KR102060947B1 - 접속 부품용 도전 재료 - Google Patents
접속 부품용 도전 재료 Download PDFInfo
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- KR102060947B1 KR102060947B1 KR1020177030146A KR20177030146A KR102060947B1 KR 102060947 B1 KR102060947 B1 KR 102060947B1 KR 1020177030146 A KR1020177030146 A KR 1020177030146A KR 20177030146 A KR20177030146 A KR 20177030146A KR 102060947 B1 KR102060947 B1 KR 102060947B1
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- 239000004020 conductor Substances 0.000 title claims abstract description 52
- 239000011247 coating layer Substances 0.000 claims abstract description 258
- 239000000463 material Substances 0.000 claims abstract description 209
- 229910017755 Cu-Sn Inorganic materials 0.000 claims abstract description 115
- 229910017927 Cu—Sn Inorganic materials 0.000 claims abstract description 115
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 claims abstract description 115
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 109
- 239000000956 alloy Substances 0.000 claims abstract description 109
- 238000005096 rolling process Methods 0.000 claims abstract description 71
- 229910000881 Cu alloy Inorganic materials 0.000 claims abstract description 40
- 238000007545 Vickers hardness test Methods 0.000 claims abstract description 15
- 239000010949 copper Substances 0.000 claims description 69
- 239000010410 layer Substances 0.000 claims description 60
- 238000012360 testing method Methods 0.000 claims description 47
- 238000000034 method Methods 0.000 claims description 34
- 238000007747 plating Methods 0.000 description 43
- 230000003746 surface roughness Effects 0.000 description 20
- 238000005259 measurement Methods 0.000 description 19
- 238000003780 insertion Methods 0.000 description 12
- 230000037431 insertion Effects 0.000 description 12
- 238000011088 calibration curve Methods 0.000 description 11
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 238000005097 cold rolling Methods 0.000 description 9
- 238000009792 diffusion process Methods 0.000 description 9
- 229910017482 Cu 6 Sn 5 Inorganic materials 0.000 description 8
- 229910001128 Sn alloy Inorganic materials 0.000 description 8
- 229910052718 tin Inorganic materials 0.000 description 7
- 238000005260 corrosion Methods 0.000 description 6
- 230000007797 corrosion Effects 0.000 description 6
- 230000003647 oxidation Effects 0.000 description 6
- 238000007254 oxidation reaction Methods 0.000 description 6
- 238000005498 polishing Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 230000001105 regulatory effect Effects 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 238000004080 punching Methods 0.000 description 4
- BTJIUGUIPKRLHP-UHFFFAOYSA-N 4-nitrophenol Chemical compound OC1=CC=C([N+]([O-])=O)C=C1 BTJIUGUIPKRLHP-UHFFFAOYSA-N 0.000 description 3
- 229910000990 Ni alloy Inorganic materials 0.000 description 3
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- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 239000002356 single layer Substances 0.000 description 3
- 235000011121 sodium hydroxide Nutrition 0.000 description 3
- 239000002345 surface coating layer Substances 0.000 description 3
- 229910001369 Brass Inorganic materials 0.000 description 2
- 229910000531 Co alloy Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910000640 Fe alloy Inorganic materials 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 239000010953 base metal Substances 0.000 description 2
- 238000009412 basement excavation Methods 0.000 description 2
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- 101100258233 Caenorhabditis elegans sun-1 gene Proteins 0.000 description 1
- 206010028980 Neoplasm Diseases 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- 238000000441 X-ray spectroscopy Methods 0.000 description 1
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- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000008520 organization Effects 0.000 description 1
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- 239000011574 phosphorus Substances 0.000 description 1
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- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
- C25D5/50—After-treatment of electroplated surfaces by heat-treatment
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
- C25D5/50—After-treatment of electroplated surfaces by heat-treatment
- C25D5/505—After-treatment of electroplated surfaces by heat-treatment of electroplated tin coatings, e.g. by melting
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
- H01R13/02—Contact members
- H01R13/03—Contact members characterised by the material, e.g. plating, or coating materials
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/30—Electroplating: Baths therefor from solutions of tin
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
도 2는 마찰 계수 측정 지그의 개념도이다.
