KR101507240B1 - 금속 산화물 나노선 패턴을 포함하는 가스센서 나노어레이의 제조방법 - Google Patents
금속 산화물 나노선 패턴을 포함하는 가스센서 나노어레이의 제조방법 Download PDFInfo
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- KR101507240B1 KR101507240B1 KR1020130108357A KR20130108357A KR101507240B1 KR 101507240 B1 KR101507240 B1 KR 101507240B1 KR 1020130108357 A KR1020130108357 A KR 1020130108357A KR 20130108357 A KR20130108357 A KR 20130108357A KR 101507240 B1 KR101507240 B1 KR 101507240B1
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- Prior art keywords
- oxide precursor
- metal oxide
- poly
- nozzle
- nanowire
- Prior art date
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- 239000002070 nanowire Substances 0.000 title claims abstract description 133
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- 238000000034 method Methods 0.000 title claims abstract description 23
- 239000012702 metal oxide precursor Substances 0.000 claims abstract description 55
- 239000002131 composite material Substances 0.000 claims abstract description 40
- 239000000758 substrate Substances 0.000 claims abstract description 37
- 230000005684 electric field Effects 0.000 claims abstract description 24
- 238000004519 manufacturing process Methods 0.000 claims abstract description 19
- 238000010438 heat treatment Methods 0.000 claims abstract description 10
- 239000002243 precursor Substances 0.000 claims description 78
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 67
- 239000011787 zinc oxide Substances 0.000 claims description 32
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 24
- 238000003860 storage Methods 0.000 claims description 24
- 229920000620 organic polymer Polymers 0.000 claims description 19
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 13
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- 229910001887 tin oxide Inorganic materials 0.000 claims description 13
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- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 12
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- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 1
- JLDSOYXADOWAKB-UHFFFAOYSA-N aluminium nitrate Chemical compound [Al+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O JLDSOYXADOWAKB-UHFFFAOYSA-N 0.000 description 1
- ZZCONUBOESKGOK-UHFFFAOYSA-N aluminum;trinitrate;hydrate Chemical compound O.[Al+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O ZZCONUBOESKGOK-UHFFFAOYSA-N 0.000 description 1
- 229910003481 amorphous carbon Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- UNTBPXHCXVWYOI-UHFFFAOYSA-O azanium;oxido(dioxo)vanadium Chemical compound [NH4+].[O-][V](=O)=O UNTBPXHCXVWYOI-UHFFFAOYSA-O 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- WDEQGLDWZMIMJM-UHFFFAOYSA-N benzyl 4-hydroxy-2-(hydroxymethyl)pyrrolidine-1-carboxylate Chemical compound OCC1CC(O)CN1C(=O)OCC1=CC=CC=C1 WDEQGLDWZMIMJM-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 229940036348 bismuth carbonate Drugs 0.000 description 1
- JHXKRIRFYBPWGE-UHFFFAOYSA-K bismuth chloride Chemical group Cl[Bi](Cl)Cl JHXKRIRFYBPWGE-UHFFFAOYSA-K 0.000 description 1
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- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- UFGZSIPAQKLCGR-UHFFFAOYSA-N chromium carbide Chemical compound [Cr]#C[Cr]C#[Cr] UFGZSIPAQKLCGR-UHFFFAOYSA-N 0.000 description 1
- QSWDMMVNRMROPK-UHFFFAOYSA-K chromium(3+) trichloride Chemical compound [Cl-].[Cl-].[Cl-].[Cr+3] QSWDMMVNRMROPK-UHFFFAOYSA-K 0.000 description 1
