KR102093157B1 - 다층 세라믹 기판 - Google Patents
다층 세라믹 기판 Download PDFInfo
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- KR102093157B1 KR102093157B1 KR1020140169573A KR20140169573A KR102093157B1 KR 102093157 B1 KR102093157 B1 KR 102093157B1 KR 1020140169573 A KR1020140169573 A KR 1020140169573A KR 20140169573 A KR20140169573 A KR 20140169573A KR 102093157 B1 KR102093157 B1 KR 102093157B1
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- 239000000919 ceramic Substances 0.000 title claims abstract description 191
- 239000000758 substrate Substances 0.000 title claims abstract description 47
- 239000000843 powder Substances 0.000 claims abstract description 65
- 229910052751 metal Inorganic materials 0.000 claims abstract description 34
- 239000002184 metal Substances 0.000 claims abstract description 34
- 239000000203 mixture Substances 0.000 claims description 15
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- AYJRCSIUFZENHW-UHFFFAOYSA-L barium carbonate Chemical compound [Ba+2].[O-]C([O-])=O AYJRCSIUFZENHW-UHFFFAOYSA-L 0.000 claims description 3
- 229910000019 calcium carbonate Inorganic materials 0.000 claims description 3
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 167
- 238000010304 firing Methods 0.000 description 14
- 238000004519 manufacturing process Methods 0.000 description 14
- 238000000034 method Methods 0.000 description 11
- 238000010344 co-firing Methods 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- 230000008569 process Effects 0.000 description 9
- 239000011230 binding agent Substances 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- 238000011049 filling Methods 0.000 description 4
- 238000007639 printing Methods 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 239000011733 molybdenum Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000011812 mixed powder Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005056 compaction Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
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- H05K3/00—Apparatus or processes for manufacturing printed circuits
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- H05K3/46—Manufacturing multilayer circuits
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
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- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
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- H05K3/4629—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials laminating inorganic sheets comprising printed circuits, e.g. green ceramic sheets
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
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- H05K2201/0338—Layered conductor, e.g. layered metal substrate, layered finish layer or layered thin film adhesion layer
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- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
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Abstract
Description
도 2 내지 도 4는 본 발명의 실시예에 따른 다층 세라믹 기판의 제조방법이 도시된 공정도로서,
도 2는 복수의 세라믹 그린 시트에 내부 전극, 비아 전극 및 외부 전극 중 적어도 하나 이상을 형성한 후의 단면도이고,
도 3은 내부 전극, 비아 전극 및 외부 전극 중 적어도 하나 이상이 형성된 복수의 세라믹 그린 시트를 적층한 후의 단면도이고,
도 4는 세라믹 시트 적층체의 동시소성 후의 단면도이다.
120 : 내부 전극 130 : 비아 전극
140 : 외부 전극 142 : 제1 도전층
144 : 제2 도전층 146 : 제3 도전층
110a, 110b, 110c, 110d : 세라믹 시트
110a', 110b', 110c', 110d': 세라믹 그린 시트
Claims (13)
- 다층의 세라믹층; 및
상기 다층의 세라믹층 중 최외각층의 일 영역을 관통하여 매립된 제1 도전층, 상기 제1 도전층 상에 순차 적층된 제2 도전층 및 제3 도전층으로 구성된 외부 전극;을 포함하되,
상기 제1 도전층 및 상기 제2 도전층은 세라믹 분말 및 금속 분말로 형성되며,
상기 제1 도전층 및 상기 제2 도전층의 세라믹 분말은
상기 세라믹층의 조성과 동일 성분; 및 탄산마그네슘(MgCO3), 탄산바륨(BaCO3), 탄산칼슘(CaCO3) 및 실리카(SiO2) 중에서 선택된 어느 하나 이상;이 더 함유되는 다층 세라믹 기판.
- 제1항에 있어서,
상기 제1 도전층은 상기 제2 도전층보다 상기 세라믹 분말의 함량이 높은 다층 세라믹 기판.
- 제1항에 있어서,
상기 제1 도전층은 세라믹 분말 대비 금속 분말의 조성비가 20중량%~30중량%:70중량%~80중량%인 다층 세라믹 기판.
- 제1항에 있어서,
상기 제2 도전층은 세라믹 분말 대비 금속 분말의 조성비가 5중량%~10중량%:90중량%~95중량%인 다층 세라믹 기판.
- 제1항에 있어서,
상기 제3 도전층은 금속 분말로 형성되는 다층 세라믹 기판.
- 제1항에 있어서,
상기 제2 도전층은 상기 세라믹층의 최외각면보다 돌출되는 다층 세라믹 기판.
- 제1항에 있어서,
상기 제2 도전층의 폭을 W2, 상기 제1 도전층의 폭을 W1으로 정의할 때,
상기 W1, W2 간에는 W1≤W2 관계가 성립되는 다층 세라믹 기판.
- 제1항에 있어서,
상기 세라믹층과 상기 외부 전극은 동시소성된 것인 다층 세라믹 기판.
- 삭제
- 삭제
- 제1항에 있어서,
상기 제3 도전층은 상기 제2 도전층의 상면과 측면을 덮는 다층 세라믹 기판.
