KR101641855B1 - Scrubber for treating processing waste gas - Google Patents

Abstract

The present invention relates to a scrubber for process waste gas treatment, and more particularly, to a scrubber for process waste gas treatment, which comprises a plasma processing unit for decomposing the process waste gas by bringing the plasma into contact with the process waste gas, a cooling unit for cooling the process waste gas, And a reaction part having a reaction housing in which the process waste gas flows from the cooling part and hollow inside and a urea particle layer positioned inside the reaction housing and contacting the process waste gas, .

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a scrubber for treating waste gas,

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a scrubber for treating waste gas discharged from a semiconductor manufacturing process, a manufacturing process of a flat panel display such as an LCD (Liquid Crystal Display) or an OLED (Organic Light Emitting Display) .

(Hereinafter referred to as "process waste gas") which is harmful to the human body and the environment is generated in a process of manufacturing a flat panel display such as a semiconductor manufacturing process, a LCD or an OLED, a process using a special gas such as a solar cell and an LED manufacturing process . In order to prevent environmental pollution caused by the process waste gas, the process waste gas must be purified before it is discharged to the outside.

The process waste gas is purified by the scrubber for process waste gas treatment and discharged to the outside. Generally, the process waste gas scrubber includes a reaction chamber for providing a high-temperature heat source for decomposing harmful substances in the process waste gas or promoting a chemical reaction, and a water treatment tower for filtering the solid phase powder from waste gas passing through the reaction chamber .

Meanwhile, the process waste gas contains a large amount of halogenated hydrogen compounds such as HF and HCl generated during the plasma treatment of PFCs and CFCs. The water-soluble gas such as the hydrogen halide compound contained in the process waste gas is mainly collected and processed through a wet process of passing water or spraying water, so that waste water is generated and it is troublesome to further collect and treat the waste water . Further, in the case of using the above-mentioned wet process, the treatment efficiency of a water-soluble gas containing a hydrogen halide compound is low, which is a problem.

Korean Patent Publication No. 10-2007-0080004 (Publication Date: August 9, 2007)

The present invention provides a scrubber for processing waste gas, which is capable of treating a water-soluble gas contained in a process waste gas using a urea material.

According to an aspect of the present invention, there is provided a scrubber for processing exhaust gas, comprising: a plasma processing unit for decomposing the process waste gas by bringing a plasma into contact with a process gas; A reaction part for cooling the waste gas to collect reaction by-products, a reaction housing in which the process waste gas flows from the cooling part and hollow inside, and a urea particle layer located inside the reaction housing and contacting the process waste gas, As shown in FIG.

In addition, the urea particle layer may be formed to remove the hydrogencarbonate compound containing HF gas or HCl gas contained in the process waste gas in contact with the process waste gas flowing from the cooling section. The urea particle layer may be formed by filling urea particles having an average particle size of several hundred microns to several millimeters at a predetermined height inside the reaction housing.

Also, the reaction housing may include a reaction inlet through which the process waste gas flows and a reaction outlet through which the process waste gas flows out, and the urea particle layer may be positioned between the reaction inlet and the reaction outlet.

The plasma processing unit includes a plasma torch for generating a plasma, an injection chamber for bringing the process waste gas flowing from the outside into contact with the plasma, and a reaction chamber in which the plasma and the process waste gas react with each other to decompose the process waste gas, .

The cooling unit may include a cooling housing through which the process waste gas flowing out of the plasma processing unit flows, a first cooling plate for primarily cooling the introduced process waste gas to collect reaction by-products of the process waste gas, and a second cooling plate And a second cooling plate that secondarily cools the process waste gas to collect reaction by-products of the process waste gas. At this time, the cooling housing has a hollow interior and a housing including a side wall, another side wall, a front wall, a rear wall, a main body upper plate and a lower main plate, and a waste gas inlet and a waste gas outlet formed on one side and the other side, respectively, A first partition wall formed at a position opposite to the one side wall on the opposite side of the waste gas inlet in the housing main body and forming a first partition wall hole between the rear wall and the other side wall of the housing body; And a second partition wall hole formed between the first partition wall and the second partition wall, the second partition wall hole being formed at a position opposite to the other side wall on the opposite side of the waste gas outlet and formed at the lower edge of the front end.

