KR102015938B1 - 산 무수물기 함유 오르가노실록산 및 그의 제조 방법 - Google Patents
산 무수물기 함유 오르가노실록산 및 그의 제조 방법 Download PDFInfo
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- KR102015938B1 KR102015938B1 KR1020190049016A KR20190049016A KR102015938B1 KR 102015938 B1 KR102015938 B1 KR 102015938B1 KR 1020190049016 A KR1020190049016 A KR 1020190049016A KR 20190049016 A KR20190049016 A KR 20190049016A KR 102015938 B1 KR102015938 B1 KR 102015938B1
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- 125000004018 acid anhydride group Chemical group 0.000 title claims abstract description 56
- 125000005375 organosiloxane group Chemical group 0.000 title claims abstract description 55
- 238000000034 method Methods 0.000 title description 9
- 229920000570 polyether Polymers 0.000 claims abstract description 57
- 239000004721 Polyphenylene oxide Substances 0.000 claims abstract description 56
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims abstract description 35
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 21
- 125000005843 halogen group Chemical group 0.000 claims abstract description 14
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- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 19
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 claims description 18
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 18
- 229910052739 hydrogen Inorganic materials 0.000 claims description 16
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- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 7
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- 239000003054 catalyst Substances 0.000 claims description 6
- 125000002252 acyl group Chemical group 0.000 claims description 5
- OKFSRIDZHGKYED-UHFFFAOYSA-N 2-trimethoxysilylpropanoic acid Chemical compound CO[Si](OC)(OC)C(C)C(O)=O OKFSRIDZHGKYED-UHFFFAOYSA-N 0.000 claims description 4
- 125000003118 aryl group Chemical group 0.000 claims description 4
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 claims description 3
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- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 claims description 3
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- 229920001843 polymethylhydrosiloxane Polymers 0.000 description 18
- PZJJKWKADRNWSW-UHFFFAOYSA-N trimethoxysilicon Chemical group CO[Si](OC)OC PZJJKWKADRNWSW-UHFFFAOYSA-N 0.000 description 17
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- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 5
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- DPZAXHCMFPNUCE-UHFFFAOYSA-N 2-triethoxysilylpropanoic acid Chemical compound CCO[Si](OCC)(OCC)C(C)C(O)=O DPZAXHCMFPNUCE-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
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- RHQSHWZFBPKRLK-UHFFFAOYSA-N 2-dimethoxysilyl-2-methylpropanoic acid Chemical compound CC(C(=O)O)(C)[SiH](OC)OC RHQSHWZFBPKRLK-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 238000005481 NMR spectroscopy Methods 0.000 description 3
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- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
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- 229940014800 succinic anhydride Drugs 0.000 description 3
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- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Polymers CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
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- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
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- 239000000126 substance Substances 0.000 description 2
