KR101990253B1 - Container type mushroom growing apparatus - Google Patents

Abstract

The present invention relates to a mushroom cultivation apparatus and, more specifically, to a mushroom cultivation apparatus which attaches a guide rod to the inside of a container, and mounts a guide rail for sliding the top of the guide rod on a growth and development table from side to side, wherein the growth and development table is installed to be movable inside the container.

Description

[0001] Container type mushroom growing apparatus [0002]

The present invention relates to a mushroom cultivation apparatus, and more particularly, to a mushroom cultivation apparatus in which a guide rod is attached to the inside of a container, and a guide rail for sliding the guide rod in the left- The present invention relates to a mushroom cultivation apparatus, which is characterized in that the mushroom cultivation apparatus is installed as far as possible.

Generally, mushroom is a microorganism belonging to Basidiomycetes, which is mostly used for food, except for toxicity. These mushrooms are high-protein foods that can replace meat and are useful natural substances It is recognized as a health food and is carrying out mushroom cultivation in many farms.

These mushroom cultivation methods have been cultivated by punching holes in pine wood, oyster, oak tree, oak, etc. according to the kinds of seeds. However, since stable supply of wood is difficult and skilled labor force is required In recent years, methods such as sawdust and closure have been used as a medium to cultivate the seedlings, boxes, and cell cultures in the growers.

In particular, techniques for using cargo containers to grow mushrooms are known.

Namely, a mushroom cultivation apparatus of Korean Patent Publication No. 10-1791115, a mushroom cultivation apparatus of Korean Patent Registration No. 10-1591942, a container-type mushroom cultivation apparatus of Korean Patent Laid-open Publication No. 10-2006-80008, Korean Patent Publication No. 10-2000 The technology of the sterilization and fermentation system of the mushroom culture medium of -9832 is known as the technology of the mushroom grower using the container.

The techniques of the mushroom grower using the above-described conventional containers are as follows: a growth stand assembled in a frame form is disposed inside a container having a certain volume, a metal pipe is placed, the shelves are mounted on the growth platform, A container for feeding mushrooms, a supply means for supplying mushrooms, a supply means for supplying mushrooms, a supply means for maintaining temperature, and a controller for controlling the supply amount of the mushrooms. And sensors for measuring the humidity, temperature and carbon dioxide inside the container. It is designed to harvest the maximum amount of mushroom by utilizing the minimum space.

FIG. 1 is an indoor photograph of such a conventional container type mushroom grower. The mushroom cultivation apparatus utilizing such a container necessarily includes a shelf 3 in which bottles 4 inoculated with mushroom seedlings are placed inside the container 1, It is very difficult to arrange more than two growth platforms due to the limited space inside the container. Accordingly, a new technology development for efficiently utilizing the space inside the container is required. It is an urgent situation.

Disclosure of Invention Technical Problem [8] Accordingly, the present invention has been made to solve the above-mentioned problems of the prior art, and it is an object of the present invention to provide mobility of a growth platform for efficiently using an inner space of a container, The present invention also provides a configuration of a container type mushroom cultivation apparatus capable of monitoring the current state of a mushroom cultivation apparatus by a mobile communication terminal such as a mobile phone, and performing necessary control.

According to an aspect of the present invention, there is provided a container-type mushroom cultivation apparatus comprising a guide bar attached to a container, a guide rail for sliding the guide bar in the left- And the container is provided movably inside the container.

The container-type mushroom cultivating apparatus of the present invention having the above-described structure can maximize the utilization of the inner space of the container because the growing rack can be moved vertically or horizontally in the front, rear, left and right directions inside the container, Carbon dioxide, and light amount of the mushroom grower can be controlled automatically, and the present state of the mushroom grower can be monitored by a mobile communication terminal such as a smart phone and the necessary control can be performed.

