KR101995076B1 - Colored curable resin composition - Google Patents
Colored curable resin composition Download PDFInfo
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- KR101995076B1 KR101995076B1 KR1020120150658A KR20120150658A KR101995076B1 KR 101995076 B1 KR101995076 B1 KR 101995076B1 KR 1020120150658 A KR1020120150658 A KR 1020120150658A KR 20120150658 A KR20120150658 A KR 20120150658A KR 101995076 B1 KR101995076 B1 KR 101995076B1
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- South Korea
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- carbon atoms
- hydrocarbon group
- compound
- formula
- Prior art date
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- 239000011342 resin composition Substances 0.000 title claims description 55
- 150000001875 compounds Chemical class 0.000 claims abstract description 138
- 229920005989 resin Polymers 0.000 claims abstract description 87
- 239000011347 resin Substances 0.000 claims abstract description 87
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 66
- 239000003086 colorant Substances 0.000 claims abstract description 33
- 229930195734 saturated hydrocarbon Natural products 0.000 claims abstract description 33
- 239000003505 polymerization initiator Substances 0.000 claims abstract description 32
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 30
- 150000002902 organometallic compounds Chemical class 0.000 claims abstract description 29
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 18
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 16
- 230000008033 biological extinction Effects 0.000 claims abstract description 10
- 125000001424 substituent group Chemical group 0.000 claims abstract description 10
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 8
- 239000000049 pigment Substances 0.000 claims description 58
- 229910052757 nitrogen Inorganic materials 0.000 claims description 31
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 19
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 16
- 229910052751 metal Inorganic materials 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 16
- 125000001931 aliphatic group Chemical group 0.000 claims description 13
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims description 13
- 125000004429 atom Chemical group 0.000 claims description 12
- 125000005843 halogen group Chemical group 0.000 claims description 10
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 9
- 150000002736 metal compounds Chemical class 0.000 claims description 5
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 4
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims description 3
- -1 2-ethylhexyl Chemical group 0.000 description 129
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 59
- 239000010408 film Substances 0.000 description 47
- 239000002904 solvent Substances 0.000 description 47
- 239000000975 dye Substances 0.000 description 36
- 238000000034 method Methods 0.000 description 31
- 150000002430 hydrocarbons Chemical group 0.000 description 26
- 239000000243 solution Substances 0.000 description 22
- 239000000758 substrate Substances 0.000 description 22
- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 20
- 229920001577 copolymer Polymers 0.000 description 19
- 239000004094 surface-active agent Substances 0.000 description 19
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 18
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 18
- 239000000203 mixture Substances 0.000 description 18
- 238000004519 manufacturing process Methods 0.000 description 16
- KWYUFKZDYYNOTN-UHFFFAOYSA-M potassium hydroxide Inorganic materials [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 16
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 15
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 14
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 13
- 239000010949 copper Substances 0.000 description 13
- 239000011521 glass Substances 0.000 description 13
- 238000006243 chemical reaction Methods 0.000 description 12
- 229910052802 copper Inorganic materials 0.000 description 12
- OTTZHAVKAVGASB-UHFFFAOYSA-N hept-2-ene Chemical compound CCCCC=CC OTTZHAVKAVGASB-UHFFFAOYSA-N 0.000 description 12
- 239000003446 ligand Substances 0.000 description 12
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 11
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 10
- 239000002253 acid Substances 0.000 description 10
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 10
- 239000002270 dispersing agent Substances 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- 150000004292 cyclic ethers Chemical group 0.000 description 9
- 229940116333 ethyl lactate Drugs 0.000 description 9
- 238000006116 polymerization reaction Methods 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- 238000004040 coloring Methods 0.000 description 8
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 8
- 239000011572 manganese Substances 0.000 description 8
- 239000000178 monomer Substances 0.000 description 8
- 239000003960 organic solvent Substances 0.000 description 8
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 8
- 239000007787 solid Substances 0.000 description 8
- 238000003786 synthesis reaction Methods 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 229920002126 Acrylic acid copolymer Polymers 0.000 description 7
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical group C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 7
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 7
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 7
- 229910052731 fluorine Inorganic materials 0.000 description 7
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 7
- 229910052738 indium Inorganic materials 0.000 description 7
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 7
- 238000002156 mixing Methods 0.000 description 7
- 238000003756 stirring Methods 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000007983 Tris buffer Substances 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 239000013078 crystal Substances 0.000 description 6
- 125000001153 fluoro group Chemical group F* 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 6
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 5
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 description 5
- 239000011651 chromium Substances 0.000 description 5
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 5
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 5
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- 239000011541 reaction mixture Substances 0.000 description 5
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 4
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical group [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- ZSWFCLXCOIISFI-UHFFFAOYSA-N cyclopentadiene Chemical compound C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 4
- 238000011161 development Methods 0.000 description 4
- 230000018109 developmental process Effects 0.000 description 4
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 4
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 description 4
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 150000007524 organic acids Chemical class 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 229920001296 polysiloxane Polymers 0.000 description 4
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 230000009257 reactivity Effects 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- 125000004066 1-hydroxyethyl group Chemical group [H]OC([H])([*])C([H])([H])[H] 0.000 description 3
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 3
- 125000004182 2-chlorophenyl group Chemical group [H]C1=C([H])C(Cl)=C(*)C([H])=C1[H] 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical group [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical group [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 3
- SJEYSFABYSGQBG-UHFFFAOYSA-M Patent blue Chemical compound [Na+].C1=CC(N(CC)CC)=CC=C1C(C=1C(=CC(=CC=1)S([O-])(=O)=O)S([O-])(=O)=O)=C1C=CC(=[N+](CC)CC)C=C1 SJEYSFABYSGQBG-UHFFFAOYSA-M 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 3
- 238000000862 absorption spectrum Methods 0.000 description 3
- 239000000980 acid dye Substances 0.000 description 3
- 150000001408 amides Chemical class 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical class C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 239000011575 calcium Substances 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- UFDHBDMSHIXOKF-UHFFFAOYSA-N cyclohexene-1,2-dicarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 125000000623 heterocyclic group Chemical group 0.000 description 3
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 3
- 229910052748 manganese Inorganic materials 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 3
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 3
- 125000002524 organometallic group Chemical group 0.000 description 3
- 125000003566 oxetanyl group Chemical group 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 3
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 3
- 230000000737 periodic effect Effects 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 229920002223 polystyrene Polymers 0.000 description 3
- 229910052706 scandium Inorganic materials 0.000 description 3
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 3
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Chemical group C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 125000005425 toluyl group Chemical group 0.000 description 3
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 3
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical group [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 3
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 2
- MKRBAPNEJMFMHU-UHFFFAOYSA-N 1-benzylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1CC1=CC=CC=C1 MKRBAPNEJMFMHU-UHFFFAOYSA-N 0.000 description 2
- BQTPKSBXMONSJI-UHFFFAOYSA-N 1-cyclohexylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1CCCCC1 BQTPKSBXMONSJI-UHFFFAOYSA-N 0.000 description 2
- UAJRSHJHFRVGMG-UHFFFAOYSA-N 1-ethenyl-4-methoxybenzene Chemical compound COC1=CC=C(C=C)C=C1 UAJRSHJHFRVGMG-UHFFFAOYSA-N 0.000 description 2
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 2
- SDJHPPZKZZWAKF-UHFFFAOYSA-N 2,3-dimethylbuta-1,3-diene Chemical compound CC(=C)C(C)=C SDJHPPZKZZWAKF-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- WYGWHHGCAGTUCH-UHFFFAOYSA-N 2-[(2-cyano-4-methylpentan-2-yl)diazenyl]-2,4-dimethylpentanenitrile Chemical compound CC(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)C WYGWHHGCAGTUCH-UHFFFAOYSA-N 0.000 description 2
- PTJWCLYPVFJWMP-UHFFFAOYSA-N 2-[[3-hydroxy-2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)COCC(CO)(CO)CO PTJWCLYPVFJWMP-UHFFFAOYSA-N 0.000 description 2
- LTHNHFOGQMKPOV-UHFFFAOYSA-N 2-ethylhexan-1-amine Chemical compound CCCCC(CC)CN LTHNHFOGQMKPOV-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
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- KDYFGRWQOYBRFD-UHFFFAOYSA-L succinate(2-) Chemical compound [O-]C(=O)CCC([O-])=O KDYFGRWQOYBRFD-UHFFFAOYSA-L 0.000 description 1
- 238000000967 suction filtration Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- MUTNCGKQJGXKEM-UHFFFAOYSA-N tamibarotene Chemical compound C=1C=C2C(C)(C)CCC(C)(C)C2=CC=1NC(=O)C1=CC=C(C(O)=O)C=C1 MUTNCGKQJGXKEM-UHFFFAOYSA-N 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 229910052713 technetium Inorganic materials 0.000 description 1
- GKLVYJBZJHMRIY-UHFFFAOYSA-N technetium atom Chemical compound [Tc] GKLVYJBZJHMRIY-UHFFFAOYSA-N 0.000 description 1
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 description 1
- BZBMBZJUNPMEBD-UHFFFAOYSA-N tert-butyl bicyclo[2.2.1]hept-2-ene-5-carboxylate Chemical compound C1C2C(C(=O)OC(C)(C)C)CC1C=C2 BZBMBZJUNPMEBD-UHFFFAOYSA-N 0.000 description 1
- WNQPPENQFWLADQ-UHFFFAOYSA-J tetrasodium;4-hydroxy-5-[[4-[[4-[(8-hydroxy-3,6-disulfonatonaphthalen-1-yl)diazenyl]-2-methoxy-5-methylphenyl]carbamoylamino]-5-methoxy-2-methylphenyl]diazenyl]naphthalene-2,7-disulfonate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]S(=O)(=O)C1=CC(O)=C2C(N=NC3=C(C)C=C(C(=C3)OC)NC(=O)NC3=CC(C)=C(N=NC=4C5=C(O)C=C(C=C5C=C(C=4)S([O-])(=O)=O)S([O-])(=O)=O)C=C3OC)=CC(S([O-])(=O)=O)=CC2=C1 WNQPPENQFWLADQ-UHFFFAOYSA-J 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- FRNOGLGSGLTDKL-UHFFFAOYSA-N thulium atom Chemical compound [Tm] FRNOGLGSGLTDKL-UHFFFAOYSA-N 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000000411 transmission spectrum Methods 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- WLPUWLXVBWGYMZ-UHFFFAOYSA-N tricyclohexylphosphine Chemical compound C1CCCCC1P(C1CCCCC1)C1CCCCC1 WLPUWLXVBWGYMZ-UHFFFAOYSA-N 0.000 description 1
- RXJKFRMDXUJTEX-UHFFFAOYSA-N triethylphosphine Chemical compound CCP(CC)CC RXJKFRMDXUJTEX-UHFFFAOYSA-N 0.000 description 1
- 125000004205 trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- MBYLVOKEDDQJDY-UHFFFAOYSA-N tris(2-aminoethyl)amine Chemical compound NCCN(CCN)CCN MBYLVOKEDDQJDY-UHFFFAOYSA-N 0.000 description 1
- VXYADVIJALMOEQ-UHFFFAOYSA-K tris(lactato)aluminium Chemical compound CC(O)C(=O)O[Al](OC(=O)C(C)O)OC(=O)C(C)O VXYADVIJALMOEQ-UHFFFAOYSA-K 0.000 description 1
- VRVDFJOCCWSFLI-UHFFFAOYSA-K trisodium 3-[[4-[(6-anilino-1-hydroxy-3-sulfonatonaphthalen-2-yl)diazenyl]-5-methoxy-2-methylphenyl]diazenyl]naphthalene-1,5-disulfonate Chemical compound [Na+].[Na+].[Na+].COc1cc(N=Nc2cc(c3cccc(c3c2)S([O-])(=O)=O)S([O-])(=O)=O)c(C)cc1N=Nc1c(O)c2ccc(Nc3ccccc3)cc2cc1S([O-])(=O)=O VRVDFJOCCWSFLI-UHFFFAOYSA-K 0.000 description 1
- WTPOYMNMKZIOGO-UHFFFAOYSA-K trisodium;2,5-dichloro-4-[4-[[5-[[4-chloro-6-(4-sulfonatoanilino)-1,3,5-triazin-2-yl]amino]-2-sulfonatophenyl]diazenyl]-3-methyl-5-oxo-4h-pyrazol-1-yl]benzenesulfonate Chemical compound [Na+].[Na+].[Na+].CC1=NN(C=2C(=CC(=C(Cl)C=2)S([O-])(=O)=O)Cl)C(=O)C1N=NC(C(=CC=1)S([O-])(=O)=O)=CC=1NC(N=1)=NC(Cl)=NC=1NC1=CC=C(S([O-])(=O)=O)C=C1 WTPOYMNMKZIOGO-UHFFFAOYSA-K 0.000 description 1
- UJMBCXLDXJUMFB-UHFFFAOYSA-K trisodium;5-oxo-1-(4-sulfonatophenyl)-4-[(4-sulfonatophenyl)diazenyl]-4h-pyrazole-3-carboxylate Chemical compound [Na+].[Na+].[Na+].[O-]C(=O)C1=NN(C=2C=CC(=CC=2)S([O-])(=O)=O)C(=O)C1N=NC1=CC=C(S([O-])(=O)=O)C=C1 UJMBCXLDXJUMFB-UHFFFAOYSA-K 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 239000000984 vat dye Substances 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000001018 xanthene dye Substances 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G02B5/00—Optical elements other than lenses
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
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- Manufacturing & Machinery (AREA)
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Abstract
본 발명은, 착색제, 수지, 중합성 화합물, 중합 개시제 및 유기 금속 화합물을 포함하고, 착색제가 식 (1)로 표시되는 화합물을 포함하는 착색제이며, 유기 금속 화합물의 가시광 영역에 있어서의 몰 흡광 계수의 최대치가 식 (1)로 표시되는 화합물의 가시광 영역에 있어서의 몰 흡광 계수의 최대치보다도 작은 착색 경화성 수지 조성물을 제공한다.
[식 (1)에서, R1 및 R2는 각각 독립적으로 치환기를 갖고 있더라도 좋은 페닐기를 나타낸다. R3 및 R4는 각각 독립적으로 탄소수 1∼10의 1가의 포화 탄화수소기를 나타낸다. R5는 -OH, -SO3H 등을 나타낸다.
R6 및 R7은 각각 독립적으로 수소 원자 또는 탄소수 1∼6의 알킬기를 나타낸다. m은 0∼4의 정수를 나타낸다.]The present invention relates to a colorant comprising a colorant, a resin, a polymerizable compound, a polymerization initiator and an organometallic compound, wherein the colorant is a colorant containing a compound represented by the formula (1), and the molar extinction coefficient Is smaller than the maximum molar extinction coefficient in the visible light region of the compound represented by the formula (1).
[In the formula (1), R 1 and R 2 each independently represent a phenyl group which may have a substituent. R 3 and R 4 each independently represent a monovalent saturated hydrocarbon group having 1 to 10 carbon atoms. R 5 represents -OH, -SO 3 H, or the like.
R 6 and R 7 each independently represent a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; and m represents an integer of 0 to 4.]
Description
본 발명은 착색 경화성 수지 조성물에 관한 것이다. The present invention relates to a colored curable resin composition.
착색 경화성 수지 조성물은 액정 표시 패널, 일렉트로루미네센스 패널 및 플라즈마 디스플레이 패널 등의 표시 장치에 사용되는 컬러 필터의 제조에 이용되고 있다. 이러한 착색 경화성 수지 조성물로서는, 착색제로서 식 (A2-1a)로 표시되는 화합물 및 식 (A2-1b)로 표시되는 화합물을 2-에틸헥실아민으로 술폰아미드화한 염료 및 C.I. 피그먼트 블루를 포함하고, 비스(디부틸디티오카르바민산)아연을 더 포함하는 착색 경화성 수지 조성물이 알려져 있다(JP2011-118365-A). The colored curable resin composition is used in the production of color filters used in display devices such as liquid crystal display panels, electroluminescence panels and plasma display panels. Examples of such a color-curable resin composition include dyes obtained by sulfonating a compound represented by the formula (A2-1a) and a compound represented by the formula (A2-1b) with 2-ethylhexylamine as colorants; (JP2011-118365-A), which further contains zinc bis (dibutyldithiocarbamate) and pigment blue.
종래부터 알려진 상기한 착색 경화성 수지 조성물은 그 착색 경화성 수지 조성물에 의해 얻어지는 컬러 필터의 명도가 반드시 충분히 만족할 수 있는 것은 아니었다. The conventionally known coloring curable resin composition does not necessarily satisfy the brightness of the color filter obtained by the coloring curable resin composition.
본 발명은 이하의 발명을 포함한다. The present invention includes the following inventions.
[1] 착색제, 수지, 중합성 화합물, 중합 개시제 및 유기 금속 화합물을 포함하는 착색 경화성 수지 조성물로서, [1] A colored curable resin composition comprising a colorant, a resin, a polymerizable compound, a polymerization initiator, and an organometallic compound,
착색제가 식 (1)로 표시되는 화합물을 포함하고, Wherein the colorant comprises a compound represented by the formula (1)
유기 금속 화합물의 가시광 영역에 있어서의 몰 흡광 계수의 최대치가 식 (1)로 표시되는 화합물의 가시광 영역에 있어서의 몰 흡광 계수의 최대치보다도 작다. The maximum value of the molar extinction coefficient in the visible light region of the organometallic compound is smaller than the maximum value of the molar extinction coefficient in the visible light region of the compound represented by the formula (1).
[식 (1)에서, R1 및 R2는 서로 독립적으로 치환기를 갖고 있더라도 좋은 페닐기를 나타낸다. [In the formula (1), R 1 and R 2 independently represent a phenyl group which may have a substituent.
R3 및 R4는 서로 독립적으로 탄소수 1∼10의 1가의 포화 탄화수소기를 나타내고, 이 포화 탄화수소기에 포함되는 수소 원자는 탄소수 6∼10의 방향족 탄화수소기 또는 할로겐 원자로 치환되어 있더라도 좋고, 상기 방향족 탄화수소기에 포함되는 수소 원자는 탄소수 1∼3의 알킬기 또는 탄소수 1∼3의 알콕시기로 치환되어 있더라도 좋고, 상기 포화 탄화수소기에 포함되는 -CH2-는 -O-, -CO- 또는 -NR11-로 치환되어 있더라도 좋다. R 3 and R 4 independently represent a monovalent saturated hydrocarbon group having 1 to 10 carbon atoms, and the hydrogen atom contained in the saturated hydrocarbon group may be substituted with an aromatic hydrocarbon group having 6 to 10 carbon atoms or a halogen atom, and the aromatic hydrocarbon group The hydrogen atom contained may be substituted with an alkyl group having 1 to 3 carbon atoms or an alkoxy group having 1 to 3 carbon atoms, and -CH 2 - included in the saturated hydrocarbon group is substituted with -O-, -CO- or -NR 11 - It may be.
R1 및 R3은 질소 원자와 함께 질소 원자를 포함하는 고리를 형성하더라도 좋고, R2 및 R4는 질소 원자와 함께 고리를 형성하더라도 좋다. R 1 and R 3 may form a ring containing a nitrogen atom together with the nitrogen atom, and R 2 and R 4 may form a ring together with the nitrogen atom.
R5는 -OH, -SO3H, -SO3 -Z+, -CO2H, -CO2 -Z+, -CO2R8-, -SO3R8 또는 -SO2NR9R10을 나타낸다. R 5 is -OH, -SO 3 H, -SO 3 - Z +, -CO 2 H, -CO 2 - Z +, -CO 2 R 8 -, -SO 3 R 8 or -SO 2 NR 9 R 10 .
R6 및 R7은 각각 독립적으로 수소 원자 또는 탄소수 1∼6의 알킬기를 나타낸다. R 6 and R 7 each independently represent a hydrogen atom or an alkyl group having 1 to 6 carbon atoms;
m은 0∼4의 정수를 나타낸다. m이 2 이상일 때, 복수의 R5는 동일하더라도 상이하더라도 좋다. m represents an integer of 0 to 4; When m is 2 or more, plural R 5 s may be the same or different.
R8은 탄소수 1∼20의 1가의 포화 탄화수소기를 나타내고, 이 포화 탄화수소기에 포함되는 수소 원자는 할로겐 원자로 치환되어 있더라도 좋다. R 8 represents a monovalent saturated hydrocarbon group having 1 to 20 carbon atoms, and the hydrogen atom contained in the saturated hydrocarbon group may be substituted with a halogen atom.
Z+는 +N(R11)4, Na+ 또는 K+를 나타낸다. Z + represents + N (R < 11 >) 4 , Na + or K + .
R9 및 R10은 각각 독립적으로 수소 원자 또는 탄소수 1∼20의 1가의 포화 탄화수소기를 나타내고, R9 및 R10은 서로 결합하여 질소 원자와 함께 3∼10원 질소 함유 복소환을 형성하고 있더라도 좋다. R 9 and R 10 each independently represent a hydrogen atom or a monovalent saturated hydrocarbon group having 1 to 20 carbon atoms, and R 9 and R 10 may be bonded to each other to form a 3- to 10-membered nitrogen-containing heterocycle together with the nitrogen atom .
R11은 각각 독립적으로 수소 원자, 탄소수 1∼20의 1가의 포화 탄화수소기 또는 탄소수 7∼10의 아랄킬기를 나타낸다.]R 11 each independently represents a hydrogen atom, a monovalent saturated hydrocarbon group having 1 to 20 carbon atoms, or an aralkyl group having 7 to 10 carbon atoms.
[2] 유기 금속 화합물이 식 (F1)로 표시되는 화합물, 식 (F2)로 표시되는 화합물 및 이들의 수화물로 이루어지는 군에서 선택되는 1종 이상인 [1]에 기재한 착색 경화성 수지 조성물. [2] The color-curable resin composition according to [1], wherein the organometallic compound is at least one selected from the group consisting of a compound represented by the formula (F1), a compound represented by the formula (F2), and a hydrate thereof.
[식 (F1)에서, W1 및 W2는 각각 독립적으로 탄소수 1∼6의 1가의 지방족 탄화수소기 또는 탄소수 6∼10의 1가의 방향족 탄화수소기를 나타내고, 상기 지방족 탄화수소기 및 상기 방향족 탄화수소기에 포함되는 수소 원자는 히드록시기로 치환되어 있더라도 좋다. Wherein W 1 and W 2 each independently represent a monovalent aliphatic hydrocarbon group having 1 to 6 carbon atoms or a monovalent aromatic hydrocarbon group having 6 to 10 carbon atoms and the aliphatic hydrocarbon group and the aromatic hydrocarbon group included in the aromatic hydrocarbon group The hydrogen atom may be substituted with a hydroxy group.
M1은 금속 원자를 나타낸다. M 1 represents a metal atom.
x는 1∼3의 정수를 나타내고, x가 2 이상일 때, 복수의 W1 및 W2는 서로 동일하더라도 상이하더라도 좋다.]x represents an integer of 1 to 3, and when x is 2 or more, a plurality of W 1 and W 2 may be the same or different.
[식 (F2)에서, W3 및 W4는 각각 독립적으로 탄소수 1∼6의 1가의 지방족 탄화수소기를 나타내고, 상기 지방족 탄화수소기에 포함되는 수소 원자는 할로겐 원자로 치환되어 있더라도 좋다. [In the formula (F2), W 3 and W 4 each independently represent a monovalent aliphatic hydrocarbon group having 1 to 6 carbon atoms, and the hydrogen atom contained in the aliphatic hydrocarbon group may be substituted with a halogen atom.
M2는 금속 원자를 나타낸다. M 2 represents a metal atom.
y는 1∼3의 정수를 나타내고, y가 2 이상일 때, 복수의 W3 및 W4는 서로 동일하더라도 상이하더라도 좋다.]y represents an integer of 1 to 3, and when y is 2 or more, a plurality of W 3 and W 4 may be the same or different.
[3] 착색제가 안료를 더 포함하는 [1] 또는 [2]에 기재한 착색 경화성 수지 조성물. [3] The colored curable resin composition according to [1] or [2], wherein the colorant further comprises a pigment.
[4] [1]∼[3] 중 어느 것에 기재한 착색 경화성 수지 조성물에 의해 형성되는 컬러 필터. [4] A color filter formed by the colored curable resin composition according to any one of [1] to [3].
[5] [4]에 기재한 컬러 필터를 포함하는 표시 장치. [5] A display device comprising the color filter according to [4].
본 발명의 착색 경화성 수지 조성물에 의하면, 고명도의 컬러 필터를 형성할 수 있다. According to the colored curable resin composition of the present invention, a high-definition color filter can be formed.
도 1은 본 발명의 컬러 필터의 제조 방법을 설명하는 개략도이다.
도 2는 본 발명의 컬러 필터의 제조 방법을 설명하는 개략도이다.
도 3은 본 발명의 컬러 필터의 제조 방법을 설명하는 개략도이다. 1 is a schematic view for explaining a method of manufacturing a color filter of the present invention.
2 is a schematic view for explaining a method of manufacturing a color filter of the present invention.
3 is a schematic view for explaining a method of manufacturing a color filter of the present invention.
본 발명의 착색 경화성 수지 조성물은 착색제(A), 수지(B), 중합성 화합물(C), 중합 개시제(D) 및 유기 금속 화합물(M)을 포함한다. The colored curable resin composition of the present invention comprises a colorant (A), a resin (B), a polymerizable compound (C), a polymerization initiator (D) and an organometallic compound (M).
착색제(A)는 상기 식 (1)로 표시되는 화합물(이하 「화합물 (1)」이라고 하는 경우가 있음)을 포함하고, 안료(A1)를 더 포함하는 것이 바람직하다. The colorant (A) preferably contains the compound represented by the above formula (1) (hereinafter sometimes referred to as " compound (1) ") and further contains the pigment (A1).
본 발명의 착색 경화성 수지 조성물은 용제(E)를 더 포함하는 것이 바람직하다. The colored curable resin composition of the present invention preferably further comprises a solvent (E).
또한, 본 발명의 착색 경화성 수지 조성물은 필요에 따라서 화합물 (1)과는 다른 염료(이하 「염료(A2)」라고 하는 경우가 있음), 중합 개시 조제(D1) 및 계면활성제(F)로 이루어지는 군에서 선택되는 1종 이상을 포함하더라도 좋다. The colored curable resin composition of the present invention may further contain a dye (A2) different from the compound (1), a polymerization initiator (D1) and a surfactant (F) And at least one kind selected from the group consisting of
한편, 본 명세서에 있어서, 각 성분으로서 예시하는 화합물은 특별히 양해를 구하지 않는 한, 단독으로 또는 복수 종을 조합하여 사용할 수 있다. On the other hand, in the present specification, the compounds exemplified as respective components can be used singly or in combination of a plurality of species, unless specifically appreciated.
<화합물 (1)> ≪ Compound (1) >
본 발명의 착색 경화성 수지 조성물은 착색제로서 화합물 (1)을 포함함으로써 고명도의 컬러 필터를 제조할 수 있다. 화합물 (1)로서는 그 호변 이성체라도 좋다. The color-curable resin composition of the present invention contains the compound (1) as a colorant, whereby a high-definition color filter can be produced. The compound (1) may be a tautomer thereof.
[식 (1)에서, R1∼R7 및 m은 각각 상기와 동일한 의미를 나타낸다.][In the formula (1), R 1 to R 7 and m each have the same meaning as described above.]
R8, R9, R10 및 R11에 있어서의 탄소수 1∼20의 1가의 포화 탄화수소기로서는 예컨대 메틸기, 에틸기, 프로필기, 부틸기, 펜틸기, 헥실기, 헵틸기, 옥틸기, 노닐기, 데실기, 도데실기, 헥사데실기, 아이코실 등의 탄소수 1∼20의 직쇄형 알킬기; 이소프로필기, 이소부틸기, sec-부틸기, tert-부틸기, 이소펜틸기, 네오펜틸기, 2-에틸헥실기 등의 탄소수 3∼20의 분기쇄형 알킬기; 시클로프로필기, 시클로펜틸기, 시클로헥실기, 시클로헵틸기, 시클로옥틸기, 트리시클로데실기 등의 탄소수 3∼20의 지환식 포화 탄화수소기를 들 수 있다. Examples of the monovalent saturated hydrocarbon group having 1 to 20 carbon atoms in R 8 , R 9 , R 10 and R 11 include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, , A straight chain alkyl group having 1 to 20 carbon atoms such as a decyl group, a dodecyl group, a hexadecyl group and an icosyl group; Branched chain alkyl groups having 3 to 20 carbon atoms such as isopropyl, isobutyl, sec-butyl, tert-butyl, isopentyl, neopentyl and 2-ethylhexyl; An alicyclic saturated hydrocarbon group having 3 to 20 carbon atoms such as cyclopropyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group, cyclooctyl group and tricyclodecyl group.
-OR8로서는 예컨대 메톡시기, 에톡시기, 프로폭시기, 부톡시기, 펜틸옥시기, 헥실옥시기, 헵틸옥시기, 옥틸옥시기, 2-에틸헥실옥시기, 아이코실옥시기 등을 들 수 있다. Examples of-OR 8 include methoxy, ethoxy, propoxy, butoxy, pentyloxy, hexyloxy, heptyloxy, octyloxy, 2-ethylhexyloxy and icosyloxy.
