아르알킬 라디칼이고,
R33 및 R34는 각각 독립적으로 임의로 치환된 C1- 또는 C2-알킬 라디칼이거나, 임의로 분지화된 및/또는 임의로 치환된 C3- 내지 C5-알킬 라디칼이고,
R41은 C2- 내지 C22-알킬, C3- 내지 C22-알케닐, C5- 내지 C7-시클로알킬 또는 C7- 내지 C13-아르알킬 라디칼이고,
R42 내지 R44는 각각 독립적으로, 할로겐, C1- 내지 C4-알킬, 트리플루오로메틸, C1- 내지 C4-알콕시, 트리플루오로메톡시, 페닐 및 페녹시로부터 선택된 1개 이상의 라디칼에 의해 치환된 C6- 내지 C10-아릴 라디칼이거나,
또는 상기 식에서,
R31은 임의로 분지화된 C14- 내지 C22-알킬 라디칼이고,
R32는 임의로 분지화된 C8- 내지 C22-알킬 라디칼 또는 C7- 내지 C10-아르알킬 라디칼이고,
R33 및 R34는 함께 -(CH2)4-, -(CH2)5- 또는 -(CH2)2-O-(CH2)2- 가교를 형성하고,
R41은 C2- 내지 C22-알킬, C3- 내지 C22-알케닐, C5- 내지 C7-시클로알킬 또는 C7- 내지 C13-아르알킬 라디칼이고,
R42 내지 R44는 각각 독립적으로, 할로겐, C1- 내지 C4-알킬, 트리플루오로메틸, C1- 내지 C4-알콕시, 트리플루오로메톡시, 페닐 및 페녹시로부터 선택된 1개 이상의 라디칼에 의해 치환된 C6- 내지 C10-아릴 라디칼이거나,
또는 상기 식에서,
R31은 임의로 분지화된 C14- 내지 C22-알킬 라디칼이고,
R32는, 임의로 분지화된 C3- 내지 C8-알킬 라디칼, 임의로 분지화된 C3- 내지 C8-알콕시 라디칼, 트리플루오로메틸, 트리플루오로메톡시, 시클로펜틸, 시클로헥실, 시클로헵틸, 페닐 및 페녹시의 군으로부터의 1 내지 3개의 라디칼에 의해 치환된 페닐 라디칼이고,
R33 및 R34는 각각 독립적으로 임의로 치환된 C1- 또는 C2-알킬 라디칼이거나, 임의로 분지화된 및/또는 임의로 치환된 C3- 내지 C5-알킬 라디칼이거나, 또는
R41은 C2- 내지 C22-알킬, C3- 내지 C22-알케닐, C5- 내지 C7-시클로알킬 또는 C7- 내지 C13-아르알킬 라디칼이고,
R42 내지 R44는 각각 독립적으로, 할로겐, C1- 내지 C4-알킬, 트리플루오로메틸, C1- 내지 C4-알콕시, 트리플루오로메톡시, 페닐 및 페녹시로부터 선택된 1개 이상의 라디칼에 의해 치환된 C6- 내지 C10-아릴 라디칼이거나,
또는 상기 식에서,
R31은 임의로 분지화된 C14- 내지 C22-알킬 라디칼이고,
R32, R33 및 R34는 N+ 원자와 함께, 적어도 C1- 내지 C8-알킬, C1- 내지 C8-알콕시, C5- 내지 C7-시클로알킬, 벤질 또는 페닐로부터 선택된 1개의 라디칼에 의해 치환된 이미다졸 또는 피리딘 고리를 형성하고,
R41은 C2- 내지 C22-알킬, C3- 내지 C22-알케닐, C5- 내지 C7-시클로알킬 또는 C7- 내지 C13-아르알킬 라디칼이고,
R42 내지 R44는 각각 독립적으로, 할로겐, C1- 내지 C4-알킬, 트리플루오로메틸, C1- 내지 C4-알콕시, 트리플루오로메톡시, 페닐 및 페녹시로부터 선택된 1개 이상의 라디칼에 의해 치환된 C6- 내지 C10-아릴 라디칼이다. - 제17항에 있어서, R42 내지 R44가 각각 4-할로페닐 라디칼 또는 4-알킬-3-할로아릴 라디칼인 것을 특징으로 하는 보레이트.