1 is a photograph showing the inside of a conventional container type mushroom cultivation apparatus.
2 is a perspective view of the mushroom cultivation apparatus of the present invention.
3 is a longitudinal sectional view of the mushroom cultivation apparatus of the present invention.
Figs. 4 to 6 are photographs showing the growth stages of the mushroom cultivation apparatus of the present invention. Fig.
Fig. 7 is a detailed view of the guide rail of the growth stand of the mushroom cultivation apparatus of the present invention.
8 is a plan sectional view of the mushroom cultivation apparatus of the present invention.
9 is a photograph showing another embodiment of the mushroom cultivation apparatus of the present invention.
10 is a block diagram of a control panel of a mushroom cultivation apparatus of the present invention.

Hereinafter, the configuration of the container-type mushroom cultivation apparatus of the present invention will be described in detail with reference to the accompanying drawings. However, the disclosed drawings are provided as examples for allowing a person skilled in the art to sufficiently convey the idea of the present invention . Accordingly, the present invention may be embodied in other specific forms without departing from the spirit or scope of the following claims. Further, unless otherwise defined in the terminology used in the specification of the present invention, And a detailed description of known functions and configurations that may unnecessarily obscure the gist of the present invention will be omitted in the following description and the accompanying drawings.

Fig. 2 is a perspective view of the mushroom cultivation apparatus of the present invention, and Fig. 3 is a longitudinal sectional view of the mushroom cultivation apparatus of the present invention.

First, referring to FIG. 2, the mushroom cultivation apparatus 10 of the present invention uses a conventional container 20.

The container 20 is in the form of a conventional box comprising a bottom surface 23, a back surface 24, a front surface 25, side walls 26 and a ceiling surface 27.

An entrance 21 is formed on the front surface 25 of the container 20 so that an operator can enter and exit the door 20 and a door 22 is installed on the entrance 21.

3, the inner space of the container 10 of the present invention has a partition wall 60 extending vertically from the bottom surface 23 and contacting the ceiling face 27. As shown in Fig.

The inner space of the container 20 is divided into a growth chamber 30 in which a growth platform 100 for growing mushrooms is placed by the partition wall 60 and a growth chamber 30 for controlling the cultivation environment of the growth chamber 30, And a control room 40 in which a control panel 200 for communicating with a mobile communication terminal of the mobile communication terminal is installed.

5, an air supply line 50 for supplying air to the growth chamber 30 is installed on the ceiling surface 27 of the container 20, and the air supply line 50, Is installed as close as possible to the ceiling surface by using the clamp 52, and a discharge port 51 for discharging the air is formed at a predetermined interval in the pipe-shaped body.

Figs. 4 to 6 are photographs showing the growth platform 100 disposed inside the container 20 of the mushroom cultivation apparatus of the present invention.

The growth platform 100 of the present invention is assembled in the form of a frame using a metal pipe, and a pair of vertical bars 110 are vertically installed at regular intervals, and the vertical bars 110 are horizontally connected And a pair of horizontal bars 120 are mounted on the connection bar 130. The connection bar 130 is provided with a connection bar 130,

1) is placed on the horizontal bar 120 and the bottle, box or bag 4 (see Fig. 1) inoculated with the mushroom seeds on the shelf 3 is placed in a predetermined Respectively.

6, the mushroom cultivation apparatus 10 according to the present invention includes a mushroom cultivation apparatus 10 for cultivating a mushroom cultivation apparatus 10 in a horizontal direction on a partition wall 60 of a container 20 in order to utilize the inner space of the container 20 as much as possible, A guide rail 150 for sliding the guide bar 140 in the left and right direction on the vertical bar 110 of the growth platform 100 facing the installation height point of the guide bar 140, .

7 is a detailed view and a cross-sectional view of the guide rail 150. The plate 151 is fixed on the vertical bar 110 and the guide rod 140 is slidably mounted on the plate 151, (152).