- JIUWLLYCZJHZCZ-UHFFFAOYSA-N 3-propyloxolane-2,5-dione Chemical group CCCC1CC(=O)OC1=O JIUWLLYCZJHZCZ-UHFFFAOYSA-N 0.000 description 1
- 229920000298 Cellophane Polymers 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
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- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 1
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- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
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- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
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- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
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- FKRCODPIKNYEAC-UHFFFAOYSA-N propionic acid ethyl ester Natural products CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
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- 150000003377 silicon compounds Chemical class 0.000 description 1
- ADCFFIGZZVYRNB-UHFFFAOYSA-N silyl propanoate Chemical compound CCC(=O)O[SiH3] ADCFFIGZZVYRNB-UHFFFAOYSA-N 0.000 description 1
- 238000006884 silylation reaction Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
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- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
- C07F7/0838—Compounds with one or more Si-O-Si sequences
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/06—Preparatory processes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
- C07F7/0838—Compounds with one or more Si-O-Si sequences
- C07F7/0872—Preparation and treatment thereof
- C07F7/0876—Reactions involving the formation of bonds to a Si atom of a Si-O-Si sequence other than a bond of the Si-O-Si linkage
- C07F7/0878—Si-C bond
- C07F7/0879—Hydrosilylation reactions
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/46—Block-or graft-polymers containing polysiloxane sequences containing polyether sequences
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Silicon Polymers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polyethers (AREA)
Abstract
(X는 산 무수물기를 갖는 1가 탄화수소기, Y는 폴리에테르기를 갖는 1가 탄화수소기, Z는 가수분해성 실릴기를 갖는 1가 탄화수소기, R1은 수소 원자 또는 할로겐 원자로 치환될 수도 있는 1가 탄화수소기를 나타내고, M1은 상기 X, Y, Z, R1로부터 선택되는 기를 나타내고, 0≤a≤100, 0≤b≤100, 0≤c≤100, 0≤d≤100의 정수를 나타내되, 단 a가 0인 경우, M1이 X이고, c는 1≤c≤100의 정수이고, c가 0인 경우, M1이 Z이고, a는 1≤a≤100의 정수임)
본 발명의 오르가노실록산은 분자 내에 가수분해성 실릴기와, 산 무수물기와, 추가로 필요에 따라 폴리에테르기를 갖는 것으로서, 각 관능기의 수를 자유롭게 조정할 수 있다.
Description
Claims (6)
- 하기 화학식 [1b]로 표시되는, 분자 내에 가수분해성 실릴기와 산 무수물기와 폴리에테르기를 각각 적어도 1개 갖는 오르가노실록산.
(식 중, X는 산 무수물기를 갖는 1가 탄화수소기를 나타내고, Y는 폴리에테르기를 갖는 1가 탄화수소기를 나타내고, Z는 가수분해성 실릴기를 갖는 1가 탄화수소기를 나타내고, R1은 서로 독립적으로 수소 원자, 또는 할로겐 원자로 치환될 수도 있는 탄소 원자수 1 내지 20의 1가 탄화수소기를 나타내고, M1은 상기 X, Y, Z, R1로부터 선택되는 기를 나타내고, a, b, c, d는 각각 0≤a≤100, 0≤b≤100, 0≤c≤100, 0≤d≤100의 양수를 나타내되, 단 a가 0인 경우, M1이 X이고, b, c는 각각 1≤b≤100, 1≤c≤100의 양수이고, 또한 b가 0인 경우, M1이 Y이고, a, c는 각각 1≤a≤100, 1≤c≤100의 양수이고, 또한 c가 0인 경우, M1이 Z이고, a, b는 각각 1≤a≤100, 1≤b≤100의 양수임) - 제1항에 있어서, 상기 화학식 [1b]에 있어서, X가 하기 화학식 [2]로 표시되는 산 무수물기를 갖는 1가 탄화수소기이며, Y가 하기 화학식 [3]으로 표시되는 폴리에테르기를 갖는 1가 탄화수소기이며, Z가 하기 화학식 [5]로 표시되는 가수분해성 실릴기를 갖는 1가 탄화수소기인 것을 특징으로 하는 오르가노실록산.
(식 중, A는 직쇄상 또는 분지상의 탄소 원자수 2 내지 6의 알킬렌기를 나타냄)
(식 중, R2는 수소 원자, 탄소 원자수 1 내지 6의 1가 탄화수소기, 또는 하기 화학식 [4]로 표시되는 기를 나타내고, m은 1 이상의 정수를 나타내고, e, f는 0 이상의 양수를 나타내되, 단 e, f 중 적어도 하나는 1 이상의 양수를 취함)
(식 중, R3은 탄소 원자수 1 내지 4의 1가 탄화수소기를 나타냄)
(식 중, R4는 탄소 원자수 1 내지 10의 알킬기를 나타내고, R5는 탄소 원자수 1 내지 10의 1가 탄화수소기, 또는 아실기를 나타내고, n은 1 이상의 정수를 나타내고, g는 1 내지 3의 정수를 나타냄) - 제1항에 기재된 오르가노실록산과, 활성 수소 함유 화합물의 포착제로서 하기 화학식 [6]으로 표시되는 α-실릴 지방족 에스테르 화합물을 함유하여 이루어지는 것을 특징으로 하는 오르가노실록산 조성물.