-CO2R8로서는 예컨대 메톡시카르보닐기, 에톡시카르보닐기, 프로폭시카르보닐기, tert-부톡시카르보닐기, 헥실옥시카르보닐기, 아이코실옥시카르보닐기 등을 들 수 있다. Examples of -CO 2 R 8 include a methoxycarbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, a tert-butoxycarbonyl group, a hexyloxycarbonyl group, and an icosyloxycarbonyl group.
-SR8로서는 예컨대 메틸술파닐기, 에틸술파닐기, 부틸술파닐기, 헥실술파닐기, 데실술파닐기, 아이코실술파닐기 등을 들 수 있다. Examples of -SR 8 include a methylsulfanyl group, an ethylsulfanyl group, a butylsulfanyl group, a hexylsulfanyl group, a decylsulfanyl group, and an icosylsulfanyl group.
-SO2R8로서는 예컨대 메틸술포닐기, 에틸술포닐기, 부틸술포닐기, 헥실술포닐기, 데실술포닐기, 아이코실술포닐기 등을 들 수 있다. Examples of -SO 2 R 8 include a methylsulfonyl group, an ethylsulfonyl group, a butylsulfonyl group, a hexylsulfonyl group, a decylsulfonyl group, and an icosylsulfonyl group.
-SO3R8로서는 예컨대 메톡시술포닐기, 에톡시술포닐기, 프로폭시술포닐기, tert-부톡시술포닐기, 헥실옥시술포닐기, 아이코실옥시술포닐기 등을 들 수 있다.Examples of -SO 3 R 8 include a methoxysulfonyl group, an ethoxysulfonyl group, a propoxysulfonyl group, a tert-butoxysulfonyl group, a hexyloxysulfonyl group, and an icosyloxysulfonyl group.
-SO2NR9R10으로서는 예컨대 술파모일기; Examples of -SO 2 NR 9 R 10, for example a sulfamoyl group;
N-메틸술파모일기, N-에틸술파모일기, N-프로필술파모일기, N-이소프로필술파모일기, N-부틸술파모일기, N-이소부틸술파모일기, N-sec-부틸술파모일기, N-tert-부틸술파모일기, N-펜틸술파모일기, N-(1-에틸프로필)술파모일기, N-(1,1-디메틸프로필)술파모일기, N-(1,2-디메틸프로필)술파모일기, N-(2,2-디메틸프로필)술파모일기, N-(1-메틸부틸)술파모일기, N-(2-메틸부틸)술파모일기, N-(3-메틸부틸)술파모일기, N-시클로펜틸술파모일기, N-헥실술파모일기, N-(1,3-디메틸부틸)술파모일기, N-(3,3-디메틸부틸)술파모일기, N-헵틸술파모일기, N-(1-메틸헥실)술파모일기, N-(1,4-디메틸펜틸)술파모일기, N-옥틸술파모일기, N-(2-에틸헥실)술파모일기, N-(1,5-디메틸)헥실술파모일기, N-(1,1,2,2-테트라메틸부틸)술파모일기 등의 N-1 치환 술파모일기; N-isopropylsulfamoyl group, N-methylsulfamoyl group, N-methylsulfamoyl group, N-ethylsulfamoyl group, N-propylsulfamoyl group, N-isopropylsulfamoyl group, (1, 1-dimethylpropyl) sulfamoyl group, N- (1, 2-dimethylpropyl) sulfamoyl group, N-methylpyrrolyl group, N- (2-dimethylpropyl) sulfamoyl group, N- (2,2-dimethylpropyl) sulfamoyl group, N- (1-methylbutyl) sulfamoyl group, N- (3-methylbutyl) sulfamoyl group, an N-cyclopentylsulfamoyl group, an N-hexylsulfamoyl group, N- (1,3-dimethylbutyl) sulfamoyl group, N- (1-methylhexyl) sulfamoyl group, N- (1,4-dimethylpentyl) sulfamoyl group, N-octylsulfamoyl group, N- (2-ethylhexyl) An N-1-substituted sulfamoyl group such as a sulfamoyl group, N- (1,5-dimethyl) hexylsulfamoyl group and N- (1,1,2,2-tetramethylbutyl) sulfamoyl group;
N,N-디메틸술파모일기, N,N-에틸메틸술파모일기, N,N-디에틸술파모일기, N,N-프로필메틸술파모일기, N,N-이소프로필메틸술파모일기, N,N-tert-부틸메틸술파모일기, N,N-부틸에틸술파모일기, N,N-비스(1-메틸프로필)술파모일기, N,N-헵틸메틸술파모일기 등의 N,N-2 치환 술파모일기 등을 들 수 있다. N, N-dimethylsulfamoyl group, N, N-ethylmethylsulfamoyl group, N, N-diethylsulfamoyl group, N, N-propylmethylsulfamoyl group, N, N-diethylamino groups such as N, N-tert-butylmethylsulfamoyl group, N, N-butylethylsulfamoyl group, N, N-bis (1-methylpropyl) sulfamoyl group, N-2-substituted sulfamoyl group, and the like.
R9 및 R10은 서로 결합하여 질소 원자와 함께 3∼10원 질소 함유 복소환을 형성하고 있더라도 좋다. 즉, R9에 있어서의 1가의 포화 탄화수소기를 구성하는 원자와 R10에 있어서의 1가의 포화 탄화수소기를 구성하는 원자가 결합하여 질소 원자와 함께 3∼10원 질소 함유 복소환을 형성하더라도 좋다. 이 복소환으로서는 예컨대 이하의 것을 들 수 있다. R 9 and R 10 may be bonded to each other to form a 3- to 10-membered nitrogen-containing heterocyclic ring together with the nitrogen atom. That is, the atom constituting the monovalent saturated hydrocarbon group in R 9 and the monovalent saturated hydrocarbon group in R 10 may be bonded to form a 3- to 10-membered nitrogen-containing heterocyclic ring together with the nitrogen atom. Examples of the heterocyclic ring include the following.
R3 및 R4에 있어서의 탄소수 1∼10의 1가의 포화 탄화수소기로서는 R8의 포화 탄화수소기로서 예로 든 것 중에 탄소수 1∼10인 것을 들 수 있다. As the monovalent saturated hydrocarbon group having 1 to 10 carbon atoms in R 3 and R 4 , saturated hydrocarbon groups represented by R 8 include those having 1 to 10 carbon atoms in the exemplified group.
탄소수 6∼10의 방향족 탄화수소기로서는 페닐기, 나프틸기 등을 들 수 있다. 이들 탄소수 6∼10의 방향족 탄화수소기에 포함되는 수소 원자가 치환되어 있더라도 좋은 기 중, 탄소수 1∼3의 알킬기로서는 메틸기, 에틸기, n-프로필기 및 이소프로필기를 들 수 있고, 탄소수 1∼3의 알콕시기로서는 메톡시기, 에톡시기, n-프로폭시기 및 이소프로폭시기를 들 수 있다. Examples of the aromatic hydrocarbon group having 6 to 10 carbon atoms include a phenyl group and a naphthyl group. Of these groups in which hydrogen atoms contained in the aromatic hydrocarbon group having 6 to 10 carbon atoms may be substituted, examples of the alkyl group having 1 to 3 carbon atoms include methyl group, ethyl group, n-propyl group and isopropyl group, and alkoxy groups having 1 to 3 carbon atoms Include a methoxy group, an ethoxy group, an n-propoxy group and an isopropoxy group.
탄소수 6∼10의 방향족 탄화수소기로 치환된 포화 탄화수소기로서는 예컨대 벤질기, 페닐에틸기, 페닐프로필기, 페닐부틸기, 톨루일메틸기, 톨루일에틸기, 톨루일프로필기, 톨루일부틸기, 메톡시페닐메틸기, 메톡시페닐에틸기, 메톡시페닐프로필기, 메톡시페닐부틸기 등을 들 수 있다. Examples of the saturated hydrocarbon group substituted with an aromatic hydrocarbon group having 6 to 10 carbon atoms include a benzyl group, a phenylethyl group, a phenylpropyl group, a phenylbutyl group, a toluylmethyl group, a tolylethyl group, a toluylpropyl group, a toluylbutyl group, A methyl group, a methoxyphenylethyl group, a methoxyphenylpropyl group, and a methoxyphenylbutyl group.
할로겐 원자로서는 예컨대 불소 원자, 염소 원자, 브롬 원자 및 요오드 원자를 들 수 있다. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
할로겐 원자로 치환된 포화 탄화수소기로서는 예컨대 플루오로메틸기, 디플루오로메틸기, 트리플루오로메틸기, 퍼플루오로에틸기, 클로로부틸기 등을 들 수 있다. Examples of the saturated hydrocarbon group substituted with a halogen atom include a fluoromethyl group, a difluoromethyl group, a trifluoromethyl group, a perfluoroethyl group, and a chlorobutyl group.
R3 및 R4로서는 무치환의 탄소수 1∼10의 1가의 포화 탄화수소기가 바람직하고, 탄소수 1∼4의 1가의 포화 탄화수소기가 보다 바람직하고, 탄소수 1∼3의 1가의 포화 탄화수소기가 더욱 바람직하다. As R 3 and R 4, an unsubstituted monovalent saturated hydrocarbon group of 1 to 10 carbon atoms is preferable, a monovalent saturated hydrocarbon group of 1 to 4 carbon atoms is more preferable, and a monovalent saturated hydrocarbon group of 1 to 3 carbon atoms is more preferable.
R6 및 R7에 있어서의 탄소수 1∼6의 알킬기로서는 예컨대 메틸기, 에틸기, 프로필기, 부틸기, 펜틸기, 헥실기, 이소프로필기, 이소부틸기, sec-부틸기, tert-부틸기, 이소펜틸기, 네오펜틸기 등을 들 수 있다. Examples of the alkyl group having 1 to 6 carbon atoms for R 6 and R 7 include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, an isopropyl group, an isobutyl group, Isopentyl group, neopentyl group and the like.
R11에 있어서의 탄소수 7∼10의 아랄킬기로서는 예컨대 벤질기, 페닐에틸기, 페닐부틸기 등을 들 수 있다. Examples of the aralkyl group having 7 to 10 carbon atoms for R 11 include a benzyl group, a phenylethyl group, and a phenylbutyl group.
Z+는 +N(R11)4, Na+ 또는 K+이며, 바람직하게는 +N(R11)4이다. Z + is + N (R 11 ) 4 , Na + or K + , preferably + N (R 11 ) 4 .
상기 +N(R11)4로서는 4개의 R11 중 적어도 2개가 탄소수 5∼20의 1가의 포화 탄화수소기인 것이 바람직하다. 또한, 4개의 R11의 합계 탄소수는 20∼80이 바람직하고, 20∼60이 보다 바람직하다. As the + N (R 11 ) 4, it is preferable that at least two of the four R 11 s are monovalent saturated hydrocarbon groups having 5 to 20 carbon atoms. The total number of carbon atoms of the four R < 11 > s is preferably from 20 to 80, more preferably from 20 to 60. [
R1 및 R2를 나타내는 페닐기는 치환기를 갖고 있더라도 좋다. 이 치환기로서는 할로겐 원자, -R8, -OH, -OR8, -SO3H, -SO3 -Z+, -CO2H, -CO2R8, -SR8, -SO2R8, -SO3R8 및 -SO2NR9R10을 들 수 있다. 이들 치환기 중에서도 -R8이 바람직하고, 탄소수 1∼10의 1가의 포화 탄화수소기가 보다 바람직하다. 이 경우의 -SO3 -Z+로서는 -SO3 -+N(R11)4가 바람직하다. The phenyl group representing R 1 and R 2 may have a substituent. Examples of the substituent halogen atoms, -R 8, -OH, -OR 8 , -SO 3 H, -SO 3 - Z +, -CO 2 H, -CO 2 R 8, -SR 8, -SO 2 R 8, -SO 3 R 8 and -SO 2 NR 9 R 10 . Among these substituents, -R 8 is preferable, and a monovalent saturated hydrocarbon group having 1 to 10 carbon atoms is more preferable. In this case, -SO 3 - Z + is preferably -SO 3 - + N (R 11 ) 4 .
치환기를 갖는 페닐기로서는 톨루일기, 디메틸페닐기, 에틸페닐기, 프로필페닐기, 이소프로필페닐기, 메틸술파닐페닐기, 메틸술포닐페닐기 등을 들 수 있다. 그 중에서도 질소와의 결합수(手)에 대하여 오르토 위치에 치환기를 갖는 페닐기가 바람직하다. Examples of the phenyl group having a substituent include a toluyl group, a dimethylphenyl group, an ethylphenyl group, a propylphenyl group, an isopropylphenyl group, a methylsulfanylphenyl group and a methylsulfonylphenyl group. Among them, a phenyl group having a substituent at the ortho position with respect to the number of bonds with nitrogen (hand) is preferable.
R1 및 R2는 서로 독립적으로 탄소수 1∼4의 1가의 포화 탄화수소기를 갖는 페닐기인 것이 바람직하고, 톨루일기 또는 디메틸페닐기인 것이 보다 바람직하고, o-톨루일기 또는 2,6-디메틸페닐기인 것이 더욱 바람직하다. Preferably, R 1 and R 2 are each independently a phenyl group having a monovalent saturated hydrocarbon group of 1 to 4 carbon atoms, more preferably a toluyl group or a dimethylphenyl group, and an o-toluyl group or a 2,6-dimethylphenyl group More preferable.
R1 및 R3은 질소 원자와 함께 질소 원자를 포함하는 고리를 형성하더라도 좋다. 즉, R1에 있어서의 치환기를 갖고 있더라도 좋은 페닐기를 구성하는 벤젠환 상의 탄소 원자와, R3에 있어서의 1가의 포화 탄화수소기를 구성하는 원자가 결합하여, 질소 원자와 함께 질소 원자를 포함하는 고리를 형성하더라도 좋다. R2 및 R4는 질소 원자와 함께 질소 원자를 포함하는 고리를 형성하더라도 좋다. 즉, R2에 있어서의 치환기를 갖고 있더라도 좋은 페닐기를 구성하는 벤젠환 상의 탄소 원자와, R4에 있어서의 1가의 포화 탄화수소기를 구성하는 원자가 결합하여, 질소 원자와 함께 질소 원자를 포함하는 고리를 형성하더라도 좋다. 형성되는 고리로서는 예컨대 이하의 것을 들 수 있다. R 1 and R 3 together with the nitrogen atom may form a ring containing a nitrogen atom. That is, a carbon atom on the benzene ring constituting a phenyl group which may have a substituent in R 1 and an atom constituting a monovalent saturated hydrocarbon group in R 3 are bonded to form a ring containing a nitrogen atom together with a nitrogen atom . R 2 and R 4 together with the nitrogen atom may form a ring containing a nitrogen atom. That is, a carbon atom on the benzene ring constituting a phenyl group which may have a substituent in R 2 and an atom constituting a monovalent saturated hydrocarbon group in R 4 are bonded to form a ring containing a nitrogen atom together with a nitrogen atom . Examples of the ring to be formed include the following.
R5로서는 -SO3H, -SO3 -Z+ 및 -SO2NR9R10이 바람직하다. R 5 -SO 3 H, -SO 3 Examples - the Z + and -SO 2 NR 9 R 10 are preferred.
R6 및 R7로서는 수소 원자, 메틸기 및 에틸기가 바람직하고, 수소 원자가 보다 바람직하다. As R 6 and R 7 , a hydrogen atom, a methyl group and an ethyl group are preferable, and a hydrogen atom is more preferable.
m은 0∼2의 정수가 바람직하고, 1 또는 2인 것이 보다 바람직하다. m is preferably an integer of 0 to 2, more preferably 1 or 2.
화합물 (1)로서는 식 (2)로 표시되는 화합물이 바람직하다. The compound (1) is preferably a compound represented by the formula (2).
[식 (2)에서, R21, R22, R23 및 R24는 서로 독립적으로 탄소수 1∼4의 알킬기를 나타낸다. [In the formula (2), R 21 , R 22 , R 23 and R 24 independently represent an alkyl group having 1 to 4 carbon atoms.
p 및 q는 각각 독립적으로 0∼5의 정수를 나타낸다. p가 2 이상인 경우, 복수의 R23은 동일하더라도 상이하더라도 좋고, q가 2 이상인 경우, 복수의 R24는 동일하더라도 상이하더라도 좋다.]p and q each independently represent an integer of 0 to 5; When p is 2 or more, plural R 23 s may be the same or different, and when q is 2 or more, plural R 24 s may be the same or different.
R21, R22, R23 및 R24를 나타내는 탄소수 1∼4의 알킬기로서는 메틸기, 에틸기, 프로필기, 부틸기, 이소프로필기, 이소부틸기, sec-부틸기, tert-부틸기 등을 들 수 있다. Examples of the alkyl group having 1 to 4 carbon atoms representing R 21 , R 22 , R 23 and R 24 include methyl, ethyl, propyl, butyl, isopropyl, isobutyl, sec- .
R21 및 R22는 각각 독립적으로 탄소수 1∼3의 1가의 포화 탄화수소기인 것이 바람직하다. R23 및 R24는 메틸기가 바람직하다. R 21 and R 22 each independently represent a monovalent saturated hydrocarbon group having 1 to 3 carbon atoms. R 23 and R 24 are preferably methyl groups.
p 및 q는 0∼2의 정수가 바람직하고, 1 또는 2인 것이 바람직하다. p and q are preferably an integer of 0 to 2, and are preferably 1 or 2.
화합물 (1)로서는 식 (3)으로 표시되는 화합물이 바람직하다. As the compound (1), a compound represented by the formula (3) is preferable.
[식 (3)에서, R31 및 R32는 각각 독립적으로 탄소수 1∼4의 알킬기를 나타낸다.[In the formula (3), R 31 and R 32 each independently represent an alkyl group having 1 to 4 carbon atoms.
R33, R34, R35 및 R36은 각각 독립적으로 수소 원자 또는 탄소수 1∼4의 알킬기를 나타낸다.] R 33 , R 34 , R 35 and R 36 each independently represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.
R31∼R36을 나타내는 탄소수 1∼4의 알킬기로서는 상기와 같은 것을 들 수 있다. Examples of the alkyl group having 1 to 4 carbon atoms represented by R 31 to R 36 include the same groups as described above.
R31 및 R32는 각각 독립적으로 탄소수 1∼3의 1가의 포화 탄화수소기인 것이 바람직하다. R33∼R36은 각각 독립적으로 수소 원자 또는 메틸기인 것이 바람직하다. R 31 and R 32 each independently represent a monovalent saturated hydrocarbon group having 1 to 3 carbon atoms. It is preferable that R 33 to R 36 are each independently a hydrogen atom or a methyl group.
화합물 (1)로서는 예컨대 식 (1-1)∼식 (1-15) 중 어느 것으로 표시되는 화합물을 들 수 있다. 그 중에서도 유기 용매에의 용해성이 우수하다는 점에서 식 (1-1), 식 (1-2) 또는 식 (1-5)∼식 (1-12)로 표시되는 화합물이 바람직하다. Examples of the compound (1) include compounds represented by any one of the formulas (1-1) to (1-15). Among them, the compound represented by the formula (1-1), the formula (1-2) or the formula (1-5) to (1-12) is preferable in that the solubility in an organic solvent is excellent.
화합물 (1)의 제조 방법으로서는, 식 (1a)로 표시되는 화합물과 식 (1b)로 표시되는 화합물 및 식 (1c)로 표시되는 화합물을 유기 용매의 존재 하에 또는 무용매로 반응시키는 방법을 들 수 있다. 수율의 점에서 무용매로 반응시키는 것이 바람직하다. 반응 온도는 30℃∼180℃가 바람직하고, 80℃∼130℃가 보다 바람직하다. 반응 시간은 1시간∼12시간이 바람직하고, 3시간∼8시간이 보다 바람직하다. Examples of the method for producing the compound (1) include a method of reacting the compound represented by the formula (1a) with the compound represented by the formula (1b) and the compound represented by the formula (1c) in the presence or absence of an organic solvent . It is preferable to react in the absence of solvent in terms of yield. The reaction temperature is preferably 30 ° C to 180 ° C, more preferably 80 ° C to 130 ° C. The reaction time is preferably 1 hour to 12 hours, more preferably 3 hours to 8 hours.
[식 (1b) 및 식 (1c)에서, R1∼R4는 각각 상기와 동일한 의미를 나타낸다.][In formulas (1b) and (1c), R 1 to R 4 each have the same meaning as defined above.]
상기 유기 용매로서는 톨루엔, 크실렌 등의 탄화수소 용매; 클로로벤젠, 디클로로벤젠, 클로로포름 등의 할로겐화 탄화수소 용매; 메탄올, 에탄올, 부탄올 등의 알코올 용매; 니트로벤젠 등의 니트로 탄화수소 용매; 메틸이소부틸케톤 등의 케톤 용매; 1-메틸-2-피롤리돈 등의 아미드 용매 등을 들 수 있다. Examples of the organic solvent include hydrocarbon solvents such as toluene and xylene; Halogenated hydrocarbon solvents such as chlorobenzene, dichlorobenzene and chloroform; Alcohol solvents such as methanol, ethanol and butanol; A nitrohydrocarbon solvent such as nitrobenzene; Ketone solvents such as methyl isobutyl ketone; And amide solvents such as 1-methyl-2-pyrrolidone.
식 (1b)로 표시되는 화합물 및 식 (1c)로 표시되는 화합물의 사용량은 식 (1a)로 표시되는 화합물 1 몰에 대하여 각각 바람직하게는 1 몰 이상 8 몰 이하이며, 보다 바람직하게는 1 몰 이상 5 몰 이하이다. 각각 단계적으로 반응시키더라도 좋고, 동시에 반응시키더라도 좋다. The amount of the compound represented by formula (1b) and the compound represented by formula (1c) is preferably 1 mole or more and 8 mole or less, more preferably 1 mole or less per mole of the compound represented by formula (1a) Or more and 5 moles or less. May be reacted stepwise or simultaneously.
화합물 (1)의 제조가 용이하다고 하는 점에서, 식 (1b)로 표시되는 화합물과 식 (1c)로 표시되는 화합물이 동일한 구조인 것이 바람직하다. It is preferable that the compound represented by formula (1b) and the compound represented by formula (1c) have the same structure in that the preparation of compound (1) is easy.
반응 혼합물로부터 목적 화합물인 화합물 (1)을 취득하는 방법은 특별히 한정되지 않고 공지된 여러 가지 수법을 채용할 수 있다. 예컨대, 반응 혼합물을 산(예컨대, 초산 등)과 함께 혼합하여, 석출된 결정을 여과하여 취할 수 있다. 상기 산은 미리 산의 수용액을 조제하고 나서 반응 혼합물을 상기 수용액에 첨가하는 것이 바람직하다. 반응 혼합물을 첨가할 때의 온도는 바람직하게는 10℃ 이상 50℃ 이하이다. 또한, 이 후, 같은 온도에서 0.5∼2시간 정도 교반하는 것이 바람직하다. 여과하여 취한 결정은 물 등으로 세정하고, 이어서 건조하는 것이 바람직하다. 또한 필요에 따라서 재결정 등의 공지된 수법에 의해서 더 정제하더라도 좋다. The method for obtaining the desired compound (1) from the reaction mixture is not particularly limited and various known methods may be employed. For example, the reaction mixture may be mixed with an acid (e.g., acetic acid or the like), and the precipitated crystals may be collected by filtration. It is preferable that the acid is prepared by preparing an aqueous solution of an acid in advance and then adding the reaction mixture to the aqueous solution. The temperature at the time of adding the reaction mixture is preferably from 10 캜 to 50 캜. Thereafter, stirring is preferably performed at the same temperature for about 0.5 to 2 hours. The crystals obtained by filtration are preferably washed with water or the like, and then dried. If necessary, it may be further purified by a known method such as recrystallization.
본 발명의 착색 경화성 수지 조성물에 있어서의 화합물 (1)의 함유량은 고형분의 총량에 대하여 0.025 질량% 이상 48 질량% 이하가 바람직하고, 0.08 질량% 이상 42 질량% 이하가 보다 바람직하고, 0.1 질량% 이상 30 질량% 이하가 더욱 바람직하다. 여기서, 본 명세서에 있어서의 「고형분의 총량」이란, 착색 경화성 수지 조성물의 총량에서 용제의 함유량을 제한 양을 말한다. 고형분의 총량 및 이것에 대한 각 성분의 함유량은 예컨대 액체 크로마토그래피 또는 가스 크로마토그래피 등의 공지된 분석 수단으로 측정할 수 있다. The content of the compound (1) in the colored curable resin composition of the present invention is preferably 0.025 mass% or more and 48 mass% or less, more preferably 0.08 mass% or more and 42 mass% Or more and 30 mass% or less. Here, the "total amount of solid content" in the present specification refers to a limited amount of the solvent in the total amount of the colored curable resin composition. The total amount of the solid content and the content of each component relative to the total amount can be measured by a known analytical means such as liquid chromatography or gas chromatography.
또한, 착색제(A)가 안료(A1) 및/또는 염료(A2)를 화합물 (1)과 함께 포함하는 경우, 화합물 (1)의 함유량은 착색제(A)의 총량에 대하여 0.5 질량% 이상 80 질량% 이하가 바람직하고, 1 질량% 이상 70 질량% 이하가 보다 바람직하고, 1 질량% 이상 50 질량% 이하가 더욱 바람직하다. When the colorant (A) contains the pigment (A1) and / or the dye (A2) together with the compound (1), the content of the compound (1) is preferably not less than 0.5% by mass and not more than 80% Or less, more preferably 1 mass% or more and 70 mass% or less, and still more preferably 1 mass% or more and 50 mass% or less.
<안료(A1)> ≪ Pigment (A1) >
안료(A1)로서는 특별히 한정되지 않고 공지된 안료를 사용할 수 있으며, 예컨대 컬러 인덱스(The Society of Dyers and Colourists 출판)에서 피그먼트로 분류되어 있는 화합물을 들 수 있다. The pigment (A1) is not particularly limited, and known pigments can be used. For example, the pigment is classified into pigments in the color index (The Society of Dyers and Colourists).
안료로서는 예컨대 C.I. 피그먼트 옐로우 1, 3, 12, 13, 14, 15, 16, 17, 20, 24, 31, 53, 83, 86, 93, 94, 109, 110, 117, 125, 128, 137, 138, 139, 147, 148, 150, 153, 154, 166, 173, 194, 214 등의 황색 안료; As the pigment, for example, C.I. Pigment Yellow 1, 3, 12, 13, 14, 15, 16, 17, 20, 24, 31, 53, 83, 86, 93, 94, 109, 110, 117, 125, 128, 137, 138, 139 , 147, 148, 150, 153, 154, 166, 173, 194 and 214;
C.I. 피그먼트 오렌지 13, 31, 36, 38, 40, 42, 43, 51, 55, 59, 61, 64, 65, 71, 73 등의 오렌지색의 안료; C.I. Orange pigments such as Pigment Orange 13, 31, 36, 38, 40, 42, 43, 51, 55, 59, 61, 64, 65, 71, 73;
C.I. 피그먼트 레드 9, 97, 105, 122, 123, 144, 149, 166, 168, 175, 176, 177, 180, 192, 209, 215, 216, 224, 242, 254, 255, 264, 265 등의 적색 안료; C.I. Pigment Red 9, 97, 105, 122, 123, 144, 149, 166, 168, 175, 176, 177, 180, 192, 209, 215, 216, 224, 242, 254, 255, 264, Red pigment;
C.I. 피그먼트 블루 15, 15:3, 15:4, 15:6, 60, 80 등의 청색 안료; C.I. Pigment Blue 15, 15: 3, 15: 4, 15: 6, 60 and 80;
C.I. 피그먼트 바이올렛 1, 19, 23, 29, 32, 36, 38 등의 바이올렛색 안료; C.I. Violet pigments such as
C.I. 피그먼트 그린 7, 36, 58 등의 녹색 안료; C.I. Green pigments such as Pigment Green 7, 36, and 58;
C.I. 피그먼트 브라운 23, 25 등의 브라운색 안료; C.I. Brown pigments such as
C.I. 피그먼트 블랙 1, 7 등의 흑색 안료 등을 들 수 있다. C.I. Pigment black 1, pigment black 7, and the like.
