KR101864757B1 - 도금용 랙의 절연코팅 조성물 및 그 제조방법 - Google Patents
도금용 랙의 절연코팅 조성물 및 그 제조방법 Download PDFInfo
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- KR101864757B1 KR101864757B1 KR1020160150504A KR20160150504A KR101864757B1 KR 101864757 B1 KR101864757 B1 KR 101864757B1 KR 1020160150504 A KR1020160150504 A KR 1020160150504A KR 20160150504 A KR20160150504 A KR 20160150504A KR 101864757 B1 KR101864757 B1 KR 101864757B1
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- inorganic nanoparticles
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- polyvinyl chloride
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- plastisol
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- 239000008199 coating composition Substances 0.000 title claims abstract description 37
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- 239000002105 nanoparticle Substances 0.000 claims abstract description 128
- 239000007822 coupling agent Substances 0.000 claims abstract description 81
- 239000004800 polyvinyl chloride Substances 0.000 claims abstract description 71
- 229920000915 polyvinyl chloride Polymers 0.000 claims abstract description 70
- 239000011347 resin Substances 0.000 claims abstract description 63
- 229920005989 resin Polymers 0.000 claims abstract description 63
- 229920001944 Plastisol Polymers 0.000 claims abstract description 53
- 239000004999 plastisol Substances 0.000 claims abstract description 53
- 239000004014 plasticizer Substances 0.000 claims abstract description 33
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 23
- 125000003277 amino group Chemical group 0.000 claims abstract description 9
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- 238000000034 method Methods 0.000 claims description 14
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- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 8
- 239000003381 stabilizer Substances 0.000 claims description 8
- 239000002518 antifoaming agent Substances 0.000 claims description 7
- 239000002562 thickening agent Substances 0.000 claims description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 239000000395 magnesium oxide Substances 0.000 claims description 6
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 6
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 6
- 229910044991 metal oxide Inorganic materials 0.000 claims description 6
- 150000004706 metal oxides Chemical class 0.000 claims description 6
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 claims description 5
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 claims description 5
- 239000000292 calcium oxide Substances 0.000 claims description 4
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 claims description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 3
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052788 barium Inorganic materials 0.000 claims description 3
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims description 3
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 claims description 3
- FZFYOUJTOSBFPQ-UHFFFAOYSA-M dipotassium;hydroxide Chemical compound [OH-].[K+].[K+] FZFYOUJTOSBFPQ-UHFFFAOYSA-M 0.000 claims description 3
- INJVFBCDVXYHGQ-UHFFFAOYSA-N n'-(3-triethoxysilylpropyl)ethane-1,2-diamine Chemical compound CCO[Si](OCC)(OCC)CCCNCCN INJVFBCDVXYHGQ-UHFFFAOYSA-N 0.000 claims description 3
- 230000003647 oxidation Effects 0.000 claims description 3
- 238000007254 oxidation reaction Methods 0.000 claims description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 3
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- 235000012239 silicon dioxide Nutrition 0.000 claims description 3
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 claims description 3
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 3
- GMGNDPFLENJNEP-UHFFFAOYSA-N 4-methyl-N-(1-triethoxysilyl-3-trimethoxysilylpropyl)pentan-2-imine Chemical compound C(C)O[Si](C(CC[Si](OC)(OC)OC)N=C(CC(C)C)C)(OCC)OCC GMGNDPFLENJNEP-UHFFFAOYSA-N 0.000 claims description 2
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 2
- 229910052744 lithium Inorganic materials 0.000 claims description 2
- 238000002156 mixing Methods 0.000 claims description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 239000010937 tungsten Substances 0.000 claims description 2
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 claims 1
- 239000011247 coating layer Substances 0.000 description 36
- 239000005871 repellent Substances 0.000 description 29
- 150000001875 compounds Chemical class 0.000 description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 22
