KR102136197B1 - 탄화탄탈 코팅 재료 - Google Patents
탄화탄탈 코팅 재료 Download PDFInfo
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- KR102136197B1 KR102136197B1 KR1020180163541A KR20180163541A KR102136197B1 KR 102136197 B1 KR102136197 B1 KR 102136197B1 KR 1020180163541 A KR1020180163541 A KR 1020180163541A KR 20180163541 A KR20180163541 A KR 20180163541A KR 102136197 B1 KR102136197 B1 KR 102136197B1
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- tantalum carbide
- carbide coating
- thermal expansion
- expansion coefficient
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- 239000011248 coating agent Substances 0.000 title claims abstract description 71
- 238000000576 coating method Methods 0.000 title claims abstract description 71
- 239000000463 material Substances 0.000 title claims abstract description 48
- 229910052715 tantalum Inorganic materials 0.000 title description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 title description 2
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 claims abstract description 86
- 229910003468 tantalcarbide Inorganic materials 0.000 claims abstract description 86
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 56
- 239000000758 substrate Substances 0.000 claims abstract description 42
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 40
- 229910002804 graphite Inorganic materials 0.000 claims description 12
- 239000010439 graphite Substances 0.000 claims description 12
- 238000005452 bending Methods 0.000 claims description 5
- 229910021389 graphene Inorganic materials 0.000 claims description 4
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical compound C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 claims description 3
- 229910003472 fullerene Inorganic materials 0.000 claims description 3
- 230000000052 comparative effect Effects 0.000 description 13
- 239000011247 coating layer Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 239000003575 carbonaceous material Substances 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- 239000007770 graphite material Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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Abstract
Description
도 2는 본 발명의 실시예 및 비교예를 통해 제조된 탄화탄탈 코팅 재료의 흑연 소재별 휨의 경향을 나타낸 그래프이다.
흑연(기재) | 탄화탄탈 코팅 | ||||
실시예 1 | 실시예 2 | 실시예 3 | 비교예 1 | ||
열팽창계수 (10-6/℃) |
4.15 | 5.09 | 6.0 | 7.8 | 7~7.8 |
마이크로 크랙의 폭 (㎛) | |||
실시예 1 | 실시예 2 | 실시예 3 | 비교예 1 |
0.91 | 0.59 | 0.53 | - |
Claims (8)
- 탄소 기재; 및
상기 탄소 기재 상에 형성된 탄화탄탈 코팅;를 포함하고,
상기 탄소 기재의 열팽창계수 및 상기 탄화탄탈 코팅의 열팽창계수의 차이가 1.0×10-6/℃ 이상이고,
상기 탄화탄탈 코팅은 0.1 ㎛ 내지 1.5 ㎛ 폭의 크랙을 포함하는 것인,
탄화탄탈 코팅 재료.
- 제1항에 있어서,
상기 탄소 기재의 열팽창계수 및 상기 탄화탄탈 코팅의 열팽창계수의 차이가 1.5×10-6/℃ 이상인 것인,
탄화탄탈 코팅 재료.
- 제1항에 있어서,
상기 탄소 기재의 열팽창계수 및 상기 탄화탄탈 코팅의 열팽창계수의 차이가 2.0×10-6/℃ 이상인 것인,
탄화탄탈 코팅 재료.
- 제1항에 있어서,
상기 탄소 기재의 열팽창계수는 4.0×10-6/℃ 내지 6.0×10-6/℃인 것인,
탄화탄탈 코팅 재료.
- 제1항에 있어서,
상기 탄화탄탈 코팅의 열팽창계수는 7.0×10-6/℃ 내지 7.8×10-6/℃인 것인,
탄화탄탈 코팅 재료.
- 제1항에 있어서,
상기 탄소 기재는,
그래핀, 흑연 및 플러렌으로 이루어진 군으로부터 선택된 적어도 하나를 포함하는 것인,
탄화탄탈 코팅 재료.
- 삭제
- 제1항에 있어서,
상기 탄화탄탈 코팅 재료의 휨은 20 ㎛ 이하인 것인,
탄화탄탈 코팅 재료.