안료로서는 C.I. 피그먼트 블루 15, 15:3, 15:4, 15:6, 60 등의 청색 안료 및 C.I. 피그먼트 바이올렛 1, 19, 23, 29, 32, 36, 38 등의 바이올렛색 안료가 바람직하고, C.I. 피그먼트 블루 15:3, 15:6 및 C.I. 피그먼트 바이올렛 23이 보다 바람직하고, C.I 피그먼트 블루 15:6이 더욱 바람직하다. 상기한 안료를 포함함으로써 특히 본 발명의 착색 경화성 수지 조성물을 청색 착색 경화성 수지 조성물로서 조제하는 경우에 투과 스펙트럼의 최적화가 용이하고, 컬러 필터의 내광성 및 내약품성이 양호하게 된다. As the pigment, C.I. Pigment Blue 15, 15: 3, 15: 4, 15: 6 and 60, and C.I. Violet color pigments such as
안료는 필요에 따라서 로진 처리, 산성 기 또는 염기성 기가 도입된 안료 유도체 등을 이용한 표면 처리, 고분자 화합물 등에 의한 안료 표면에의 그라프트 처리, 황산 미립화법 등에 의한 미립화 처리 또는 불순물을 제거하기 위한 유기 용제나 물 등에 의한 세정 처리, 이온성 불순물의 이온교환법 등에 의한 제거 처리 등이 실시되고 있더라도 좋다. The pigment may be subjected to a surface treatment using a rosin treatment, a pigment derivative in which an acidic group or a basic group is introduced, a graft treatment on the surface of a pigment with a polymer compound or the like, an atomization treatment such as a sulfuric acid atomization method or an organic solvent A cleaning treatment with water or the like, a removal treatment with an ion exchange method of ionic impurities, or the like may be performed.
안료는 입경이 균일한 것이 바람직하다. 안료 분산제를 함유시켜 분산 처리를 함으로써 안료가 용액 중에서 균일하게 분산된 상태의 안료 분산액을 얻을 수 있다. The pigment preferably has a uniform particle size. By containing the pigment dispersant and performing the dispersion treatment, a pigment dispersion in which the pigment is uniformly dispersed in the solution can be obtained.
상기한 안료 분산제로서는 예컨대 양이온계, 음이온계, 비이온계, 양성, 폴리에스테르계, 폴리아민계, 아크릴계 등의 안료 분산제 등을 들 수 있다. 이들 안료 분산제는 단독으로 이용하더라도 2종 이상을 조합시켜 이용하더라도 좋다. 안료 분산제로서는 상품명으로 KP(신에츠가가쿠고교(주) 제조), 플로렌(교에이샤가가쿠(주) 제조), 솔스파스(제네카(주) 제조), EFKA(CIBA사 제조), 아지스퍼(아지노모토파인테크노(주) 제조), Disperbyk(비크케미사 제조) 등을 들 수 있다. Examples of the pigment dispersant include cationic, anionic, nonionic, amphoteric, polyester, polyamine, and acrylic pigment dispersants. These pigment dispersants may be used alone or in combination of two or more. Examples of the pigment dispersant include trade name KP (manufactured by Shin-Etsu Chemical Co., Ltd.), fluorene (manufactured by Kyoeisha Chemical Co., Ltd.), Solspas (manufactured by Zeneca), EFKA Spur (manufactured by Ajinomoto Fine Techno Co., Ltd.), and Disperbyk (manufactured by Vickers).
안료 분산제를 이용하는 경우, 그 사용량은 안료(A1)에 대하여 바람직하게는 1 질량% 이상 100 질량% 이하이며, 보다 바람직하게는 5 질량% 이상 50 질량% 이하이다. 안료 분산제의 사용량이 상기한 범위 내에 있으면, 보다 균일한 분산 상태의 안료 분산액을 얻을 수 있는 경향이 있다. When a pigment dispersant is used, the amount thereof is preferably 1% by mass or more and 100% by mass or less, and more preferably 5% by mass or more and 50% by mass or less, based on the pigment (A1). When the amount of the pigment dispersant is within the above range, there is a tendency to obtain a more uniformly dispersed pigment dispersion.
착색제(A)가 안료(A1)를 포함하는 경우, 안료(A1)의 함유량은 착색제(A)의 총량에 대하여 20 질량% 이상 99.5 질량% 이하가 바람직하고, 30 질량% 이상 99 질량% 이하가 보다 바람직하다. When the colorant (A) contains the pigment (A1), the content of the pigment (A1) is preferably 20 mass% or more and 99.5 mass% or less, more preferably 30 mass% or more and 99 mass% or less based on the total amount of the colorant (A) More preferable.
<염료(A2)> ≪ Dye (A2) >
염료(A2)로서서는 화합물 (1)과 상이한 것이라면 특별히 한정되지 않고 공지된 염료를 사용할 수 있으며, 유용성 염료, 산성 염료, 염기성 염료, 직접 염료, 매염 염료, 산성 염료의 아민염이나 산성 염료의 술폰아미드 유도체 등의 염료를 들 수 있고, 예컨대, 컬러 인덱스(The Society of Dyers and Colourists 출판)에서 염료(피그먼트 이외이며 또한 색상을 갖는 것)로 분류되어 있는 화합물이나, 염색 노트(시키센샤)에 기재되어 있는 공지된 염료를 들 수 있다. 또한, 화학 구조에 따르면, 아조 염료, 시아닌 염료, 트리페닐메탄 염료, 크산텐 염료, 프탈로시아닌 염료, 나프토퀴논 염료, 퀴논이민 염료, 메틴 염료, 아조메틴 염료, 스쿠아릴륨 염료, 아크리딘 염료, 스티릴 염료, 쿠마린 염료, 퀴놀린 염료 및 니트로 염료 등을 들 수 있다. 이들 중, 유기 용제 가용성 염료가 바람직하다. The dye (A2) is not particularly limited as long as it is different from the compound (1), and known dyes can be used. Examples of the dye (A2) include useful dyes, acid dyes, basic dyes, direct dyes, mordant dyes, amine salts of acid dyes Amide derivatives, and the like. Examples of such dyes include compounds classified in the color index (published by The Society of Dyers and Colourists) as dyes (other than pigments and having a color), dyeing notes And the known dyes described. According to the chemical structure, the azo dye, cyanine dye, triphenylmethane dye, xanthene dye, phthalocyanine dye, naphthoquinone dye, quinoneimine dye, methine dye, azomethine dye, squarylium dye, , Styryl dyes, coumarin dyes, quinoline dyes, and nitro dyes. Of these, organic solvent-soluble dyes are preferred.
구체적으로는 C.I. 솔벤트 옐로우 4(이하, C.I. 솔벤트 옐로우의 기재를 생략하고, 번호만으로 기재함), 14, 15, 23, 24, 38, 62, 63, 68, 82, 94, 98, 99, 162; Specifically, C.I. 14, 15, 23, 24, 38, 62, 63, 68, 82, 94, 98, 99, 162; Solvent Yellow 4 (hereinafter abbreviated as CI Solvent Yellow)
C.I. 솔벤트 레드 45, 49, 125, 130, 218; C.I. Solvent Red 45, 49, 125, 130, 218;
C.I. 솔벤트 오렌지 2, 7, 11, 15, 26, 56; C.I. Solvent Orange 2, 7, 11, 15, 26, 56;
C.I. 솔벤트 블루 4, 5, 37, 67, 70, 90; C.I. Solvent Blue 4, 5, 37, 67, 70, 90;
C.I. 솔벤트 그린 1, 4, 5, 7, 34, 35 등의 C.I. 솔벤트 염료, C.I. Solvent Green 1, 4, 5, 7, 34, 35, etc. C.I. Solvent dyes,
C.I. 애시드 옐로우 1, 3, 7, 9, 11, 17, 23, 25, 29, 34, 36, 38, 40, 42, 54, 65, 72, 73, 76, 79, 98, 99, 111, 112, 113, 114, 116, 119, 123, 128, 134, 135, 138, 139, 140, 144, 150, 155, 157, 160, 161, 163, 168, 169, 172, 177, 178, 179, 184, 190, 193, 196, 197, 199, 202, 203, 204, 205, 207, 212, 214, 220, 221, 228, 230, 232, 235, 238, 240, 242, 243, 251; C.I.
C.I. 애시드 레드 1, 4, 8, 14, 17, 18, 26, 27, 29, 31, 34, 35, 37, 42, 44, 50, 51, 52, 57, 66, 73, 87, 88, 91, 92, 94, 97, 103, 111, 114, 129, 133, 134, 138, 143, 145, 150, 151, 158, 176, 182, 183, 195, 198, 206, 211, 215, 216, 217, 227, 228, 249, 252, 257, 258, 260, 261, 266, 268, 270, 274, 277, 280, 281, 289, 308, 312, 315, 316, 339, 341, 345, 346, 349, 382, 383, 388, 394, 401, 412, 417, 418, 422, 426; C.I.
C.I. 애시드 오렌지 6, 7, 8, 10, 12, 26, 50, 51, 52, 56, 62, 63, 64, 74, 75, 94, 95, 107, 108, 169, 173;C.I. Acid Orange 6, 7, 8, 10, 12, 26, 50, 51, 52, 56, 62, 63, 64, 74, 75, 94, 95, 107, 108, 169, 173;
C.I. 애시드 바이올렛 6B, 7, 9, 17, 19, 30, 102; C.I. Acid Violet 6B, 7, 9, 17, 19, 30, 102;
C.I. 애시드 블루 1, 7, 9, 15, 18, 22, 29, 42, 59, 60, 62, 70, 72, 74, 82, 83, 86, 87, 90, 92, 93, 100, 102, 103, 104, 113, 117, 120, 126, 130, 131, 142, 147, 151, 154, 158, 161, 166, 167, 168, 170, 171, 184, 187, 192, 199, 210, 229, 234, 236, 242, 243, 256, 259, 267, 285, 296, 315, 335; C.I.
C.I. 애시드 그린 1, 3, 5, 9, 16, 50, 58, 63, 65, 80, 104, 105, 106, 109 등의 C.I. 애시드 염료, C.I. C.I., such as Acid Green 1, 3, 5, 9, 16, 50, 58, 63, 65, 80, 104, 105, Acid dyes,
C.I. 다이렉트 옐로우 2, 33, 34, 35, 38, 39, 43, 47, 50, 54, 58, 68, 69, 70, 71, 86, 93, 94, 95, 98, 102, 108, 109, 129, 136, 138, 141; C.I. Direct Yellow 2, 33, 34, 35, 38, 39, 43, 47, 50, 54, 58, 68, 69, 70, 71, 86, 93, 94, 95, 98, 136, 138, 141;
C.I. 다이렉트 레드 79, 82, 83, 84, 91, 92, 96, 97, 98, 99, 105, 106, 107, 172, 173, 176, 177, 179, 181, 182, 184, 204, 207, 211, 213, 218, 220, 221, 222, 232, 233, 234, 241, 243, 246, 250; C.I.
C.I. 다이렉트 오렌지 26, 34, 39, 41, 46, 50, 52, 56, 57, 61, 64, 65, 68, 70, 96, 97, 106, 107; C.I. Direct Orange 26, 34, 39, 41, 46, 50, 52, 56, 57, 61, 64, 65, 68, 70, 96, 97, 106, 107;
C.I. 다이렉트 바이올렛 47, 52, 54, 59, 60, 65, 66, 79, 80, 81, 82, 84, 89, 90, 93, 95, 96, 103, 104; C.I. Direct Violet 47, 52, 54, 59, 60, 65, 66, 79, 80, 81, 82, 84, 89, 90, 93, 95, 96, 103, 104;
C.I. 다이렉트 블루 1, 2, 6, 8, 15, 22, 25, 41, 57, 71, 76, 78, 80, 81, 84, 85, 86, 90, 93, 94, 95, 97, 98, 99, 100, 101, 106, 107, 108, 109, 113, 114, 115, 117, 119, 120, 137, 149, 150, 153, 155, 156, 158, 159, 160, 161, 162, 163, 164, 165, 166, 167, 168, 170, 171, 172, 173, 188, 189, 190, 192, 193, 194, 195, 196, 198, 199, 200, 201, 202, 203, 207, 209, 210, 212, 213, 214, 222, 225, 226, 228, 229, 236, 237, 238, 242, 243, 244, 245, 246, 247, 248, 249, 250, 251, 252, 256, 257, 259, 260, 268, 274, 275, 293; C.I.
C.I. 다이렉트 그린 25, 27, 31, 32, 34, 37, 63, 65, 66, 67, 68, 69, 72, 77, 79, 82 등의 C.I. 다이렉트 염료;C.I.
C.I. 디스퍼스 옐로우 54, 76 등의 C.I. 디스퍼스 염료;C.I. Disperse Yellow 54, C.I. Disperse Dyes;
C.I. 베이식 레드 1, 10; C.I. Basic red 1, 10;
C.I. 베이식 블루 1, 3, 5, 7, 9, 19, 24, 25, 26, 28, 29, 40, 41, 54, 58, 59, 64, 65, 66, 67, 68; C.I.
C.I. 베이식 그린 1 등의 C.I 베이식 염료,C.I. Basic green 1 and other C.I. basic dyes,
C.I. 리액티브 옐로우 2, 76, 116;C.I. Reactive Yellow 2, 76, 116;
C.I. 리액티브 오렌지 16; C.I. Reactive Orange 16;
C.I. 리액티브 레드 36 등의 C.I. 리액티브 염료,C.I. C.I. Reactive dyes,
C.I. 모던트 옐로우 5, 8, 10, 16, 20, 26, 30, 31, 33, 42, 43, 45, 56, 61, 62, 65; C.I. Modern Yellow 5, 8, 10, 16, 20, 26, 30, 31, 33, 42, 43, 45, 56, 61, 62, 65;
C.I. 모던트 레드 1, 2, 4, 9, 12, 14, 17, 18, 19, 22, 23, 24, 25, 26, 27, 30, 32, 33, 36, 37, 38, 39, 41, 43, 45, 46, 48, 53, 56, 63, 71, 74, 85, 86, 88, 90, 94, 95; C.I. 43, 38, 39, 41, 43, 43, 43, 43, 42, 43, , 45, 46, 48, 53, 56, 63, 71, 74, 85, 86, 88, 90, 94, 95;
C.I. 모던트 오렌지 3, 4, 5, 8, 12, 13, 14, 20, 21, 23, 24, 28, 29, 32, 34, 35, 36, 37, 42, 43, 47, 48; C.I.
C.I. 모던트 바이올렛 1, 2, 4, 5, 7, 14, 22, 24, 30, 31, 32, 37, 40, 41, 44, 45, 47, 48, 53, 58; C.I.
C.I. 모던트 블루 1, 2, 3, 7, 9, 12, 13, 15, 16, 19, 20, 21, 22, 26, 30, 31, 39, 40, 41, 43, 44, 49, 53, 61, 74, 77, 83, 84; C.I. 1, 2, 3, 7, 9, 12, 13, 15, 16, 19, 20, 21, 22, 26, 30, 31, 39, 40, 41, 43, 44, 49, 53, 61 , 74, 77, 83, 84;
C.I. 모던트 그린 1, 3, 4, 5, 10, 15, 26, 29, 33, 34, 35, 41, 43, 53 등의 C.I. 모던트 염료, C.I. CI. 1, 3, 4, 5, 10, 15, 26, 29, 33, 34, 35, 41, Modern dyes,
C.I. 배트 그린 1 등의 C.I. 배트 염료 등을 들 수 있다. C.I. C.I. Vat dyes and the like.
이들 염료는 원하는 컬러 필터의 분광 스펙트럼에 맞춰 적절하게 선택하면 된다. 그 중에서도 청색 염료, 바이올렛색 염료 및 적색 염료가 바람직하다. These dyes can be appropriately selected in accordance with the spectral spectrum of a desired color filter. Among them, a blue dye, a violet dye and a red dye are preferable.
착색제(A)가 염료(A2)를 포함하는 경우, 염료(A2)의 함유량은 착색제(A)의 총량에 대하여 0.5 질량% 이상 35 질량% 이하가 바람직하고, 1 질량% 이상 30 질량% 이하가 보다 바람직하다. When the colorant (A) contains the dye (A2), the content of the dye (A2) is preferably 0.5% by mass or more and 35% by mass or less, more preferably 1% by mass or more and 30% More preferable.
착색제(A)로서는 화합물 (1) 및 안료(A1)로 이루어지는 착색제, 및 화합물 (1),안료(A1) 및 염료(A2)로 이루어지는 착색제가 바람직하다. As the colorant (A), a colorant comprising the compound (1) and the pigment (A1) and a colorant comprising the compound (1), the pigment (A1) and the dye (A2) are preferable.
착색제(A)가 화합물 (1) 및 안료(A1)로 이루어지는 착색제인 경우, 이들의 함유량은 착색제(A)의 총량에 대하여 각각 When the coloring agent (A) is a coloring agent comprising the compound (1) and the pigment (A1), the content thereof is preferably in the range of
화합물 (1); 0.5 질량% 이상 80 질량% 이하 Compound (1); 0.5% by mass or more and 80% by mass or less
안료(A1); 20 질량% 이상 99.5 질량% 이하가 바람직하고, A pigment (A1); More preferably 20 mass% or more and 99.5 mass% or less,
화합물 (1); 1 질량% 이상 50 질량% 이하Compound (1); 1% by mass or more and 50% by mass or less
안료(A); 50 질량% 이상 99 질량% 이하가 보다 바람직하다. Pigment (A); More preferably 50 mass% or more and 99 mass% or less.
착색제(A)가 화합물 (1), 안료(A1) 및 염료(A2)로 이루어지는 착색제인 경우, 이들의 함유량은 착색제(A)의 총량에 대하여 각각 When the coloring agent (A) is a coloring agent comprising the compound (1), the pigment (A1) and the dye (A2), the content thereof is preferably
화합물 (1); 0.5 질량% 이상 79.5 질량% 이하 Compound (1); 0.5% by mass or more and 79.5% by mass or less
안료(A1); 20 질량% 이상 99 질량% 이하 A pigment (A1); 20 mass% or more and 99 mass% or less
염료(A2); 0.5 질량% 이상 35 질량% 이하가 바람직하고, A dye (A2); More preferably 0.5 mass% or more and 35 mass% or less,
화합물 (1); 1 질량% 이상 50 질량% 이하 Compound (1); 1% by mass or more and 50% by mass or less
안료(A1); 49 질량% 이상 98 질량% 이하 A pigment (A1); 49% by mass or more and 98% by mass or less
염료(A2); 1 질량% 이상 30 질량% 이하가 보다 바람직하다. A dye (A2); More preferably 1% by mass or more and 30% by mass or less.
착색제(A)의 함유량은 고형분의 총량에 대하여 바람직하게는 5∼60 질량%이며, 보다 바람직하게는 8∼55 질량%이고, 더욱 바람직하게는 10∼50 질량%이다. 착색제(A)의 함유량이 상기한 범위 내에 있으면, 컬러 필터로 했을 때의 색 농도가 충분하고, 또한 조성물 중에 수지(B)나 중합성 화합물(C)을 필요량 함유시킬 수 있기 때문에, 기계적 강도가 충분한 패턴을 형성할 수 있다. The content of the colorant (A) is preferably from 5 to 60% by mass, more preferably from 8 to 55% by mass, and still more preferably from 10 to 50% by mass, based on the total amount of solids. When the content of the colorant (A) is within the above range, the color density of the color filter is sufficient and the resin (B) or the polymerizable compound (C) can be contained in a required amount in the composition. A sufficient pattern can be formed.
<수지(B)> ≪ Resin (B) >
수지(B)는 특별히 한정되지 않지만, 알칼리 가용성 수지인 것이 바람직하다. 수지(B)로서는 이하의 수지 [K1]∼[K6] 등을 들 수 있다. The resin (B) is not particularly limited, but is preferably an alkali-soluble resin. Examples of the resin (B) include the following resins [K1] to [K6].
수지 [K1] 불포화 카르복실산 및 불포화 카르복실산 무수물로 이루어지는 군에서 선택되는 1종 이상(a)(이하 「(a)」라고 하는 경우가 있음)과, 탄소수 2∼4의 환상 에테르 구조와 에틸렌성 불포화 결합을 갖는 단량체(b)(이하 「(b)」라고 하는 경우가 있음)와의 공중합체; (A) (hereinafter also referred to as "(a)") selected from the group consisting of a resin [K1] unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride, a cyclic ether structure having a carbon number of 2 to 4 (B) (hereinafter also referred to as "(b)") having an ethylenically unsaturated bond;
수지 [K2] (a)와 (b)와, (a)와 공중합 가능한 단량체(c)(단, (a) 및 (b)와는 상이함)(이하 「(c)」라고 하는 경우가 있음)와의 공중합체; The monomer (c) copolymerizable with the resin (K2) (a), (b) and (a) (different from (a) and (b) ≪ / RTI >
수지 [K3] (a)와 (c)와의 공중합체; Resin [K3] Copolymer of (a) and (c);
수지 [K4] (a)와 (c)와의 공중합체에 (b)를 반응시킨 수지; Resin [K4] Resin (b) is reacted with a copolymer of (a) and (c);
수지 [K5] (b)와 (c)와의 공중합체에 (a)를 반응시킨 수지; Resin [K5] Resin (a) is reacted with a copolymer of (b) and (c);
수지 [K6] (b)와 (c)와의 공중합체에 (a)를 반응시키고, 또한 카르복실산 무수물을 반응시킨 수지. Resin [K6] A resin obtained by reacting (a) a copolymer of (b) and (c) with a carboxylic acid anhydride.
(a)로서는 구체적으로는 예컨대 아크릴산, 메타크릴산, 크로톤산, o-, m-, p-비닐안식향산 등의 불포화 모노카르복실산류;(a) include unsaturated monocarboxylic acids such as acrylic acid, methacrylic acid, crotonic acid, o-, m- and p-vinylbenzoic acid;
말레산, 푸마르산, 시트라콘산, 메사콘산, 이타콘산, 3-비닐프탈산, 4-비닐프탈산, 3,4,5,6-테트라히드로프탈산, 1,2,3,6-테트라히드로프탈산, 디메틸테트라히드로프탈산, 1,4-시클로헥센디카르복실산 등의 불포화 디카르복실산류; Maleic acid, fumaric acid, citraconic acid, mesaconic acid, itaconic acid, 3-vinylphthalic acid, 4-vinylphthalic acid, 3,4,5,6-tetrahydrophthalic acid, 1,2,3,6-tetrahydrophthalic acid, Unsaturated dicarboxylic acids such as tetrahydrophthalic acid and 1,4-cyclohexene dicarboxylic acid;
메틸-5-노르보넨-2,3-디카르복실산, 5-카르복시비시클로[2.2.1]헵트-2-엔, 5,6-디카르복시비시클로[2.2.1]헵트-2-엔, 5-카르복시-5-메틸비시클로[2.2.1]헵트-2-엔, 5-카르복시-5-에틸비시클로[2.2.1]헵트-2-엔, 5-카르복시-6-메틸비시클로[2.2.1]헵트-2-엔, 5-카르복시-6-에틸비시클로[2.2.1]헵트-2-엔 등의 카르복시기를 함유하는 비시클로 불포화 화합물류; 5-norbornene-2,3-dicarboxylic acid, 5-carboxybicyclo [2.2.1] hept-2-ene, 5,6-dicarboxybicyclo [2.2.1] hept- 5-ethylbicyclo [2.2.1] hept-2-ene, 5-carboxy-6-methylbicyclo [2.2.1] hept- [2.2.1] hept-2-ene, and 5-carboxy-6-ethylbicyclo [2.2.1] hept-2-ene;
무수 말레산, 시트라콘산 무수물, 이타콘산 무수물, 3-비닐프탈산 무수물, 4-비닐프탈산 무수물, 3,4,5,6-테트라히드로프탈산 무수물, 1,2,3,6-테트라히드로프탈산 무수물, 디메틸테트라히드로프탈산 무수물, 5,6-디카르복시비시클로[2.2.1]헵트-2-엔 무수물 등의 불포화 디카르복실산류 무수물; Maleic anhydride, citraconic anhydride, itaconic anhydride, 3-vinylphthalic anhydride, 4-vinylphthalic anhydride, 3,4,5,6-tetrahydrophthalic anhydride, 1,2,3,6-tetrahydrophthalic anhydride , Unsaturated dicarboxylic acid anhydrides such as dimethyl tetrahydrophthalic anhydride and 5,6-dicarboxybicyclo [2.2.1] hept-2-eno anhydride;
호박산모노[2-(메트)아크릴로일옥시에틸], 프탈산모노[2-(메트)아크릴로일옥시에틸] 등의 2가 이상의 다가 카르복실산의 불포화 모노[(메트)아크릴로일옥시알킬]에스테르류;(Meth) acryloyloxyalkyl (meth) acrylate of a divalent or higher polyvalent carboxylic acid such as mono [2- (meth) acryloyloxyethyl] succinate, mono [2- ] Esters;
α-(히드록시메틸)아크릴산과 같은 동일 분자 중에 히드록시기 및 카르복시기를 함유하는 불포화 아크릴산류 등을 들 수 있다. and unsaturated acrylic acids containing a hydroxyl group and a carboxyl group in the same molecule such as? - (hydroxymethyl) acrylic acid.
이들 중, 공중합 반응성의 점이나 얻어지는 수지의 알칼리 수용액에의 용해성의 점에서, 아크릴산, 메타크릴산, 무수 말레산 등이 바람직하다. Of these, acrylic acid, methacrylic acid and maleic anhydride are preferable from the viewpoint of copolymerization reactivity and the solubility of the resulting resin in an aqueous alkali solution.
(b)는 예컨대 탄소수 2∼4의 환상 에테르 구조(예컨대, 옥시란환, 옥세탄환 및 테트라히드로푸란환으로 이루어지는 군에서 선택되는 1종 이상)와 에틸렌성 불포화 결합을 갖는 중합성 화합물을 말한다. (b)는 탄소수 2∼4의 환상 에테르와 (메트)아크릴로일옥시기를 갖는 단량체가 바람직하다. (b) refers to a polymerizable compound having an ethylenic unsaturated bond and a cyclic ether structure having 2 to 4 carbon atoms (e.g., at least one member selected from the group consisting of oxirane rings, oxetane rings, and tetrahydrofuran rings). (b) is preferably a monomer having a cyclic ether having 2 to 4 carbon atoms and a (meth) acryloyloxy group.
한편, 본 명세서에 있어서 「(메트)아크릴산」이란, 아크릴산 및 메타크릴산으로 이루어지는 군에서 선택되는 1종 이상을 나타낸다. 「(메트)아크릴로일」 및 「(메트)아크릴레이트」 등의 표기도 같은 의미를 갖는다. In the present specification, the term " (meth) acrylic acid " refers to at least one member selected from the group consisting of acrylic acid and methacrylic acid. The expressions such as "(meth) acryloyl" and "(meth) acrylate" have the same meaning.
(b)로서는 예컨대 옥시라닐기와 에틸렌성 불포화 결합을 갖는 단량체(b1)(이하 「(b1)」이라고 하는 경우가 있음), 옥세타닐기와 에틸렌성 불포화 결합을 갖는 단량체(b2)(이하 「(b2)」라고 하는 경우가 있음), 테트라히드로푸릴기와 에틸렌성 불포화 결합을 갖는 단량체(b3)(이하 「(b3)」이라고 하는 경우가 있음) 등을 들 수 있다. (b1) having an oxiranyl group and an ethylenically unsaturated bond (hereinafter sometimes referred to as "(b1)"), a monomer (b2) having an oxetanyl group and an ethylenically unsaturated bond (hereinafter referred to as " b2) "), a monomer (b3) having a tetrahydrofuryl group and an ethylenically unsaturated bond (hereinafter occasionally referred to as" (b3) "), and the like.
(b1)은 예컨대 직쇄형 또는 분지쇄형의 불포화 지방족 탄화수소가 에폭시화된 구조를 갖는 단량체(b1-1)(이하 「(b1-1)」이라고 하는 경우가 있음), 불포화 지환식 탄화수소가 에폭시화된 구조를 갖는 단량체(b1-2)(이하 「(b1-2)」라고 하는 경우가 있음)를 들 수 있다. (b1-1) having a structure in which a linear or branched unsaturated aliphatic hydrocarbon is epoxidized (hereinafter sometimes referred to as "(b1-1)"), an unsaturated alicyclic hydrocarbon is epoxidized (Hereinafter sometimes referred to as " (b1-2) ").
(b1-1)로서는 글리시딜(메트)아크릴레이트, β-메틸글리시딜(메트)아크릴레이트, β-에틸글리시딜(메트)아크릴레이트, 글리시딜비닐에테르, o-비닐벤질글리시딜에테르, m-비닐벤질글리시딜에테르, p-비닐벤질글리시딜에테르, α-메틸-o-비닐벤질글리시딜에테르, α-메틸-m-비닐벤질글리시딜에테르, α-메틸-p-비닐벤질글리시딜에테르, 2,3-비스(글리시딜옥시메틸)스티렌, 2,4-비스(글리시딜옥시메틸)스티렌, 2,5-비스(글리시딜옥시메틸)스티렌, 2,6-비스(글리시딜옥시메틸)스티렌, 2,3,4-트리스(글리시딜옥시메틸)스티렌, 2,3,5-트리스(글리시딜옥시메틸)스티렌, 2,3,6-트리스(글리시딜옥시메틸)스티렌, 3,4,5-트리스(글리시딜옥시메틸)스티렌, 2,4,6-트리스(글리시딜옥시메틸)스티렌 등을 들 수 있다. (meth) acrylate,? -methyl glycidyl (meth) acrylate,? -ethylglycidyl (meth) acrylate, glycidyl vinyl ether, o-vinylbenzyl glycidyl Vinylbenzyl glycidyl ether,? -Methyl-o-vinylbenzyl glycidyl ether,? -Methyl-o-vinylbenzyl glycidyl ether,? -Methyl- Methyl-p-vinylbenzyl glycidyl ether, 2,3-bis (glycidyloxymethyl) styrene, 2,4-bis (glycidyloxymethyl) styrene, 2,5- ) Styrene, 2,6-bis (glycidyloxymethyl) styrene, 2,3,4-tris (glycidyloxymethyl) styrene, 2,3,5- , 3,6-tris (glycidyloxymethyl) styrene, 3,4,5-tris (glycidyloxymethyl) styrene, 2,4,6-tris (glycidyloxymethyl) have.
