KR101339528B1 - 전자 빔 용접 조인트 및 전자 빔 용접용 강판과 그의 제조 방법 - Google Patents
전자 빔 용접 조인트 및 전자 빔 용접용 강판과 그의 제조 방법 Download PDFInfo
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Abstract
Description
도 2a는 켄칭성과 용접 금속의 결정립 직경의 관계를 정성적으로 도시하는 도면이다.
도 2b는 켄칭성과 열 영향부의 고탄소 마르텐사이트량의 관계를 정성적으로 도시하는 도면이다.
도 3은 강재(모재)의 경도에 대한 용접 금속의 경도의 비와 용접 금속 및 열 영향부의 파괴 인성의 관계를 정성적으로 도시하는 도면이다.
도 4는 CeEB와 용접 금속 및 열 영향부의 파괴 인성값(δc)의 관계를 정성적으로 도시하는 도면이다.
도 5a는 용접 금속의 파괴 인성값과 C/CeEB의 관계를 정성적으로 도시하는 도면이다.
도 5b는 열 영향부의 파괴 인성값과 C/CeEB의 관계를 정성적으로 도시하는 도면이다.
도 6은 노치를 도입한 시험편을 도시하는 도면이다.
도 7은 용접 조인트의 CTOD 시험 결과와, 강재에 포함되는 개재물(미소한 Ti 질화물과 조대한 개재물 입자)의 개수의 관계를 나타낸 도면이다.
도 8a는 주조편의 냉각 속도와, 강재에 포함되는 미소한 Ti 질화물의 수의 상관을 도시하는 도면이다.
도 8b는 주조편의 냉각 속도와, 강재에 포함되는 조대한 개재물 입자의 수의 상관을 도시하는 도면이다.
Claims (8)
- 강판이 전자 빔으로 용접된 전자 빔 용접 조인트이며, 상기 강판의 조성이, 질량%로,
C: 0.02% 내지 0.06%,
Si: 0.03% 내지 0.30%,
Mn: 1.5% 내지 2.5%,
Ti: 0.005 내지 0.015%,
N: 0.0020 내지 0.0060%,
Al: 0.004% 초과 0.05% 이하,
Nb: 0% 내지 0.012%,
V: 0% 내지 0.030%,
Cr: 0% 내지 0.50%,
Mo: 0% 내지 0.50%,
Cu: 0% 내지 0.25%,
Ni: 0% 내지 0.50%,
B: 0% 내지 0.0030% 및
Ca: 0% 내지 0.0050%를 함유하고,
P: 0.015% 이하로 제한하고,
S: 0.010% 이하로 제한하고,
O: 0.0035% 이하로 제한하고,
잔량부가 철 및 불가피적 불순물로 이루어지고,
상기 강판의 조성을 하기의 식 1에 대입하여 구해지는 지표값 CeEB가 0.49% 내지 0.60%이고,
상기 강판의 상기 지표값 CeEB에 대한 질량%로 나타낸 상기 강판의 C량의 비인 C/CeEB가 0.04 내지 0.18이며,
상기 강판의 판 두께 방향을 따른 단면의 판 두께 중심부에 있어서, 원 상당 직경이 1.0㎛ 이상인 개재물 입자의 수가 20개/mm2 이하이고,
상기 판 두께 중심부에 있어서, Ti를 10% 이상 함유하는 원 상당 직경이 0.05㎛ 이상 0.5㎛ 미만인 Ti 함유 질화물 입자의 수가 1×103개/mm2 이상인 것을 특징으로 하는 전자 빔 용접 조인트.
전자 빔 용접 켄칭성 지표 CeEB=C+(9/40)Mn+(1/15)Cu+(1/15)Ni+(1/5)Cr+(1/5)Mo+(1/5)V … (식 1)
여기서, C, Mn, Cu, Ni, Cr, Mo 및 V는, 각각 소정의 강판의 조성 중의 각 원소의 질량%. - 제1항에 있어서,
상기 강판의 두께가 45 내지 150mm인 것을 특징으로 하는, 전자 빔 용접 조인트. - 제1항 또는 제2항에 있어서,
용접 금속의 CTOD값을 δWM, 용접 열 영향부의 CTOD값을 δHAZ 및 상기 강판의 CTOD값을 δBM이라 정의하면, δWM, δHAZ 및 δBM이 하기의 식 2 및 식 3을 만족하는 것을 특징으로 하는, 전자 빔 용접 조인트.
0.15≤δWM/δBM≤1.1 … (식 2)
0.15≤δHAZ/δBM≤1.1 … (식 3) - 전자 빔 용접 조인트용의 강판이며, 상기 강판의 조성이, 질량%로,
C: 0.02% 내지 0.06%,
Si: 0.03% 내지 0.30%,
Mn: 1.5% 내지 2.5%,
Ti: 0.005% 내지 0.015%,
N: 0.0020% 내지 0.0060%,
Al: 0.004% 초과 0.05% 이하,
Nb: 0% 내지 0.012%,
V: 0% 내지 0.030%,
Cr: 0% 내지 0.50%,
Mo: 0% 내지 0.50%,
Cu: 0% 내지 0.25%,
Ni: 0% 내지 0.50%,
B: 0% 내지 0.0030% 및
Ca: 0% 내지 0.0050%를 함유하고,
P: 0.015% 이하로 제한하고,
S: 0.010% 이하로 제한하고,
O: 0.0035% 이하로 제한하고,
잔량부가 철 및 불가피적 불순물로 이루어지고,
상기 강판의 조성을 하기의 식 1에 대입하여 구해지는 지표값 CeEB가 0.49% 내지 0.60%이고,
상기 강판의 상기 지표값 CeEB에 대한 질량%로 나타낸 상기 강판의 C량의 비인 C/CeEB가 0.04 내지 0.18이며,
상기 강판의 판 두께 방향을 따른 단면의 판 두께 중심부에 있어서, 원 상당 직경이 1.0㎛ 이상인 개재물 입자의 수가 20개/mm2 이하이고,
상기 판 두께 중심부에 있어서, Ti를 10% 이상 함유하는 원 상당 직경이 0.05㎛ 이상 0.5㎛ 미만인 Ti 함유 질화물 입자의 수가 1×103개/mm2 이상인 것을 특징으로 하는, 전자 빔 용접 조인트용 강판.
전자 빔 용접 켄칭성 지표 CeEB=C+(9/40)Mn+(1/15)Cu+(1/15)Ni+(1/5)Cr+(1/5)Mo+(1/5)V … (식 1)
여기서, C, Mn, Cu, Ni, Cr, Mo 및 V는, 각각 소정의 강판의 조성 중의 각 원소의 질량%. - 제4항에 있어서,
상기 강판의 두께가 45 내지 150mm인 것을 특징으로 하는, 전자 빔 용접 조인트용 강판. - 제4항 또는 제5항에 기재된 전자 빔 용접 조인트용 강판의 제조 방법이며,
상기 강판을 주조할 때, 상기 강판을, 1300 내지 1100℃의 온도 영역에서의 냉각 속도가 9℃/분 이상이 되도록 냉각하는 공정과,
상기 주조 공정 후, 상기 강판을, 950 내지 1150℃로 가열하고, 그 후, 가공 열처리를 실시하는 공정,
을 갖는 것을 특징으로 하는 전자 빔 용접 조인트용 강판의 제조 방법. - 삭제
- 삭제
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