Therefore, as shown in the plan view of the mushroom cultivation apparatus 10 of the present invention shown in FIG. 8, the wheel 152 can slide in the left-right direction of the guide rod 140, The guide rails 150 installed on the respective growth stands 100 are freely slidable in the left and right directions along the guide rods 140 provided on the partition walls 60 when the guide rails 100 are arranged in the growth chambers 30 The operator can freely move the growth platform 100 in the indoor space of the container 20 so that the operator can push the growth platform 100 to be worked in the left and right direction along the guide rod 140, It is possible to secure a predetermined space and enter the secured space to take an activity necessary for mushroom cultivation on the growth platform 100.

9 shows an embodiment in which another guide bar 140-1 is provided between the side walls 26 of the container 20 in the interior space of the container 20 Another growth platform 100-1 is additionally arranged so as to be closer to the entrance 21 side than the platform 100 and the guide rods 140-1 to 140-4 are provided on the vertical bar 110 of another growth platform 100-1. 1, the guide rails 150 slide along the guide rods 140-1 so that the other growth platform 100-1 can be moved in the left and right directions .

In this case, for example, in addition to the three growth platforms 100 shown in FIG. 8, another three growth platforms 100 can be added close to the inlet 21 side, If the length of the container 20 is allowed, the guide rods 140 may be additionally provided in the container so as to operate nine or twelve of the growth platforms 100.

10 is a block diagram of the control panel 200 of the present invention.

The control panel 200 of the present invention includes a lighting device 221 for cultivating mushrooms, a moisture supply device 241, a heating device 231 for maintaining temperature, a temperature sensor 232, Humidity, degree of drying, temperature, and carbon dioxide are received from various sensors (not shown) such as a light amount sensor 242, a light amount sensor 222 and a carbon dioxide sensor 251. The light amount control unit 220, A humidity controller 240, a carbon dioxide controller 250 and a ventilator 280. The central controller 210 controls the operation of the air conditioner 230, the humidity controller 240, the carbon dioxide controller 250,

The central control unit 210 is interlocked with a database 260 for storing a program necessary for control and various sensed values to be transmitted and is connected to the mobile communication terminal 300 via the communication network such as the Internet using the communication unit 270. [ And the mobile communication terminal 300 may transmit temperature, humidity, light amount information, and carbon dioxide information, which are various sensed values installed in the mushroom grower, from the central control unit 210 to the mobile communication To the terminal (300).

The temperature of the mushroom growers can be determined as described above and the amount of the mushroom growers can be determined based on the detected state of the mushroom grower 220, the temperature controller 230, the humidity controller 240, the carbon dioxide controller 250, To control the light quantity, temperature, humidity and carbon dioxide amount of the mushroom grower.

On the other hand, in the growth platform 100, since the guide bars 140 and the guide rails 150 are abraded due to friction, wear due to humidity during mushroom growth, It is necessary to protect against the impact generated by the impact.

For this, the present invention is characterized in that it may further comprise a protective film provided on the outer surface of the growth platform 100 by applying and curing a protective agent.

Such a protective film must be easily provided, must be excellent in adhesion, further have improved anticorrosiveness, fire resistance, and rustproofing property, and further, it is required to have improved waterproof property through improved fabricating and water repellent treatment due to rapid curing .

The protective composition for the protective layer of the present invention which provides the above effect is prepared by mixing 100 parts by weight of phenoxyethyl acrylate, 150-250 parts by weight of polyester acrylate, 30-40 parts by weight of 2,4,6-trimethylbenzoyldiphenylphosphine oxide 50 to 100 parts by weight of polyvinyl acetate, 1 to 5 parts by weight of 2-methyl-4-isothiazolin-3-one, 25 to 35 parts by weight of silica airgel, 10 to 30 parts by weight of 3-glycidoxypropylmethyldimethoxysilane, 30 to 50 parts by weight of sodium silicate, 10 to 70 parts by weight of hydroxyethyl acrylate, 30 to 60 parts by weight of ethylsilicone, 1 to 5 parts by weight of ethylenediamine tetraacetate, 0.5 to 2.5 parts by weight of tetraethoxysilane .