(b1-2)로서는 비닐시클로헥센모노옥사이드, 1,2-에폭시-4-비닐시클로헥산(예컨대, 셀록사이드 2000; (주)다이셀 제조), 3,4-에폭시시클로헥실메틸(메트)아크릴레이트(예컨대, 사이클로마 A400; (주)다이셀 제조), 3,4-에폭시시클로헥실메틸(메트)아크릴레이트(예컨대, 사이클로마 M100; (주)다이셀 제조), 식 (I)로 표시되는 화합물 및 식 (II)로 표시되는 화합물 등을 들 수 있다. (b1-2) include vinylcyclohexene monoxide, 1,2-epoxy-4-vinylcyclohexane (such as Celloxide 2000 manufactured by Daicel), 3,4-epoxycyclohexylmethyl (meth) Cyclohexylmethyl (meth) acrylate (for example, Cyclorom M100, manufactured by Daicel), represented by the formula (I) And a compound represented by the formula (II).
[식 (I) 및 식 (II)에서, R51 및 R52는 수소 원자 또는 탄소수 1∼4의 알킬기를 나타내고, 이 알킬기에 포함되는 수소 원자는 히드록시기로 치환되어 있더라도 좋다. [In the formulas (I) and (II), R 51 and R 52 represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and the hydrogen atom contained in the alkyl group may be substituted with a hydroxy group.
X51 및 X52는 단결합, -R53-, *-R53-O-, *-R53-S- 또는 *-R53-NH-을 나타낸다. X 51 and X 52 represent a single bond, -R 53 -, * -R 53 -O-, * -R 53 -S- or * -R 53 -NH-.
R53은 탄소수 1∼6의 알칸디일기를 나타낸다. And R 53 represents an alkanediyl group having 1 to 6 carbon atoms.
*는 O와의 결합수를 나타낸다.]* Represents the number of bonds with O.]
탄소수 1∼4의 알킬기로서는 메틸기, 에틸기, n-프로필기, 이소프로필기, n-부틸기, sec-부틸기, tert-부틸기 등을 들 수 있다.Examples of the alkyl group having 1 to 4 carbon atoms include methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl and tert-butyl.
수소 원자가 히드록시로 치환된 알킬기로서는 히드록시메틸기, 1-히드록시에틸기, 2-히드록시에틸기, 1-히드록시프로필기, 2-히드록시프로필기, 3-히드록시프로필기, 1-히드록시-1-메틸에틸기, 2-히드록시-1-메틸에틸기, 1-히드록시부틸기, 2-히드록시부틸기, 3-히드록시부틸기, 4-히드록시부틸기 등을 들 수 있다.Examples of the alkyl group in which the hydrogen atom is substituted with hydroxy include a hydroxymethyl group, a 1-hydroxyethyl group, a 2-hydroxyethyl group, a 1-hydroxypropyl group, a 2-hydroxypropyl group, a 3-hydroxypropyl group, 1-methylethyl group, 2-hydroxy-1-methylethyl group, 1-hydroxybutyl group, 2-hydroxybutyl group, 3-hydroxybutyl group and 4-hydroxybutyl group.
R51 및 R52로서는 바람직하게는 수소 원자, 메틸기, 히드록시메틸기, 1-히드록시에틸기, 2-히드록시에틸기를 들 수 있고, 보다 바람직하게는 수소 원자, 메틸기를 들 수 있다. R 51 and R 52 are preferably a hydrogen atom, a methyl group, a hydroxymethyl group, a 1-hydroxyethyl group or a 2-hydroxyethyl group, more preferably a hydrogen atom or a methyl group.
알칸디일기로서는 메틸렌기, 에틸렌기, 프로판-1,2-디일기, 프로판-1,3-디일기, 부탄-1,4-디일기, 펜탄-1,5-디일기, 헥산-1,6-디일기 등을 들 수 있다. Examples of the alkanediyl group include a methylene group, an ethylene group, a propane-1,2-diyl group, a propane-1,3-diyl group, a butane- A 6-diyl group and the like.
X51 및 X52로서는 바람직하게는 단결합, 메틸렌기, 에틸렌기, *-CH2-O- 및 *-CH2CH2-O-을 들 수 있고, 보다 바람직하게는 단결합, *-CH2CH2-O-을 들 수 있다(*는 O와의 결합수를 나타냄). X 51 and X 52 are preferably a single bond, a methylene group, an ethylene group, * -CH 2 -O- and * -CH 2 CH 2 -O-, more preferably a single bond, * -CH 2 CH 2 -O- (* represents the number of bonds with O).
식 (I)로 표시되는 화합물로서는 식 (I-1)∼식 (I-15) 중 어느 것으로 나타내는 화합물 등을 들 수 있다. 바람직하게는 식 (I-1), 식 (I-3), 식 (I-5), 식 (I-7), 식 (I-9) 또는 식 (I-11)∼식 (I-15)로 표시되는 화합물을 들 수 있다. 보다 바람직하게는 식 (I-1), 식 (I-7), 식 (I-9) 또는 식 (I-15)로 표시되는 화합물을 들 수 있다. Examples of the compound represented by the formula (I) include compounds represented by any one of the formulas (I-1) to (I-15). (I-1), (I-3), (I-5), ). ≪ / RTI > More preferably, the compound represented by formula (I-1), formula (I-7), formula (I-9) or formula (I-15) can be mentioned.
식 (II)로 표시되는 화합물로서는 식 (II-1)∼식 (II-15) 중 어느 것으로 표시되는 화합물 등을 들 수 있다. 바람직하게는 식 (II-1), 식 (II-3), 식 (II-5), 식 (II-7), 식 (II-9) 또는 식 (II-11)∼식 (II-15)로 표시되는 화합물을 들 수 있다. 보다 바람직하게는 식 (II-1), 식 (II-7), 식 (II-9) 또는 식 (II-15)로 표시되는 화합물을 들 수 있다. Examples of the compound represented by the formula (II) include compounds represented by any one of the formulas (II-1) to (II-15). (II-1), II-3, II-5, II-7, II-9 or II- ). ≪ / RTI > The compound represented by formula (II-1), formula (II-7), formula (II-9) or formula (II-15) is more preferred.
식 (I)로 표시되는 화합물 및 식 (II)로 표시되는 화합물은 각각 단독으로 이용할 수 있다. 또한, 이들은 임의의 비율로 혼합할 수 있다. 혼합하는 경우, 그 혼합 비율은 몰비로 바람직하게는 식 (I):식 (II)로 5:95∼95:5, 보다 바람직하게는 10:90∼90:10, 더욱 바람직하게는 20:80∼80:20이다. The compound represented by formula (I) and the compound represented by formula (II) may be used alone. They may be mixed at an arbitrary ratio. In the case of mixing, the mixing ratio thereof is preferably from 5:95 to 95: 5, more preferably from 10:90 to 90:10, and even more preferably from 20:80 to 90:10 in formula (I) ~ 80: 20.
(b2)로서는 옥세타닐기와 (메트)아크릴로일옥시기를 갖는 단량체가 보다 바람직하다. (b2)로서는 3-메틸-3-메타크릴로일옥시메틸옥세탄, 3-메틸-3-아크릴로일옥시메틸옥세탄, 3-에틸-3-메타크릴로일옥시메틸옥세탄, 3-에틸-3-아크릴로일옥시메틸옥세탄, 3-메틸-3-메타크릴로일옥시에틸옥세탄, 3-메틸-3-아크릴로일옥시에틸옥세탄, 3-에틸-3-메타크릴로일옥시에틸옥세탄, 3-에틸-3-아크릴로일옥시에틸옥세탄 등을 들 수 있다. (b2) is more preferably a monomer having an oxetanyl group and a (meth) acryloyloxy group. methyl-3-acryloyloxymethyloxetane, 3-ethyl-3-methacryloyloxymethyloxetane, 3- (3-methacryloyloxymethyloxetane) Ethyl-3-acryloyloxymethyloxetane, 3-methyl-3-methacryloyloxyethyl oxetane, 3-methyl-3-acryloyloxyethyl oxetane, 3- 3-ethyl-3-acryloyloxyethyl oxetane, and the like.
(b3)으로서는 테트라히드로푸릴기와 (메트)아크릴로일옥시기를 갖는 단량체가 보다 바람직하다. (b3)으로서는 구체적으로는 테트라히드로푸르푸릴아크릴레이트(예컨대, 비스코트 V#150, 오사카유키가가쿠고교(주) 제조), 테트라히드로푸르푸릴메타크릴레이트를 들 수 있다.As the monomer (b3), a monomer having a tetrahydrofuryl group and a (meth) acryloyloxy group is more preferable. Specific examples of the compound (b3) include tetrahydrofurfuryl acrylate (e.g., Viscot V # 150, Osaka Yuki Kagaku Kogyo Co., Ltd.) and tetrahydrofurfuryl methacrylate.
(b)로서는 얻어지는 컬러 필터의 내열성, 내약품성 등의 신뢰성을 보다 높일 수 있다는 점에서 (b1)인 것이 바람직하다. 또한, 착색 경화성 수지 조성물의 보존 안전성이 우수하다고 하는 점에서 (b1-2)가 보다 바람직하다. (b) is preferably (b1) in that reliability of heat resistance, chemical resistance, etc. of the obtained color filter can be further improved. Further, (b1-2) is more preferable in that the storage stability of the colored curable resin composition is excellent.
(c)로서는 예컨대 메틸(메트)아크릴레이트, 에틸(메트)아크릴레이트, n-부틸(메트)아크릴레이트, sec-부틸(메트)크릴레이트, tert-부틸(메트)아크릴레이트, 2-에틸헥실(메트)아크릴레이트, 도데실(메트)아크릴레이트, 라우릴(메트)아크릴레이트, 스테아릴(메트)아크릴레이트, 시클로펜틸(메트)아크릴레이트, 시클로헥실(메트)아크릴레이트, 2-메틸시클로헥실(메트)아크릴레이트, 트리시클로[5.2.1.02.6]데칸-8-일(메트)아크릴레이트(이 기술분야에서는 관용명으로서 「디시클로펜타닐(메트)아크릴레이트」라고 일컬어지고 있다. 또한, 「트리시클로데실(메트)아크릴레이트」라고 하는 경우가 있다.), 트리시클로[5.2.1.02.6]데센-8-일(메트)아크릴레이트(이 기술분야에서는 관용명으로서 「디시클로펜테닐(메트)아크릴레이트」라고 일컬어지고 있음), 디시클로펜타닐옥시에틸(메트)아크릴레이트, 이소보르닐(메트)아크릴레이트, 아다만틸(메트)아크릴레이트, 알릴(메트)아크릴레이트, 프로파르길(메트)아크릴레이트, 페닐(메트)아크릴레이트, 나프틸(메트)아크릴레이트, 벤질(메트)아크릴레이트 등의 (메트)아크릴산에스테르류; (meth) acrylate, tert-butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, (Meth) acrylate, cyclohexyl (meth) acrylate, dodecyl (meth) acrylate, lauryl (meth) acrylate, stearyl (meth) acrylate, cyclopentyl (Meth) acrylate, tricyclo [5.2.1.0 2,6 ] decan-8-yl (meth) acrylate (also referred to in the art as "dicyclopentanyl (meth) acrylate" Tricyclodecyl (meth) acrylate "), tricyclo [5.2.1.0 2,6 ] decen-8-yl (meth) acrylate (dicyclopentenyl (meth) acrylate Acrylate "), dicyclopentane (Meth) acrylate, isobornyl (meth) acrylate, adamantyl (meth) acrylate, allyl (meth) acrylate, propargyl (Meth) acrylates such as naphthyl (meth) acrylate and benzyl (meth) acrylate;
2-히드록시에틸(메트)아크릴레이트, 2-히드록시프로필(메트)아크릴레이트 등의 히드록시기 함유 (메트)아크릴산에스테르류; (Meth) acrylic acid esters having a hydroxyl group such as 2-hydroxyethyl (meth) acrylate and 2-hydroxypropyl (meth) acrylate;
말레산디에틸, 푸마르산디에틸, 이타콘산디에틸 등의 디카르복실산디에스테르; Dicarboxylic acid diesters such as diethyl maleate, diethyl fumarate, and diethyl itaconate;
비시클로[2.2.1]헵트-2-엔, 5-메틸비시클로[2.2.1]헵트-2-엔, 5-에틸비시클로[2.2.1]헵트-2-엔, 5-히드록시비시클로[2.2.1]헵트-2-엔, 5-히드록시메틸비시클로[2.2.1]헵트-2-엔, 5-(2'-히드록시에틸)비시클로[2.2.1]헵트-2-엔, 5-메톡시비시클로[2.2.1]헵트-2-엔, 5-에톡시비시클로[2.2.1]헵트-2-엔, 5,6-디히드록시비시클로[2.2.1]헵트-2-엔, 5,6-디(히드록시메틸)비시클로[2.2.1]헵트-2-엔, 5,6-디(2'-히드록시에틸)비시클로[2.2.1]헵트-2-엔, 5,6-디메톡시비시클로[2.2.1]헵트-2-엔, 5,6-디에톡시비시클로[2.2.1]헵트-2-엔, 5-히드록시-5-메틸비시클로[2.2.1]헵트-2-엔, 5-히드록시-5-에틸비시클로[2.2.1]헵트-2-엔, 5-히드록시메틸-5-메틸비시클로[2.2.1]헵트-2-엔, 5-tert-부톡시카르보닐비시클로[2.2.1]헵트-2-엔, 5-시클로헥실옥시카르보닐비시클로[2.2.1]헵트-2-엔, 5-페녹시카르보닐비시클로[2.2.1]헵트-2-엔, 5,6-비스(tert-부톡시카르보닐)비시클로[2.2.1]헵트-2-엔, 5,6-비스(시클로헥실옥시카르보닐)비시클로[2.2.1]헵트-2-엔 등의 비시클로 불포화 화합물류; 2-ene, 5-methylbicyclo [2.2.1] hept-2-ene, 5-ethylbicyclo [2.2.1] hept- 2.2.1] hept-2-ene, 5- (2'-hydroxyethyl) bicyclo [2.2.1] hept- 2.2.1] hept-2-ene, 5-methoxybicyclo [2.2.1] (2'-hydroxyethyl) bicyclo [2.2.1] hept-2-ene, 5,6-di (hydroxymethyl) bicyclo [2.2.1] hept- Ene, 5,6-dimethoxybicyclo [2.2.1] hept-2-ene, 5,6-diethoxybicyclo [2.2.1] hept- 2.2.1] hept-2-ene, 5-hydroxymethyl-5-methylbicyclo [2.2.1] hept- 2-ene, 5-tert-butoxycarbonylbicyclo [2.2.1] hept-2-ene, 5-cyclohexyloxycarbonylbicyclo [2.2.1] hept- Cyclohexyl [2.2.1] hept-2-ene, 5,6-bis 2,6-bis (cyclohexyloxycarbonyl) bicyclo [2.2.1] hept-2-ene and the like such as bis (tert-butoxycarbonyl) bicyclo [2.2.1] hept- Cyclo-unsaturated compounds;
N-페닐말레이미드, N-시클로헥실말레이미드, N-벤질말레이미드, N-숙신이미딜-3-말레이미드벤조에이트, N-숙신이미딜-4-말레이미드부틸레이트, N-숙신이미딜-6-말레이미드카프로에이트, N-숙신이미딜-3-말레이미드프로피오네이트, N-(9-아크리디닐)말레이미드 등의 디카르보닐이미드 유도체류; N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide, N-succinimidyl-3-maleimide benzoate, N-succinimidyl-4-maleimide butyrate, N- Dicarbonylimide derivatives such as N-succinimidyl-3-maleimidepropionate and N- (9-acridinyl) maleimide;
스티렌, α-메틸스티렌, m-메틸스티렌, p-메틸스티렌, 비닐톨루엔, p-메톡시스티렌, 아크릴로니트릴, 메타크릴로니트릴, 염화비닐, 염화비닐리덴, 아크릴아미드, 메타크릴아미드, 초산비닐, 1,3-부타디엔, 이소프렌, 2,3-디메틸-1,3-부타디엔 등을 들 수 있다.But are not limited to, styrene, -methylstyrene, m-methylstyrene, p-methylstyrene, vinyltoluene, p-methoxystyrene, acrylonitrile, methacrylonitrile, vinyl chloride, vinylidene chloride, acrylamide, methacrylamide, Vinyl, 1,3-butadiene, isoprene, 2,3-dimethyl-1,3-butadiene and the like.
이들 중, 공중합 반응성 및 내열성의 점에서, 스티렌, N-페닐말레이미드, N-시클로헥실말레이미드, N-벤질말레이미드, 비시클로[2.2.1]헵트-2-엔 등이 바람직하다. Of these, styrene, N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide and bicyclo [2.2.1] hept-2-ene are preferable from the viewpoint of copolymerization reactivity and heat resistance.
수지 [K1]에 있어서, 각각에 유래하는 구조 단위의 비율은 수지 [K1]를 구성하는 전체 구조 단위 중, In the resin [K1], the proportion of the structural unit derived from each of the resins [K1]
(a)에 유래하는 구조 단위; 2∼60 몰%(a); 2 to 60 mol%
(b)에 유래하는 구조 단위; 40∼98 몰%인 것이 바람직하고, (b); Is preferably 40 to 98 mol%
(a)에 유래하는 구조 단위; 10∼50 몰%(a); 10 to 50 mol%
(b)에 유래하는 구조 단위; 50∼90 몰%인 것이 보다 바람직하다. (b); And more preferably 50 to 90 mol%.
수지 [K1]의 구조 단위의 비율이 상기한 범위에 있으면, 착색 경화성 수지 조성물의 보존 안정성, 착색 패턴을 형성할 때의 현상성 및 컬러 필터의 내용제성이 우수한 경향이 있다. When the ratio of the structural unit of the resin [K1] is within the above-mentioned range, there is a tendency that storage stability of the colored curable resin composition, developability in forming a colored pattern, and solvent resistance of the color filter are excellent.
수지 [K1]은 예컨대 문헌 「고분자합성의 실험법」(오오츠 타카유키 저, 핫코쇼(주) 화학동인 제1판 제1쇄 1972년 3월 1일 발행)에 기재된 방법 및 이 문헌에 기재된 인용문헌을 참고로 하여 제조할 수 있다. Resin [K1] can be synthesized by, for example, the method described in "Experimental Method of Polymer Synthesis" (published by Otsu Takayuki Co., Ltd., first edition, 1st edition, published on March 1, 1972) . ≪ / RTI >
구체적으로는 예컨대 (a) 및 (b)의 소정량, 중합 개시제 및 용제 등을 반응 용기 속에 넣어 예컨대 질소에 의해 산소를 치환함으로써 탈산소 분위기로 하여, 교반하면서 가열 및 보온하는 방법을 들 수 있다. 한편, 여기서 이용되는 중합 개시제 및 용제 등은 특별히 한정되지 않고, 이 분야에서 통상 사용되고 있는 것을 사용할 수 있다. 예컨대 중합 개시제로서는 아조 화합물(2,2'-아조비스이소부티로니트릴, 2,2'-아조비스(2,4-디메틸발레로니트릴) 등)이나 유기 과산화물(벤조일퍼옥사이드 등)을 들 수 있고, 용제로서는 각 모노머를 용해하는 것이면 되며, 착색 경화성 수지 조성물의 용제(E)로서 후술하는 용제 등을 들 수 있다. Specifically, for example, a predetermined amount of (a) and (b), a polymerization initiator and a solvent are placed in a reaction vessel to replace the oxygen with nitrogen, for example, to form a deoxidized atmosphere, followed by heating and heating with stirring . On the other hand, the polymerization initiator and the solvent to be used herein are not particularly limited, and those generally used in this field can be used. Examples of the polymerization initiator include azo compounds (2,2'-azobisisobutyronitrile, 2,2'-azobis (2,4-dimethylvaleronitrile) and the like) and organic peroxides (benzoyl peroxide and the like) As the solvent, any one that dissolves the respective monomers may be used. As the solvent (E) of the colored curable resin composition, there may be mentioned a solvent described later.
한편, 얻어진 공중합체는 반응 후의 용액을 그대로 사용하더라도 좋고, 농축 혹은 희석한 용액을 사용하더라도 좋고, 재침전 등의 방법으로 교체(분체)로서 취출한 것을 사용하더라도 좋다. 특히, 이 중합할 때에 용제로서 본 발명의 착색 경화성 수지 조성물에 포함되는 용제를 사용함으로써 반응 후의 용액을 그대로 본 발명의 착색 경화성 수지 조성물의 조제에 사용할 수 있으므로 제조 공정을 간략화할 수 있다. On the other hand, the resulting copolymer may be used as it is, or may be a concentrated or diluted solution, or may be used as a replacement (powder) by re-precipitation or the like. In particular, by using a solvent contained in the colored curable resin composition of the present invention as a solvent in the polymerization, the solution after the reaction can be used as it is for preparing the colored curable resin composition of the present invention, thereby simplifying the production process.
수지 [K2]에 있어서, 각각에 유래하는 구조 단위의 비율은 수지 [K2]를 구성하는 전체 구조 단위 중, In the resin [K2], the proportion of the structural units derived from each other is preferably from 1 to 100,
(a)에 유래하는 구조 단위; 2∼45 몰%(a); 2 to 45 mol%
(b)에 유래하는 구조 단위; 2∼95 몰%(b); 2 to 95 mol%
(c)에 유래하는 구조 단위; 1∼65 몰%인 것이 바람직하고, (c); , More preferably 1 to 65 mol%
(a)에 유래하는 구조 단위; 5∼40 몰%(a); 5 to 40 mol%
(b)에 유래하는 구조 단위; 5∼80 몰%(b); 5 to 80 mol%
(c)에 유래하는 구조 단위; 5∼60 몰%인 것이 보다 바람직하다. (c); And more preferably 5 to 60 mol%.
수지 [K2]의 구조 단위의 비율이 상기한 범위에 있으면, 착색 경화성 수지 조성물의 보존 안정성, 패턴을 형성할 때의 현상성 및 얻어지는 패턴의 내용제성, 내열성 및 기계 강도가 우수한 경향이 있다. When the ratio of the structural unit of the resin [K2] is within the above-mentioned range, there is a tendency that the storage stability of the colored curing resin composition, developability in forming the pattern, solvent resistance of the obtained pattern, heat resistance and mechanical strength are excellent.
수지 [K2]는 예컨대 수지 [K1]의 제조 방법으로서 기재한 방법과 같은 식으로 제조할 수 있다. The resin [K2] can be produced, for example, in the same manner as the method described as the method for producing the resin [K1].
수지 [K3]에 있어서, 각각에 유래하는 구조 단위의 비율은 수지 [K3]을 구성하는 전체 구조 단위 중, In the resin [K3], the ratio of the respective structural units derived from each other is preferably selected from the group consisting of the total structural units constituting the resin [K3]
(a)에 유래하는 구조 단위; 2∼60 몰%(a); 2 to 60 mol%
(c)에 유래하는 구조 단위; 40∼98 몰%인 것이 바람직하고, (c); Is preferably 40 to 98 mol%
(a)에 유래하는 구조 단위; 10∼50 몰%(a); 10 to 50 mol%
(c)에 유래하는 구조 단위; 50∼90 몰%인 것이 보다 바람직하다. (c); And more preferably 50 to 90 mol%.
수지 [K3]은 예컨대 수지 [K1]의 제조 방법으로서 기재한 방법과 같은 식으로 제조할 수 있다. The resin [K3] can be produced, for example, in the same manner as the method described as the method for producing the resin [K1].
수지 [K4]는 (a)와 (c)와의 공중합체를 얻어, (b)가 갖는 탄소수 2∼4의 환상 에테르를 (a)가 갖는 카르복실산 및/또는 카르복실산 무수물에 부가시킴으로써 제조할 수 있다. The resin [K4] is obtained by obtaining a copolymer of (a) and (c) and adding a cyclic ether having 2 to 4 carbon atoms in (b) to a carboxylic acid and / or carboxylic acid anhydride having (a) can do.
우선 (a)와 (c)와의 공중합체를 수지 [K1]의 제조 방법으로서 기재한 방법과 같은 식으로 제조한다. 이 경우, 각각에 유래하는 구조 단위의 비율은 수지 [K3]에서 예로 든 것과 같은 비율인 것이 바람직하다. First, a copolymer of (a) and (c) is prepared in the same manner as the method described as the method for producing the resin [K1]. In this case, the proportion of the structural units derived from each of them is preferably the same as that in the resin [K3].
이어서, 상기 공중합체 중의 (a)에 유래하는 카르복실산 및/또는 카르복실산 무수물의 일부에 (b)가 갖는 탄소수 2∼4의 환상 에테르를 반응시킨다. Subsequently, a cyclic ether having 2 to 4 carbon atoms contained in (b) is reacted with a part of the carboxylic acid and / or carboxylic acid anhydride derived from (a) in the copolymer.
(a)와 (c)와의 공중합체의 제조에 이어서 플라스크 내 분위기를 질소에서 공기로 치환하여, (b), 카르복실산 또는 카르복실산 무수물과 환상 에테르와의 반응 촉매(예컨대 트리스(디메틸아미노메틸)페놀 등) 및 중합 금지제(예컨대 히드로퀴논 등) 등을 플라스크 안에 넣어 예컨대 60∼130℃에서 1∼10시간 반응함으로써 수지 [K4]를 제조할 수 있다. Subsequent to the preparation of the copolymer of (a) and (c), the atmosphere in the flask is replaced with air in nitrogen, and (b) a reaction catalyst of a carboxylic acid or carboxylic acid anhydride with a cyclic ether Methyl) phenol) and a polymerization inhibitor (e.g., hydroquinone) are placed in a flask and reacted at 60 to 130 DEG C for 1 to 10 hours, for example, to prepare the resin [K4].
(b)의 사용량은 (a) 100 몰에 대하여 5∼80 몰이 바람직하고, 보다 바람직하게는 10∼75 몰이다. 이 범위로 함으로써, 착색 경화성 수지 조성물의 보존 안정성, 패턴을 형성할 때의 현상성 및 얻어지는 패턴의 내용제성, 내열성, 기계 강도 및 감도의 밸런스가 양호하게 되는 경향이 있다. 환상 에테르의 반응성이 높고, 미반응의 (b)가 잔존하기 어려우므로, 수지 [K4]에 이용하는 (b)로서는 (b1)이 바람직하고, (b1-1)이 더욱 바람직하다. (b) is preferably 5 to 80 moles, more preferably 10 to 75 moles, per 100 moles of (a). Within this range, there is a tendency that the balance between the storage stability of the colored curable resin composition, developability in forming the pattern, solvent resistance of the obtained pattern, heat resistance, mechanical strength and sensitivity becomes good. (B1) is more preferable, and (b1-1) is more preferable for the resin (K4) because the reactivity of the cyclic ether is high and unreacted (b)
상기 반응 촉매의 사용량은 (a), (b) 및 (c)의 합계량 100 질량부에 대하여 0.001∼5 질량부가 바람직하다. 상기 중합 금지제의 사용량은 (a), (b) 및 (c)의 합계량 100 질량부에 대하여 0.001∼5 질량부가 바람직하다. The amount of the reaction catalyst to be used is preferably 0.001 to 5 parts by mass per 100 parts by mass of the total amount of (a), (b) and (c). The amount of the polymerization inhibitor to be used is preferably 0.001 to 5 parts by mass based on 100 parts by mass of the total amount of (a), (b) and (c).
투입 방법, 반응 온도 및 시간 등의 반응 조건은 제조 설비나 중합에 의한 발열량 등을 고려하여 적절하게 조정할 수 있다. 한편, 중합 조건과 마찬가지로, 제조 설비나 중합에 의한 발열량 등을 고려하여 투입 방법이나 반응 온도를 적절하게 조정할 수 있다. The reaction conditions such as the charging method, the reaction temperature and the time can be appropriately adjusted in consideration of the production facility or the amount of heat generated by polymerization. On the other hand, as in the case of the polymerization conditions, the charging method and the reaction temperature can be appropriately adjusted in consideration of the production facility or the amount of heat generated by polymerization.
수지 [K5]는 제1 단계로서 상술한 수지 [K1]의 제조 방법과 같은 식으로 하여 (b)와 (c)와의 공중합체를 얻는다. 상기와 마찬가지로, 얻어진 공중합체는 반응 후의 용액을 그대로 사용하더라도 좋고, 농축 혹은 희석한 용액을 사용하더라도 좋고, 재침전 등의 방법으로 고체(분체)로서 취출한 것을 사용하더라도 좋다. Resin [K5] is a first step, and a copolymer of (b) and (c) is obtained in the same manner as the above-mentioned method for producing Resin [K1]. Similarly to the above, the solution after the reaction may be used as it is, or a concentrated or diluted solution may be used, and the copolymer taken out as a solid (powder) by re-precipitation or the like may be used.