- QFSKIUZTIHBWFR-UHFFFAOYSA-N chromium;hydrate Chemical compound O.[Cr] QFSKIUZTIHBWFR-UHFFFAOYSA-N 0.000 description 1
- XEHUIDSUOAGHBW-UHFFFAOYSA-N chromium;pentane-2,4-dione Chemical compound [Cr].CC(=O)CC(C)=O.CC(=O)CC(C)=O.CC(=O)CC(C)=O XEHUIDSUOAGHBW-UHFFFAOYSA-N 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- VVOLVFOSOPJKED-UHFFFAOYSA-N copper phthalocyanine Chemical compound [Cu].N=1C2=NC(C3=CC=CC=C33)=NC3=NC(C3=CC=CC=C33)=NC3=NC(C3=CC=CC=C33)=NC3=NC=1C1=CC=CC=C12 VVOLVFOSOPJKED-UHFFFAOYSA-N 0.000 description 1
- AQMRBJNRFUQADD-UHFFFAOYSA-N copper(I) sulfide Chemical compound [S-2].[Cu+].[Cu+] AQMRBJNRFUQADD-UHFFFAOYSA-N 0.000 description 1
- 229910000009 copper(II) carbonate Inorganic materials 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- NKNDPYCGAZPOFS-UHFFFAOYSA-M copper(i) bromide Chemical compound Br[Cu] NKNDPYCGAZPOFS-UHFFFAOYSA-M 0.000 description 1
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 1
- ZKXWKVVCCTZOLD-UHFFFAOYSA-N copper;4-hydroxypent-3-en-2-one Chemical compound [Cu].CC(O)=CC(C)=O.CC(O)=CC(C)=O ZKXWKVVCCTZOLD-UHFFFAOYSA-N 0.000 description 1
- GEZOTWYUIKXWOA-UHFFFAOYSA-L copper;carbonate Chemical compound [Cu+2].[O-]C([O-])=O GEZOTWYUIKXWOA-UHFFFAOYSA-L 0.000 description 1
- VMKYLARTXWTBPI-UHFFFAOYSA-N copper;dinitrate;hydrate Chemical compound O.[Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O VMKYLARTXWTBPI-UHFFFAOYSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000011646 cupric carbonate Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- GMZOPRQQINFLPQ-UHFFFAOYSA-H dibismuth;tricarbonate Chemical compound [Bi+3].[Bi+3].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O GMZOPRQQINFLPQ-UHFFFAOYSA-H 0.000 description 1
- VWYGTDAUKWEPCZ-UHFFFAOYSA-L dichlorocopper;hydrate Chemical compound O.Cl[Cu]Cl VWYGTDAUKWEPCZ-UHFFFAOYSA-L 0.000 description 1
- HGGYAQHDNDUIIQ-UHFFFAOYSA-L dichloronickel;hydrate Chemical compound O.Cl[Ni]Cl HGGYAQHDNDUIIQ-UHFFFAOYSA-L 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- NZQSCKCTGMHIRY-UHFFFAOYSA-N ethylindium Chemical compound CC[In] NZQSCKCTGMHIRY-UHFFFAOYSA-N 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910021389 graphene Inorganic materials 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- PSCMQHVBLHHWTO-UHFFFAOYSA-K indium(iii) chloride Chemical compound Cl[In](Cl)Cl PSCMQHVBLHHWTO-UHFFFAOYSA-K 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 1
- PVFSDGKDKFSOTB-UHFFFAOYSA-K iron(3+);triacetate Chemical group [Fe+3].CC([O-])=O.CC([O-])=O.CC([O-])=O PVFSDGKDKFSOTB-UHFFFAOYSA-K 0.000 description 1
- LZKLAOYSENRNKR-LNTINUHCSA-N iron;(z)-4-oxoniumylidenepent-2-en-2-olate Chemical compound [Fe].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O LZKLAOYSENRNKR-LNTINUHCSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910001338 liquidmetal Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- MBBQAVVBESBLGH-UHFFFAOYSA-N methyl 4-bromo-3-hydroxybutanoate Chemical compound COC(=O)CC(O)CBr MBBQAVVBESBLGH-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000000877 morphologic effect Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- ZBQNIFVEJKLWAA-UHFFFAOYSA-L nickel(2+);carbonate;hydrate Chemical compound [OH-].[Ni+2].OC([O-])=O ZBQNIFVEJKLWAA-UHFFFAOYSA-L 0.000 description 1
- HIIGGQNLPWIVAG-UHFFFAOYSA-L nickel(2+);diacetate;hydrate Chemical compound O.[Ni+2].CC([O-])=O.CC([O-])=O HIIGGQNLPWIVAG-UHFFFAOYSA-L 0.000 description 1
- DWAHIRJDCNGEDV-UHFFFAOYSA-N nickel(2+);dinitrate;hydrate Chemical compound O.[Ni+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O DWAHIRJDCNGEDV-UHFFFAOYSA-N 0.000 description 1