The scrubber for the process waste gas treatment may further include a trap portion positioned between the cooling portion and the reaction portion to allow the process waste gas flowing out from the cooling portion to flow and to collect the reaction byproducts by cooling the process- As shown in FIG.

Since the scrubber for the process waste gas treatment of the present invention treats the water-soluble gas by the acid base reaction of the urea material and the process waste gas, there is no need to use separate water other than the circulating cooling water, so there is no waste water discharge and a separate water treatment facility There is an effect to prevent.

Further, the scrubber for the process waste gas treatment of the present invention has the effect of removing the hydrogen halide compound contained in the process waste gas by bringing the urea into contact with the process waste gas before finally discharging the process gas.

The scrubber for the process waste gas treatment of the present invention firstly removes the reaction by-products of the process waste gas while cooling the process waste gas, then proceeds the efficient acid base reaction by contacting the amine-based material with the process waste gas to increase the treatment efficiency of the water- There is an effect that can be.

In addition, since the scrubber for the process waste gas treatment of the present invention uses only electricity and does not use water, no wastewater is generated, thereby preventing corrosion of the equipment, facilitating management, and reducing operating expenses.

1 is a front view of a scrubber for processing waste gas according to an embodiment of the present invention.
2 is a plan view of a scrubber for processing waste gas according to an embodiment of the present invention.
3 is a horizontal cross-sectional view of AA of FIG.
4 is a vertical sectional view of BB of Fig.
5 is a partially cutaway perspective view of the first cooling portion of Fig.
Figure 6 is a vertical cross-sectional view of CC of Figure 2;

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a scrubber for processing waste gas according to the present invention will be described in detail with reference to the accompanying drawings.

First, the structure of the scrubber for the process waste gas treatment of the present invention will be described.

1 is a front view of a scrubber for processing waste gas according to an embodiment of the present invention. 2 is a plan view of a scrubber for processing waste gas according to an embodiment of the present invention. 3 is a horizontal sectional view taken along line A-A in Fig. 4 is a vertical sectional view taken along the line B-B in Fig. 5 is a partially cutaway perspective view of the first cooling portion of Fig. 6 is a vertical cross-sectional view taken along line C-C of Fig.

1 to 6, a scrubber for processing exhaust gas according to an embodiment of the present invention includes a plasma processing unit 100, a cooling unit 200, a trap unit 300, and a reaction unit 400 .

The process waste gas treatment scrubber handles a process waste gas containing a halogen group element such as chlorine (Cl) and fluorine (F). Particularly, the scrubber for the process waste gas disassembles and dissociates the process waste gas in the plasma processing unit 100, and cools the process waste gas decomposed in the cooling unit 200 and the byproducts generated during the process, thereby collecting reaction byproducts as powder. Further, the scrubber for the process waste gas treatment further collects reaction by-products (powder by-products) in the trap portion 300. The scrubber for the process waste gas treatment collects and removes the hydrogen halide compound before the process waste gas is finally discharged using the chemical reaction between the urea material and the hydrogen halide compound in the reaction part 140. Therefore, the scrubber for the process waste gas treatment collects and removes a water-soluble gas such as a hydrogen halide compound contained in the process waste gas without using water. Here, the hydrogen halide compound includes a water-soluble gas such as HX (X = F, Cl).

The plasma processing unit 100 is formed of a general plasma processing unit used in a scrubber for processing a process waste gas using plasma. For example, the plasma processing unit 100 may include a plasma torch 110, an injection chamber 130, a reaction chamber 150, and a connection pipe 170.

The plasma processing unit 100 decomposes and dissociates the process waste gas by bringing the plasma flame generated in the plasma torch 110 and the process waste gas into contact with each other in the injection chamber 130 and reacting in the reaction chamber 150, .