(b) 및 (c)에 유래하는 구조 단위의 비율은 상기한 공중합체를 구성하는 전체 구조 단위의 합계 몰수에 대하여 이하의 범위에 있는 것이 바람직하다. the proportion of the structural units derived from (b) and (c) is preferably within the following range with respect to the total number of moles of the total structural units constituting the copolymer.
(b)에 유래하는 구조 단위; 5∼95 몰%(b); 5 to 95 mol%
(c)에 유래하는 구조 단위; 5∼95 몰%인 것이 바람직하고, (c); , More preferably 5 to 95 mol%
(b)에 유래하는 구조 단위; 10∼90 몰%(b); 10 to 90 mol%
(c)에 유래하는 구조 단위; 10∼90 몰%인 것이 보다 바람직하다. (c); And more preferably 10 to 90 mol%.
또한, 수지 [K4]의 제조 방법과 같은 조건으로 (b)와 (c)와의 공중합체가 갖는 (b)에 유래하는 환상 에테르에 (a)가 갖는 카르복실산 또는 카르복실산 무수물을 반응시킴으로써 수지 [K5]를 얻을 수 있다. Further, by reacting the carboxylic acid or carboxylic acid anhydride of (a) with a cyclic ether derived from (b) in the copolymer of (b) and (c) under the same conditions as in the production of resin [K4] Resin [K5] can be obtained.
상기한 공중합체에 반응시키는 (a)의 사용량은 (b) 100 몰에 대하여 5∼80 몰이 바람직하다. 환상 에테르의 반응성이 높고, 미반응의 (b)가 잔존하기 어려우므로, 수지 [K5]에 이용하는 (b)로서는 (b1)이 바람직하고, (b1-1)이 더욱 바람직하다. The amount of (a) to be reacted with the copolymer is preferably 5 to 80 moles per 100 moles of (b). (B1) is more preferable, and (b1-1) is more preferable for the resin (K5) because the reactivity of the cyclic ether is high and the unreacted (b)
수지 [K6]은 수지 [K5]에 카르복실산 무수물을 더 반응시킨 수지이다. Resin [K6] is a resin obtained by further reacting a resin [K5] with a carboxylic acid anhydride.
환상 에테르와 카르복실산 또는 카르복실산 무수물과의 반응에 의해 발생하는 히드록시기에 카르복실산 무수물을 반응시킨다. A carboxylic acid anhydride is reacted with a hydroxy group generated by the reaction of a cyclic ether with a carboxylic acid or a carboxylic acid anhydride.
카르복실산 무수물로서는, 무수 말레산, 시트라콘산 무수물, 이타콘산 무수물, 3-비닐프탈산 무수물, 4-비닐프탈산 무수물, 3,4,5,6-테트라히드로프탈산 무수물, 1,2,3,6-테트라히드로프탈산 무수물, 디메틸테트라히드로프탈산 무수물, 5,6-디카르복시비시클로[2.2.1]헵트-2-엔 무수물(하이믹산 무수물) 등을 들 수 있다. 카르복실산 무수물의 사용량은 (a)의 사용량 1 몰에 대하여 0.5∼1 몰이 바람직하다. Examples of the carboxylic anhydrides include maleic anhydride, citraconic anhydride, itaconic anhydride, 3-vinylphthalic anhydride, 4-vinylphthalic anhydride, 3,4,5,6-tetrahydrophthalic anhydride, Tetrahydrophthalic anhydride, dimethyltetrahydrophthalic anhydride, and 5,6-dicarboxybicyclo [2.2.1] hept-2-ene anhydride (hydroamic anhydride). The amount of the carboxylic acid anhydride to be used is preferably 0.5 to 1 mole based on 1 mole of the amount of (a).
수지(B)로서는 구체적으로 3,4-에폭시시클로헥실메틸(메트)아크릴레이트/(메트)아크릴산 공중합체, 3,4-에폭시트리시클로[5.2.1.02.6]데실아크릴레이트/(메트)아크릴산 공중합체 등의 수지 [K1]; 글리시딜(메트)아크릴레이트/벤질(메트)아크릴레이트/(메트)아크릴산 공중합체, 글리시딜(메트)아크릴레이트/스티렌/(메트)아크릴산 공중합체, 3,4-에폭시트리시클로[5.2.1.02.6]데실아크릴레이트/(메트)아크릴산/N-시클로헥실말레이미드 공중합체, 3-메틸-3-(메트)아크릴로일옥시메틸옥세탄/(메트)아크릴산/스티렌 공중합체 등의 수지 [K2]; 벤질(메트)아크릴레이트/(메트)아크릴산 공중합체, 스티렌/(메트)아크릴산 공중합체 등의 수지 [K3]; 벤질(메트)아크릴레이트/(메트)아크릴산 공중합체에 글리시딜(메트)아크릴레이트를 부가시킨 수지, 트리시클로데실(메트)아크릴레이트/스티렌/(메트)아크릴산 공중합체에 글리시딜(메트)아크릴레이트를 부가시킨 수지, 트리시클로데실(메트)아크릴레이트/벤질(메트)아크릴레이트/(메트)아크릴산 공중합체에 글리시딜(메트)아크릴레이트를 부가시킨 수지 등의 수지 [K4]; 트리시클로데실(메트)아크릴레이트/글리시딜(메트)아크릴레이트의 공중합체에 (메트)아크릴산을 반응시킨 수지, 트리시클로데실(메트)아크릴레이트/스티렌/글리시딜(메트)아크릴레이트의 공중합체에 (메트)아크릴산을 반응시킨 수지 등의 수지 [K5]; 트리시클로데실(메트)아크릴레이트/글리시딜(메트)아크릴레이트의 공중합체에 (메트)아크릴산을 반응시킨 수지에 테트라히드로프탈산 무수물을 더 반응시킨 수지 등의 수지 [K6] 등을 들 수 있다. Specific examples of the resin (B) include 3,4-epoxycyclohexylmethyl (meth) acrylate / (meth) acrylic acid copolymer, 3,4-epoxytricyclo [5.2.1.0 2.6 ] decyl acrylate / (meth) Resin [K1] such as coalescence; (Meth) acrylate / benzyl (meth) acrylate / (meth) acrylic acid copolymer, glycidyl (meth) acrylate / styrene / (meth) acrylic acid copolymer, 3,4-epoxytricyclo [5.2 .1.0 2.6] decyl acrylate / (meth) resins such as acrylic acid / N- cyclohexyl maleimide copolymer, 3-methyl-3- (meth) acryloyloxyethyl-methyl oxetane / (meth) acrylic acid / styrene copolymer [K2]; Resins [K3] such as benzyl (meth) acrylate / (meth) acrylic acid copolymer and styrene / (meth) acrylic acid copolymer; A resin obtained by adding glycidyl (meth) acrylate to a benzyl (meth) acrylate / (meth) acrylic acid copolymer and a resin obtained by adding glycidyl (meth) acrylate to a tricyclodecyl (meth) acrylate / styrene / (meth) ) Resin, a resin obtained by adding glycidyl (meth) acrylate to a tricyclodecyl (meth) acrylate / benzyl (meth) acrylate / (meth) acrylic acid copolymer; A resin obtained by reacting a copolymer of tricyclodecyl (meth) acrylate / glycidyl (meth) acrylate with (meth) acrylic acid, a resin obtained by reacting tricyclodecyl (meth) acrylate / styrene / glycidyl (meth) A resin [K5] such as a resin obtained by reacting a (meth) acrylic acid with a copolymer; A resin such as a resin obtained by further reacting a resin obtained by reacting (meth) acrylic acid with a copolymer of tricyclodecyl (meth) acrylate / glycidyl (meth) acrylate and tetrahydrophthalic anhydride, and the like .
그 중에서도 수지(B)로서는 수지 [K1], 수지 [K2] 및 수지 [K4]가 바람직하다.Among them, as the resin (B), resin [K1], resin [K2] and resin [K4] are preferable.
수지(B)의 폴리스티렌 환산의 중량 평균 분자량은 바람직하게는 3,000∼100,000이며, 보다 바람직하게는 5,000∼50,000이고, 더욱 바람직하게는 5,000∼30,000이다. 분자량이 상기한 범위 내에 있으면, 도막 경도가 향상되어, 잔막율도 높고, 미노광부의 현상액에 대한 용해성이 양호하여, 해상도가 향상되는 경향이 있다. The weight average molecular weight of the resin (B) in terms of polystyrene is preferably 3,000 to 100,000, more preferably 5,000 to 50,000, and still more preferably 5,000 to 30,000. When the molecular weight is within the above range, the hardness of the coating film is improved, the residual film ratio is high, the solubility of the unexposed portion in the developer is good, and the resolution tends to be improved.
수지(B)의 분자량 분포[중량 평균 분자량(Mw)/수평균 분자량(Mn)]은 바람직하게는 1.1∼6이며, 보다 바람직하게는 1.2∼4이다. The molecular weight distribution (weight average molecular weight (Mw) / number average molecular weight (Mn)) of the resin (B) is preferably 1.1 to 6, and more preferably 1.2 to 4.
수지(B)의 산가는 바람직하게는 50∼170 mg-KOH/g이며, 보다 바람직하게는 60∼150 mg-KOH/g, 더욱 바람직하게는 70∼135 mg-KOH/g이다. 여기서 산가는 수지(B) 1 g을 중화하는 데에 필요한 수산화칼륨의 양(mg)으로서 측정되는 값이며, 예컨대 수산화칼륨 수용액을 이용하여 적정함으로써 구할 수 있다. The acid value of the resin (B) is preferably 50 to 170 mg-KOH / g, more preferably 60 to 150 mg-KOH / g, and still more preferably 70 to 135 mg-KOH / g. The acid value is a value measured as the amount (mg) of potassium hydroxide necessary for neutralizing 1 g of the resin (B), and can be determined by titration using, for example, an aqueous potassium hydroxide solution.
수지(B)의 함유량은 고형분의 총량에 대하여 바람직하게는 7∼65 질량%이며, 보다 바람직하게는 13∼60 질량%이고, 더욱 바람직하게는 17∼55 질량%이다. 수지(B)의 함유량이 상기한 범위 내에 있으면, 용이하게 착색 패턴을 형성할 수 있고, 또한 착색 패턴의 해상도 및 잔막율이 향상되는 경향이 있다. The content of the resin (B) is preferably from 7 to 65% by mass, more preferably from 13 to 60% by mass, and still more preferably from 17 to 55% by mass, based on the total solid content. When the content of the resin (B) is within the above range, a colored pattern can be easily formed, and the resolution and residual film ratio of the colored pattern tends to be improved.
<중합성 화합물(C)> ≪ Polymerizable compound (C) >
중합성 화합물(C)은 열 혹은 중합 개시제(D)로부터 발생하는 활성 라디칼 및/또는 산에 의해서 중합할 수 있는 화합물이며, 예컨대 중합성의 에틸렌성 불포화 결합을 갖는 화합물 등을 들 수 있고, 바람직하게는 (메트)아크릴산에스테르 화합물이다. The polymerizable compound (C) is a compound capable of being polymerized by an active radical and / or an acid generated from heat or the polymerization initiator (D), for example, a compound having a polymerizable ethylenic unsaturated bond, Is a (meth) acrylic acid ester compound.
그 중에서도 중합성 화합물(C)은 에틸렌성 불포화 결합을 3개 이상 갖는 중합성 화합물인 것이 바람직하다. 이러한 중합성 화합물로서는 예컨대 트리메틸올프로판트리(메트)아크릴레이트, 펜타에리스리톨트리(메트)아크릴레이트, 펜타에리스리톨테트라(메트)아크릴레이트, 디펜타에리스리톨펜타(메트)아크릴레이트, 디펜타에리스리톨헥사(메트)아크릴레이트, 트리펜타에리스리톨옥타(메트)아크릴레이트, 트리펜타에리스리톨헵타(메트)아크릴레이트, 테트라펜타에리스리톨데카(메트)아크릴레이트, 테트라펜타에리스리톨노나(메트)아크릴레이트, 트리스(2-(메트)아크릴로일옥시에틸)이소시아누레이트, 에틸렌글리콜 변성 펜타에리스리톨테트라(메트)아크릴레이트, 에틸렌글리콜 변성 디펜타에리스리톨헥사(메트)아크릴레이트, 프로필렌글리콜 변성 펜타에리스리톨테트라(메트)아크릴레이트, 프로필렌글리콜 변성 디펜타에리스리톨헥사(메트)아크릴레이트, 카프로락톤 변성 펜타에리스리톨테트라(메트)아크릴레이트, 카프로락톤 변성 디펜타에리스리톨헥사(메트)아크릴레이트 등을 들 수 있다. Among them, the polymerizable compound (C) is preferably a polymerizable compound having three or more ethylenic unsaturated bonds. Examples of such polymerizable compounds include trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa Acrylate, tetrapentaerythritol hexa (meth) acrylate, tripentaerythritol hexa (meth) acrylate, tripentaerythritol hexa (meth) acrylate, (Meth) acrylate, ethylene glycol modified pentaerythritol tetra (meth) acrylate, ethylene glycol modified dipentaerythritol hexa (meth) acrylate, propylene glycol modified pentaerythritol tetra Glycol-modified dipentaerythritol hexa (meth) acrylate , Caprolactone-modified pentaerythritol tetra (meth) acrylate, and caprolactone-modified dipentaerythritol hexa (meth) acrylate.
그 중에서도, 디펜타에리스리톨펜타(메트)아크릴레이트 및 디펜타에리스리톨헥사(메트)아크릴레이트가 바람직하다. Among them, dipentaerythritol penta (meth) acrylate and dipentaerythritol hexa (meth) acrylate are preferable.
중합성 화합물(C)의 중량 평균 분자량은 바람직하게는 150 이상 2,900 이하, 보다 바람직하게는 250∼1,500 이하이다. The weight average molecular weight of the polymerizable compound (C) is preferably 150 or more and 2,900 or less, and more preferably 250 to 1,500 or less.
중합성 화합물(C)의 함유량은 고형분의 총량에 대하여 7∼65 질량%인 것이 바람직하고, 보다 바람직하게는 13∼60 질량%이며, 더욱 바람직하게는 17∼55 질량%이다. 중합성 화합물(C)의 함유량이 상기한 범위 내에 있으면, 패턴 형성시의 잔막율 및 패턴의 내약품성이 향상되는 경향이 있다. The content of the polymerizable compound (C) is preferably from 7 to 65% by mass, more preferably from 13 to 60% by mass, and still more preferably from 17 to 55% by mass, based on the total amount of solids. When the content of the polymerizable compound (C) is within the above range, the residual film ratio at the time of pattern formation and the chemical resistance of the pattern tend to be improved.
<중합 개시제(D)> ≪ Polymerization initiator (D) >
중합 개시제(D)는 빛이나 열의 작용에 의해 활성 라디칼, 산 등을 발생하며, 중합을 개시할 수 있는 화합물이라면 특별히 한정되는 일없이 공지된 중합 개시제를 이용할 수 있다. The polymerization initiator (D) generates active radicals, acids, etc. by the action of light or heat, and any known polymerization initiator can be used as long as it is a compound capable of initiating polymerization.
중합 개시제(D)로서는 알킬페논 화합물, 트리아진 화합물, 아실포스핀옥사이드 화합물, O-아실옥심 화합물 및 비이미다졸 화합물로 이루어지는 군에서 선택되는 1종 이상을 포함하는 중합 개시제가 바람직하고, 0-아실옥심 화합물을 포함하는 중합 개시제가 보다 바람직하다. As the polymerization initiator (D), a polymerization initiator containing at least one member selected from the group consisting of alkylphenone compounds, triazine compounds, acylphosphine oxide compounds, O-acyloxime compounds and imidazole compounds is preferable, A polymerization initiator comprising an acyloxime compound is more preferable.
O-아실옥심 화합물은 식 (d1)로 표시되는 부분 구조를 갖는 화합물이다. The O-acyloxime compound is a compound having a partial structure represented by formula (d1).
이하, *는 결합수를 나타낸다. Herein, * represents the number of bonds.
O-아실옥심 화합물로서는 예컨대 N-벤조일옥시-1-(4-페닐술파닐페닐)부탄-1-온-2-이민, N-벤조일옥시-1-(4-페닐술파닐페닐)옥탄-1-온-2-이민, N-벤조일옥시-1-(4-페닐술파닐페닐)-3-시클로펜틸프로판-1-온-2-이민, N-아세톡시-1-[9-에틸-6-(2-메틸벤조일)-9H-카르바졸-3-일]에탄-1-이민, N-아세톡시-1-[9-에틸-6-{2-메틸-4-(3,3-디메틸-2,4-디옥사시클로펜타닐메틸옥시)벤조일}-9H-카르바졸-3-일]에탄-1-이민, N-아세톡시-1-[9-에틸-6-(2-메틸벤조일)-9H-카르바졸-3-일]-3-시클로펜틸프로판-1-이민, N-벤조일옥시-1-[9-에틸-6-(2-메틸벤조일)-9H-카르바졸-3-일]-3-시클로펜틸프로판-1-온-2-이민 등을 들 수 있다. 이르가큐어(등록상표) OXE01, OXE02(이상, BASF사 제조), N-1919(ADEKA사 제조) 등의 시판 제품을 이용하더라도 좋다. Examples of the O-acyloxime compound include N-benzoyloxy-1- (4-phenylsulfanylphenyl) butan-1-one-2-imine, N-benzoyloxy- 2-imine, N-benzoyloxy-1- (4-phenylsulfanylphenyl) -3-cyclopentylpropan- -Acetoxy-l- [9-ethyl-6- {2-methyl-4- (3,3-dimethyl Benzoyl} -9H-carbazol-3-yl] ethan-1-imine, N- acetoxy- 1- [9- ethyl- 6- (2-methylbenzoyl) -9H-carbazol-3-yl] -3-cyclopentylpropan-1-imine, N-benzoyloxy- 1- [9- ethyl-6- (2-methylbenzoyl) -9H- ] -3-cyclopentylpropan-1-one-2-imine. Commercially available products such as Irgacure (registered trademark) OXE01, OXE02 (manufactured by BASF) and N-1919 (manufactured by ADEKA) may be used.
알킬페논 화합물은 식 (d2)로 표시되는 부분 구조 또는 식 (d3)으로 표시되는 부분 구조를 갖는 화합물이다. 이들 부분 구조 중, 벤젠환은 치환기를 갖고 있더라도 좋다. The alkylphenone compound is a compound having a partial structure represented by formula (d2) or a partial structure represented by formula (d3). Of these partial structures, the benzene ring may have a substituent.
식 (d2)로 표시되는 부분 구조를 갖는 화합물로서는 예컨대 2-메틸-2-모르폴리노-1-(4-메틸술파닐페닐)프로판-1-온, 2-디메틸아미노-1-(4-모르폴리노페닐)-2-벤질부탄-1-온, 2-(디메틸아미노)-2-[(4-메틸페닐)메틸]-1-[4-(4-모르폴리닐)페닐]부탄-1-온 등을 들 수 있다. 이르가큐어(등록상표) 369, 907 및 379(이상, BASF사 제조) 등의 시판 제품을 이용하더라도 좋다.Examples of the compound having a partial structure represented by the formula (d2) include 2-methyl-2-morpholino-1- (4-methylsulfanylphenyl) propan- 2- (4-methylphenyl) methyl] -1- [4- (4-morpholinyl) phenyl] butane-1-one - on. Commercially available products such as Irgacure (registered trademark) 369, 907 and 379 (manufactured by BASF) may be used.
식 (d3)으로 표시되는 부분 구조를 갖는 화합물로서는 예컨대 2-히드록시-2-메틸-1-페닐프로판-1-온, 2-히드록시-2-메틸-1-[4-(2-히드록시에톡시)페닐]프로판-1-온, 1-히드록시시클로헥실페닐케톤, 2-히드록시-2-메틸-1-(4-이소프로페닐페닐)프로판-1-온의 올리고머, α,α-디에톡시아세토페논, 벤질디메틸케탈 등을 들 수 있다.Examples of the compound having a partial structure represented by the formula (d3) include 2-hydroxy-2-methyl-1-phenylpropan-1-one, 2- 1-hydroxy-2-methyl-1- (4-isopropenylphenyl) propane-1-one, ? -diethoxyacetophenone, benzyldimethylketal, and the like.
감도의 점에서, 알킬페논 화합물로서는 식 (d2)로 표시되는 부분 구조를 갖는 화합물이 바람직하다.From the viewpoint of sensitivity, the alkylphenone compound is preferably a compound having a partial structure represented by formula (d2).
트리아진 화합물로서는 예컨대 2,4-비스(트리클로로메틸)-6-(4-메톡시페닐)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-(4-메톡시나프틸)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-피페로닐-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-(4-메톡시스티릴)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(5-메틸푸란-2-일)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(푸란-2-일)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(4-디에틸아미노-2-메틸페닐)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(3,4-디메톡시페닐)에테닐]-1,3,5-트리아진 등을 들 수 있다. Examples of the triazine compound include 2,4-bis (trichloromethyl) -6- (4-methoxyphenyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- (Methoxynaphthyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6-piperonyl-1,3,5-triazine, 2,4- Methyl) -6- (4-methoxystyryl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- 2- (furan-2-yl) ethenyl] -1,3,5-triazine, 2,4,6-trichloromethyl- Bis (trichloromethyl) -6- [2- (4-diethylamino-2-methylphenyl) ethenyl] -1,3,5-triazine, 2,4- - [2- (3,4-dimethoxyphenyl) ethenyl] -1,3,5-triazine.
아실포스핀옥사이드 화합물로서는 2,4,6-트리메틸벤조일디페닐포스핀옥사이드 등을 들 수 있다. 이르가큐어 819(BASF사 제조) 등의 시판 제품을 이용하더라도 좋다. Examples of the acylphosphine oxide compound include 2,4,6-trimethylbenzoyldiphenylphosphine oxide and the like. Commercially available products such as Irgacure 819 (manufactured by BASF) may be used.
비이미다졸 화합물로서는 예컨대 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(2,3-디클로로페닐)-4,4',5,5'-테트라페닐비이미다졸(예컨대 JPH06-75372-A, JPH06-75373-A 등 참조), 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라(알콕시페닐)비이미다졸, 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라(디알콕시페닐)비이미다졸, 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라(트리알콕시페닐)비이미다졸(예컨대, JPS48-38403-B, JPS62-174204-A 등 참조), 4,4'5,5'-위치의 페닐기가 카르보알콕시기에 의해 치환되어 있는 이미다졸 화합물(예컨대 JPH07-10913-A 등 참조) 등을 들 수 있다. Examples of the imidazole compound include 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2,3- 4,4 ', 5,5'-tetraphenylbiimidazole (see JPH06-75372-A, JPH06-75373-A and the like), 2,2'-bis (2-chlorophenyl) 5,5'-tetraphenylbiimidazole, 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetra (alkoxyphenyl) (2-chlorophenyl) -4,4 ', 5,5'-tetra (dialkoxyphenyl) biimidazole, 2,2'-bis (Trialkoxyphenyl) imidazole (for example, see JPS48-38403-B, JPS62-174204-A and the like), imidazole compounds in which the phenyl group at the 4,4'5,5'-position is substituted by a carboalkoxy group (See JPH07-10913-A, for example).
또한 중합 개시제(D)로서는 벤조인, 벤조인메틸에테르, 벤조인에틸에테르, 벤조인이소프로필에테르, 벤조인이소부틸에테르 등의 벤조인 화합물; 벤조페논, o-벤조일안식향산메틸, 4-페닐벤조페논, 4-벤조일-4'-메틸디페닐설파이드, 3,3',4,4'-테트라(tert-부틸퍼옥시카르보닐)벤조페논, 2,4,6-트리메틸벤조페논 등의 벤조페논 화합물; 9,10-페난트렌퀴논, 2-에틸안트라퀴논, 캄파퀴논 등의 퀴논 화합물; 10-부틸-2-클로로아크리돈, 벤질, 페닐글리옥실산메틸, 티타노센 화합물 등을 들 수 있다. 이들은 후술하는 중합 개시 조제(D1)(특히 아민류)와 조합하여 이용하는 것이 바람직하다. Examples of the polymerization initiator (D) include benzoin compounds such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether and benzoin isobutyl ether; Benzophenone, methyl o-benzoylbenzoate, 4-phenylbenzophenone, 4-benzoyl-4'-methyldiphenylsulfide, 3,3 ', 4,4'-tetra (tert- butylperoxycarbonyl) benzophenone, Benzophenone compounds such as 2,4,6-trimethylbenzophenone; Quinone compounds such as 9,10-phenanthrenequinone, 2-ethyl anthraquinone, and campquinone; Butyl-2-chloroacridone, benzyl, methyl phenylglyoxylate, and titanocene compounds. These are preferably used in combination with the polymerization initiator D1 (particularly amines) to be described later.
산발생제로서는 예컨대 4-히드록시페닐디메틸술포늄p-톨루엔술포네이트, 4-히드록시페닐디메틸술포늄헥사플루오로안티모네이트, (4-아세톡시페닐)디메틸술포늄p-톨루엔술포네이트, 벤질(4-아세톡시페닐)메틸술포늄헥사플루오로안티모네이트, 트리페닐술포늄p-톨루엔술포네이트, 트리페닐술포늄헥사플루오로안티모네이트, 디페닐요오도늄p-톨루엔술포네이트, 디페닐요오도늄헥사플루오로안티모네이트 등의 오늄염류나 니트로벤젠토실레이트류, 벤조인토실레이트류 등을 들 수 있다.Examples of the acid generator include 4-hydroxyphenyldimethylsulfonium p-toluenesulfonate, 4-hydroxyphenyldimethylsulfonium hexafluoroantimonate, (4-acetoxyphenyl) dimethylsulfonium p-toluenesulfonate, Benzyl (4-acetoxyphenyl) methylsulfonium hexafluoroantimonate, triphenylsulfonium p-toluenesulfonate, triphenylsulfonium hexafluoroantimonate, diphenyliodonium p- toluenesulfonate, Diphenyl iodonium hexafluoroantimonate, and the like; and nitrobenzenesulfonates, benzoin tosylates, and the like.
중합 개시제(D)의 함유량은 수지(B) 및 중합성 화합물(C)의 합계량 100 질량부에 대하여 바람직하게는 0.1∼30 질량부이며, 보다 바람직하게는 1∼20 질량부이다. 중합 개시제(D)의 함유량이 상기한 범위 내에 있으면, 고감도화하여 노광 시간이 단축되는 경향이 있기 때문에 생산성이 향상된다. The content of the polymerization initiator (D) is preferably 0.1 to 30 parts by mass, more preferably 1 to 20 parts by mass, based on 100 parts by mass of the total amount of the resin (B) and the polymerizable compound (C). When the content of the polymerization initiator (D) is in the above range, high sensitivity is obtained and the exposure time tends to be shortened, so that the productivity is improved.
<중합 개시 조제(D1)> ≪ Polymerization initiator (D1) >
중합 개시 조제(D1)는 중합 개시제에 의해서 중합이 개시된 중합성 화합물의 중합을 촉진하기 위해서 이용되는 화합물 혹은 증감제이다. 중합 개시 조제(D1)는 통상 중합 개시제(D)와 함께 이용된다. The polymerization initiator (D1) is a compound or a sensitizer used for promoting polymerization of a polymerizable compound initiated polymerization by a polymerization initiator. The polymerization initiator (D1) is usually used together with the polymerization initiator (D).
중합 개시 조제(D1)로서는 아민 화합물, 알콕시안트라센 화합물, 티오크산톤 화합물 및 카르복실산 화합물 등을 들 수 있다. Examples of the polymerization initiator (D1) include an amine compound, an alkoxyanthracene compound, a thioxanthone compound, and a carboxylic acid compound.
아민 화합물로서는, 트리에탄올아민, 메틸디에탄올아민, 트리이소프로판올아민, 4-디메틸아미노안식향산메틸, 4-디메틸아미노안식향산에틸, 4-디메틸아미노안식향산이소아밀, 안식향산2-디메틸아미노에틸, 4-디메틸아미노안식향산2-에틸헥실, N,N-디메틸-p-톨루이딘, 4,4'-비스(디메틸아미노)벤조페논(통칭 미힐러 케톤), 4,4'-비스(디에틸아미노)벤조페논, 4,4'-비스(에틸메틸아미노)벤조페논 등을 들 수 있고, 그 중에서도 4,4'-비스(디에틸아미노)벤조페논이 바람직하다. EAB-F(호도가야가가쿠고교(주) 제조) 등의 시판품을 이용하더라도 좋다. Examples of the amine compound include triethanolamine, methyldiethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 2-dimethylaminoethyl benzoate, (Diethylamino) benzophenone, 4,4'-bis (dimethylamino) benzophenone (commonly known as Michler's ketone), 4,4'-bis , 4'-bis (ethylmethylamino) benzophenone, and the like, among which 4,4'-bis (diethylamino) benzophenone is preferable. And commercially available products such as EAB-F (manufactured by Hodogaya Chemical Industry Co., Ltd.) may be used.
