KR102186432B1 - 플라즈마 전극장치 - Google Patents
플라즈마 전극장치 Download PDFInfo
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- KR102186432B1 KR102186432B1 KR1020140034441A KR20140034441A KR102186432B1 KR 102186432 B1 KR102186432 B1 KR 102186432B1 KR 1020140034441 A KR1020140034441 A KR 1020140034441A KR 20140034441 A KR20140034441 A KR 20140034441A KR 102186432 B1 KR102186432 B1 KR 102186432B1
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- SMZOGRDCAXLAAR-UHFFFAOYSA-N aluminium isopropoxide Chemical compound [Al+3].CC(C)[O-].CC(C)[O-].CC(C)[O-] SMZOGRDCAXLAAR-UHFFFAOYSA-N 0.000 description 1
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- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
- B01D53/323—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00 by electrostatic effects or by high-voltage electric fields
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- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
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Abstract
Description
도 2는 도 1의 "A" 부분을 확대한 도면이다.
도 3은 본 발명의 실시예에 따른 플라즈마 전극장치의 분해 사시도이다.
도 4는 본 발명의 실시예에 따른 제 1 기판의 구성을 보여주는 평면도이다.
도 5는 본 발명의 실시예에 따른 제 2 기판의 구성을 보여주는 평면도이다.
도 6은 도 1의 I-I'를 따라 절개한 단면도이다.
201 : 제 1 기판 본체 210 : 접지전극
220 : 제 1 절연체 230 : 광촉매부
240 : 제 1 방전전극 241 : 방전 전극부
242 : 연결라인 243 : 패턴 프레임
245 : 방전침 250 : 제 1 유동공
300 : 제 2 기판 301 : 제 2 기판 본체
310 : 제 2 방전전극 320 : 제 2 절연체
350 : 제 2 유동공
Claims (11)
- 다수의 제 1 유동공이 배열되는 제 1 기판; 및
상기 제 1 기판으로부터 소정 간격 이격되고, 다수의 제 2 유동공이 배열되는 제 2 기판을 포함하고,
상기 제 1 기판은,
접지 전극과, 상기 접지 전극을 둘러싸는 에폭시 재질의 제 1 절연체를 포함하는 제 1 기판 본체;
상기 제 1 절연체의 상면에 형성되는 제 1 방전 전극; 및
상기 제 1 방전 전극과 상기 제 1 절연체 사이에 코팅되는 광촉매부를 포함하고,
상기 제 2 기판은,
제 2 방전 전극;
상기 제 2 방전 전극을 둘러싸는 에폭시 재질의 제 2 절연체를 포함하며,
상기 다수의 제 1 유동공은, 상기 제 1 기판의 길이 방향 및 폭 방향으로 간격을 두어 배열되고,
상기 제 2 유동공은, 상기 제 1 유동공과 동일한 수로 구비되고, 상기 제 1 유동공과 마주보고 정렬되어 각각 연통하며,
상기 제 1 방전 전극은,
상기 제 1 기판의 길이 방향 및 폭 방향으로 배열되는 다수의 유동공들 중 일부의 가장자리를 둘러싸는 형태로 형성되며,
상기 제 1 기판의 길이 방향 및 폭 방향으로, 상기 제 1 방전 전극이 형성된 유동공과 상기 제 1 방전 전극이 형성되지 않은 유동공이 교번하여 형성되는 것을 특징으로 하는 플라즈마 전극장치. - 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 제 1 항에 있어서,
상기 광촉매부에는,
인산은(Ag3PO4), 이산화티타늄(TiO2) 및 무기 바인더가 포함되는 플라즈마 전극장치. - 삭제
- 제 1 항에 있어서,
상기 제 1 방전전극에는,
전원이 인가되는 방전 전극부;
상기 제 1 유동공을 둘러싸도록 배치되는 패턴 프레임; 및
상기 패턴 프레임에 구비되는 하나 이상의 방전침이 포함되는 플라즈마 전극장치. - 삭제
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