KR101696016B1 - 2-실릴옥시-피롤을 사용한 3-((피롤-2-일)메틸렌)-2-피롤론의 제조 방법 - Google Patents
2-실릴옥시-피롤을 사용한 3-((피롤-2-일)메틸렌)-2-피롤론의 제조 방법 Download PDFInfo
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- KR101696016B1 KR101696016B1 KR1020137014139A KR20137014139A KR101696016B1 KR 101696016 B1 KR101696016 B1 KR 101696016B1 KR 1020137014139 A KR1020137014139 A KR 1020137014139A KR 20137014139 A KR20137014139 A KR 20137014139A KR 101696016 B1 KR101696016 B1 KR 101696016B1
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- C07D403/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings
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Abstract
Description
도 2는 수니티닙 염기 1 및 수니티닙 말레이트 2의 화학 구조를 도시한다.
도 3은 3-((피롤-2-일)메틸렌)-2-피롤론 또는 3-((아릴)메틸렌)-2-피롤론 모이어티를 갖는, 생물학적으로 활성인 화합물을 도시한다.
도 4는 본 발명에서 DMSO 및 MIBK로부터 결정화된 수니티닙 말레이트의 X-레이 분말 회절 XRPD 패턴을 도시한다.
도 5는 수니티닙 말레이트 다형체 형태 I의 X-레이 분말 회절 XRPD 패턴을 도시한다(US2007191테드 산8A1).
도 6은 형태 U와 일치하는, 여기에 기재된 구현예에 의해 분리된 수니티닙 말레이트의 결정형의 X-레이 분말 회절 XRPD 패턴을 도시한다.
도 7은 여기에 기재된 구현예에 의해 분리된 수니티닙 말레이트의 또다른 결정형의 DSC 트레이스를 도시한다.
도 8은 WO2009067686A2에 기재된 형태 U의 X-레이 분말 회절 XRPD 패턴을 도시한다.
도 9는 실시예 19에서 만들어진 생성물의 X-레이 분말 회절 패턴을 도시한다.
도 10은 실시예 19에서 만들어진 생성물의 시차 주사 열량측정을 도시한다.
Claims (29)
- 하기 식 (I)의 수니티닙(sunitinib) 또는 그 염의 제조 방법으로서:
a) 하기 식 (IIA)의 화합물을,
하기 식 (III)의 화합물과,
촉매의 존재 중에서 및 용매 중에서 반응시켜서 상기 식 (I)의 수니티닙을 얻는 단계; 또는
a') 하기 식 (IIB)의 화합물을,
하기 식 (III)의 화합물과,
촉매의 존재 중에서 및 용매 중에서 반응시켜서 하기 식 (IIIA)의 화합물을 얻고,
그 다음 상기 식 (IIIA)의 화합물을 상기 식 (I)의 수니티닙으로 전환시키는 단계를 포함하고;
b) 상기 식 (I)의 수니티닙의 염을 제조할 경우, 상기 방법은 식 (I)의 수니티닙을 염 형성제와 반응시켜 그 염을 얻는 단계를 더 포함하는 것인, 제조 방법. - 청구항 1에 있어서, 상기 촉매는 루이스 산 또는 브뢴스테드 산 촉매인 것인, 제조 방법.
- 청구항 2에 있어서, 상기 루이스 산은 트리메틸실릴 트리플루오로메탄술포네이트(TMSOTf), tert-부틸디메틸실릴 트리플루오로메탄술포네이트(TBSOTf), 트리메틸실릴 메탄술포네이트(TMSOMs), BF3.Et20, SnCl4, LiCl04, M(OTf)3 (여기서 OTf는 트리플레이트이고, M은 란타나이드 이온, 또는 Bi임), M(OTf)4 (여기서 OTf는 트리플레이트이고, M은 전이 금속 이온임), ZnCl2, ZnBr2, ZnI2, AlCl3, MgCl2, MgBr2 및 TiCl4로 이루어진 군에서 선택된 것인, 제조 방법.