알콕시안트라센 화합물로서는 9,10-디메톡시안트라센, 2-에틸-9,10-디메톡시안트라센, 9,10-디에톡시안트라센, 2-에틸-9,10-디에톡시안트라센, 9,10-디부톡시안트라센, 2-에틸-9,10-디부톡시안트라센 등을 들 수 있다. Examples of the alkoxyanthracene compound include 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 2-ethyl-9,10-diethoxyanthracene, 9,10- Anthracene, and 2-ethyl-9,10-dibutoxyanthracene.
티오크산톤 화합물로서는 2-이소프로필티오크산톤, 4-이소프로필티오크산톤, 2,4-디에틸티오크산톤, 2,4-디클로로티오크산톤, 1-클로로-4-프로폭시티오크산톤 등을 들 수 있다. Examples of the thioxanthone compound include 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone, 1- Santon et al.
카르복실산 화합물로서는 페닐술파닐초산, 메틸페닐술파닐초산, 에틸페닐술파닐초산, 메틸에틸페닐술파닐초산, 디메틸페닐술파닐초산, 메톡시페닐술파닐초산, 디메톡시페닐술파닐초산, 클로로페닐술파닐초산, 디클로로페닐술파닐초산, N-페닐글리신, 페녹시초산, 나프틸티오초산, N-나프틸글리신, 나프톡시초산 등을 들 수 있다. Examples of the carboxylic acid compound include phenylsulfanyl acetic acid, methylphenylsulfanyl acetic acid, ethylphenylsulfanyl acetic acid, methylethylphenylsulfanyl acetic acid, dimethylphenylsulfanyl acetic acid, methoxyphenylsulfanyl acetic acid, dimethoxyphenylsulfanyl acetic acid, Diphenylacetic acid, dichlorophenylsulfanyl acetic acid, N-phenylglycine, phenoxyacetic acid, naphthylthioacetic acid, N-naphthylglycine, naphthoxyacetic acid and the like.
이들 중합 개시 조제(D1)를 이용하는 경우, 그 사용량은 수지(B) 및 중합성 화합물(C)의 합계량 100 질량부에 대하여 바람직하게는 0.1∼30 질량부, 보다 바람직하게는 1∼20 질량부이다. 중합 개시 조제(D1)의 양이 이 범위에 있으면, 더욱 고감도로 패턴을 형성할 수 있어, 패턴의 생산성이 향상되는 경향이 있다.When these polymerization initiator (D1) is used, the amount thereof is preferably 0.1 to 30 parts by mass, more preferably 1 to 20 parts by mass, per 100 parts by mass of the total amount of the resin (B) and the polymerizable compound (C) to be. When the amount of the polymerization initiator (D1) is in this range, it is possible to form the pattern with higher sensitivity, and the productivity of the pattern tends to be improved.
<유기 금속 화합물(M)>≪ Organometallic Compound (M) >
유기 금속 화합물(M)은 가시광 영역(파장 380 nm∼780 nm)에 있어서의 몰 흡광 계수(ε)의 최대치(이하 「εM」라고 하는 경우가 있음)가 화합물 (1)의 εM보다도 작은 유기 금속 화합물이다. 이 유기 금속 화합물은 금속 원자 또는 금속 이온을 중심으로 하여 음성, 중성 또는 양성의 배위자가 배위된 유기 금속 착체 혹은 유기산의 금속염이다. 그 중에서도 유기 용제에 용해하는 것이 바람직하다. An organic metal compound (M) is a visible light region of the maximum molar extinction coefficient (ε) of the (with a wavelength of 380 nm nm~780) (below that there is a case called "ε M ') is smaller than ε M of compound (1) Organometallic compounds. The organometallic compound is an organometallic complex or a metal salt of an organic acid in which a negative, neutral or positive ligand is coordinated centering on a metal atom or a metal ion. Among them, it is preferable to dissolve in an organic solvent.
유기 금속 화합물(M)의 εM은 유기 금속 화합물(M) 0.1 g을 젖산에틸로 0.250 L에 희석하여 용액을 조제하여, 이 용액을 자외가시분광광도계로 가시광 영역의 흡수 스펙트럼을 측정하고, Lambert-Beer 법칙을 이용하여 산출함으로써 구해진다.? M of the organometallic compound (M) was determined by diluting 0.1 g of the organometallic compound (M) with 0.250 L of ethyl lactate to prepare a solution, measuring the absorption spectrum of the solution in a visible light spectrophotometer, Lambert-Beer's law.
본 발명의 착색 경화성 수지 조성물에 2종 이상의 화합물 (1)이 포함되는 경우, 가장 작은 εM을 갖는 화합물 (1)을 기준으로 한다. When two or more compounds (1) are contained in the colored curable resin composition of the present invention, the compound (1) having the smallest epsilon M is used as a reference.
유기 금속 화합물(M)의 εM은 화합물 (1)의 εM보다 작고, 바람직하게는 1000 이하이며, 보다 바람직하게는 500 이하, 더욱 바람직하게는 100 이하, 더욱 보다 바람직하게는 80 이하이고, 특히 바람직하게는 60 이하이다. εM이 상기한 범위 내이면, 컬러 필터의 명도가 높아지는 경향이 있기 때문에 바람직하다. 한편, 본 발명의 착색 경화성 수지 조성물이 2종 이상의 화합물 (1)을 포함하는 경우, 유기 금속 화합물(M)의 εM은 가장 작은 εM을 갖는 화합물 (1)의 εM보다도 작다. 또한, 본 발명의 착색 경화성 수지 조성물이 2종 이상의 유기 금속 화합물(M)을 포함하는 경우, 가장 큰 εM을 갖는 유기 금속 화합물(M)의 εM은 화합물 (1)의 εM보다도 작다. And ε M of the organic metal compound (M) is smaller than ε M of compound (1), preferably 1000 or less, more preferably 500 or less, more preferably 80 or less still more preferably 100 or less, Particularly preferably 60 or less. If? M is within the above-mentioned range, the brightness of the color filter tends to be high. On the other hand, when the colored curable resin composition containing the two or more kinds of compound (1) of the present invention, ε M of the organic metal compound (M) is smaller than ε M of compound (1) having the smallest ε M. Further, when the colored curable resin composition of the present invention contains two or more kinds of organometallic compounds (M),? M of the organometallic compound (M) having the largest? M is smaller than? M of the compound (1).
유기 금속 화합물(M)의 금속 원자 또는 금속 이온을 구성하는 금속으로서는 전형 금속 및 전이 금속을 들 수 있다. Examples of the metal constituting the metal atom or the metal ion of the organometallic compound (M) include a typical metal and a transition metal.
전형 금속으로서는 예컨대 주기표의 제1족 원소(알칼리 금속), 제2족 원소(알칼리 토류 금속), 제12족 원소(아연족), 제13족 원소(붕소족), 제14족 원소(탄소족), 제15족 원소(질소족)에 포함되는 금속 원소의 원자를 들 수 있다.Examples of the typical metals include Group 1 elements (alkali metals), Group 2 elements (alkaline earth metals), Group 12 elements (Zinc Group), Group 13 Elements (Boron Group), Group 14 Elements ), And the atom of the metal element contained in the group 15 element (nitrogen group).
구체적으로는 베릴륨(Be), 마그네슘(Mg), 알루미늄(Al), 칼슘(Ca), 아연(Zn), 갈륨(Ga), 루비듐(Rb), 스트론튬(Sr), 카드뮴(Cd), 인듐(In), 주석(Sn), 세슘(Cs), 바륨(Ba), 수은(Hg), 탈륨(Tl), 납(Pb), 비스무트(Bi), 프랑슘(Fr), 라듐(Ra) 등의 원자를 들 수 있다. Specifically, examples of the material include beryllium, magnesium, aluminum, calcium, zinc, gallium, rubidium, strontium, cadmium, Atoms such as In, Sn, Cs, Ba, Hg, Tl, Pb, Bi, .
그 중에서도 마그네슘(Mg), 알루미늄(Al), 칼슘(Ca), 아연(Zn), 갈륨(Ga), 루비듐(Rb), 스트론튬(Sr), 인듐(In), 세슘(Cs) 및 바륨(Ba)이 바람직하고, 알루미늄(Al), 아연(Zn), 인듐(In) 및 바륨(Ba)의 원자가 보다 바람직하고, 알루미늄(Al), 아연(Zn) 및 인듐(In)의 원자가 더욱 바람직하다. Among them, a metal such as magnesium (Mg), aluminum (Al), calcium (Ca), zinc (Zn), gallium (Ga), rubidium (Rb), strontium (Sr), indium (In), cesium ) Is more preferable and the valence of aluminum (Al), zinc (Zn), indium (In) and barium (Ba) is more preferable and the atom of aluminum (Al), zinc (Zn) and indium (In) is more preferable.
전이 금속으로서는 예컨대 주기표의 제3족 원소(스칸듐족), 제4족 원소(티탄족), 제5족 원소(바나듐족), 제6족 원소(크롬족), 제7족 원소(망간족), 제4 주기 제8∼10족 원소(철족) 및 제5∼6 주기 제8∼10족 원소(백금족)에 포함되는 금속 원소의 원자를 들 수 있다. Examples of the transition metal include Group 3 elements (scandium), Group 4 elements (titanium group), Group 5 elements (vanadium group), Group 6 elements (chromium group), Group 7 elements (manganese group) , The fourth periodic group 8-10 element (iron family), and the fifth periodic group 6 periodic group 8-10 element (platinum group).
구체적으로는 스칸듐(Sc), 티탄(Ti), 바나듐(V), 크롬(Cr), 망간(Mn), 철(Fe), 코발트(Co), 니켈(Ni), 구리(Cu), 이트륨(Y), 지르코늄(Zr), 니오븀(Nb), 몰리브덴(Mo), 테크네튬(Tc), 루테늄(Ru), 로듐(Rh), 팔라듐(Pd), 은(Ag), 란탄(La), 세륨(Ce), 프라세오디뮴(Pr), 네오디뮴(Nd), 프로메튬(Pm), 사마륨(Sm), 유로퓸(Eu), 가돌리늄(Gd), 테르븀(Tb), 디스프로슘(Dy), 홀뮴(Ho), 에르븀(Er), 툴륨(Tm), 이테르븀(Yb), 루테튬(Lu), 하프늄(Hf), 탄탈(Ta), 텅스텐(W), 레늄(Re), 오스뮴(Os), 이리듐(Ir), 백금(Pt), 금(Au) 등을 들 수 있다. Concretely, it is possible to use scandium (Sc), titanium (Ti), vanadium (V), chromium (Cr), manganese (Mn), iron (Fe), cobalt (Co), nickel (Ni) Y, zirconium, niobium, molybdenum, technetium, ruthenium, rhodium, palladium, silver, lanthanum, Ce, Pr, Ge, Pm, Sm, Eu, Gd, Terbium, Dy, Hol, Erbium, (Ir), thulium (Tm), ytterbium (Yb), lutetium (Lu), hafnium (Hf), tantalum (Ta), tungsten (W), rhenium (Re), osmium Pt), and gold (Au).
그 중에서도 스칸듐(Sc), 티탄(Ti), 바나듐(V), 크롬(Cr), 망간(Mn), 철(Fe), 코발트(Co), 니켈(Ni), 구리(Cu) 등, 제1 계열(즉 제4 주기)에 속하는 것이 바람직하고, 코발트(Co) 및 니켈(Ni)이 보다 바람직하다. Among them, the first metal such as scandium (Sc), titanium (Ti), vanadium (V), chromium (Cr), manganese (Mn), iron (Fe), cobalt (Co), nickel (Ni) (I.e., the fourth period), and cobalt (Co) and nickel (Ni) are more preferable.
유기 금속 화합물(M)이 유기 금속 착체인 경우의 배위자로서는, 특별히 한정되지 않고, 단좌 배위자라도 다좌 배위자라도 좋다. 상기 배위자 1개의 분자량은 20 이상 500 이하가 바람직하다. The ligand in the case where the organometallic compound (M) is an organometallic complex is not particularly limited and may be a monodentate ligand or a multi-ligand ligand. The molecular weight of one ligand is preferably 20 or more and 500 or less.
배위자로서는 예컨대 테트라히드로푸란, 에틸렌글리콜디메틸에테르, 아세토니트릴, 벤조니트릴, 옥살레이트, 아세테이토, 에탄올레이토, 1-부탄티올레이토, 티오페놀레이토, 2,2'-티오비스(4-t-옥틸)페놀레이트, 2,4-펜탄디오네이토, 2,2,6,6-테트라메틸-3,5-헵탄디오네이토, 트리플루오로-2,4-펜탄디오네이토, 헥사플루오로-2,4-펜탄디오네이토, 에틸아세토아세테이토, 디메틸아민, 디에틸아민, 테트라에틸암모늄, 피페리딘, N-메틸아닐린, 피리딘, 2-페닐피리딘, 에틸렌디아민, N,N,N',N'-테트라메틸에틸렌디아민, 1,2-디아미노시클로헥산, 2,2'-비피리딘, 1,10-페난트롤린, 에틸렌디아민테트라아세테이토, 1,4,8,11-테트라아자시클로테트라데칸, 트리스(2-아미노에틸)아민, 트리에틸포스핀, 트리부틸포스핀, 트리시클로헥실포스핀, 디메틸페닐포스핀, 트리페닐포스핀, 디페닐포스핀, 트리시클로헥실포스핀, 시클로펜타디엔, 펜타메틸시클로펜타디엔, 시클로옥텐, 1,5-시클로옥타디엔, 비시클로[2.2.1]헵타-2,5-디엔, 벤젠, 나프탈렌, 알릴 등을 들 수 있다. Examples of the ligand include tetrahydrofuran, ethylene glycol dimethyl ether, acetonitrile, benzonitrile, oxalate, acetateto, ethanolate, 1-butanethiolate, thiophenolate, 2,2'- Octyl) phenolate, 2,4-pentanedione, 2,2,6,6-tetramethyl-3,5-heptanedione, trifluoro-2,4-pentanedione, hexafluoro- N, N ', N < / RTI > (N, N'-diphenylmethylaniline, '-Tetramethylethylenediamine, 1,2-diaminocyclohexane, 2,2'-bipyridine, 1,10-phenanthroline, ethylenediamine tetraacetate, 1,4,8,11-tetraazacyclo Tetradecane, tris (2-aminoethyl) amine, triethylphosphine, tributylphosphine, tricyclohexylphosphine, dimethylphenylphosphine, triphenylphosphine, Cyclopentadiene, cyclopentadiene, cyclooctene, 1,5-cyclooctadiene, bicyclo [2.2.1] hept-2,5-diene, benzene, naphthalene, Allyl, and the like.
상기 배위자의 바람직한 것으로서는, 배위자 내에 방향환을 함유하지 않는 것이 바람직하고, 아세테이토, 아세틸아세토네이토, 헥사플루오로아세틸아세토네이토, 디에틸디티오카르바메이트 및 디-n-부틸디티오카르바메이트가 보다 바람직하다. Preferable examples of the ligand are those which do not contain an aromatic ring in the ligand and include acetates, acetyl acetonates, hexafluoroacetyl acetonates, diethyl dithiocarbamates and di-n-butyl dithiols More preferred is an oxcarbamate.
상기 유기 금속 착체가 유기 화합물에 유래하는 배위자를 적어도 하나 갖고 있으면, 그 이외의 배위자를 갖고 있더라도 좋다. 이러한 배위자로서는 예컨대 플루오로, 클로로, 브로모, 요오도, 히드록소, 아쿠아, 옥소, 페록소, 카르보닐, 카르보네이토, 시아노, 아민, 술페이토, 니트로, 니트리토, 포스페이토, 티오시아네이토, 이소티오시아네이토 등을 들 수 있다. The organometallic complex may have at least one ligand derived from the organic compound as long as it has at least one ligand. Examples of such ligands include fluoro, chloro, bromo, iodo, hydroxy, aqua, oxo, peroxo, carbonyl, carbonato, cyano, amine, sulfato, nitro, nitrito, phosphato, Thiocyanato, isothiocyanato, and the like.
유기 금속 화합물(M)이 유기산의 금속염인 경우, 그 유기산 1개의 분자량은 20 이상 500 이하가 바람직하다. When the organometallic compound (M) is a metal salt of an organic acid, the molecular weight of one organic acid is preferably 20 or more and 500 or less.
유기산으로서는 예컨대 디메틸디티오카르바민산, 디에틸디티오카르바민산, 디부틸디티오카르바민산, N,N-비스(2-히드록시에틸)디티오카르바민산, N-에틸-N-페닐디티오카르바민산, N,N-디벤질디티오카르바민산, 디에틸디티오인산, 디이소프로필디티오인산, 2-히드록시프로판산, 스테아린산, 타르타르산, 옥살산 등을 들 수 있다. Examples of the organic acid include dimethyldithiocarbamic acid, diethyldithiocarbamic acid, dibutyldithiocarbamic acid, N, N-bis (2-hydroxyethyl) dithiocarbamic acid, N- N, N-dibenzyldithiocarbamic acid, diethyldithiophosphoric acid, diisopropyldithiophosphoric acid, 2-hydroxypropanoic acid, stearic acid, tartaric acid, and oxalic acid.
유기 금속 화합물(M)로서는 예컨대 트리스(2-히드록시프로판산)알루미늄, 비스(2-에틸헥사노에이토)히드록시알루미늄, 비스(2-술파닐피리딘-N-옥사이드)아연, 비스(2-히드록시프로판산)아연, 비스(2-히드록시프로판산)바륨, 비스(스테아린산)바륨, 타르타르산바륨, 옥살산바륨, JP2011-118365-A 및 JP2004-295116-A에 기재된 화합물 등을 들 수 있다. Examples of the organometallic compound (M) include aluminum tris (2-hydroxypropanoate), bis (2-ethylhexanoate) hydroxy aluminum, bis (2-sulfanylpyridine-N-oxide) zinc, bis (Barium stearate), barium tartarate, barium oxalate, compounds described in JP2011-118365-A and JP2004-295116-A, and the like can be mentioned .
그 중에서도 바람직하게는 -C(=O)- 및 -C(=S)-로 이루어지는 군에서 선택되는 1종 이상의 기를 포함하는 유기 금속 화합물이 바람직하고, 식 (F1)로 표시되는 화합물, 식 (F2)로 표시되는 화합물 및 이들의 수화물로 이루어지는 군에서 선택되는 1종 이상인 화합물이 보다 바람직하다. 유기 금속 화합물(M)이 이들의 화합물이면, 유기 용제에의 용해성이 향상되는 경향이 있기 때문에 바람직하다. Among them, an organometallic compound containing at least one group selected from the group consisting of -C (= O) - and -C (= S) - is preferable, and a compound represented by the formula (F1) F2), and hydrates thereof. The compound represented by Formula (I) is more preferably at least one compound selected from the group consisting of compounds represented by Formula If the organometallic compound (M) is a compound of these, the solubility in an organic solvent tends to be improved.
[식 (F1)에서, W1, W2, M1 및 x는 각각 상기와 동일한 의미를 나타낸다.][In the formula (F1), W 1 , W 2 , M 1 and x each have the same meaning as defined above.]
[식 (F2)에서, W3, W4, M2 및 y는 각각 상기와 동일한 의미를 나타낸다.][In formula (F2), W 3, W 4, M 2 , and y represents the same meanings, respectively.]
W1 및 W2에 있어서의 탄소수 1∼6의 1가의 지방족 탄화수소기로서는 예컨대 메틸기, 에틸기, 프로필기, 이소프로필기, 부틸기, sec-부틸기, tert-부틸기, 펜틸기, 헥실기 등을 들 수 있다. 수소 원자가 히드록시기로 치환되어 있는 탄소수 1∼6의 1가의 지방족 탄화수소기로서는 예컨대 히드록시메틸기, 1-히드록시에틸기, 2-히드록시에틸기, 1-히드록시프로필기, 2-히드록시프로필기, 3-히드록시프로필기, 1-히드록시-1-메틸에틸기, 2-히드록시-1-메틸에틸기, 1-히드록시부틸기, 2-히드록시부틸기, 3-히드록시부틸기, 4-히드록시부틸기 등을 들 수 있다. 그 중에서도 바람직하게는 에틸기, 부틸기 및 2-히드록시에틸기이다. Examples of the monovalent aliphatic hydrocarbon group having 1 to 6 carbon atoms in W 1 and W 2 include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a sec-butyl group, a tert-butyl group, a pentyl group, . Examples of the monovalent aliphatic hydrocarbon group having 1 to 6 carbon atoms in which the hydrogen atom is substituted with a hydroxy group include a hydroxymethyl group, a 1-hydroxyethyl group, a 2-hydroxyethyl group, a 1- -Hydroxypropyl group, 1-hydroxy-1-methylethyl group, 2-hydroxy-1-methylethyl group, 1-hydroxybutyl group, 2-hydroxybutyl group, Butyl group and the like. Among them, preferred are an ethyl group, a butyl group and a 2-hydroxyethyl group.
W1 및 W2에 있어서의 탄소수 6∼10의 1가의 방향족 탄화수소기로서는 예컨대 페닐기, 톨루일기, 크실릴기, 프로필페닐기, 부틸페닐기 등의 아릴기; 벤질기 등의 아랄킬기 등을 들 수 있다. 수소 원자가 히드록시기로 치환되어 있는 탄소수 6∼10의 1가의 방향족 탄화수소기로서는 예컨대 히드록시페닐기, 히드록시메틸페닐기 등을 들 수 있다. 그 중에서도 바람직하게는 페닐기 및 벤질기이다. Examples of the monovalent aromatic hydrocarbon group having 6 to 10 carbon atoms in W 1 and W 2 include an aryl group such as a phenyl group, a toluyl group, a xylyl group, a propylphenyl group and a butylphenyl group; And an aralkyl group such as a benzyl group. Examples of the monovalent aromatic hydrocarbon group having 6 to 10 carbon atoms in which the hydrogen atom is substituted by a hydroxy group include a hydroxyphenyl group and a hydroxymethylphenyl group. Among them, phenyl group and benzyl group are preferable.
W3 및 W4에 있어서의 탄소수 1∼6의 1가의 지방족 탄화수소기로서는 W1 및 W2에 있어서의 것과 동일한 기를 들 수 있다. Examples of the monovalent aliphatic hydrocarbon group having 1 to 6 carbon atoms in W 3 and W 4 include the same groups as those in W 1 and W 2 .
상기 할로겐 원자로서는 예컨대 불소 원자, 염소 원자, 브롬 원자 및 요오드 원자를 들 수 있고, 바람직하게는 불소 원자이다. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, preferably a fluorine atom.
수소 원자가 할로겐 원자로 치환되어 있는 탄소수 1∼6의 1가의 지방족 탄화수소기로서는 예컨대 플루오로메틸기, 디플루오로메틸기, 트리플루오로메틸기, 트리플루오로에틸기, 클로로메틸기, 클로로에틸기, 디클로로에틸기, 클로로프로필기, 클로로부틸기, 브로모부틸기, 요오도부틸기 등을 들 수 있다. 그 중에서도 바람직하게는 메틸기, tert-부틸기 또는 트리플루오로메틸기이다.Examples of the monovalent aliphatic hydrocarbon group having 1 to 6 carbon atoms in which the hydrogen atom is substituted with a halogen atom include a fluoromethyl group, a difluoromethyl group, a trifluoromethyl group, a trifluoroethyl group, a chloromethyl group, a chloroethyl group, a dichloroethyl group, , A chlorobutyl group, a bromobutyl group, and an iodobutyl group. Among them, a methyl group, a tert-butyl group or a trifluoromethyl group is preferable.
식 (F1)로 표시되는 화합물로서는 예컨대 비스[N,N-비스(2-히드록시에틸)디티오카르바민산]아연, 비스(N,N-디메틸디티오카르바민산)아연, 비스(N,N-디에틸디티오카르바민산)아연, 비스(N,N-디부틸디티오카르바민산)아연, 비스(N-에틸-N-페닐디티오카르바민산)아연, 비스(N,N-디벤질디티오카르바민산)아연 등을 들 수 있다.Examples of the compound represented by the formula (F1) include bis [N, N-bis (2-hydroxyethyl) dithiocarbamate] zinc, bis (N, N-dimethyldithiocarbamate) Bis (N, N-dibutyldithiocarbamate) zinc, bis (N-ethyl-N-phenyldithiocarbamate) Dibenzyldithiocarbamic acid) zinc, and the like.
식 (F2)로 표시되는 화합물로서는 예컨대 트리스(2,4-펜탄디오네이토)알루미늄(III), 트리스(트리플루오로-2,4-펜탄디오네이토)알루미늄(III), 트리스(2,4-펜탄디오네이토)인듐(III), 트리스(2,2,6,6-테트라메틸-3,5-헵탄디오네이토)인듐(III), 트리스(트리플루오로-2,4-펜탄디오네이토)인듐(III), 비스(2,4-펜탄디오네이토)바륨, 비스(헥사플루오로-2,4-펜탄디오네이토)바륨, 비스(2,2,6,6-테트라메틸-3,5-헵탄디오네이토)바륨, 비스(2,4-펜탄디오네이토)니켈(II), 비스(N,N-디부틸디티오카르바민산)니켈(II), 비스(2,4-펜탄디오네이토)코발트(II), 비스(헥사플루오로-2,4-펜탄디오네이토)코발트(II) 등을 들 수 있다. Examples of the compound represented by the formula (F2) include tris (2,4-pentanedione) aluminum (III), tris (trifluoro-2,4-pentanedionato) aluminum (III) Pentanedionato) indium (III), tris (2,2,6,6-tetramethyl-3,5-heptanedionato) indium (III), tris (trifluoro-2,4-pentanedionato) indium (III), barium (2,4-pentanedione) barium, bis (hexafluoro-2,4-pentanedione) barium, bis (2,2,6,6-tetramethyl- Bis (2,4-pentanedione) nickel (II), bis (N, N-dibutyldithiocarbamate) nickel (II) (II), bis (hexafluoro-2,4-pentanediono) cobalt (II), and the like.
유기 금속 화합물(M)로서는 비스(2,4-펜탄디오네이토)니켈(II), 비스(2,4-펜탄디오네이토)코발트(II), 트리스(2,4-펜탄디오네이토)인듐(III), 트리스(2,4-펜탄디오네이토)알루미늄(III), 비스(헥사플루오로-2,4-펜탄디오네이토)코발트(II), 비스(N,N-디부틸디티오카르바민산)아연, 비스[N,N-비스(2-히드록시에틸)디티오카르바민산]아연 및 이들의 수화물이 바람직하다. 이들 화합물이라면, 고콘트라스트의 컬러 필터를 얻을 수 있고, 또한 화합물의 유기 용제에의 용해성이 높은 경향이 있기 때문에, 이물 발생이 보다 적은 컬러 필터가 얻어지는 경향이 있어서 바람직하다. Examples of the organometallic compound (M) include bis (2,4-pentanedione) nickel (II), bis (2,4-pentanediono) cobalt (II), tris ), Tris (2,4-pentanedionato) aluminum (III), bis (hexafluoro-2,4-pentanediono) cobalt (II), bis (N, N-dibutyldithiocarbamate) Zinc, bis [N, N-bis (2-hydroxyethyl) dithiocarbamate] zinc and hydrates thereof are preferable. These compounds are preferable because a color filter of high contrast can be obtained, and the solubility of the compound in an organic solvent tends to be high, so that a color filter having less foreign matter can be obtained.
유기 금속 화합물(M)의 함유량은 수지(B) 및 중합성 화합물(C)의 합계량 100 질량부에 대하여 0.1 질량부 이상 20 질량부 이하가 바람직하고, 0.5 질량부 이상 15 질량부 이하가 보다 바람직하고, 1 질량부 이상 10 질량부 이하가 더욱 바람직하다. 유기 금속 화합물(M)의 함유량이 상기한 범위 내에 있으면, 명도 및 콘트라스트가 보다 높은 컬러 필터가 얻어진다. The content of the organometallic compound (M) is preferably 0.1 part by mass or more and 20 parts by mass or less, more preferably 0.5 part by mass or more and 15 parts by mass or less, based on 100 parts by mass of the total amount of the resin (B) And more preferably 1 part by mass or more and 10 parts by mass or less. When the content of the organic metal compound (M) is within the above range, a color filter having higher brightness and contrast can be obtained.