The plasma torch 110 is located at the top of the plasma processing unit 100 and generates plasma. The plasma torch 110 may be formed of a conventional plasma torch used in a scrubber for processing waste gas of the process, and may be formed in various structures. Meanwhile, the plasma torch 110 may be replaced with any one selected from a gas torch, an electric heater and its equivalent.

The injection chamber 130 has a substantially cylindrical shape with upper and lower openings, and is connected to the lower end of the plasma torch 110. The injection chamber 130 includes a plurality of process waste gas injection pipes 131 which are spaced apart in the circumferential direction and penetrate into the process chamber. The process chamber waste gas is injected into the injection chamber 130 through the process waste gas injection pipe 131. In addition, plasma flame is introduced into the injection chamber 130 from the upper plasma torch 110. Accordingly, the injection chamber 130 provides a space in which the plasma flame and the process waste gas are in primary contact. The injection chamber 130 allows the process waste gas in contact with the plasma flame to flow downward.

The process waste gas inlet pipe 131 is connected to a process waste gas pipe (not shown) connected to the process equipment (not shown), and allows the process waste gas to flow into the inner space of the injection chamber 130.

The reaction chamber 150 has a substantially cylindrical shape with upper and lower openings, and is connected to the lower end of the injection chamber 130. The reaction chamber 150 provides a space in which the process waste gas flows in contact with the plasma flame to decompose. The process waste gas is decomposed and dissociated by the thermal energy of the plasma flame.

The connection pipe 170 is formed in a substantially cylindrical shape having upper and lower openings and is connected to the lower end of the reaction chamber 150. The connection pipe 170 may be divided into a plurality of connection pipes as required. The connection pipe 170 connects the reaction chamber 150 with the cooling unit 200 and provides a passage through which the process waste gas processed in the reaction chamber 150 flows into the cooling unit 200. The connection pipe 170 may be omitted when the reaction chamber 150 is directly connected to the cooling unit 200.

A cooling water passage (not shown) may be formed along the outer circumferential surface of the connection pipe 170 to allow the process waste gas treated by the cooling water to flow into the cooling unit 200 while cooling the waste gas. In this case, the coupling pipe 170 rapidly cools the temperature of the process waste gas so that the collection efficiency of reaction byproduct is improved.

The cooling unit 200 includes a cooling housing 210, a first cooling plate 230, and a second cooling plate 250. The cooling unit 200 collects reaction by-products generated while the process waste gas, which is decomposed and dissociated in the plasma processing unit 100 and is introduced into the cooling housing 210, is first cooled by the first cooling plate 230, And the reaction by-products generated while cooling in the second cooling plate 250 are collected in powder form.

The cooling housing 210 includes a housing body 211, a waste gas inlet 213, a waste gas outlet 215, a first partition 217, and a second partition 219.

The housing main body 211 is formed in a substantially box shape having a hollow interior and may be formed in a rectangular box shape. For example, the housing main body 211 includes a first side wall 211a, a second side wall 211b, a front wall 211c, a rear side wall 211d, a main body upper plate 211e and a lower main body plate 211f . The housing main body 211 accommodates the first cooling plate 230 and the second cooling plate 250 and provides a space through which the process waste gas flows.

The waste gas inlet 213 is formed at one side of the main body upper plate 211e of the housing main body 211 and the reaction chamber 150 or the connection pipe 170 is connected. The waste gas inlet 213 provides a path through which process waste gas processed in the reaction chamber 150 flows into the interior of the cooling housing 210.

The waste gas outlet 215 is formed on the other side of the main body upper plate 211e of the housing main body 211 and the trap portion 300 is connected. The waste gas outlet 215 provides a path through which the process waste gas from which reaction byproducts are removed flows to the trap unit 300.