- 제1항에 있어서,
상기 다층 세라믹 기판은
상기 다층의 세라믹층의 내부에 복수의 내부 전극 및 복수의 비아 전극이 더 형성되고,
상기 복수의 비아 전극 중 일부는 상기 제1 도전층과 접속되는 다층 세라믹 기판.
- 제1항에 있어서,
상기 다층의 세라믹층 중 최외각층은
최상층 또는 최하층 중 적어도 어느 하나인 다층 세라믹 기판.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020140169573A KR102093157B1 (ko) | 2014-12-01 | 2014-12-01 | 다층 세라믹 기판 |
US14/887,108 US9974173B2 (en) | 2014-12-01 | 2015-10-19 | Multilayer ceramic substrate and manufacturing thereof |
US15/589,078 US20170245375A1 (en) | 2014-12-01 | 2017-05-08 | Multilayer ceramic substrate and manufacturing thereof |
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KR1020140169573A KR102093157B1 (ko) | 2014-12-01 | 2014-12-01 | 다층 세라믹 기판 |
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KR20160065512A KR20160065512A (ko) | 2016-06-09 |
KR102093157B1 true KR102093157B1 (ko) | 2020-03-25 |
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US11419218B2 (en) | 2017-06-29 | 2022-08-16 | Dit Co., Ltd. | Multilayered ceramic substrate and method for manufacturing same |
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WO2017195572A1 (ja) * | 2016-05-09 | 2017-11-16 | 株式会社村田製作所 | セラミック電子部品 |
US11309251B2 (en) * | 2017-07-31 | 2022-04-19 | AdTech Ceramics Company | Selective metallization of integrated circuit packages |
KR102393213B1 (ko) * | 2017-09-07 | 2022-05-02 | 삼성전기주식회사 | 적층 세라믹 커패시터 및 그 제조방법 |
KR101994950B1 (ko) * | 2017-09-15 | 2019-07-01 | 에스케이씨 주식회사 | 입자상 물질 센서 및 이의 제조방법 |
US10720338B1 (en) * | 2017-11-07 | 2020-07-21 | Honeywell Federal Manufacturing & Technologies, Llc | Low temperature cofired ceramic substrates and fabrication techniques for the same |
US12226822B2 (en) | 2018-10-10 | 2025-02-18 | Schlumberger Technology Corporation | Additive manufacturing process of 3D electronic substrate |
US11765839B2 (en) * | 2018-10-10 | 2023-09-19 | Schlumberger Technology Corporation | Additive manufactured 3D electronic substrate |
US11062976B2 (en) | 2019-05-03 | 2021-07-13 | International Business Machines Corporation | Functional stiffener that enables land grid array interconnections and power decoupling |
US11770906B2 (en) | 2021-08-27 | 2023-09-26 | Schlumberger Technology Corporation | 3D-printed ceramics with conductor infusion for ultra-high-speed electronics |
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JP2011146444A (ja) * | 2010-01-12 | 2011-07-28 | Ngk Spark Plug Co Ltd | 基板内蔵用部品及びその製造方法並びに配線基板 |
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JP3286651B2 (ja) * | 1993-12-27 | 2002-05-27 | 株式会社住友金属エレクトロデバイス | セラミック多層配線基板およびその製造法並びにセラミック多層配線基板用導電材料 |
US5613181A (en) * | 1994-12-21 | 1997-03-18 | International Business Machines Corporation | Co-sintered surface metallization for pin-join, wire-bond and chip attach |
US6238741B1 (en) * | 1998-12-07 | 2001-05-29 | International Business Machines Corporation | Single mask screening process |
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JP2004260098A (ja) | 2003-02-27 | 2004-09-16 | Murata Mfg Co Ltd | 多層セラミック基板およびその製造方法 |
ES2287749T3 (es) * | 2003-08-08 | 2007-12-16 | Sumitomo Electric Industries, Ltd. | Pastas electricamente conductoras. |
TW200920215A (en) * | 2007-10-17 | 2009-05-01 | Murata Manufacturing Co | Multilayer ceramic substrate and process for producing the multilayer ceramic |
US8383011B2 (en) * | 2008-01-30 | 2013-02-26 | Basf Se | Conductive inks with metallo-organic modifiers |
KR100956212B1 (ko) | 2008-04-25 | 2010-05-04 | 삼성전기주식회사 | 다층 세라믹 기판의 제조 방법 |
KR20110019536A (ko) * | 2009-08-20 | 2011-02-28 | 삼성전기주식회사 | 세라믹 기판 및 그 제조방법 |
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JP2011146444A (ja) * | 2010-01-12 | 2011-07-28 | Ngk Spark Plug Co Ltd | 基板内蔵用部品及びその製造方法並びに配線基板 |
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US11419218B2 (en) | 2017-06-29 | 2022-08-16 | Dit Co., Ltd. | Multilayered ceramic substrate and method for manufacturing same |
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US20160157341A1 (en) | 2016-06-02 |
KR20160065512A (ko) | 2016-06-09 |
US20170245375A1 (en) | 2017-08-24 |
US9974173B2 (en) | 2018-05-15 |
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