- 제17항 또는 제18항에 있어서, R32, R33 및 R34가 N+ 원자와 함께, 하기 화학식 IX, X 또는 XI 중 1종에 상응하는 이미다졸 또는 피리딘 고리를 형성하는 것을 특징으로 하는 보레이트:
<화학식 IX>
<화학식 X>
<화학식 XI>
상기 식에서,
R31은 임의로 분지화된 C14- 내지 C22-알킬 라디칼이고,
R51 및 R53은 각각 독립적으로 임의로 분지화된 C3- 내지 C8-알킬 라디칼, 시클로펜틸, 시클로헥실, 시클로헵틸 또는 페닐이고, R51은 추가로 임의로 분지화된 C3- 내지 C8-알콕시 라디칼 또는 페녹시이고, R53은 추가로 페닐 또는 벤질이고,
R52는 C1- 내지 C4-알킬 라디칼이고,
R54는 수소, C1- 내지 C4-알킬 라디칼 또는 페닐이다.
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PCT/EP2014/071877 WO2015055576A1 (de) | 2013-10-17 | 2014-10-13 | Photopolymer-formulierung zur herstellung holographischer medien mit boraten mit niedriger tg |
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JP (1) | JP6446446B2 (ko) |
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CN (1) | CN105814487B (ko) |
ES (1) | ES2679543T3 (ko) |
PL (1) | PL3058423T3 (ko) |
TR (1) | TR201809751T4 (ko) |
TW (1) | TW201527865A (ko) |
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TWI698326B (zh) | 2015-01-14 | 2020-07-11 | 德商科思創德意志股份有限公司 | 以全相光學元件製備光學鑄件之方法及光學鑄件 |
US11098066B2 (en) | 2016-11-09 | 2021-08-24 | Covestro Deutschland Ag | Method for producing triarylorganoborates |
JP6977033B2 (ja) | 2016-11-09 | 2021-12-08 | コベストロ、ドイチュラント、アクチエンゲゼルシャフトCovestro Deutschland Ag | トリアリールオルガノボレートの製造方法 |
CN109890830A (zh) * | 2016-11-09 | 2019-06-14 | 科思创德国股份有限公司 | 制造三芳基-有机-硼酸盐的方法 |
WO2018105537A1 (ja) * | 2016-12-08 | 2018-06-14 | 株式会社日本触媒 | 光ルイス酸発生剤 |
KR102239212B1 (ko) | 2018-12-14 | 2021-04-12 | 주식회사 엘지화학 | 포토폴리머 조성물 |
US11718580B2 (en) | 2019-05-08 | 2023-08-08 | Meta Platforms Technologies, Llc | Fluorene derivatized monomers and polymers for volume Bragg gratings |
US11780819B2 (en) | 2019-11-27 | 2023-10-10 | Meta Platforms Technologies, Llc | Aromatic substituted alkane-core monomers and polymers thereof for volume Bragg gratings |
US11879024B1 (en) | 2020-07-14 | 2024-01-23 | Meta Platforms Technologies, Llc | Soft mold formulations for surface relief grating fabrication with imprinting lithography |
WO2022055315A1 (ko) * | 2020-09-14 | 2022-03-17 | 주식회사 엘지화학 | 홀로그래픽 광학 소자 및 그의 제조방법 |
EP4483366A1 (de) | 2022-02-21 | 2025-01-01 | Covestro Deutschland AG | Photopolymerzusammensetzungen für thermostabile photopolymere im sichtbaren spektralbereich |
EP4483365A1 (de) | 2022-02-21 | 2025-01-01 | Covestro Deutschland AG | Thermostabile photopolymere im sichtbaren spektralbereich und photopolymer-zusammensetzungen damit |
WO2023156485A1 (de) | 2022-02-21 | 2023-08-24 | Covestro Deutschland Ag | Triarylalkylboratsalze als coinitiatoren in nir-photopolymerzusammensetzungen |
CN115322186A (zh) * | 2022-08-17 | 2022-11-11 | 南京工业大学 | 一种光动力抑菌剂及其制备方法和应用 |
WO2024052256A1 (de) | 2022-09-07 | 2024-03-14 | Covestro Deutschland Ag | Spezielle benzopyryliumsalze als farbstoffe für photopolymerzusammensetzungen |
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TW201527865A (zh) | 2015-07-16 |
EP3058423A1 (de) | 2016-08-24 |
KR20160072158A (ko) | 2016-06-22 |
TR201809751T4 (tr) | 2018-07-23 |
CN105814487B (zh) | 2019-11-08 |
WO2015055576A1 (de) | 2015-04-23 |
US20160252808A1 (en) | 2016-09-01 |
CN105814487A (zh) | 2016-07-27 |
US10001703B2 (en) | 2018-06-19 |
PL3058423T3 (pl) | 2018-09-28 |
ES2679543T3 (es) | 2018-08-28 |
JP2016537452A (ja) | 2016-12-01 |
EP3058423B1 (de) | 2018-04-18 |
JP6446446B2 (ja) | 2018-12-26 |
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