- 239000000463 material Substances 0.000 description 17
- 230000002940 repellent Effects 0.000 description 14
- 230000008878 coupling Effects 0.000 description 9
- 238000010168 coupling process Methods 0.000 description 9
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- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
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- 238000006482 condensation reaction Methods 0.000 description 6
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- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 229910052623 talc Inorganic materials 0.000 description 4
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Natural products CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
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- 229910052760 oxygen Inorganic materials 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- ZFMQKOWCDKKBIF-UHFFFAOYSA-N bis(3,5-difluorophenyl)phosphane Chemical compound FC1=CC(F)=CC(PC=2C=C(F)C=C(F)C=2)=C1 ZFMQKOWCDKKBIF-UHFFFAOYSA-N 0.000 description 2
- 229910000019 calcium carbonate Inorganic materials 0.000 description 2
- 239000001506 calcium phosphate Substances 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
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- 239000007788 liquid Substances 0.000 description 2
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- 238000012986 modification Methods 0.000 description 2
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 239000000454 talc Substances 0.000 description 2
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 2
- 229940078499 tricalcium phosphate Drugs 0.000 description 2
- 229910000391 tricalcium phosphate Inorganic materials 0.000 description 2
- 235000019731 tricalcium phosphate Nutrition 0.000 description 2
- HJIMAFKWSKZMBK-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F HJIMAFKWSKZMBK-UHFFFAOYSA-N 0.000 description 1
- ZDZYGYFHTPFREM-UHFFFAOYSA-N 3-[3-aminopropyl(dimethoxy)silyl]oxypropan-1-amine Chemical compound NCCC[Si](OC)(OC)OCCCN ZDZYGYFHTPFREM-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- HAXRGICMTFMBKI-UHFFFAOYSA-N NCCCO[Si](OC)(OC)CCCN.C(C)O[Si](CCCN=C(CC(C)C)C)(OCC)OCC Chemical compound NCCCO[Si](OC)(OC)CCCN.C(C)O[Si](CCCN=C(CC(C)C)C)(OCC)OCC HAXRGICMTFMBKI-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hcl hcl Chemical compound Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 238000009863 impact test Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- 229940089951 perfluorooctyl triethoxysilane Drugs 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
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- 230000007480 spreading Effects 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- JNEGECSXOURYNI-UHFFFAOYSA-N trichloro(1,1,2,2,3,3,4,4,5,5,6,6,7,7,10,10,10-heptadecafluorodecyl)silane Chemical compound FC(F)(F)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)[Si](Cl)(Cl)Cl JNEGECSXOURYNI-UHFFFAOYSA-N 0.000 description 1
- PISDRBMXQBSCIP-UHFFFAOYSA-N trichloro(3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl)silane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CC[Si](Cl)(Cl)Cl PISDRBMXQBSCIP-UHFFFAOYSA-N 0.000 description 1
- ZFUVZJADECZZMS-UHFFFAOYSA-N trichloro(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,12-henicosafluorododecyl)silane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CC[Si](Cl)(Cl)Cl ZFUVZJADECZZMS-UHFFFAOYSA-N 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten trioxide Chemical compound O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 description 1
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- C09D127/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers
- C09D127/02—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment
- C09D127/04—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing chlorine atoms
- C09D127/06—Homopolymers or copolymers of vinyl chloride
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- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
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Abstract
Description
도 1(b)는 도 1(a)의 도금용 랙의 절연코팅 조성물을 구리 모재 표면에 도포하여 형성된 절연코팅층을 나타내는 이미지이다.
도 2(a)는 도 1(b)의 절연코팅층의 SEM 이미지이다.
도 2(b)는 도 1(b)의 절연코팅층의 EDX 분석 결과를 나타내는 도면이다.
Claims (13)
- 폴리염화비닐 수지 및 가소제를 포함하는 플라스티졸; 및
상기 플라스티졸 내에 분산되고, 수산화기 및 아민기를 포함하는 커플링제에 의해 표면개질된 무기 나노입자를 포함하고,
상기 폴리염화비닐 수지와 상기 무기 나노입자는 상기 커플링제에 의해 결합되는 것을 특징으로 하고,
상기 폴리염화비닐 수지 중량 대비, 상기 가소제의 함량은 45 내지 65PHR이고, 상기 무기 나노입자의 함량은 5 내지 25PHR인 것인 것을 특징으로 하는 도금용 랙의 절연코팅 조성물.
- 삭제
- 제1항에 있어서,
상기 커플링제는 상기 폴리염화비닐 수지와 결합하여 아민 결합물 및 염산을 생성하는 것인 도금용 랙의 절연코팅 조성물.