The first partition 217 is formed in a plate shape and has a smaller width than a side wall 211a of the housing body 211. [ The first partition 217 is formed at a position opposite to the one side wall 211a of the housing body 211 on the opposite side with respect to the waste gas inlet 213. [ That is, a waste gas inlet 213 is positioned between the first partition 217 and the one side wall 211a of the housing main body 211. The first partition 217 is formed such that one end of the first partition 217 contacts the front wall 211c of the housing body 211 and the other end of the first partition 217 is spaced from the rear wall 211d of the housing body 211. Accordingly, the first partition 217 separates one space of the housing body 211 into two spaces. The first partition 217 forms a first partition wall hole 217a through which a waste gas flows between the first partition 217 and the rear wall 211d of the housing body 211. [ The first partition wall hole 217a provides a passage through which the process waste gas flowing from the waste gas inlet 213 flows to the first cooling plate 230. [

The second partition 219 is in the form of a plate and is formed to have the same width as the one side wall 211a of the housing body 211. [ The second partition 219 is located between the other side wall 211b of the housing main body 211 and the first partition wall 217 and extends from the opposite side of the waste gas outlet 215 to the other side wall of the housing body 211 211b. That is, the second gas barrier 219 has a waste gas outlet 215 between the other side wall 211b of the housing body 211 and the first partition wall 217. The second partition 219 is formed such that one end of the second partition 219 contacts the front wall 211c of the housing body 211 and the other end of the second partition 219 is spaced from the rear wall 211d of the housing body 211. The second partition 219 is formed such that one end of the second partition 219 contacts the front wall 211c of the housing body 211 and the other end of the second partition 219 contacts the rear wall 211d of the housing body 211.

The second barrier rib 219 includes a second barrier rib 219a formed at the bottom edge of the front end. The second partition wall hole 219a provides a passage through which the process waste gas that has passed through the first cooling plate 230 flows to the second cooling plate 250.

The first cooling plate 230 is formed in a hexagonal plate shape having a hollow interior and includes a plurality of gas pipe tubes 231 penetrating from one side to the other side. The first cooling plate 230 may be formed by coupling an upper plate, a lower plate, and a side plate. The first cooling plate 230 includes a first cooling water inlet 233 and a first cooling water outlet 235 at an upper portion thereof. The first cooling plate 230 may be formed by coupling an upper plate, a lower plate, and a side plate.

The first cooling plate 230 has an area corresponding to the width and the height between the first barrier rib 217 and the second barrier rib 219 and is perpendicular to the first barrier rib 217 and the second barrier rib 219 Respectively. A plurality of the first cooling plates 230 are spaced apart from each other so as to be parallel to the front wall 211c between the front wall 211c and the rear wall 211d of the housing main body 211. [ The gas pipe 231 is formed so that its center axis is horizontal. The gas pipe 231 is formed so as not to penetrate the gas pipe 231 of the adjacent first cooling plate 230. Thus, the process waste gas passes through the gas pipe 231 while flowing zigzag between the first cooling plates 230, and is cooled while being in contact with the surface of the first cooling plate 230.

The first cooling plate 230 is cooled by cooling water flowing in the first cooling plate 230, and passes through the gas pipe 231 to cool the waste gas flowing through the first cooling plate 230. The cooling water flows into the first cooling water inlet 233, flows through the first cooling plate 230, and then flows out to the first cooling water outlet 235. The first cooling plate 230 dissolves in the plasma processing unit 100 and cools the process waste gas flowing to collect reaction byproducts in powder form.

The first cooling water inlet 233 and the first cooling water outlet 235 are formed at any one of the upper plate, the lower plate, and the side plate of the first cooling plate 230. The first cooling water inlet 233 introduces cooling water into the first cooling plate 230 and the first cooling water outlet 235 allows the cooling water flowing into the first cooling plate 230 to flow out. The cooling water cools the first cooling plate 230 so that the process waste gas contacting the surface is effectively cooled and collected.