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020180163541A KR102136197B1 (ko) | 2018-12-17 | 2018-12-17 | 탄화탄탈 코팅 재료 |
JP2019224721A JP7696198B2 (ja) | 2018-12-17 | 2019-12-12 | 炭化タンタルコーティング材料 |
CN201911290562.3A CN111320491A (zh) | 2018-12-17 | 2019-12-16 | 碳化钽涂层材料 |
US16/717,525 US11780732B2 (en) | 2018-12-17 | 2019-12-17 | Carbonated tantalum coating material |
TW108146116A TWI820273B (zh) | 2018-12-17 | 2019-12-17 | 碳化鉭塗層材料 |
EP19216866.4A EP3670450A1 (en) | 2018-12-17 | 2019-12-17 | Tantalum carbide coating material |
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KR1020180163541A KR102136197B1 (ko) | 2018-12-17 | 2018-12-17 | 탄화탄탈 코팅 재료 |
Publications (2)
Publication Number | Publication Date |
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KR20200074771A KR20200074771A (ko) | 2020-06-25 |
KR102136197B1 true KR102136197B1 (ko) | 2020-07-22 |
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KR1020180163541A Active KR102136197B1 (ko) | 2018-12-17 | 2018-12-17 | 탄화탄탈 코팅 재료 |
Country Status (6)
Country | Link |
---|---|
US (1) | US11780732B2 (ko) |
EP (1) | EP3670450A1 (ko) |
JP (1) | JP7696198B2 (ko) |
KR (1) | KR102136197B1 (ko) |
CN (1) | CN111320491A (ko) |
TW (1) | TWI820273B (ko) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112374891B (zh) * | 2020-11-16 | 2021-11-23 | 南京工业大学 | 一种石墨基座盘表面梯度TaC涂层 |
KR102600114B1 (ko) * | 2020-12-01 | 2023-11-10 | 주식회사 티씨케이 | 탄화탄탈 코팅 탄소 재료 및 이의 제조방법 |
CN112830815A (zh) * | 2021-01-20 | 2021-05-25 | 中电化合物半导体有限公司 | 一种碳基表面形成的碳化钽涂层及其形成方法和用途 |
CN113185324B (zh) * | 2021-06-10 | 2022-03-08 | 中电化合物半导体有限公司 | 石墨件及其处理方法、单晶生长设备 |
JP7544671B2 (ja) | 2021-08-12 | 2024-09-03 | 信越化学工業株式会社 | 炭化タンタル被覆炭素材料 |
CN114368984B (zh) * | 2022-01-27 | 2023-04-14 | 中电化合物半导体有限公司 | 一种碳基体的涂层及其制备方法与应用 |
CN116023169A (zh) * | 2022-12-28 | 2023-04-28 | 苏州优晶光电科技有限公司 | 一种石墨处理工艺及石墨结构 |
Citations (1)
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JP2007308369A (ja) | 2007-07-27 | 2007-11-29 | Toyo Tanso Kk | 還元性雰囲気炉用炭素複合材料及びその製造方法 |
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JPS63129071A (ja) * | 1986-11-20 | 1988-06-01 | 品川白煉瓦株式会社 | 耐スポ−リング性炭化珪素質耐火物 |
JP3282700B2 (ja) * | 1994-04-15 | 2002-05-20 | 石川島播磨重工業株式会社 | コーティング膜の形成法 |
JP4498477B2 (ja) * | 1997-03-04 | 2010-07-07 | 東洋炭素株式会社 | 還元性雰囲気炉用炭素複合材料及びその製造方法 |
JP3938361B2 (ja) * | 2002-06-28 | 2007-06-27 | イビデン株式会社 | 炭素複合材料 |
FR2857502B1 (fr) | 2003-07-10 | 2006-02-24 | Soitec Silicon On Insulator | Substrats pour systemes contraints |
CN100450978C (zh) * | 2005-02-14 | 2009-01-14 | 东洋炭素株式会社 | 碳化钽被覆碳材料及其制造方法 |
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JP4641536B2 (ja) * | 2007-07-27 | 2011-03-02 | 東洋炭素株式会社 | 還元性雰囲気炉用炭素複合材料及びその製造方法 |
CN101445392B (zh) * | 2008-12-31 | 2012-05-30 | 中南大学 | 一种石墨基体无裂纹TaC涂层及其制造方法 |
CN103922797B (zh) * | 2009-12-28 | 2016-03-16 | 东洋炭素株式会社 | 碳化钽被覆碳材料及其制造方法 |
JP6219238B2 (ja) | 2014-06-24 | 2017-10-25 | 東洋炭素株式会社 | サセプタ及びその製造方法 |
CN105839070B (zh) * | 2016-01-29 | 2018-01-23 | 中南大学 | 一种低摩擦纳米TaC增强炭基复相薄膜的制备方法 |
KR20170133191A (ko) * | 2016-05-25 | 2017-12-05 | 주식회사 티씨케이 | 고경도 TaC 코팅 탄소 재료 및 그 제조방법 |
KR20170133193A (ko) * | 2016-05-25 | 2017-12-05 | 주식회사 티씨케이 | 탄화탄탈 다중코팅 재료 및 그 제조방법 |
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TWI820273B (zh) | 2023-11-01 |
US20200207629A1 (en) | 2020-07-02 |
US11780732B2 (en) | 2023-10-10 |
JP7696198B2 (ja) | 2025-06-20 |
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