<용제(E)> ≪ Solvent (E) >
용제(E)는 특별히 한정되지 않고 이 분야에서 통상 사용되는 용제를 이용할 수 있다. 예컨대, 에스테르 용제(분자 내에 -COO-를 포함하고, -O-를 포함하지 않는 용제), 에테르 용제(분자 내에 -O-를 포함하고, -COO-를 포함하지 않는 용제), 에테르에스테르 용제(분자 내에 -COO-와 -O-를 포함하는 용제), 케톤 용제(분자 내에 -CO-를 포함하고, -COO-를 포함하지 않는 용제), 알코올 용제(분자 내에 OH를 포함하고, -O-, -CO- 및 -COO-을 포함하지 않는 용제), 방향족 탄화수소 용제, 아미드 용제, 디메틸설폭시드 등 중에서 선택하여 이용할 수 있다. The solvent (E) is not particularly limited, and a solvent commonly used in this field can be used. For example, an ester solvent (a solvent containing -COO- in the molecule and not containing -O-), an ether solvent (a solvent containing -O- and no -COO- in the molecule), an ether ester solvent ( A solvent containing -COO- and -O- in a molecule), a ketone solvent (a solvent containing -CO- in the molecule and not including -COO-), an alcohol solvent (containing OH in the molecule, -O- , -CO- and -COO-), an aromatic hydrocarbon solvent, an amide solvent, dimethylsulfoxide, and the like.
에스테르 용제로서는 젖산메틸, 젖산에틸, 젖산부틸, 2-히드록시이소부탄산메틸, 초산에틸, 초산n-부틸, 초산이소부틸, 포름산펜틸, 초산이소펜틸, 프로피온산부틸, 부티르산이소프로필, 부티르산에틸, 부티르산부틸, 피루브산메틸, 피루브산에틸, 피루브산프로필, 아세토초산메틸, 아세토초산에틸, 시클로헥산올아세테이트, γ-부티로락톤 등을 들 수 있다. Examples of the ester solvent include methyl lactate, ethyl lactate, butyl lactate, methyl 2-hydroxyisobutanoate, ethyl acetate, n-butyl acetate, isobutyl acetate, pentyl formate, isopentyl acetate, butyl propionate, isopropyl butyrate, Butyl, methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, cyclohexanol acetate, and γ-butyrolactone.
에테르 용제로서는 에틸렌글리콜모노메틸에테르, 에틸렌글리콜모노에틸에테르, 에틸렌글리콜모노프로필에테르, 에틸렌글리콜모노부틸에테르, 디에틸렌글리콜모노메틸에테르, 디에틸렌글리콜모노에틸에테르, 디에틸렌글리콜모노부틸에테르, 프로필렌글리콜모노메틸에테르, 프로필렌글리콜모노에틸에테르, 프로필렌글리콜모노프로필에테르, 프로필렌글리콜모노부틸에테르, 3-메톡시-1-부탄올, 3-메톡시-3-메틸부탄올, 테트라히드로푸란, 테트라히드로피란, 1,4-디옥산, 디에틸렌글리콜디메틸에테르, 디에틸렌글리콜디에틸에테르, 디에틸렌글리콜메틸에틸에테르, 디에틸렌글리콜디프로필에테르, 디에틸렌글리콜디부틸에테르, 아니솔, 페네톨, 메틸아니솔 등을 들 수 있다. Examples of the ether solvent include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol Propylene glycol monopropyl ether, propylene glycol monobutyl ether, 3-methoxy-1-butanol, 3-methoxy-3-methylbutanol, tetrahydrofuran, tetrahydropyran, 1 , 4-dioxane, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol dipropyl ether, diethylene glycol dibutyl ether, anisole, phenetole, .
에테르에스테르 용제로서는 메톡시초산메틸, 메톡시초산에틸, 메톡시초산부틸, 에톡시초산메틸, 에톡시초산에틸, 3-메톡시프로피온산메틸, 3-메톡시프로피온산에틸, 3-에톡시프로피온산메틸, 3-에톡시프로피온산에틸, 2-메톡시프로피온산메틸, 2-메톡시프로피온산에틸, 2-메톡시프로피온산프로필, 2-에톡시프로피온산메틸, 2-에톡시프로피온산에틸, 2-메톡시-2-메틸프로피온산메틸, 2-에톡시-2-메틸프로피온산에틸, 3-메톡시부틸아세테이트, 3-메틸-3-메톡시부틸아세테이트, 프로필렌글리콜모노메틸에테르아세테이트, 프로필렌글리콜모노에틸에테르아세테이트, 프로필렌글리콜모노프로필에테르아세테이트, 에틸렌글리콜모노메틸에테르아세테이트, 에틸렌글리콜모노에틸에테르아세테이트, 디에틸렌글리콜모노에틸에테르아세테이트, 디에틸렌글리콜모노부틸에테르아세테이트 등을 들 수 있다. Examples of the ether ester solvent include methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, Methoxypropionate, ethyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, methyl 2-methoxypropionate, ethyl 2-methoxypropionate, propyl 2-methoxypropionate, Methyl propionate, ethyl propionate, ethyl propionate, ethyl propionate, ethyl propionate, ethyl propionate, ethyl propionate, ethyl propionate, ethyl propionate, ethyl propionate, ethyl propionate, propyleneglycol monomethyl ether acetate, Ether acetate, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol moiety N-butyl ether acetate and the like.
케톤 용제로서는 4-히드록시-4-메틸-2-펜타논, 아세톤, 2-부타논, 2-헵타논, 3-헵타논, 4-헵타논, 4-메틸-2-펜타논, 시클로펜타논, 시클로헥사논, 이소포론 등을 들 수 있다.Examples of the ketone solvent include 4-hydroxy-4-methyl-2-pentanone, acetone, 2-butanone, 2-heptanone, 3-heptanone, 4- Cyclohexanone, isophorone, and the like.
알코올 용제로서는 메탄올, 에탄올, 프로판올, 부탄올, 헥산올, 시클로헥산올, 에틸렌글리콜, 프로필렌글리콜, 글리세린 등을 들 수 있다. Examples of the alcohol solvent include methanol, ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, propylene glycol, glycerin and the like.
방향족 탄화수소 용제로서는 벤젠, 톨루엔, 크실렌, 메시틸렌 등을 들 수 있다. Examples of the aromatic hydrocarbon solvent include benzene, toluene, xylene, and mesitylene.
아미드 용제로서는 N,N-디메틸포름아미드, N,N-디메틸아세트아미드, N-메틸피롤리돈 등을 들 수 있다. Examples of the amide solvent include N, N-dimethylformamide, N, N-dimethylacetamide and N-methylpyrrolidone.
상기한 용제 중, 도포성, 건조성의 점에서, 1 atm에 있어서의 비점이 120℃ 이상 180℃ 이하인 유기 용제가 바람직하다. 용제(E)로서는 프로필렌글리콜모노메틸에테르아세테이트, 젖산에틸, 프로필렌글리콜모노메틸에테르, 3-에톡시프로피온산에틸, 에틸렌글리콜모노메틸에테르, 디에틸렌글리콜모노메틸에테르, 디에틸렌글리콜모노에틸에테르, 4-히드록시-4-메틸-2-펜타논 및 N,N-디메틸포름아미드가 바람직하고, 프로필렌글리콜모노메틸에테르아세테이트, 프로필렌글리콜모노메틸에테르, 젖산에틸 및 3-에톡시프로피온산에틸이 보다 바람직하다. Among these solvents, an organic solvent having a boiling point of 120 占 폚 or more and 180 占 폚 or less at 1 atm is preferable from the viewpoint of coatability and drying property. Examples of the solvent (E) include propylene glycol monomethyl ether acetate, ethyl lactate, propylene glycol monomethyl ether, ethyl 3-ethoxypropionate, ethylene glycol monomethyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, 4- Hydroxy-4-methyl-2-pentanone and N, N-dimethylformamide are preferable, and propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether, ethyl lactate and ethyl 3-ethoxypropionate are more preferable.
용제(E)의 함유량은 착색 경화성 수지 조성물의 총량에 대하여 바람직하게는 70∼95 질량%이며, 보다 바람직하게는 75∼92 질량%이다. 다시 말해서, 착색 경화성 수지 조성물의 고형분은 바람직하게는 5∼30 질량%, 보다 바람직하게는 8∼25 질량%이다. The content of the solvent (E) is preferably 70 to 95% by mass, and more preferably 75 to 92% by mass, based on the total amount of the colored curable resin composition. In other words, the solid content of the colored curable resin composition is preferably 5 to 30% by mass, and more preferably 8 to 25% by mass.
용제(E)의 함유량이 상기한 범위 내에 있으면, 도포시의 평탄성이 보다 양호하게 되고, 또한 컬러 필터를 형성했을 때에 색 농도 부족의 우려가 없기 때문에 표시 특성이 양호하게 되는 경향이 있다. When the content of the solvent (E) is within the above range, the flatness at the time of coating becomes better, and there is no fear of lack of color density when the color filter is formed, and the display characteristics tend to be good.
<계면활성제(F)> ≪ Surfactant (F) >
계면활성제(F)로서는 실리콘계 계면활성제, 불소계 계면활성제, 불소 원자를 갖는 실리콘계 계면활성제 등을 들 수 있다. 이들은 측쇄에 중합성 기를 갖고 있더라도 좋다. Examples of the surfactant (F) include a silicone surfactant, a fluorinated surfactant, and a silicon surfactant having a fluorine atom. These may have a polymerizable group in the side chain.
실리콘계 계면활성제로서는 분자 내에 실록산 결합을 갖는 계면활성제 등을 들 수 있다. 구체적으로는, 도오레실리콘 DC3PA, 동 SH7PA, 동 DC11PA, 동 SH21PA, 동 SH28PA, 동 SH29PA, 동 SH30PA, 동 SH8400(상품명: 도오레다우코닝(주) 제조), KP321, KP322, KP323, KP324, KP326, KP340, KP341(신에츠가가쿠고교(주) 제조), TSF400, TSF401, TSF410, TSF4300, TSF4440, TSF4445, TSF4446, TSF4452 및 TSF4460(모멘티브 퍼포먼스 마테리알즈 재팬 합동회사 제조) 등을 들 수 있다.Examples of the silicone surfactant include a surfactant having a siloxane bond in the molecule. Concretely, it is preferable to use a silicone resin such as diolefin silicone DC3PA, copper SH7PA, copper DC11PA, copper SH21PA, copper SH28PA, copper SH29PA, copper SH30PA, copper SH8400 (trade name, manufactured by Dow Corning Co., Ltd.), KP321, KP322, KP323, KP326, KP340 and KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.), TSF400, TSF401, TSF410, TSF4300, TSF4440, TSF4445, TSF4446, TSF4452 and TSF4460 (manufactured by Momentive Performance Materials Japan Joint- .
상기한 불소계 계면활성제로서는 분자 내에 플루오로카본쇄를 갖는 계면활성제 등을 들 수 있다. 구체적으로는, 플로라드(등록상표) FC430, 동 FC431(스미토모쓰리엠(주) 제조), 메가파크(등록상표) F142D, 동 F171, 동 F172, 동 F173, 동 F177, 동 F183, 동 F554, 동 R30, 동 RS-718-K(DIC(주) 제조), 에프톱(등록상표) EF301, 동 EF303, 동 EF351, 동 EF352(미스비씨마테리알덴시가세이(주) 제조), 사플론(등록상표) S381, 동 S382, 동 SC101, 동 SC105(아사히가라스(주) 제조) 및 E5844((주)다이킨파인케미칼겐큐쇼 제조) 등을 들 수 있다. Examples of the fluorine-based surfactant include a surfactant having a fluorocarbon chain in the molecule. Concretely, it is possible to use a flour (registered trademark) FC430, FC431 (manufactured by Sumitomo 3M Co., Ltd.), Megapark (registered trademark) F142D, copper F171, copper F172, copper F173, copper F177 copper copper F554 copper (Registered trademark) EF301, EF303, EF351, EF352 (manufactured by MISS) and Saffron (manufactured by Mitsubishi Materials Corporation), RS-718-K S381, S382, SC101, SC105 (manufactured by Asahi Glass Co., Ltd.) and E5844 (manufactured by Daikin Fine Chemicals Co., Ltd.).
상기한 불소 원자를 갖는 실리콘계 계면활성제로서는 분자 내에 실록산 결합 및 플루오로카본쇄를 갖는 계면활성제 등을 들 수 있다. 구체적으로는 메가파크(등록상표) R08, 동 BL20, 동 F475, 동 F477 및 동 F443(DIC(주) 제조) 등을 들 수 있다. Examples of the silicone surfactant having a fluorine atom include a surfactant having a siloxane bond and a fluorocarbon chain in the molecule. Specific examples thereof include Megapark (registered trademark) R08, BL20, F475, F477 and F443 (manufactured by DIC).
이들 계면활성제는 단독으로도 2 종류 이상을 조합시켜 이용하더라도 좋다. These surfactants may be used singly or in combination of two or more kinds.
계면활성제(F)의 함유량은 착색 경화성 수지 조성물의 총량에 대하여 바람직하게는 0.001 질량% 이상 0.2 질량% 이하이며, 보다 바람직하게는 0.002 질량% 이상 0.1 질량% 이하, 더욱 바람직하게는 0.01 질량% 이상 0.05 질량% 이하이다. 한편, 이 함유량에 상기 안료 분산제의 함유량은 포함되지 않는다. 계면활성제(F)의 함유량이 상기한 범위 내에 있으면, 도막의 평탄성을 보다 양호하게 할 수 있다. The content of the surfactant (F) is preferably 0.001% by mass or more and 0.2% by mass or less, more preferably 0.002% by mass or more and 0.1% by mass or less, further preferably 0.01% by mass or more relative to the total amount of the colored curable resin composition 0.05% by mass or less. On the other hand, the content of the pigment dispersant is not included in this content. When the content of the surfactant (F) is within the above range, the flatness of the coating film can be improved.
<그 밖의 성분> ≪ Other components >
본 발명의 착색 경화성 수지 조성물은 필요에 따라서 충전제, 다른 고분자 화합물, 밀착촉진제, 산화방지제, 광안정제, 연쇄이동제 등, 이 기술분야에서 공지된 첨가제를 포함하더라도 좋다. The colored curable resin composition of the present invention may contain additives known in the art such as fillers, other polymer compounds, adhesion promoters, antioxidants, light stabilizers, chain transfer agents and the like, if necessary.
<착색 경화성 수지 조성물의 제조 방법> ≪ Process for producing colored curable resin composition >
본 발명의 착색 경화성 수지 조성물은 예컨대 화합물 (1), 수지(B), 중합성 화합물(C), 중합 개시제(D) 및 유기 금속 화합물(M) 및 필요에 따라서 이용되는 안료(A1), 염료(A2), 중합 개시 조제(D1), 계면활성제(F), 용제(E) 및 기타 성분을 혼합함으로써 조제할 수 있다. The colored curable resin composition of the present invention can be obtained, for example, by mixing the compound (1), the resin (B), the polymerizable compound (C), the polymerization initiator (D) and the organometallic compound (M) (A2), a polymerization initiator (D1), a surfactant (F), a solvent (E) and other components.
안료(A1)를 포함하는 경우, 안료(A1)를 미리 용제(E)의 일부 또는 전부와 혼합하여, 안료의 평균 입자경이 0.2 ㎛ 이하 정도가 될 때까지 비드밀 등을 이용하여 분산시키는 것이 바람직하다. 이 때, 필요에 따라서 수지(B)의 일부 또는 전부, 상기 안료 분산제를 배합하더라도 좋다. 얻어진 안료 분산액에 나머지 성분 등을 소정의 농도가 되도록 혼합함으로써 목적으로 하는 착색 경화성 수지 조성물을 조제할 수 있다. When the pigment (A1) is contained, it is preferable to mix the pigment (A1) with a part or the whole of the solvent (E) in advance and disperse by using a bead mill or the like until the average particle diameter of the pigment becomes about 0.2 탆 or less Do. At this time, if necessary, a part or all of the resin (B) and the pigment dispersant may be blended. The desired colored curable resin composition can be prepared by mixing the remaining components or the like to the obtained pigment dispersion to a predetermined concentration.
화합물 (1) 및 염료(A2)를 포함하는 경우의 염료(A2)는 미리 용제(E)의 일부 또는 전부에 각각 용해시켜 미리 용액을 조제하더라도 좋다. 이 용액을 구멍 직경 0.01∼1 ㎛ 정도의 필터로 여과하는 것이 바람직하다. The dye (A2) in the case of containing the compound (1) and the dye (A2) may be previously dissolved in a part or all of the solvent (E) to prepare a solution in advance. The solution is preferably filtered through a filter having a pore diameter of about 0.01 to 1 mu m.
혼합 후의 착색 경화성 수지 조성물을 구멍 직경 0.01∼10 ㎛ 정도의 필터로 여과하는 것이 바람직하다. The colored curable resin composition after mixing is preferably filtered with a filter having a pore diameter of about 0.01 to 10 mu m.
<컬러 필터 및 액정 표시 장치의 제조 방법> ≪ Color filter and manufacturing method of liquid crystal display device >
본 발명의 착색 경화성 수지 조성물로부터 컬러 필터의 착색 패턴을 제조하는 방법으로서는 포토리소그래프법, 잉크젯법, 인쇄법 등을 들 수 있다. 그 중에서도 포토리소그래프법이 바람직하다. 포토리소그래프법은 본 발명의 착색 경화성 수지 조성물을 기판에 도포하고, 용제 등의 휘발 성분을 제거하거나 하여 건조시켜 조성물층을 형성한다. 이어서, 포토마스크를 통해 상기 조성물층을 노광하여 현상하는 방법이다. 현상 후, 필요에 따라서 가열함으로써 착색 패턴을 형성할 수 있다. 상기 착색 패턴의 형성 방법에 있어서, 노광할 때에 포토마스크를 이용하지 않음으로써 및/또는 현상하지 않음으로써, 상기 조성물층의 경화물인 착색 도막을 형성할 수 있다. 이렇게 하여 얻어지는 착색 패턴 및 착색 도막을 컬러 필터로 할 수 있다.Examples of a method for producing a coloring pattern of a color filter from the colored curable resin composition of the present invention include a photolithographic method, an inkjet method, and a printing method. Among them, the photolithographic method is preferable. In the photolithography method, the colored curable resin composition of the present invention is applied to a substrate, and a volatile component such as a solvent is removed and dried to form a composition layer. Then, the composition layer is exposed through a photomask to perform development. After development, a colored pattern can be formed by heating as required. In the method for forming a colored pattern, a colored coating film which is a cured product of the composition layer can be formed by not using and / or not developing a photomask when exposed. The coloring pattern and the colored coating film thus obtained can be used as a color filter.
제작하는 컬러 필터의 막 두께는 특별히 한정되지 않고 목적이나 용도 등에 따라서 적절하게 조정할 수 있으며, 예컨대 0.1∼30 ㎛, 바람직하게는 0.1∼20 ㎛, 더욱 바람직하게는 0.5∼6 ㎛이다. The film thickness of the color filter to be produced is not particularly limited and may be suitably adjusted in accordance with the purpose and application, and is, for example, from 0.1 to 30 탆, preferably from 0.1 to 20 탆, more preferably from 0.5 to 6 탆.
기판으로서는 석영 유리, 붕규산 유리, 알루미나규산염 유리, 표면을 실리카 코트한 소다 석회 유리 등의 유리판이나, 폴리카보네이트, 폴리메타크릴산메틸, 폴리에틸렌테레프탈레이트 등의 수지판, 실리콘, 상기 기판 상에 알루미늄, 은, 은/구리/팔라듐 합금 박막 등을 형성한 것이 이용된다. 이들 기판 상에는 별도의 컬러 필터층, 수지층, 트랜지스터, 회로 등이 형성되어 있더라도 좋다. Examples of the substrate include glass plates such as quartz glass, borosilicate glass, alumina silicate glass and soda lime glass whose surface is coated with silica, resin plates such as polycarbonate, polymethylmethacrylate, and polyethylene terephthalate, silicon, A silver / copper / palladium alloy thin film, or the like is formed. A separate color filter layer, a resin layer, a transistor, a circuit, and the like may be formed on these substrates.
이어서, 박막 트랜지스터(이하 「TFT」라고 함)가 형성된 유리 기판 상에 패턴을 형성하는 방법에 관해서 설명한다. Next, a method of forming a pattern on a glass substrate on which a thin film transistor (hereinafter referred to as " TFT ") is formed will be described.
구체적으로는, 포토리소그래피 기술 등의 공지된 방법에 의해서 유리 기판(21) 상에 복수의 TFT(22)를 화소마다 형성한다(도 1 참조). TFT(22)는 유리 기판(21) 상에 예컨대 몰리브덴(Mo)에 의해 형성되는 동시에 게이트선의 일부를 구성하는 게이트 전극(22a)과, 이 게이트 전극(22a) 상에 형성된 예컨대 질화막(SiNx)과 산화막(SiO2)과의 적층막으로 이루어지는 게이트 절연막(22b)과, 이 게이트 절연막(22b) 상에 형성된 다결정 실리콘막(22c)과, 예컨대 산화막(SiO2)과 질화막(SiNx)의 적층막에 의해 형성된 보호막(22d)에 의해 구성되어 있다. 다결정 실리콘막(22c)의 게이트 전극(22a)에 대향하는 영역이 TFT(22)의 채널 영역, 또한 이 채널 영역 양측의 영역이 소스 영역 또는 드레인 영역으로 되어 있다. 다결정 실리콘막(22c)의 소스 영역은 보호막(22d)에 형성된 접속 구멍(컨택트 홀)을 통해 예컨대 알루미늄(Al)에 의해 형성된 신호선(27)에 전기적으로 접속되어 있다. 한편, 다결정 실리콘막(22c)의 드레인 영역은 후술하는 것과 같이 접속 구멍(컨택트 홀)(201)을 통해 화소 전극(24)과 전기적으로 접속되도록 되어 있다. Specifically, a plurality of
유리 기판(21) 상에 복수의 TFT(22)를 화소마다 형성할 때, 유리 기판(21) 상에 TFT(22)와 동시에 얼라이먼트 마크(도시하지 않음)를 형성한다. 이 얼라이먼트 마크는 후술하는 것과 같이 컬러 필터층(23)의 형성 공정에 있어서의 위치맞춤의 기준이 된다. 한편, 이들 얼라이먼트 마크는 구동 기판과 대향 기판과의 접합의 기준이 되는 마크와 겸용할 수도 있다. 얼라이먼트 마크는 TFT(22)의 제조 프로세스에 있어서 배선 등의 금속층이나 다결정 실리콘층을 형성할 때에 적어도 그 일층을 이용하여 동일 공정에서 형성할 수 있다. Alignment marks (not shown) are formed on the
이어서, TFT(22) 및 얼라이먼트 마크가 형성된 유리 기판(21) 상에, 본 발명의 착색 경화성 수지 조성물을 도포하여, 가열 건조(프리베이크) 및/또는 감압 건조함으로써 용제 등의 휘발 성분을 제거하여 건조시켜, 막 두께 0.5∼5.0 ㎛, 예컨대 1.0 ㎛의 조성물층을 형성한다. Subsequently, the colored curable resin composition of the present invention is applied onto the
도포 방법으로서는 스핀코트법, 슬릿코트법, 슬릿&스핀코트법 등을 들 수 있다. Examples of the application method include a spin coat method, a slit coat method, and a slit & spin coat method.
가열 건조를 행하는 경우의 온도는 30∼120℃가 바람직하고, 50∼110℃가 보다 바람직하다. 또한 가열 시간으로서는 10초간∼60분간인 것이 바람직하고, 30초간∼30분간인 것이 보다 바람직하다. The temperature in the case of heat drying is preferably 30 to 120 占 폚, more preferably 50 to 110 占 폚. The heating time is preferably 10 seconds to 60 minutes, more preferably 30 seconds to 30 minutes.
감압 건조를 행하는 경우는 50∼150 Pa의 압력 하에 20∼25℃의 온도 범위에서 행하는 것이 바람직하다. In the case of carrying out the reduced pressure drying, it is preferably carried out at a temperature of 20 to 25 캜 under a pressure of 50 to 150 Pa.
이어서, 포토마스크(도시하지 않음)를 통해 조성물층에 대하여 자외선을 조사하고, 또한 현상액에 의해 불필요부(미노광부)를 선택적으로 제거함으로써, 다결정 실리콘막(22c)의 드레인 영역에 달하는 접속 구멍(컨택트 홀)(201)이 형성된 화소에 성형된 조성물층을 얻은 후에 물로 씻는다. Subsequently, ultraviolet rays are irradiated to the composition layer through a photomask (not shown), and unnecessary portions (unexposed portions) are selectively removed by a developer to form connection holes (not shown) reaching the drain regions of the
현상에 의해 조성물층의 미노광부가 현상액에 용해되어 제거된다. 현상액으로서는 예컨대 수산화칼륨, 탄산수소나트륨, 탄산나트륨, 수산화테트라메틸암모늄 등의 알칼리성 화합물의 수용액이 바람직하다. 이들 알칼리성 화합물의 수용액 중의 농도는 바람직하게는 0.01∼10 질량%이며, 보다 바람직하게는 0.03∼5 질량%이다. 또한, 현상액은 계면활성제를 포함하고 있더라도 좋다. By the development, the unexposed portion of the composition layer is dissolved and removed in the developer. As the developer, an aqueous solution of an alkaline compound such as potassium hydroxide, sodium hydrogencarbonate, sodium carbonate, tetramethylammonium hydroxide or the like is preferable. The concentration of these alkaline compounds in the aqueous solution is preferably 0.01 to 10 mass%, and more preferably 0.03 to 5 mass%. In addition, the developer may contain a surfactant.
현상 방법은 퍼들법, 디핑법 및 스프레이법 등의 어느 것이라도 좋다. 또한 현상시에 기판을 임의의 각도로 기울이더라도 좋다. The developing method may be any of a puddle method, a dipping method and a spraying method. Further, the substrate may be inclined at an arbitrary angle at the time of development.
그 후, 접속 구멍(컨택트 홀)(201)이 형성된 조성물층을 재유동(리플로우) 및/또는 경화시키기 위해서 예컨대 150∼250℃의 범위, 바람직하게는 160∼235℃ 범위의 온도에서 1∼120분간이 바람직하고, 10∼60분간 가열한다. 이렇게 하여, 착색 경화성 수지 조성물층(23A)이 형성된다. 이 착색 경화성 수지 조성물층(23A)이 본 발명의 컬러 필터에 대응하고 있다. Thereafter, in order to reflow and / or cure the composition layer in which the connection hole (contact hole) 201 is formed, it is preferable to heat the composition layer at a temperature in the range of 150 to 250 占 폚, preferably 160 to 235 占 폚, 120 minutes is preferable, and heating is performed for 10 to 60 minutes. Thus, the colored curable resin composition layer 23A is formed. This colored curable resin composition layer 23A corresponds to the color filter of the present invention.
이 조작을 반복하여, 적색 착색 경화성 수지 조성물, 녹색 착색 경화성 수지 조성물 및 청색 착색 경화성 수지 조성물로부터 각각 착색 경화성 수지 조성물층(23A)을 형성함으로써, 화소열마다 대응하여 적색 필터(23a), 녹색 필터(23b) 및 청색 필터(23c)를 포함하는 컬러 필터층(23)이 형성된다(도 2 참조). 컬러 필터층(23)의 각 필터 사이의 영역은 인접하는 색의 혼합 영역이 되는데, 이 영역은 신호선(27)에 대향한 차광 영역이므로, 특별히 품질상 지장은 없다. 한편, 이 각 필터 사이의 영역은 착색되지 않도록 하더라도 좋다. This operation is repeated to form the colored curable resin composition layer 23A from the red colored curable resin composition, the green colored curable resin composition and the blue colored curable resin composition, respectively, so that the
이어서, 예컨대 스핀코트법에 의해서 컬러 필터층(23)을 덮도록 예컨대 막 두께 0.3∼2.0 ㎛의 보호막으로서의 감광성 수지막(29)을 형성한다. 이어서, 포토마스크(도시하지 않음)를 통해 감광성 수지막(29)에 대하여 자외선을 조사하고, 또한 현상액에 의해서 접속 구멍(201)에 대응하는 영역 및 불필요부를 선택적으로 제거함으로써 다결정 실리콘막(22c)의 드레인 영역에 달하는 접속 구멍(컨택트 홀)(202)을 형성한 후에 물로 씻는다. 그 후, 감광성 수지막(29)의 재유동(리플로우)을 위해, 100∼300℃ 범위의 온도, 예컨대 200℃에서 가열한다. 이어서, 컨택트홀(202) 내에 퇴적된 염료 등의 잔사 및 유기물을 제거하기 위해서, 산소 플라즈마에 의한 에칭을 하고, 또한 산소 플라즈마에 의해서 형성된 산화막을 제거하기 위해서 예컨대 희불산에 의해 에칭한다. Next, for example, a
이어서, 감광성 수지막(29) 상에 예컨대 스퍼터링법에 의해 투명 도전 재료, 예컨대 ITO(Indium-Tin Oxide: 인듐과 주석의 산화물 혼합막)를 형성하고, 이 IT0막을 포토리소그래피 기술 및 에칭에 의해 패터닝하여, 투명한 화소 전극(24)을 형성한다(도 3 참조). 한편, 이 화소 전극(24)은 제작하는 디바이스에 따라서는 알루미늄(Al)이나 은(Ag) 등의 금속에 의해 형성하도록 하더라도 좋다. 그 후에는 기지의 방법에 의해 배향막을 형성한 후, 이 구동 기판과 대향 기판과의 접합을 행함으로써 액정 표시 장치를 제조할 수 있다. Then, a transparent conductive material such as ITO (Indium-Tin Oxide: an oxide mixture film of indium and tin) is formed on the
본 발명의 착색 경화성 수지 조성물에 따르면, 특히 명도 및 콘트라스트가 우수한 컬러 필터를 제작할 수 있다. 이 컬러 필터는 표시 장치(예컨대, 액정 표시 장치, 유기 EL 장치, 전자 페이퍼 등) 및 고체 촬상 소자에 이용되는 컬러 필터로서 유용하다.According to the colored curable resin composition of the present invention, a color filter having excellent brightness and contrast can be produced. This color filter is useful as a color filter used in a display device (e.g., a liquid crystal display device, an organic EL device, an electronic paper, etc.) and a solid-state image pickup device.