2, 3: 오목부의 대각선
4: 숫시험편
5: 대
6: 암시험편
7: 추
8: 로드 셀
Claims (10)
- 구리 합금 판조로 이루어지는 모재의 표면에, Cu 함유량이 20∼70at%이고 평균 두께가 0.2∼3.0μm인 Cu-Sn 합금 피복층과 평균 두께가 0.2∼5.0μm인 리플로 Sn 피복층이 모재측으로부터 순차로 배치되고, 적어도 1방향에 있어서의 산술 평균 거칠기 Ra가 0.15μm 이상이고, 모든 방향에 있어서의 산술 평균 거칠기 Ra가 3.0μm 이하이며, 상기 리플로 Sn 피복층의 표면에 상기 Cu-Sn 합금 피복층의 일부가 노출되어 형성되고, 상기 Cu-Sn 합금 피복층의 재료 표면 노출 면적률이 3∼75%이며, 적어도 1방향에 있어서의 평균의 재료 표면 노출 간격이 0.01∼0.5mm인 접속 부품용 도전 재료에 있어서,
시험력을 가하는 방향에 평행한 면으로서 정사각뿔의 압자의 능선 중 1개를 포함하는 면을 상기 모재의 압연 방향에 평행하게 향하게 하고, 4.903N의 시험력을 상기 모재 표면에 가하여 10초간 유지하는 비커스 경도 시험을 행하고, 상기 시험력을 해제한 후에 상기 모재 표면에 남은 오목부의 압연 방향에 평행한 대각선의 길이로부터 구한 비커스 경도를 VL, 압연 방향에 수직한 대각선의 길이로부터 구한 비커스 경도를 VT로 했을 때, VT-VL≥4이며,
압연 방향에 대해 45°방향 및 수직 방향의 마찰 계수가, 압연 방향에 대해 평행 방향의 마찰 계수보다 작고,
압연 방향에 대해 45°방향의 마찰 계수가, 압연 방향에 대해 수직 방향의 마찰 계수보다 작으며,
상기 리플로 Sn 피복층의 표면에 노출되는 상기 Cu-Sn 합금 피복층의 두께가 0.2μm 이상인 것을 특징으로 하는 접속 부품용 도전 재료. - 제 1 항에 있어서,
상기 모재의 표면과 상기 Cu-Sn 합금 피복층 사이에 추가로 Cu 피복층을 갖는 것을 특징으로 하는 접속 부품용 도전 재료. - 제 1 항 또는 제 2 항에 있어서,
상기 모재의 표면과 상기 Cu-Sn 합금 피복층 사이에 추가로 Ni 피복층, Co 피복층 및 Fe 피복층 중 어느 1개 또는 2개로 이루어지는 하지층이 형성되고, 동 하지층의 평균 두께가 0.1∼3.0μm인 것을 특징으로 하는 접속 부품용 도전 재료. - 제 3 항에 있어서,
상기 하지층과 Cu-Sn 합금 피복층 사이에 추가로 Cu 피복층을 갖는 것을 특징으로 하는 접속 부품용 도전 재료. - 제 1 항 또는 제 2 항에 있어서,
상기 모재의 표면은, 적어도 1방향에 있어서의 산술 평균 거칠기 Ra가 0.3μm 이상이고, 모든 방향에 있어서의 산술 평균 거칠기 Ra가 4.0μm 이하인 것을 특징으로 하는 접속 부품용 도전 재료. - 제 3 항에 있어서,
상기 모재의 표면은, 적어도 1방향에 있어서의 산술 평균 거칠기 Ra가 0.3μm 이상이고, 모든 방향에 있어서의 산술 평균 거칠기 Ra가 4.0μm 이하인 것을 특징으로 하는 접속 부품용 도전 재료. - 제 4 항에 있어서,
상기 모재의 표면은, 적어도 1방향에 있어서의 산술 평균 거칠기 Ra가 0.3μm 이상이고, 모든 방향에 있어서의 산술 평균 거칠기 Ra가 4.0μm 이하인 것을 특징으로 하는 접속 부품용 도전 재료. - 제 5 항에 있어서,
상기 모재의 표면은, 적어도 1방향에 있어서의 요철의 평균 간격 Sm이 0.01∼0.5mm인 것을 특징으로 하는 접속 부품용 도전 재료. - 제 6 항에 있어서,
상기 모재의 표면은, 적어도 1방향에 있어서의 요철의 평균 간격 Sm이 0.01∼0.5mm인 것을 특징으로 하는 접속 부품용 도전 재료. - 제 7 항에 있어서,
상기 모재의 표면은, 적어도 1방향에 있어서의 요철의 평균 간격 Sm이 0.01∼0.5mm인 것을 특징으로 하는 접속 부품용 도전 재료.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2015-059759 | 2015-03-23 | ||
JP2015059759A JP6000392B1 (ja) | 2015-03-23 | 2015-03-23 | 接続部品用導電材料 |
PCT/JP2016/057091 WO2016152495A1 (ja) | 2015-03-23 | 2016-03-08 | 接続部品用導電材料 |
Publications (2)
Publication Number | Publication Date |
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KR20170129880A KR20170129880A (ko) | 2017-11-27 |
KR102060947B1 true KR102060947B1 (ko) | 2019-12-31 |
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KR1020177030146A Expired - Fee Related KR102060947B1 (ko) | 2015-03-23 | 2016-03-08 | 접속 부품용 도전 재료 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20180044807A1 (ko) |
EP (1) | EP3276048A4 (ko) |
JP (1) | JP6000392B1 (ko) |
KR (1) | KR102060947B1 (ko) |