Phenoxyethylacrylate (Phenoxyethylacrylate) was first used as an acrylate monomer, and it was confirmed that it was most suitable for the present composition among various acrylate monomers because it has adequate flowability and excellent heat resistance. The amount of each composition to be described below will be described based on 100 parts by weight of the phenoxyethyl acrylate.

Next, (Polyesteracrylate) polyester acrylate is used as an acrylate oligomer, and it has been confirmed that it is most suitable for the present composition among various acrylate oligomers since it has proper adhesiveness, strength and durability. It is preferable that such polyester acrylate is used in an amount of 150 to 250 parts by weight. It has been confirmed that adhesion, strength and durability of the protective film are remarkably lowered when the polyester acrylate is used out of the above range. As a result of repeated experiment, it was confirmed that the most preferable amount was 200 parts by weight.

Next, (2,4,6-trimethylbenzoyldiphenylphosphineoxide) 2,4,6-trimethylbenzoyldiphenylphosphine oxide is used as an initiator, and when used with the above-mentioned phenoxyethyl acrylate and polyester acrylate among various initiators It was confirmed that the most excellent physical properties can be secured. It is preferable that 30 to 40 parts by weight of 2,4,6-trimethylbenzoyldiphenylphosphine oxide is used. When the amount of the 2,4,6-trimethylbenzoyldiphenylphosphine oxide is less than 30 parts by weight, it is difficult to form a sufficient radical. When the amount is more than 40 parts by weight, , And remarkable deterioration was observed in the curing time and the flowability when the composition was used out of the above range. As a result of repeated experiment, it was confirmed that the most preferable amount was 35 parts by weight.

Next, (Polyvinylacetate) polyvinyl acetate is used as a fixing agent for improving the fixing strength of the protective agent, and the amount thereof is preferably 50 to 100 parts by weight. If it is used in an amount of less than 50 parts by weight, there is a problem that the protective agent can not be adhered well due to a decrease in the flexibility of the coating film, and when it is used in excess of 100 parts by weight, the dryness of the protective agent deteriorates. As a result of repeated experiments, it was confirmed that the optimum amount of use was 70 parts by weight.

Next, (2-Methyl-4-Isothiazoline-3-one) 2-methyl-4-isothiazolin-3-one is used as an antiseptic agent and its amount is preferably 1 to 5 parts by weight. When used outside of the above-mentioned composition range, there are no obvious problems, but repeated experiments have shown the most remarkable effect in the composition range.

Next, (Silica Aerogel) silica airgel is used as a refractory agent and a thermal insulation agent to improve the refractory and thermal insulation based on diffused pores. This silica airgel has a very high specific surface area with a porosity of 80 to 99.87% and a pore size of 1 to 50 nm. Since the silica airgel has high transparency and low thermal conductivity as a transparent low-density material, it has high potential as a transparent insulating material Lt; / RTI > Such a silica airgel is preferably subjected to hydrophobic treatment on its surface because its gel structure and physical properties are lowered when it absorbs water, and the amount thereof is preferably 25 to 35 parts by weight. There is a problem in that optimum physical properties can not be secured when the composition is used out of the above-mentioned composition range. In particular, when it is used in excess of 35 parts by weight, economical efficiency is lowered. As a result of repeated experiment, it was confirmed that the most preferable amount was 30 parts by weight.

Next, (3-Glycidoxypropylmethyldimethoxysilane) 3-glycidoxypropylmethyldimethoxysilane is used as a coupling agent for improving the interfacial adhesion of each composition, particularly polymer compositions, to improve physical properties, and the amount thereof is 10 to 25 parts by weight desirable. When used out of the composition ratio, the binding force between the compositions is not effectively expressed. As a result of repeated experiment, it was confirmed that the most preferable amount was 20 parts by weight.