(식 중, R6은 할로겐 원자로 치환될 수도 있는 탄소 원자수 1 내지 20의 알킬기, 탄소 원자수 5 내지 20의 시클로알킬기, 또는 탄소 원자수 6 내지 20의 아릴기를 나타내고, R7은 수소 원자 또는 메틸기를 나타내고, R8은 탄소 원자수 1 내지 4의 알킬기를 나타내고, R9는 탄소 원자수 1 내지 4의 알킬기를 나타내고, h는 1 내지 3의 정수를 나타냄) - 제3항에 있어서, 상기 화학식 [6]으로 표시되는 α-실릴 지방족 에스테르 화합물이 α-트리메톡시실릴프로피온산에틸 또는 α-메틸디메톡시실릴프로피온산옥틸인 것을 특징으로 하는 오르가노실록산 조성물.
- 백금 촉매 하, 하기 화학식 [7]로 표시되는 오르가노하이드로젠실록산에, 하기 화학식 [8]로 표시되는 지방족 불포화 결합을 갖는 가수분해성 실릴기 함유 화합물과, 하기 화학식 [9]로 표시되는 지방족 불포화 결합을 갖는 산 무수물기 함유 화합물과, 하기 화학식 [10]으로 표시되는 지방족 불포화 결합을 갖는 폴리에테르기 함유 화합물을 히드로실릴화 반응시키는 것을 특징으로 하는 제1항에 기재된 오르가노실록산의 제조 방법.
(식 중, R10은 할로겐 원자로 치환될 수도 있는 탄소 원자수 1 내지 20의 1가 탄화수소기를 나타내고, M2는 수소 원자 또는 상기 R10을 나타내고, i, j는 각각 1≤i≤300, 0≤j≤100의 양수를 나타냄)
(식 중, R4는 탄소 원자수 1 내지 10의 알킬기를 나타내고, R5는 탄소 원자수 1 내지 10의 1가 탄화수소기, 또는 아실기를 나타내고, p는 0 내지 10의 정수를 나타내고, g는 1 내지 3의 정수를 나타냄)
(식 중, p는 0 내지 10의 정수를 나타냄)
(식 중, p는 0 내지 10의 정수를 나타내고, R2는 수소 원자, 탄소 원자수 1 내지 6의 1가 탄화수소기, 또는 하기 화학식 [4]로 표시되는 기를 나타내고, e, f는 0 이상의 양수를 나타내되, 단 e, f 중 적어도 하나는 1 이상의 양수를 취함)
(식 중, R3은 탄소 원자수 1 내지 4의 1가 탄화수소기를 나타냄) - 제5항에 있어서, 불포화 결합을 갖는 가수분해성 실릴기 함유 화합물이 비닐트리메톡시실란, 비닐트리에톡시실란으로부터 선택되는 적어도 1종이고, 불포화 결합을 갖는 산 무수물기 함유 화합물이 알릴 무수 숙신산이고, 불포화 결합을 갖는 폴리에테르기 함유 화합물이 하기 화학식 [11]로 표시되는 알릴폴리에테르인 오르가노실록산의 제조 방법.
(식 중, R2는 수소 원자, 탄소 원자수 1 내지 6의 1가 탄화수소기, 또는 하기 화학식 [4]로 표시되는 기를 나타내고, e, f는 0 이상의 양수를 나타내되, 단 e, f 중 적어도 하나는 1 이상의 양수를 취함)
(식 중, R3은 탄소 원자수 1 내지 4의 1가 탄화수소기를 나타냄)
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