KR102124380B1 - 세라믹스 적층체, 세라믹스 절연 기판, 및 세라믹스 적층체의 제조 방법 - Google Patents
세라믹스 적층체, 세라믹스 절연 기판, 및 세라믹스 적층체의 제조 방법 Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/02—Coating starting from inorganic powder by application of pressure only
- C23C24/04—Impact or kinetic deposition of particles
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
- H01L23/14—Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
- H01L23/15—Ceramic or glass substrates
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Abstract
Description
도 2는, 제2 상 입자를 타원으로 보고 판단하여 상당 타원을 도시하는 개략도이다.
도 3은, 배향각의 설명에 제공되는 개략도이다.
도 4는, 실시예 1에서 제작한 본 발명의 세라믹스 적층체에 있어서, 복합 세라믹스층과 기재의 접합면에 대하여 직교하는 임의의 단면을, 전계 방사형 주사 전자 현미경으로 관찰하였을 때의 반사 전자상이다.
도 5는, 실시예 3에서 제작한 본 발명의 세라믹스 적층체에 있어서, 복합 세라믹스층과 기재의 접합면에 대하여 직교하는 임의의 단면을, 전계 방사형 주사 전자 현미경으로 관찰하였을 때의 2차 전자상이다.
2: 알루미나상(제1 상)
3: 지르코니아상(제2 상 입자)
4: 공극
Claims (12)
- 기재층의 일부 혹은 전체면에, 알루미나상과 지르코니아상을 포함하여 이루어지는 복합 세라믹스층이 피복된 세라믹스 적층체이며,
상기 복합 세라믹스층과 상기 기재층의 접합면에 대하여 직교하는 임의의 단면에 있어서, 상기 알루미나상 또는 상기 지르코니아상 중 어느 것으로 이루어지는 제1 상 내에, 해당 제1 상보다 총 면적률이 작은 다른 쪽의 상기 지르코니아상 또는 상기 알루미나상으로 이루어지는 제2 상 입자가 분산된 조직을 갖고,
상기 단면 내에 있어서 원 상당 직경이 0.01㎛ 이상인 상기 제2 상 입자와 공극을 계측하였을 때,
상기 제2 상 입자의 원 상당 직경의 최댓값이 5㎛ 이하이고,
상기 제2 상 입자의 원 상당 직경의 평균값이 0.02㎛ 이상 0.3㎛ 이하로 이루어지고,
또한, 상기 제2 상 입자를 타원으로 보고 판단하였을 때의 상당 타원의 긴 직경을 짧은 직경으로 나눈 값의 평균값이 2 이상 10 이하이고,
공극의 면적률이 5% 이하인 것을 특징으로 하는 세라믹스 적층체. - 제1항에 있어서, 상기 제2 상 입자의 무게 중심에 가장 거리가 가까운 상기 접합면의 면 방향과, 상기 제2 상 입자의 상당 타원 긴 직경의 방향이 이루는 각이 -90°내지 90°의 각도로 표현되고, 그 각도의 절댓값을 상기 제2 상 입자의 배향각이라고 하였을 때,
임의의 상기 단면에서는, 60% 이상의 수의 상기 제2 상 입자가 30°이하의 상기 배향각을 갖고 있으며,
또한 상기 배향각의 총합을 상기 제2 상 입자의 총 입자수로 나눈 평균 배향각이 5°이상 35°이하인 것을 특징으로 하는 세라믹스 적층체. - 제1항 또는 제2항에 있어서, 상기 기재층은 구리 또는 알루미늄을 주체로 하고,
상기 복합 세라믹스층은, 상기 기재층과 수직 방향의 두께가 5㎛ 이상 200㎛ 이하인 것을 특징으로 하는 세라믹스 적층체. - 제1항 또는 제2항에 있어서, 상기 제1 상이 알루미나상이고, 상기 제2 상이 지르코니아상인 것을 특징으로 하는 세라믹스 적층체.
- 제1항 또는 제2항에 있어서, 상기 지르코니아상이 적어도 정방정을 함유하고, 이트륨의 함유량이 0.1질량% 이하인 것을 특징으로 하는 세라믹스 적층체.
- 제1항 또는 제2항에 기재된 세라믹스 적층체로 이루어지는 것을 특징으로 하는 세라믹스 절연 기판.
- 제6항에 있어서, 상기 기재층이 구리 또는 알루미늄이며, 상기 복합 세라믹스층을 사이에 두고 반대면에 구리 또는 알루미늄 회로가 형성되어 있는, 세라믹스 절연 기판.
- 제7항에 있어서, 상기 기재층의 두께가 0.5mm 초과이며, 상기 회로의 두께의 2배 이상인, 세라믹스 절연 기판.
- 제1항에 기재된 세라믹스 적층체의 제조 방법이며, 알루미나 원료 입자와 지르코니아 원료 입자를 기체와 혼합하고, 상기 알루미나 원료 입자와 상기 지르코니아 원료 입자를 상기 기체와 함께 기재층의 표면을 향하여 분사하여 충돌시킴으로써, 상기 기재층의 표면에 복합 세라믹스층을 적층하는 것을 특징으로 하는 세라믹스 적층체의 제조 방법.
- 제9항에 있어서, 상기 알루미나 원료 입자와 상기 기체를 혼합하여 하나의 에어로졸을 생성하고, 상기 지르코니아 원료 입자와 상기 기체를 혼합하여 다른 에어로졸을 생성하고,
상기 하나의 에어로졸과 상기 다른 에어로졸을 상기 기재층의 표면을 향하여 분사하는 것을 특징으로 하는 세라믹스 적층체의 제조 방법. - 제9항에 있어서, 상기 알루미나 원료 입자 및 상기 지르코니아 원료 입자를 혼합한 혼합 원료 분말에, 상기 기체를 혼합시켜 에어로졸을 생성하고, 상기 에어로졸을 상기 기재층의 표면을 향하여 분사하는 것을 특징으로 하는 세라믹스 적층체의 제조 방법.
- 제9항 내지 제11항 중 어느 한 항에 있어서, 상기 지르코니아 원료가 전융 분말인, 세라믹스 적층체의 제조 방법.
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