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KR101860406B1 - 대물 렌즈 지지 장치 및 포토 에칭 기기 - Google Patents

대물 렌즈 지지 장치 및 포토 에칭 기기 Download PDF

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Publication number
KR101860406B1
KR101860406B1 KR1020167019532A KR20167019532A KR101860406B1 KR 101860406 B1 KR101860406 B1 KR 101860406B1 KR 1020167019532 A KR1020167019532 A KR 1020167019532A KR 20167019532 A KR20167019532 A KR 20167019532A KR 101860406 B1 KR101860406 B1 KR 101860406B1
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South Korea
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Korean (ko)
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KR20160100379A (ko
Inventor
치앤 왕
Original Assignee
상하이 마이크로 일렉트로닉스 이큅먼트(그룹) 컴퍼니 리미티드
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/80—Etching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020167019532A 2013-12-31 2014-12-24 대물 렌즈 지지 장치 및 포토 에칭 기기 Active KR101860406B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CN201310752319.5A CN104749904B (zh) 2013-12-31 2013-12-31 物镜支撑装置及光刻机
CN201310752319.5 2013-12-31
PCT/CN2014/094749 WO2015101194A1 (zh) 2013-12-31 2014-12-24 物镜支撑装置及光刻机

Publications (2)

Publication Number Publication Date
KR20160100379A KR20160100379A (ko) 2016-08-23
KR101860406B1 true KR101860406B1 (ko) 2018-05-23

Family

ID=53493193

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167019532A Active KR101860406B1 (ko) 2013-12-31 2014-12-24 대물 렌즈 지지 장치 및 포토 에칭 기기

Country Status (4)

Country Link
KR (1) KR101860406B1 (zh)
CN (1) CN104749904B (zh)
TW (1) TWI541616B (zh)
WO (1) WO2015101194A1 (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105425354B (zh) * 2015-12-21 2018-11-02 中国工程物理研究院应用电子学研究所 一种用于光学传输系统的刚柔组合支撑隔振装置
CN106931290B (zh) * 2015-12-30 2019-01-29 上海微电子装备（集团）股份有限公司 一种减振系统及其调节方法
CN111380464B (zh) * 2018-12-28 2021-05-07 上海微电子装备（集团）股份有限公司 一种光栅尺的安装装置、安装方法、光栅测量系统及光刻机
CN111692994B (zh) * 2020-06-02 2021-06-22 中国科学院西安光学精密机械研究所 一种角度测量装置装配结构及方法
CN113848684B (zh) * 2021-09-22 2022-11-04 哈尔滨工业大学 一种光刻机掩模台隔振装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3493682B2 (ja) * 1993-04-14 2004-02-03 株式会社ニコン 鏡筒支持装置及び露光装置
JP2005322907A (ja) 2004-05-05 2005-11-17 Asml Netherlands Bv リソグラフィ装置、熱調節システム、およびデバイス製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3031947B2 (ja) * 1990-04-12 2000-04-10 キヤノン株式会社 露光装置
JP2003318080A (ja) * 2002-04-22 2003-11-07 Hitachi High-Technologies Corp 電子ビーム描画装置
US6977713B2 (en) * 2003-12-08 2005-12-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN101180706A (zh) * 2005-10-05 2008-05-14 株式会社尼康 曝光装置及曝光方法
US7936443B2 (en) * 2006-05-09 2011-05-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN101042539A (zh) * 2006-12-22 2007-09-26 上海微电子装备有限公司 悬挂式支撑成像系统及光刻装置
CN100578362C (zh) * 2007-06-29 2010-01-06 上海微电子装备有限公司 垂向微调及重力补偿装置与光刻机

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3493682B2 (ja) * 1993-04-14 2004-02-03 株式会社ニコン 鏡筒支持装置及び露光装置
JP2005322907A (ja) 2004-05-05 2005-11-17 Asml Netherlands Bv リソグラフィ装置、熱調節システム、およびデバイス製造方法

Also Published As

Publication number Publication date
TW201531814A (zh) 2015-08-16
TWI541616B (zh) 2016-07-11
CN104749904B (zh) 2017-08-25
WO2015101194A1 (zh) 2015-07-09
CN104749904A (zh) 2015-07-01
KR20160100379A (ko) 2016-08-23

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