The second cooling plate 250 includes a mesh net 251, a support bar 253, and a cooling pipe 255. The second cooling plate 250 has a width smaller than a distance between the first partition 217 and the second partition 219 and a distance between the front wall 211c and the rear wall 211d of the housing body 211 And have a corresponding length. The second cooling plate 250 is positioned between the first partition 217 and the second partition 219 to form a horizontal plane, and a plurality of the second cooling plates 250 are spaced apart from each other in the vertical direction. At this time, a plurality of the second cooling plates 250 are alternately contacted to the other side wall 211b of the cooling housing 210 or to the second partition 219. Therefore, the second cooling plate 250 forms a second cooling hole 250a through which the waste gas flows between the second cooling plate 250 and the other side wall 211b or the second partition wall 219. Part of the process waste gas flows through the mesh nets 251 while flowing upward, while the remaining part of the process waste gas flows in a zigzag manner while passing through the second cooling holes 250a. Accordingly, the second cooling holes 250a increase the contact time of the process waste gas with the mesh net 251 and smooth the flow of the process waste gas even when many reaction by-products are accumulated in the mesh net 251.

The second cooling plate 250 is cooled so that the process waste gas flowing through the first cooling plate 230 passes through the mesh net 251 cooled by the cooling water flowing through the cooling pipe 255 and is collected as reaction byproduct do.

The mesh network 251 may be a general mesh network in which wires are connected in a lattice shape and a plurality of holes are formed so as to pass vertically, or a perforated plate having a flat plate shape and having a plurality of holes penetrating vertically. The mesh net 251 is formed in a substantially rectangular shape and has a width smaller than a distance between the first bank 217 and the second bank 219 and a width of the front wall 211c and the rear wall 211d And a length corresponding to the distance between the two ends.

The mesh network 251 includes an upper mesh network 251a and a lower mesh network 251b, and may be spaced apart from each other in the vertical direction. However, the mesh network 251 may be formed of only the upper mesh network 251a or the lower mesh network 251b. The mesh net 251 cools process waste gas passing through a plurality of holes passing through the upper and lower sides to collect reaction byproducts.

The supporting bar 253 is formed in a bar shape and supports the front and rear sides of the upper mesh net 251a and the lower mesh net 251b, respectively. The supporting bar 253 is coupled to the second partition wall 219 and the other side wall 211b to support the mesh net 251.

The cooling pipe 255 is formed of a hollow pipe. The cooling pipes 255 are formed in a zigzag shape so that both ends of the cooling pipes 255 extend outside the other side wall 211b of the cooling housing 210. [ The cooling pipe 255 is coupled to the upper or lower surface of the mesh net 251 and is preferably positioned between the upper mesh net 251a and the lower mesh net 251b. The cooling pipe 255 is connected to an external cooling water supply pipe (not shown), and is cooled by cooling water supplied from outside and discharged from the outside. In addition, the cooling pipe 255 cools the upper mesh net 251a and the lower mesh net 251b. The cooling pipe 255 cools the process waste gas passing through the mesh net 251 from the lower part to the upper part together with the mesh net 251 to efficiently collect the reaction by-products.

The trap unit 300 includes a trap housing 310 and a trap plate 330. The trap part 300 cools and further collects the reaction by-products contained in the process waste gas flowing through the cooling part 200. Meanwhile, the trap part 300 may be omitted when the amount of the reaction by-products in the process waste gas passing through the second cooling plate 250 is small.

The trap housing 310 is formed in a hollow cylindrical shape and may be formed in a cylindrical shape. The trap housing 310 is formed with a trap inlet 311 and a trap outlet 313. The trap inlet 311 of the trap housing 310 is formed at the bottom of the trap housing 310 and is coupled to the waste gas outlet 215 of the housing body 211. The trap inlet 311 allows the process waste gas flowing out from the waste gas outlet 215 to flow into the trap housing 310.

The trap outlet 313 is formed on the upper part of the trap housing 310 and is coupled to the reaction part 400. The trap outlet 313 allows the process waste gas flowing in the trap housing 310 to flow out into the reaction unit 400.

The trap plate 330 is formed to include a first trap plate 331 and a second trap plate 333. The trap plate 330 is formed by alternately laminating the first trap plate 331 and the second trap plate 333 so as to be spaced apart from each other in the vertical direction within the trap housing 310. At this time, the first trap plate 331 and the second trap plate 333 are supported and separated by a separate trap support rod 335. The trap plate 330 collects the reaction by-products generated by cooling the process waste gas that is contacted while flowing from the lower part to the upper part.