실시예Example
이어서 실시예를 들어 본 발명을 더욱 구체적으로 설명한다. 예에서 함유량 내지 사용량을 나타내는 % 및 부는 특별히 기재가 없는 한, 질량 기준이다. Hereinafter, the present invention will be described in more detail with reference to Examples. In the examples, "%" and "parts" indicating the content or amount are based on mass unless otherwise specified.
이하의 합성예에 있어서, 화합물은 질량 분석(LC; Agilent 제조 1200형, MASS; Agilent 제조 LC/MSD형)에 의해 동정했다. In the following synthesis examples, the compound was identified by mass analysis (LC: Agilent 1200 type, MASS; manufactured by Agilent, LC / MSD type).
[합성예 1][Synthesis Example 1]
식 (1a)로 표시되는 화합물 20부와 N-에틸-o-톨루이딘(와코쥰야쿠고교(주) 제조) 200부를 차광 조건 하에 혼합하여 얻어진 용액을 110℃에서 6시간 교반했다. 얻어진 반응액을 실온까지 냉각한 후, 물 800부, 35% 염산 50부의 혼합액 중에 첨가하여 실온에서 1시간 교반한 바, 결정이 석출되었다. 석출된 결정을 흡인 여과의 잔사로서 취득한 후 건조하여 식 (1-1)로 표시되는 화합물 24부를 얻었다. 수율은 80%였다. A solution obtained by mixing 20 parts of the compound represented by the formula (1a) and 200 parts of N-ethyl-o-toluidine (Wako Pure Chemical Industries, Ltd.) under light-shielding conditions was stirred at 110 ° C for 6 hours. The obtained reaction solution was cooled to room temperature, added to a mixed solution of 800 parts of water and 50 parts of 35% hydrochloric acid, and the mixture was stirred at room temperature for 1 hour to precipitate crystals. The precipitated crystals were collected as a residue of suction filtration and dried to obtain 24 parts of a compound represented by the formula (1-1). The yield was 80%.
식 (1-1)로 표시되는 화합물의 동정Identification of the compound represented by the formula (1-1)
(질량 분석) 이온화 모드=ESI+: m/z=[M+H]+ 603.4 (Mass analysis) Ionization mode = ESI +: m / z = [M + H] + 603.4
Exact Mass: 602.2Exact Mass: 602.2
[합성예 2] [Synthesis Example 2]
N-에틸-o-톨루이딘 대신에 N-이소프로필-2,6-디메틸아닐린을 이용하는 것 이외에는 합성예 1과 같은 식으로 하여 식 (1-6)으로 표시되는 화합물을 얻었다. (1-6) was obtained in the same manner as in Synthesis Example 1 except that N-isopropyl-2,6-dimethylaniline was used instead of N-ethyl-o-toluidine.
식 (1-6)으로 표시되는 화합물의 동정Identification of the compound represented by the formula (1-6)
(질량 분석) 이온화 모드= ESI+: m/z=[M+H]+ 659.4 (Mass analysis) Ionization mode = ESI +: m / z = [M + H] + 659.4
Exact Mass: 658.3Exact Mass: 658.3
[합성예 3][Synthesis Example 3]
냉각관 및 교반 장치를 구비한 플라스크에, 식 (A2-1a)로 표시되는 화합물 및 식 (A2-1b)로 표시되는 화합물의 혼합물(상품명 Chugai Aminol Fast Pink R; 쥬가이가세이 제조)를 15부, 클로로포름 150부 및 N,N-디메틸포름아미드 8.9부를 투입하여, 교반 하에 20℃ 이하를 유지하면서 염화티오닐 10.9부를 적하하여 가했다. 적하 종료 후, 50℃로 승온하여, 동 온도에서 5시간 유지하여 반응시키고, 그 후 20℃로 냉각했다. 냉각 후의 반응 용액을 교반 하에 20℃ 이하로 유지하면서 2-에틸헥실아민 12.5부 및 트리에틸아민 22.1부의 혼합액을 적하하여 가했다. 그 후, 동 온도에서 5시간 교반하여 반응시켰다. 이어서 얻어진 반응 혼합물을 로터리 에바포레이터로 용매 유거한 후, 메탄올을 소량 가하여 격하게 교반했다. 이 혼합물을 이온교환수 375부의 혼합액 중에 교반하면서 가하여 결정을 석출시켰다. 석출된 결정을 여과 분별하여 이온교환수로 잘 세정하고, 60℃에서 감압 건조하여, 염료(A2-1)(식 (A2-1-1)∼식 (A2-1-8)로 표시되는 화합물의 혼합물) 11.3부를 얻었다. A mixture of a compound represented by the formula (A2-1a) and a compound represented by the formula (A2-1b) (trade name: Chugai Aminol Fast Pink R; manufactured by Juga Igasai) was added to a flask equipped with a condenser and a cooling tube , 150 parts of chloroform and 8.9 parts of N, N-dimethylformamide were charged and 10.9 parts of thionyl chloride was added dropwise while maintaining the temperature at 20 占 폚 or lower with stirring. After completion of the dropwise addition, the temperature was raised to 50 캜, and the reaction was maintained at the same temperature for 5 hours and then cooled to 20 캜. After cooling, the reaction solution was added dropwise with stirring a mixture of 12.5 parts of 2-ethylhexylamine and 22.1 parts of triethylamine while keeping the temperature at 20 ° C or lower. Thereafter, the reaction was carried out by stirring at the same temperature for 5 hours. Subsequently, the obtained reaction mixture was distilled off with a rotary evaporator, and then a small amount of methanol was added thereto. This mixture was added to a mixed solution of 375 parts of ion-exchanged water with stirring to precipitate crystals. The precipitated crystals were separated by filtration, washed well with ion-exchanged water and dried under reduced pressure at 60 ° C to obtain a dye (A2-1) (a compound represented by the formula (A2-1-1) to (A2-1-8) ) Was obtained.
[합성예 4][Synthesis Example 4]
교반기, 온도계, 환류 냉각기 및 적하 깔대기를 갖춘 플라스크 내에 질소를 0.02 L/분으로 흘려 질소 분위기로 하고, 젖산에틸 305부를 넣어 교반하면서 70℃까지 가열했다. 이어서, 메타크릴산 60부, 3,4-에폭시트리시클로[5.2.1.02.6]데실아크릴레이트(식 (I-1)로 표시되는 화합물 및 식 (II-1)로 표시되는 화합물을 몰비로 50:50으로 혼합) 240부 및 젖산에틸 140부에 용해하여 용액을 조제하고, 이 용액을 적하 깔대기를 이용하여 4시간 걸쳐 70℃로 보온한 플라스크 내에 적하했다. Nitrogen was flowed at 0.02 L / min in a flask equipped with a stirrer, a thermometer, a reflux condenser, and a dropping funnel, and 305 parts of ethyl lactate was added and heated to 70 캜 with stirring. Subsequently, 60 parts of methacrylic acid, 3,4-epoxytricyclo [5.2.1.0 2,6 ] decyl acrylate (the compound represented by the formula (I-1) and the compound represented by the formula (II-1) : 50) and 140 parts of ethyl lactate to prepare a solution, and this solution was dropped into a flask kept at 70 캜 for 4 hours by using a dropping funnel.
한편, 중합 개시제 2,2'-아조비스(2,4-디메틸발레로니트릴) 30부를 젖산에틸 225부에 용해한 용액을 별도의 적하 깔대기를 이용하여 4시간 걸쳐 플라스크 내에 적하했다. 중합 개시제 용액의 적하가 종료된 후, 4시간, 70℃로 유지하고, 그 후 실온까지 냉각하여, 중량 평균 분자량(Mw)은 1.3×104, 분자량 분포가 2.5, 고형분 35.4%, 고형분 환산의 산가는 103 mgKOH/g인 수지 B1 용액을 얻었다. 수지 B1은 하기에 나타내는 구조 단위를 갖는다. On the other hand, a solution prepared by dissolving 30 parts of polymerization initiator 2,2'-azobis (2,4-dimethylvaleronitrile) in 225 parts of ethyl lactate was added dropwise to the flask over 4 hours using a separate dropping funnel. After the dropwise addition of the polymerization initiator solution was completed, the solution was maintained at 70 캜 for 4 hours and then cooled to room temperature to obtain a polymer having a weight average molecular weight (Mw) of 1.3 x 10 4 , a molecular weight distribution of 2.5, a solid content of 35.4% A resin B1 solution having an acid value of 103 mgKOH / g was obtained. Resin B1 has the following structural unit.
합성예에서 얻어진 수지의 중량 평균 분자량(Mw) 및 수평균 분자량(Mn)의 측정은 GPC법을 이용하여 이하의 조건으로 행했다. The weight average molecular weight (Mw) and the number average molecular weight (Mn) of the resin obtained in Synthesis Example were measured by the GPC method under the following conditions.
장치; K2479((주)시마즈세이사쿠쇼 제조)Device; K2479 (manufactured by Shimadzu Seisakusho Co., Ltd.)
컬럼; SHIMADZU Shim-pack GPC-80M column; SHIMADZU Shim-pack GPC-80M
컬럼 온도; 40℃ Column temperature; 40 ℃
용매; THF(테트라히드로푸란)menstruum; THF (tetrahydrofuran)
유속; 1.0 mL/min Flow rate; 1.0 mL / min
검출기; RI Detector; RI
교정용 표준 물질; TSK STANDARD POLYSTYRENE F-40, F-4, F-288, A-2500, A-500(도소(주) 제조)Calibration standards; TSK STANDARD POLYSTYRENE F-40, F-4, F-288, A-2500, A-500 (manufactured by TOSOH CORPORATION)
상기에서 얻어진 폴리스티렌 환산의 중량 평균 분자량 및 수평균 분자량의 비(Mw/Mn)를 분자량 분포로 했다. The ratio (Mw / Mn) of the weight average molecular weight and the number average molecular weight in terms of polystyrene obtained in the above was regarded as molecular weight distribution.
실시예 1∼6 및 비교예 1Examples 1 to 6 and Comparative Example 1
표 1에 나타내는 조성이 되도록 각 성분을 혼합하여 착색 경화성 수지 조성물을 얻었다. Each component was mixed so as to have the composition shown in Table 1 to obtain a colored curable resin composition.
1)「A1-1」은 아크릴계 안료 분산제 및 「E-13)」란에 기재한 양의 프로필렌글리콜모노메틸에테르아세테이트와 혼합하여 미리 분산시킨 것을 이용했다. 1) " A1-1 " was preliminarily dispersed by mixing with an acrylic pigment dispersant and an amount of propylene glycol monomethyl ether acetate as described in " E- 13) & quot ;.
2)「E-12)」란은 프로필렌글리콜모노메틸에테르아세테이트 함유량의 합계를 나타낸다. 2) "E-1 2) " represents the sum of propylene glycol monomethyl ether acetate content.
표 1에서 각 성분은 이하의 것을 나타낸다. Each component in Table 1 shows the following.
(A) 착색제: 1-1: 식 (1-1)로 표시되는 화합물(A) Colorant: 1-1: Compound represented by formula (1-1)
(A) 착색제: 1-6: 식 (1-6)으로 표시되는 화합물 (A) Colorant: 1-6: Compound represented by formula (1-6)
(A) 착색제: A1-1: C.I. 피그먼트 블루 15:6(안료)(A) Colorant: A1-1: C.I. Pigment Blue 15: 6 (pigment)
(A) 착색제: A2-1: 염료(A2-1)(A) Colorant: A2-1: Dye (A2-1)
(B) 수지: B-1: 수지 B1 용액(B) Resin: B-1: Resin B1 solution
(C) 중합성 화합물: 디펜타에리스리톨헥사아크릴레이트(니혼가야쿠(주) 제조; KAYARAD(등록상표) DPHA)(C) Polymerizable compound: dipentaerythritol hexaacrylate (KAYARAD (registered trademark) DPHA, manufactured by Nippon Kayaku Co., Ltd.)
(D) 중합 개시제: N-벤조일옥시-1-(4-페닐술파닐페닐)옥탄-1-온-2-이민(이르가큐어(등록상표) OXE 01; BASF사 제조)(D) A polymerization initiator: N-benzoyloxy-1- (4-phenylsulfanylphenyl) octan-1-one-2-imine (Irgacure (registered trademark) OXE 01,
(M) 유기 금속 화합물: M-1: 비스(디부틸디티오카르바민산)아연(M) Organometallic compound: M-1: Bis (dibutyldithiocarbamic acid) zinc
(M) 유기 금속 화합물: M-2: 비스[비스(2-히드록시에틸)디티오카르바민산]아연(M) Organometallic compound: M-2: Bis [bis (2-hydroxyethyl) dithiocarbamic acid] Zinc
(M) 유기 금속 화합물: M-3: 트리스(2,4-펜탄디오네이토)인듐(M) Organometallic compound: M-3: tris (2,4-pentanedione) indium
(M) 유기 금속 화합물: M-4: 트리스(2,4-펜탄디오네이토)알루미늄(M) Organometallic compound: M-4: Tris (2,4-pentanedione) aluminum
(M) 유기 금속 화합물: M-5: 비스(2,4-펜탄디오네이토)니켈(II)(M) Organometallic compound: M-5: Bis (2,4-pentanedione) nickel (II)
(M) 유기 금속 화합물: M-6: 비스(2,4-펜탄디오네이토)코발트(II)(M) Organometallic compound: M-6: Bis (2,4-pentanedionato) cobalt (II)
(E) 용제: E-1: 프로필렌글리콜모노메틸에테르아세테이트(E) Solvent: E-1: Propylene glycol monomethyl ether acetate
(E) 용제: E-2: 프로필렌글리콜모노메틸에테르(E) Solvent: E-2: Propylene glycol monomethyl ether
(E) 용제: E-3: 젖산에틸(E) Solvent: E-3: Ethyl lactate
(F) 계면활성제: 불소계 계면활성제(메가파크(등록상표) F554; DIC(주) 제조)(F) Surfactant: fluorine surfactant (Megapark (registered trademark) F554, manufactured by DIC Corporation)
[몰 흡광 계수의 산출][Calculation of molar extinction coefficient]
메스플라스크에 시료를 각각 0.1 g 칭량하여 넣고, 이어서 젖산에틸로 0.250 L가 되도록 희석했다. 이 용액에 대해서 자외가시분광광도계(V-650DS; 니혼분코(주) 제조)(석영 셀, 광로 길이; 1 cm)로 흡수 스펙트럼을 측정하여, Lambert-Beer 법칙을 이용하여 가시광 영역(380 nm∼780 nm)에 있어서의 몰 흡광 계수(ε)의 최대치[εM]를 산출했다. 결과를 표 2에 나타낸다. Each sample was weighed in a measuring flask of 0.1 g, and then diluted to 0.250 L with ethyl lactate. The absorption spectrum of this solution was measured with a spectrophotometer (V-650DS; manufactured by Nihon Bunko Co., Ltd.) (quartz cell, optical path length: 1 cm), and the absorption spectrum was measured using a Lambert- The maximum value [? M ] of the molar extinction coefficient? The results are shown in Table 2.
[(L/(mol·cm)]Maximum value of molar extinction coefficient
[(L / (mol · cm)]
[착색 패턴의 형성][Formation of coloring pattern]
2 inch square의 유리 기판(이글 XG; 코닝사 제조) 상에, 착색 경화성 조성물을 스핀코트법으로 도포한 후, 100℃에서 3분간 프리베이크하여 착색 조성물층을 얻었다. 냉각 후, 착색 조성물층이 형성된 유리 기판과 석영 유리로 만든 포토마스크와의 간격을 100 ㎛로 하여 노광기(TME-150RSK; 토프콘(주) 제조)를 이용하여, 대기 분위기 하에 150 mJ/㎠의 노광량(365 nm 기준)으로 광조사했다. 포토마스크로서는 100 ㎛ 라인&스페이스 패턴이 형성된 것을 사용했다. 광조사 후, 상기 도막을 비이온계 계면활성제 0.12%와 수산화칼륨 0.04%를 포함하는 수계 현상액에 23℃에서 80초간 침지 현상하여, 물로 씻은 후, 오븐 속에서 220℃에서 20분간 포스트 베이크를 하여, 착색 패턴을 얻었다. The colored curable composition was applied on a 2 inch square glass substrate (Eagle XG; Corning) by spin coating, and then prebaked at 100 ° C for 3 minutes to obtain a colored composition layer. After cooling, the glass substrate with the coloring composition layer formed thereon and the photomask made of quartz glass were set to 100 mu m in an interval of 150 mJ / cm < 2 > (manufactured by Toshiba Corporation) And irradiated with light at an exposure amount (based on 365 nm). As the photomask, a substrate having a 100 占 퐉 line and space pattern was used. After the light irradiation, the coating film was immersed in an aqueous developer containing 0.12% of a nonionic surfactant and 0.04% of potassium hydroxide at 23 DEG C for 80 seconds, washed with water, and postbaked in an oven at 220 DEG C for 20 minutes , And a coloring pattern was obtained.
[막 두께 측정][Measurement of film thickness]
얻어진 착색 패턴에 대해서 막 두께를 막 두께 측정 장치(DEKTAK3; 니혼신쿠기쥬츠(주) 제조))를 이용하여 측정했다. 결과를 표 3에 나타낸다. The film thickness of the resulting colored pattern was measured using a film thickness measuring device (DEKTAK3, manufactured by Nihon Shinkuigi Co., Ltd.)). The results are shown in Table 3.
[색도 평가][Evaluation of color]
얻어진 유리 기판 상의 착색 패턴에 대해서 측색기(OSP-SP-200; 올림푸스(주) 제조)를 이용하여 분광을 측정하고, C 광원의 등색 함수를 이용하여 CIE의 XYZ 표색계에 있어서의 xy 색도 좌표(x,y) 및 3 자극치 Y를 측정했다. Y의 값이 클수록 명도가 높음을 나타낸다. 결과를 표 3에 나타낸다. Spectroscopy was performed using a colorimeter (OSP-SP-200, manufactured by Olympus Corporation) with respect to the obtained color pattern on the glass substrate, and the xy chromaticity coordinates (x , y) and the tristimulus value Y were measured. The larger the value of Y, the higher the brightness. The results are shown in Table 3.
[콘트라스트 평가][Evaluation of contrast]
포토마스크의 사용 없이 노광하는 것 이외에는 착색 패턴의 형성과 같은 조작을 하여 유리 기판 상에 착색 도막을 형성했다. 얻어진 도막에 대해서, 콘트라스트 측색기(CT-1; 츠보사카덴키사 제조, 검출기; BM-5A, 광원; F-10)를 이용하여, 블랭크치를 30000으로 하여 콘트라스트를 측정했다. 착색 도막을 형성한 유리 기판을 편광 필름(POLAX-38S; 루케오사 제조)으로 사이에 끼운 것을 측정 샘플로 했다. 결과를 표 3에 나타낸다.Except that exposure was performed without using a photomask, a colored coating film was formed on the glass substrate by the same operation as formation of a colored pattern. Using a contrast colorimeter (CT-1; manufactured by Tsubosaka Denshoku Co., Ltd., detector: BM-5A, light source: F-10), the obtained coating film was subjected to contrast measurement with a blank value of 30,000. A glass substrate on which a colored coating film was formed was sandwiched by a polarizing film (POLAX-38S, manufactured by LuKeo Corporation) to obtain a measurement sample. The results are shown in Table 3.
실시예의 결과로부터, 본 발명의 착색 경화성 수지 조성물로부터 얻어진 착색 패턴은 높은 명도의 청색을 보이고, 또한 콘트라스트도 높은 것이 확인되었다. 이로부터, 본 발명의 착색 경화성 수지 조성물로부터 얻어진 패턴은 고명도의 컬러 필터로서 유용하고, 또한 상기 컬러 필터를 포함하는 표시 장치는 표시 특성이 우수한 것을 알 수 있다. From the results of the examples, it was confirmed that the coloring pattern obtained from the colored curable resin composition of the present invention exhibited a high brightness of blue and a high contrast. From this, it can be seen that the pattern obtained from the colored curable resin composition of the present invention is useful as a high-definition color filter, and the display device including the color filter has excellent display characteristics.
본 발명의 착색 경화성 수지 조성물에 의하면, 고명도의 컬러 필터를 형성할 수 있다. According to the colored curable resin composition of the present invention, a high-definition color filter can be formed.
21: 유리 기판 22: TFT(스위칭 소자)
22a: 게이트 전극 22b: 게이트 절연막
22c: 다결정 실리콘막 22d: 보호막
23: 컬러 필터층 23A: 착색 경화성 수지 조성물층(컬러 필터)
23a: 적색 필터 23b: 녹색 필터
23c: 청색 필터 24: 화소 전극
27: 신호선 29: 감광성 수지막(보호막)
201, 202: 접속 구멍21: glass substrate 22: TFT (switching element)
22a:
22c:
23: color filter layer 23A: colored curable resin composition layer (color filter)
23a:
23c: blue filter 24: pixel electrode
27: Signal line 29: Photosensitive resin film (protective film)
201, 202: Connection holes
Claims (5)
착색제가 하기 식 (1)로 표시되는 화합물을 포함하는 착색제이고,
유기 금속 화합물이 하기 식 (F1)로 표시되는 화합물, 하기 식 (F2)로 표시되는 화합물 및 이들의 수화물로 이루어지는 군에서 선택되는 1종 이상이고,
유기 금속 화합물의 가시광 영역에 있어서의 몰 흡광 계수의 최대치가 식 (1)로 표시되는 화합물의 가시광 영역에 있어서의 몰 흡광 계수의 최대치보다도 작은 착색 경화성 수지 조성물.
[식 (1)에서, R1 및 R2는 각각 독립적으로 치환기를 갖고 있더라도 좋은 페닐기를 나타낸다.
R3 및 R4는 각각 독립적으로 탄소수 1∼10의 1가의 포화 탄화수소기를 나타내고, 이 포화 탄화수소기에 포함되는 수소 원자는, 탄소수 6∼10의 방향족 탄화수소기 또는 할로겐 원자로 치환되어 있더라도 좋고, 이 방향족 탄화수소기에 포함되는 수소 원자는, 탄소수 1∼3의 알킬기 또는 탄소수 1∼3의 알콕시기로 치환되어 있더라도 좋고, 상기 포화 탄화수소기에 포함되는 -CH2-는 -O-, -CO- 또는 -NR11-로 치환되어 있더라도 좋다.
R1 및 R3은 질소 원자와 함께 질소 원자를 포함하는 고리를 형성하더라도 좋고, R2 및 R4는 질소 원자와 함께 질소 원자를 포함하는 고리를 형성하더라도 좋다.
R5는 -OH, -SO3H, -SO3 -Z+, -CO2H, -CO2 -Z+, -CO2R8, -SO3R8 또는 -SO2NR9R10을 나타낸다.
R6 및 R7은 서로 독립적으로 수소 원자 또는 탄소수 1∼6의 알킬기를 나타낸다.
m은 0∼4의 정수를 나타낸다. m이 2 이상일 때, 복수의 R5는 동일하더라도 상이하더라도 좋다.
R8은 탄소수 1∼20의 1가의 포화 탄화수소기를 나타내고, 이 포화 탄화수소기에 포함되는 수소 원자는 할로겐 원자로 치환되어 있더라도 좋다.
Z+는 +N(R11)4, Na+ 또는 K+를 나타낸다.
R9 및 R10은 각각 독립적으로 수소 원자 또는 탄소수 1∼20의 1가의 포화 탄화수소기를 나타내고, R9 및 R10은 서로 결합하여 질소 원자와 함께 3∼10원 질소 함유 복소환을 형성하고 있더라도 좋다.
R11은 각각 독립적으로 수소 원자, 탄소수 1∼20의 1가의 포화 탄화수소기 또는 탄소수 7∼10의 아랄킬기를 나타낸다.]
[식 (F1)에서, W1 및 W2는 각각 독립적으로 탄소수 1∼6의 1가의 지방족 탄화수소기 또는 탄소수 6∼10의 1가의 방향족 탄화수소기를 나타내고, 이 지방족 탄화수소기 및 이 방향족 탄화수소기에 포함되는 수소 원자는 히드록시기로 치환되어 있더라도 좋다.
M1은 금속 원자를 나타낸다.
x는 1∼3의 정수를 나타내고, x가 2 이상일 때, 복수의 W1 및 W2는 서로 동일하더라도 상이하더라도 좋다.]
[식 (F2)에서, W3 및 W4는 각각 독립적으로 탄소수 1∼6의 1가의 지방족 탄화수소기를 나타내고, 이 지방족 탄화수소기에 포함되는 수소 원자는 할로겐 원자로 치환되어 있더라도 좋다.
M2는 금속 원자를 나타낸다.
y는 1∼3의 정수를 나타내고, y가 2 이상일 때, 복수의 W3 및 W4는 서로 동일하더라도 상이하더라도 좋다.]A colored curable resin composition comprising a colorant, a resin, a polymerizable compound, a polymerization initiator, and an organometallic compound,
Wherein the colorant is a colorant comprising a compound represented by the following formula (1)
Wherein the organometallic compound is at least one selected from the group consisting of a compound represented by the following formula (F1), a compound represented by the following formula (F2), and a hydrate thereof,
Wherein the maximum value of the molar extinction coefficient in the visible light region of the organic metal compound is smaller than the maximum value of the molar extinction coefficient in the visible light region of the compound represented by the formula (1).
[In the formula (1), R 1 and R 2 each independently represent a phenyl group which may have a substituent.
R 3 and R 4 each independently represent a monovalent saturated hydrocarbon group having 1 to 10 carbon atoms, and the hydrogen atom contained in the saturated hydrocarbon group may be substituted with an aromatic hydrocarbon group having 6 to 10 carbon atoms or a halogen atom, and the aromatic hydrocarbon The hydrogen atom contained in the group may be substituted with an alkyl group having 1 to 3 carbon atoms or an alkoxy group having 1 to 3 carbon atoms, and -CH 2 - included in the saturated hydrocarbon group may be replaced by -O-, -CO- or -NR 11 - And may be substituted.
R 1 and R 3 may form a ring including a nitrogen atom together with a nitrogen atom, and R 2 and R 4 may form a ring including a nitrogen atom together with a nitrogen atom.
R 5 is -OH, -SO 3 H, -SO 3 - of Z +, -CO 2 R 8, -SO 3 R 8 or -SO 2 NR 9 R 10 - Z +, -CO 2 H, -CO 2 .
R 6 and R 7 independently represent a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.
m represents an integer of 0 to 4; When m is 2 or more, plural R 5 s may be the same or different.
R 8 represents a monovalent saturated hydrocarbon group having 1 to 20 carbon atoms, and the hydrogen atom contained in the saturated hydrocarbon group may be substituted with a halogen atom.
Z + represents + N (R < 11 >) 4 , Na + or K + .
R 9 and R 10 each independently represent a hydrogen atom or a monovalent saturated hydrocarbon group having 1 to 20 carbon atoms, and R 9 and R 10 may be bonded to each other to form a 3- to 10-membered nitrogen-containing heterocycle together with the nitrogen atom .
R 11 each independently represents a hydrogen atom, a monovalent saturated hydrocarbon group having 1 to 20 carbon atoms, or an aralkyl group having 7 to 10 carbon atoms.
In Formula (F1), W 1 and W 2 each independently represent a monovalent aliphatic hydrocarbon group of 1 to 6 carbon atoms or a monovalent aromatic hydrocarbon group of 6 to 10 carbon atoms, and the aliphatic hydrocarbon group and the aliphatic hydrocarbon group contained in the aromatic hydrocarbon group The hydrogen atom may be substituted with a hydroxy group.
M 1 represents a metal atom.
x represents an integer of 1 to 3, and when x is 2 or more, a plurality of W 1 and W 2 may be the same or different.
[In the formula (F2), W 3 and W 4 each independently represent a monovalent aliphatic hydrocarbon group having 1 to 6 carbon atoms, and the hydrogen atom contained in the aliphatic hydrocarbon group may be substituted with a halogen atom.
M 2 represents a metal atom.
y represents an integer of 1 to 3, and when y is 2 or more, a plurality of W 3 and W 4 may be the same or different.
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JP2013133358A (en) | 2013-07-08 |
KR20130074753A (en) | 2013-07-04 |
CN103176361B (en) | 2018-06-29 |
JP5938895B2 (en) | 2016-06-22 |
CN103176361A (en) | 2013-06-26 |
TW201332986A (en) | 2013-08-16 |
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