- 청구항 3에 있어서, 상기 루이스 산 촉매는 트리메틸실릴 트리플루오로메탄술포네이트(TMSOTf)인 것인, 제조 방법.
- 청구항 2에 있어서, 상기 브뢴스테드 산은 D-말산, L-말산, 트리플루오로아세트산, H2SO4, p-톨루엔술폰산(TsOH), 트리플릭산(TfOH), 메탄술폰산(MsOH) 및 캄포술폰산(CSA)으로 이루어진 군에서 선택된 것인, 제조 방법.
- 청구항 4에 있어서, 상기 트리메틸실릴 트리플루오로메탄술포네이트(TMSOTf)의 몰 퍼센트는 상기 화학식 (IIA) 또는 (IIB)의 화합물에 대해 5 mol% 내지 200 mol%인 것인, 제조 방법.
- 청구항 7에 있어서, 상기 실릴화제는 헥사메틸디실라잔(HMDS), N,O-비스(트리메틸실릴)트리플루오로아세트아미드(BSTFA), 트리메틸실릴 클로라이드(TMSCl), N,O-비스(트리메틸실릴)아세트아미드(BSA), tert-부틸디메틸실릴 트리플루오로메탄술포네이트(TBSOTf) 및 tert-부틸디메틸실릴 클로라이드(TBSCl)로 이루어진 군에서 선택된 것인, 제조 방법.
- 청구항 7에 있어서, 상기 실릴화는 용매의 존재 중에서, 또는 용매의 부존재 중에서 수행되고, 상기 실릴화제는 용매로서 작용하는 것인, 제조 방법.
- 청구항 1에 있어서, 상기 염 형성제는 D-말산, L-말산, 캄포술폰산, 타르타르산, 트리플루오로아세트산, 벤조산(BzOH), 아세트산(AcOH), 메탄술폰산(MsOH), HCl, HBr, H2S04, HF, 및 3HF.Et3N으로 이루어진 군에서 선택된 것인, 제조 방법.
- 청구항 1에 있어서, 상기 단계 a) 후에 하기 단계들을 더 포함하는, 제조 방법:
i) 반응 단계 a)로부터 얻어진 조 수니티닙(crude sunitinib)을 수성 염기로 퀀치(quenching)하여 습윤 케이크(wet cake)를 얻는 단계;
ii) 상기 습윤 케이크를 알코올로 재슬러리(reslurrying) 및 여과하는 단계; 및
iii) 필터 케이크를 건조하여 정제된 수니티닙을 얻는 단계. - 청구항 1에 있어서, 상기 수니티닙의 염은 수니티닙 L-말레이트이고, 상기 단계 b)가 수행되어 조 수니티닙 L-말레이트를 고체 형태로 얻고, 상기 방법은 하기 단계들을 더 포함하는, 제조 방법:
i) 디메틸술폭시드(DMSO)를 45℃로 예비 가열하는 단계;
ii) 고체 형태의 조 수니티닙 L-말레이트를 예비 가열된 디메틸술폭시드(DMSO)에 가하는 단계;
iii) 메틸 이소부틸 케톤(MIBK)을 ii)의 혼합물에 가하는 단계;
iv) iii)의 혼합물을 냉각 및 여과하여 정제된 수니티닙 L-말레이트를 제공하는 단계. - 청구항 1에 있어서, 상기 용매는 1,2-디클로로에탄(DCE), 디클로로메탄(DCM), 클로로포름(CHCl3), 톨루엔(PhMe), N,N-디메틸포름아미드(DMF), N,N-디메틸아세트아미드(DMAC), N-메틸-2-피롤리돈(NMP), 디메틸술폭시드(DMSO), 에틸 아세테이트(EtOAc), 아세토니트릴(MeCN), n-헵탄, 1,4-디옥산, 아세톤, 메틸 이소부틸 케톤(MIBK), 및 테트라히드로푸란(THF) 및 이들의 혼합물로 이루어진 군에서 선택된 것인, 제조 방법.
- 청구항 1에 있어서, 상기 반응 단계 a)는 0℃ 내지 200℃의 온도에서 수행되는 것인, 제조 방법.