The first trap plate 331 and the second trap plate 333 are provided with separate cooling water supply ports (not shown) so that the cooling water is supplied to the inside and cooled. In addition, the first trap plate 331 and the second trap plate 333 may be formed with a separate cooling module (not shown). Accordingly, the first trap plate 331 and the second trap plate 333 can collect the reaction by-products while cooling the process waste gas flowing out more efficiently.

The first trap plate 331 is formed in a shape corresponding to the inner horizontal section of the trap housing 310 and may be formed in a disc shape. And is formed so as to be in contact with or in contact with the inner circumferential surface of the housing. The first trap plate 331 includes a first trap hole 331a formed at a central portion thereof. The first trap hole 331a provides a passage through which the process waste gas flowing through the trap inlet 311 flows upward. The process waste gas flows through the trap inlet 311 and then rises after it comes into contact with the lower surface of the first trap plate 331 or directly through the first trap hole 331a.

The second trap plate 333 is formed in a shape corresponding to the inner horizontal section of the trap housing 310 and may be formed in a disc shape. The second trap plate 333 is formed of a first trap plate 331, Is formed to have a smaller diameter. The second trap plate 333 is spaced apart from the inner circumferential surface of the trap housing 310 and forms a second trap hole 333a between the outer circumferential surface of the second trap plate 333 and the inner circumferential surface of the trap housing 310. [ The second trap hole 333a provides a passage through which the process waste gas flowing through the first trap hole 331a flows upward. After the process waste gas has risen through the first trap hole 331a, it contacts the lower surface of the second trap plate 333 and then rises through the second trap hole 333a.

Since the first trap plate 331 and the second trap plate 333 are alternately stacked and formed, the process waste gas passes sequentially through the first trap hole 331a and the second trap hole 333a, And flows between the first trap plate 331 and the second trap plate 333.

The reaction unit 400 includes a reaction housing 410 and a urea particle layer 420. The reaction unit 400 is positioned above the cooling unit 200 or the trap unit 300 and is positioned to allow the process waste gas to flow from the cooling unit 200 or the trap unit 300. The reaction unit 400 removes a water-soluble gas such as a hydrogen halide compound contained in the process waste gas by contacting the urea material of the urea particle layer 420 by an acid base reaction.

The reaction housing 410 is formed in a hollow cylindrical shape, and may be formed in a cylindrical shape. The reaction housing 410 is formed with a reaction inlet 411 and a reaction outlet 413. In addition, the reaction housing 410 may further include a reaction top plate 415 sealing the upper opening. The reaction inlet 411 of the reaction housing 410 is formed at the bottom of the reaction housing 410 and is coupled to the trap outlet 313 of the trap housing 310. The reaction inlet 411 allows the process waste gas flowing out from the trap outlet 313 to flow into the reaction housing 410.

The reaction outlet 413 may be formed on the upper surface of the reaction housing 410 and may be formed on the outer peripheral surface of the reaction housing 410. The reaction outlet 413 may be formed in the reaction top plate 415. The reaction outlet 413 allows the process waste gas flowing inside the reaction housing 410 to flow out to the outside.

The reaction top plate 415 temporarily shields the upper opening of the reaction housing 410. The reaction top plate 415 is temporarily separated from the reaction housing 410 when the urea particle layer 420 of the urea particle layer 420 located in the reaction housing 410 is replaced and the upper portion of the reaction housing 410 is opened .