- AIBQNUOBCRIENU-UHFFFAOYSA-N nickel;dihydrate Chemical compound O.O.[Ni] AIBQNUOBCRIENU-UHFFFAOYSA-N 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
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- 239000000123 paper Substances 0.000 description 1
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- 239000002985 plastic film Substances 0.000 description 1
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- 229910052697 platinum Inorganic materials 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 229920001637 poly (styrene sulfonyl fluoride) Polymers 0.000 description 1
- 229920001606 poly(lactic acid-co-glycolic acid) Polymers 0.000 description 1
- 229920002480 polybenzimidazole Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- NPSSWQJHYLDCNV-UHFFFAOYSA-N prop-2-enoic acid;hydrochloride Chemical compound Cl.OC(=O)C=C NPSSWQJHYLDCNV-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- MVJQBEGKEZLVSH-UHFFFAOYSA-N sodium;tungsten;hydrate Chemical compound O.[Na].[W] MVJQBEGKEZLVSH-UHFFFAOYSA-N 0.000 description 1
- 238000002174 soft lithography Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- KKHJTSPUUIRIOP-UHFFFAOYSA-J tetrachlorostannane;hydrate Chemical compound O.Cl[Sn](Cl)(Cl)Cl KKHJTSPUUIRIOP-UHFFFAOYSA-J 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- JMXKSZRRTHPKDL-UHFFFAOYSA-N titanium ethoxide Chemical compound [Ti+4].CC[O-].CC[O-].CC[O-].CC[O-] JMXKSZRRTHPKDL-UHFFFAOYSA-N 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- 229910003470 tongbaite Inorganic materials 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- WOZZOSDBXABUFO-UHFFFAOYSA-N tri(butan-2-yloxy)alumane Chemical compound [Al+3].CCC(C)[O-].CCC(C)[O-].CCC(C)[O-] WOZZOSDBXABUFO-UHFFFAOYSA-N 0.000 description 1
- VITRLXDSBBVNCZ-UHFFFAOYSA-K trichloroiron;hydrate Chemical compound O.Cl[Fe](Cl)Cl VITRLXDSBBVNCZ-UHFFFAOYSA-K 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical group [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten trioxide Chemical compound O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 150000003738 xylenes Chemical class 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- DJWUNCQRNNEAKC-UHFFFAOYSA-L zinc acetate Chemical compound [Zn+2].CC([O-])=O.CC([O-])=O DJWUNCQRNNEAKC-UHFFFAOYSA-L 0.000 description 1
- 239000004246 zinc acetate Substances 0.000 description 1
- 239000011667 zinc carbonate Substances 0.000 description 1
- 235000004416 zinc carbonate Nutrition 0.000 description 1
- 229910000010 zinc carbonate Inorganic materials 0.000 description 1
- UGZADUVQMDAIAO-UHFFFAOYSA-L zinc hydroxide Chemical compound [OH-].[OH-].[Zn+2] UGZADUVQMDAIAO-UHFFFAOYSA-L 0.000 description 1
- 229940007718 zinc hydroxide Drugs 0.000 description 1
- 229910021511 zinc hydroxide Inorganic materials 0.000 description 1
- ONDPHDOFVYQSGI-UHFFFAOYSA-N zinc nitrate Chemical compound [Zn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ONDPHDOFVYQSGI-UHFFFAOYSA-N 0.000 description 1
- FOSPKRPCLFRZTR-UHFFFAOYSA-N zinc;dinitrate;hydrate Chemical compound O.[Zn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O FOSPKRPCLFRZTR-UHFFFAOYSA-N 0.000 description 1
- NHXVNEDMKGDNPR-UHFFFAOYSA-N zinc;pentane-2,4-dione Chemical compound [Zn+2].CC(=O)[CH-]C(C)=O.CC(=O)[CH-]C(C)=O NHXVNEDMKGDNPR-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
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- B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
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Abstract
Description
도 2는 전기장 보조 로보틱 노즐 프린터의 개략도를 나타낸 것이다.