- 청구항 15에 있어서, 상기 촉매는 루이스 산 또는 브뢴스테드 산 촉매인 것인, 제조 방법.
- 청구항 16에 있어서, 상기 루이스 산은 트리메틸실릴 트리플루오로메탄술포네이트(TMSOTf), tert-부틸디메틸실릴 트리플루오로메탄술포네이트(TBSOTf), 트리메틸실릴 메탄술포네이트(TMSOMs), BF3.Et20, SnCl4, LiCl04, M(OTf)3 (여기서 OTf는 트리플레이트이고, M은 란타나이드 이온, 또는 Bi임), M(OTf)4 (여기서 OTf는 트리플레이트이고, M은 전이 금속 이온임), ZnCl2, ZnBr2, ZnI2, AlCl3, MgCl2, MgBr2 및 TiCl4로 이루어진 군에서 선택된 것인, 제조 방법.
- 청구항 17에 있어서, 상기 루이스 산 촉매는 트리메틸실릴 트리플루오로메탄술포네이트(TMSOTf)인 것인, 제조 방법.
- 청구항 16에 있어서, 상기 브뢴스테드 산은 D-말산, L-말산, 트리플루오로아세트산, H2SO4, p-톨루엔술폰산(TsOH), 트리플릭산(TfOH), 메탄술폰산(MsOH) 및 캄포술폰산(CSA)으로 이루어진 군에서 선택된 것인, 제조 방법.
- 청구항 18에 있어서, 상기 트리메틸실릴 트리플루오로메탄술포네이트(TMSOTf)의 몰 퍼센트는 상기 화학식 (IIC)의 화합물에 대해 5 mol% 내지 200 mol%인 것인, 제조 방법.
- 청구항 21에 있어서, 상기 실릴화제는 헥사메틸디실라잔(HMDS), N,O-비스(트리메틸실릴)트리플루오로아세트아미드(BSTFA), 트리메틸실릴 클로라이드(TMSCl), N,O-비스(트리메틸실릴)아세트아미드(BSA), tert-부틸디메틸실릴 트리플루오로메탄술포네이트(TBSOTf) 및 tert-부틸디메틸실릴 클로라이드(TBSCl)로 이루어진 군에서 선택된 것인, 제조 방법.
- 청구항 21에 있어서, 상기 실릴화는 용매의 존재 중에서, 또는 용매의 부존재 중에서 수행되고, 상기 실릴화제는 용매로서 작용하는 것인, 제조 방법.
- 청구항 15에 있어서, 상기 염 형성제는 D-말산, L-말산, 캄포술폰산, 타르타르산, 트리플루오로아세트산, 벤조산(BzOH), 아세트산(AcOH), 메탄술폰산(MsOH), HCl, HBr, H2S04, HF, 및 3HF.Et3N으로 이루어진 군에서 선택된 것인, 제조 방법.
- 청구항 15에 있어서, 상기 용매는 1,2-디클로로에탄(DCE), 디클로로메탄(DCM), 클로로포름(CHCl3), 톨루엔(PhMe), N,N-디메틸포름아미드(DMF), N,N-디메틸아세트아미드(DMAC), N-메틸-2-피롤리돈(NMP), 디메틸술폭시드(DMSO), 에틸 아세테이트(EtOAc), 아세토니트릴(MeCN), n-헵탄, 1,4-디옥산, 아세톤, 메틸 이소부틸 케톤(MIBK), 및 테트라히드로푸란(THF) 및 이들의 혼합물로 이루어진 군에서 선택된 것인, 제조 방법.
- 청구항 15에 있어서, 상기 반응 단계 a)는 0℃ 내지 200℃의 온도에서 수행되는 것인, 제조 방법.
- 청구항 28에 있어서, 상기 식 (VI)의 화합물 및 상기 식 (VII)의 화합물 간의 반응은 루이스 산 또는 브뢴스테드 산 촉매의 존재 중에서 수행되는 것인, 제조 방법.
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