The urea particle layer 420 is formed by filling urea particles at a predetermined height inside the reaction housing 410. Here, the urea particle means a form in which the urea material is aggregated in the form of a powder or a lump. The urea particle layer 420 includes a plurality of pores formed by filling the urea particles, and provides a passage through which the process waste gas passes. The urea particle layer 420 may be formed in the reaction housing 410 by filling urea particles in a separate case (not shown) in which a plurality of holes are formed in the lower plate and the upper plate. The urea particle layer 420 may be formed by stacking urea particles at a predetermined height on an upper portion of a separate perforated plate (not shown) located at an inner lower portion of the reaction housing 410. The urea particle layer 420 may be formed to have a total fill volume of 40 to 60L. Further, the urea particles are formed to have an average particle size of several hundred microns to several millimeters. If the average particle size of the urea particles is too small, the passage for passing the process waste gas is not sufficiently provided, and the flow of the process waste gas is not smooth. If the average particle size of the urea particles is too large, the contact between the urea particles and the process waste gas is not sufficient, and the removal of the hydrogen halide compound becomes insufficient. The urea particle layer 420 may be formed at an appropriate height depending on the capacity of the process waste gas of the scrubber or the average particle size of the urea particles.

The urea particle layer 420 collects water-soluble gas such as HF gas or HCl gas contained in the process waste gas.

More specifically, the urea particle reacts with a hydrogen halide compound by the main reaction formula or the reaction formula below to collect a hydrogen halide compound. According to the main reaction scheme, the hydrogen halide compound bonds with the hydrogen atom of the amine group of the urea, and no substitution by the halogen group element occurs. As the urea reacts with the hydrogen halide compound and binds, the powder state changes to the emulsified state. Further, according to the reaction formula, the urea particles decompose into carbonyl and amine groups when heat is present, the carbonyl group is converted to CO ₂ , and the amine group reacts with a halogenated hydrogen compound to form NH ₄ X.

<Reaction Scheme>

&Lt; Subreaction formula &

Next, the operation of the scrubber for the process waste gas treatment of the present invention will be described.

First, the process waste gas generated in the semiconductor process flows into the injection chamber 130 through the process waste gas injection pipe 131. At this time, the plasma torch 110 forms a plasma flame and provides it to the injection chamber 130. The process waste gas contacts the plasma flame within the injection chamber 130 and flows into the reaction chamber 150. The process waste gas reacts and decomposes and dissociates in contact with the plasma flame. The process waste gas is partially formed as reaction by-products while being cooled through the connection pipe 170, and flows into the cooling unit 200.

The process waste gas flows into the space between the one side wall 211a of the housing main body 211 and the first partition wall 217 through the waste gas inlet 213 formed at one side of the cooling housing 210. [ The process waste gas flows into the space between the first partition 217 and the second partition 219 through the first partition wall hole 217a of the first partition wall 217 and comes into contact with the first cooling plate 230 do. The first cooling plate 230 cools the process waste gas in contact with the incoming process waste gas and collects reaction by-products. The first cooling plate 230 is cooled by the cooling water flowing through the first cooling water inlet 233 and the first cooling water outlet 235 to continuously collect the reaction by-products while cooling the process waste gas. The process waste gas flows while passing through the gas pipe 231 formed in the first cooling plate 230. The process waste gas passes through the first cooling plate 230 and then passes through the second partition wall hole 219a formed in the second partition wall 219 and the second partition wall 219 and the other wall of the housing body 211 211b. The second cooling plate 250 is cooled while allowing the process waste gas to pass through the mesh net 251 and the cooling pipe 255 to collect reaction byproducts. Second cooling holes 250a are formed on one side and the other side of the second cooling plate 250 so that the time during which the process waste gas contacts the mesh net 251 while flowing zigzag between the second cooling plates 250 increases .

The process waste gas passes through the second cooling plate 250 and then flows out from the cooling housing 210 through the waste gas outlet 215 and flows into the trap housing 310 through the trap inlet 311. The trap unit 300 allows the process waste gas flowing through the trap inlet 311 to flow upward while contacting the trap plate 330. The trap plate 330 is cooled by contacting the process waste gas with the first trap plate 331 and the second trap plate 333 to further collect reaction by-products. The trap plate 330 allows the process waste gas to flow staggered while alternately passing through the first trap hole 331a of the first trap plate 331 and the second trap hole 333a of the second trap plate 333 .