- 제1항에 있어서,
상기 커플링제는 실란 커플링제를 포함하는 것인 도금용 랙의 절연코팅 조성물.
- 제4항에 있어서,
상기 실란 커플링제는 아미노프로필트리메톡시실란, 아미노프로필트리에톡시실란, 3-트리에톡시실리-N-(1,3-디메틸-부틸리덴)프로필아민, N-2(아미노에틸)-3-아미노프로필트리메톡시실란, N-2(아미노에틸)-3-아미노프로필트리에톡시실란, N-2(아미노에틸)-3-아미노프로필메틸디메톡시실란, 및 N-페닐-3-아미노프로필트리메톡시실란으로 구성되는 군으로부터 선택되는 적어도 하나를 포함하는 것인 도금용 랙의 절연코팅 조성물.
- 제1항에 있어서,
상기 무기 나노입자는 금속 산화물을 포함하는 것인 도금용 랙의 절연코팅 조성물.
- 제6항에 있어서,
상기 금속 산화물은 이산화규소(SiO2), 산화 알루미늄(Al2O3), 산화 지르코늄(ZrO2), 산화 타이타늄(TiO2), 산화 텅스텐(WO3), 산화 바륨(BaO), 산화 칼슘(CaO), 산화 마그네슘(MgO), 산화 리튬(Li2O), 산화 나트륨(Na2O), 및 산화 칼륨(K2O)으로 구성되는 군으로부터 선택되는 적어도 하나를 포함하는 것인 도금용 랙의 절연코팅 조성물.
- 제1항에 있어서,
상기 플라스티졸은 충전제, 안정제, 증점제, 및 소포제로 구성되는 군으로부터 선택되는 적어도 하나를 더 포함하는 것인 도금용 랙의 절연코팅 조성물.
- 폴리염화비닐 수지 및 가소제를 포함하는 플라스티졸을 제조하는 단계;
무기 나노입자의 표면을 수산화기 및 아민기를 포함하는 커플링제로 개질하는 단계; 및
상기 표면개질된 무기 나노입자를 상기 제조된 플라스티졸에 투입하여, 상기 표면개질된 무기 나노입자가 상기 플라스티졸 내에서 분산되는 단계를 포함하고,
상기 무기 나노입자와 상기 폴리염화비닐 수지는 상기 커플링제에 의해 결합되는 것을 특징으로 하고,
상기 플라스티졸을 제조하는 단계에서 상기 가소제의 함량은 상기 폴리염화비닐 수지 중량 대비 45 내지 65PHR이고,
상기 표면개질된 무기 나노입자를 투입하는 단계에서 상기 무기 나노입자의 함량은 상기 폴리염화비닐 수지 중량 대비 5 내지 25PHR인 것을 특징으로 하는 도금용 랙의 절연코팅 조성물의 제조방법.
- 제9항에 있어서,
상기 플라스티졸을 제조하는 단계는
폴리염화비닐 수지를 가소제에 용해하는 단계; 및
상기 폴리염화비닐 수지가 용해된 상기 가소제에 충전제, 안정제, 증점제, 및 소포제로 구성되는 군으로부터 선택되는 적어도 하나를 첨가하는 단계를 포함하는 것인 도금용 랙의 절연코팅 조성물의 제조방법.
- 제9항에 있어서,
상기 무기 나노입자의 표면을 개질하는 단계는
커플링제를 휘발성 용매에 혼합하는 단계;
상기 커플링제가 혼합된 상기 휘발성 용매에 무기 나노입자를 투입하여, 상기 무기 나노입자의 표면이 개질되도록 상기 커플링제가 상기 무기 나노입자에 결합되는 단계; 및
상기 무기 나노입자에 결합되지 않은 커플링제 및 상기 휘발성 용매를 제거하는 단계를 포함하는 것인 도금용 랙의 절연코팅 조성물의 제조방법.
- 삭제
- 제9항에 있어서,
상기 커플링제는 상기 폴리염화비닐 수지와 결합하여 아민 결합물 및 염산을 생성하는 것인 도금용 랙의 절연코팅 조성물의 제조방법.
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