Next, sodium silicate sodium silicate is added as a rust inhibitor, which is advantageous in that it is relatively economical among various rust inhibitor compositions. The sodium silicate is preferably used in an amount of 30 to 50 parts by weight. If the sodium silicate is used in an amount less than 30 parts by weight, it is difficult to ensure anticorrosive performance. If the sodium silicate is used in an amount exceeding 50 parts by weight, economical efficiency is lowered. The optimum amount to be used is 40 parts by weight in consideration of both economy and rustproofing ability.

Next, (Hydroxyethylacrylate) hydroxyethyl acrylate is added as an adhesion promoter, and hydroxyethyl acrylate is employed because it has an advantage of excellent curability. The use amount of 10 to 70 parts by weight is less than 10 parts by weight. When the amount is more than 70 parts by weight, volatility increases and toxicity is increased. As a result of the repeated experiment, it was confirmed that the most preferable amount was 40 parts by weight.

Next, (Ethylsiliconate) Ethyl Siliconate is added as a strength enhancer to increase the corrosion resistance, impact resistance, resistance to magnetic (scratch resistance) and surface hardness of the protective film, and the average particle size is 10 to 20 nm And the amount thereof is preferably 30 to 60 parts by weight. If it is used in an amount less than 30 parts by weight, sufficient strength can not be obtained. When it is used in an amount exceeding 60 parts by weight, the possibility of cracking after application increases due to excessive rigidity. As a result of the repeated experiment, it was confirmed that the most preferable amount was 40 parts by weight.

Next, (Ehtylenediaminetetracetate) Ethylenediaminetetraacetate is used as an adsorption enhancer, and enhances the adsorption force during the initial construction of the protective film, thereby improving the adhesion. The preferable amount of ethylenediamine tetraacetate to be used is 1 to 5 parts by weight, and when it is used out of the above-mentioned composition range, the adsorption strengthening effect is not adequately expressed.

Next, (Tetraethoxysilane) tetraethoxysilane is added to enhance the water repellency and water repellency of the protective film by hydrolysis and condensation, and to improve the anticorrosive property, and it is preferably 0.5 to 2.5 parts by weight, and when it is used less than 0.5 part by weight Water repellency, water repellency and anticorrosive property are insignificant, and when it is used in excess of 2.5 parts by weight, the workability is lowered. As a result of repeated experiment, the most preferable amount of use was confirmed to be 2 parts by weight.

The protective film of the present invention having the above-described composition and composition range is not required to be limited in drying temperature, and can be easily cured because it is not flowable, and therefore it is easy to provide a protective film and furthermore has excellent anticorrosive properties , And has an anticorrosive property, and further has an advantage of being excellent in water resistance.

[Example]

In order to test the effect of the protective composition according to the present invention and the protective layer formed thereon, 500 g of the protective agent (500 g) mixed in the composition ratio of each of Examples 1 to 3 was coated on the test block, After forming a protective film on the outer surface of the block, experiments were conducted according to Experimental Examples 1 to 4 using the respective test blocks (see the component table below).

[Ingredient List]

[Experimental Example 1]

As a result of measuring the UV curing time of each of the test blocks of Examples 1 to 3, it was measured as about 1 minute for Example 1, about 1 minute 30 seconds for Example 2, and 2 minutes for Example 3. [ Therefore, in all of Examples 1 to 3, the overall curing time was short, and in all the examples, rapid curing proceeded without flow.

[Experimental Example 2]

As a result of performing a cross-cut test on each of the test blocks of Examples 1 to 3, no peeling occurred in the error range of 1% in all of Examples 1 to 3 (peel ratio <1%).

Thereafter, scratching experiments were carried out through scratchers having irregular protruding portions on the outer surfaces of the test blocks of Examples 1 to 3, respectively. As a result, in Example 1, most of the protective film was broken. In Examples 2 and 3, The breakage of the protective film did not occur at all (breakage rate less than 5%).