The process waste gas flows out through the trap outlet 330 of the trap housing 310 after passing through the trap plate 330 and is discharged through the reaction inlet 411 of the reaction housing 410 to the inside of the reaction housing 410 Lt; / RTI &gt; The urea particle layer 420 of the reaction part 400 makes contact with a water-soluble gas such as a halogenated hydrogen compound contained in the process waste gas by the main reaction formula and the reaction formula mentioned above while contacting the process waste gas, Collect and fix the gas. The process waste gas flows out through the reaction outlet 413 of the reaction housing 410 after passing through the urea particle layer 420.

Therefore, the process waste gas treatment apparatus of the present invention does not use any other water than the cooling water circulated while being supplied to the first cooling plate 230 and the second cooling plate 250 of the cooling unit 200, And does not require a water treatment facility to treat wastewater. Therefore, the process waste gas treatment apparatus of the present invention treats waste gas by an environmentally friendly method. Furthermore, the process waste gas treatment apparatus of the present invention completely decomposes and dissociates the waste gas using thermal energy such as plasma, and converts the decomposed and dissociated waste gas into a powder reaction product (powder byproduct) Can be further lowered. Further, since the present invention uses only electricity, it is easy to manage and the operation cost can be reduced.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the invention. Will be clear to those who have knowledge of.

100; The plasma processing section
110: plasma torch 130: injection chamber
150: reaction chamber 170: connector
200:
210: cooling housing 230: first cooling plate
250: second cooling plate
300:
310: trap housing 320: trap plate
400: reaction part
410; Reaction housing 420: Urea particle layer

Claims (8)

A process for removing a water-soluble gas containing a hydrogen halide compound contained in a process waste gas without using water. As a scrubber for waste gas treatment,
A plasma processing unit for bringing the plasma into contact with the process waste gas to decompose the process waste gas;
A cooling unit for cooling the process waste gas decomposed and introduced in the plasma processing unit to collect reaction by-products,
And a reaction unit having a reaction housing in which the process waste gas flows from the cooling unit and hollow inside, and a urea particle layer located inside the reaction housing and contacting the process waste gas,
The cooling unit
A cooling housing through which the process waste gas flowing out of the plasma processing section flows,
A first cooling plate for first cooling the introduced process waste gas to collect reaction by-products of the process waste gas and
And a second cooling plate that secondarily cools the process waste gas that has passed through the first cooling plate to collect reaction by-products of the process waste gas,
The cooling housing
A housing main body including a waste gas inlet and a waste gas outlet formed on one side and the other side of the main body upper plate, the main body upper plate and the lower main body plate having a hollow interior and having one side wall, another side wall,
A first partition wall formed at a position opposite to the one side wall on the opposite side of the waste gas inlet in the housing body and forming a first partition wall hole between the rear wall and the rear wall;
And a second partition wall hole formed in a lower corner of the front end, the partition wall being located between the other side wall of the housing main body and the first partition wall and facing the other side wall on the opposite side with respect to the waste gas outlet, Wherein said scrubber is a scrubber. The method according to claim 1,
Wherein the urea particle layer is in contact with a process waste gas flowing from the cooling section to remove a hydrogencarbonate compound containing HF gas or HCl gas contained in the process waste gas. The method according to claim 1,
Wherein the urea particle layer is formed by filling urea particles having an average particle size of several hundred microns to several millimeters at a predetermined height inside the reaction housing. The method according to claim 1,
Wherein the reaction housing includes a reaction inlet through which the process waste gas flows and a reaction outlet through which the process waste gas flows out,
Wherein the urea particle layer is positioned between the reaction inlet and the reaction outlet. The method according to claim 1,
The plasma processing unit
A plasma torch for generating plasma,
An injection chamber for bringing the process waste gas flowing from the outside into contact with the plasma;
And a reaction chamber in which the plasma and the process waste gas react with each other to decompose the process waste gas. delete delete The method according to claim 1,
The process waste gas flowing out from the cooling unit is introduced between the cooling unit and the reaction unit,
Further comprising a trap portion for collecting the reaction by-products by cooling the process waste gas flowing into the process chamber.

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