도 3은 본 발명의 실시예 1에 따라 제조된 기판의 현미경사진이다.
도 4은 본 발명의 실시예 2에 따른 ZnO 나노선의 주사전자현미경(SEM) 사진이다.
도 5는 본 발명의 실시예 2에 따른 정렬된 ZnO 나노선을 나타낸 주사전자현미경(SEM) 사진이다.
도 6는 본 발명의 실시예 2에 따른 NO2 가스에 대한 ZnO 나노선의 가스센서 결과그래프이다.
도 7은 본 발명의 실시예 2에 따른 나노선 어레이 가스센서용 기판이다.
도 8a는 본 발명의 실시예 2에 따라 제조된 ZnO 나노선의 주사전자현미경(SEM) 사진이다.
도 8b는 본 발명의 실시예 2에 따른 C2H5OH, NO2 가스에 대한 ZnO 나노선의 가스센서 결과그래프이다.
도 9a는 본 발명의 실시예 2에 따라 제조된 SnO2 나노선의 주사전자현미경(SEM) 사진이다.
도 9b는 본 발명의 실시예 2에 따른 C2H5OH, NO2 가스에 대한 SnO2 나노선의 가스센서 결과그래프이다.
도 10a는 본 발명의 실시예 2에 따라 제조된 In2O3 나노선의 주사전자현미경(SEM) 사진이다.
도 10b는 본 발명의 실시예 2에 따른 C2H5OH, NO2 가스에 대한 In2O3 나노선의 가스센서 결과그래프이다.
30 : 노즐 40 : 전압 인가 장치
50 : 콜렉터 51 : 접지 장치
60 : 로봇 스테이지 61 : 석정반
70 : 마이크로 거리 조절기 71 : 조그
Claims (10)
- 기판 상에 소스 전극 및 드레인 전극을 포함하는 전극쌍을 복수 개 형성하는 단계;
상기 소스 전극 및 드레인 전극 상에 정렬된 금속 산화물 전구체/유기 복합 나노선 패턴을 형성하는 단계; 및
상기 금속 산화물 전구체/유기 복합 나노선 패턴을 가열하여 금속 산화물을 포함하는 나노선 패턴을 형성하는 단계를 포함하고,
상기 금속 산화물 전구체/유기 복합 나노선 패턴을 형성하는 단계는 전기장 보조 로보틱 노즐 프린터를 이용하며,
상기 전기장 보조 로보틱 노즐 프린터는 용액 저장 장치, 노즐, 상기 용액 저장 장치에 압력을 가하여 상기 노즐로 용액을 토출시키는 토출 조절기, 상기 기판을 지지하고 접지된 콜렉터, 상기 노즐에 전압을 인가하는 전압 인가 장치, 상기 콜렉터를 이동시키는 로봇 스테이지 및 상기 노즐과 상기 콜렉터 사이의 거리를 조절하는 마이크로 거리 조절기를 포함하고, 상기 전압이 인가된 노즐과 접지된 콜렉터 사이에 전기장이 존재하는 프린터이며,
상기 금속 산화물 전구체/유기 복합 나노선 패턴을 형성하는 단계에서, 밀폐되고 환풍기가 구비된 하우징 내에 상기 전기장 보조 로보틱 노즐 프린터를 배치하고, 상기 환풍기를 이용하여 하우징 내 증기압을 조절하여서 용매의 증발 속도를 조절하는 것을 포함하는 것인,
가스센서 나노어레이의 제조방법. - 제1항에 있어서,
상기 금속 산화물 전구체/유기 복합 나노선 패턴을 형성하는 단계는,
금속 산화물 전구체 및 유기 소재를 증류수 또는 유기 용제에 혼합하여 금속 산화물 전구체/유기 고분자 복합체 용액을 준비하는 단계; 및
상기 금속 산화물 전구체/유기 고분자 복합체 용액을 이용하여 상기 소스 전극 및 드레인 전극 상에 정렬된 금속 산화물 전구체/유기 복합 나노선 패턴을 형성하는 단계를 포함하는 것을 특징으로 하는 가스센서 나노어레이의 제조방법. - 제1항에 있어서,