Therefore, it was confirmed that Examples 2 and 3 were superior to Example 1 in adhesion strength and strength of the protective film.

[Experimental Example 3]

Experiments were carried out on the outer surfaces of the test blocks of Examples 1 to 3 through a torch for 10 minutes to directly spray the flame. As a result, in Examples 1 and 2, some combustion and melting occurred. In Example 3, however, Only the protective film was not burned at all.

Therefore, it can be confirmed that Example 3 is superior in fire resistance and heat insulating property to Examples 1 and 2.

[Experimental Example 4]

Water was sprayed on the outer surface of each of the test blocks of Examples 1 to 3 for 6 hours. After removing the protective film and examining the degree of internal invasion of the test block, a small amount of moisture was detected in Examples 1 and 2, No moisture was detected at all.

Therefore, it was confirmed that Example 3 was superior in water resistance to Examples 1 and 2.

10: mushroom cultivation apparatus of the present invention
20: container 21: entrance
22: Door 23: Floor surface
24: back side 25: front side
26: Side wall
30: Growing room
40: control room
50: air supply line 51: outlet
52: Clamp
60: compartment wall
100: Growing ground 110: Vertical bar
120: horizontal bar 130: connecting bar
140: guide rod 150: guide rail
151: Plate 152: Wheel
200: control panel 210:
220: light quantity control unit 221: lighting device
230: temperature control unit 231: heating device / cooling device
240: humidity controller 241: moisture supplier
250: carbon dioxide controller 251: carbon dioxide sensor
260: storage unit 270: communication unit
280: Fan
300: mobile communication terminal

Claims (4)

A mushroom growing apparatus for placing a growth platform (100) in a container (20)
A guide rail 140 is attached to the inside of the container 20 and a guide rail 150 is slidably mounted on the guide rails 140 to slide the guide rods 140 in the left- And is movably installed in the container,
The growth platform 100 includes a pair of vertical bars 110 vertically installed at regular intervals and a connecting bar 130 horizontally connecting the vertical bars 110, And a pair of horizontal bars 120 mounted on the bar 130,
The guide rail 150 is formed by fixing a flat plate 151 on the vertical bar 110 and installing a wheel 152 on the plate 151 to slide the outer circumference of the guide bar 140 And,
A partition wall 60 vertically extending from the bottom surface 23 is formed in the inner space of the container 20 and the growth chamber 30 for growing the mushroom by the partition wall 60 and the control chamber 200, The control room 40 is divided into a control room 40,
The control panel 200 includes a lighting device 221 for growing mushrooms, a water supply device 241, a heating device 231, a temperature sensor 232, a humidity sensor 242, a light amount sensor 222, a carbon dioxide sensor And a central control unit 210 for receiving the sensing value from the control unit 220 and controlling the operation of the light amount control unit 220, the temperature control unit 230, the humidity control unit 240, the carbon dioxide control unit 250, and the ventilator 280 and,
An air supply line 50 for supplying air to the growth chamber 30 is installed on the ceiling surface 27 of the container 20,
And a protective film provided on the outer surface of the growth stand (100) by applying and curing a protective agent,
The protective agent may be selected from the group consisting of 100 parts by weight of phenoxyethyl acrylate, 150 to 250 parts by weight of polyester acrylate, 30 to 40 parts by weight of 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 50 to 100 parts by weight of polyvinyl acetate, 1 to 5 parts by weight of 2-methyl-4-isothiazolin-3-one, 25 to 35 parts by weight of silica airgel, 10 to 25 parts by weight of 3-glycidoxypropylmethyldimethoxysilane, 30 to 50 parts by weight of sodium silicate 10 to 70 parts by weight of hydroxyethyl acrylate, 30 to 60 parts by weight of ethylsilicone, 1 to 5 parts by weight of ethylenediamine tetraacetate, and 0.5 to 2.5 parts by weight of tetraethoxysilane. delete delete delete

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