CN (1) | CN107429416B (ko) |
WO (1) | WO2016152495A1 (ko) |
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JP7272224B2 (ja) * | 2019-09-30 | 2023-05-12 | 三菱マテリアル株式会社 | コネクタ用端子材 |
Citations (3)
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JP2004068026A (ja) | 2001-07-31 | 2004-03-04 | Kobe Steel Ltd | 接続部品用導電材料及びその製造方法 |
JP2006183068A (ja) | 2004-12-27 | 2006-07-13 | Kobe Steel Ltd | 接続部品用導電材料及びその製造方法 |
JP2010075988A (ja) | 2008-09-29 | 2010-04-08 | Dowa Metaltech Kk | 板材の打抜き加工方法 |
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JP3926355B2 (ja) * | 2004-09-10 | 2007-06-06 | 株式会社神戸製鋼所 | 接続部品用導電材料及びその製造方法 |
KR100870334B1 (ko) * | 2004-09-10 | 2008-11-25 | 가부시키가이샤 고베 세이코쇼 | 접속 부품용 도전 재료 및 그의 제조방법 |
JP5050226B2 (ja) * | 2005-03-31 | 2012-10-17 | Dowaメタルテック株式会社 | 銅合金材料の製造法 |
JP4974193B2 (ja) * | 2008-02-08 | 2012-07-11 | 古河電気工業株式会社 | 電気電子部品用銅合金板材 |
JP5950499B2 (ja) * | 2011-02-11 | 2016-07-13 | 株式会社神戸製鋼所 | 電気・電子部品用銅合金及びSnめっき付き銅合金材 |
JP6103811B2 (ja) * | 2012-03-30 | 2017-03-29 | 株式会社神戸製鋼所 | 接続部品用導電材料 |
EP2703524A3 (en) * | 2012-08-29 | 2014-11-05 | Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) | Sn-coated copper alloy strip having excellent heat resistance |
JP6591140B2 (ja) * | 2014-01-31 | 2019-10-16 | 日本航空電子工業株式会社 | コネクタ対 |
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2015
- 2015-03-23 JP JP2015059759A patent/JP6000392B1/ja not_active Expired - Fee Related
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2016
- 2016-03-08 CN CN201680017157.2A patent/CN107429416B/zh not_active Expired - Fee Related
- 2016-03-08 WO PCT/JP2016/057091 patent/WO2016152495A1/ja active Application Filing
- 2016-03-08 EP EP16768398.6A patent/EP3276048A4/en not_active Withdrawn
- 2016-03-08 KR KR1020177030146A patent/KR102060947B1/ko not_active Expired - Fee Related
- 2016-03-08 US US15/560,208 patent/US20180044807A1/en not_active Abandoned
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JP2004068026A (ja) | 2001-07-31 | 2004-03-04 | Kobe Steel Ltd | 接続部品用導電材料及びその製造方法 |
JP2006183068A (ja) | 2004-12-27 | 2006-07-13 | Kobe Steel Ltd | 接続部品用導電材料及びその製造方法 |
JP2010075988A (ja) | 2008-09-29 | 2010-04-08 | Dowa Metaltech Kk | 板材の打抜き加工方法 |
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JP2016180128A (ja) | 2016-10-13 |
CN107429416B (zh) | 2019-06-21 |
US20180044807A1 (en) | 2018-02-15 |
EP3276048A1 (en) | 2018-01-31 |
JP6000392B1 (ja) | 2016-09-28 |
EP3276048A4 (en) | 2018-12-12 |
KR20170129880A (ko) | 2017-11-27 |
CN107429416A (zh) | 2017-12-01 |
WO2016152495A1 (ja) | 2016-09-29 |
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