상기 금속 산화물을 포함하는 나노선 패턴은 수평 정렬된 것을 특징으로 하는 가스센서 나노어레이의 제조방법. - 삭제
- 제1항에 있어서,
상기 소스 전극 및 드레인 전극 상에 정렬된 금속 산화물 전구체/유기 복합 나노선 패턴을 형성하는 단계는,
상기 소스 전극 및 드레인 전극마다 각기 다른 금속 산화물 전구체/유기 복합 나노선 패턴을 형성하는 것을 특징으로 하는 가스센서 나노어레이의 제조방법. - 제1항에 있어서,
상기 소스 전극 및 드레인 전극의 두께는 1nm 내지 1㎛인 것을 특징으로 하는 가스센서 나노 어레이의 제조방법. - 제1항에 있어서,
상기 금속 산화물 전구체/유기 복합 나노선 패턴을 가열하는 단계는,
100 ℃ 내지 900 ℃ 의 온도 하에서, 1 시간 내지 24 시간 동안 가열하는 것을 특징으로 하는 가스센서 나노어레이의 제조방법. - 제1항에 있어서,
상기 금속 산화물 전구체는 산화아연 전구체, 산화인듐 전구체, 산화주석 전구체, 산화텅스텐 전구체, 산화알루미늄 전구체, 산화티타늄 전구체, 산화바나듐 전구체, 산화몰리브데늄 전구체, 산화구리 전구체, 산화니켈 전구체, 산화철 전구체, 산화크롬 전구체 및 산화비스무스 전구체로 이루어진 군으로부터 선택되는 적어도 하나를 포함하는 가스센서 나노어레이의 제조방법. - 제2항에 있어서,
상기 유기 소재는 폴리비닐 알코올(PVA), 폴리에틸렌 옥사이드(PEO), 폴리스티렌(PS), 폴리카프로락톤(PCL), 폴리아크릴로니트릴(PAN), 폴리(메틸 메타크릴레이트)(PMMA), 폴리이미드, 폴리(비닐리덴 플루오라이드)(PVDF), 폴리아닐린(PANI), 폴리비닐클로라이드(PVC), 나일론, 폴리(아크릴산), 폴리(클로로 스티렌), 폴리(디메틸 실록산), 폴리(에테르 이미드), 폴리(에테르 술폰), 폴리(알킬 아크릴레이트), 폴리(에틸 아크릴레이트), 폴리(에틸 비닐 아세테이트), 폴리(에틸-co-비닐 아세테이트), 폴리(에틸렌 테레프탈레이트), 폴리(락트산-co-글리콜산), 폴리(메타크릴산)염, 폴리(메틸 스티렌), 폴리(스티렌 술폰산)염, 폴리(스티렌 술포닐 플루오라이드), 폴리(스티렌-co-아크릴로니트릴), 폴리(스티렌-co-부타디엔), 폴리(스티렌-co-디비닐 벤젠), 폴리(비닐 아세테이트), 폴리락타이드, 폴리(비닐 알콜), 폴리아크릴아미드, 폴리벤즈이미다졸, 폴리카보네이트, 폴리(디메틸실록산-co-폴리에틸렌옥사이드), 폴리(에테르에테르케톤), 폴리에틸렌, 폴리에틸렌이민, 폴리이소프렌, 폴리락타이드, 폴리프로필렌, 폴리술폰, 폴리우레탄, 폴리(비닐피로리돈), 폴리(페닐렌 비닐렌) 및 폴리(비닐 카바졸)로 이루어진 군으로부터 선택되는 적어도 하나를 포함하는 가스센서 나노어레이의 제조방법. - 제 2 항에 있어서,
상기유기 용제는 다이클로로에틸렌, 클로로포름, 클로로벤젠, 다이클로로벤젠, 다이클로로메탄, 스티렌, 다이메틸포름아미드, 다이메틸설폭사이드, 트리클로로에틸렌, 테트라하이드로퓨란, 자일렌, 톨루엔, 사이클로헥센, 이소프로필알콜, 아세토나이트릴, 에탄올, 메탄올, 부탄올, 및 아세톤으로 이루어진 군으로부터 선택되는 적어도 하나를 포함하는 가스센서 나노어레이의 제조방법.
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